WO2008120416A1 - 光学用複合材料、その製造方法、及び光学用複合材料を用いた光学素子 - Google Patents

光学用複合材料、その製造方法、及び光学用複合材料を用いた光学素子 Download PDF

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Publication number
WO2008120416A1
WO2008120416A1 PCT/JP2007/072653 JP2007072653W WO2008120416A1 WO 2008120416 A1 WO2008120416 A1 WO 2008120416A1 JP 2007072653 W JP2007072653 W JP 2007072653W WO 2008120416 A1 WO2008120416 A1 WO 2008120416A1
Authority
WO
WIPO (PCT)
Prior art keywords
composite material
optical
optical composite
manufacturing
resin
Prior art date
Application number
PCT/JP2007/072653
Other languages
English (en)
French (fr)
Inventor
Hiroaki Ando
Hideaki Wakamatsu
Original Assignee
Konica Minolta Opto, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Opto, Inc. filed Critical Konica Minolta Opto, Inc.
Publication of WO2008120416A1 publication Critical patent/WO2008120416A1/ja

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
    • C08L83/02—Polysilicates
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/02—Polysilicates
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • C08K3/36—Silica

Abstract

　高い透明性を有する光学用複合材料、その製造方法、及び当該光学用複合材料を用いた光学素子を提供する。当該光学用複合材料の製造方法は、樹脂と無機粒子を含有する光学用複合材料の製造方法であって、当該無機粒子がシリカ含有量１０～９０質量％である複合粒子であり、かつ当該無機粒子をかさ密度が０．００１～０．１ｇ／ｍｌの粉体として樹脂と混合する工程を有することを特徴とする。
PCT/JP2007/072653 2007-02-27 2007-11-22 光学用複合材料、その製造方法、及び光学用複合材料を用いた光学素子 WO2008120416A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007046902 2007-02-27
JP2007-046902 2007-02-27

Publications (1)

Publication Number Publication Date
WO2008120416A1 true WO2008120416A1 (ja) 2008-10-09

Family

ID=39808004

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/072653 WO2008120416A1 (ja) 2007-02-27 2007-11-22 光学用複合材料、その製造方法、及び光学用複合材料を用いた光学素子

Country Status (1)

Country Link
WO (1) WO2008120416A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013032262A (ja) * 2011-06-30 2013-02-14 Dic Corp 表面処理されたシリカ粒子の製造方法、シリカ粒子分散体、及び樹脂組成物
CN110650993A (zh) * 2017-05-17 2020-01-03 株式会社亚都玛科技 复合粒子材料和其制造方法、复合粒子材料浆料、树脂组合物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04175219A (ja) * 1990-11-08 1992-06-23 Ube Nitto Kasei Co Ltd ジルコニア被覆シリカ微粒子及びその製造方法
JP2003252616A (ja) * 2001-12-27 2003-09-10 Tokuyama Corp シリカ系複合酸化物粒子およびその製造方法
WO2005026793A1 (en) * 2003-09-12 2005-03-24 3M Innovative Properties Company Durable optical element
JP2005146042A (ja) * 2003-11-12 2005-06-09 Olympus Corp 有機無機複合材料及びその製造方法並びに光学素子
JP2006052128A (ja) * 2004-07-13 2006-02-23 Tokuyama Corp 無機酸化物粒子

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04175219A (ja) * 1990-11-08 1992-06-23 Ube Nitto Kasei Co Ltd ジルコニア被覆シリカ微粒子及びその製造方法
JP2003252616A (ja) * 2001-12-27 2003-09-10 Tokuyama Corp シリカ系複合酸化物粒子およびその製造方法
WO2005026793A1 (en) * 2003-09-12 2005-03-24 3M Innovative Properties Company Durable optical element
JP2005146042A (ja) * 2003-11-12 2005-06-09 Olympus Corp 有機無機複合材料及びその製造方法並びに光学素子
JP2006052128A (ja) * 2004-07-13 2006-02-23 Tokuyama Corp 無機酸化物粒子

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013032262A (ja) * 2011-06-30 2013-02-14 Dic Corp 表面処理されたシリカ粒子の製造方法、シリカ粒子分散体、及び樹脂組成物
CN110650993A (zh) * 2017-05-17 2020-01-03 株式会社亚都玛科技 复合粒子材料和其制造方法、复合粒子材料浆料、树脂组合物
CN110650993B (zh) * 2017-05-17 2020-12-22 株式会社亚都玛科技 复合粒子材料和其制造方法、复合粒子材料浆料、树脂组合物

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