WO2008111165A1 - 有機膜のパターニング方法 - Google Patents

有機膜のパターニング方法 Download PDF

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Publication number
WO2008111165A1
WO2008111165A1 PCT/JP2007/054913 JP2007054913W WO2008111165A1 WO 2008111165 A1 WO2008111165 A1 WO 2008111165A1 JP 2007054913 W JP2007054913 W JP 2007054913W WO 2008111165 A1 WO2008111165 A1 WO 2008111165A1
Authority
WO
WIPO (PCT)
Prior art keywords
organic
film
patterning
area
organic films
Prior art date
Application number
PCT/JP2007/054913
Other languages
English (en)
French (fr)
Inventor
Tatsuya Yoshizawa
Takuya Hatakeyama
Kenichi Nagayama
Original Assignee
Pioneer Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Pioneer Corporation filed Critical Pioneer Corporation
Priority to US12/531,196 priority Critical patent/US20100087032A1/en
Priority to JP2009503807A priority patent/JP4927938B2/ja
Priority to PCT/JP2007/054913 priority patent/WO2008111165A1/ja
Publication of WO2008111165A1 publication Critical patent/WO2008111165A1/ja

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/233—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers by photolithographic etching
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/14—Carrier transporting layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/321—Metal complexes comprising a group IIIA element, e.g. Tris (8-hydroxyquinoline) gallium [Gaq3]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y02E10/549—Organic PV cells

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Electroluminescent Light Sources (AREA)
  • Drying Of Semiconductors (AREA)

Abstract

　各種有機デバイスを製造する際に好適な、新規な有機膜のパターニング方法を提供することを主たる課題とする。 　所定の領域に形成された有機膜のパターニング方法において、パターニング後に残存させるべき有機膜に対応する部分に、金属錯体を含有する有機カバー層を形成する、有機カバー層形成工程と、前記有機カバー層形成工程後、有機カバー層の上部からプラズマを照射することにより、前記有機膜における有機カバー層が形成されていない部分をエッチングする、プラズマエッチング工程と、を含むようにする。
PCT/JP2007/054913 2007-03-13 2007-03-13 有機膜のパターニング方法 WO2008111165A1 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
US12/531,196 US20100087032A1 (en) 2007-03-13 2007-03-13 Method for patterning of organic film
JP2009503807A JP4927938B2 (ja) 2007-03-13 2007-03-13 有機膜のパターニング方法
PCT/JP2007/054913 WO2008111165A1 (ja) 2007-03-13 2007-03-13 有機膜のパターニング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2007/054913 WO2008111165A1 (ja) 2007-03-13 2007-03-13 有機膜のパターニング方法

Publications (1)

Publication Number Publication Date
WO2008111165A1 true WO2008111165A1 (ja) 2008-09-18

Family

ID=39759116

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2007/054913 WO2008111165A1 (ja) 2007-03-13 2007-03-13 有機膜のパターニング方法

Country Status (3)

Country Link
US (1) US20100087032A1 (ja)
JP (1) JP4927938B2 (ja)
WO (1) WO2008111165A1 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011151312A (ja) * 2010-01-25 2011-08-04 Nissha Printing Co Ltd 有機薄膜太陽電池およびその製造方法（１）
JP2011151313A (ja) * 2010-01-25 2011-08-04 Nissha Printing Co Ltd 有機薄膜太陽電池およびその製造方法（２）
JP2012238578A (ja) * 2011-04-27 2012-12-06 Canon Inc 有機ｅｌ表示装置の製造方法、電子機器

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2977720A1 (fr) * 2011-07-08 2013-01-11 Commissariat Energie Atomique Dispositif optoelectronique organique et son procede d'encapsulation.
KR102029471B1 (ko) * 2013-01-08 2019-10-07 삼성전기주식회사 정전 방전 보호 소자 및 이를 구비하는 칩 부품

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002208482A (ja) * 2001-01-11 2002-07-26 Sharp Corp 有機エレクトロルミネッセンス素子およびその製造方法
WO2004110105A1 (ja) * 2003-06-06 2004-12-16 Pioneer Corporation 有機半導体素子及びその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5948570A (en) * 1995-05-26 1999-09-07 Lucent Technologies Inc. Process for dry lithographic etching
US6087270A (en) * 1998-06-18 2000-07-11 Micron Technology, Inc. Method of patterning substrates
JP4095763B2 (ja) * 2000-09-06 2008-06-04 株式会社ルネサステクノロジ 半導体装置及びその製造方法
US7223691B2 (en) * 2004-10-14 2007-05-29 International Business Machines Corporation Method of forming low resistance and reliable via in inter-level dielectric interconnect

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002208482A (ja) * 2001-01-11 2002-07-26 Sharp Corp 有機エレクトロルミネッセンス素子およびその製造方法
WO2004110105A1 (ja) * 2003-06-06 2004-12-16 Pioneer Corporation 有機半導体素子及びその製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011151312A (ja) * 2010-01-25 2011-08-04 Nissha Printing Co Ltd 有機薄膜太陽電池およびその製造方法（１）
JP2011151313A (ja) * 2010-01-25 2011-08-04 Nissha Printing Co Ltd 有機薄膜太陽電池およびその製造方法（２）
JP2012238578A (ja) * 2011-04-27 2012-12-06 Canon Inc 有機ｅｌ表示装置の製造方法、電子機器

Also Published As

Publication number Publication date
JPWO2008111165A1 (ja) 2010-06-24
US20100087032A1 (en) 2010-04-08
JP4927938B2 (ja) 2012-05-09

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