WO2008050638A1 - Filtre de couleur pour un dispositif d'affichage à cristaux liquides semi-transmissif et son procédé de fabrication - Google Patents

Filtre de couleur pour un dispositif d'affichage à cristaux liquides semi-transmissif et son procédé de fabrication Download PDF

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Publication number
WO2008050638A1
WO2008050638A1 PCT/JP2007/070176 JP2007070176W WO2008050638A1 WO 2008050638 A1 WO2008050638 A1 WO 2008050638A1 JP 2007070176 W JP2007070176 W JP 2007070176W WO 2008050638 A1 WO2008050638 A1 WO 2008050638A1
Authority
WO
WIPO (PCT)
Prior art keywords
resin layer
colored resin
transparent
colored
liquid crystal
Prior art date
Application number
PCT/JP2007/070176
Other languages
English (en)
Japanese (ja)
Inventor
Kenji Matsumasa
Masahiro Tada
Ichiro Masuda
Original Assignee
Toppan Printing Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toppan Printing Co., Ltd. filed Critical Toppan Printing Co., Ltd.
Priority to JP2008540948A priority Critical patent/JPWO2008050638A1/ja
Publication of WO2008050638A1 publication Critical patent/WO2008050638A1/fr

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Classifications

    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509Filters, e.g. light shielding masks
    • G02F1/133514Colour filters
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/1335Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553Reflecting elements
    • G02F1/133555Transflectors
    • GPHYSICS
    • G02OPTICS
    • G02FOPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333Constructional arrangements; Manufacturing methods
    • G02F1/133371Cells with varying thickness of the liquid crystal layer

Definitions

  • Color filter for transflective liquid crystal display device and manufacturing method thereof
  • the present invention relates to a color filter for a transflective liquid crystal display device and a method for manufacturing the same.
  • a transflective liquid crystal panel capable of displaying a clear image both indoors and outdoors is common.
  • the transflective liquid crystal panel has a transmissive part that displays with backlight and a reflective part that displays using external light. In the reflective part, external light is transmitted twice through the liquid crystal panel. Is thinner and brighter than the color filter in the transmission area! /, And color is required! /.
  • RGB of a transmissive part and a reflective part are produced twice each, and a structure in which a through hole is formed in a reflective part are common.
  • the former has a problem that the manufacturing cost increases, and the latter has a problem that the color of the reflecting portion is deteriorated as compared with the former.
  • the present invention has been made under the circumstances as described above, and does not require a change in resist material, and can reduce variation in the thickness of the colored resin layer in the reflective portion, and is a transflective liquid crystal. It is an object of the present invention to provide a color filter for a display device and a manufacturing method thereof.
  • a color filter for a transflective liquid crystal display device in which colored pixels are formed on a transparent substrate, wherein the colored pixels include a transmissive portion and the transmissive portion.
  • a transflective liquid crystal display device wherein the color resin layer of the reflective part has a thickness of 40% or less of the thickness of the colored resin layer of the transmissive part Utility filter is provided.
  • a color filter for a transflective liquid crystal display device in which colored pixels are formed on a transparent substrate, wherein the colored pixels include a transmissive portion and the transmissive portion.
  • a colored resin layer formed so as to extend from the colored resin layer and run on the transparent resin layer, and the thickness of the colored resin layer of the reflective portion is the thickness of the colored resin layer of the transmissive portion.
  • a method for producing a color filter for a transflective liquid crystal display device wherein a colored pixel comprising a colored resin layer is formed on a transparent substrate, wherein the transparent substrate comprises: A step of applying a colored resin over the entire surface, forming a thick colored resin layer on the transmissive part, and forming a thin colored resin layer on the reflective part, the colored resin layer comprising a transparent part, a semi-light-shielding part, and a light-shielding part.
  • a transmission part made of a colored resin layer on the transparent substrate, a transmission part made of a colored resin layer;
  • a color filter for a transflective liquid crystal display device comprising a colored pixel having a reflective portion made of a colored resin layer having a thickness smaller than that of the colored resin layer of the transmissive portion, which is formed on the transparent resin layer adjacent to the transmissive portion.
  • a step of forming a transparent resin layer in the reflective portion forming region of the transparent substrate a colored resin is applied to the entire surface of the transparent substrate, and a thick colored resin layer is formed in the transparent portion forming region of the transparent substrate.
  • a step of forming a thin colored resin layer on the transparent resin layer a step of exposing the colored resin layer using a photomask pattern having a transparent part, a semi-light-shielding part, and a light-shielding part, and the exposed coloration
  • the resin layer is developed, the colored resin layer portion corresponding to the light shielding portion of the photomask pattern is removed, the film thickness of the colored resin layer portion corresponding to the semi-light shielding portion is reduced, and the transparent portion of the photomask pattern is formed.
  • a color resin layer for a transflective liquid crystal display device comprising: forming a colored resin layer of the transmissive part and a colored resin layer of the reflective part corresponding to the semi-light-shielding part.
  • the colored resin layer of the reflective portion is formed so as to extend from the colored resin layer of the transmissive portion and run on the transparent resin layer, and using a photomask pattern including a semi-light-shielding film Since it is formed by exposure and development, the amount of reduction in the thickness of the colored resin layer in the reflective portion can be reduced, thereby reducing the variation in the thickness of the colored resin layer in the reflective portion.
  • Manufacture of color filters for transflective LCDs that can adjust the thickness of the colored resin layer in the reflective part without changing the resist material even if the size or shape of the transparent resin layer changes. A method is provided.
  • FIG. 1 is a cross-sectional view showing a configuration of a color filter substrate according to a first embodiment of the present invention.
  • FIG. 2A is a sectional view showing a manufacturing process of the color filter substrate according to the first embodiment of the present invention.
  • FIG. 2B is a cross-sectional view showing the manufacturing process of the color filter substrate according to the first embodiment of the present invention.
  • FIG. 2C is a cross-sectional view showing the manufacturing process of the color filter substrate according to the first embodiment of the present invention.
  • FIG. 3 is a cross-sectional view showing a configuration of a transflective liquid crystal display device according to a second embodiment of the present invention.
  • FIG. 4 is a characteristic diagram showing transmittance characteristics of a halftone film of a photomask.
  • FIG. 1 is a cross-sectional view showing one pixel of a color filter for a transflective liquid crystal display device according to an embodiment of the present invention.
  • a transparent resin layer 2 is formed on a transparent substrate 1.
  • a colored resin layer 3 is formed in a region where the transparent resin layer 2 is not formed on the transparent substrate 1 to form a transmission portion A, and the colored portion extends from the colored resin layer 3 and rides on the transparent resin layer 2.
  • the resin layer 4 is formed, and the reflection part B is constituted by the transparent resin layer 2 and the colored resin layer 4.
  • the thickness of the colored resin layer 4 in the reflective portion B is thinner than the thickness of the colored resin layer 3 in the transmissive portion A. Of 40% or less, preferably 5 to 40%.
  • the thickness of the colored resin layer 4 in the reflective part B is thicker than this range, the brightness is low when the reflected light from the reflective part B is displayed on the screen as display light. It becomes difficult to control the film thickness.
  • the thickness of the colored resin layer 3 in the transmission part A is preferably 1.5 to 3.0 m. Therefore, the thickness of the colored resin layer 4 in the reflection part B is 5 to 40 %, Ie, 0.0.7-1.2 m is preferable.
  • the thickness of the transparent resin layer 2 is preferably 2 to 4111. Thickness force of transparent resin layer 2 S If thicker than this range, the colored resin layer 4 in the reflective part B becomes thinner and the above problem is likely to occur. As the film thickness of the colored resin layer 4 of part B increases, the brightness tends to decrease.
  • the colored resin layer pattern composed of the thick colored resin layer 2 and the thin colored resin layer 3 as described above is obtained by using a photomask pattern having a transparent portion and a semi-light-shielding portion corresponding to each. It is formed.
  • the light shielding part of the photomask pattern can be made of metallic chrome, and the semi-light shielding part can be made of ITO.
  • a color filter for a transflective liquid crystal display device according to an embodiment of the present invention shown in FIG. 2A to 2C can be manufactured by the manufacturing process.
  • a black matrix (not shown) is formed on the transparent substrate 1
  • a transparent resin is coated on the entire surface, exposed and developed, and divided into pixels by the black matrix.
  • the transparent resin layer 2 is formed in the reflective part forming region of the region.
  • the entire surface is coated with, for example, a red colored resin, and a colored resin layer is coated.
  • the colored resin layer 5 is exposed using a photomask pattern having a transparent portion, a semi-light-shielding portion, and a light-shielding portion, then developed, and the colored resin layer 5 corresponding to the light-shielding portion of the photomask pattern is exposed. While removing the portion, the thickness of the portion corresponding to the semi-light-shielding portion is reduced. As a result, as shown in FIG. 2C, a transmissive portion A composed of the colored resin layer 3 corresponding to the transparent portion of the photomask pattern and a reflective portion B composed of the colored resin layer 4 corresponding to the semi-light-shielding portion of the photomask pattern. Are formed. In this case, the thickness of the colored resin layer 4 is 5 to 40% of the thickness of the colored resin layer 3.
  • Such a process is repeated for green and blue pixels to obtain a color filter for a transflective liquid crystal display device including red, green, and blue colored pixels.
  • FIG. 3 is a configuration diagram schematically showing an example of a transflective liquid crystal display device according to the second embodiment of the present invention.
  • the color filter substrate 10 and the array substrate 30 having the electrodes 22 formed at predetermined positions on the transparent substrate 21 are bonded to form a cell, liquid crystal 40 is sealed, and polarizing films 50a, By disposing 50b, a transflective liquid crystal display device according to the second embodiment of the present invention is configured.
  • the color filter substrate 10 has red pixels 11R, green pixels 11G, and blue pixels 1 IB formed in regions separated by the black matrix 7 on the transparent substrate 1, and further includes transparent electrodes 12 and over A coating layer 13 is formed.
  • Each colored pixel 11R, 11G, and 11B is composed of a transmissive portion A and a reflective portion B configured as shown in FIG.
  • Cyclohexanone was added to the resin solution so that the nonvolatile content was 20.0% by weight to prepare an acrylic resin solution for a photosensitive colored resin composition.
  • the weight average molecular weight of this acrylic resin was about 30000.
  • Acrylic resin solution 40g dipentaerythritol pentaatarylate 1 ⁇ 0g, 1- [4- (2-hydroxyethoxy) monophenyl] — 2-hydroxy-1-2-methyl 1-propaneone 2.0 ⁇ g, 2 Methyl-1 [4 (Methylthio) phenyl] -2 Morpholinopropane-1 —one 1.0 g, 7.0 g CI Pigment Red 177, 2.0 g pigment dispersant, and 2 methoxyethanolanol 38.0 g
  • Clinole Tree Moonlight Melt Night 40 ⁇ 0g, Dipentaurisurienorepenta Crela ⁇ 1 ⁇ 0g, 1 [4 -(2-Hydroxyethoxy) monophenyl] — 2-Hydroxy-2-Meter-1-one 1-Propanone 1 ⁇ 2 g, 2 Methyl-1 [4 (Methylthio) phenyl] -2 Morpholinopropane 1-one 1. 0 g, CI Pigment Blue 15: 6 6.0 g, Pigment Dispersant 2.0 g, and 2-Methylethanolanol 39. Og
  • a black pigment-dispersed photosensitive resin film was formed on a transparent substrate (320 X 400 X 0.7 mm), and this was processed by a photolinography process to form a black matrix with a thickness of 1/4 m. Thereafter, the photosensitive coloring resin composition containing no pigment dispersant was applied by spin coating and dried at 80 ° C. for 20 minutes. Next, exposure was performed through a predetermined pattern, and development was performed to form a transparent resin layer having a thickness of 3.6 ⁇ on the reflection portion planned region on the transparent substrate partitioned by the black matrix.
  • a photosensitive red resin composition (acrylic resist: manufactured by Toyo Ink Manufacturing Co., Ltd.) was applied by spin coating (time: 10 seconds, Acc: 3 seconds) at a rotation speed of 188 rpm, It was dried under reduced pressure (attainment pressure: ltorr) and pre-betated at 50 ° C for 30 seconds.
  • exposure was performed through a photomask pattern having a transparent portion, a semi-light-shielding portion, and a light-shielding portion and having a half-tone film having transmittance characteristics as shown in FIG. 4 as a semi-light-shielding portion.
  • the exposure was performed by setting the exposure gap to 100 m, inserting a blue plate having a thickness of 0.5 mm into the exposure machine, and cutting the short wavelength emission line.
  • development was performed at a development time of 50 seconds, and red pixels were formed on predetermined areas defined by the black matrix.
  • the part of the photosensitive red resin composition corresponding to the light shielding part of the photomask pattern was removed, and the film thickness of the part corresponding to the semi-light shielding part was reduced.
  • the transparent portion A made of the (red) colored resin layer 3 corresponding to the transparent portion of the photomask pattern and the (red) colored resin layer 4 corresponding to the semi-light-shielding portion of the photomask pattern A red pixel having a reflection part B made of is formed.
  • the reflective portion and the transmissive portion formed by using the photomask pattern including the semi-shielding film and the riding of the transmissive portion on the transparent resin layer from the colored resin layer are provided.
  • the photosensitive colored resin composition is changed, and coating, exposure, and development are repeated, so that the green pixel and the blue image are formed on the transparent substrate partitioned by the black matrix.
  • a color filter for a transflective liquid crystal display device was obtained.
  • the chromaticity of the obtained red pixel is shown in Table 1 below.
  • Experiment No. 9 was performed in which a red pixel having a transmissive portion and a reflective portion was formed using a photomask having a transparent portion, a semi-light-shielding portion, and a light-shielding portion without forming a transparent resin layer. It was.
  • the photosensitive red resin composition an acrylic resist (manufactured by Toyo Ink Manufacturing Co., Ltd.) different from the above was used.
  • Table 2 shows the exposure conditions, the film thicknesses of the transmission part A and the reflection part B, the film thickness ratio, and the chromaticity.
  • the film thickness ratio was 29.0%, but this film thickness ratio was the limit when it was not used to run on the transparent resin layer.
  • the thickness of the reflective portion is reduced by extending the colored resin layer of the transmissive portion so as to run on the transparent resin layer, and exposure is performed using a photomask pattern that does not include a semi-light-shielding film.
  • Experiment Nos. 10 to 13 for forming a red pixel having a transmission part and a reflection part were performed.
  • an acrylic resist made by Toyo Ink Co., Ltd.
  • Table 3 shows the exposure conditions, the film thicknesses of the transmission part A and the reflection part B, the film thickness ratio, and the chromaticity.
  • the colored resin layer of the reflective portion is formed so as to extend from the colored resin layer of the transmissive portion and run on the transparent resin layer. Therefore, the amount of reduction in the thickness of the colored resin layer in the reflective portion can be reduced, and thus the colored resin layer in the reflective portion can be reduced. It has become possible to reduce variations in film thickness. Further, it was possible to adjust the thickness of the colored resin layer in the reflective portion without changing the resist material even if the size and shape of the transparent resin layer were changed.

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  • Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)

Abstract

L'invention concerne un filtre de couleur pour des dispositifs d'affichage à cristaux liquides semi-transmissifs, qui est obtenu en formant un pixel de couleur sur un substrat transparent. Ce filtre de couleur pour des dispositifs d'affichage à cristaux liquides semi-transmissifs est caractérisé par le fait que le pixel de couleur présente une partie transmissive et une partie réfléchissante qui est disposée au voisinage de la partie transmissive, et l'épaisseur de film d'une couche de résine colorée de la partie réfléchissante n'est pas supérieure à 40 % de l'épaisseur du film d'une couche de résine colorée de la partie transmissive.
PCT/JP2007/070176 2006-10-16 2007-10-16 Filtre de couleur pour un dispositif d'affichage à cristaux liquides semi-transmissif et son procédé de fabrication WO2008050638A1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2008540948A JPWO2008050638A1 (ja) 2006-10-16 2007-10-16 半透過型液晶表示装置用カラーフィルタ及びその製造方法

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006281850 2006-10-16
JP2006-281850 2006-10-16

Publications (1)

Publication Number Publication Date
WO2008050638A1 true WO2008050638A1 (fr) 2008-05-02

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TW (1) TW200841049A (fr)
WO (1) WO2008050638A1 (fr)

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JP5077367B2 (ja) * 2010-01-28 2012-11-21 凸版印刷株式会社 半透過型液晶表示装置用カラーフィルタ基板、その製造方法、及び半透過型液晶表示装置

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004045757A (ja) * 2002-07-11 2004-02-12 Seiko Epson Corp カラーフィルタの製造方法、電気光学装置及び電子機器

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004233399A (ja) * 2003-01-28 2004-08-19 Toppan Printing Co Ltd カラーフィルタ及びそれを用いた半透過型液晶表示装置

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004045757A (ja) * 2002-07-11 2004-02-12 Seiko Epson Corp カラーフィルタの製造方法、電気光学装置及び電子機器

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TW200841049A (en) 2008-10-16

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