WO2008093507A1 - 感放射線性樹脂組成物 - Google Patents

感放射線性樹脂組成物 Download PDF

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Publication number
WO2008093507A1
WO2008093507A1 PCT/JP2008/050010 JP2008050010W WO2008093507A1 WO 2008093507 A1 WO2008093507 A1 WO 2008093507A1 JP 2008050010 W JP2008050010 W JP 2008050010W WO 2008093507 A1 WO2008093507 A1 WO 2008093507A1
Authority
WO
WIPO (PCT)
Prior art keywords
radiation
resin composition
negative
ethylenically unsaturated
double bonds
Prior art date
Application number
PCT/JP2008/050010
Other languages
English (en)
French (fr)
Inventor
Nami Onimaru
Kouji Nishikawa
Original Assignee
Jsr Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jsr Corporation filed Critical Jsr Corporation
Priority to JP2008556029A priority Critical patent/JP5277968B2/ja
Publication of WO2008093507A1 publication Critical patent/WO2008093507A1/ja

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F20/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide or nitrile thereof
    • C08F20/02—Monocarboxylic acids having less than ten carbon atoms, Derivatives thereof
    • C08F20/10—Esters
    • C08F20/20—Esters of polyhydric alcohols or polyhydric phenols, e.g. 2-hydroxyethyl (meth)acrylate or glycerol mono-(meth)acrylate
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0045—Photosensitive materials with organic non-macromolecular light-sensitive compounds not otherwise provided for, e.g. dissolution inhibitors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

　本発明のネガ型感放射線性樹脂組成物は、（Ａ）アルカリ可溶性樹脂、（Ｂ）エチレン性不飽和二重結合を２個以上有し、かつ少なくとも２つのエチレン性不飽和二重結合を連結する２価の有機基が酸の作用により分解する特定の基を少なくとも１個有する化合物、（Ｃ）酸発生剤、および（Ｄ）感放射線性ラジカル重合開始剤を含有することを特徴とする。 　本発明によれば、パターニング部分の樹脂の機械強度が高く、所望の形状が容易に得られ、また、アルカリ性条件下でもメッキできるだけでなく、レジストのパターニング部分を剥離する際にも、一般的な溶剤で容易に剥離できる、ネガ型レジストが提供される。
PCT/JP2008/050010 2007-01-31 2008-01-07 感放射線性樹脂組成物 WO2008093507A1 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008556029A JP5277968B2 (ja) 2007-01-31 2008-01-07 感放射線性樹脂組成物

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2007-021631 2007-01-31
JP2007021631 2007-01-31

Publications (1)

Publication Number Publication Date
WO2008093507A1 true WO2008093507A1 (ja) 2008-08-07

Family

ID=39673821

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/050010 WO2008093507A1 (ja) 2007-01-31 2008-01-07 感放射線性樹脂組成物

Country Status (3)

Country Link
JP (1) JP5277968B2 (ja)
TW (1) TWI442182B (ja)
WO (1) WO2008093507A1 (ja)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20130084518A1 (en) * 2011-10-03 2013-04-04 Fujifilm Corporation Negative chemical amplification resist composition, resist film, and, resist-coated mask blanks, method for forming resist pattern, and photomask, each using the same
JP2014205838A (ja) * 2009-06-08 2014-10-30 三洋化成工業株式会社 感光性組成物の光硬化物の製造方法
JP2018127648A (ja) * 2017-02-06 2018-08-16 Jsr株式会社 メッキ造形物の製造方法、およびメッキ造形物製造用感光性組成物
JP2020079858A (ja) * 2018-11-13 2020-05-28 Jsr株式会社 感光性組成物、レジストパターンの形成方法、およびメッキ造形物の製造方法
WO2022030163A1 (ja) * 2020-08-04 2022-02-10 東京応化工業株式会社 化学増幅型感光性組成物、感光性ドライフィルム、めっき用鋳型付き基板の製造方法、及びめっき造形物の製造方法
US11560463B2 (en) 2017-12-08 2023-01-24 Lg Chem, Ltd. Cross-linking agent compound and polymer prepared using the same
US11578175B2 (en) 2017-12-08 2023-02-14 Lg Chem, Ltd. Preparation method of super absorbent polymer
JP7464986B2 (ja) 2017-11-01 2024-04-10 ナヤム イノベーションズ ピーヴィティー リミテッド 着色光学レンズ用の光応答性形状変化ポリマー組成物

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004123611A (ja) * 2002-10-03 2004-04-22 Yasuhara Chemical Co Ltd （メタ）アクリル酸エステルおよびその（共）重合体
JP2005023205A (ja) * 2003-07-02 2005-01-27 Jsr Corp 感放射線性接着剤組成物およびこれを用いたウェハーの加工方法
JP2005274920A (ja) * 2004-03-24 2005-10-06 Jsr Corp ネガ型感放射線性樹脂組成物
JP2005290146A (ja) * 2004-03-31 2005-10-20 Jsr Corp 被着体の剥離方法
WO2006134925A1 (ja) * 2005-06-15 2006-12-21 Nippon Soda Co., Ltd. アクリル酸系重合体及びその製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004123611A (ja) * 2002-10-03 2004-04-22 Yasuhara Chemical Co Ltd （メタ）アクリル酸エステルおよびその（共）重合体
JP2005023205A (ja) * 2003-07-02 2005-01-27 Jsr Corp 感放射線性接着剤組成物およびこれを用いたウェハーの加工方法
JP2005274920A (ja) * 2004-03-24 2005-10-06 Jsr Corp ネガ型感放射線性樹脂組成物
JP2005290146A (ja) * 2004-03-31 2005-10-20 Jsr Corp 被着体の剥離方法
WO2006134925A1 (ja) * 2005-06-15 2006-12-21 Nippon Soda Co., Ltd. アクリル酸系重合体及びその製造方法

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014205838A (ja) * 2009-06-08 2014-10-30 三洋化成工業株式会社 感光性組成物の光硬化物の製造方法
US20130084518A1 (en) * 2011-10-03 2013-04-04 Fujifilm Corporation Negative chemical amplification resist composition, resist film, and, resist-coated mask blanks, method for forming resist pattern, and photomask, each using the same
JP2013080061A (ja) * 2011-10-03 2013-05-02 Fujifilm Corp ネガ型化学増幅レジスト組成物、並びに、それを用いたレジスト膜、レジスト塗布マスクブランクス、レジストパターン形成方法、及び、フォトマスク
JP2018127648A (ja) * 2017-02-06 2018-08-16 Jsr株式会社 メッキ造形物の製造方法、およびメッキ造形物製造用感光性組成物
JP7464986B2 (ja) 2017-11-01 2024-04-10 ナヤム イノベーションズ ピーヴィティー リミテッド 着色光学レンズ用の光応答性形状変化ポリマー組成物
US11560463B2 (en) 2017-12-08 2023-01-24 Lg Chem, Ltd. Cross-linking agent compound and polymer prepared using the same
US11578175B2 (en) 2017-12-08 2023-02-14 Lg Chem, Ltd. Preparation method of super absorbent polymer
JP2020079858A (ja) * 2018-11-13 2020-05-28 Jsr株式会社 感光性組成物、レジストパターンの形成方法、およびメッキ造形物の製造方法
JP7200614B2 (ja) 2018-11-13 2023-01-10 Jsr株式会社 感光性組成物、レジストパターンの形成方法、およびメッキ造形物の製造方法
WO2022030163A1 (ja) * 2020-08-04 2022-02-10 東京応化工業株式会社 化学増幅型感光性組成物、感光性ドライフィルム、めっき用鋳型付き基板の製造方法、及びめっき造形物の製造方法
JP7444999B2 (ja) 2020-08-04 2024-03-06 東京応化工業株式会社 化学増幅型感光性組成物、感光性ドライフィルム、めっき用鋳型付き基板の製造方法、及びめっき造形物の製造方法

Also Published As

Publication number Publication date
JP5277968B2 (ja) 2013-08-28
TW200844662A (en) 2008-11-16
TWI442182B (zh) 2014-06-21
JPWO2008093507A1 (ja) 2010-05-20

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