WO2008084520A1 - 光学デバイス、パターン生成装置及びパターン生成方法、露光装置及び露光方法、並びにデバイス製造方法 - Google Patents

光学デバイス、パターン生成装置及びパターン生成方法、露光装置及び露光方法、並びにデバイス製造方法 Download PDF

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Publication number
WO2008084520A1
WO2008084520A1 PCT/JP2007/001477 JP2007001477W WO2008084520A1 WO 2008084520 A1 WO2008084520 A1 WO 2008084520A1 JP 2007001477 W JP2007001477 W JP 2007001477W WO 2008084520 A1 WO2008084520 A1 WO 2008084520A1
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WO
WIPO (PCT)
Prior art keywords
status
pattern generating
exposure
mirror element
electrode
Prior art date
Application number
PCT/JP2007/001477
Other languages
English (en)
French (fr)
Inventor
Soichi Owa
Original Assignee
Nikon Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corporation filed Critical Nikon Corporation
Publication of WO2008084520A1 publication Critical patent/WO2008084520A1/ja

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/0841—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting element being moved or deformed by electrostatic means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Optics & Photonics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

　ミラー素子（５２）の反射面（－Ｚ側の面）が、ＸＹ平面に対して角度α傾く状態（オフ状態）では、可動電極（６２Ａ）と固定電極（６４Ａ）とが当接する。そして、ミラー素子（５２）の反射面が、ＸＹ平面に対してほぼ平行（すなわち水平）となる状態（オン状態）では、可動電極（６２Ｂ）と固定電極（６４Ｂ）とが当接する。したがって、ミラー素子（５２）がオン状態とオフ状態との間で切り替わる場合に、ミラー素子の裏面に設けられた電極が、電極と当接し、切り替わった直後におけるミラー素子の振動の発生を効果的に抑制することができる。従って、ミラー素子（５２）のオン状態とオフ状態との間の切り替えを高速で行うことが可能になる。
PCT/JP2007/001477 2006-12-28 2007-12-27 光学デバイス、パターン生成装置及びパターン生成方法、露光装置及び露光方法、並びにデバイス製造方法 WO2008084520A1 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006356556 2006-12-28
JP2006-356556 2006-12-28

Publications (1)

Publication Number Publication Date
WO2008084520A1 true WO2008084520A1 (ja) 2008-07-17

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Application Number Title Priority Date Filing Date
PCT/JP2007/001477 WO2008084520A1 (ja) 2006-12-28 2007-12-27 光学デバイス、パターン生成装置及びパターン生成方法、露光装置及び露光方法、並びにデバイス製造方法

Country Status (1)

Country Link
WO (1) WO2008084520A1 (ja)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110418994A (zh) * 2017-03-14 2019-11-05 浜松光子学株式会社 光模块
US11487104B2 (en) 2017-03-14 2022-11-01 Hamamatsu Photonics K.K. Optical module
US11513339B2 (en) 2017-03-14 2022-11-29 Hamamatsu Photonics K.K. Optical module
US11561388B2 (en) 2017-03-14 2023-01-24 Hamamatsu Photonics K.K. Light module

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214398A (ja) * 1999-01-25 2000-08-04 Nikon Corp 画像出力装置
JP2001033727A (ja) * 1999-07-21 2001-02-09 Victor Co Of Japan Ltd 光偏向器
JP2002287045A (ja) * 2001-03-28 2002-10-03 Seiko Epson Corp 平行平板型マイクロ静電アクチュエータ、マイクロ光路スイッチ、マイクロメカニカルスイッチおよびそれらの駆動方法
JP2005084358A (ja) * 2003-09-09 2005-03-31 Citizen Watch Co Ltd アクチュエータ装置
JP2005266712A (ja) * 2004-03-22 2005-09-29 Hitachi Cable Ltd 光スイッチ
JP2006133394A (ja) * 2004-11-04 2006-05-25 Ricoh Co Ltd 光偏向装置アレイの駆動方法、光偏向装置アレイ、光偏向装置および画像投影表示装置

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000214398A (ja) * 1999-01-25 2000-08-04 Nikon Corp 画像出力装置
JP2001033727A (ja) * 1999-07-21 2001-02-09 Victor Co Of Japan Ltd 光偏向器
JP2002287045A (ja) * 2001-03-28 2002-10-03 Seiko Epson Corp 平行平板型マイクロ静電アクチュエータ、マイクロ光路スイッチ、マイクロメカニカルスイッチおよびそれらの駆動方法
JP2005084358A (ja) * 2003-09-09 2005-03-31 Citizen Watch Co Ltd アクチュエータ装置
JP2005266712A (ja) * 2004-03-22 2005-09-29 Hitachi Cable Ltd 光スイッチ
JP2006133394A (ja) * 2004-11-04 2006-05-25 Ricoh Co Ltd 光偏向装置アレイの駆動方法、光偏向装置アレイ、光偏向装置および画像投影表示装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
DAUDERSTADT U. ET AL.: "Application of Spatial Modulators for Micrilithography", PROCEEDINGS OF SPIE, vol. 5348, 26 January 2004 (2004-01-26) - 27 January 2004 (2004-01-27), pages 119 - 126, XP002400753, DOI: doi:10.1117/12.528798 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110418994A (zh) * 2017-03-14 2019-11-05 浜松光子学株式会社 光模块
CN110418994B (zh) * 2017-03-14 2022-04-19 浜松光子学株式会社 光模块
US11487104B2 (en) 2017-03-14 2022-11-01 Hamamatsu Photonics K.K. Optical module
US11513339B2 (en) 2017-03-14 2022-11-29 Hamamatsu Photonics K.K. Optical module
US11561388B2 (en) 2017-03-14 2023-01-24 Hamamatsu Photonics K.K. Light module

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