WO2008025508A8 - Process for preparing a polymeric relief structure - Google Patents

Process for preparing a polymeric relief structure Download PDF

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Publication number
WO2008025508A8
WO2008025508A8 PCT/EP2007/007498 EP2007007498W WO2008025508A8 WO 2008025508 A8 WO2008025508 A8 WO 2008025508A8 EP 2007007498 W EP2007007498 W EP 2007007498W WO 2008025508 A8 WO2008025508 A8 WO 2008025508A8
Authority
WO
WIPO (PCT)
Prior art keywords
coating composition
coated substrate
radiation
relief structure
amount
Prior art date
Application number
PCT/EP2007/007498
Other languages
French (fr)
Other versions
WO2008025508A1 (en
Inventor
Ko Hermans
Cornelis Wilhelmus Bastiaansen
Dirk Broer
Jolke Perelaer
Original Assignee
Stichting Dutch Polymer Inst
Ko Hermans
Cornelis Wilhelmus Bastiaansen
Dirk Broer
Jolke Perelaer
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Stichting Dutch Polymer Inst, Ko Hermans, Cornelis Wilhelmus Bastiaansen, Dirk Broer, Jolke Perelaer filed Critical Stichting Dutch Polymer Inst
Priority to EP07801921A priority Critical patent/EP2059855A1/en
Priority to JP2009525964A priority patent/JP2010501687A/en
Priority to CN2007800324901A priority patent/CN101535900B/en
Priority to US12/438,209 priority patent/US20100028816A1/en
Publication of WO2008025508A1 publication Critical patent/WO2008025508A1/en
Publication of WO2008025508A8 publication Critical patent/WO2008025508A8/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/36—Imagewise removal not covered by groups G03F7/30 - G03F7/34, e.g. using gas streams, using plasma
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Materials For Photolithography (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Abstract

The invention relates to a process for the preparation of a polymeric relief structure comprising the steps of coating a substrate with a coating composition comprising one or more radiation-sensitive ingredients, locally treating the coated substrate with electromagnetic radiation having a periodic or random radiation-intensity pattern, forming a latent image, and polymerizing and/or crosslinking the resulting coated substrate, wherein the coating composition comprises one or more radical scavengers in an amount sufficient to inhibit/retard substantial polymerization in the non-treated areas of the coated substrate, and low enough to allow polymerization and/or crosslinking in the treated areas in step c, with the proviso that the amount of oxygen present in the coating composition is not equal to the equilibrium amount of oxygen present when the coating composition is in contact with air.
PCT/EP2007/007498 2006-08-30 2007-08-28 Process for preparing a polymeric relief structure WO2008025508A1 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
EP07801921A EP2059855A1 (en) 2006-08-30 2007-08-28 Process for preparing a polymeric relief structure
JP2009525964A JP2010501687A (en) 2006-08-30 2007-08-28 Method for preparing polymer relief structure
CN2007800324901A CN101535900B (en) 2006-08-30 2007-08-28 Process for preparing a polymeric relief structure
US12/438,209 US20100028816A1 (en) 2006-08-30 2007-08-28 Process for preparing a polymeric relief structure

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP06018087 2006-08-30
EP06018087.4 2006-08-30

Publications (2)

Publication Number Publication Date
WO2008025508A1 WO2008025508A1 (en) 2008-03-06
WO2008025508A8 true WO2008025508A8 (en) 2009-05-22

Family

ID=37728209

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2007/007498 WO2008025508A1 (en) 2006-08-30 2007-08-28 Process for preparing a polymeric relief structure

Country Status (6)

Country Link
US (1) US20100028816A1 (en)
EP (1) EP2059855A1 (en)
JP (1) JP2010501687A (en)
KR (1) KR20090079193A (en)
CN (1) CN101535900B (en)
WO (1) WO2008025508A1 (en)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2109005A1 (en) * 2008-04-07 2009-10-14 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure
EP2192447A1 (en) 2008-11-27 2010-06-02 Akzo Nobel Coatings International B.V. Method of applying a pattern to a substrate
EP2592477A1 (en) * 2011-11-14 2013-05-15 Stichting Dutch Polymer Institute Continuous process for preparation of a substrate with a relief structure
CN102977251B (en) * 2012-12-17 2015-01-21 利达科技（福建）有限公司 Internal plasticization artware molding emulsion as well as preparation method and use thereof
CN103631088B (en) * 2013-11-06 2016-03-30 无锡英普林纳米科技有限公司 A kind of thermoplasticity impression glue and Synthesis and application method thereof
WO2016052026A1 (en) * 2014-09-30 2016-04-07 富士フイルム株式会社 Method for manufacturing article having recessed and projected structure, and article having recessed and projected structure
JP6424150B2 (en) * 2014-09-30 2018-11-14 富士フイルム株式会社 Method for manufacturing article having concavo-convex structure and article having concavo-convex structure
CN104533251A (en) * 2014-10-31 2015-04-22 周东平 Polyurethane embossment fireproof door and production process thereof

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3663222A (en) * 1968-06-06 1972-05-16 Asahi Chemical Ind Process for preparing steric block with liquid photopolymerizable composition
US4518677A (en) * 1978-01-04 1985-05-21 Hercules Incorporated Process for making printing plates
US4269933A (en) * 1978-06-08 1981-05-26 E. I. Du Pont De Nemours And Company Methods of developing photopolymerizable compositions containing an 0-nitroaromatic compound as photoinhibitor
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
US4478931A (en) * 1982-09-27 1984-10-23 E. I. Du Pont De Nemours And Company Precurled flexographic printing plate
US4539286A (en) * 1983-06-06 1985-09-03 Dynachem Corporation Flexible, fast processing, photopolymerizable composition
US4634657A (en) * 1984-08-23 1987-01-06 E. I. Du Pont De Nemours And Company Photoimaging compositions containing substituted 1,2-dibromoethanes
JPH02289856A (en) * 1989-01-18 1990-11-29 Fuji Photo Film Co Ltd Photosensitive and thermosensitive composition and recording material and image forming method using the same
CA2016919C (en) * 1989-05-18 2003-07-29 Masaru Nanpei Photosensitive resin compositions
WO1991018329A1 (en) * 1990-05-21 1991-11-28 Asahi Kasei Kogyo Kabushiki Kaisha Photo-set resin letterpress
US5403698A (en) * 1990-10-16 1995-04-04 Hitachi Chemical Company, Ltd. Negative type photosensitive electrodepositing resin composition
JP3912705B2 (en) * 1998-03-05 2007-05-09 東京応化工業株式会社 Negative photosensitive resin composition and photosensitive resin plate using the same
EP1136254B1 (en) * 2000-03-23 2003-05-28 BASF Drucksysteme GmbH Use of graft copolymers for the manufacture of relief laser-markable elements
TW562997B (en) * 2000-09-27 2003-11-21 Hitachi Chemical Co Ltd Photoresist mask pattern, and preparing method and use thereof
JP4049701B2 (en) * 2003-04-23 2008-02-20 三菱レイヨン株式会社 Method for producing dope
US20060187383A1 (en) * 2003-07-17 2006-08-24 Broer Dirk J Method of manufacturing a reflector and liquid crystal display device including such a reflector
JP2006130777A (en) * 2004-11-05 2006-05-25 Fuji Photo Film Co Ltd Original lithographic printing plate and lithographic printing method using this original plate
WO2006085741A1 (en) * 2005-02-09 2006-08-17 Stichting Dutch Polymer Institute Process for preparing a polymeric relief structure

Also Published As

Publication number Publication date
EP2059855A1 (en) 2009-05-20
KR20090079193A (en) 2009-07-21
US20100028816A1 (en) 2010-02-04
WO2008025508A1 (en) 2008-03-06
CN101535900A (en) 2009-09-16
CN101535900B (en) 2013-09-04
JP2010501687A (en) 2010-01-21

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