WO2008102758A1 - 平版印刷版材料、平版印刷版の作製方法及び平版印刷版 - Google Patents

平版印刷版材料、平版印刷版の作製方法及び平版印刷版 Download PDF

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Publication number
WO2008102758A1
WO2008102758A1 PCT/JP2008/052730 JP2008052730W WO2008102758A1 WO 2008102758 A1 WO2008102758 A1 WO 2008102758A1 JP 2008052730 W JP2008052730 W JP 2008052730W WO 2008102758 A1 WO2008102758 A1 WO 2008102758A1
Authority
WO
WIPO (PCT)
Prior art keywords
printing plate
lithographic printing
manufacturing
improved
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/JP2008/052730
Other languages
English (en)
French (fr)
Inventor
Hirohide Ito
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Medical and Graphic Inc
Original Assignee
Konica Minolta Medical and Graphic Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Medical and Graphic Inc filed Critical Konica Minolta Medical and Graphic Inc
Publication of WO2008102758A1 publication Critical patent/WO2008102758A1/ja
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/10—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme
    • B41C1/1008—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials
    • B41C1/1016—Forme preparation for lithographic printing; Master sheets for transferring a lithographic image to the forme by removal or destruction of lithographic material on the lithographic support, e.g. by laser or spark ablation; by the use of materials rendered soluble or insoluble by heat exposure, e.g. by heat produced from a light to heat transforming system; by on-the-press exposure or on-the-press development, e.g. by the fountain of photolithographic materials characterised by structural details, e.g. protective layers, backcoat layers or several imaging layers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/02—Cover layers; Protective layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2201/00—Location, type or constituents of the non-imaging layers in lithographic printing formes
    • B41C2201/14—Location, type or constituents of the non-imaging layers in lithographic printing formes characterised by macromolecular organic compounds, e.g. binder, adhesives
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/04—Negative working, i.e. the non-exposed (non-imaged) areas are removed
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/06—Developable by an alkaline solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/10—Developable by an acidic solution
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/22—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by organic non-macromolecular additives, e.g. dyes, UV-absorbers, plasticisers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C2210/00—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation
    • B41C2210/24—Preparation or type or constituents of the imaging layers, in relation to lithographic printing forme preparation characterised by a macromolecular compound or binder obtained by reactions involving carbon-to-carbon unsaturated bonds, e.g. acrylics, vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0047—Photosensitive materials characterised by additives for obtaining a metallic or ceramic pattern, e.g. by firing

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Thermal Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Printing Plates And Materials Therefor (AREA)

Abstract

　本発明は、基材上に画像形成層を有する平版印刷版材料であって、該平版印刷版材料がプラズモン吸収を有する金属粒子を含有する層を有することを特徴とし、画質の向上、耐刷性向上、地汚れ防止及び保存性の向上を可能にする平版印刷版材料が提供でき、そしてそれを用いた平版印刷版の作製方法及び平版印刷版が提供できる。
PCT/JP2008/052730 2007-02-23 2008-02-19 平版印刷版材料、平版印刷版の作製方法及び平版印刷版 Ceased WO2008102758A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-043559 2007-02-23
JP2007043559 2007-02-23

Publications (1)

Publication Number Publication Date
WO2008102758A1 true WO2008102758A1 (ja) 2008-08-28

Family

ID=39710035

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/052730 Ceased WO2008102758A1 (ja) 2007-02-23 2008-02-19 平版印刷版材料、平版印刷版の作製方法及び平版印刷版

Country Status (1)

Country Link
WO (1) WO2008102758A1 (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9446266B2 (en) 2009-10-01 2016-09-20 Akzo Nobel Chemicals International B.V. Compositions and method for thermal protection of hair
CN115145435A (zh) * 2022-07-13 2022-10-04 厦门极致互动网络技术股份有限公司 一种基于ui界面的3d粒子特效展示方法

Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000258900A (ja) * 1999-03-05 2000-09-22 Konica Corp 画像形成材料
JP2001315452A (ja) * 2000-05-10 2001-11-13 Fuji Photo Film Co Ltd 平版印刷用原板
JP2002120467A (ja) * 2000-10-16 2002-04-23 Fuji Photo Film Co Ltd 平版印刷版用原版
JP2003156839A (ja) * 2001-11-22 2003-05-30 Fuji Photo Film Co Ltd 刷版材料およびそれを用いた製版方法
JP2003225899A (ja) * 2002-01-31 2003-08-12 Sangaku Renkei Kiko Kyushu:Kk 金属ナノロッドの分光特性を利用する機能素子
JP2005262708A (ja) * 2004-03-19 2005-09-29 Fuji Photo Film Co Ltd 平版印刷版原版および平版印刷方法
WO2006090623A1 (ja) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
JP2006264306A (ja) * 2005-02-28 2006-10-05 Fuji Photo Film Co Ltd 平版印刷版原版の製造方法
JP2006349867A (ja) * 2005-06-14 2006-12-28 Fujifilm Holdings Corp 黒色組成物、感光性転写材料、遮光画像付き基板、カラーフィルタ、液晶表示素子及び遮光画像の製造方法

Patent Citations (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000258900A (ja) * 1999-03-05 2000-09-22 Konica Corp 画像形成材料
JP2001315452A (ja) * 2000-05-10 2001-11-13 Fuji Photo Film Co Ltd 平版印刷用原板
JP2002120467A (ja) * 2000-10-16 2002-04-23 Fuji Photo Film Co Ltd 平版印刷版用原版
JP2003156839A (ja) * 2001-11-22 2003-05-30 Fuji Photo Film Co Ltd 刷版材料およびそれを用いた製版方法
JP2003225899A (ja) * 2002-01-31 2003-08-12 Sangaku Renkei Kiko Kyushu:Kk 金属ナノロッドの分光特性を利用する機能素子
JP2005262708A (ja) * 2004-03-19 2005-09-29 Fuji Photo Film Co Ltd 平版印刷版原版および平版印刷方法
WO2006090623A1 (ja) * 2005-02-25 2006-08-31 Konica Minolta Medical & Graphic, Inc. 感光性平版印刷版材料
JP2006264306A (ja) * 2005-02-28 2006-10-05 Fuji Photo Film Co Ltd 平版印刷版原版の製造方法
JP2006349867A (ja) * 2005-06-14 2006-12-28 Fujifilm Holdings Corp 黒色組成物、感光性転写材料、遮光画像付き基板、カラーフィルタ、液晶表示素子及び遮光画像の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9446266B2 (en) 2009-10-01 2016-09-20 Akzo Nobel Chemicals International B.V. Compositions and method for thermal protection of hair
CN115145435A (zh) * 2022-07-13 2022-10-04 厦门极致互动网络技术股份有限公司 一种基于ui界面的3d粒子特效展示方法

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