200841049 九、發明說明： 【發明所屬之技術領域】 本發明涉及半透射型液晶顯示裝置用彩色濾光片及其 製法。 【先前技術】 使用於手機、數位相機等之液晶面板，一般係室內室外 皆能顯示清晰影像之半透射型液晶面板。半透射型液晶面 板具有以背光顯示之透射部及利用外光顯示之反射部，於 • 反射部因外光透射液晶面板2次，該部分之彩色濾光片有 比透射部之彩色濾光片薄而色彩明亮之要求。 半透射型液晶面板用彩色濾光片，一般係透射部及反射 部之RGB各製作2次之6色CF，或於反射部開出通孔之構 造，而前者有製造成本上升之問題，後者則有反射部之色 彩相較於前者劣化之問題。 因之，RGB各以1步驟（計3色）形成，具有與6色CF 同等性能之彩色濾光片的開發受到期待。其所需技術，近 # 年來有使用濃淡光罩（halftone mask)形成反射部之方式（參 考例如日本專利特開 2004-25 8 1 6 1 號公報、特開 2006-20 1 433號公報），或，形成透明膜，於該透明膜上覆 以RGB膜形成薄RGB膜之方式（參考例如日本專利第 3465 695號公報）之硏究。 可是，於透明膜上覆以RGB膜而形成薄RGB膜之方式， 因透明膜之尺寸、形狀而使透明膜上之RGB膜的膜厚降 低，有必須變更光阻材料之問題。 相對於此，使用濃淡光罩形成反射部之方式雖可變更曝 200841049 光條件或顯像條件而使反射部之RGB 射部與反射部RGB膜之膜厚差時，有 之變異而變大之缺點。 【發明內容】 本發明鑑於如上實情，其目的在提 材料’且減少反射部著色樹脂層之膜 晶顯示裝置用彩色濾光片及其製法。 本發明之第1樣態提供，於透明基 ®成之半透射型液晶顯示裝置用彩色濾 著色像素具有透射部及鄰接上述透射 射部之上述著色樹脂層膜厚係上述透 之40%以下。 本發明之第2樣態提供，於透明基 成之半透射型液晶顯示裝置用彩色濾 著色像素具有透射部及鄰接上述透射 射部係由形成於上述透明基板上之著 • 反射部係由形成於上述透明基板上之 爲延伸自上述透射部之著色樹脂層而 層上之著色樹脂層構成，上述反射部 膜厚係上述透射部著色樹脂層膜厚之 本發明之第3樣態提供，於透明基 層構成之著色像素而成之半透射型液 光片之製法，其特徵爲包括，於上述 色樹脂，於透射部形成厚著色樹脂層 色樹脂層之步驟，將上述著色樹脂層 膜變薄，但當加大透 膜厚變異因製程條件 供，可不必變更光阻 厚變異的半透射型液 板上形成著色像素而 光片，其特徵爲上述 部之反射部，上述反 射部著色樹脂層膜厚 板上形成著色像素而 光片，其特徵爲上述 部之反射部，上述透 色樹脂層構成，上述 透明樹脂層，及形成 騎覆於上述透明樹脂 的上述著色樹脂層之 40%以下。 板上形成由著色樹脂 晶顯示裝置用彩色濾 透明基板全面塗敷著 ，於反射部形成薄著 以具有透明部、半遮 200841049 光部及遮光部之光罩圖案曝光之步驟，以及，將上述經曝 光之著色樹脂層顯像，去除對應於上述光罩圖案的遮光部 的著色樹脂層之部分，降低對應於半遮光部的著色樹脂層 之部分的膜厚，對應於光罩圖案之透明部形成在上述反射 部區域之著色樹脂層，及對應於上述透射部區域的著色樹 脂層之步驟。 本發明之第4樣態提供，於透明基板上具備：具有由著 色樹脂層構成之透射部，及由鄰接上述透射部形成於透明 ^樹脂層上，膜厚低於上述透射部著色樹脂層之著色樹脂層 構成的反射部之著色像素的半透射型液晶顯示裝置用彩色 濾光片之製法，其特徵爲具備，於上述透明基板之反射部 形成區域形成透明樹脂層之步驟，於上述透明基板全面塗 敷著色樹脂，於上述透明基板之透射部形成區域形成厚著 色樹脂層，於上述透明樹脂層上形成薄著色樹脂層之步 驟，將上述著色.樹脂層以具有透明部、半遮光部及遮光部 之光罩圖案曝光之步驟，以及，將上述經曝光之著色樹脂 ® 層顯像，去除對應於上述光罩圖案的遮光部的著色樹脂層 之部分，降低對應於半遮光部的著色樹脂層之部分的膜 厚，對應於光罩圖案之透明部形成上述透射部之著色樹脂 層，及對應於上述半遮光部形成上述反射部的著色樹脂層 之步驟。 依本發明可提供，反射部之著色樹脂層係形成爲，延伸 自透射部之著色樹脂層而騎覆於透明樹脂層上，並因藉由 使用含半遮光膜之光罩圖案曝光、顯像而形成，反射部之 著色樹脂層膜厚降低量可予減少，因而反射部之著色樹脂 200841049 層膜厚變異可予減少，且即使透明樹脂層之尺寸或形狀改 變亦可不更換光阻材料而調整反射部著色樹脂層膜厚的半 透射型液晶顯示裝置用彩色濾光片之製法。 【實施方式】 以下說明本發明之實施形態。 第1圖係顯示本發明之一實施形態有關的半透射型液晶 顯示裝置用彩色濾光片之一像素之剖視圖。第1圖中，透 明基板1上形成有透明樹脂層2。透明基板1上未形成有透 ^明樹脂層2之區域形成著色樹脂層3而構成透射部A，著 色樹脂層4係形成爲自此著色樹脂層3延伸而騎覆於透明 樹脂層2上，並由透明樹脂層2及著色樹脂層4構成反射 部B。 第1圖之彩色濾光片中，反射部B之著色樹脂層4的膜 厚低於透射部A之著色樹脂層3的膜厚，係透射部A著色 樹脂層3之膜厚的40%以下，較佳爲5~40%。反射部B之 著色樹脂層4的膜厚高於此範圍時，在以反射部B之反射 ® 光作爲顯示光而顯示畫面的情況下，亮度會變低，在低於 此範圍的情況下，則膜厚難以控制。 透射部A之著色樹脂層3的膜厚以係1.5〜3.0// m爲佳’ 因此，反射部B之著色樹脂層4的膜厚以係其之5〜40% ’ 亦即0.07〜1.2/zm爲佳。 又，透明樹脂層2之厚度宜係2〜4 // m。透明樹脂層2 之厚度高於此範圍時，反射部B之著色樹脂層4之膜厚變 薄，易起上述問題，低於此範圍時，反射部B之著色樹脂 層4變厚，成爲亮度降低的傾向。 200841049 如上之高膜厚著色樹脂層3及低膜厚著色樹脂層4構成 之著色樹脂層圖案，係使用各自對應具有透明部及半遮光 部之光罩圖案形成。又，此光罩圖案之遮光部可由金屬鉻 構成，半遮光部可由ITO構成。 第1圖所示之本發明的一實施形態有關之半透射型液晶 顯示裝置用彩色濾光片可依如第2A〜2C圖之製程製造。 首先，如第2A圖所示般，於透明基板1上形成黑色矩 陣（未圖示）後，全面塗以透明樹脂，進行曝光及顯像，於 ® 以黑色矩陣所區分之像素區域的反射部形成區域形成透明 樹脂層2。 其次，如第2B圖所示般，全面塗以例如紅色著色樹脂， 形成著色樹脂層5。此時，著色樹脂層5之透明樹脂層2 上之部分的膜厚減爲透明基板 1上的部分之膜厚的 3 0 ~ 7 0 % 〇 然後，以具有透明部、半遮光部及遮光部之光罩圖案將 著色樹脂層5曝光，接著顯像，去除對應於光罩圖案之遮 ® 光部之著色樹脂層5的部分，並使對應於半遮光部之部分 的膜厚降低。藉此，如第2C圖所示般，形成具有由對應於 光罩圖案之透明部的著色樹脂層3所構成之透射部A，及 由對應於光罩圖案之半遮光部的著色樹脂層4所構成之反 射部B的像素。此時，著色樹脂層4之膜厚成爲著色樹脂 層3之膜厚的5〜40%。 亦就綠及藍像素重複進行如此步驟，能得含紅、綠及藍 之著色像素之半透射型液晶顯示裝置用彩色濾光片。 第3圖係顯示本發明之第2實施形態有關的半透射型液 200841049 晶顯示裝置之一例的構造示意圖。第3圖中，將彩色濾光 片基板10，及在透明基板21之特定位置形成有電極22之 陣列基板3 0貼合而晶胞化，封入液晶4 0，更於晶胞（c e 11) 的兩面配置偏光膜50a、50b，藉以構成本發明之第2實施 形態有關的半透射型液晶顯示裝置。 又，彩色濾光片基板10係於透明基板1上之由黑色矩 陣7所區分之區域形成紅色像素1 1 R、綠色像素1 1 G及藍 色像素11B，並形成透明電極12及頂塗層（overcoatlayer)13 胃而成。各著色像素11R、11G及11B係由構造如第1圖所示 之透射部A及反射部B構成。 以下顯示本發明之實施例及習知例，具體說明本發明之 效果。 <丙烯酸樹脂溶液之製作> 於反應容器放入環己酮800.0份，一邊注入氮氣於容器 一邊加熱，滴入下述單體及熱聚合引發劑之混合物，進行 聚合反應。 苯乙烯 60.0份 甲基丙烯酸 60.0份 甲基丙烯酸甲酯 65.0份 甲基丙烯酸丁酯 65.0份 熱聚合引發劑 10.0份 滴完後充分加熱，添加溶解熱聚合引發劑2.0份於環己 酮5 0.0份之溶液，並繼續反應得丙烯酸樹脂溶液。 添加環己酮至此樹脂溶液的不揮發成分成爲20.0重量 %，調製感光性著色樹脂組成物用之丙烯酸樹脂溶液。此丙 -10 - 200841049 烯酸樹脂的重量平均分子量係約30000。 使用如上製作之丙烯酸樹脂溶液，製作以下組成之3色 感光性著色樹脂組成物，各自於室溫下攪拌3小時。 .(感光性紅色樹脂組成物） 丙烯酸樹脂溶液40g、二新戊四醇五丙烯酸酯i〇.〇g、 1- [4-(2 -經基乙氧基）苯基]-2 -經基-2-甲基-1-丙院-酮2.0g、 2- 甲基- l[4-(甲基硫）苯基]-2-嗎福啉基丙烷-1-酮l.〇g、C. I. Pigment Red 177 7.0g、顏料分散劑2.0g及2-甲氧乙醇38.0g (感光性綠色樹脂組成物） 丙烯酸樹脂溶液40.0g、二新戊四醇五丙烯酸酯1〇. 〇g、 1·[4-(2-經基乙氧基）本基]-2-經基-2-甲-1-丙院·酬2.0g、2_ 甲基-1[4-(甲基硫）苯基]-2-嗎福啉基丙烷-1-酮l.Og、C. I. Pigment Green3 6 8.0g、顏料分散劑2.0g及2-甲氧基乙醇 37.0g (感光性藍色樹脂組成物） 丙烯酸樹脂溶液40.0g、二新戊四醇五丙烯酸酯10.0§、 卜[4-(2-羥基乙氧基）苯基]羥-2-甲基-卜丙烷-酮2.〇g、2_ 甲基-1[4-(甲基硫）苯基]嗎福啉基丙烷-1-酮l.〇g、C. I.[Technical Field] The present invention relates to a color filter for a transflective liquid crystal display device and a method of manufacturing the same. [Prior Art] A liquid crystal panel used for mobile phones, digital cameras, etc., is generally a semi-transmissive liquid crystal panel that can display clear images indoors and outdoors. The transflective liquid crystal panel has a transmissive portion that is displayed in a backlight and a reflective portion that is displayed by external light, and the liquid crystal panel is transmitted twice by the external light in the reflective portion, and the color filter of the portion has a color filter than the transmissive portion. Thin and bright colors. A color filter for a semi-transmissive liquid crystal panel is generally a structure in which two RGB colors of the transmissive portion and the reflecting portion are formed twice, or a through hole is formed in the reflecting portion, and the former has a problem of an increase in manufacturing cost, and the latter There is a problem that the color of the reflecting portion is degraded compared to the former. Therefore, RGB is formed in one step (three colors), and development of a color filter having the same performance as that of six colors of CF is expected. A technique for forming a reflection portion using a halftone mask has been used in recent years (refer to, for example, Japanese Patent Laid-Open Publication No. 2004-25 8 1 1 1 and JP-A-2006-20 1 433). Alternatively, a transparent film is formed, and a transparent RGB film is coated with a RGB film to form a thin RGB film (refer to, for example, Japanese Patent No. 3465695). However, in the case where a transparent film is covered with an RGB film to form a thin RGB film, the film thickness of the RGB film on the transparent film is lowered by the size and shape of the transparent film, and it is necessary to change the photoresist material. On the other hand, when the reflection portion is formed by using the condensed mask, the exposure of the RGB portion of the reflection portion to the RGB film of the reflection portion can be changed by changing the light condition or the development condition of 200841049, and the variation is made larger. Disadvantages. SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a color filter for a film crystal display device which is improved in a material of a reflective portion and a method for producing the same. According to a first aspect of the present invention, a color filter colored pixel for a transparent-based semi-transmissive liquid crystal display device has a transmissive portion and a thickness of the colored resin layer adjacent to the transmissive portion of 40% or less. According to a second aspect of the present invention, a color filter colored pixel for a transflective liquid crystal display device having a transparent base has a transmissive portion, and a reflective portion formed adjacent to the transparent portion is formed on the transparent substrate. The transparent substrate is formed of a colored resin layer extending from the colored resin layer of the transmissive portion, and the thickness of the reflecting portion is the third aspect of the present invention in which the thickness of the transmissive portion is colored, and is transparent. A method for producing a semi-transmissive liquid crystal sheet comprising a colored pixel formed by a base layer, comprising the step of forming a thick colored resin layer color resin layer in the transmissive portion in the color resin, and thinning the colored resin layer film. However, when the variation of the thickness of the membrane is increased by the process conditions, it is possible to form a colored pixel without changing the thickness of the semi-transmissive liquid plate, and the light sheet is characterized by the reflection portion of the portion, and the colored resin layer film of the reflection portion. Forming a colored pixel and a light sheet on the thick plate, characterized by a reflecting portion of the portion, the transparent resin layer, the transparent resin layer, and forming a ride 40% of the colored resin layer below the transparent resin. Forming a plate on the plate by a colored resin crystal display device, using a color filter transparent substrate, and forming a thin portion on the reflective portion to expose the mask pattern having a transparent portion, a semi-shielding 200841049 light portion, and a light shielding portion, and The exposed colored resin layer is developed to remove a portion of the colored resin layer corresponding to the light shielding portion of the mask pattern, and the film thickness of the portion corresponding to the colored resin layer of the semi-shielding portion is lowered, corresponding to the transparent portion of the mask pattern. a step of forming a colored resin layer in the reflection portion region and a colored resin layer corresponding to the transmission portion region. According to a fourth aspect of the present invention, a transparent substrate includes: a transmissive portion having a colored resin layer; and a transparent resin layer formed adjacent to the transmissive portion, wherein a film thickness is lower than a coloring resin layer of the transmissive portion The method for producing a color filter for a semi-transmissive liquid crystal display device of a coloring pixel of a reflective portion formed of a colored resin layer, comprising the step of forming a transparent resin layer on a reflecting portion forming region of the transparent substrate, and the transparent substrate a method of uniformly coating a colored resin, forming a thick colored resin layer in a transmissive portion forming region of the transparent substrate, and forming a thin colored resin layer on the transparent resin layer, and having the transparent resin layer and the semi-shield portion a step of exposing the mask pattern of the light shielding portion, and developing the exposed colored resin layer to remove a portion of the colored resin layer corresponding to the light shielding portion of the mask pattern, thereby reducing the coloring resin corresponding to the semi-shielding portion a film thickness of a portion of the layer corresponding to the transparent portion of the mask pattern to form the colored resin layer of the transmissive portion, and corresponding to The semi-shielding portion forms a step of forming a colored resin layer of the reflecting portion. According to the present invention, the colored resin layer of the reflecting portion is formed to extend over the transparent resin layer from the colored resin layer of the transmissive portion, and is exposed and imaged by using a mask pattern including a semi-shielding film. On the other hand, the film thickness reduction of the colored resin layer of the reflecting portion can be reduced, so that the film thickness variation of the coloring resin 200841049 of the reflecting portion can be reduced, and even if the size or shape of the transparent resin layer is changed, the photoresist can be adjusted without changing the photoresist material. A method of producing a color filter for a semi-transmissive liquid crystal display device having a thickness of a reflective resin layer. [Embodiment] Hereinafter, embodiments of the present invention will be described. Fig. 1 is a cross-sectional view showing a pixel of a color filter for a transflective liquid crystal display device according to an embodiment of the present invention. In Fig. 1, a transparent resin layer 2 is formed on a transparent substrate 1. The colored resin layer 3 is formed in a region where the transparent resin layer 2 is not formed on the transparent substrate 1 to form the transmissive portion A, and the colored resin layer 4 is formed so as to extend from the colored resin layer 3 and ride over the transparent resin layer 2, The reflecting portion B is composed of the transparent resin layer 2 and the colored resin layer 4. In the color filter of Fig. 1, the thickness of the colored resin layer 4 of the reflecting portion B is lower than the thickness of the colored resin layer 3 of the transmissive portion A, and is 40% or less of the film thickness of the transmissive portion A colored resin layer 3. Preferably, it is 5 to 40%. When the film thickness of the colored resin layer 4 of the reflecting portion B is higher than this range, when the screen is displayed by using the reflected light of the reflecting portion B as the display light, the brightness is lowered, and if it is lower than the range, The film thickness is difficult to control. The film thickness of the colored resin layer 3 of the transmissive portion A is preferably 1.5 to 3.0 / / m. Therefore, the film thickness of the colored resin layer 4 of the reflecting portion B is 5 to 40% of which is 0.07 to 1.2 / Zm is better. Further, the thickness of the transparent resin layer 2 is preferably 2 to 4 // m. When the thickness of the transparent resin layer 2 is larger than the above range, the thickness of the colored resin layer 4 of the reflecting portion B becomes thin, which is liable to cause the above problem. When the thickness is less than this range, the colored resin layer 4 of the reflecting portion B becomes thick and becomes brightness. The tendency to decrease. 200841049 The colored resin layer pattern composed of the high film thickness colored resin layer 3 and the low film thickness colored resin layer 4 described above is formed using a mask pattern each having a transparent portion and a semi-shield portion. Further, the light shielding portion of the mask pattern may be made of metallic chromium, and the semi-shielding portion may be made of ITO. The color filter for a transflective liquid crystal display device according to an embodiment of the present invention shown in Fig. 1 can be manufactured by the process of Figs. 2A to 2C. First, as shown in FIG. 2A, a black matrix (not shown) is formed on the transparent substrate 1, and then a transparent resin is applied to the entire surface, and exposure and development are performed, and the reflection portion of the pixel region is distinguished by a black matrix. The formation region forms the transparent resin layer 2. Next, as shown in Fig. 2B, for example, a red colored resin is applied in total to form a colored resin layer 5. At this time, the film thickness of the portion on the transparent resin layer 2 of the colored resin layer 5 is reduced to 30 to 70% of the film thickness of the portion on the transparent substrate 1, and then has a transparent portion, a semi-shielding portion, and a light shielding portion. The mask pattern exposes the colored resin layer 5, and then develops, removes the portion of the colored resin layer 5 corresponding to the mask portion of the mask pattern, and reduces the film thickness corresponding to the portion of the semi-shielding portion. Thereby, as shown in FIG. 2C, the transmissive portion A having the colored resin layer 3 corresponding to the transparent portion of the mask pattern and the colored resin layer 4 corresponding to the semi-shielding portion corresponding to the mask pattern are formed. The pixels of the reflecting portion B formed. At this time, the film thickness of the colored resin layer 4 is 5 to 40% of the film thickness of the colored resin layer 3. This step is also repeated for the green and blue pixels, and a color filter for a transflective liquid crystal display device including red, green, and blue colored pixels can be obtained. Fig. 3 is a view showing the configuration of an example of a semi-transmissive liquid 200841049 crystal display device according to a second embodiment of the present invention. In the third embodiment, the color filter substrate 10 and the array substrate 30 in which the electrodes 22 are formed at specific positions on the transparent substrate 21 are bonded to each other to form a liquid crystal, and the liquid crystal 40 is sealed to the unit cell (ce 11). The semi-transmissive liquid crystal display device according to the second embodiment of the present invention is configured by arranging the polarizing films 50a and 50b on both sides. Further, the color filter substrate 10 is formed on the transparent substrate 1 by a region defined by the black matrix 7 to form a red pixel 1 1 R, a green pixel 1 1 G, and a blue pixel 11B, and forms a transparent electrode 12 and a top coat layer. (overcoatlayer) 13 stomach. Each of the colored pixels 11R, 11G, and 11B is composed of a transmissive portion A and a reflecting portion B having the structure shown in Fig. 1. The embodiments of the present invention and the conventional examples are shown below to specifically explain the effects of the present invention. <Preparation of Acrylic Resin Solution> 800.0 parts of cyclohexanone was placed in a reaction container, and nitrogen gas was injected into the container while heating, and a mixture of the following monomer and a thermal polymerization initiator was added dropwise to carry out a polymerization reaction. Styrene 60.0 parts methacrylic acid 60.0 parts methyl methacrylate 65.0 parts butyl methacrylate 65.0 parts Thermal polymerization initiator 10.0 parts After the completion of the dropwise addition, the mixture was heated sufficiently, and 2.0 parts of the dissolved thermal polymerization initiator was added to cyclohexanone 5 0.0 parts. The solution is continued and the reaction is continued to obtain an acrylic resin solution. The cyclohexanone was added to the resin solution in an amount of 20.0% by weight to prepare an acrylic resin solution for the photosensitive colored resin composition. The C-10 - 200841049 olefinic acid resin has a weight average molecular weight of about 30,000. Using the acrylic resin solution prepared above, a three-color photosensitive colored resin composition having the following composition was prepared, and each was stirred at room temperature for 3 hours. (Photosensitive Red Resin Composition) 40 g of acrylic resin solution, dipentaerythritol pentaacrylate i〇.〇g, 1-[4-(2-propionyloxy)phenyl]-2-yl group -2-methyl-1-propanol-ketone 2.0g, 2-methyl-l[4-(methylthio)phenyl]-2-morpholinepropan-1-one l.〇g, CI Pigment Red 177 7.0g, pigment dispersant 2.0g and 2-methoxyethanol 38.0g (photosensitive green resin composition) 40.0g of acrylic resin solution, dipentaerythritol pentaacrylate 1〇. 〇g, 1·[ 4-(2-P-ethoxyethyl)benzyl]-2-carboxy-2-methyl-1-propanoid·2.0 g, 2-methyl-1[4-(methylthio)phenyl]- 2-morpholinepropan-1-one l.Og, CI Pigment Green3 6 8.0 g, pigment dispersant 2.0 g, and 2-methoxyethanol 37.0 g (photosensitive blue resin composition) Acrylic resin solution 40.0 g Dipentaerythritol pentaacrylate 10.0§, [4-(2-hydroxyethoxy)phenyl]hydroxy-2-methyl-propane-one 2.〇g, 2_methyl-1[4 -(methylthio)phenyl]morpholinepropan-1-one l.〇g, CI
Pigment Blue 15 : 6 6.0g、顏料分散劑2.(^及2-甲氧乙醇 39.0g 實施例 於透明基板（3 20x400x0.7mm)上形成黑色顏料分散感光 性樹脂膜，將之以光刻法加工，形成厚度1.4 /z m之黑色矩 陣。然後’以旋塗法塗敷上述感光性著色樹脂組成物之不 含顏料分散劑者，於80。(：乾燥2〇分鐘。其次，隔著特定圖 200841049 案進行曝光、顯像，於黑色矩陣所區分之透明基板上的反 射部預定區域形成厚度3.6//m之透明樹脂層。 其次，以188i:pm之轉速的旋塗法塗敷（時間：10秒，Acc: 3秒）感光性紅色樹脂組成物（丙烯酸系光阻：東洋印墨製造 (股）製），減壓乾燥（抵達壓力：ltorr)，於50°C預烘烤30 秒。 然後，隔著具有透明部、半遮光部及遮光部，以具有如 第4圖所示之透射率特性的濃淡膜作爲半遮光部之光罩圖 ® 案進行曝光。曝光係以曝光間隙100//111，於曝光機插入 0.5mm厚度之藍板以遮斷短波長明線而施行。其次，以顯 像時間50秒顯像，於黑色矩陣所區分之特定區域上形成紅 色像素。 亦即，去除對應於光罩圖案之遮光部之感光性紅色樹脂 組成物的部分，降低對應於半遮光部之部分的膜厚。藉此， 如第1圖所示般，形成具有由對應於光罩圖案之透明部的 (紅色）著色樹脂層3構成之透射部A，及由對應於光罩圖案 ® 之半遮光部的（紅色）著色樹脂層4構成的反射部B之紅色 像素。 如上述般地進行，形成具備自透過部之著色樹脂層朝透 明樹脂層之騎覆、使用含半遮光膜之光罩圖案而形成的反 射部及透射部之紅色像素後，變更感光性著色樹脂組成 物，重複進行塗敷、曝光、顯像，於黑色矩陣所區分之透 明基板上形成綠色及藍色像素，得半透射型液晶顯不裝置 用彩色濾光片。 本發明人等在以上實施例中改變曝光量、照度、膜厚比 -12 - 200841049 而進行紅色像素之形成，進行了實驗No. 1〜8。得到之紅色 像素的色度列於下述之表1。 -13- 200841049Pigment Blue 15 : 6 6.0 g, pigment dispersant 2. (^ and 2-methoxyethanol 39.0 g Example) A black pigment-dispersed photosensitive resin film was formed on a transparent substrate (3 20 x 400 x 0.7 mm) by photolithography After processing, a black matrix having a thickness of 1.4 /zm is formed. Then, the pigment-free dispersing agent of the above-mentioned photosensitive colored resin composition is applied by spin coating at 80. (: drying for 2 minutes. Second, by a specific figure In 200841049, exposure and development were carried out, and a transparent resin layer having a thickness of 3.6/m was formed in a predetermined region of the reflecting portion on the transparent substrate distinguished by the black matrix. Next, it was applied by spin coating at a rotational speed of 188 μ: pm (time: 10 seconds, Acc: 3 seconds) Photosensitive red resin composition (acrylic photoresist: manufactured by Toyo Ink Co., Ltd.), dried under reduced pressure (arrival pressure: ltorr), and prebaked at 50 ° C for 30 seconds. Then, with a transparent portion, a semi-shielding portion, and a light-shielding portion, the light-shielding film having the transmittance characteristic as shown in Fig. 4 is exposed as a mask pattern of the semi-shielding portion. The exposure is performed by the exposure gap 100/. /111, insert a 0.5mm thick blue plate on the exposure machine to Secondly, the short-wavelength bright line is blocked and the second time, the development time is 50 seconds, and a red pixel is formed on a specific area distinguished by the black matrix. That is, the photosensitive red resin corresponding to the light-shielding portion of the mask pattern is removed. The portion of the composition lowers the film thickness corresponding to the portion of the semi-shielding portion. Thereby, as shown in Fig. 1, the transmission having the (red) colored resin layer 3 corresponding to the transparent portion of the mask pattern is formed. The red portion of the reflection portion B composed of the (red) colored resin layer 4 corresponding to the semi-shielding portion of the mask pattern® is formed as described above, and the colored resin layer having the self-transmissive portion is formed toward the transparent resin. After riding the layer, using the reflecting portion formed by the mask pattern of the semi-shielding film and the red pixel of the transmissive portion, the photosensitive colored resin composition is changed, and coating, exposure, and development are repeated, and the black matrix is distinguished. The green and blue pixels are formed on the transparent substrate, and the color filter for the semi-transmissive liquid crystal display device is obtained. The inventors of the present invention changed the exposure amount, the illuminance, and the film thickness ratio -12 in the above embodiments. - 200841049 The formation of red pixels was carried out, and Experiment Nos. 1 to 8 were carried out. The chromaticity of the obtained red pixels is shown in Table 1 below. -13- 200841049
200841049 由上述袠1知，膜厚比超過4 0 %之實驗Ν ο · 8，Y値低’ 無法得到所欲色度。 其次’不形成透明樹脂層，使用具有透明部、半遮光部 及遮光部之光罩，進行形成具有透射部及反射部的紅色像 素之實驗No. 9。作爲感光性紅色樹脂組成物係使用與上述 不同之丙烯酸系光阻（東洋印墨製造（股）製）。 曝光條件、透射部A及反射部B之膜厚、膜厚比、色度 列於下述之表2。 200841049 膜厚比 \ 29.0% ! 3!, 1^0 >> 0.326 反射音[ x 0.498 lmi4. s IMr m ON 1 i 透射部 0.329 ϊ>< 1 0.662 跡 2.08 m 陛 mW CTn \ ' i 曝光量 mJ/cm2 wo CO 實驗 4 200841049 由上述表2知，此實驗No. 9之膜厚比係29.0% ’ 使用朝透明樹脂層之騎覆的情況下，此程度之膜厚tt 限。 又，藉由僅將反射部形成爲自透射部之著色樹脂擇 而騎覆於透明樹脂層上以降低膜厚，藉由使用不含与 膜之光罩圖案進行曝光、顯像，進行形成具有透射g 射部之紅色像素之實驗No. 10〜13。作爲感光性紅色赛 成物係用與上述不同之丙烯酸系光阻（東洋印墨製； •製)。 曝光條件、透射部A及反射部B之膜厚、膜厚比 列於下述之表3。 在未 爲極 延伸 遮光 及反 脂組 .(股） 色度200841049 It is known from the above ,1 that the experiment with a film thickness ratio exceeding 40% ο·8, Y値 low is unable to obtain the desired chromaticity. Next, Experiment No. 9 in which a red pixel having a transmissive portion and a reflecting portion was formed was used without forming a transparent resin layer and using a photomask having a transparent portion, a semi-shielding portion, and a light-shielding portion. As the photosensitive red resin composition, an acrylic photoresist (manufactured by Toyo Ink Co., Ltd.) different from the above was used. The film thickness, film thickness ratio, and chromaticity of the exposure conditions, the transmissive portion A, and the reflecting portion B are shown in Table 2 below. 200841049 Film thickness ratio \ 29.0% ! 3!, 1^0 >> 0.326 Reflected sound [ x 0.498 lmi4. s IMr m ON 1 i Transmissive part 0.329 ϊ>< 1 0.662 Trace 2.08 m 陛mW CTn \ ' i Exposure amount mJ/cm2 wo CO Experiment 4 200841049 It is known from the above Table 2 that the film thickness ratio of this experiment No. 9 is 29.0%. In the case of riding with a transparent resin layer, the film thickness tt is limited to this extent. Further, by forming the reflective portion only as a coloring resin of the self-transmissive portion, it is mounted on the transparent resin layer to reduce the film thickness, and is formed by exposure and development using a mask pattern not containing the film. Experiment No. 10 to 13 for transmitting red pixels of the g-emitting portion. As the photosensitive red race system, an acrylic photoresist (made by Toyo Ink; manufactured) different from the above was used. The film thickness and film thickness ratio of the exposure conditions, the transmissive portion A, and the reflection portion B are shown in Table 3 below. In the case of non-extremely extending shading and anti-fat groups.
-17- 200841049-17- 200841049
* 200841049 由上述之表3知，僅藉由朝透明樹脂層上之騎覆而降低 反射部之膜厚時，Y値低，無法獲得所欲色度。且膜厚比 3 5 %左右已係極限。 若依以上之半透射型液晶顯示裝置用彩色濾光片之製 程，則因反射部之著色樹脂層係形成爲延伸自透射部之著 色樹脂層而騎覆於透明樹脂層上，並使用含半遮光膜之光 罩圖案曝光、顯像而形成，故反射部之著色樹脂層的膜厚 降低量可予減少，藉此，反射部著色樹脂層膜厚變異即可 φ 減少。又，即使透明樹脂層之尺寸或形狀有變化，亦不會 更換光阻材料而可調整反射部著色樹脂層之膜厚。 【圖式簡單說明】 第1圖顯示本發明之第1實施形態有關的彩色濾光片基 板之構造的剖視圖。 第2A圖顯示本發明之第1實施形態有關的彩色濾光片 基板之製程的剖視圖。 第2 B圖顯示本發明之第1實施形態有關的彩色濾光片 φ 基板之製程的剖視圖。 第2C圖顯示本發明之第1實施形態有關的彩色濾光片 基板之製程的剖視圖。 第3圖顯示本發明之第2實施形態有關的半透射型液晶 顯示裝置之構造的剖視圖。 第4圖顯示光罩之濃淡膜之透射率特性的特性圖。 【主要元件符號說明】 A 透射部 B 反射部 •19- 200841049 1、21 透明基板 2 透明樹脂層 3、4、5 著色樹脂層 7 黑色矩陣 10 彩色濾光片基板 1 IB 藍色像素 1 1G 綠色像素 11R 紅色像素 12 透明電極 13 頂塗層 22 電極 3 0 陣列基板 40 液晶 50a 、 50b 偏光膜 -20-* 200841049 It is known from Table 3 above that when the film thickness of the reflecting portion is lowered by riding on the transparent resin layer, Y 値 is low and the desired chromaticity cannot be obtained. And the film thickness ratio is about 35%, which is the limit. According to the color filter of the above-described semi-transmissive liquid crystal display device, the colored resin layer of the reflecting portion is formed to extend over the transparent resin layer from the colored resin layer extending from the transmissive portion, and is used in half. Since the mask pattern of the light-shielding film is formed by exposure and development, the amount of film thickness reduction of the colored resin layer in the reflecting portion can be reduced, whereby the film thickness of the colored portion of the reflecting portion can be reduced by φ. Further, even if the size or shape of the transparent resin layer is changed, the thickness of the colored resin layer of the reflecting portion can be adjusted without replacing the photoresist. BRIEF DESCRIPTION OF THE DRAWINGS Fig. 1 is a cross-sectional view showing the structure of a color filter substrate according to a first embodiment of the present invention. Fig. 2A is a cross-sectional view showing the process of the color filter substrate according to the first embodiment of the present invention. Fig. 2B is a cross-sectional view showing the process of the color filter φ substrate according to the first embodiment of the present invention. Fig. 2C is a cross-sectional view showing the process of the color filter substrate according to the first embodiment of the present invention. Fig. 3 is a cross-sectional view showing the structure of a transflective liquid crystal display device according to a second embodiment of the present invention. Fig. 4 is a graph showing the characteristics of the transmittance characteristics of the thick film of the photomask. [Main component symbol description] A Transmissive portion B Reflecting portion • 19- 200841049 1, 21 Transparent substrate 2 Transparent resin layer 3, 4, 5 Colored resin layer 7 Black matrix 10 Color filter substrate 1 IB Blue pixel 1 1G Green Pixel 11R Red Pixel 12 Transparent Electrode 13 Top Coating 22 Electrode 3 0 Array Substrate 40 Liquid Crystal 50a, 50b Polarizing Film -20-