WO2008126902A1 - 組成物、保護被膜形成方法及び積層体とその製法 - Google Patents

組成物、保護被膜形成方法及び積層体とその製法 Download PDF

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Publication number
WO2008126902A1
WO2008126902A1 PCT/JP2008/057097 JP2008057097W WO2008126902A1 WO 2008126902 A1 WO2008126902 A1 WO 2008126902A1 JP 2008057097 W JP2008057097 W JP 2008057097W WO 2008126902 A1 WO2008126902 A1 WO 2008126902A1
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WO
WIPO (PCT)
Prior art keywords
coating film
protective coating
group
laminate
carbon atoms
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/057097
Other languages
English (en)
French (fr)
Inventor
Hideaki Kuwano
Hiroshi Takeuchi
Yukiko Kato
Akira Motonaga
Mina Nomura
Masanori Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Mitsubishi Rayon Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Rayon Co Ltd filed Critical Mitsubishi Rayon Co Ltd
Priority to JP2008519759A priority Critical patent/JPWO2008126902A1/ja
Publication of WO2008126902A1 publication Critical patent/WO2008126902A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/045—Polysiloxanes containing less than 25 silicon atoms
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/36—Sulfur-, selenium-, or tellurium-containing compounds
    • C08K5/37—Thiols
    • C08K5/375—Thiols containing six-membered aromatic rings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Paints Or Removers (AREA)
  • Laminated Bodies (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Silicon Polymers (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)

Abstract

　耐擦傷性等の被膜性能に優れた無機系の透明保護被膜を短時間で形成可能な保護被膜形成方法として、シロキサンオリゴマー、オルガノシラン類及びアルキルシリケート類から選択される少なくとも１種（Ａ）、及び一般式（１）で示される芳香族スルホニウム塩型酸発生剤（Ｂ）を含有する光硬化性組成物を基材に塗布し、光照射により前記光硬化性組成物を硬化させる。 （式中、Ｒ１、Ｒ２、Ｒ３は、それぞれ水素、炭素数１～１０の有機基、ハロゲン基、水酸基を表し、Ｒ４は、炭素数１～１０の脂肪族炭化水素基を表し、Ｒ５は、置換基を有しても良い芳香族炭化水素基を表す。Ｘ－は、カウンターアニオンを表す。）
PCT/JP2008/057097 2007-04-11 2008-04-10 組成物、保護被膜形成方法及び積層体とその製法 Ceased WO2008126902A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008519759A JPWO2008126902A1 (ja) 2007-04-11 2008-04-10 組成物、保護被膜形成方法及び積層体とその製法

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP2007103949 2007-04-11
JP2007-103949 2007-04-11
JP2007-310945 2007-11-30
JP2007310945 2007-11-30

Publications (1)

Publication Number Publication Date
WO2008126902A1 true WO2008126902A1 (ja) 2008-10-23

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PCT/JP2008/057097 Ceased WO2008126902A1 (ja) 2007-04-11 2008-04-10 組成物、保護被膜形成方法及び積層体とその製法

Country Status (3)

Country Link
JP (1) JPWO2008126902A1 (ja)
TW (1) TW200904899A (ja)
WO (1) WO2008126902A1 (ja)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010100819A (ja) * 2008-09-25 2010-05-06 Panasonic Electric Works Co Ltd 指紋汚れの防止方法、並びに耐指紋性コーティング材組成物及びその塗装品
JP2011084706A (ja) * 2009-09-15 2011-04-28 Mitsubishi Rayon Co Ltd 活性エネルギー線硬化性組成物、硬化被膜形成方法及び積層体
JP2012051813A (ja) * 2010-08-31 2012-03-15 San Apro Kk スルホニウム塩、光酸発生剤及び感光性樹脂組成物
WO2012153848A1 (ja) * 2011-05-11 2012-11-15 三菱レイヨン株式会社 活性エネルギー線硬化性組成物、積層体及び積層体の製造方法
KR101293735B1 (ko) 2011-06-30 2013-08-06 삼성정밀화학 주식회사 경화온도가 조절되는 투명 피막 형성용 조성물

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112888750B (zh) * 2018-09-24 2023-09-08 地板工业有限公司 用于喷墨数字印刷的陶瓷油墨

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11349895A (ja) * 1998-06-08 1999-12-21 Kansai Paint Co Ltd カチオン重合性塗料組成物
JP2000109695A (ja) * 1998-08-04 2000-04-18 Jsr Corp 光硬化性樹脂組成物および硬化膜
JP2000109694A (ja) * 1998-08-04 2000-04-18 Jsr Corp 光硬化性樹脂組成物および硬化膜
JP2000171604A (ja) * 1998-12-07 2000-06-23 Jsr Corp 反射防止膜、反射防止膜を含む積層体および反射防止膜の製造方法
JP2003089723A (ja) * 2001-09-18 2003-03-28 Kansai Paint Co Ltd 硬化性組成物及びその被膜形成方法
JP2007041361A (ja) * 2005-08-04 2007-02-15 Toray Ind Inc 感光性樹脂組成物、それから形成された硬化膜、および硬化膜を有する素子
JP2007226214A (ja) * 2006-01-27 2007-09-06 Toray Ind Inc 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子
JP2007277332A (ja) * 2006-04-04 2007-10-25 Atomix Co Ltd 紫外線硬化型コーティング用組成物およびこれを被覆してなる樹脂被覆品
JP2008120870A (ja) * 2006-11-09 2008-05-29 Mitsubishi Rayon Co Ltd 活性エネルギー線硬化性組成物、及び積層体

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11349895A (ja) * 1998-06-08 1999-12-21 Kansai Paint Co Ltd カチオン重合性塗料組成物
JP2000109695A (ja) * 1998-08-04 2000-04-18 Jsr Corp 光硬化性樹脂組成物および硬化膜
JP2000109694A (ja) * 1998-08-04 2000-04-18 Jsr Corp 光硬化性樹脂組成物および硬化膜
JP2000171604A (ja) * 1998-12-07 2000-06-23 Jsr Corp 反射防止膜、反射防止膜を含む積層体および反射防止膜の製造方法
JP2003089723A (ja) * 2001-09-18 2003-03-28 Kansai Paint Co Ltd 硬化性組成物及びその被膜形成方法
JP2007041361A (ja) * 2005-08-04 2007-02-15 Toray Ind Inc 感光性樹脂組成物、それから形成された硬化膜、および硬化膜を有する素子
JP2007226214A (ja) * 2006-01-27 2007-09-06 Toray Ind Inc 感光性シロキサン組成物、それから形成された硬化膜、および硬化膜を有する素子
JP2007277332A (ja) * 2006-04-04 2007-10-25 Atomix Co Ltd 紫外線硬化型コーティング用組成物およびこれを被覆してなる樹脂被覆品
JP2008120870A (ja) * 2006-11-09 2008-05-29 Mitsubishi Rayon Co Ltd 活性エネルギー線硬化性組成物、及び積層体

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010100819A (ja) * 2008-09-25 2010-05-06 Panasonic Electric Works Co Ltd 指紋汚れの防止方法、並びに耐指紋性コーティング材組成物及びその塗装品
JP2011084706A (ja) * 2009-09-15 2011-04-28 Mitsubishi Rayon Co Ltd 活性エネルギー線硬化性組成物、硬化被膜形成方法及び積層体
JP2012051813A (ja) * 2010-08-31 2012-03-15 San Apro Kk スルホニウム塩、光酸発生剤及び感光性樹脂組成物
WO2012153848A1 (ja) * 2011-05-11 2012-11-15 三菱レイヨン株式会社 活性エネルギー線硬化性組成物、積層体及び積層体の製造方法
CN103517951A (zh) * 2011-05-11 2014-01-15 三菱丽阳株式会社 活性能量射线固化性组合物、层积体和层积体的制造方法
KR101293735B1 (ko) 2011-06-30 2013-08-06 삼성정밀화학 주식회사 경화온도가 조절되는 투명 피막 형성용 조성물

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Publication number Publication date
JPWO2008126902A1 (ja) 2010-07-22
TW200904899A (en) 2009-02-01

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