WO2008001722A1 - Active energy ray-curable composition for optical purposes, and high refractive index resin - Google Patents

Active energy ray-curable composition for optical purposes, and high refractive index resin Download PDF

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Publication number
WO2008001722A1
WO2008001722A1 PCT/JP2007/062698 JP2007062698W WO2008001722A1 WO 2008001722 A1 WO2008001722 A1 WO 2008001722A1 JP 2007062698 W JP2007062698 W JP 2007062698W WO 2008001722 A1 WO2008001722 A1 WO 2008001722A1
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Prior art keywords
compound
active energy
energy ray
epoxy
refractive index
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PCT/JP2007/062698
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French (fr)
Japanese (ja)
Inventor
Toru Kurihashi
Hideaki Kametani
Kazuyoshi Yamamoto
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Nippon Kayaku Kabushiki Kaisha
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Priority to JP2008522565A priority Critical patent/JP5641554B2/en
Publication of WO2008001722A1 publication Critical patent/WO2008001722A1/en

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    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F283/00Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G
    • C08F283/10Macromolecular compounds obtained by polymerising monomers on to polymers provided for in subclass C08G on to polymers containing more than one epoxy radical per molecule
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1433Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds
    • C08G59/1438Polycondensates modified by chemical after-treatment with organic low-molecular-weight compounds containing oxygen
    • C08G59/1455Monocarboxylic acids, anhydrides, halides, or low-molecular-weight esters thereof
    • C08G59/1461Unsaturated monoacids
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1494Polycondensates modified by chemical after-treatment followed by a further chemical treatment thereof

Definitions

  • the present invention includes an active energy ray-curable optical composition containing a compound derived from an epoxy resin having a specific structure and exhibiting high refractive index, and the composition is irradiated with active energy rays.
  • the present invention relates to a high refractive index resin obtained as described above, an optical multilayer material having a layer of the high refractive index resin, and an optical material containing the high refractive index resin.
  • an epoxy talile monolith compound obtained by addition reaction of acrylic acid or the like with epoxy resin and a polybasic acid anhydride obtained by addition reaction of a polybasic acid anhydride with this epoxy acrylate polymer compound.
  • Carboxylic acid compounds have been widely used because the cured product has excellent adhesion to the substrate, high thermal stability, and dimensional stability.
  • resist materials for use in electrical and electronic parts can be used as compounds imparted with developability with an aqueous alkali solution by acid modification.
  • Patent Document 1 an epoxy atrelate compound derived from an epoxy resin having a biphenol structure is known to provide a tough cured product having high thermal stability (Patent Document 1 and Patent Document) 2).
  • Patent Document 2 an epoxy atrelate compound derived from an epoxy resin having a biphenol structure is known to provide a tough cured product having high thermal stability.
  • Patent Document 1 and Patent Document 2 describe optics based on high refractive index. It ’s not listed.
  • Patent Document 1 JP-A-9 211860
  • Patent Document 2 Japanese Patent Laid-Open No. 11-140144
  • An object of the present invention is to provide an optical composition that provides a cured product having excellent heat resistance, moisture resistance, and toughness and exhibiting a high refractive index.
  • the present inventors include an epoxy carboxylate compound or a polycarboxylic acid compound derived from an epoxy resin having a specific skeleton.
  • the present inventors have found that the composition gives a cured product having an excellent balance of the above-mentioned properties, and have reached the present invention.
  • the present invention provides an epoxy resin obtained by reacting an epoxy resin (a) represented by the following general formula (1) with a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule.
  • High refractive index comprising a carboxylate compound (A) and a reactive compound (C) that exhibits curing reactivity by active energy rays other than the epoxy carboxylate compound (A)
  • the present invention relates to an active energy ray-curable optical composition that is used in the production of rate oil.
  • the present invention provides a polycarboxylic acid compound (B) obtained by reacting a polybasic acid anhydride (c) with a hydroxyl group of the epoxy carboxylate compound (A), and Active energy used for the production of a high refractive index resin characterized by containing a reactive compound (C) that exhibits curing reactivity with an active energy ray other than the polycarboxylic acid compound (B).
  • the present invention relates to a linear curable optical composition.
  • the present invention relates to the above active energy ray-curable optical composition having the m force ⁇ of the general formula (1).
  • the reactive energy (C) force radical reaction type (meth) acrylates, cation reaction type epoxy compounds and other Buly compounds force
  • the above active energy ray which is a selected compound
  • the present invention relates to a curable optical composition.
  • the present invention relates to the above active energy ray-curable optical composition containing the light stabilizer (D).
  • the present invention relates to a high refractive index resin that is a cured product obtained by irradiating the above optical composition with active energy rays.
  • the present invention relates to an optical multilayer material having at least one layer of the above high refractive index resin.
  • the present invention relates to an optical material containing the above-described high refractive index resin.
  • the cured product obtained by irradiating the active energy ray-curable optical composition containing the active compound (C) by irradiating the active energy ray with a high refractive index is not only excellent in the balance of heat resistance and moisture resistance. Have.
  • the cured product is a material excellent in mechanical properties such as toughness, and particularly as a film-forming material excellent in adhesion to a substrate and scratch resistance, and also in a water-soluble alkali solution with a polycarboxylic acid. Therefore, it is also suitable as a material used for so-called optical resists. That is, for example, it is suitable for optical applications such as hard coats for display devices such as lenses, optical disks, and liquid crystal displays, films, and photoconductive materials such as optical waveguides.
  • the active energy ray-curable optical composition of the present invention is a composition used for the production of a high refractive index resin, wherein the general formula (1) (wherein R1 is a halogen atom or a carbon number) Represents an alkyl group of 1 to 4, which may be the same or different, m represents an integer of 0 to 4, n represents an average value of 1 to 6 and an epoxy resin (a ) And an epoxy carboxylate compound (A) obtained by reacting a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule, or the epoxy carboxylate compound (A) A polycarboxylic acid compound (B) obtained by reacting a polybasic acid anhydride (c) with a hydroxyl group, and a reactive compound (C) showing curing reactivity by active energy rays including.
  • the general formula (1) (wherein R1 is a halogen atom or a carbon number) Represents an alkyl group of 1 to
  • Rl should be appropriately selected depending on the intended use, and includes, for example, a methyl group, an ethyl group, an n propyl group, an i propyl group, an n butyl group, i linear or branched saturated hydrocarbon group having 1 to 4 carbon atoms such as butyl group and sbutyl group; halogen atom such as chlorine atom, bromine atom and iodine atom.
  • m is preferably an integer of 0 to 2! /. Of these, m is 0, that is, it has no substituents! /, And the compound is most preferred from the viewpoint of obtaining materials.
  • R1 is a halogen atom such as a chlorine atom, bromine atom or iodine atom, a higher refractive index can be obtained.
  • the bonding position of the biphenyl methyl group and the glycidyl ether group is not particularly limited. However, in view of the production method, it is preferred that the biphenylmethyl group is bonded to the ortho or para position with respect to the glycidyl ether group!
  • the epoxycarboxylate compound (A) used in the active energy ray-curable optical composition of the present invention is a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the epoxy resin (a). To obtain (epoxycarboxylate step).
  • the polycarboxylic oxide compound (B) used in the active energy ray-curable optical composition of the present invention has a polybasic acid anhydride (c) on the hydroxyl group of the epoxy carboxylate compound (A). (Acid addition step).
  • the epoxy carboxylate solution process is intended to introduce an ethylenically unsaturated group, which is a reactive group of active energy rays, into the skeleton of epoxy resin by reacting an epoxy group with a carboxyl group. It is.
  • Examples of the compound (b) having both the ethylenically unsaturated group and the carboxyl group include:
  • (Meth) acrylic acids, crotonic acid, a-cyan cinnamic acid, cinnamic acid, or ethylenically unsaturated examples thereof include compounds obtained by reacting a compound having both a sum group and a hydroxyl group with a saturated or unsaturated dibasic acid.
  • the compound obtained by reacting a compound having both an ethylenically unsaturated group and a hydroxyl group with a saturated or unsaturated dibasic acid is, for example, a (meth) atally having one hydroxyl group in one molecule.
  • Examples include half esters obtained by reacting a rate derivative with a saturated or unsaturated dibasic acid anhydride in an equimolar amount.
  • hydroxyethyl (meth) acrylate, alkyl (meth) acrylate and maleic anhydride Succinic anhydride, phthalic anhydride, phthalic anhydride partly or fully hydrogenated compound, trimellitic anhydride, pyromellitic anhydride and the like are reacted with a saturated or unsaturated dibasic acid. .
  • the compound (b) is preferably a monocarboxylic acid. Even when monocarboxylic acid and polycarboxylic acid are used in combination, it is preferable that the mole ratio of monocarboxylic acid to molar ratio of polycarboxylic acid is 15 or more.
  • (meth) acrylic acid or cinnamic acid from the viewpoint of sensitivity to a line of active energy when an active energy ray-curable optical composition is used.
  • the charging ratio of the epoxy resin (a) and the compound (b) having both an ethylenically unsaturated group and a carboxyl group in this reaction should be appropriately changed depending on the application. That is, when all the epoxy groups are carboxylated, no unreacted epoxy groups remain, so that the storage stability as the epoxy carboxylate compound (A) is high. In this case, only the reactivity due to the introduced double bond is used for the curing reaction.
  • the charge ratio of the epoxy resin (a) and the compound (b) having both an ethylenically unsaturated group and a carboxyl group is as follows.
  • the compound (b) is preferably 0.9 to 1.2 equivalents per 1 equivalent of the epoxy group of the fat (a). If it falls below this range, epoxy groups remain, causing gelation in the acid addition step, and deterioration of the storage stability of the resin. Conversely, if the amount of compound (b) charged is greater than this range, excess compound (b) remains. It is not preferable.
  • the epoxy carboxylate solution process is performed without solvent or diluted with a solvent.
  • the solvent is not particularly limited as long as the reaction is not affected.
  • Examples of the solvent include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene, aliphatic hydrocarbon solvents such as hexane, octane, and decane, or mixtures thereof.
  • aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene
  • aliphatic hydrocarbon solvents such as hexane, octane, and decane, or mixtures thereof.
  • alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate
  • cyclic esters such as ⁇ -butyrolatatone
  • ethylene glycol monomethylenoate monoacetate diethyleneglycolonemonomonomethyl Noreeate Monoacetate, Diethylene Glycol Nole Monoetinoreate Nore Monoacetate, Triethylene Glycol Monoethinorete Tenole Monoacetate, Diethylene Glycol Monobutyl Ether Monoacetate, Propylene Glycol Monomethyl Ether Monoacetate, Butylene Glycol Monomethyl Ether Mono or polyalkylene glycol monoa such as monoacetate
  • alkyl ether esters such as alkyl ether monoacetates, dialkyl glutarate, dialkyl succinate, and dialkyl adipate.
  • alkyl ethers such as jetyl ether and ethylbutyl ether, ethylene glycol dimethyl ether, ethylene glycol jetyl ether, dipropylene glycol dimethyl ether, dipropylene glycol jet nole ethere, triethylene glycol dimethyl ether , Dalicol ethers such as triethylene glycol ethyl ether, and cyclic ethers such as tetrahydrofuran.
  • Examples of the ketone solvent include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.
  • the reactive compound (C) and the like described later can also be used as a solvent, and these can be used alone or in combination.
  • the product is preferable because it can be used as it is as the active energy single-line curable optical composition of the present invention.
  • a catalyst in the epoxy carboxylate step it is preferable to use a catalyst in the epoxy carboxylate step to accelerate the reaction.
  • the amount of the catalyst used is preferably about 0.1 to 10% by weight based on the total amount of the reactants.
  • the catalyst include tertiary amines such as triethylamine, benzyldimethylamine, salt triethylamine, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, and the like. Quaternary ammonium salts, organometallic salts such as chromium octanoate and zirconium octoate, and basic catalysts such as triphenylphosphine and triphenylstibine.
  • the reaction temperature is 60 to 150 ° C, and the reaction time is preferably 5 to 60 hours.
  • thermal polymerization inhibitor it is preferable to use a polymerization inhibitor such as hydroquinone monomethyl ether, 2-methyl hydroquinone, hydroquinone, diphenylpicrylhydrazine, diphenylamine, 3,5-dibutyl 4-hydroxytoluene, and the like. ,.
  • the acid value of the sample (measured according to ⁇ IS K5601-2-1: 1999) is appropriately sampled, and is lmg'KOHZg or less, preferably 0.5 mg'KOHZg or less
  • the end point is the point where
  • the purpose of the acid addition step is to introduce a carboxyl group through an ester bond by reacting the polybasic acid anhydride (c) with the hydroxyl group generated by the epoxy carboxylate solution step.
  • the polybasic acid anhydride (c) is not particularly limited as long as it is a compound having an acid anhydride structure in the molecule.
  • a polybasic acid anhydride (c) is a raw material excellent in developability in alkali aqueous solution, heat resistance, hydrolysis resistance, and the like.
  • Succinic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, itaconic anhydride, 3-methyl-tetrahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, Trimellitic anhydride or maleic anhydride is preferred.
  • a polybasic acid anhydride is added to the reaction solution of the epoxy carboxylate solution step.
  • the polyrubonic acid compound (B) used in the active energy ray-curable optical composition of the present invention is used as an alkali-developing resist, the finally obtained polycrystal is obtained.
  • a large amount of carboxylic acid compound (B) with a solid content acid value (measured according to JIS K5601-2-1: 1999) of 40 to: LOOmg 'KOHZg, more preferably 60 to 90 mg' KOH / g It is preferable to charge the basic acid anhydride (c).
  • the solid content acid value is smaller than this range, the developability of the aqueous solution of the active energy ray-curable optical composition in alkaline aqueous solution is remarkably lowered, and in the worst case, development is impossible.
  • a catalyst to accelerate the reaction.
  • the amount of the catalyst used is preferably about 0.1 to about LO weight% with respect to the total amount of the reactants.
  • the catalyst include tertiary amines such as triethylamine and benzyldimethylamine, quaternary ammonia such as triethylammonium chloride, benzyltrimethylammonium bromide, and benzyltrimethylammonium iodide.
  • the reaction temperature is 60 to 150 ° C, and the reaction time is preferably 5 to 60 hours.
  • the reaction is carried out without solvent or diluted with a solvent.
  • the solvent is not particularly limited as long as the reaction is not affected.
  • the acid addition step there is no influence on the acid addition step, and if it is a solvent, it may be used in the acid addition step without removing the solvent. ,.
  • Examples of the solvent include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene, aliphatic hydrocarbon solvents such as hexane, octane, and decane, or mixtures thereof.
  • aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene
  • aliphatic hydrocarbon solvents such as hexane, octane, and decane, or mixtures thereof.
  • alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate
  • cyclic esters such as ⁇ -butyrolatatone, ethylene glycol monomethylenothenomonoacetate, diethyleneglycolonemonomonomethyl Noreeate Monoacetate, Diethylene Glycol Nole Monoetinoreate Nore Monoacetate, Triethylene Glycol Monoethinorete Tenole Monoacetate, Diethylene Glycol Monobutyl Ether Monoacetate, Propylene Glycol Monomethyl Ether Monoacetate, Butylene Glycol Monomethyl Ether Mono- or polyalkylene glycol monoalkyl ether monoacetates such as monoacetate, dialkyl glutarate, dialkyl succinate, diadipate Examples thereof include polycarboxylic acid alkyl esters such as rualkyl.
  • alkyl ethers such as jetyl ether and ethylbutyl ether, ethylene glycol dimethyl ether, ethylene glycol jetyl ether, dipropylene glycol dimethyl ether, dipropylene glycol jet alcohol, triethylene glycol dimethyl ether , Dalicol ethers such as triethylene glycol ethyl ether, and cyclic ethers such as tetrahydrofuran.
  • ketone solvent examples include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.
  • the reactive compound (C) and the like described later can also be used as a solvent, and these can be used alone or in combination.
  • the product is the active energy of the present invention. It is preferable because it can be used as it is as a gear curable optical composition.
  • thermal polymerization inhibitor the same one as in the epoxy carboxylate soot process can be used.
  • the end point is determined when the acid value of the reaction product is within a range of ⁇ 10% of the acid value set according to the intended use while appropriately sampling.
  • the reactive compound (C) used in the active energy ray-curable optical composition of the present invention is an active energy ray-curable optical composition containing an epoxy carboxylate compound (A).
  • an epoxy carboxylate compound (A) In the case of the compound other than the epoxycarboxylate compound (A), and in the case of the active energy ray-curable optical composition containing the polystrengthenic acid compound (B), other than the polycarboxylic acid compound (B).
  • This compound is a compound that exhibits curing reactivity with an active energy ray, and can impart physical properties before or after curing according to the purpose of use.
  • the reactive compound (C) a radical reaction type, that is, a (meth) atalylate, a cation reaction type, which generates an active radical upon irradiation with active energy rays and causes a curing reaction by the radical
  • a radical reaction type that is, a (meth) atalylate
  • a cation reaction type which generates an active radical upon irradiation with active energy rays and causes a curing reaction by the radical
  • reactive oligomers such as epoxy compounds and other vinyl compounds which generate cations (acids) upon irradiation with active energy rays and cause a curing reaction by the cations.
  • radical reaction type (meth) acrylates examples include monofunctional (meth) acrylates, polyfunctional (meth) acrylates, epoxy (meth) acrylates, polyester (meth) acrylates. And urethane (meth) acrylates and the like.
  • Monofunctional (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, lauryl (meth) acrylate, polyethylene glycol (meth) acrylate. , Polyethylene glycol (meth) acrylate monomethyl ether, phenyl (meth) acrylate, isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, tetrahydrofurfuryl ( (Meta) Atarirate.
  • Examples of the polyfunctional (meth) acrylates include butanediol di (meth) acrylate, hexane diol di (meth) acrylate, neopentyl glycol di (meth) acrylate, nonane All di (meth) acrylate, glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, tris (meth) ateroyloxychetyl isocyanurate, polypropylene glycol di (meta) ) Atalylate, adipic acid epoxy di (meth) acrylate, bisphenol ethylene oxide di (meth) acrylate, hydrogenated bisphenol ethylene oxide (meth) acrylate, bisphenol di (meth) acrylate, hydroxybiba Di (meth) atalylate of dipentaerythritol and dipentaerythritol and ⁇ -force prolatatone
  • the cation-reactive epoxy compounds are not particularly limited as long as they are generally compounds having an epoxy group.
  • examples of the above bull compounds include bull ethers, styrenes, and other bees.
  • examples of the bull ethers include ethyl vinyl ether, propyl vinylenoatenole, hydroxyethylenolevininoatenole, and ethylene glyconoresininoate ether.
  • examples of styrenes include styrene, methyl styrene, and ethyl styrene.
  • examples of other vinyl compounds include triallyl isocyanurate.
  • the reactive compound (C) is preferably a radical reaction type (meth) acrylate.
  • the reactive compound (C) is preferably a radical reaction type (meth) acrylate.
  • meth radical reaction type
  • cation-reactive epoxy compounds if a carboxyl group remains in the system, it reacts with the epoxy group, so it is necessary to use a two-component mixed type that is mixed at the time of use.
  • the epoxycarboxylate compound (A) and Z or the polycarboxylic acid compound (B) are contained in the composition in an amount of 90 to 5% by weight, Preferably 80 to: LO wt%, preferably 3 to 90 wt%, preferably 13 to 80 wt% of reactive compound (C). You may include other ingredients as needed!
  • the active energy ray-curable optical composition of the present invention is cured by irradiation with active energy rays.
  • the active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X-rays, gamma rays and laser rays, and particle rays such as alpha rays, beta rays and electron rays. These can be appropriately selected depending on the use of the active energy ray-curable optical composition of the present invention, and among these, ultraviolet rays, laser beams, visible rays or electron beams are preferred.
  • the active energy ray-curable optical composition of the present invention is cured by active energy rays.
  • the light source used at that time include xenon lamps, carbon arc lamps, germicidal lamps, ultraviolet fluorescent lamps, A pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, an electrodeless lamp, a metal halide lamp, or an electron beam by a scanning type or curtain type electron beam accelerator can be used.
  • the active energy ray-curable optical composition of the present invention is cured by ultraviolet irradiation, the amount of ultraviolet irradiation necessary for curing is 300 to It's about 3000miZcm 2 !
  • the present invention also includes a high refractive index resin which is a cured product obtained by the irradiation.
  • a light stabilizer for the purpose of imparting light resistance to the active energy ray-curable optical composition of the present invention.
  • the light stabilizer is a general term for compounds added to prevent discoloration and brittleness when exposed to light for a long period of time. Since the active energy ray-curable optical composition of the present invention has an aromatic ring in its skeleton, the light resistance as an optical material can be further improved by adding a light stabilizer.
  • the light stabilizer (D) includes compounds used as ultraviolet absorbers, antioxidants and the like.
  • Examples of the light stabilizer (D) include bis (1, 2, 2, 6, 6 pentamethyl-4-piperidyl) [[3,5 bis (1,1-dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate.
  • Examples thereof include hindered amine light stabilizers such as “Tinuvin 144” manufactured by Ciba Specialty Chemicals.
  • the light stabilizer (D) for example, 2- (2 hydroxy-5-t-butylphenol) -2H-benzotriazole (for example, “Tinuvin PS” manufactured by Ciba Specialty Chemicals, etc.)
  • HPT hydroxyphenol triazine
  • Examples of the light stabilizer (D) include tetrakis (2,4di-t-butylphenyl) [1,1-biphenyl] -4,4,1 diylbisphosphonite (for example, Ciba Specialty) Phosphite acids such as “IRGAFOS XP40” manufactured by Chemicals) and bis (2,4di-t-butylphenol) pentaerythritol diphosphite (eg “IRGAFOS XP60” manufactured by Ciba Specialty Chemicals) Anti-wrinkle agent, or pentaerythritol tetrakis [3— (3,5-di-t-butyl-4-hydroxyphenol) propionate (eg “IRGANOX 1010” manufactured by Ciba Specialty Chemicals), thiojetylene Bis [3— (3,5 di-tert-butyl-4-hydroxyphenol) propionate] (for example, riRGANOX 1035 manufactured by Ciba
  • a light stabilizer When a light stabilizer is used, one or more of the above may be used.
  • the use ratio in the active energy ray-curable optical composition of the present invention is preferably 0.1 to 5% by weight in the composition, and more preferably. 0.5 to 3% by weight. When the amount is less than this, the effect as a sufficient stabilizer is not exhibited, and when the amount is too much, the curing reaction by active energy rays may be inhibited.
  • other components may be added up to 70% by weight of the composition.
  • Other components include photopolymerization initiators, coloring materials, other additives, and the like.
  • Examples of the photopolymerization initiator include benzoins such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutyl ether; acetophenone, 2,2-diethoxy-2-phenyl.
  • Ruacetophenone 2, 2-diethoxy-1, 2-phen-acetophenone, 1, 1-dichloroacetophenone, 2-hydro Acetofenones such as xyl-2-methyl-phenylpropane 1-one, diethoxyacetophenone, 1-hydroxycyclohexyl phenol ketone, 2-methyl-1- [4 (methylthio) phenol] 2 -morpholinopropan 1-one;
  • Anthraquinones such as 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-chloroanthraquinone, 2-amylanthraquinone, and the like; 2,4 thixanthones such as jetylthioxanthone, 2-isopropylthixanthone, and 2-chlorothiaxanthone Ketals such as acetophenone dimethyl ketal and benzil dimethyl ketal; benzophenones such as benzophenone, 4-benzoy
  • photopolymerization initiators include “NK” manufactured by Nippon Photosensitizer, which is a baud rate initiator.
  • photoacid generators for example, 9 phenolacridine, 2, 2, 1bis (o black mouth) 1, 4, 4, 5, 5, 1 tetraphenol -Lu 1, 2 Biimidazole (such as “Biimidazole” manufactured by Kurokin Kasei), 2, 2-azobis (2-aminopropane) dihydric chloride (such as “V50” manufactured by Wako Pure Chemical Industries), 2, 2 Azobis [2- (Imidazoline-1 2-yl) propan] dihydrochloride (such as “VA044” manufactured by Wako Pure Chemical Industries), [Eter 5—2-4 (cyclopentadecyl) (1, 2, 3, 4, 5, 6, And cation initiators such as “Irgacure 261” manufactured by Ciba Geigy).
  • Biimidazole such as “Biimidazole” manufactured by Kurokin Kasei
  • 2-azobis (2-aminopropane) dihydric chloride such as “V50” manufactured by Wako Pure Chemical Industries
  • radical type and cationic groups may be used in combination with azo type initiators such as azobisisobutyoritol-tolyl and peroxide sensitive radical type initiators such as benzoyl peroxide which are sensitive to heat. Both initiators of the mold may be used together.
  • the content of the initiator is about 0.1 to 10% by weight.
  • coloring material examples include organic pigments such as phthalocyanine, azo, and quinacridone, inorganic pigments such as titanium oxide, carbon black, bengara, zinc oxide, barium sulfate, and talc, and known general coloring. And extender pigments can be used.
  • organic pigments such as phthalocyanine, azo, and quinacridone
  • inorganic pigments such as titanium oxide, carbon black, bengara, zinc oxide, barium sulfate, and talc
  • extender pigments can be used.
  • thermosetting catalysts such as melamine, talc, barium sulfate, calcium carbonate, magnesium carbonate, barium titanate, hydroxyaluminum hydroxide, acidic aluminum, silica Polymerization prohibition of fillers such as clay, thixotropic agents such as “Aerosil”, phthalocyanine blue, phthalocyanine green, titanium oxide, silicone, fluorine leveling agents and antifoaming agents, hydroquinone, hydroquinone monomethyl ether, etc. An agent or the like can be used.
  • the active energy ray-curable optical composition of the present invention includes other non-reactive resins (so-called inert polymers), such as epoxy resin other than those described above.
  • resins such as epoxy resin other than those described above.
  • a solvent such as an epoxycarboxylate salting step and an acid addition step are used in the composition up to 40% by weight, preferably 20% by weight.
  • Solvents exemplified as being usable can also be added.
  • the present invention also includes an optical material containing a high refractive index resin obtained by irradiating the above-mentioned optical composition with active energy rays and used for the purpose of optically refracting light. It is.
  • Optical materials include, for example, lens materials such as convex lenses, concave lenses, microlenses, Fresnel lenses, and lenticular lenses; light guide materials used in liquid crystal display devices; sheets and films processed into plates, Discs, etc .; so-called nanoimprint materials that perform micro-molding by pressing a micro-molded “mold” into an uncured composition; furthermore, sealing materials for protecting elements, especially light-emitting diodes, photoelectric conversion Examples thereof include sealing materials such as elements.
  • Coating materials such as hard coats, top coats, overprint varnishes, clear coats; adhesive materials for laminating, optical discs and other various adhesives, adhesives; solder resists, etching resists, resists for micromachines, etc. It is also suitably used for film formation that requires a high refractive index such as a resist material.
  • the film-forming material is temporarily applied to a peelable substrate to form a film, it can be used as a so-called dry film in which a film is formed by being bonded to the originally intended substrate. .
  • lens material such as a convex lens, a concave lens, a micro lens, a Fresnel lens, and a lenticular lens
  • a coating material such as a hard coat, top coat, overprint varnish, and clear coat is particularly preferable.
  • an active energy ray-curable optical composition containing the polycarboxylic acid compound (B) the adhesion to the base material is enhanced by the carboxyl group in view of the above use. It can also be used as an application for coating a plastic substrate or a metal substrate.
  • the composition can also be used as an alkali-developable optical resist material composition that requires a high refractive index by taking advantage of its solubility in an alkali solution. That is, an active energy ray-sensitive type in which a film layer of the composition is formed on a substrate, irradiated with active energy rays such as ultraviolet rays, and unirradiated portions are dissolved and removed with an alkaline solution or the like to draw. It is used as an optical composition.
  • the method of forming the film is not particularly limited, and intaglio printing method such as gravure, relief printing method such as flexo, stencil printing method such as silk screen, lithographic printing method such as offset, etc.
  • intaglio printing method such as gravure
  • relief printing method such as flexo
  • stencil printing method such as silk screen
  • lithographic printing method such as offset, etc.
  • Various coating methods such as “Ta ' ⁇ ”, Knife co ⁇ ⁇ "' ⁇ ”, Daiko 1 ⁇ Ta ' ⁇ "Power” ⁇ "Tenko. ⁇ "Ta' ⁇ ", Spinco 1 ⁇ Ta ' ⁇ ”, etc. Can be arbitrarily adopted.
  • a high refractive index resin means a value of 1.55 or more when the refractive index of a cured product obtained by irradiating active energy rays is measured according to JIS K7142: 1996. It is greaves.
  • the present invention also includes an optical multilayer material having a high refractive index resin layer obtained by forming a film on the substrate and curing the above active energy ray-curable optical composition.
  • Epoxy equivalent Measured by the method described in JIS—K7236: 2001.
  • Hardness Measured by the method described in JIS K5600-5-4: 1999.
  • 1.5 g of triphenylphosphine as a catalyst
  • lOOg of propylene glycol monomethyl ether monoacetate as a solvent. Reacted for hours.
  • NER-1202 epoxy value 292g / eq
  • AA mucoacrylic acid
  • Example 1 Example 1 1, Example 1 2, Example 1 3: Active energy ray-curable optical composition Preparation and evaluation
  • an ultraviolet vertical exposure apparatus manufactured by Oak Seisakusho
  • the hardness of the coating film of this multilayer material was measured according to JIS K5600-5: 4: 1999, shown in Table 3 as pencil hardness, and an impact test was conducted according to IS06272-1: 2002. It was shown in 3.
  • Example 1-1 Synthesis example 1-1 1. 6 0 2 H Slight scratch Example 1-2 Synthesis example 1-2 1.6 1 H 1 Scratch slightly Example 1-3 Synthesis example 2-2 1.5 9 H No scratch Ratio shelf 1-1 Specific age example 1 1 1 1 3 5 3 F No scratch From the above results, the present invention compared to the composition / cured product prepared from the epoxy resin of the comparative example A composition derived from a specific epoxy resin. * The cured product is tough, high in hardness and also has a high refractive index. [0112]
  • Example 2 Active energy ray-curable optical resist
  • Example 1-1 To the composition obtained in Example 1-1, 5 g of the same composition as a light stabilizer (D) was added 2, 4 bis [2 hydroxy-4-butoxy file] — 6- (2, 4 dibutoxy file). ) 1, 3, 5 Triazine (Ciba Specialty Chemicals, trade name: Tinuvin 460) 40 mg, bis (1, 2, 2, 6, 6 pentamethyl-4 piperidyl) [[3,5 bis (1, 1 —Dimethylruetyl) -4-hydroxyphenol] methyl] butylmalonate (product name: Tinuvin 144; hindered amine light stabilizer), 40 mg and bis (2,4-diethylbutylbutyl) pentaerythritoldi Add 20 mg of phosphite (Ciba Special Chemicals, trade name: IRGAFOS XP60; acid-fouling inhibitor), and apply onto a quartz glass plate with a hand applicator so that the film thickness when dried is 20 ⁇ m.
  • a light resistance test was performed by irradiating light for 1000 hours with a Fedometer. Measurement of light transmission at 45 Onm, and transmission after light resistance test as an indicator of light resistance The ratio of transmittance before implementation of rate Z was determined and shown in Table 4.
  • Example 3-2 No 0.5 5 From the above results, it was shown that the light stability can be improved by adding the light stabilizer (D).
  • the active energy ray-curable optical composition derived from the epoxy resin having the specific structure of the present invention provides a cured product having a relatively strong and high refractive index.
  • it can be used as an optical resist that can be alkali-developed by acid modification.
  • it can be used as a molding material or a film forming material, and can be suitably used for optical parts such as lenses, paints, films, and the like.

Abstract

[PROBLEMS] To provide an active energy ray-curable composition for optical purposes which comprises a compound derived from an epoxy resin having a specific structure. [MEANS FOR SOLVING PROBLEMS] Disclosed is an active energy ray-curable composition for optical purposes, which comprises: an epoxy carboxylate compound (A) produced by reacting an epoxy resin (a) represented by the general formula (1) with a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule, or a polycarboxylic acid compound (B) produced by reacting a hydroxyl group in the epoxy carboxylate compound (A) with a polybasic acid anhydride (c); and a reactive compound (C) which shows a curing reactivity upon being irradiated with an active energy ray. The composition can be used for the production of a high refractive index resin. (1) wherein R1's independently represent a halogen atom or an alkyl group having 1 to 4 carbon atoms; m represents an integer of 0 to 4; and n represents a positive integer of 1 to 6 on average.

Description

明 細 書  Specification
活性エネルギー線硬化型光学用組成物及び高屈折率樹脂  Active energy ray-curable optical composition and high refractive index resin
技術分野  Technical field
[0001] 本発明は、特定の構造を有するエポキシ榭脂から誘導される化合物を含み、高屈 折率性を示す活性エネルギー線硬化型光学用組成物、該組成物に活性エネルギー 線を照射して得られる高屈折率榭脂、該高屈折率榭脂の層を有する光学多層材並 びに該高屈折率榭脂を含有してなる光学用材料に関する。  [0001] The present invention includes an active energy ray-curable optical composition containing a compound derived from an epoxy resin having a specific structure and exhibiting high refractive index, and the composition is irradiated with active energy rays. The present invention relates to a high refractive index resin obtained as described above, an optical multilayer material having a layer of the high refractive index resin, and an optical material containing the high refractive index resin.
背景技術  Background art
[0002] 従来から、例えば、エポキシ榭脂にアクリル酸等を付加反応させたエポキシアタリレ 一トイヒ合物、及びこのエポキシアタリレートィヒ合物に多塩基酸無水物を付加反応させ て得られるポリカルボン酸化合物は、硬化物の硬さゃ基材への密着性、高い熱安定 性、寸法安定性に優れるため広く用いられてきた。特に、電気、電子部品用途にお けるレジスト材料においては、酸変性することで、アルカリ水溶液による現像性が付 与された化合物として用いられて ヽる。  [0002] Conventionally, for example, an epoxy talile monolith compound obtained by addition reaction of acrylic acid or the like with epoxy resin, and a polybasic acid anhydride obtained by addition reaction of a polybasic acid anhydride with this epoxy acrylate polymer compound. Carboxylic acid compounds have been widely used because the cured product has excellent adhesion to the substrate, high thermal stability, and dimensional stability. In particular, resist materials for use in electrical and electronic parts can be used as compounds imparted with developability with an aqueous alkali solution by acid modification.
[0003] 中でも、ビフエノール構造を有するエポキシ榭脂から誘導されるエポキシアタリレー ト化合物は、高い熱安定性を有し強靭な硬化物を提供することが知られている (特許 文献 1及び特許文献 2)。し力しながら、これらの文献には高屈折率性に基づく光学
Figure imgf000003_0001
、ては記載がな 、。
[0003] Among them, an epoxy atrelate compound derived from an epoxy resin having a biphenol structure is known to provide a tough cured product having high thermal stability (Patent Document 1 and Patent Document) 2). However, these documents describe optics based on high refractive index.
Figure imgf000003_0001
It ’s not listed.
特許文献 1:特開平 9 211860号公報  Patent Document 1: JP-A-9 211860
特許文献 2:特開平 11― 140144号公報  Patent Document 2: Japanese Patent Laid-Open No. 11-140144
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0004] 近年、光学材料として、より高い強靭性が求められるようになり、単に硬いというだけ ではなく衝撃等によっても割れない硬化皮膜等が求められている。 [0004] In recent years, higher toughness has been demanded as an optical material, and there has been a demand for a cured film that is not simply hard but does not break by impact or the like.
[0005] 本発明は、耐熱性、耐湿性、強靭性に優れ、高屈折率を示す硬化物を与える光学 用組成物を提供することを目的とする。 [0005] An object of the present invention is to provide an optical composition that provides a cured product having excellent heat resistance, moisture resistance, and toughness and exhibiting a high refractive index.
課題を解決するための手段 [0006] 本発明者らは前記課題を解決すべく鋭意研究を行った結果、特定の骨格を有する エポキシ榭脂から誘導されるエポキシカルボキシレートイ匕合物又はポリカルボン酸ィ匕 合物を含む組成物が上記の各特性のバランスに優れる硬化物を与えることを見出し て本発明に到達した。 Means for solving the problem [0006] As a result of intensive studies to solve the above-mentioned problems, the present inventors include an epoxy carboxylate compound or a polycarboxylic acid compound derived from an epoxy resin having a specific skeleton. The present inventors have found that the composition gives a cured product having an excellent balance of the above-mentioned properties, and have reached the present invention.
[0007] 即ち、本発明は、下記一般式(1)で表されるエポキシ榭脂 (a)に分子中にエチレン 性不飽和基とカルボキシル基を併せ持つ化合物 (b)を反応させて得られるエポキシ カルボキシレートイ匕合物 (A)、及びエポキシカルボキシレートイ匕合物 (A)以外の活性 エネルギー線により硬化反応性を示す反応性ィ匕合物 (C)を含むことを特徴とする高 屈折率榭脂の製造に用いられる活性エネルギー線硬化型光学用組成物に関する。  That is, the present invention provides an epoxy resin obtained by reacting an epoxy resin (a) represented by the following general formula (1) with a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule. High refractive index comprising a carboxylate compound (A) and a reactive compound (C) that exhibits curing reactivity by active energy rays other than the epoxy carboxylate compound (A) The present invention relates to an active energy ray-curable optical composition that is used in the production of rate oil.
[0008] [化 1]  [0008] [Chemical 1]
Figure imgf000004_0001
Figure imgf000004_0001
(式中、 R1は、ハロゲン原子又は炭素数 1〜4のアルキル基を表し、同一でも異なつ ていてもよい。 mは 0〜4の整数を、 nは平均値で 1〜6の正数をそれぞれ表す) また、本発明は、上記エポキシカルボキシレートイ匕合物 (A)の水酸基に多塩基酸 無水物(c)を反応させて得られるポリカルボン酸ィ匕合物(B)、及びポリカルボン酸ィ匕 合物(B)以外の活性エネルギー線により硬化反応性を示す反応性ィ匕合物(C)を含 むことを特徴とする高屈折率榭脂の製造に用いられる活性エネルギー線硬化型光学 用組成物に関する。  (Wherein R1 represents a halogen atom or an alkyl group having 1 to 4 carbon atoms, and may be the same or different. M is an integer of 0 to 4, and n is a positive number of 1 to 6 on average. In addition, the present invention provides a polycarboxylic acid compound (B) obtained by reacting a polybasic acid anhydride (c) with a hydroxyl group of the epoxy carboxylate compound (A), and Active energy used for the production of a high refractive index resin characterized by containing a reactive compound (C) that exhibits curing reactivity with an active energy ray other than the polycarboxylic acid compound (B). The present invention relates to a linear curable optical composition.
[0009] 更に、一般式(1)の m力 ^である上記の活性エネルギー線硬化型光学用組成物に 関する。  [0009] Further, the present invention relates to the above active energy ray-curable optical composition having the m force ^ of the general formula (1).
[0010] 更に、反応性化合物(C)力 ラジカル反応型の (メタ)アタリレート類、カチオン反応 型のエポキシ化合物類及びその他のビュルィ匕合物類力 選ばれる化合物である上 記の活性エネルギー線硬化型光学用組成物に関する。 [0011] 更に、光安定剤 (D)を含む上記の活性エネルギー線硬化型光学用組成物に関す る。 [0010] Furthermore, the reactive energy (C) force radical reaction type (meth) acrylates, cation reaction type epoxy compounds and other Buly compounds force The above active energy ray which is a selected compound The present invention relates to a curable optical composition. [0011] Further, the present invention relates to the above active energy ray-curable optical composition containing the light stabilizer (D).
[0012] 更に、上記の光学用組成物に活性エネルギー線を照射して得られる硬化物である 高屈折率榭脂に関する。  [0012] Further, the present invention relates to a high refractive index resin that is a cured product obtained by irradiating the above optical composition with active energy rays.
[0013] 更に、上記の高屈折率榭脂の層を少なくとも 1層有する光学多層材に関する。 [0013] Further, the present invention relates to an optical multilayer material having at least one layer of the above high refractive index resin.
[0014] 更に、上記の高屈折率榭脂を含有してなる光学用材料に関する。 Furthermore, the present invention relates to an optical material containing the above-described high refractive index resin.
発明の効果  The invention's effect
[0015] 本発明の、特定の骨格を有するエポキシ榭脂に分子中にエチレン性不飽和基と力 ルボキシル基を併せ持つ化合物(b)を反応させて得られるエポキシカルボキシレート 化合物 (A)、又は、該エポキシカルボキシレートイ匕合物 (A)の水酸基に多塩基酸無 水物(c)を反応させて得られるポリカルボン酸ィ匕合物(B)並びに活性エネルギー線 により硬化反応性を示す反応性化合物 (C)を含む活性エネルギー線硬化型光学用 組成物に活性エネルギー線を照射して硬化させた硬化物は、耐熱性、耐湿性のバラ ンスに優れているだけではなぐ高い屈折率を有している。更に、該硬化物は強靭性 等の機械的物性に優れた材料であり、特に、基材への密着性ゃ耐傷性にも優れた 皮膜形成用材料として、また、ポリカルボン酸によるアルカリ水溶性を利用する現像 が可能なことから、いわゆる光学用レジストに用いる素材としても好適である。即ち、 例えば、レンズ、光学ディスク、液晶ディスプレー等の表示機器用のハードコート、フ イルム、光導波路等の光伝導材料等の光学用途に好適である。  [0015] The epoxy carboxylate compound (A) obtained by reacting the epoxy resin having a specific skeleton with a compound (b) having both an ethylenically unsaturated group and a force carboxyl group in the molecule of the present invention, or Polycarboxylic acid compound (B) obtained by reacting the hydroxyl group of epoxy carboxylate compound (A) with polybasic acid anhydride (c) and a reaction showing curing reactivity by active energy rays The cured product obtained by irradiating the active energy ray-curable optical composition containing the active compound (C) by irradiating the active energy ray with a high refractive index is not only excellent in the balance of heat resistance and moisture resistance. Have. Furthermore, the cured product is a material excellent in mechanical properties such as toughness, and particularly as a film-forming material excellent in adhesion to a substrate and scratch resistance, and also in a water-soluble alkali solution with a polycarboxylic acid. Therefore, it is also suitable as a material used for so-called optical resists. That is, for example, it is suitable for optical applications such as hard coats for display devices such as lenses, optical disks, and liquid crystal displays, films, and photoconductive materials such as optical waveguides.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0016] 本発明の活性エネルギー線硬化型光学用組成物は、高屈折率榭脂の製造に用い られる組成物であって、上記一般式(1) (式中、 R1はハロゲン原子又は炭素数 1〜4 のアルキル基を表し、同一でも異なっていてもよい。 mは 0〜4の整数を、 nは平均値 で 1〜6の正数をそれぞれ表す)で表されるエポキシ榭脂(a)に、分子中にエチレン 性不飽和基とカルボキシル基を併せ持つ化合物 (b)を反応させて得られるエポキシ カルボキシレートイ匕合物(A)、又は、該エポキシカルボキシレートイ匕合物(A)の水酸 基に多塩基酸無水物(c)を反応させて得られるポリカルボン酸ィ匕合物(B)、並びに、 活性エネルギー線により硬化反応性を示す反応性ィ匕合物(C)を含む。 [0017] 一般式(1)において、 Rlは、使用される用途に応じて適宜選択されるべきものであ り、例えば、メチル基、ェチル基、 n プロピル基、 i プロピル基、 n ブチル基、 i ブチル基、 s ブチル基等の炭素数が 1〜4の直鎖若しくは分岐鎖状の飽和炭化水 素基;塩素原子、臭素原子、ヨウ素原子等のハロゲン原子が挙げられる。 The active energy ray-curable optical composition of the present invention is a composition used for the production of a high refractive index resin, wherein the general formula (1) (wherein R1 is a halogen atom or a carbon number) Represents an alkyl group of 1 to 4, which may be the same or different, m represents an integer of 0 to 4, n represents an average value of 1 to 6 and an epoxy resin (a ) And an epoxy carboxylate compound (A) obtained by reacting a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule, or the epoxy carboxylate compound (A) A polycarboxylic acid compound (B) obtained by reacting a polybasic acid anhydride (c) with a hydroxyl group, and a reactive compound (C) showing curing reactivity by active energy rays including. [0017] In the general formula (1), Rl should be appropriately selected depending on the intended use, and includes, for example, a methyl group, an ethyl group, an n propyl group, an i propyl group, an n butyl group, i linear or branched saturated hydrocarbon group having 1 to 4 carbon atoms such as butyl group and sbutyl group; halogen atom such as chlorine atom, bromine atom and iodine atom.
[0018] mは 0〜2の整数が好まし!/、。これらのうち、 mが 0、即ち、置換基を有しな!/、化合物 が材料の入手等の観点力も最も好ま 、。  [0018] m is preferably an integer of 0 to 2! /. Of these, m is 0, that is, it has no substituents! /, And the compound is most preferred from the viewpoint of obtaining materials.
[0019] R1が塩素原子、臭素原子、ヨウ原子等のハロゲン原子である場合には、より高い屈 折率が得られる。  [0019] When R1 is a halogen atom such as a chlorine atom, bromine atom or iodine atom, a higher refractive index can be obtained.
[0020] 一般式(1)で表されるフエノールビフエ-ルメチル型エポキシ榭脂であるエポキシ 榭脂(a)において、ビフエ-ルメチル基とグリシジルエーテル基の結合位置は特に限 定されない。し力しながら、製法上、グリシジルエーテル基に対してビフエ-ルメチル 基がオルト位あるいはパラ位に結合して 、る場合が好まし!/、。  [0020] In the epoxy resin (a), which is a phenol biphenyl methyl type epoxy resin represented by the general formula (1), the bonding position of the biphenyl methyl group and the glycidyl ether group is not particularly limited. However, in view of the production method, it is preferred that the biphenylmethyl group is bonded to the ortho or para position with respect to the glycidyl ether group!
[0021] 一般式(1)で表されるエポキシ榭脂 (a)は、例えば特許文献 1にその製造方法が記 載されていて、その方法に準じて製造することも可能であり、また、市販品(商品名: NC— 3000、 NC— 3000P、 NC— 3000S、 NC— 3000H等の一般式(1)の m力^) である榭脂、 日本ィ匕薬 (株)製)として入手することも可能である。  [0021] The production method of the epoxy resin (a) represented by the general formula (1) is described in Patent Document 1, for example, and can be produced according to the method. Obtained as a commercial product (brand name: NC-3000, NC-3000P, NC-3000S, NC-3000H, etc.) It is also possible.
[0022] 本発明の活性エネルギー線硬化型光学用組成物に使用するエポキシカルボキシ レート化合物 (A)は、エポキシ榭脂 (a)にエチレン性不飽和基とカルボキシル基を併 せ持つ化合物 (b)を反応させて得られる(エポキシカルボキシレートイ匕工程)。  [0022] The epoxycarboxylate compound (A) used in the active energy ray-curable optical composition of the present invention is a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the epoxy resin (a). To obtain (epoxycarboxylate step).
[0023] 本発明の活性エネルギー線硬化型光学用組成物に使用するポリカルボン酸化合 物(B)は、上記エポキシカルボキシレートイ匕合物 (A)の水酸基に多塩基酸無水物(c )を反応させて得られる (酸付加工程)。  [0023] The polycarboxylic oxide compound (B) used in the active energy ray-curable optical composition of the present invention has a polybasic acid anhydride (c) on the hydroxyl group of the epoxy carboxylate compound (A). (Acid addition step).
[0024] エポキシカルボキシレート化工程につ!、て説明する。  [0024] The epoxy carboxylation step will be described.
[0025] エポキシカルボキシレートイ匕工程はエポキシ基とカルボキシル基を反応させ、ェポ キシ榭脂の骨格に活性エネルギー線の反応性基であるエチレン性不飽和基を導入 することを目的とするものである。  [0025] The epoxy carboxylate solution process is intended to introduce an ethylenically unsaturated group, which is a reactive group of active energy rays, into the skeleton of epoxy resin by reacting an epoxy group with a carboxyl group. It is.
[0026] 該エチレン性不飽和基とカルボキシル基を併せ持つ化合物 (b)としては、例えば、  [0026] Examples of the compound (b) having both the ethylenically unsaturated group and the carboxyl group include:
(メタ)アクリル酸類、クロトン酸、 a—シァノ桂皮酸、桂皮酸、或いはエチレン性不飽 和基と水酸基を併せ持つ化合物に飽和若しくは不飽和二塩基酸を反応させたィ匕合 物等が挙げられる。 (Meth) acrylic acids, crotonic acid, a-cyan cinnamic acid, cinnamic acid, or ethylenically unsaturated Examples thereof include compounds obtained by reacting a compound having both a sum group and a hydroxyl group with a saturated or unsaturated dibasic acid.
[0027] 上記においてエチレン性不飽和基と水酸基を併せ持つ化合物に飽和若しくは不 飽和二塩基酸を反応させた化合物等とは、例えば、 1分子中に 1個の水酸基を有す る (メタ)アタリレート誘導体と飽和若しくは不飽和二塩基酸無水物を等モル反応させ て得られる半エステル類が挙げられ、例えば、ヒドロキシェチル (メタ)アタリレート、ヒ アルキル (メタ)アタリレートに、無水マレイン酸、無水コハク酸、無水フタル酸、無水フ タル酸の部分若しくは全水添ィ匕合物、無水トリメリット酸、無水ピロメリット酸等の飽和 若しくは不飽和二塩基酸を反応させた化合物が挙げられる。  [0027] In the above, the compound obtained by reacting a compound having both an ethylenically unsaturated group and a hydroxyl group with a saturated or unsaturated dibasic acid is, for example, a (meth) atally having one hydroxyl group in one molecule. Examples include half esters obtained by reacting a rate derivative with a saturated or unsaturated dibasic acid anhydride in an equimolar amount. For example, hydroxyethyl (meth) acrylate, alkyl (meth) acrylate and maleic anhydride Succinic anhydride, phthalic anhydride, phthalic anhydride partly or fully hydrogenated compound, trimellitic anhydride, pyromellitic anhydride and the like are reacted with a saturated or unsaturated dibasic acid. .
[0028] これらのうち、エポキシ榭脂 (a)とエチレン性不飽和基とカルボキシル基を併せ持つ 化合物 (b)の反応の安定性を考慮すると、化合物 (b)はモノカルボン酸であることが 好ましぐモノカルボン酸とポリカルボン酸を併用する場合でも、モノカルボン酸のモ ル量 Zポリカルボン酸のモル量の比が 15以上であることが好ましい。  Of these, considering the stability of the reaction of the epoxy resin (a) and the compound (b) having both an ethylenically unsaturated group and a carboxyl group, the compound (b) is preferably a monocarboxylic acid. Even when monocarboxylic acid and polycarboxylic acid are used in combination, it is preferable that the mole ratio of monocarboxylic acid to molar ratio of polycarboxylic acid is 15 or more.
[0029] より好ましくは、活性エネルギー線硬化型光学用組成物としたときの活性エネルギ 一線に対する感度の点から (メタ)アクリル酸又は桂皮酸が挙げられる。  [0029] More preferred is (meth) acrylic acid or cinnamic acid from the viewpoint of sensitivity to a line of active energy when an active energy ray-curable optical composition is used.
[0030] この反応におけるエポキシ榭脂(a)と、エチレン性不飽和基とカルボキシル基を併 せ持つ化合物 (b)の仕込み割合としては、用途に応じて適宜変更されるべきもので ある。即ち、全てのエポキシ基をカルボキシレートイ匕した場合は、未反応のエポキシ 基が残存しな 、ために、エポキシカルボキシレートイ匕合物 (A)としての保存安定性は 高い。この場合、硬化反応には導入した二重結合による反応性のみを利用すること になる。  [0030] The charging ratio of the epoxy resin (a) and the compound (b) having both an ethylenically unsaturated group and a carboxyl group in this reaction should be appropriately changed depending on the application. That is, when all the epoxy groups are carboxylated, no unreacted epoxy groups remain, so that the storage stability as the epoxy carboxylate compound (A) is high. In this case, only the reactivity due to the introduced double bond is used for the curing reaction.
[0031] エポキシカルボキシレートイ匕工程において、エポキシ基を残存させない場合には、 エポキシ榭脂 (a)と、エチレン性不飽和基とカルボキシル基を併せ持つ化合物 (b)の 仕込み割合としては、エポキシ榭脂 (a)のエポキシ基 1当量に対し、化合物 (b)の力 ルポキシル基 0. 9〜1. 2当量が好ましい。この範囲を下回る場合、エポキシ基が残 存し、酸付加工程においてゲルィ匕したり、榭脂の保存安定性が悪くなつたりする。逆 に化合物 (b)の仕込み量がこの範囲より多 、場合には、過剰の化合物 (b)が残存し 、好ましくない。 [0031] In the epoxy carboxylate solution process, when no epoxy group remains, the charge ratio of the epoxy resin (a) and the compound (b) having both an ethylenically unsaturated group and a carboxyl group is as follows. The compound (b) is preferably 0.9 to 1.2 equivalents per 1 equivalent of the epoxy group of the fat (a). If it falls below this range, epoxy groups remain, causing gelation in the acid addition step, and deterioration of the storage stability of the resin. Conversely, if the amount of compound (b) charged is greater than this range, excess compound (b) remains. It is not preferable.
[0032] 一方、エチレン性不飽和基とカルボキシル基を併せ持つ化合物(b)の仕込み量を 減量して未反応のエポキシ基を残すことにより、導入したエチレン性不飽和結合によ る反応と残存するエポキシ基による反応 (例えば、光力チオン触媒による重合反応や 熱重合反応等)を複合的に利用することも可能となる。  [0032] On the other hand, by reducing the amount of the compound (b) having both an ethylenically unsaturated group and a carboxyl group to leave an unreacted epoxy group, the reaction with the introduced ethylenically unsaturated bond remains. It is also possible to use a combination of reactions based on epoxy groups (for example, a polymerization reaction or thermal polymerization reaction using a light power thione catalyst).
[0033] エポキシカルボキシレートイ匕工程において、エポキシ基を残す場合には、エポキシ 榭脂(a)のエポキシ基 1当量に対し、エチレン性不飽和基とカルボキシル基を併せ持 つ化合物(b)のカルボキシル基を 0. 2〜0. 9当量仕込むことが好ましい。この範囲を 逸脱する場合には複合硬化の効果が薄くなる。エポキシ基を残す場合には、続く反 応中のゲルィ匕ゃエポキシカルボキシレートイ匕合物 (A)の経時安定性に特に注意を 払う必要がある。  [0033] In the case of leaving an epoxy group in the epoxy carboxylate solution process, the compound (b) having both an ethylenically unsaturated group and a carboxyl group with respect to 1 equivalent of the epoxy group of the epoxy resin (a). It is preferable to charge 0.2 to 0.9 equivalent of a carboxyl group. If it is outside this range, the effect of composite curing will be diminished. When leaving an epoxy group, it is necessary to pay particular attention to the time-dependent stability of the gel or epoxycarboxylate compound (A) during the subsequent reaction.
[0034] 更に、後述の酸付加工程を経てポリカルボン酸ィ匕合物(B)として使用する場合には 、エポキシ基を残存させないことが特に好ましい。即ち、エポキシ基が数多く残存する 場合には、導入されるカルボキシル基と反応してしまい、保存安定性等が特に悪ィ匕 する。  [0034] Furthermore, when used as a polycarboxylic acid compound (B) through an acid addition step described later, it is particularly preferable that no epoxy group remains. That is, when a large number of epoxy groups remain, it reacts with the introduced carboxyl group, and storage stability and the like are particularly poor.
[0035] エポキシカルボキシレートイ匕工程は、無溶剤で若しくは溶剤で希釈して行う。溶剤 を使用する場合、該溶剤としては反応に影響が無ければ特に限定されない。  [0035] The epoxy carboxylate solution process is performed without solvent or diluted with a solvent. When a solvent is used, the solvent is not particularly limited as long as the reaction is not affected.
[0036] 上記溶剤としては、例えば、トルエン、キシレン、ェチルベンゼン、テトラメチルベン ゼン等の芳香族系炭化水素溶剤、へキサン、オクタン、デカン等の脂肪族系炭化水 素溶剤、又はそれらの混合物である石油エーテル、ホワイトガソリン、ソルベントナフ サ等が挙げられる。  [0036] Examples of the solvent include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene, aliphatic hydrocarbon solvents such as hexane, octane, and decane, or mixtures thereof. Some petroleum ethers, white gasoline, and solvent naphtha.
[0037] また、エステル系溶剤として、酢酸ェチル、酢酸プロピル、酢酸ブチル等のアルキ ルアセテート類、 γ —ブチロラタトン等の環状エステル類、エチレングリコールモノメ チノレエーテノレモノアセテート、ジエチレングリコ一ノレモノメチノレエーテノレモノアセテー ト、ジエチレングリコーノレモノェチノレエーテノレモノアセテート、トリエチレングリコール モノエチノレエーテノレモノアセテート、ジエチレングリコールモノブチルエーテルモノア セテート、プロピレングリコールモノメチルエーテルモノアセテート、ブチレングリコー ルモノメチルエーテルモノアセテート等のモノ若しくはポリアルキレングリコールモノア ルキルエーテルモノアセテート類、グルタル酸ジアルキル、コハク酸ジアルキル、アジ ピン酸ジアルキル等のポリカルボン酸アルキルエステル類等が挙げられる。 [0037] In addition, as ester solvents, alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate, cyclic esters such as γ-butyrolatatone, ethylene glycol monomethylenoate monoacetate, diethyleneglycolonemonomonomethyl Noreeate Monoacetate, Diethylene Glycol Nole Monoetinoreate Nore Monoacetate, Triethylene Glycol Monoethinorete Tenole Monoacetate, Diethylene Glycol Monobutyl Ether Monoacetate, Propylene Glycol Monomethyl Ether Monoacetate, Butylene Glycol Monomethyl Ether Mono or polyalkylene glycol monoa such as monoacetate Examples include alkyl ether esters such as alkyl ether monoacetates, dialkyl glutarate, dialkyl succinate, and dialkyl adipate.
[0038] また、エーテル系溶剤として、ジェチルエーテル、ェチルブチルエーテル等のアル キルエーテル類、エチレングリコールジメチルエーテル、エチレングリコールジェチル エーテル、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールジェチ ノレエーテノレ、トリエチレングリコールジメチルエーテル、トリエチレングリコールジェチ ルエーテル等のダリコールエーテル類、テトラヒドロフラン等の環状エーテル類等が 挙げられる。  [0038] In addition, as ether solvents, alkyl ethers such as jetyl ether and ethylbutyl ether, ethylene glycol dimethyl ether, ethylene glycol jetyl ether, dipropylene glycol dimethyl ether, dipropylene glycol jet nole ethere, triethylene glycol dimethyl ether , Dalicol ethers such as triethylene glycol ethyl ether, and cyclic ethers such as tetrahydrofuran.
[0039] また、ケトン系溶剤として、アセトン、メチルェチルケトン、シクロへキサノン、イソホロ ン等が挙げられる。  [0039] Examples of the ketone solvent include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.
[0040] この他にも、後記の反応性化合物(C)等を溶剤として使用することもでき、これらを 単独又は混合して使用することができる。この場合、生成物は、本発明の活性ェネル ギ一線硬化型光学用組成物としてそのまま利用することができるので好ましい。  In addition to this, the reactive compound (C) and the like described later can also be used as a solvent, and these can be used alone or in combination. In this case, the product is preferable because it can be used as it is as the active energy single-line curable optical composition of the present invention.
[0041] エポキシカルボキシレートイ匕工程には、反応を促進させるために触媒を使用するこ とが好ましい。該触媒の使用量は、反応物の総量に対して 0. 1〜10重量%程度添 加するのが好ましい。該触媒としては、例えば、トリェチルァミン、ベンジルジメチルァ ミン等の 3級ァミン類、塩ィ匕トリェチルアンモ-ゥム、臭化べンジルトリメチルアンモ- ゥム、ヨウ化べンジルトリメチルアンモ -ゥム等の 4級アンモ-ゥム塩類、オクタン酸ク ロム、オクタン酸ジルコニウム等の有機金属塩類、トリフエ-ルホスフィン、トリフエ-ル スチビン等の塩基性触媒等が挙げられる。  [0041] It is preferable to use a catalyst in the epoxy carboxylate step to accelerate the reaction. The amount of the catalyst used is preferably about 0.1 to 10% by weight based on the total amount of the reactants. Examples of the catalyst include tertiary amines such as triethylamine, benzyldimethylamine, salt triethylamine, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, and the like. Quaternary ammonium salts, organometallic salts such as chromium octanoate and zirconium octoate, and basic catalysts such as triphenylphosphine and triphenylstibine.
[0042] 反応温度は 60〜150°Cであり、また、反応時間は好ましくは 5〜60時間である。  [0042] The reaction temperature is 60 to 150 ° C, and the reaction time is preferably 5 to 60 hours.
[0043] また、熱重合禁止剤として、例えば、ハイドロキノンモノメチルエーテル、 2 メチル ハイドロキノン、ハイドロキノン、ジフエ二ルピクリルヒドラジン、ジフエニルァミン、 3, 5 ージー t ブチル 4 ヒドロキシトルエン等の重合禁止剤の使用が好まし 、。  [0043] As the thermal polymerization inhibitor, it is preferable to use a polymerization inhibitor such as hydroquinone monomethyl ether, 2-methyl hydroquinone, hydroquinone, diphenylpicrylhydrazine, diphenylamine, 3,5-dibutyl 4-hydroxytoluene, and the like. ,.
[0044] エポキシカルボキシレートイ匕工程は、適宜サンプリングしながら、サンプルの酸価 α IS K5601— 2— 1 : 1999に準拠して測定)が lmg'KOHZg以下、好ましくは 0. 5 mg'KOHZg以下となった時点を終点とする。  [0044] In the epoxy carboxylate soot process, the acid value of the sample (measured according to α IS K5601-2-1: 1999) is appropriately sampled, and is lmg'KOHZg or less, preferably 0.5 mg'KOHZg or less The end point is the point where
[0045] 次に、酸付カ卩工程について説明する。 [0046] 酸付加工程は、エポキシカルボキシレートイ匕工程によって生じた水酸基に多塩基 酸無水物(c)を反応させ、エステル結合を介してカルボキシル基の導入を目的とする [0045] Next, the acidification process will be described. [0046] The purpose of the acid addition step is to introduce a carboxyl group through an ester bond by reacting the polybasic acid anhydride (c) with the hydroxyl group generated by the epoxy carboxylate solution step.
[0047] 多塩基酸無水物 (c)とは、分子中に酸無水物構造を有する化合物であれば特に限 定されないが、例えばアルカリ水溶液現像性、耐熱性、加水分解耐性等に優れた生 成物を与えることから、無水コハク酸、無水フタル酸、テトラヒドロ無水フタル酸、へキ サヒドロ無水フタル酸、無水ィタコン酸、 3—メチルーテトラヒドロ無水フタル酸、 4ーメ チルーへキサヒドロ無水フタル酸、無水トリメリット酸又は無水マレイン酸が好ましい。 [0047] The polybasic acid anhydride (c) is not particularly limited as long as it is a compound having an acid anhydride structure in the molecule. For example, a polybasic acid anhydride (c) is a raw material excellent in developability in alkali aqueous solution, heat resistance, hydrolysis resistance, and the like. Succinic anhydride, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, itaconic anhydride, 3-methyl-tetrahydrophthalic anhydride, 4-methylhexahydrophthalic anhydride, Trimellitic anhydride or maleic anhydride is preferred.
[0048] 酸付加工程は、前記エポキシカルボキシレートイ匕工程の反応液に多塩基酸無水物  [0048] In the acid addition step, a polybasic acid anhydride is added to the reaction solution of the epoxy carboxylate solution step.
(c)を加えることにより行うこともできる。多塩基酸無水物(c)の添加量は用途に応じ て適宜変更されるべきものである。  It can also be done by adding (c). The addition amount of the polybasic acid anhydride (c) should be appropriately changed according to the use.
[0049] しカゝしながら、本発明の活性エネルギー線硬化型光学用組成物に使用するポリ力 ルボン酸化合物(B)をアルカリ現像型のレジストとして用いる場合は、最終的に得ら れるポリカルボン酸化合物(B)の固形分酸価 (JIS K5601 - 2- 1: 1999に準拠し て測定)を 40〜: LOOmg 'KOHZg、より好ましくは 60〜90mg 'KOH/gとする計算 量の多塩基酸無水物 (c)を仕込むことが好ましい。上記固形分酸価がこの範囲よりも 小さ 、場合、活性エネルギー線硬化型光学用組成物のアルカリ水溶液現像性が著 しく低下し、最悪の場合には現像できなくなる。また、固形分酸価がこれを越える場 合には、多塩基酸無水物 (c)が反応点に対して過剰となり、未反応の多塩基酸無水 物 (C)が組成物中に残存し、現像性が高くなりすぎて、ノ ターユングができなくなるこ とがある。  [0049] However, when the polyrubonic acid compound (B) used in the active energy ray-curable optical composition of the present invention is used as an alkali-developing resist, the finally obtained polycrystal is obtained. A large amount of carboxylic acid compound (B) with a solid content acid value (measured according to JIS K5601-2-1: 1999) of 40 to: LOOmg 'KOHZg, more preferably 60 to 90 mg' KOH / g It is preferable to charge the basic acid anhydride (c). When the solid content acid value is smaller than this range, the developability of the aqueous solution of the active energy ray-curable optical composition in alkaline aqueous solution is remarkably lowered, and in the worst case, development is impossible. If the solid content acid value exceeds this, the polybasic acid anhydride (c) becomes excessive with respect to the reaction point, and the unreacted polybasic acid anhydride (C) remains in the composition. Developability may become too high and not be able to make notes.
[0050] 酸付加工程には反応を促進させるために触媒を使用することが好ま ヽ。該触媒 の使用量は、反応物の総量に対して 0. 1〜: LO重量%程度添加するのが好ましい。 該触媒としては、例えば、トリェチルァミン、ベンジルジメチルァミン等の 3級ァミン類、 塩化トリェチルアンモ-ゥム、臭化べンジルトリメチルアンモ-ゥム、ヨウ化べンジルトリ メチルアンモ -ゥム等の 4級アンモ-ゥム塩類、オクタン酸クロム、オクタン酸ジルコ- ゥム等の有機金属塩類、トリフエ-ルホスフィン、トリフエ-ルスチビン等の塩基性触媒 等が挙げられる。 [0051] 反応温度は 60〜150°Cであり、また、反応時間は好ましくは 5〜60時間である。 [0050] In the acid addition step, it is preferable to use a catalyst to accelerate the reaction. The amount of the catalyst used is preferably about 0.1 to about LO weight% with respect to the total amount of the reactants. Examples of the catalyst include tertiary amines such as triethylamine and benzyldimethylamine, quaternary ammonia such as triethylammonium chloride, benzyltrimethylammonium bromide, and benzyltrimethylammonium iodide. -Umum salts, organic metal salts such as chromium octanoate and zirconium octanoate, and basic catalysts such as triphenylphosphine and triphenylstibine. [0051] The reaction temperature is 60 to 150 ° C, and the reaction time is preferably 5 to 60 hours.
[0052] 酸付加工程は無溶剤で若しくは溶剤で希釈して反応させる。溶剤を使用する場合 、該溶剤としては反応に影響が無ければ特に限定されない。また、前工程であるェポ キシカルボキシレートイ匕工程で溶剤を用いて製造した場合には、酸付加工程に影響 が無 、溶剤であれば溶剤を除くことなく酸付加工程に供してもょ 、。 [0052] In the acid addition step, the reaction is carried out without solvent or diluted with a solvent. When a solvent is used, the solvent is not particularly limited as long as the reaction is not affected. In addition, in the case of producing using a solvent in the epoxy carboxylate step, which is the previous step, there is no influence on the acid addition step, and if it is a solvent, it may be used in the acid addition step without removing the solvent. ,.
[0053] 上記溶剤としては、例えば、トルエン、キシレン、ェチルベンゼン、テトラメチルベン ゼン等の芳香族系炭化水素溶剤、へキサン、オクタン、デカン等の脂肪族系炭化水 素溶剤、又はそれらの混合物である石油エーテル、ホワイトガソリン、ソルベントナフ サ等が挙げられる。 [0053] Examples of the solvent include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzene, aliphatic hydrocarbon solvents such as hexane, octane, and decane, or mixtures thereof. Some petroleum ethers, white gasoline, and solvent naphtha.
[0054] また、エステル系溶剤として、酢酸ェチル、酢酸プロピル、酢酸ブチル等のアルキ ルアセテート類、 γ —ブチロラタトン等の環状エステル類、エチレングリコールモノメ チノレエーテノレモノアセテート、ジエチレングリコ一ノレモノメチノレエーテノレモノアセテー ト、ジエチレングリコーノレモノェチノレエーテノレモノアセテート、トリエチレングリコール モノエチノレエーテノレモノアセテート、ジエチレングリコールモノブチルエーテルモノア セテート、プロピレングリコールモノメチルエーテルモノアセテート、ブチレングリコー ルモノメチルエーテルモノアセテート等のモノ若しくはポリアルキレングリコールモノア ルキルエーテルモノアセテート類、グルタル酸ジアルキル、コハク酸ジアルキル、アジ ピン酸ジアルキル等のポリカルボン酸アルキルエステル類等が挙げられる。  [0054] Further, as ester solvents, alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate, cyclic esters such as γ-butyrolatatone, ethylene glycol monomethylenothenomonoacetate, diethyleneglycolonemonomonomethyl Noreeate Monoacetate, Diethylene Glycol Nole Monoetinoreate Nore Monoacetate, Triethylene Glycol Monoethinorete Tenole Monoacetate, Diethylene Glycol Monobutyl Ether Monoacetate, Propylene Glycol Monomethyl Ether Monoacetate, Butylene Glycol Monomethyl Ether Mono- or polyalkylene glycol monoalkyl ether monoacetates such as monoacetate, dialkyl glutarate, dialkyl succinate, diadipate Examples thereof include polycarboxylic acid alkyl esters such as rualkyl.
[0055] また、エーテル系溶剤として、ジェチルエーテル、ェチルブチルエーテル等のアル キルエーテル類、エチレングリコールジメチルエーテル、エチレングリコールジェチル エーテル、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールジェチ ノレエーテノレ、トリエチレングリコールジメチルエーテル、トリエチレングリコールジェチ ルエーテル等のダリコールエーテル類、テトラヒドロフラン等の環状エーテル類等が 挙げられる。  [0055] In addition, as ether solvents, alkyl ethers such as jetyl ether and ethylbutyl ether, ethylene glycol dimethyl ether, ethylene glycol jetyl ether, dipropylene glycol dimethyl ether, dipropylene glycol jet alcohol, triethylene glycol dimethyl ether , Dalicol ethers such as triethylene glycol ethyl ether, and cyclic ethers such as tetrahydrofuran.
[0056] また、ケトン系溶剤として、アセトン、メチルェチルケトン、シクロへキサノン、イソホロ ン等が挙げられる。  [0056] Examples of the ketone solvent include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.
[0057] この他にも、後記の反応性化合物(C)等を溶剤として使用することもでき、これらを 単独又は混合して使用することができる。この場合、生成物を、本発明の活性ェネル ギ一線硬化型光学用組成物としてそのまま利用することができるので好ましい。 In addition to this, the reactive compound (C) and the like described later can also be used as a solvent, and these can be used alone or in combination. In this case, the product is the active energy of the present invention. It is preferable because it can be used as it is as a gear curable optical composition.
[0058] また、熱重合禁止剤としては、前記エポキシカルボキシレートイ匕工程におけるのと 同様のものを使用することができる。  [0058] Further, as the thermal polymerization inhibitor, the same one as in the epoxy carboxylate soot process can be used.
[0059] 酸付加工程は、適宜サンプリングしながら、反応物の酸価が目的とする用途に応じ て設定した酸価の ± 10%の範囲になった点をもって終点とする。  [0059] In the acid addition step, the end point is determined when the acid value of the reaction product is within a range of ± 10% of the acid value set according to the intended use while appropriately sampling.
[0060] 本発明の活性エネルギー線硬化型光学用組成物に使用される反応性化合物(C) とは、エポキシカルボキシレートイ匕合物 (A)を含む活性エネルギー線硬化型光学用 組成物の場合にはエポキシカルボキシレートイ匕合物 (A)以外の化合物、また、ポリ力 ルボン酸化合物(B)を含む活性エネルギー線硬化型光学用組成物の場合にはポリ カルボン酸化合物(B)以外の化合物であって、活性エネルギー線により硬化反応性 を示す化合物であり、これにより使用目的に応じた硬化前や硬化後の物性の付与を 行うことができる。  [0060] The reactive compound (C) used in the active energy ray-curable optical composition of the present invention is an active energy ray-curable optical composition containing an epoxy carboxylate compound (A). In the case of the compound other than the epoxycarboxylate compound (A), and in the case of the active energy ray-curable optical composition containing the polystrengthenic acid compound (B), other than the polycarboxylic acid compound (B). This compound is a compound that exhibits curing reactivity with an active energy ray, and can impart physical properties before or after curing according to the purpose of use.
[0061] 反応性化合物(C)としては、ラジカル反応型、即ち活性エネルギー線の照射に伴 つて活性ラジカルを発生し、そのラジカルにより硬化反応を起こす (メタ)アタリレート 類、カチオン反応型、即ち活性エネルギー線の照射に伴ってカチオン (酸)を発生し 、そのカチオンにより硬化反応を起こすエポキシィ匕合物類、その他のビニル化合物 類等の、いわゆる、反応性オリゴマー類が挙げられる。  [0061] As the reactive compound (C), a radical reaction type, that is, a (meth) atalylate, a cation reaction type, which generates an active radical upon irradiation with active energy rays and causes a curing reaction by the radical, Examples include so-called reactive oligomers such as epoxy compounds and other vinyl compounds which generate cations (acids) upon irradiation with active energy rays and cause a curing reaction by the cations.
[0062] 上記ラジカル反応型の (メタ)アタリレート類としては、単官能 (メタ)アタリレート類、 多官能 (メタ)アタリレート類、エポキシ (メタ)アタリレート類、ポリエステル (メタ)アタリレ ート類、ウレタン (メタ)アタリレート類等が挙げられる。  [0062] Examples of the radical reaction type (meth) acrylates include monofunctional (meth) acrylates, polyfunctional (meth) acrylates, epoxy (meth) acrylates, polyester (meth) acrylates. And urethane (meth) acrylates and the like.
[0063] 単官能 (メタ)アタリレート類としては、メチル (メタ)アタリレート、ェチル (メタ)アタリレ ート、ブチル (メタ)アタリレート、ラウリル (メタ)アタリレート、ポリエチレングリコール (メ タ)アタリレート、ポリエチレングリコール (メタ)アタリレートモノメチルエーテル、フエ- ルェチル (メタ)アタリレート、イソボル-ル (メタ)アタリレート、シクロへキシル (メタ)ァ タリレート、ベンジル (メタ)アタリレート、テトラヒドロフルフリル (メタ)アタリレート等が挙 げられる。  [0063] Monofunctional (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, lauryl (meth) acrylate, polyethylene glycol (meth) acrylate. , Polyethylene glycol (meth) acrylate monomethyl ether, phenyl (meth) acrylate, isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, tetrahydrofurfuryl ( (Meta) Atarirate.
[0064] 多官能 (メタ)アタリレート類としては、ブタンジオールジ (メタ)アタリレート、へキサン ジオールジ (メタ)アタリレート、ネオペンチルグリコールジ (メタ)アタリレート、ノナンジ オールジ (メタ)アタリレート、グリコールジ (メタ)アタリレート、ジエチレングリコールジ( メタ)アタリレート、ポリエチレングリコールジ (メタ)アタリレート、トリス (メタ)アタリロイル ォキシェチルイソシァヌレート、ポリプロピレングリコールジ (メタ)アタリレート、アジピ ン酸エポキシジ (メタ)アタリレート、ビスフエノールエチレンォキシドジ (メタ)アタリレー ト、水素化ビスフエノールエチレンォキシド (メタ)アタリレート、ビスフエノールジ (メタ) アタリレート、ヒドロキシビバリン酸ネオペンチルグリコールの ε一力プロラタトン付カロ 物のジ (メタ)アタリレート、ジペンタエリスリトールと ε—力プロラタトンの反応生成物の ポリ(メタ)アタリレート、ジペンタエリスリトールポリ(メタ)アタリレート、トリメチロールプ 口パントリ(メタ)アタリレート、トリェチロールプロパントリ(メタ)アタリレート若しくはその エチレンォキシド付加物、ペンタエリスリトールトリ(メタ)アタリレート若しくはそのェチ レンォキシド付加物、ペンタエリスリトールテトラ (メタ)アタリレート、ジペンタエリスリト ールへキサ (メタ)アタリレート若しくはそのエチレンォキシド付加物等が挙げられる。 [0064] Examples of the polyfunctional (meth) acrylates include butanediol di (meth) acrylate, hexane diol di (meth) acrylate, neopentyl glycol di (meth) acrylate, nonane All di (meth) acrylate, glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, tris (meth) ateroyloxychetyl isocyanurate, polypropylene glycol di (meta) ) Atalylate, adipic acid epoxy di (meth) acrylate, bisphenol ethylene oxide di (meth) acrylate, hydrogenated bisphenol ethylene oxide (meth) acrylate, bisphenol di (meth) acrylate, hydroxybiba Di (meth) atalylate of dipentaerythritol and dipentaerythritol and ε-force prolatatone reaction product of neopentyl glycol phosphate , Trimethylol propane pantri (meth) acrylate, triethylol propane tri (meth) acrylate or its ethylene oxide adduct, pentaerythritol tri (meth) acrylate or its ethylene oxide adduct, pentaerythritol tetra Examples include (meth) acrylate, dipentaerythritol hexa (meth) acrylate, or ethylene oxide adducts thereof.
[0065] 上記カチオン反応型のエポキシィ匕合物類としては、一般的にエポキシ基を有する 化合物であれば特に限定はない。例えば、グリシジル (メタ)アタリレート、メチルグリジ ジルエーテル、ェチルダリシジルエーテル、ブチルダリシジルエーテル、ビスフエノー ノレ Αジグリジジノレエーテノレ、 3, 4 エポキシシクロへキシノレメチノレー 3, 4—エポキシ シクロへキサンカルボキシレート(ユニオン 'カーバイド製「サイラキュア UVR— 6110 」等)、 3, 4 エポキシシクロへキシノレエチノレー 3, 4—エポキシシクロへキサンカノレボ キシレート、ビュルシクロへキセンジォキシド(ユニオン 'カーバイド製「ELR— 4206」 等)、リモネンジォキシド (ダイセルィ匕学工業製「セロキサイド 3000」等)、ァリルシクロ へキセンジォキシド、 3, 4 エポキシー4ーメチルシクロへキシルー 2 プロピレンォ キシド、 2- (3, 4 エポキシシクロへキシルー 5, 5—スピロ 3, 4 エポキシ)シクロ へキサン m ジォキサン、ビス(3, 4—エポキシシクロへキシノレ)アジペート(ュニォ ン 'カーバイド製「サイラキュア UVR— 6128」等)、ビス(3, 4 エポキシシクロへキシ ルメチル)アジペート、ビス(3, 4—エポキシシクロへキシル)エーテル、ビス(3, 4— エポキシシクロへキシルメチル)エーテル、ビス(3, 4—エポキシシクロへキシル)ジェ チルシロキサン等が挙げられる。  [0065] The cation-reactive epoxy compounds are not particularly limited as long as they are generally compounds having an epoxy group. For example, glycidyl (meth) acrylate, methyl glycidyl ether, ethyl daricidyl ether, butyl daricidyl ether, bisphenol nole レ diglycidino reetenole, 3, 4 epoxycyclohexino retinoyl 3,4-epoxy cyclohex Xancarboxylate (Union Carbide “Syracure UVR-6110”, etc.), 3, 4 Epoxycyclohexenoreethinole 3, 4-Epoxycyclohexanecanoloxylate, Burcyclohexenedioxide (Union Carbide “ELR— 4206” ), Limonene dioxide (such as “Celoxide 3000” manufactured by Daicel Chemical Industries), allylcyclohexene dioxide, 3, 4 epoxy 4-methylcyclohexylene, 2 propylene oxide, 2- (3,4 epoxycyclohexane, 5, 5 —Spiro 3, 4 Epoxy ) Cyclohexane m Dioxane, bis (3,4-epoxycyclohexylene) adipate (eg “Syracure UVR-6128” manufactured by Union® Carbide), bis (3,4 Epoxycyclohexylmethyl) adipate, bis (3 , 4-epoxycyclohexyl) ether, bis (3,4-epoxycyclohexylmethyl) ether, bis (3,4-epoxycyclohexyl) ethylsiloxane, and the like.
[0066] また、上記ビュル化合物類としてはビュルエーテル類、スチレン類、その他のビ- ル化合物が挙げられる。ビュルエーテル類としてはェチルビ-ルエーテル、プロピル ビニノレエーテノレ、ヒドロキシェチノレビニノレエーテノレ、エチレングリコーノレジビニノレエ一 テル等が挙げられる。スチレン類としてはスチレン、メチルスチレン、ェチルスチレン 等が挙げられる。その他のビニルイ匕合物としてはトリアリルイソシァヌレート等が挙げ られる。 [0066] Further, examples of the above bull compounds include bull ethers, styrenes, and other bees. Compounds. Examples of the bull ethers include ethyl vinyl ether, propyl vinylenoatenole, hydroxyethylenolevininoatenole, and ethylene glyconoresininoate ether. Examples of styrenes include styrene, methyl styrene, and ethyl styrene. Examples of other vinyl compounds include triallyl isocyanurate.
[0067] 反応性化合物(C)としては、上記のうち、ラジカル反応型の (メタ)アタリレート類が 好ましい。カチオン反応型のエポキシ化合物類の場合、系内にカルボキシル基が残 つているとそれとエポキシ基が反応してしまうため使用時に混合する 2液混合型にす ることが必要である。  [0067] Among the above, the reactive compound (C) is preferably a radical reaction type (meth) acrylate. In the case of cation-reactive epoxy compounds, if a carboxyl group remains in the system, it reacts with the epoxy group, so it is necessary to use a two-component mixed type that is mixed at the time of use.
[0068] 上記のエポキシカルボキシレートイ匕合物(A)又はポリカルボン酸化合物(B)と、反 応性化合物 (C)とを混合して、本発明の活性エネルギー線硬化型光学用組成物を 得ることができる。  [0068] The above-mentioned epoxy carboxylate compound (A) or polycarboxylic acid compound (B) and the reactive compound (C) are mixed to produce the active energy ray-curable optical composition of the present invention. Obtainable.
[0069] 本発明の活性エネルギー線硬化型光学用組成物においては、該組成物中にェポ キシカルボキシレート化合物(A)及び Z又はポリカルボン酸化合物(B)を 90〜5重 量%、好ましくは 80〜: LO重量%、反応性化合物(C)を 3〜90重量%、好ましくは 13 〜80重量%含むのが好まし 、。必要に応じて適宜その他の成分を含んでもよ!、。  [0069] In the active energy ray-curable optical composition of the present invention, the epoxycarboxylate compound (A) and Z or the polycarboxylic acid compound (B) are contained in the composition in an amount of 90 to 5% by weight, Preferably 80 to: LO wt%, preferably 3 to 90 wt%, preferably 13 to 80 wt% of reactive compound (C). You may include other ingredients as needed!
[0070] 本発明の活性エネルギー線硬化型光学用組成物は、活性エネルギー線の照射に よって硬化する。ここで活性エネルギー線としては、紫外線、可視光線、赤外線、 X線 、ガンマ線、レーザー光線等の電磁波、アルファ線、ベータ線、電子線等の粒子線 等が挙げられる。これらは、本発明の活性エネルギー線硬化型光学用組成物の用途 により適宜選択し得るが、中でも紫外線、レーザー光線、可視光線又は電子線が好 ましい。  [0070] The active energy ray-curable optical composition of the present invention is cured by irradiation with active energy rays. Examples of the active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X-rays, gamma rays and laser rays, and particle rays such as alpha rays, beta rays and electron rays. These can be appropriately selected depending on the use of the active energy ray-curable optical composition of the present invention, and among these, ultraviolet rays, laser beams, visible rays or electron beams are preferred.
[0071] 本発明の活性エネルギー線硬化型光学用組成物は活性エネルギー線により硬化 するが、その際に用いる光源としては、例えば、キセノンランプ、カーボンアーク灯、 殺菌灯、紫外線用蛍光ランプ、中圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ 、無電極ランプ、メタルハライドランプ、あるいは走査型、カーテン型電子線加速器に よる電子線等を使用することができる。また、本発明の活性エネルギー線硬化型光学 用組成物を紫外線照射により硬化する場合、硬化に必要な紫外線照射量は 300〜 3000miZcm2程度でよ!ヽ。 [0071] The active energy ray-curable optical composition of the present invention is cured by active energy rays. Examples of the light source used at that time include xenon lamps, carbon arc lamps, germicidal lamps, ultraviolet fluorescent lamps, A pressure mercury lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, an electrodeless lamp, a metal halide lamp, or an electron beam by a scanning type or curtain type electron beam accelerator can be used. When the active energy ray-curable optical composition of the present invention is cured by ultraviolet irradiation, the amount of ultraviolet irradiation necessary for curing is 300 to It's about 3000miZcm 2 !
[0072] 本発明には、上記照射によって得られる硬化物である高屈折率榭脂も含まれる。 [0072] The present invention also includes a high refractive index resin which is a cured product obtained by the irradiation.
[0073] 更に、本発明の活性エネルギー線硬化型光学用組成物に耐光性を付与させること を目的として光安定剤 (D)を添加することも好ましい。光安定剤とは、光が長期間当 たる際の変色や脆ィ匕を防止するために添加される化合物の総称である。本発明の活 性エネルギー線硬化型光学用組成物は芳香環をその骨格中に有しているために、 光安定剤を添加することにより光学材料用途としての耐光性をより高めることができる [0073] Furthermore, it is also preferable to add a light stabilizer (D) for the purpose of imparting light resistance to the active energy ray-curable optical composition of the present invention. The light stabilizer is a general term for compounds added to prevent discoloration and brittleness when exposed to light for a long period of time. Since the active energy ray-curable optical composition of the present invention has an aromatic ring in its skeleton, the light resistance as an optical material can be further improved by adding a light stabilizer.
[0074] 光安定剤 (D)としては、紫外線吸収剤、酸化防止剤等として使用される化合物も含 まれる。 [0074] The light stabilizer (D) includes compounds used as ultraviolet absorbers, antioxidants and the like.
[0075] 光安定剤(D)としては、例えばビス(1, 2, 2, 6, 6 ペンタメチルー 4ーピペリジル ) [ [3, 5 ビス(1, 1ージメチルェチル)ー4ーヒドロキシフエ-ル]メチル]ブチルマロ ネート(例えば、チバスべシャリティケミカルズ製「Tinuvin 144」等)等のヒンダード アミン系光安定剤が挙げられる。  [0075] Examples of the light stabilizer (D) include bis (1, 2, 2, 6, 6 pentamethyl-4-piperidyl) [[3,5 bis (1,1-dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate. Examples thereof include hindered amine light stabilizers such as “Tinuvin 144” manufactured by Ciba Specialty Chemicals.
[0076] また、光安定剤 (D)としては、例えば、 2— (2 ヒドロキシ一 5— t—ブチルフエ-ル )—2H—ベンゾトリアゾール(例えば、チバスべシャリティケミカルズ製「Tinuvin PS 」等)、 3— (2H ベンゾトリァゾーノレ— 2—ィノレ)—5— (1, 1—ジメチノレエチノレ)—4 ヒドロキシベンゼンプロパン酸 分岐鎖及び直鎖(C7— C9)アルキルエステル(例 えば、チバスべシャリティケミカルズ製「Tinuvin 99— 2」、「Tinuvin 384— 2」等) 、 2— (2H ベンゾトリアゾール—2—ィル)—4, 6 ビス(1—メチル—1—フエ-ル ェチル)フエノーノレ(例えば、チバスべシャリティケミカルズ製「Tinuvin 900」等)等 のべンゾトリアゾール系紫外線吸収剤; 2— (4, 6 ビス(2, 4 ジメチルフエ-ル)— 1, 3, 5 トリァジン一 2—ィル) 5 フエノールとォキシラン([ (C10— C16 (主とし て C12— C13)アルキルォキシ)メチル]ォキシラン)との反応生成物(例えば、チバス ぺシャリティケミカルズ製「Tinuvin 400」等)、 2— (2, 4 ジヒドロキシフエ-ル)一 4, 6 ビス(2, 4 ジメチルフエ-ル) 1, 3, 5 トリアジンと(2 ェチルへキシル) ーグリシド酸エステルの反応生成物(例えば、チノ スぺシャリティケミカルズ製「Tinuv in 405」等)、 2, 4 ビス [2 ヒドロキシ一 4 ブトキシフエ-ル]— 6— (2, 4 ジブ トキシフエ-ル)— 1, 3, 5 トリァジン(例えば、チバスべシャリティケミカルズ製「Tin uvin 460」等)等のヒドロキシフエニルトリアジン (HPT)系紫外線吸収剤等が挙げら れる。 [0076] Further, as the light stabilizer (D), for example, 2- (2 hydroxy-5-t-butylphenol) -2H-benzotriazole (for example, “Tinuvin PS” manufactured by Ciba Specialty Chemicals, etc.) , 3— (2H Benzotriazolenol-2-ynole) —5— (1, 1-Dimethylenoethinole) —4 Hydroxybenzenepropanoic acid Branched and straight chain (C7—C9) alkyl esters (eg Cibas Specialty Chemicals “Tinuvin 99-2”, “Tinuvin 384-2”, etc.), 2— (2H benzotriazole-2-yl) —4,6 bis (1-methyl-1-phenylethyl) Benzotriazole-based UV absorbers such as phenol (for example, “Tinuvin 900” manufactured by Ciba Specialty Chemicals); 2— (4, 6 bis (2, 4 dimethylphenol) — 1, 3, 5 Triazine 2—yl) 5 phenol and oxysilane ([(C10— C16 (mainly C12—C13) alkyloxy) methyl] oxysilane) (for example, “Tinuvin 400” manufactured by Ciba Specialty Chemicals, etc.), 2— (2, 4 dihydroxyphenol) 1, 4, 6 bis (2, 4 Dimethylphenol) 1, 3, 5 Triazine and (2 ethylhexyl) -glycidic acid ester reaction products (eg “Tinuv in 405” manufactured by Tino Specialty Chemicals), 2, 4 Bis [2 Hydroxy 1 4-Butoxyphenyl] — 6— (2, 4 Jib Toxylphenol) -1, 3, 5 Triazine (for example, “Tin uvin 460” manufactured by Ciba Specialty Chemicals, etc.) and the like, and hydroxyphenyl triazine (HPT) ultraviolet absorbers.
[0077] 硬化反応に用いる活性エネルギー線が紫外線である場合には、ヒドロキシフエ-ル トリアジン (HPT)系紫外線吸収剤が効果的である。  [0077] In the case where the active energy ray used for the curing reaction is ultraviolet rays, hydroxyphenol triazine (HPT) ultraviolet absorbers are effective.
[0078] 光安定剤(D)としては、例えば、テトラキス(2, 4 ジー t ブチルフエニル) [1, 1 —ビフエ-ル]— 4, 4,一ジィルビスホスフォナイト(例えば、チバスべシャリティケミカ ルズ製「IRGAFOS XP40」等)、ビス(2, 4 ジ— t—ブチルフエ-ル)ペンタエリス リトールジホスファイト(例えば、チバスべシャリティケミカルズ製「IRGAFOS XP60」 等)等のホスファイト系酸ィ匕防止剤、或いは、ペンタエリスリトールテトラキス [3— (3, 5—ジ— t ブチル— 4—ヒドロキシフエ-ル)プロピオネート(例えば、チバスべシャリ ティケミカルズ製「IRGANOX 1010」等)、チオジェチレンビス [3— (3, 5 ジ—t ーブチルー 4ーヒドロキシフエ-ル)プロピオネート] (例えば、チバスべシャリティケミ カルズ製 riRGANOX 1035」等)、 4, 6 ビス(ォクチルチオメチル) o—タレゾー ル(例えば、チバスべシャリティケミカルズ製「IRGANOX 1520LJ等)等のヒンダ一 ドフエノール系酸ィ匕防止剤が挙げられる。  [0078] Examples of the light stabilizer (D) include tetrakis (2,4di-t-butylphenyl) [1,1-biphenyl] -4,4,1 diylbisphosphonite (for example, Ciba Specialty) Phosphite acids such as “IRGAFOS XP40” manufactured by Chemicals) and bis (2,4di-t-butylphenol) pentaerythritol diphosphite (eg “IRGAFOS XP60” manufactured by Ciba Specialty Chemicals) Anti-wrinkle agent, or pentaerythritol tetrakis [3— (3,5-di-t-butyl-4-hydroxyphenol) propionate (eg “IRGANOX 1010” manufactured by Ciba Specialty Chemicals), thiojetylene Bis [3— (3,5 di-tert-butyl-4-hydroxyphenol) propionate] (for example, riRGANOX 1035 manufactured by Ciba Specialty Chemicals), 4, 6 Bis (octylthiomethyl) o-talezo (For example, “IRGANOX 1520LJ” manufactured by Ciba Specialty Chemicals, etc.)
[0079] 光安定剤を使用する場合、上記のうちから 1種又は 2種以上を用いればよい。  [0079] When a light stabilizer is used, one or more of the above may be used.
[0080] 光安定剤 (D)を使用する場合、本発明の活性エネルギー線硬化型光学用組成物 におけるその使用割合は、該組成物中 0. 1〜5重量%が好ましぐ更に好ましくは 0 . 5〜3重量%である。これよりも少ない場合には充分な安定剤としての効果が発揮さ れず、多すぎる場合には活性エネルギー線による硬化反応を阻害する場合がある。  [0080] When the light stabilizer (D) is used, the use ratio in the active energy ray-curable optical composition of the present invention is preferably 0.1 to 5% by weight in the composition, and more preferably. 0.5 to 3% by weight. When the amount is less than this, the effect as a sufficient stabilizer is not exhibited, and when the amount is too much, the curing reaction by active energy rays may be inhibited.
[0081] この他、本発明の活性エネルギー線硬化型光学用組成物を各種用途に適合させ る目的で、該組成物の 70重量%を上限にその他の成分をカ卩えることもできる。その 他の成分としては光重合開始剤、着色材料、その他の添加剤等が挙げられる。  [0081] In addition, for the purpose of adapting the active energy ray-curable optical composition of the present invention to various applications, other components may be added up to 70% by weight of the composition. Other components include photopolymerization initiators, coloring materials, other additives, and the like.
[0082] 上記光重合開始剤としては、例えば、ベンゾイン、ベンゾインメチルエーテル、ベン ゾインェチルエーテル、ベンゾインプロピルエーテル、ベンゾインイソブチルエーテル 等のベンゾイン類;ァセトフエノン、 2, 2—ジエトキシ一 2—フエ-ルァセトフエノン、 2, 2—ジエトキシ一 2—フエ-ルァセトフエノン、 1, 1—ジクロロアセトフエノン、 2—ヒドロ キシ 2—メチルーフェニルプロパン 1 オン、ジエトキシァセトフエノン、 1ーヒドロ キシシクロへキシルフエ-ルケトン、 2—メチルー 1 [4 (メチルチオ)フエ-ル] 2 -モルホリノ一プロパン 1—オン等のァセトフエノン類; 2 -ェチルアントラキノン、 2 —tーブチルアントラキノン、 2—クロ口アントラキノン、 2—アミルアントラキノン等のァ ントラキノン類; 2, 4 ジェチルチオキサントン、 2 イソプロピルチォキサントン、 2— クロ口チォキサントン等のチォキサントン類;ァセトフエノンジメチルケタール、ベンジ ルジメチルケタール等のケタール類;ベンゾフエノン、 4一べンゾィルー 4,ーメチルジ フエ-ルスルフイド、 4, 4,一ビスメチルァミノべンゾフエノン等のベンゾフエノン類; 2, 4, 6 トリメチルベンゾィルジフエ-ルホスフィンォキシド、ビス(2, 4, 6 トリメチル ベンゾィル) フエ-ルホスフィンォキシド等のホスフィンォキシド類等のラジカル型開 始剤が挙げられる。 [0082] Examples of the photopolymerization initiator include benzoins such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutyl ether; acetophenone, 2,2-diethoxy-2-phenyl. Ruacetophenone, 2, 2-diethoxy-1, 2-phen-acetophenone, 1, 1-dichloroacetophenone, 2-hydro Acetofenones such as xyl-2-methyl-phenylpropane 1-one, diethoxyacetophenone, 1-hydroxycyclohexyl phenol ketone, 2-methyl-1- [4 (methylthio) phenol] 2 -morpholinopropan 1-one; Anthraquinones such as 2-ethylanthraquinone, 2-tert-butylanthraquinone, 2-chloroanthraquinone, 2-amylanthraquinone, and the like; 2,4 thixanthones such as jetylthioxanthone, 2-isopropylthixanthone, and 2-chlorothiaxanthone Ketals such as acetophenone dimethyl ketal and benzil dimethyl ketal; benzophenones such as benzophenone, 4-benzoyl, 4-methyldiphenylsulfide, 4, 4, monobismethylaminobenzophenone; 2, 4, 6 Rudiphenol-phosphine Kishido, bis (2, 4, 6-trimethyl Benzoiru) Hue - Le phosphine O sulfoxide such phosphine O dimethylsulfoxide radical type opening initiator, such compounds can be mentioned.
[0083] その他の光重合開始剤としては、ボーレート系開始剤である日本感光色素製「NK  [0083] Other photopolymerization initiators include “NK” manufactured by Nippon Photosensitizer, which is a baud rate initiator.
3876」、「NK— 3881」等;光酸発生剤である、例えば、 9 フエ-ルァクリジン、 2 , 2,一ビス(o クロ口フエ-ル)一 4, 4,, 5, 5,一テトラフエ-ル一 1, 2 ビイミダゾ ール(黒金化成製「ビイミダゾール」等)、 2, 2—ァゾビス(2—ァミノ プロパン)ジヒド 口クロリド (和光純薬製「V50」等)、 2, 2 ァゾビス [2— (イミダソリン一 2ィル)プロパ ン]ジヒドロクロリド(和光純薬製「VA044」等)、 [ィーター 5— 2—4 (シクロペンタデ シル)(1, 2, 3, 4, 5, 6,ィータ) - (メチルェチル)—ベンゼン]鉄(Π)へキサフルォ 口ホスホネート(チバガイギー製「Irgacure 261」等)等のカチオン型開始剤が挙げ られる。  3876 "," NK-3881 ", etc .; photoacid generators, for example, 9 phenolacridine, 2, 2, 1bis (o black mouth) 1, 4, 4, 5, 5, 1 tetraphenol -Lu 1, 2 Biimidazole (such as “Biimidazole” manufactured by Kurokin Kasei), 2, 2-azobis (2-aminopropane) dihydric chloride (such as “V50” manufactured by Wako Pure Chemical Industries), 2, 2 Azobis [2- (Imidazoline-1 2-yl) propan] dihydrochloride (such as “VA044” manufactured by Wako Pure Chemical Industries), [Eter 5—2-4 (cyclopentadecyl) (1, 2, 3, 4, 5, 6, And cation initiators such as “Irgacure 261” manufactured by Ciba Geigy).
[0084] また、ァゾビスイソブチ口-トリル等のァゾ系開始剤、過酸化ベンゾィル等の熱に感 応する過酸ィ匕物系ラジカル型開始剤等を併せて用いてもよぐラジカル型とカチオン 型の双方の開始剤を併せて用いてもよい。  [0084] In addition, radical type and cationic groups may be used in combination with azo type initiators such as azobisisobutyoritol-tolyl and peroxide sensitive radical type initiators such as benzoyl peroxide which are sensitive to heat. Both initiators of the mold may be used together.
[0085] 本発明の活性エネルギー線硬化型光学用組成物にこれらの開始剤を含有させる 場合、該組成物に対するその含有率は 0. 1〜10重量%程度である。  [0085] When these initiators are included in the active energy ray-curable optical composition of the present invention, the content of the initiator is about 0.1 to 10% by weight.
[0086] 上記着色材料としては、例えば、フタロシアニン系、ァゾ系、キナクリドン系等の有 機顔料、酸化チタン、カーボンブラック、ベンガラ、酸化亜鉛、硫酸バリウム、タルク等 の無機顔料、公知一般の着色及び体質顔料を使用することができる。 [0087] その他の添加剤としては、例えば、メラミン等の熱硬化触媒、タルク、硫酸バリウム、 炭酸カルシウム、炭酸マグネシウム、チタン酸バリウム、水酸ィ匕アルミニウム、酸ィ匕ァ ルミ-ゥム、シリカ、クレー等の充填剤、「ァエロジル」等のチキソトロピー付与剤、フタ ロシアニンブルー、フタロシアニングリーン、酸化チタン、シリコーン、フッ素系のレべ リング剤や消泡剤、ハイドロキノン、ハイドロキノンモノメチルエーテル等の重合禁止 剤等を使用することができる。 [0086] Examples of the coloring material include organic pigments such as phthalocyanine, azo, and quinacridone, inorganic pigments such as titanium oxide, carbon black, bengara, zinc oxide, barium sulfate, and talc, and known general coloring. And extender pigments can be used. [0087] Other additives include, for example, thermosetting catalysts such as melamine, talc, barium sulfate, calcium carbonate, magnesium carbonate, barium titanate, hydroxyaluminum hydroxide, acidic aluminum, silica Polymerization prohibition of fillers such as clay, thixotropic agents such as “Aerosil”, phthalocyanine blue, phthalocyanine green, titanium oxide, silicone, fluorine leveling agents and antifoaming agents, hydroquinone, hydroquinone monomethyl ether, etc. An agent or the like can be used.
[0088] 更に、本発明の活性エネルギー線硬化型光学用組成物には、他に活性エネルギ 一線に反応性を示さない榭脂類 (いわゆるイナートポリマー)、例えば、上記以外のェ ポキシ榭月旨、フエノール榭脂、ウレタン榭月旨、ポリエステル榭脂、ケトンホノレムァノレデヒ ド榭脂、クレゾール榭脂、キシレン榭脂、ジァリルフタレート榭脂、スチレン榭脂、グァ ナミン榭脂、天然若しくは合成ゴム、アクリル榭脂、ポリオレフイン榭脂、又はこれらの 変性物を用いることもできる。これらは、該組成物中 40重量%までの範囲において用 、ることが好まし!/、。  [0088] Further, the active energy ray-curable optical composition of the present invention includes other non-reactive resins (so-called inert polymers), such as epoxy resin other than those described above. , Phenolic resin, urethane resin, polyester resin, ketone phenolic resin resin, cresol resin, xylene resin, diallyl phthalate resin, styrene resin, guanamine resin, natural Alternatively, synthetic rubber, acrylic resin, polyolefin resin, or modified products thereof can also be used. These are preferably used in the composition up to 40% by weight! /.
[0089] また、使用目的に応じて粘度を調整する目的で、該組成物中 40重量%、好ましく は 20重量%までの範囲において溶剤、例えば、エポキシカルボキシレートイ匕工程及 び酸付加工程に用いることができると例示した溶剤等を添加することもできる。  [0089] For the purpose of adjusting the viscosity according to the purpose of use, a solvent such as an epoxycarboxylate salting step and an acid addition step are used in the composition up to 40% by weight, preferably 20% by weight. Solvents exemplified as being usable can also be added.
[0090] 本発明には上記の光学用組成物に活性エネルギー線を照射して得られる高屈折 率榭脂を含有し、光学的に光を屈折させることを目的として用いられる光学用材料も 含まれる。  [0090] The present invention also includes an optical material containing a high refractive index resin obtained by irradiating the above-mentioned optical composition with active energy rays and used for the purpose of optically refracting light. It is.
[0091] 光学用材料とは、例えば、凸レンズ、凹レンズ、マイクロレンズ、フレネルレンズ、レ ンチキユラ一レンズ等のレンズ材料;液晶表示装置等に用いられる導光材料;板状に 加工したシートやフィルム、ディスク等;未硬化の組成物に微細加工された「型」を押 し当てて微細な成形を行う、いわゆる、ナノインプリント材料;更には素子を保護する ための封止材、特に発光ダイオード、光電変換素子等の封止材料等が挙げられる。  [0091] Optical materials include, for example, lens materials such as convex lenses, concave lenses, microlenses, Fresnel lenses, and lenticular lenses; light guide materials used in liquid crystal display devices; sheets and films processed into plates, Discs, etc .; so-called nanoimprint materials that perform micro-molding by pressing a micro-molded “mold” into an uncured composition; furthermore, sealing materials for protecting elements, especially light-emitting diodes, photoelectric conversion Examples thereof include sealing materials such as elements.
[0092] また、ハードコート、トップコート、オーバープリントニス、クリャコート等の塗工材料; ラミネート用、光ディスク用他各種接着剤、粘着剤等の接着材料;ソルダーレジスト、 エッチングレジスト、マイクロマシン用レジスト等のレジスト材料等の高屈折率を求めら れる皮膜形成用にも好適に用いられる。 [0093] 更には、皮膜形成用材料を一時的に剥離性基材に塗工しフィルム化した後、本来 目的とする基材に貼合し皮膜を形成させる、いわゆるドライフィルムとしても使用でき る。 [0092] Coating materials such as hard coats, top coats, overprint varnishes, clear coats; adhesive materials for laminating, optical discs and other various adhesives, adhesives; solder resists, etching resists, resists for micromachines, etc. It is also suitably used for film formation that requires a high refractive index such as a resist material. [0093] Furthermore, after the film-forming material is temporarily applied to a peelable substrate to form a film, it can be used as a so-called dry film in which a film is formed by being bonded to the originally intended substrate. .
[0094] 中でも、凸レンズ、凹レンズ、マイクロレンズ、フレネルレンズ、レンチキュラーレンズ 等のレンズ材料やハードコート、トップコート、オーバープリントニス、クリャコート等の 塗工材料としての使用が特に好ま 、。  [0094] Among them, use as a lens material such as a convex lens, a concave lens, a micro lens, a Fresnel lens, and a lenticular lens, and a coating material such as a hard coat, top coat, overprint varnish, and clear coat is particularly preferable.
[0095] また、ポリカルボン酸ィ匕合物(B)を含有する活性エネルギー線硬化型光学用組成 物の場合、上記の用途にカ卩えて、カルボキシル基によって基材への密着性が高まる ため、プラスチック基材若しくは金属基材を被覆するための用途として用いることもで きる。該組成物はアルカリ溶液に可溶性となる特徴を生カゝして、高屈折率を求められ るアルカリ現像性光学用レジスト材料組成物として用いることもできる。即ち、基材上 に該組成物の皮膜層を形成し、紫外線等の活性エネルギー線を部分的に照射し、 未照射部をアルカリ溶液等で溶解させ除去して描画する活性エネルギー線感応型 の光学用組成物としての使用である。  [0095] In addition, in the case of an active energy ray-curable optical composition containing the polycarboxylic acid compound (B), the adhesion to the base material is enhanced by the carboxyl group in view of the above use. It can also be used as an application for coating a plastic substrate or a metal substrate. The composition can also be used as an alkali-developable optical resist material composition that requires a high refractive index by taking advantage of its solubility in an alkali solution. That is, an active energy ray-sensitive type in which a film layer of the composition is formed on a substrate, irradiated with active energy rays such as ultraviolet rays, and unirradiated portions are dissolved and removed with an alkaline solution or the like to draw. It is used as an optical composition.
[0096] 皮膜形成の方法としては特に制限されず、グラビア等の凹版印刷方式、フレキソ等 の凸版印刷方式、シルクスクリーン等の孔版印刷方式、オフセット等の平版印刷方式 、口■ ~"ノレコ^ ~"タ' ~"、ナイフコ^ ~" ' ~"、ダイコ1 ~~タ' ~" 力' ~"テンコ. ~"タ' ~"、スピンコ1 ~~タ' ~" 等の各種塗工方式を任意に採用できる。 [0096] The method of forming the film is not particularly limited, and intaglio printing method such as gravure, relief printing method such as flexo, stencil printing method such as silk screen, lithographic printing method such as offset, etc. Various coating methods such as "Ta '~", Knife co ^ ~ "'~", Daiko 1 ~~ Ta '~ "Power" ~ "Tenko. ~"Ta' ~ ", Spinco 1 ~~ Ta '~", etc. Can be arbitrarily adopted.
[0097] 本発明にお ヽて高屈折率榭脂とは、活性エネルギー線を照射して得られる硬化物 を JIS K7142 : 1996に従って屈折率を測定したときに、 1. 55以上の値となる榭脂 である。 [0097] In the present invention, a high refractive index resin means a value of 1.55 or more when the refractive index of a cured product obtained by irradiating active energy rays is measured according to JIS K7142: 1996. It is greaves.
[0098] 本発明には、上記の活性エネルギー線硬化型光学用組成物を基材上に皮膜形成 •硬化させて得られる高屈折率榭脂の層をもってなる光学多層材も含まれる。  The present invention also includes an optical multilayer material having a high refractive index resin layer obtained by forming a film on the substrate and curing the above active energy ray-curable optical composition.
実施例  Example
[0099] 以下、本発明を実施例により更に詳細に説明するが、本発明はこれら実施例に限 定されるものではない。また、実施例中に特に断りがない限り、部は重量部を示す。 なお、実施例中の各物性値は以下の方法で測定した。  [0099] Hereinafter, the present invention will be described in more detail with reference to Examples, but the present invention is not limited to these Examples. Moreover, unless otherwise indicated in an Example, a part shows a weight part. In addition, each physical property value in an Example was measured with the following method.
( 1)エポキシ当量: JIS— K7236: 2001に記載の方法で測定。 (2)硬度: JIS K5600— 5— 4: 1999に記載の方法で測定。 (1) Epoxy equivalent: Measured by the method described in JIS—K7236: 2001. (2) Hardness: Measured by the method described in JIS K5600-5-4: 1999.
(3)屈折率: JIS K7142: 1996に記載の方法で測定。  (3) Refractive index: Measured by the method described in JIS K7142: 1996.
[0100] 合成例 1 1、合成例 1 2:エポキシカルボキシレートイ匕合物(A)の合成  [0100] Synthesis Example 1 1, Synthesis Example 1 2: Synthesis of epoxy carboxylate compound (A)
エポキシ榭脂 (a)としてフエノールビフエ-ルメチル型エポキシ榭脂である日本ィ匕薬 製 NC— 3000H (エポキシ価 288gZeq、 n=2.1) 144g、分子中にエチレン性不飽 和基とカルボキシル基を併せ持つ化合物 (b)としてアクリル酸 (略称 AA、分子量 = 7 2)を表 1中に記載した量、触媒としてトリフエニルホスフィン 1.5g、溶剤としてプロピ レングリコールモノメチルエーテルモノアセテート lOOgを加え、 100°Cで 24時間反応 させた。  Epoxy resin (a) is phenol bimethyl methyl type epoxy resin, Nippon Kayaku NC-3000H (epoxy value 288gZeq, n = 2.1) 144g, compound having both ethylenically unsaturated group and carboxyl group in the molecule As (b), add acrylic acid (abbreviation AA, molecular weight = 72) in Table 1, 1.5 g of triphenylphosphine as a catalyst, and lOOg of propylene glycol monomethyl ether monoacetate as a solvent. Reacted for hours.
[0101] 比較合成例 1 1:エポキシカルボキシレートイ匕合物の合成  [0101] Comparative Synthesis Example 1 1: Synthesis of epoxy carboxylate compound
エポキシ榭脂 (a)として多官能ビスフエノール A型エポキシ榭脂である日本化薬製 NER-1202 (エポキシ価 292g/eq) 146g〖こアクリル酸 (AA)を表 1中に記載した 量を加え反応させた。反応条件等は、合成例 1 1、合成例 1 2と同じであった。  As the epoxy resin (a), add NER-1202 (epoxy value 292g / eq) 146g mucoacrylic acid (AA), which is a polyfunctional bisphenol A type epoxy resin, in Table 1. Reacted. Reaction conditions and the like were the same as those in Synthesis Example 11 and Synthesis Example 12.
[0102] [表 1] 合成例 AA.重量 (モル比)  [0102] [Table 1] Synthesis example AA. Weight (molar ratio)
合成例 1—1 36 g (1. 0)  Synthesis Example 1-1 36 g (1.0)
合成例 1—2 18g (0. 5)  Synthesis Example 1-2 18g (0.5)
比始成例 1—1 36g (1. 0)  Specific example 1-1 36g (1.0)
[0103] 合成例 2—1、合成例 2— 2:ポリカルボン酸ィ匕合物(B)の合成 [0103] Synthesis Example 2-1 and Synthesis Example 2-2: Synthesis of polycarboxylic acid compound (B)
[0104] 合成例 1— 1にお 、て得られたエポキシカルボキシレートイ匕合物 (A)に、多塩基酸 無水物(c)としてテトラヒドロ無水フタル酸を表 2中に記載の量カ卩え、固形分が 70重 量0 /0となるように溶剤としてのプロピレングリコールモノメチルエーテルモノアセテート を添加し、 100°Cにて 10時間加熱して付加反応させ、ポリカルボン酸化合物(B)溶 液を得た。 [0104] In Synthesis Example 1-1, tetrahydrophthalic anhydride as polybasic acid anhydride (c) was added to the epoxy carboxylate compound (A) obtained in the above manner. for example, the addition of propylene glycol monomethyl ether monoacetate as a solvent so that the solid content would be 70 by weight 0/0, by addition reaction by heating for 10 hours at 100 ° C, polycarboxylic acid compound (B) soluble A liquid was obtained.
[0105] [表 2] 合成例 AA量 (モル比) 水物 (設定薩) 固形 5 fffi (MM) 合成例 2—1 36 g (1. 0) 67 g (100) 101 合成例 2— 2 36 g (1. 0) 10 g (20) 21 [0105] [Table 2] Synthesis example AA amount (molar ratio) Water (setting 薩) Solid 5 fffi (MM) Synthesis example 2-1 36 g (1.0) 67 g (100) 101 Synthesis example 2-2 36 g (1. 0) 10 g (20) 21
[0106] 実施例 1 1、実施例 1 2、実施例 1 3:活性エネルギー線硬化型光学用組成物 の調製と評価 Example 1 1, Example 1 2, Example 1 3: Active energy ray-curable optical composition Preparation and evaluation
合成例 1— 1、合成例 1— 2、合成例 2— 2において合成したエポキシカルボキシレ ート化合物 (A)又はポリカルボン酸ィ匕合物(B)を 20g、ラジカル反応型の単量体であ り反応性化合物(C)としてのジペンタエリスリトールへキサアタリレートを 4g、紫外線 反応型光重合開始剤として「ィルガキュア 184」を 1. 5g添加し加熱溶解した。  20 g of the epoxycarboxylate compound (A) or polycarboxylic acid compound (B) synthesized in Synthesis Example 1-1, Synthesis Example 1-2, and Synthesis Example 2-2, a radical reaction type monomer Thus, 4 g of dipentaerythritol hexatalylate as the reactive compound (C) and 1.5 g of “Irgacure 184” as an ultraviolet reactive photopolymerization initiator were added and dissolved by heating.
[0107] これを、乾燥時の膜厚が 20 μ mになるようにハンドアプリケータによってポリカーボ ネート板上に塗工し、 80°Cで 30分間、電気オーブンにて溶剤を乾燥した。乾燥後、 高圧水銀ランプを具備した紫外線垂直露光装置 (オーク製作所製)によって照射線 量 lOOOmiZcm2の紫外線を照射して硬化させ、多層材を得た。 [0107] This was coated on a polycarbonate plate with a hand applicator so that the film thickness upon drying was 20 µm, and the solvent was dried in an electric oven at 80 ° C for 30 minutes. After drying, it was cured by irradiating with an ultraviolet ray having an irradiation dose of lOOOmiZcm 2 by an ultraviolet vertical exposure apparatus (manufactured by Oak Seisakusho) equipped with a high-pressure mercury lamp to obtain a multilayer material.
[0108] この多層材の塗膜の硬度を JIS K5600— 5— 4 : 1999により測定し、鉛筆硬度で 表 3に示し、更に衝撃性の試験を IS06272— 1 : 2002によって実施し、結果を表 3 に示した。  [0108] The hardness of the coating film of this multilayer material was measured according to JIS K5600-5: 4: 1999, shown in Table 3 as pencil hardness, and an impact test was conducted according to IS06272-1: 2002. It was shown in 3.
[0109] また、屈折率測定用試料として、上記組成物をポリプロピレン板上に同様の方法に よって塗工し、乾燥し、硬化反応させ、硬化後の塗膜を剥離し、 JIS K7142 : 1996 に従って屈折率を測定し、表 3に示した。  [0109] Further, as a sample for refractive index measurement, the above composition was applied to a polypropylene plate by the same method, dried, cured, and the cured coating film was peeled off. According to JIS K7142: 1996 The refractive index was measured and shown in Table 3.
[0110] 比較例 1 1  [0110] Comparative Example 1 1
比較合成例 1 1で合成したエポキシカルボキシレートイ匕合物を用いて、実施例 1 —1と同様な方法で、組成物を調製し、硬化させ、評価した。その結果を表 3に示した  Comparative Synthesis Example 11 Using the epoxy carboxylate compound synthesized in 1, a composition was prepared, cured, and evaluated in the same manner as in Example 1-1. The results are shown in Table 3.
[0111] [表 3] [0111] [Table 3]
[表 3 ] 醫謝生  [Table 3] Keisei Tsuji
実施例 合成例 屈折率 硬度  Example Synthesis Example Refractive Index Hardness
実施例 1 - 1 合成例 1 - 1 1 . 6 0 2 H 傷少しあり 実施例 1 - 2 合成例 1― 2 1 . 6 1 H 傷少しあり 実施例 1 - 3 合成例 2— 2 1 . 5 9 H 傷なし 比棚 1 - 1 比齢成例 1一 1 1 . 5 3 F 傷なし 以上の結果から、比較例のエポキシ榭脂から調製された組成物 ·硬化物と比較して 、本発明の特定のエポキシ榭脂から誘導された組成物 *硬化物は、強靭で、硬度が 高ぐまた、高い屈折率を有することが明らかである。 [0112] 実施例 2:活性エネルギー線硬化型光学用レジスト Example 1-1 Synthesis example 1-1 1. 6 0 2 H Slight scratch Example 1-2 Synthesis example 1-2 1.6 1 H 1 Scratch slightly Example 1-3 Synthesis example 2-2 1.5 9 H No scratch Ratio shelf 1-1 Specific age example 1 1 1 1 3 5 3 F No scratch From the above results, the present invention compared to the composition / cured product prepared from the epoxy resin of the comparative example A composition derived from a specific epoxy resin. * The cured product is tough, high in hardness and also has a high refractive index. [0112] Example 2: Active energy ray-curable optical resist
合成例 2— 1で得られたポリカルボン酸ィ匕合物(B)を 20g、反応性化合物(C)として のラジカル反応型の単量体であるジペンタエリスリトールへキサアタリレートを 4g、紫 外線反応型光重合開始剤としての「ィルガキュア 184」を 1. 5g添加し、加熱溶解した  20 g of the polycarboxylic acid compound (B) obtained in Synthesis Example 2-1, 4 g of dipentaerythritol hexaatalylate, a radical-reactive monomer as the reactive compound (C), purple 1.5 g of “Irgacure 184” as an external-reactive photopolymerization initiator was added and dissolved by heating.
[0113] これを乾燥時の膜厚が 20 mになるようにハンドアプリケータによって石英板上に 塗工し、 80°Cで 30分間、電気オーブンにて溶剤乾燥をした。乾燥後、塗工物の上か らマスクパターンを覆 ヽかぶせ、高圧水銀ランプを具備した紫外線垂直露光装置 (ォ ーク製作所製)によって照射線量 lOOOmiZcm2の紫外線を照射して硬化させ、多 層材を得た。次いで、 1重量%炭酸ナトリウム水溶液をスプレーし、未露光部を溶解 して現像した。 [0113] This was coated on a quartz plate with a hand applicator so that the film thickness at the time of drying was 20 m, and the solvent was dried in an electric oven at 80 ° C for 30 minutes. After drying, the mask pattern is covered on top of the coating, and cured by irradiating with UV radiation of lOOOmiZcm 2 using an UV vertical exposure device (manufactured by Oak Seisakusho) equipped with a high-pressure mercury lamp. The material was obtained. Then, a 1% by weight aqueous sodium carbonate solution was sprayed to dissolve the unexposed area and develop.
[0114] その結果、パターンを形成させることができ、本発明のポリカルボン酸ィ匕合物(B)は レジスト適性を有することが示された。  As a result, a pattern could be formed, indicating that the polycarboxylic acid compound (B) of the present invention has resist suitability.
[0115] 実施例 3 :光安定剤の効果について  [0115] Example 3: Effect of light stabilizer
実施例 1—1により得られた組成物に、光安定剤(D)として同組成物 5gに対し、 2, 4 ビス [2 ヒドロキシ一 4 ブトキシフエ-ル]— 6— (2, 4 ジブトキシフエ-ル) 1, 3, 5 トリァジン(チバスぺシャリティケミカルズ製、商品名: Tinuvin 460) 40m g、ビス(1, 2, 2, 6, 6 ペンタメチル— 4 ピペリジル) [ [3, 5 ビス(1, 1—ジメチ ルェチル)ー4ーヒドロキシフエ-ル]メチル]ブチルマロネート(チバスぺシャリティケミ カルズ製、商品名: Tinuvin 144;ヒンダードアミン系光安定剤) 40mg及びビス(2, 4ージー t ブチルフエ-ル)ペンタエリスリトールジホスファイト(チバスぺシャリティケ ミカルズ製、商品名:IRGAFOS XP60 ;酸ィ匕防止剤) 20mgを添加し、乾燥時の膜 厚が 20 μ mになるようにハンドアプリケータによって石英ガラス板上に塗工して、 80 °Cで 30分間、電気オーブンにて溶剤乾燥した。その後、高圧水銀ランプを具備した 紫外線垂直露光装置 (オーク製作所製)によって照射線量 lOOOmiZcm2の紫外線 を照射し硬化させ多層材を得た。 To the composition obtained in Example 1-1, 5 g of the same composition as a light stabilizer (D) was added 2, 4 bis [2 hydroxy-4-butoxy file] — 6- (2, 4 dibutoxy file). ) 1, 3, 5 Triazine (Ciba Specialty Chemicals, trade name: Tinuvin 460) 40 mg, bis (1, 2, 2, 6, 6 pentamethyl-4 piperidyl) [[3,5 bis (1, 1 —Dimethylruetyl) -4-hydroxyphenol] methyl] butylmalonate (product name: Tinuvin 144; hindered amine light stabilizer), 40 mg and bis (2,4-diethylbutylbutyl) pentaerythritoldi Add 20 mg of phosphite (Ciba Special Chemicals, trade name: IRGAFOS XP60; acid-fouling inhibitor), and apply onto a quartz glass plate with a hand applicator so that the film thickness when dried is 20 μm. At 30 ° C for 30 minutes. Was solvent drying in an oven. After that, a multilayer material was obtained by irradiating with an ultraviolet ray with an irradiation dose of lOOOmiZcm 2 by an ultraviolet vertical exposure apparatus (manufactured by Oak Manufacturing) equipped with a high-pressure mercury lamp.
[0116] これにフエドメータによって 1000時間の光照射を行い耐光性試験を実施した。 45 Onmにおける光の透過性を測定し、耐光性の指標として耐光性試験実施後の透過 率 Z実施前の透過率の比を求め、表 4に示した。 [0116] A light resistance test was performed by irradiating light for 1000 hours with a Fedometer. Measurement of light transmission at 45 Onm, and transmission after light resistance test as an indicator of light resistance The ratio of transmittance before implementation of rate Z was determined and shown in Table 4.
[0117] [表 4] [0117] [Table 4]
[表 4] 定性  [Table 4] Qualitative
実施例 光安 (D) 耐雄  Examples Mitsuyasu (D) Male resistance
実施例 3—1 あり 0. 8 0 実施例 3— 2 なし 0. 5 5 以上の結果から、光安定剤 (D)の添カ卩により光安定性の向上が図られることが示さ れた。  Example 3-1 Yes 0.80 Example 3-2 No 0.5 5 From the above results, it was shown that the light stability can be improved by adding the light stabilizer (D).
産業上の利用可能性  Industrial applicability
[0118] 本発明の特定構造を有するエポキシ榭脂から誘導される活性エネルギー線硬化型 光学用組成物は、比較的強靭な高い屈折率を有する硬化物を提供する。また、酸変 性することでアルカリ現像可能な光学用レジストとしての用途も可能である。また、成 形材料、皮膜形成用材料として使用でき、例えば、レンズ等の光学部品、塗料、フィ ルム等に好適に利用することができる。 [0118] The active energy ray-curable optical composition derived from the epoxy resin having the specific structure of the present invention provides a cured product having a relatively strong and high refractive index. In addition, it can be used as an optical resist that can be alkali-developed by acid modification. Further, it can be used as a molding material or a film forming material, and can be suitably used for optical parts such as lenses, paints, films, and the like.

Claims

請求の範囲 The scope of the claims
[1] 下記一般式(1)で表されるエポキシ榭脂 (a)に分子中にエチレン性不飽和基とカル ボキシル基を併せ持つ化合物(b)を反応させて得られるエポキシカルボキシレートイ匕 合物 (A)、及びエポキシカルボキシレートイ匕合物 (A)以外の活性エネルギー線によ り硬化反応性を示す反応性化合物 (C)を含むことを特徴とする高屈折率榭脂の製造 に用いられる活性エネルギー線硬化型光学用組成物。  [1] An epoxy carboxylate compound obtained by reacting an epoxy resin represented by the following general formula (1) (a) with a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule For the production of a high refractive index resin characterized by comprising a reactive compound (C) that exhibits curing reactivity by active energy rays other than the product (A) and the epoxy carboxylate compound (A). An active energy ray-curable optical composition used.
[化 2]  [Chemical 2]
Figure imgf000024_0001
Figure imgf000024_0001
(式中、 R1は、ハロゲン原子又は炭素数 1〜4のアルキル基を表し、同一でも異なつ ていてもよい。 mは 0〜4の整数を、 nは平均値で 1〜6の正数をそれぞれ表す) [2] 請求項 1に記載のエポキシカルボキシレートイ匕合物 (A)の水酸基に多塩基酸無水物  (In the formula, R1 represents a halogen atom or an alkyl group having 1 to 4 carbon atoms, and may be the same or different. M is an integer of 0 to 4, and n is a positive number of 1 to 6 on average. [2] A polybasic acid anhydride at the hydroxyl group of the epoxy carboxylate compound (A) according to claim 1.
(c)を反応させて得られるポリカルボン酸ィ匕合物(B)、及びポリカルボン酸ィ匕合物(B )以外の活性エネルギー線により硬化反応性を示す反応性ィ匕合物(C)を含むことを 特徴とする高屈折率榭脂の製造に用いられる活性エネルギー線硬化型光学用組成 物。  The polycarboxylic acid compound (B) obtained by reacting (c), and a reactive compound (C) that exhibits curing reactivity with active energy rays other than the polycarboxylic acid compound (B). An active energy ray-curable optical composition used for the production of a high refractive index resin.
[3] 一般式(1)の m力^である、請求項 1又は 2に記載の活性エネルギー線硬化型光学 用組成物。  [3] The active energy ray-curable optical composition according to claim 1 or 2, wherein the composition is m force ^ of the general formula (1).
[4] 反応性化合物 (C)が、ラジカル反応型の (メタ)アタリレート類、カチオン反応型のェ ポキシィ匕合物類及びその他のビニルイ匕合物類力も選ばれる化合物である、請求項 1 〜3のいずれか一項に記載の活性エネルギー線硬化型光学用組成物。  [4] The reactive compound (C) is a compound in which radical reaction type (meth) acrylates, cationic reaction type epoxy compounds and other vinyl compounds are also selected. The active energy ray-curable optical composition according to any one of?
[5] 更に、光安定剤 (D)を含む、請求項 1〜4の!、ずれか一項に記載の活性エネルギー 線硬化型光学用組成物。  [5] The method according to claims 1 to 4, further comprising a light stabilizer (D)! The active energy ray-curable optical composition according to claim 1.
[6] 請求項 1〜5の 、ずれか一項に記載の光学用組成物に活性エネルギー線を照射し て得られる硬化物である高屈折率樹脂。 [6] The optical composition according to any one of claims 1 to 5 is irradiated with active energy rays. High refractive index resin that is a cured product obtained by
請求項 6の高屈折率榭脂の層を少なくとも 1層有する光学多層材。 請求項 6の高屈折率榭脂を含有してなる光学用材料。 7. An optical multilayer material comprising at least one high refractive index resin layer according to claim 6. An optical material comprising the high refractive index resin of claim 6.
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