WO2008004630A1 - Active energy ray-curable composition for optical uses, and high-refractive index resin - Google Patents
Active energy ray-curable composition for optical uses, and high-refractive index resin Download PDFInfo
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- WO2008004630A1 WO2008004630A1 PCT/JP2007/063491 JP2007063491W WO2008004630A1 WO 2008004630 A1 WO2008004630 A1 WO 2008004630A1 JP 2007063491 W JP2007063491 W JP 2007063491W WO 2008004630 A1 WO2008004630 A1 WO 2008004630A1
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
- C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
- C08F290/06—Polymers provided for in subclass C08G
- C08F290/064—Polymers containing more than one epoxy group per molecule
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/20—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
- C08G59/32—Epoxy compounds containing three or more epoxy groups
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
Definitions
- the present invention includes an active energy ray-curable optical composition containing a compound derived from an epoxy resin having a specific structure and exhibiting high refractive index, and the composition is irradiated with active energy rays.
- the present invention relates to a high refractive index resin which is a cured product obtained in this manner, an optical multilayer material having a layer of the resin, and an optical material containing the composition.
- an epoxy talile monolith compound obtained by addition reaction of acrylic acid or the like with epoxy resin and a polybasic acid anhydride obtained by addition reaction of a polybasic acid anhydride with this epoxy acrylate polymer compound.
- Carboxylic acid compounds have been widely used because the cured product has excellent adhesion to the substrate, high thermal stability, and dimensional stability.
- resist materials for use in electrical and electronic parts can be used as compounds imparted with developability with an aqueous alkali solution by acid modification.
- Japanese Patent No. 2676422 and Japanese Patent Application Laid-Open No. 2005-129139 disclose an active energy ray-curable material of an epoxy atalyte toy product of an epoxy compound having a tetraphenylethane skeleton structure having excellent heat resistance and the like. Use as is described.
- Japanese Patent Application Laid-Open No. 2005-200527 describes a method for producing an epoxy compound having a high-purity tetrafluoroethane skeleton structure.
- an object of the present invention is to provide an optical composition that provides a cured product having excellent heat resistance, moisture resistance, and toughness and exhibiting a high refractive index.
- the present inventors include an epoxy carboxylate compound or a polycarboxylic acid compound derived from an epoxy resin having a specific skeleton.
- the present inventors have found that the composition gives a cured product having an excellent balance of the above-mentioned properties, and have reached the present invention.
- an active energy ray-curable optical composition used for a high refractive index resin the epoxy resin (a) represented by the following general formula (1): And a composition containing an epoxy carboxylate compound (A) obtained by reacting a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule.
- R to R may be the same or different from each other, and may be a hydrogen atom, a halogen atom or a carbon atom.
- a prime number 1 to 4 alkyl group is shown.
- Another aspect of the present invention has the following configuration.
- the present invention relates to the above-mentioned epoxy carboxylate compound (A) without polybasic acid.
- the present invention relates to an active energy ray-curable optical composition comprising a polycarboxylic acid compound (B) obtained by reacting water (c).
- R to R in the general formula (1) are hydrogen atoms
- the present invention relates to an active energy ray-curable optical composition in which the compound (b) having both a sum group and a carboxyl group is (meth) acrylic acid or cinnamic acid.
- the present invention further relates to an active energy ray-curable optical composition
- an active energy ray-curable optical composition comprising a reactive compound (C) other than the epoxy carboxylate compound (A) and the polycarboxylic oxide compound (B).
- the present invention further relates to an active energy ray-curable optical composition containing a light stabilizer (D).
- the present invention relates to a high refractive index resin that is a cured product obtained by irradiating the above optical composition with active energy rays.
- the present invention also relates to an optical material having the above resin layer.
- the present invention also relates to an optical material comprising the above optical composition.
- the activity of the present invention comprising an epoxy carboxylate compound (A) obtained by reacting an epoxy resin having a specific skeleton with a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule.
- a cured product obtained by irradiating a line-curable optical composition with a line of active energy is not only excellent in the balance between heat resistance and moisture resistance but also has a high transparency and a high refractive index.
- the cured product is a material excellent in mechanical properties such as toughness, and in particular, it is a film forming material excellent in adhesion to a substrate and scratch resistance.
- the resin composition of the present invention can be developed by alkali water solubility with polycarboxylic acid, it is also suitable as a material used for so-called optical resists. That is, for example, it is suitable for optical applications such as hard coats for display devices such as lenses, optical disks, and liquid crystal displays, films, and photoconductive materials such as optical waveguides.
- the active energy ray-curable optical composition of the present invention is a composition used for a high refractive index resin, wherein the general formula (1) (wherein R to R are the same or different from each other).
- a compound (b) having both an ethylenically unsaturated group and a carboxy group in the molecule is reacted with an epoxy resin (a) represented by an elementary atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms).
- an epoxy resin (a) represented by an elementary atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms The resulting epoxy carboxylate compound (A) or the polycarboxylate compound (B) obtained by reacting the epoxycarboxylate compound (A) with a polybasic acid anhydride (c) is included.
- R to R should be appropriately selected according to the intended use
- a straight or branched saturated carbonization having 1 to 4 carbon atoms such as a hydrogen atom, a methyl group, an ethyl group, an n propyl group, an i propyl group, an n butyl group, an i butyl group, and an s butyl group.
- R to R are halogen atoms such as chlorine atom, bromine atom and iodine atom
- the epoxy resin (a) represented by the general formula (1) has a production method described in, for example, Japanese Patent Application Laid-Open No. 2005-200527, and can be produced according to the method. .
- a commercial product (Nippon Kayaku product name: GTR-1800:-R to R in general formula (1) are all hydrogen sources.
- Copolymer with epoxy value of 170 g / eq, manufactured by Japan Epoxy Resin Product name: j ER1031S: —R to R in general formula (1) are all hydrogen atoms, epoxy value is 200 gZeq
- the epoxy resins (a) those having an epoxy equivalent of less than 180 gZ equivalent are particularly preferred. The reason for this is that more ethylenically unsaturated bonds can be introduced, and mechanical strength is imparted to the resulting cured product, resulting in a tougher grease.
- the high purity epoxy resin (a) represented by the general formula (1) produced by the method described in JP-A-2005-200527 is an epoxy resin having a small epoxy equivalent.
- the epoxy resin ( a ) is an optical composition of the present invention, and the composition is irradiated with active energy rays. It is suitable for a high refractive index resin which is a cured product obtained by irradiation, an optical multilayer material having the resin layer, and an optical material containing the composition.
- the epoxycarboxylate compound (A) used in the active energy ray-curable optical composition of the present invention comprises a compound (b) having both an ethylenically unsaturated group and a carboxy group in the epoxy resin (a). It can be obtained by reaction (epoxycarboxylate step).
- the polycarboxylic oxide compound (B) used in the active energy ray-curable optical composition of the present invention is obtained by further reacting an epoxy carboxylate compound (A) with a polybasic acid anhydride (c) (acid addition). Step).
- the purpose of the epoxy carboxylate solution process is to introduce an ethylenically unsaturated group, which is a reactive group of active energy rays, into the skeleton of the epoxy resin. Specifically, it is a reaction between an epoxy group and a carboxy group.
- Examples of the compound (b) having both an ethylenically unsaturated group and a carboxy group include (meth) acrylic acid, crotonic acid, a cyanocinnamic acid, cinnamic acid, or a compound having both an unsaturated group and a hydroxyl group. Or the compound etc. which reacted the unsaturated dibasic acid are mentioned.
- a compound obtained by reacting a compound having both an unsaturated group and a hydroxyl group with a saturated or unsaturated dibasic acid is, for example, a (meth) acrylate derivative having one hydroxyl group in one molecule.
- examples thereof include semiesters obtained by reacting saturated or unsaturated dibasic acid anhydrides in an equimolar amount.
- hydroxyalkyl (meth) acrylate such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, maleic anhydride, succinic anhydride, phthalic anhydride,
- hydroxyalkyl (meth) acrylate such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate
- maleic anhydride succinic anhydride, phthalic anhydride
- phthalic anhydride examples thereof include compounds obtained by reacting a saturated or unsaturated dibasic acid such as partial or total hydrogenated phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and the like.
- the compound (b) is preferably a monocarboxylic acid.
- the ratio of the molar amount of the monocarboxylic acid to the molar amount of the polycarboxylic acid is preferably 15 or more.
- Compound (b) includes active energy when the active energy ray-curable optical composition is used.
- the proportion of the epoxy resin (a) and the compound (b) used in this reaction should be appropriately changed depending on the application. That is, when all of the epoxy groups are carboxylated, unreacted epoxy groups do not remain, so that the storage stability as the epoxy strength noroxylate compound (A) is high. In this case, only the reactivity due to the introduced double bond is used for the curing reaction.
- the charge ratio of epoxy resin (a) and compound (b) is 1 equivalent of epoxy group of epoxy resin (a).
- the carboxyl group of the compound (b) is 0.990-1.20 equivalent. If it is this range, it will not gelatinize in the acid addition process without an epoxy group remaining, and the storage stability of rosin is good. When the charged amount of the compound (b) is within this range, the stability of the resin with less epoxy groups in which the compound (a) remains is improved.
- the epoxy carboxylate solution process may be used without using a solvent.
- the solvent is not particularly limited as long as the reaction is not affected.
- the solvent include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene and tetramethylbenzen, aliphatic hydrocarbon solvents such as hexane, octane and decane, petroleum ether which is a mixture thereof, white Examples include gasoline, solvent naphtha, ester solvents, ether solvents, and ketone solvents.
- ester solvents include alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate, cyclic esters such as 0-butyrolatatane, ethylene glycol monomethyl etherate acetate, diethylene glycol nolemonomethineate nole monoacetate.
- Examples of the ether solvent include alkyl ethers such as jetyl ether and ethylbutyl ether, ethylene glycol-no-resin methinore etherol, ethylene glycol jetyl ether, dipropylene glycol dimethyl ether, dipropylene glycol jetyl ether, Examples thereof include Daricol ethers such as triethylene glycol dimethyl ether and triethylene glycol jetyl ether, and cyclic ethers such as tetrahydrofuran.
- alkyl ethers such as jetyl ether and ethylbutyl ether
- ethylene glycol-no-resin methinore etherol ethylene glycol jetyl ether
- dipropylene glycol dimethyl ether dipropylene glycol jetyl ether
- Examples thereof include Daricol ethers such as triethylene glycol dimethyl ether and triethylene glycol jetyl ether, and cyclic ethers such as
- ketone solvent examples include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.
- the reactive compound (C 2) described later can be used, and these can be used alone or in combination. This is preferable because it can be used as it is as the active energy ray-curable optical composition of the present invention.
- a catalyst may be used during the epoxy carboxylate step to promote the reaction.
- the catalyst is used in an amount of about 0.1 to 10% by weight based on the total amount of the reactants. Is preferred.
- the catalyst include triethylamine, benzyldimethylamine, chloride triethylamine, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, triphenylphosphine, and triphenylstibine.
- basic catalysts such as methyltristibine, chromium octoate, and zirconium octoate.
- the reaction temperature of the epoxy carboxylate soot process is 60 to 150 ° C.
- the reaction time is preferably 5 to 60 hours.
- thermal polymerization inhibitors in the epoxy carboxylate tank process include: Hydone quinone monomethyl ether, 2-methylhydroquinone, hydroquinone, diphenylpicrylhydrazine, diphenylamine, 3,5-ditert-butyl-4-hydroxytoluene, etc. Is preferred.
- the time when the acid value of the sample (according to J IS K5601-2-1: 1999) becomes 3 mg'KOH / g or less, preferably 2 mg'KOH Zg or less, is sampled appropriately. The end point.
- X is represented by the following structure X 1 or X 2 (R is a residue of compound (b)).
- a polybasic acid anhydride (c) is reacted with the hydroxyl group produced by the epoxy carboxylate oxidation step, and a polycarboxylic acid compound (B) in which a carboxyl group is introduced via an ester bond. ).
- the polybasic acid anhydride (c) is not particularly limited as long as it is a compound having an acid anhydride structure in the molecule.
- 4-methyl-hexahydrophthalic anhydride, trimellitic anhydride or maleic anhydride are preferred.
- a polybasic acid anhydride is added to the reaction solution of the epoxy carboxylate solution step.
- the polyrubonic acid compound (B) used in the active energy ray-curable optical composition of the present invention is used as an alkali development resist, the finally obtained polycrystal is used.
- the calculated amount of the solid acid value of the carboxylic acid compound (B) (JIS K5601-2-1: 1999) is 40 to: LOOmg'KOHZg, more preferably 60 to 90 mg'KOH / g It is preferable to charge polybasic acid anhydride (c).
- the solid content acid value is smaller than this range! /, The developability of the aqueous solution of the active energy ray-curable optical composition is remarkably lowered, and in the worst case, development is impossible.
- a catalyst to accelerate the reaction.
- the amount of the catalyst used is preferably about 0.1 to 10% by weight based on the total amount of the reaction product.
- Examples of the catalyst include triethylamine, benzyldimethylamine, sodium salt triethylamine, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide.
- Examples include yuum, triphenylphosphine, triphenylstibine, methyltriphenylstibine, chromium oxalate, and zirconium octoate.
- the reaction temperature in the acidification step is 60 to 150 ° C.
- the reaction time is preferably 5 to 60 hours.
- the reaction is carried out without solvent or diluted with a solvent.
- the solvent is not particularly limited as long as the reaction is not affected.
- a solvent that does not affect the acid addition step may be used in the acid addition step without removing the solvent.
- the solvent examples include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzen, aliphatic hydrocarbon solvents such as hexane, octane, and decane, petroleum ether that is a mixture thereof, white Examples include gasoline and solvent naphtha.
- alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate
- y cyclic esters such as butyrolatatane, ethylene glycol monomethyl etherate acetate, diethyleneglycolone monomethineate nole monoacetate , Diethylene glyconomonoethylenoatenole monoacetate, triethyleneglycolenomonoethylenoleate termonoacetate, diethylene glycol monobutyl ether monoacetate, propylene glycol monomethyl ether monoacetate, butylene glycol monorenomethylenoleate termonoacetate
- mono- or polyalkylene glycol monoalkyl ether monoacetates dialkyl glutarate, dialkyl succinate, dialkyl adipate, etc.
- Carboxylic acid alkyl esters such as mono- or polyalkylene glycol monoalkyl ether monoacetates, dialkyl glutarate
- alkyl ethers such as jetyl ether and butylbutyl ether, ethylene glyconoresin methinore etherol, ethylene glycol jetyl ether, dipropylene glycol dimethyl ether, dipropylene glycol jetyl ether , Dalicol ethers such as triethylene glycol dimethyl ether and triethylene glycol jetyl ether, and cyclic ethers such as tetrahydrofuran.
- ketone solvents acetone, methyl ethyl ketone, cyclohexanone, isophorone Etc.
- the reactive compound (C) described later can be used, and these can be used alone or in combination.
- a preferable heat polymerization inhibitor in the acidification step is the same as that in the epoxy carboxylate step. Can be used.
- the acid addition step is terminated when the acid value of the reaction product is in the range of plus or minus 10% of the acid value set according to the intended application while sampling appropriately.
- Y is the following structure Y 1 or Y 2 (R is the residue of the compound (b), R 1 is the compound
- the reactive compound (C) other than the epoxycarboxylate compound (A) and the polycarboxylic acid compound (B) used in the active energy ray-curable optical composition of the present invention is an activity. It is a compound that shows reactivity by energy rays.
- the reactive compound (C) is useful for imparting physical properties before and after curing according to the purpose of use, depending on its properties. Examples of the reactive compound (C) include so-called reactive oligomers such as radical-reactive (meth) acrylates, cation-reactive epoxy compounds, and other Bury compounds. .
- the (meth) acrylates include monofunctional (meth) acrylates, polyfunctional (meth) acrylates, epoxy carboxylate compounds (A), and polycarboxylic acid compounds (B). Epoxy (meth) acrylates, polyester (meth) acrylates, urethane (meth) acrylates and the like.
- Monofunctional (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, lauryl (meth) acrylate, polyethylene glycol (meth) acrylate. , Polyethylene glycol (meth) acrylate monomethyl ether, phenyl (meth) acrylate, isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, tetrahydrofurfuryl ( (Meta) Atarirate.
- Polyfunctional (meth) acrylates include butanediol di (meth) acrylate, hexane diol di (meth) acrylate, neopentyl glycol di (meth) acrylate, nonanediol all (meth) acrylate, Glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, tris (meth) ateroyloxyschetil isocyanurate, polypropylene glycol di (meth) acrylate, adipic acid Epoxy di (meth) acrylate, bisphenol ethylene oxide di (meth) ate relay , Hydrogenated bisphenol ethylene oxide (meth) acrylate, bisphenol di (meth) acrylate, di- (meth) acrylate, dipentaerythritol with ⁇ -strength prolatatone of hydroxypentavalylate ne
- the cation-reactive epoxy compounds that are the reactive compound (C) are not particularly limited as long as they are generally compounds having an epoxy group.
- Examples of the beryl compound as the reactive compound (C) include butyl ethers, styrenes, and other bur compounds.
- Examples of bur ethers include ethyl bilene ethere, propino levino eno ethenore, hydroxy ethino levino eno ethenore, and ethylene glycol dibule ether.
- Examples of styrenes include styrene, methyl styrene, ethyl styrene and the like.
- Other Birui compound is triallyl isocyanu Rate and the like.
- radical-curable (meth) acrylates are preferred.
- carboxylic acid and epoxy group react, so it is necessary to use a two-component mixed type that is mixed at the time of use.
- the active energy ray-curable optical composition of the present invention contains the reactive compound (C), the epoxy carboxylate compound (A) or the polycarboxylic acid compound ( B) is 90 to 5% by weight, preferably 80 to 10% by weight, and the reactive compound (C) is 3 to 90% by weight, preferably 13 to 80% by weight. Other components may be included as necessary.
- the active energy ray-curable optical composition of the present invention is cured by irradiation with active energy rays.
- the active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X-rays, gamma rays, and laser rays, and particle rays such as alpha rays, beta rays, and electron beams.
- the active energy ray-curable optical composition of the present invention can be appropriately selected depending on the use, but among these, ultraviolet rays, laser beams, visible rays, or electron beams are preferable.
- active energy rays for curing with active energy rays, for example, a xenon lamp, a carbon arc, etc.
- Use light sources such as germicidal lamps, fluorescent lamps for ultraviolet rays, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, electrodeless lamps, metal halide lamps, or electron beams from scanning or curtain-type electron beam accelerators. Can do.
- the active energy ray-curable optical composition of the present invention is cured by ultraviolet irradiation, the amount of ultraviolet irradiation necessary for curing may be about 300 to 3000 mjZcm 2 .
- the present invention also includes a high refractive index resin which is a cured product.
- a light stabilizer for the purpose of imparting light resistance to the active energy ray-curable optical composition of the present invention.
- a light stabilizer means that light is applied for a long time.
- the light stabilizer (D) includes compounds used as ultraviolet absorbers, antioxidants, and the like.
- the light stabilizer (D) bis (1, 2, 2, 6, 6 pentamethyl-4-piperidyl) [[3,5 bis (1,1-dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate (for example, Hindered amine light stabilizers such as Tinuvin 144 manufactured by Ciba Specialty Chemicals).
- Examples of the light stabilizer (D) include 2- (2 hydroxy-5 t-butylphenol) -2H benzotriazole (for example, Tinuvin PS manufactured by Ciba Specialty Chemicals), 3-(2H benzo Triazole-2-yl) -5- (1,1-dimethylethyl) -4 hydroxybenzenepropanoic acid branched and straight chain (C7-C9) alkyl esters (for example, Tinuvin 99-2 from Ciba Specialty Chemicals) ), 3- (2H benzotriazole 2-yl) -5- (1,1-dimethylethyl) -4-hydroxybenzenepropanoic acid branched and straight chain (C7-C9) alkyl esters (eg, Tinuv from Ciba Specialty Chemicals) in 384-2 etc.), 2- (2H benzotriazole 2-yl) 4, 6 Bis (1-methyl-1-fe-ruethyl) phenol (eg, Tinuvin from Cib
- Benzotriazole-based UV absorbers such as 2)-(4,6 bis (2,4 dimethylphenol) -1,1,3,5 triazine-2-yl) 5 hydroxyphenol and oxysilane ( Products of reaction with [(C10-C 16 mainly C 12—C 13 alkyloxy) methyl] oxysilane) (for example, Tinuvin 400 manufactured by Ciba Specialty Chemicals), 2— (2,4-dihydroxyphenyl) , 6 bis (2,4 dimethylphenol) 1, 3, 5 product of reaction of triazine with (2-ethylhexyl) -glycidic acid ester (eg Tinuvin 405 from Ciba Specialty Chemicals), 2, 4 bis [2 Hydroxy 4-butoxyphenyl] —6— (2, 4 Dibutoxyphenyl) — 1, 3, 5 Triazine (eg Tinuvin 460 from Ciba Specialty Chemicals) etc. Hydroxytritriazine (HPT) Ultraviolet rays An absorb
- HPT hydroxyphenyl triazine
- the light stabilizer (D) for example, tetrakis (2,4 tert-butylphenol) [1,1,2-biphenyl] -4,4,1 dilbisphosphonite (eg Cibas) Phosphite-based anti-oxidants such as IRGAFOS XP40 manufactured by Chemicals Chemicals, Inc.), bis (2,4 di-t-butylphenol) pentaerythritol diphosphite (eg IRGAFOS XP60 manufactured by Ciba Specialty Chemicals Co., Ltd.) Or pentaerythritol tetrakis [3— (3,5 tert-butyl 4-hydroxyphenol) propionate (eg, IRGANOX 1010 manufactured by Ciba Specialty Chemicals), thiojetylene bis [3— (3,5 di- t-butyl 4-hydroxyphenyl) propionate] (for example, IRGANOX 1035 manufactured by Ciba Specialty Chemicals
- the light stabilizer (D) When the light stabilizer (D) is used, one or more of the above may be used.
- the use ratio in the active energy ray-curable optical composition of the present invention is preferably 0.1 to 5% by weight, more preferably 0.5. ⁇ 3% by weight.
- the amount is less than this, the effect as a sufficient stabilizer is not exhibited, and when the amount is too large, the curing reaction by active energy rays may be inhibited.
- other components may be added up to 70% by weight of the composition.
- Other components include photopolymerization initiators, coloring materials, other additives, and the like.
- Examples of the photopolymerization initiator include benzoins such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutinoreethenole; acetophenone, 2,2-diethoxy-1- Phenolacetophenone, 2, 2-diethoxy-1, 2-phenacetophenone, 1,1-dichloroacetophenone, 2-hydroxy 2-methyl-phenylpropane 1-one, diethoxyacetophenone, 1-hydroxyxin cyclohexylphene Luketone, 2-methyl-1 [4 (methylthio) phenol] 2 Acetophenones such as 2-morpholinopropane 1-one; 2-anthylanthraquinone, 2-tert-butylanthraquinone, 2-chloro anthraquinone, anthraquinones such as 2-amylanthraquinone; 2, 4 jetylthioxanthone Thio
- Nippon Senshoku Dye NK a borate initiator
- photoacid generators for example, 9-phenolacridine, 2, 2, —bis (o-cross-hole), 4, 4 ,, 5, 5, one tetraphenol 1, 2 Biimidazole (Kurokin Kasei Biimidazole, etc.), 2, 2-azobis (2-aminopropane) dihydrochloride (Wako Pure Chemicals V50, etc.), 2, 2 Azobis [2— (Imidazoline 1 2 yl ) Propane] dihydrotalolide (VA044, etc., manufactured by Wako Pure Chemical Industries, Ltd.), [eater 5-2-4- (cyclopentadecyl) (1, 2, 3, 4, 5, 6, ita) (methylethyl) benzene] iron ) Cationic initiators such as hexafluorophosphonate (Irgacure 261, etc., manufactured by Ciba Geigy).
- Cationic initiators such as hexafluorophosphonate (Irgacure 261, etc
- an azo-based initiator such as azobisisobutyryl-tolyl, or a peroxide-based radical-type initiator sensitive to heat such as benzoyl peroxide may be used in combination with the photopolymerization initiator. Also, use both radical and cationic initiators together.
- the content of the initiator is about 0.1 to 10%.
- coloring materials include organic pigments such as phthalocyanine, azo, and quinacridone, organic pigments such as titanium oxide, carbon black, bengara, zinc oxide, barium sulfate, and talc, and publicly known general coloring. And extender pigments can be used.
- thermosetting catalysts such as melamine, talc, barium sulfate, calcium carbonate, magnesium carbonate, barium titanate, hydroxyaluminum hydroxide, acidic aluminum, silica.
- Fillers such as clay, thixotropy imparting agents such as Aerosil, lid opening It is possible to use cyanine blue, phthalocyanine green, titanium oxide, silicone, fluorine-based repellents and antifoaming agents, polymerization inhibitors such as hydroquinone and hydroquinone monomethyl ether, and the like.
- rosins that are not reactive with the active energy ray can also be used.
- resins include epoxy resins other than the above, phenol resins, urethane resins, polyester resins, ketone formaldehyde resins, cresol resins, xylene resins, diallyl phthalate resins, styrene resins. , Guanamine resin, natural or synthetic rubber, acrylic resin, polyolefin resin, or modified products thereof. These are preferably used in the range of up to 40% by weight in the composition!
- a solvent may be added in the composition in the range of about 60% by weight, preferably about 50% by weight.
- a solvent in the above-mentioned carboxylate reaction and acid addition step may be used.
- the present invention also includes an optical material containing the above active energy ray-curable optical composition and used for the purpose of optically refracting light.
- Optical applications include, for example, lens materials such as convex lenses, concave lenses, micro lenses, Fresnel lenses, and lenticular lenses; light guide materials used in liquid crystal display devices; sheets and films processed into plates, disks, etc .; uncured A so-called nanoimprint material, which is formed by pressing a finely processed “mold” into the composition; a sealing material for protecting the element, particularly a sealing material for a light emitting diode, a photoelectric conversion element, etc. Etc.
- the optical composition of the present invention comprises a coating material such as a hard coat, a top coat, an overprint varnish, and a clear coat; an adhesive material such as a laminate, an optical disc, and various other adhesives; an adhesive; It is also suitably used for film formation that requires a high refractive index, such as a resist material such as a ladder resist, etching resist, or micromachine resist. Furthermore, it can be used as a so-called dry film in which a film-forming material is temporarily applied to a peelable substrate to form a film and then bonded to the originally intended substrate to form a film.
- lens materials such as convex lens, concave lens, micro lens, Fresnel lens, lenticular lens, hard coat, top coat, overprint Use as a coating material such as tonis and clear coat is particularly preferred.
- the adhesion to the base material was enhanced by the carboxyl group in view of the above-mentioned use. Therefore, it can be used as an application for coating a plastic substrate or a metal substrate.
- the composition can also be used as a resist material composition for alkali developable optics that requires a high refractive index by taking advantage of its solubility in an alkaline solution. That is, it is used for forming a film layer of the composition on a substrate, partially irradiating active energy rays such as ultraviolet rays, and dissolving and removing unirradiated portions with an alkaline solution or the like to draw. .
- the method of forming the film is not particularly limited, and intaglio printing method such as gravure, relief printing method such as flexo, stencil printing method such as silk screen, lithographic printing method such as offset, etc.
- intaglio printing method such as gravure
- relief printing method such as flexo
- stencil printing method such as silk screen
- lithographic printing method such as offset, etc.
- Various coating methods such as “Ta ' ⁇ ”, Knife co ⁇ ⁇ "' ⁇ ”, Daiko 1 ⁇ Ta ' ⁇ "Power” ⁇ "Tenko. ⁇ "Ta' ⁇ ", Spinco 1 ⁇ Ta ' ⁇ ”, etc. Can be arbitrarily adopted.
- a high refractive index resin is a value obtained by measuring the refractive index of a cured product obtained by irradiating active energy rays in accordance with J IS K7142: 1996, which is approximately 1.55 or more. Is greaves
- the active energy ray-curable optical composition is formed into a film on a substrate.
- optical multilayer material comprising at least two layers of a high refractive index resin obtained by curing is also included.
- Epoxy equivalent Measured by the method described in JIS— ⁇ 7236: 2001.
- Nippon Kayaku GTR-1800 epoxy resin having a tetrafluoroethane structure as epoxy resin (a), is ethylenically unsaturated in the molecule.
- Epoxy resin (a) as epoxy resin having tetraphenol structure made of Japan Epoxy Resin jER1031S (epoxy value 200g / eq) 100g, acrylic acid (abbreviation AA, molecular weight 72) are listed in Table 1. The amounts were mixed and reacted. Reaction conditions and the like are the same as those in Synthesis Example 1-1 and Synthesis Example 12.
- NERg 1202 epoxy value 292gZeq
- a multifunctional bisphenol A type resin 146g
- Synthesis Example 1-1 Synthesis Example 1-2, Synthesis Example 1-3, Synthesis Example 2-2
- Epoxy carboxylate compound (A) or polycarboxylic acid compound (B) 20g, radical curable type 4g of dipentaerythritol hexaatalylate as a reactive compound (C) and 1.5g of Irgacure 184 as an ultraviolet-reactive photopolymerization initiator are mixed and dissolved by heating. A composition was obtained.
- the ultraviolet OOmiZcm 2 was obtained by irradiating the optical material is cured.
- the film hardness (pencil hardness) of this optical material was measured according to JIS 13 ⁇ 4600-5-4: 1999, and an impact resistance test (weight drop test) was conducted according to IS06272-1: 2002. The results are shown in Table 3. In the weight drop test, “no scratches visually” was evaluated as “no scratches”, and “scratches that can be visually confirmed on the coating surface” were evaluated as “scratches”.
- Comparative Example 1 1 Comparative Synthetic Example 1-1 A reactive epoxycarboxylate compound synthesized in Example 1 was prepared in the same manner as in Example 1-11, and the hardness, impact resistance and refractive index of the coating film were evaluated. . The results are shown in Table 3.
- the cured product of the composition prepared from the specific epoxy resin of the present invention is tougher and harder than the cured product of the composition prepared from the epoxy resin of the comparative example. However, it has a high refractive index and is suitable for optical applications.
- Example 1-1 the cured product of the composition prepared from epoxy resin ( a ) having an epoxy equivalent of less than 180 g / equivalent is a tougher cured product.
- Example 1-1 the cured product of the composition prepared from epoxy resin ( a ) having an epoxy equivalent of less than 180 g / equivalent is a tougher cured product.
- Example 2 Preparation and evaluation of active energy ray-curable optical resist
- Example 3-1 and Example 3-2 Light stabilizer
- Example 1-1 To the composition obtained in Example 1-1, 5 g of the same composition as a light stabilizer (D) was added 2, 4-bis [2 hydroxy-4-butoxyphenol] -6- (2, 4 dibutoxyphenol. -1) 1, 3, 5 Triazine (trade name: Tinuvin 460 manufactured by Ciba Specialty Chemicals), 40 mg bis (1, 2, 2, 6, 6 pentamethyl-4 piperidyl) [[3,5 Bis (1 , 1-dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate (trade name: Tinuvin 144 manufactured by Ciba Specialty Chemicals; hindered amine light stabilizer) and bis (2,4-di-tert-butylphenol) E) Add 20 mg of pentaerythritol diphosphite (trade name: IRGAFOS XP60 manufactured by Ciba Specialty Chemicals; antioxidant), and use a quartz glass plate with a hand applicator so that the film thickness when dried is 20 microns
- the solvent is dried in an electric oven at 80 ° C for 30 minutes.
- the optical material is cured by irradiating with an ultraviolet ray with an irradiation dose of lOOOmiZcm 2 using an ultraviolet vertical exposure device (Oak Manufacturing) equipped with a high-pressure mercury lamp. Obtained (Example 3-1).
- the active energy ray-curable optical composition derived from an epoxy resin having a specific structure according to the present invention provides a cured product that is relatively tough and has a refractive index and excellent transparency. It can also be used as an optical resist that can be alkali-developed by acid modification. Further, it can be used as a molding material or a film forming material, and can be suitably used for optical parts such as lenses, paints, films, and the like.
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Abstract
Disclosed is an active energy ray-curable composition for optical uses, which can be used in a high-refractive index resin. The composition comprises an epoxycarboxylate compound (A) produced by reacting an epoxy resin (a) represented by the general formula (1) with a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule. (1) wherein R1 to R8 independently represent a hydrogen atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms.
Description
明 細 書 Specification
活性エネルギー線硬化型光学用組成物及び高屈折率樹脂 Active energy ray-curable optical composition and high refractive index resin
技術分野 Technical field
[0001] 本発明は、特定の構造を有するエポキシ榭脂から誘導される化合物を含み、高屈 折率性を示す活性エネルギー線硬化型光学用組成物、該組成物に活性エネルギー 線を照射して得られる硬化物である高屈折率榭脂、該榭脂の層を有する光学多層材 料並びに該組成物を含有してなる光学用材料に関する。 [0001] The present invention includes an active energy ray-curable optical composition containing a compound derived from an epoxy resin having a specific structure and exhibiting high refractive index, and the composition is irradiated with active energy rays. The present invention relates to a high refractive index resin which is a cured product obtained in this manner, an optical multilayer material having a layer of the resin, and an optical material containing the composition.
背景技術 Background art
[0002] 従来から、例えば、エポキシ榭脂にアクリル酸等を付加反応させたエポキシアタリレ 一トイヒ合物、及びこのエポキシアタリレートィヒ合物に多塩基酸無水物を付加反応させ て得られるポリカルボン酸化合物は、硬化物の硬さゃ基材への密着性、高い熱安定 性、寸法安定性に優れるため広く用いられてきた。特に、電気、電子部品用途にお けるレジスト材料においては、酸変性することで、アルカリ水溶液による現像性が付 与された化合物として用いられて ヽる。 [0002] Conventionally, for example, an epoxy talile monolith compound obtained by addition reaction of acrylic acid or the like with epoxy resin, and a polybasic acid anhydride obtained by addition reaction of a polybasic acid anhydride with this epoxy acrylate polymer compound. Carboxylic acid compounds have been widely used because the cured product has excellent adhesion to the substrate, high thermal stability, and dimensional stability. In particular, resist materials for use in electrical and electronic parts can be used as compounds imparted with developability with an aqueous alkali solution by acid modification.
[0003] 特許第 2676422号公報及び特開 2005— 129139号公報には耐熱性等に優れる テトラフエニルェタン骨格構造を有するエポキシィ匕合物のエポキシアタリレートイ匕物の 活性エネルギー線硬化型材料としての使用が記載されている。また、特開 2005— 2 00527号公報には高純度のテトラフエ-ルェタン骨格構造を有するエポキシィ匕合物 の製造法にっ 、て記載されて 、る。 [0003] Japanese Patent No. 2676422 and Japanese Patent Application Laid-Open No. 2005-129139 disclose an active energy ray-curable material of an epoxy atalyte toy product of an epoxy compound having a tetraphenylethane skeleton structure having excellent heat resistance and the like. Use as is described. Japanese Patent Application Laid-Open No. 2005-200527 describes a method for producing an epoxy compound having a high-purity tetrafluoroethane skeleton structure.
[0004] し力しながら、このテトラフエ-ルェタン骨格構造を有するエポキシィ匕合物のェポキ シァクリレートイ匕物を含む光学用糸且成物やその高屈折率榭脂としての使用について は知られていなかった。 [0004] However, it has not been known about the use of an epoxy compound having an tetraphenylethane skeleton structure as an optical yarn containing an epoxy acrylate and its use as a high refractive index resin. .
又、カルボン酸変性による密着性や強靭性等の付与やアルカリ現像液によるパタ
、ての記載もな!/、。 In addition, adhesion and toughness due to carboxylic acid modification and patterning with alkaline developer Also, there is no mention!
発明の開示 Disclosure of the invention
発明が解決しょうとする課題 Problems to be solved by the invention
[0005] 近年、より高い強靭性を有する光学材料が求められるようになってきている。また、
単に硬 、と 、うだけではなく衝撃等によっても割れな 、程度の硬度を有する硬化皮 膜等も求められている。 In recent years, optical materials having higher toughness have been demanded. Also, There is also a need for a hardened film having a certain degree of hardness that is not only hard but not broken by impact or the like.
従って、本発明は、耐熱性、耐湿性、強靭性に優れ、高屈折率を示す硬化物を与 える光学用組成物を提供することを目的とする。 Accordingly, an object of the present invention is to provide an optical composition that provides a cured product having excellent heat resistance, moisture resistance, and toughness and exhibiting a high refractive index.
課題を解決するための手段 Means for solving the problem
[0006] 本発明者らは前記課題を解決すべく鋭意研究を行った結果、特定の骨格を有する エポキシ榭脂から誘導されるエポキシカルボキシレートイ匕合物又はポリカルボン酸ィ匕 合物を含む組成物が上記の各特性のバランスに優れる硬化物を与えることを見出し 本発明に至った。 [0006] As a result of intensive studies to solve the above-mentioned problems, the present inventors include an epoxy carboxylate compound or a polycarboxylic acid compound derived from an epoxy resin having a specific skeleton. The present inventors have found that the composition gives a cured product having an excellent balance of the above-mentioned properties, and have reached the present invention.
[0007] 即ち、本発明の 1つの態様としては、高屈折率榭脂に用いられる活性エネルギー線 硬化型光学用組成物であって、下記一般式(1)で示されるエポキシ榭脂(a)に、分 子中にエチレン性不飽和基とカルボキシル基を併せ持つ化合物 (b)を反応せしめて 得られるエポキシカルボキシレートイ匕合物 (A)を含む組成物に関する。 [0007] That is, as one aspect of the present invention, there is provided an active energy ray-curable optical composition used for a high refractive index resin, the epoxy resin (a) represented by the following general formula (1): And a composition containing an epoxy carboxylate compound (A) obtained by reacting a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule.
[0008] [化 1] [0008] [Chemical 1]
(1 ) (1)
[0009] (式中、 R〜Rは各々同一でも異なっていてもよぐ水素原子、ハロゲン原子又は炭 [Wherein, R to R may be the same or different from each other, and may be a hydrogen atom, a halogen atom or a carbon atom.
1 8 1 8
素数 1〜4のアルキル基を示す。 ) A prime number 1 to 4 alkyl group is shown. )
[0010] 本発明の他の態様は以下の構成を有する。 [0010] Another aspect of the present invention has the following configuration.
すなわち、本発明は、上記のエポキシカルボキシレートイ匕合物 (A)に多塩基酸無
水物(c)を反応せしめて得られるポリカルボン酸ィ匕合物(B)を含む活性エネルギー 線硬化型光学用組成物に関する。 That is, the present invention relates to the above-mentioned epoxy carboxylate compound (A) without polybasic acid. The present invention relates to an active energy ray-curable optical composition comprising a polycarboxylic acid compound (B) obtained by reacting water (c).
また本発明は、一般式(1)の R〜Rが水素原子であり、分子中にエチレン性不飽 In the present invention, R to R in the general formula (1) are hydrogen atoms, and
1 8 1 8
和基とカルボキシル基を併せ持つ化合物 (b)が (メタ)アクリル酸又は桂皮酸である活 性エネルギー線硬化型光学用組成物に関する。 The present invention relates to an active energy ray-curable optical composition in which the compound (b) having both a sum group and a carboxyl group is (meth) acrylic acid or cinnamic acid.
また本発明は、更に、エポキシカルボキシレートイ匕合物(A)及びポリカルボン酸化 合物(B)以外の反応性化合物(C)を含む活性エネルギー線硬化型光学用組成物 に関する。 The present invention further relates to an active energy ray-curable optical composition comprising a reactive compound (C) other than the epoxy carboxylate compound (A) and the polycarboxylic oxide compound (B).
また本発明は、更に、光安定剤(D)を含む活性エネルギー線硬化型光学用組成 物に関する。 The present invention further relates to an active energy ray-curable optical composition containing a light stabilizer (D).
[0011] 更には本発明は、上記の光学用組成物に活性エネルギー線を照射して得られる硬 化物である高屈折率榭脂に関する。 [0011] Further, the present invention relates to a high refractive index resin that is a cured product obtained by irradiating the above optical composition with active energy rays.
また本発明は、上記の榭脂の層を有する光学用材料に関する。 The present invention also relates to an optical material having the above resin layer.
また本発明は、上記の光学用組成物を含有してなる光学用材料に関する。 The present invention also relates to an optical material comprising the above optical composition.
発明の効果 The invention's effect
[0012] 本発明の、特定の骨格を有するエポキシ榭脂に、分子中にエチレン性不飽和基と カルボキシル基を併せ持つ化合物(b)を反応せしめて得られるエポキシカルボキシ レート化合物 (A)を含む活性エネルギー線硬化型光学用組成物、又は、更にェポキ シカルボキシレートイ匕合物 (A)に多塩基酸無水物(c)を反応せしめて得られるポリ力 ルボン酸化合物(B)を含む活性エネルギー線硬化型光学用組成物に活性エネルギ 一線を照射して硬化せしめた硬化物は、耐熱性、耐湿性のバランスに優れているだ けではなぐ透明性を有し、高い屈折率を示す。更に、該硬化物は強靭性等の機械 的物性に優れた材料であり、特に、基材への密着性ゃ耐傷性にも優れた皮膜形成 用材料である。又、本発明の榭脂組成物はポリカルボン酸によるアルカリ水溶性によ る現像が可能なことから、所謂、光学用レジストに用いる素材としても好適である。即 ち、例えば、レンズ、光学ディスク、液晶ディスプレー等の表示機器用のハードコート 、フィルム、光導波路等の光伝導材料等の光学用途に好適である。 [0012] The activity of the present invention comprising an epoxy carboxylate compound (A) obtained by reacting an epoxy resin having a specific skeleton with a compound (b) having both an ethylenically unsaturated group and a carboxyl group in the molecule. An active energy containing a polystrengthen carboxylic acid compound (B) obtained by reacting a polybasic acid anhydride (c) with an energy ray-curable optical composition or an epoxycarboxylate compound (A). A cured product obtained by irradiating a line-curable optical composition with a line of active energy is not only excellent in the balance between heat resistance and moisture resistance but also has a high transparency and a high refractive index. Further, the cured product is a material excellent in mechanical properties such as toughness, and in particular, it is a film forming material excellent in adhesion to a substrate and scratch resistance. In addition, since the resin composition of the present invention can be developed by alkali water solubility with polycarboxylic acid, it is also suitable as a material used for so-called optical resists. That is, for example, it is suitable for optical applications such as hard coats for display devices such as lenses, optical disks, and liquid crystal displays, films, and photoconductive materials such as optical waveguides.
発明を実施するための最良の形態
[0013] 本発明の活性エネルギー線硬化型光学用組成物は、高屈折率榭脂に用いる組成 物であって、上記一般式(1) (式中、 R〜Rは各々同一でも異なっていてもよぐ水 BEST MODE FOR CARRYING OUT THE INVENTION [0013] The active energy ray-curable optical composition of the present invention is a composition used for a high refractive index resin, wherein the general formula (1) (wherein R to R are the same or different from each other). Mogugu water
1 8 1 8
素原子、ハロゲン原子又は炭素数 1〜4のアルキル基を示す)で示されるエポキシ榭 脂(a)に、分子中にエチレン性不飽和基とカルボキシ基を併せ持つ化合物 (b)を反 応せしめて得られるエポキシカルボキシレートイ匕合物(A)、又は、更にエポキシカル ボキシレートイ匕合物 (A)に多塩基酸無水物(c)を反応せしめて得られるポリカルボン 酸化合物(B)を含む。 A compound (b) having both an ethylenically unsaturated group and a carboxy group in the molecule is reacted with an epoxy resin (a) represented by an elementary atom, a halogen atom or an alkyl group having 1 to 4 carbon atoms). The resulting epoxy carboxylate compound (A) or the polycarboxylate compound (B) obtained by reacting the epoxycarboxylate compound (A) with a polybasic acid anhydride (c) is included.
[0014] 一般式(1)において R〜Rは、使用される用途に応じて適宜選択されるべきもの [0014] In the general formula (1), R to R should be appropriately selected according to the intended use
1 8 1 8
であり、例えば、水素原子、メチル基、ェチル基、 n プロピル基、 i プロピル基、 n ブチル基、 i ブチル基、 s ブチル基等の炭素数が 1〜4の直鎖若しくは分岐状 の飽和炭化水素基;塩素原子、臭素原子、ヨウ素原子等のハロゲン原子が挙げられ る。 For example, a straight or branched saturated carbonization having 1 to 4 carbon atoms such as a hydrogen atom, a methyl group, an ethyl group, an n propyl group, an i propyl group, an n butyl group, an i butyl group, and an s butyl group. A hydrogen atom; a halogen atom such as a chlorine atom, a bromine atom or an iodine atom;
これらのうち、 R〜Rが全て水素原子である化合物が材料の入手等の観点力 最 Of these, compounds in which R to R are all hydrogen atoms are the most powerful in terms of obtaining materials.
1 8 1 8
も好ましい。 Is also preferable.
又、 R〜Rが塩素原子、臭素原子、ヨウ原子等のハロゲン原子である場合には、よ In addition, when R to R are halogen atoms such as chlorine atom, bromine atom and iodine atom,
1 8 1 8
り高い屈折率となる。 Higher refractive index.
[0015] 一般式(1)で示されるエポキシ榭脂(a)は、例えば、特開 2005— 200527号公報 にその製造方法が記載されており、その方法に準じて製造することも可能である。又 、市販品(日本化薬製 商品名: GTR— 1800 :—般式(1)の R〜Rが全て水素原 [0015] The epoxy resin (a) represented by the general formula (1) has a production method described in, for example, Japanese Patent Application Laid-Open No. 2005-200527, and can be produced according to the method. . In addition, a commercial product (Nippon Kayaku product name: GTR-1800:-R to R in general formula (1) are all hydrogen sources.
1 8 1 8
子であり、エポキシ価が 170g/eqである榭脂、ジャパンエポキシレジン製 商品名: j ER1031S :—般式(1)の R〜Rが全て水素原子であり、エポキシ価が 200gZeqで Copolymer with epoxy value of 170 g / eq, manufactured by Japan Epoxy Resin Product name: j ER1031S: —R to R in general formula (1) are all hydrogen atoms, epoxy value is 200 gZeq
1 8 1 8
ある榭脂)として入手することも可能である。 It is also possible to obtain it as a certain fat.
[0016] エポキシ榭脂(a)のうち、エポキシ当量が 180gZ当量よりも小さいものが特に好ま しい。その理由としては、より多くのエチレン性不飽和結合を導入することができること と、得られる硬化物に機械的強度を付与し、より強靭な榭脂となることが挙げられる。 又、特開 2005— 200527号公報に記載された方法により製造された一般式(1)で 示される高純度のエポキシ榭脂(a)は、エポキシ当量の小さいエポキシ榭脂である。 該エポキシ榭脂(a)は本発明の光学用組成物、該組成物に活性エネルギー線を照
射して得られる硬化物である高屈折率榭脂、該榭脂の層を有する光学多層材料並 びに該組成物を含有してなる光学用材料に適する。 [0016] Of the epoxy resins (a), those having an epoxy equivalent of less than 180 gZ equivalent are particularly preferred. The reason for this is that more ethylenically unsaturated bonds can be introduced, and mechanical strength is imparted to the resulting cured product, resulting in a tougher grease. Further, the high purity epoxy resin (a) represented by the general formula (1) produced by the method described in JP-A-2005-200527 is an epoxy resin having a small epoxy equivalent. The epoxy resin ( a ) is an optical composition of the present invention, and the composition is irradiated with active energy rays. It is suitable for a high refractive index resin which is a cured product obtained by irradiation, an optical multilayer material having the resin layer, and an optical material containing the composition.
[0017] 本発明の活性エネルギー線硬化型光学用組成物に使用するエポキシカルボキシ レート化合物 (A)は、前記エポキシ榭脂 (a)にエチレン性不飽和基とカルボキシ基を 併せ持つ化合物 (b)を反応 (エポキシカルボキシレートイ匕工程)させて得られる。 本発明の活性エネルギー線硬化型光学用組成物に使用するポリカルボン酸化合 物(B)は、エポキシカルボキシレートイ匕合物 (A)に更に多塩基酸無水物(c)を反応( 酸付加工程)させて得られる。 [0017] The epoxycarboxylate compound (A) used in the active energy ray-curable optical composition of the present invention comprises a compound (b) having both an ethylenically unsaturated group and a carboxy group in the epoxy resin (a). It can be obtained by reaction (epoxycarboxylate step). The polycarboxylic oxide compound (B) used in the active energy ray-curable optical composition of the present invention is obtained by further reacting an epoxy carboxylate compound (A) with a polybasic acid anhydride (c) (acid addition). Step).
[0018] 前記エポキシカルボキシレートイ匕工程はエポキシ榭脂の骨格に活性エネルギー線 の反応性基であるエチレン性不飽和基を導入することを目的とするものである。具体 的にはエポキシ基とカルボキシ基の反応である。 [0018] The purpose of the epoxy carboxylate solution process is to introduce an ethylenically unsaturated group, which is a reactive group of active energy rays, into the skeleton of the epoxy resin. Specifically, it is a reaction between an epoxy group and a carboxy group.
該エチレン性不飽和基とカルボキシ基を併せ持つ化合物 (b)としては、例えば、(メ タ)アクリル酸類、クロトン酸、 a シァノ桂皮酸、桂皮酸、或いは、不飽和基と水酸基 を併せ持つ化合物に飽和又は不飽和二塩基酸を反応せしめた化合物等が挙げられ る。 Examples of the compound (b) having both an ethylenically unsaturated group and a carboxy group include (meth) acrylic acid, crotonic acid, a cyanocinnamic acid, cinnamic acid, or a compound having both an unsaturated group and a hydroxyl group. Or the compound etc. which reacted the unsaturated dibasic acid are mentioned.
[0019] 上記において不飽和基と水酸基を併せ持つ化合物に飽和又は不飽和二塩基酸を 反応せしめた化合物等とは、例えば、 1分子中に 1個の水酸基を有する (メタ)アタリレ ート誘導体と飽和若しくは不飽和二塩基酸無水物を等モル反応させて得られる半ェ ステル類が挙げられる。例えば、ヒドロキシェチル (メタ)アタリレート、ヒドロキシプロピ ル (メタ)アタリレート、ヒドロキシブチル (メタ)アタリレート等のヒドロキシアルキル (メタ) アタリレートに、無水マレイン酸、無水コハク酸、無水フタル酸、無水フタル酸の部分 若しくは全水添物、無水トリメリット酸、無水ピロメリット酸等の飽和若しくは不飽和二 塩基酸を反応せしめた化合物が挙げられる。 [0019] In the above, a compound obtained by reacting a compound having both an unsaturated group and a hydroxyl group with a saturated or unsaturated dibasic acid is, for example, a (meth) acrylate derivative having one hydroxyl group in one molecule. Examples thereof include semiesters obtained by reacting saturated or unsaturated dibasic acid anhydrides in an equimolar amount. For example, hydroxyalkyl (meth) acrylate, such as hydroxyethyl (meth) acrylate, hydroxypropyl (meth) acrylate, hydroxybutyl (meth) acrylate, maleic anhydride, succinic anhydride, phthalic anhydride, Examples thereof include compounds obtained by reacting a saturated or unsaturated dibasic acid such as partial or total hydrogenated phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, and the like.
[0020] これらのうち、エポキシ榭脂 (a)と前記化合物 (b)の反応の安定性を考慮すると、化 合物(b)はモノカルボン酸であることが好ましい。モノカルボン酸とポリカルボン酸を 併用する場合には、モノカルボン酸のモル量 Zポリカルボン酸のモル量の比が 15以 上であることが好ましい。 [0020] Of these, considering the stability of the reaction between the epoxy resin (a) and the compound (b), the compound (b) is preferably a monocarboxylic acid. When the monocarboxylic acid and the polycarboxylic acid are used in combination, the ratio of the molar amount of the monocarboxylic acid to the molar amount of the polycarboxylic acid is preferably 15 or more.
化合物 (b)としては、活性エネルギー線硬化型光学用組成物としたときの活性エネ
ルギ一線に対する感度の点から (メタ)アクリル酸又は桂皮酸が最も好ましく挙げられ る。 Compound (b) includes active energy when the active energy ray-curable optical composition is used. (Meth) acrylic acid or cinnamic acid is most preferred from the standpoint of sensitivity to a line of lugi.
[0021] この反応におけるエポキシ榭脂(a)と化合物 (b)の仕込み割合は、用途に応じて適 宜変更されるべきものである。即ち、全てのエポキシ基をカルボキシレート化した場合 は、未反応のエポキシ基が残存しないためにエポキシ力ノレボキシレートイ匕合物 (A)と しての保存安定性は高い。この場合、硬化反応には導入した二重結合による反応性 のみを利用することになる。 [0021] The proportion of the epoxy resin (a) and the compound (b) used in this reaction should be appropriately changed depending on the application. That is, when all of the epoxy groups are carboxylated, unreacted epoxy groups do not remain, so that the storage stability as the epoxy strength noroxylate compound (A) is high. In this case, only the reactivity due to the introduced double bond is used for the curing reaction.
[0022] エポキシ基を残存させない場合のエポキシカルボキシレートイ匕工程においては、ェ ポキシ榭脂 (a)と化合物 (b)の仕込み割合としては、エポキシ榭脂 (a)のエポキシ基 1 当量に対し、化合物(b)のカルボキシル基 0. 90-1. 20当量が好ましい。この範囲 であれば、エポキシ基が残存することなぐ酸付加工程においてゲル化せず、榭脂の 保存安定性は良好である。化合物 (b)の仕込み量がこの範囲である場合、化合物(a )が残存するエポキシ基が少なぐ榭脂の安定性が向上する。 [0022] In the epoxy carboxylate refining process in which no epoxy group remains, the charge ratio of epoxy resin (a) and compound (b) is 1 equivalent of epoxy group of epoxy resin (a). Preferably, the carboxyl group of the compound (b) is 0.990-1.20 equivalent. If it is this range, it will not gelatinize in the acid addition process without an epoxy group remaining, and the storage stability of rosin is good. When the charged amount of the compound (b) is within this range, the stability of the resin with less epoxy groups in which the compound (a) remains is improved.
[0023] 一方、化合物 (b)の仕込み量を減量し未反応のエポキシ基を残すことにより、導入 した不飽和結合による反応と残存するエポキシ基による反応 (例えば、光力チオン触 媒による重合反応や熱重合反応等)を、硬化のために複合的に利用することも可能と なる。この場合は金属材料等への密着性の向上や硬化収縮性の低減が達成される 。しかし、エポキシカルボキシレートイ匕合物の保存や製造条件には注意を払う必要が ある。 [0023] On the other hand, by reducing the amount of compound (b) charged and leaving unreacted epoxy groups, the reaction by the introduced unsaturated bond and the reaction by the remaining epoxy group (for example, the polymerization reaction by the photopower thione catalyst). And thermal polymerization reaction) can be used in combination for curing. In this case, improvement in adhesion to a metal material or the like and reduction in curing shrinkage can be achieved. However, it is necessary to pay attention to the storage and production conditions of the epoxycarboxylate compound.
[0024] エポキシ基を残す場合には、エポキシ榭脂 (a)のエポキシ基 1当量に対し、化合物 [0024] When leaving an epoxy group, the compound is equivalent to 1 equivalent of epoxy group of epoxy resin (a).
(b)のカルボキシ基 0. 20〜0. 90当量を仕込むことが好ましい。この範囲内であれ ば、複合硬化の効果が発揮される。また、エポキシ基を残す場合には、続く反応中の ゲルィ匕ゃエポキシカルボキシレートイ匕合物 (A)の経時安定性に注意を払う必要があ る。 It is preferable to charge 0.20 to 0.90 equivalent of the carboxy group of (b). If it is within this range, the effect of composite curing is exhibited. Further, when leaving an epoxy group, it is necessary to pay attention to the aging stability of the gel or epoxycarboxylate compound (A) during the subsequent reaction.
更に、後述の酸付加工程を経てポリカルボン酸ィ匕合物(B)として使用する場合には 、エポキシ基を残存させないことが好ましい。即ち、エポキシ基が数多く残存する場 合には、導入するカルボキシ基と反応してしまい、保存安定性が特に悪化する。 Furthermore, when used as a polycarboxylic acid compound (B) through an acid addition step described later, it is preferable not to leave an epoxy group. That is, when a large number of epoxy groups remain, it reacts with the introduced carboxy group, and the storage stability is particularly deteriorated.
[0025] エポキシカルボキシレートイ匕工程は、溶剤を用いなくても、用いてもよい。溶剤を使
用する場合、該溶剤としては反応に影響が無ければ特に限定されない。 該溶剤としては、例えば、トルエン、キシレン、ェチルベンゼン、テトラメチルベンゼ ン等の芳香族系炭化水素溶剤、へキサン、オクタン、デカン等の脂肪族系炭化水素 溶剤、それらの混合物である石油エーテル、ホワイトガソリン、ソルベントナフサ、エス テル系溶剤、エーテル系溶剤、ケトン系溶剤等が挙げられる。 [0025] The epoxy carboxylate solution process may be used without using a solvent. Use solvent When used, the solvent is not particularly limited as long as the reaction is not affected. Examples of the solvent include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene and tetramethylbenzen, aliphatic hydrocarbon solvents such as hexane, octane and decane, petroleum ether which is a mixture thereof, white Examples include gasoline, solvent naphtha, ester solvents, ether solvents, and ketone solvents.
[0026] エステル系溶剤としては、酢酸ェチル、酢酸プロピル、酢酸ブチル等の酢酸アルキ ル類、 0 —ブチロラタトン等の環状エステル類、エチレングリコールモノメチルエーテ ノレアセテート、ジエチレングリコーノレモノメチノレエーテノレモノアセテート、ジエチレング リコ一ノレモノエチノレエーテノレモノアセテート、トリエチレングリコ一ノレモノエチノレエーテ ノレモノアセテート、ジエチレングリコーノレモノブチノレエーテノレモノアセテート、プロピレ ングリコールモノメチルエーテルモノアセテート、ブチレングリコーノレモノメチノレエーテ ルモノアセテート等のモノ若しくはポリアルキレングリコールモノアルキルエーテルモ ノアセテート類、グルタル酸ジアルキル、コハク酸ジアルキル、アジピン酸ジアルキル 等のポリカルボン酸アルキルエステル類等が挙げられる。 [0026] Examples of ester solvents include alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate, cyclic esters such as 0-butyrolatatane, ethylene glycol monomethyl etherate acetate, diethylene glycol nolemonomethineate nole monoacetate. , Diethylene glycol monoethylenoatenore monoacetate, triethyleneglycol monorenoethylenoleate nore monoacetate, diethyleneglycolenobutinorenoatenore monoacetate, propylene glycol monomethyl ether monoacetate, butylene glycol monoremonomethyl Mono- or polyalkylene glycol monoalkyl ether monoacetates such as monoethyl acetate, dialkyl glutarate, dialkyl succinate, dialkyl adipate Polycarboxylic acid alkyl esters, etc. and the like.
[0027] エーテル系溶剤としては、ジェチルエーテル、ェチルブチルエーテル等のアルキ ルエーテル類、エチレングリコーノレジメチノレエーテノレ、エチレングリコールジェチルェ 一テル、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールジェチル エーテル、トリエチレングリコールジメチルエーテル、トリエチレングリコールジェチル エーテル等のダリコールエーテル類、テトラヒドロフラン等の環状エーテル類等が挙 げられる。 [0027] Examples of the ether solvent include alkyl ethers such as jetyl ether and ethylbutyl ether, ethylene glycol-no-resin methinore etherol, ethylene glycol jetyl ether, dipropylene glycol dimethyl ether, dipropylene glycol jetyl ether, Examples thereof include Daricol ethers such as triethylene glycol dimethyl ether and triethylene glycol jetyl ether, and cyclic ethers such as tetrahydrofuran.
ケトン系溶剤としては、アセトン、メチルェチルケトン、シクロへキサノン、イソホロン 等が挙げられる。 Examples of the ketone solvent include acetone, methyl ethyl ketone, cyclohexanone, and isophorone.
[0028] この他にも、エポキシカルボキシレートイ匕工程の溶剤としては後記反応性ィ匕合物(C )等を使用することができ、これらを単独又は混合して使用することができる。この場 合、本発明の活性エネルギー線硬化型光学用組成物としてそのまま利用することが できるので好ましい。 In addition to this, as the solvent for the epoxy carboxylate solution step, the reactive compound (C 2) described later can be used, and these can be used alone or in combination. This is preferable because it can be used as it is as the active energy ray-curable optical composition of the present invention.
[0029] エポキシカルボキシレートイ匕工程時には、反応を促進させるために触媒を使用して もよい。該触媒の使用量は反応物の総量に対して 0. 1〜10重量%程度添加するの
が好ましい。該触媒としては、例えば、トリェチルァミン、ベンジルジメチルァミン、塩 化トリェチルアンモ-ゥム、臭化べンジルトリメチルアンモ-ゥム、ヨウ化ベンジルトリメ チルアンモ-ゥム、トリフエ-ルホスフィン、トリフエニルスチビン、メチルトリフエ-ルス チビン、オクタン酸クロム、オクタン酸ジルコニウム等の塩基性触媒等が挙げられる。 [0029] A catalyst may be used during the epoxy carboxylate step to promote the reaction. The catalyst is used in an amount of about 0.1 to 10% by weight based on the total amount of the reactants. Is preferred. Examples of the catalyst include triethylamine, benzyldimethylamine, chloride triethylamine, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide, triphenylphosphine, and triphenylstibine. And basic catalysts such as methyltristibine, chromium octoate, and zirconium octoate.
[0030] エポキシカルボキシレートイ匕工程の反応温度は 60〜150°Cである。又、反応時間 は好ましくは 5〜60時間である。 [0030] The reaction temperature of the epoxy carboxylate soot process is 60 to 150 ° C. The reaction time is preferably 5 to 60 hours.
エポキシカルボキシレートイ匕工程の熱重合禁止剤として、例えば、ハイド口キノンモ ノメチルエーテル、 2—メチルハイドロキノン、ハイドロキノン、ジフエ二ルピクリルヒドラ ジン、ジフエ-ルァミン、 3, 5—ジ tーブチルー 4ーヒドロキシトルエン等の使用が好 ましい。 Examples of thermal polymerization inhibitors in the epoxy carboxylate tank process include: Hydone quinone monomethyl ether, 2-methylhydroquinone, hydroquinone, diphenylpicrylhydrazine, diphenylamine, 3,5-ditert-butyl-4-hydroxytoluene, etc. Is preferred.
エポキシカルボキシレートイ匕工程は、適宜サンプリングしながら、サンプルの酸価 (J IS K5601— 2— 1: 1999に準拠)が 3mg'KOH/g以下、好ましくは 2mg'KOH Zg以下となった時点を終点とする。 In the epoxy carboxylate soot process, the time when the acid value of the sample (according to J IS K5601-2-1: 1999) becomes 3 mg'KOH / g or less, preferably 2 mg'KOH Zg or less, is sampled appropriately. The end point.
[0031] エポキシカルボキシレート化合物 (A)の構造は以下のように表される。 [0031] The structure of the epoxycarboxylate compound (A) is represented as follows.
[0032] [化 2] [0032] [Chemical 2]
(A) (A)
[0033] (A)の式中、 Xは以下の構造 X1又は X2 (Rは化合物 (b)の残基である。)で表される。 In the formula of (A), X is represented by the following structure X 1 or X 2 (R is a residue of compound (b)).
[0035] 次に、酸付カ卩工程にっ 、て説明する。酸付カ卩工程は、エポキシカルボキシレートイ匕 工程によって生じた水酸基に多塩基酸無水物 (c)を反応させ、エステル結合を介し てカルボキシ基が導入されたポリカルボン酸ィ匕合物(B)を得ることを目的とする。 [0035] Next, the acidification process will be described. In the acid addition step, a polybasic acid anhydride (c) is reacted with the hydroxyl group produced by the epoxy carboxylate oxidation step, and a polycarboxylic acid compound (B) in which a carboxyl group is introduced via an ester bond. ).
[0036] 多塩基酸無水物 (c)とは、分子中に酸無水物構造を有する化合物であれば特に限 定されない。例えば、アルカリ水溶液現像性、耐熱性、加水分解耐性等に優れた無 水コハク酸、無水フタル酸、テトラヒドロ無水フタル酸、へキサヒドロ無水フタル酸、無 水ィタコン酸、 3—メチルーテトラヒドロ無水フタル酸、 4ーメチルーへキサヒドロ無水フ タル酸、無水トリメリット酸又は無水マレイン酸が好まし 、。 [0036] The polybasic acid anhydride (c) is not particularly limited as long as it is a compound having an acid anhydride structure in the molecule. For example, water-free succinic acid, phthalic anhydride, tetrahydrophthalic anhydride, hexahydrophthalic anhydride, water-free itaconic acid, 3-methyl-tetrahydrophthalic anhydride, which are excellent in alkaline aqueous solution developability, heat resistance, hydrolysis resistance, etc. 4-methyl-hexahydrophthalic anhydride, trimellitic anhydride or maleic anhydride are preferred.
[0037] 酸付加工程は、前記エポキシカルボキシレートイ匕工程の反応液に多塩基酸無水物 [0037] In the acid addition step, a polybasic acid anhydride is added to the reaction solution of the epoxy carboxylate solution step.
(c)を加えることにより行うこともできる。多塩基酸無水物(c)の添加量は用途に応じ て適宜変更されるべきものである。 It can also be done by adding (c). The addition amount of the polybasic acid anhydride (c) should be appropriately changed according to the use.
[0038] しカゝしながら、本発明の活性エネルギー線硬化型光学用組成物に使用するポリ力 ルボン酸化合物(B)をアルカリ現像型のレジストとして用いる場合は、最終的に得ら れるポリカルボン酸ィ匕合物(B)の固形分酸価 (JIS K5601 - 2- 1: 1999〖こ準拠) を 40〜: LOOmg'KOHZg、より好ましくは 60〜90mg'KOH/gとする計算量の多 塩基酸無水物 (c)を仕込むことが好ま 、。固形分酸価がこの範囲よりも小さ!/、場合 、活性エネルギー線硬化型光学用組成物のアルカリ水溶液現像性が著しく低下し、 最悪の場合には現像できなくなる。又、固形分酸価がこれを越える場合には、多塩 基酸無水物 (c)が反応点に対して過剰となり、未反応の多塩基酸無水物 (c)が組成 物中に残存し、現像性が高くなりすぎパターユングができなくなる場合がある。 [0038] However, when the polyrubonic acid compound (B) used in the active energy ray-curable optical composition of the present invention is used as an alkali development resist, the finally obtained polycrystal is used. The calculated amount of the solid acid value of the carboxylic acid compound (B) (JIS K5601-2-1: 1999) is 40 to: LOOmg'KOHZg, more preferably 60 to 90 mg'KOH / g It is preferable to charge polybasic acid anhydride (c). When the solid content acid value is smaller than this range! /, The developability of the aqueous solution of the active energy ray-curable optical composition is remarkably lowered, and in the worst case, development is impossible. When the solid content acid value exceeds this, the polybasic acid anhydride (c) becomes excessive with respect to the reaction point, and the unreacted polybasic acid anhydride (c) remains in the composition. , Developability may become too high and patterning may not be possible.
[0039] 酸付加工程時には反応を促進させるために触媒を使用することが好ま ヽ。該触 媒の使用量は、反応物の総量に対して 0. 1〜10重量%程度添加するのが好ましい[0039] During the acid addition step, it is preferable to use a catalyst to accelerate the reaction. The amount of the catalyst used is preferably about 0.1 to 10% by weight based on the total amount of the reaction product.
。該触媒としては、例えば、トリェチルァミン、ベンジルジメチルァミン、塩ィ匕トリェチル アンモ-ゥム、臭化べンジルトリメチルアンモ-ゥム、ヨウ化べンジルトリメチルアンモ
ユウム、トリフエ-ルホスフィン、トリフエニルスチビン、メチルトリフエ-ルスチビン、オタ タン酸クロム、オクタン酸ジルコニウム等が挙げられる。 . Examples of the catalyst include triethylamine, benzyldimethylamine, sodium salt triethylamine, benzyltrimethylammonium bromide, benzyltrimethylammonium iodide. Examples include yuum, triphenylphosphine, triphenylstibine, methyltriphenylstibine, chromium oxalate, and zirconium octoate.
[0040] 酸付カ卩工程の反応温度は 60〜150°Cである。又、反応時間は好ましくは 5〜60時 間である。 [0040] The reaction temperature in the acidification step is 60 to 150 ° C. The reaction time is preferably 5 to 60 hours.
酸付加工程は無溶剤若しくは溶剤で希釈して反応させる。溶剤を使用する場合、 該溶剤としては反応に影響が無ければ特に限定されない。又、前工程であるカルボ キシレートイ匕工程で溶剤を用いて製造した場合には、酸付加工程に影響が無い溶 剤であれば溶剤を除くことなく酸付加工程に供してもよい。 In the acid addition step, the reaction is carried out without solvent or diluted with a solvent. When a solvent is used, the solvent is not particularly limited as long as the reaction is not affected. In addition, when a solvent is used in the preceding carboxylation step, a solvent that does not affect the acid addition step may be used in the acid addition step without removing the solvent.
該溶剤としては、例えば、トルエン、キシレン、ェチルベンゼン、テトラメチルベンゼ ン等の芳香族系炭化水素溶剤、へキサン、オクタン、デカン等の脂肪族系炭化水素 溶剤、それらの混合物である石油エーテル、ホワイトガソリン、ソルベントナフサ等が 挙げられる。 Examples of the solvent include aromatic hydrocarbon solvents such as toluene, xylene, ethylbenzene, and tetramethylbenzen, aliphatic hydrocarbon solvents such as hexane, octane, and decane, petroleum ether that is a mixture thereof, white Examples include gasoline and solvent naphtha.
[0041] 又、エステル系溶剤として、酢酸ェチル、酢酸プロピル、酢酸ブチル等の酢酸アル キル類、 y ブチロラタトン等の環状エステル類、エチレングリコールモノメチルエー テノレアセテート、ジエチレングリコーノレモノメチノレエーテノレモノアセテート、ジエチレン グリコーノレモノェチノレエーテノレモノアセテート、トリエチレングリコーノレモノェチノレエー テルモノアセテート、ジエチレングリコールモノブチルエーテルモノアセテート、プロピ レングリコールモノメチルエーテルモノアセテート、ブチレングリコーノレモノメチノレエー テルモノアセテート等のモノ若しくはポリアルキレングリコールモノアルキルエーテル モノアセテート類、グルタル酸ジアルキル、コハク酸ジアルキル、アジピン酸ジアルキ ル等のポリカルボン酸アルキルエステル類等が挙げられる。 [0041] Further, as ester solvents, alkyl acetates such as ethyl acetate, propyl acetate, and butyl acetate, y cyclic esters such as butyrolatatane, ethylene glycol monomethyl etherate acetate, diethyleneglycolone monomethineate nole monoacetate , Diethylene glyconomonoethylenoatenole monoacetate, triethyleneglycolenomonoethylenoleate termonoacetate, diethylene glycol monobutyl ether monoacetate, propylene glycol monomethyl ether monoacetate, butylene glycol monorenomethylenoleate termonoacetate Such as mono- or polyalkylene glycol monoalkyl ether monoacetates, dialkyl glutarate, dialkyl succinate, dialkyl adipate, etc. Carboxylic acid alkyl esters.
[0042] 又、エーテル系溶剤として、ジェチルエーテル、ェチルブチルエーテル等のアルキ ルエーテル類、エチレングリコーノレジメチノレエーテノレ、エチレングリコールジェチルェ 一テル、ジプロピレングリコールジメチルエーテル、ジプロピレングリコールジェチル エーテル、トリエチレングリコールジメチルエーテル、トリエチレングリコールジェチル エーテル等のダリコールエーテル類、テトラヒドロフラン等の環状エーテル類等が挙 げられる。 [0042] In addition, as ether solvents, alkyl ethers such as jetyl ether and butylbutyl ether, ethylene glyconoresin methinore etherol, ethylene glycol jetyl ether, dipropylene glycol dimethyl ether, dipropylene glycol jetyl ether , Dalicol ethers such as triethylene glycol dimethyl ether and triethylene glycol jetyl ether, and cyclic ethers such as tetrahydrofuran.
又、ケトン系溶剤として、アセトン、メチルェチルケトン、シクロへキサノン、イソホロン
等が挙げられる。 Also, as ketone solvents, acetone, methyl ethyl ketone, cyclohexanone, isophorone Etc.
[0043] この他にも、酸付加工程の溶剤としては、後記反応性化合物(C)等を使用すること ができ、これらを単独又は混合して使用することができる。この場合、本発明の活性 エネルギー線硬化型光学用組成物としてそのまま利用することができるので好ましい 酸付カ卩工程の熱重合禁止剤としては、前記エポキシカルボキシレートイ匕工程と同 様のものを使用することができる。 [0043] In addition, as the solvent in the acid addition step, the reactive compound (C) described later can be used, and these can be used alone or in combination. In this case, since it can be used as it is as the active energy ray-curable optical composition of the present invention, a preferable heat polymerization inhibitor in the acidification step is the same as that in the epoxy carboxylate step. Can be used.
酸付加工程は、適宜サンプリングしながら、反応物の酸価が目的とする用途に応じ て設定した酸価のプラスマイナス 10%の範囲になった点をもって終点とする。 The acid addition step is terminated when the acid value of the reaction product is in the range of plus or minus 10% of the acid value set according to the intended application while sampling appropriately.
[0044] ポリカルボン酸ィ匕合物(B)の構造は以下のように表される。 [0044] The structure of the polycarboxylic acid compound (B) is represented as follows.
[0045] [化 4] [0045] [Chemical 4]
[0046] (B)の式中、 Yは以下の構造 Y1又は Y2 (Rは化合物 (b)の残基であり、 R1は化合物 [0046] In the formula (B), Y is the following structure Y 1 or Y 2 (R is the residue of the compound (b), R 1 is the compound
(c)の残基である。)で表される。 It is a residue of (c). ).
[0048] 本発明の活性エネルギー線硬化型光学用組成物に使用される、エポキシカルボキ シレート化合物 (A)及びポリカルボン酸ィ匕合物(B)以外の反応性化合物(C)とは、 活性エネルギー線により反応性を示すィ匕合物である。反応性化合物(C)は、その性 質により、使用目的に応じた硬化前や硬化後の物性の付与のために有用である。 反応性ィ匕合物(C)としては、ラジカル反応型の (メタ)アタリレート類、カチオン反応 型のエポキシ化合物類、その他のビュルィ匕合物類等の、所謂、反応性オリゴマー類 が挙げられる。 [0048] The reactive compound (C) other than the epoxycarboxylate compound (A) and the polycarboxylic acid compound (B) used in the active energy ray-curable optical composition of the present invention is an activity. It is a compound that shows reactivity by energy rays. The reactive compound (C) is useful for imparting physical properties before and after curing according to the purpose of use, depending on its properties. Examples of the reactive compound (C) include so-called reactive oligomers such as radical-reactive (meth) acrylates, cation-reactive epoxy compounds, and other Bury compounds. .
[0049] 該 (メタ)アタリレート類としては、単官能 (メタ)アタリレート類、多官能 (メタ)アタリレ ート類、エポキシカルボキシレートイ匕合物(A)及びポリカルボン酸化合物(B)以外の エポキシ (メタ)アタリレート類、ポリエステル (メタ)アタリレート類、ウレタン (メタ)アタリ レート類等が挙げられる。 [0049] The (meth) acrylates include monofunctional (meth) acrylates, polyfunctional (meth) acrylates, epoxy carboxylate compounds (A), and polycarboxylic acid compounds (B). Epoxy (meth) acrylates, polyester (meth) acrylates, urethane (meth) acrylates and the like.
[0050] 単官能 (メタ)アタリレート類としては、メチル (メタ)アタリレート、ェチル (メタ)アタリレ ート、ブチル (メタ)アタリレート、ラウリル (メタ)アタリレート、ポリエチレングリコール (メ タ)アタリレート、ポリエチレングリコール (メタ)アタリレートモノメチルエーテル、フエ- ルェチル (メタ)アタリレート、イソボル-ル (メタ)アタリレート、シクロへキシル (メタ)ァ タリレート、ベンジル (メタ)アタリレート、テトラヒドロフルフリル (メタ)アタリレート等が挙 げられる。 [0050] Monofunctional (meth) acrylates include methyl (meth) acrylate, ethyl (meth) acrylate, butyl (meth) acrylate, lauryl (meth) acrylate, polyethylene glycol (meth) acrylate. , Polyethylene glycol (meth) acrylate monomethyl ether, phenyl (meth) acrylate, isobornyl (meth) acrylate, cyclohexyl (meth) acrylate, benzyl (meth) acrylate, tetrahydrofurfuryl ( (Meta) Atarirate.
[0051] 多官能 (メタ)アタリレート類としては、ブタンジオールジ (メタ)アタリレート、へキサン ジオールジ (メタ)アタリレート、ネオペンチルグリコールジ (メタ)アタリレート、ノナンジ オールジ (メタ)アタリレート、グリコールジ (メタ)アタリレート、ジエチレングリコールジ( メタ)アタリレート、ポリエチレングリコールジ (メタ)アタリレート、トリス (メタ)アタリロイル ォキシェチルイソシァヌレート、ポリプロピレングリコールジ (メタ)アタリレート、アジピ ン酸エポキシジ (メタ)アタリレート、ビスフエノールエチレンォキシドジ (メタ)アタリレー
ト、水素化ビスフエノールエチレンォキシド (メタ)アタリレート、ビスフエノールジ (メタ) アタリレート、ヒドロキシビバリン酸ネオペンチルグリコールの ε一力プロラタトン付カロ 物のジ (メタ)アタリレート、ジペンタエリスリトールと ε—力プロラタトンの反応物のポリ( メタ)アタリレート、ジペンタエリスリトールポリ(メタ)アタリレート、トリメチロールプロパン トリ (メタ)アタリレート、トリェチロールプロパントリ (メタ)アタリレート若しくはそのェチレ ンォキシド付加物、ペンタエリスリトールトリ(メタ)アタリレート若しくはそのエチレンォ キシド付加物、ペンタエリスリトールテトラ (メタ)アタリレート、ジペンタエリスリトールへ キサ (メタ)アタリレート若しくはそのエチレンォキシド付加物等が挙げられる。 [0051] Polyfunctional (meth) acrylates include butanediol di (meth) acrylate, hexane diol di (meth) acrylate, neopentyl glycol di (meth) acrylate, nonanediol all (meth) acrylate, Glycol di (meth) acrylate, diethylene glycol di (meth) acrylate, polyethylene glycol di (meth) acrylate, tris (meth) ateroyloxyschetil isocyanurate, polypropylene glycol di (meth) acrylate, adipic acid Epoxy di (meth) acrylate, bisphenol ethylene oxide di (meth) ate relay , Hydrogenated bisphenol ethylene oxide (meth) acrylate, bisphenol di (meth) acrylate, di- (meth) acrylate, dipentaerythritol with ε-strength prolatatone of hydroxypentavalylate neopentyl glycol And ε-force prolatatatone reaction product poly (meth) acrylate, dipentaerythritol poly (meth) acrylate, trimethylol propane tri (meth) acrylate, triethylol propane tri (meth) acrylate or addition of ethylene oxide , Pentaerythritol tri (meth) atalylate or its ethylene oxide adduct, pentaerythritol tetra (meth) atarylate, dipentaerythritol hexa (meth) atarylate or its ethylene oxide adduct It is.
[0052] 反応性化合物(C)であるカチオン反応型のエポキシィ匕合物類としては、一般的に エポキシ基を有する化合物であれば特に限定はない。例えば、グリシジル (メタ)ァク リレート、メチルグリジジルエーテル、ェチルダリシジルエーテル、ブチルダリシジルェ 一テル、ビスフエノール Αジグリジジルエーテル、 3, 4—エポキシシクロへキシルメチ ルー 3 , 4—エポキシシクロへキサンカルボキシレート(ユニオン ·カーバイド製「サイラ キュア UVR— 6110」等)、 3, 4 エポキシシクロへキシノレエチノレー 3, 4 エポキシ シクロへキサンカルボキシレート、ビュルシクロへキセンジォキシド(ユニオン 'カーバ イド製「ELR— 4206」等)、リモネンジォキシド (ダイセルィ匕学工業製「セロキサイド 30 00」等)、ァリルシクロへキセンジォキシド、 3, 4 エポキシー4ーメチルシクロへキシ ルー 2 プロピレンォキシド、 2- (3, 4 エポキシシクロへキシル 5, 5—スピロ一 3 , 4 エポキシ)シクロへキサン m ジォキサン、ビス(3, 4—エポキシシクロへキシ ル)アジペート(ユニオン 'カーバイド製「サイラキュア UVR— 6128」等)、ビス(3, 4 エポキシシクロへキシルメチル)アジペート、ビス(3, 4—エポキシシクロへキシノレ) エーテル、ビス(3, 4—エポキシシクロへキシルメチル)エーテル、ビス(3, 4—ェポキ シシクロへキシル)ジェチルシロキサン等が挙げられる。 [0052] The cation-reactive epoxy compounds that are the reactive compound (C) are not particularly limited as long as they are generally compounds having an epoxy group. For example, glycidyl (meth) acrylate, methyl glycidyl ether, ethyl daricidyl ether, butyl daricidyl ether, bisphenol Α diglycidyl ether, 3,4-epoxycyclohexylmethyl 3,4-epoxycyclohexane Hexanecarboxylate ("Syracure UVR-6110" manufactured by Union Carbide, etc.), 3, 4 Epoxycyclohexenoreethinore 3, 4 Epoxy cyclohexanecarboxylate, Burcyclohexenediodide ("Union 'Carbide" ELR " — 4206 ”), limonene dioxide (such as“ Celoxide 300 00 ”manufactured by Daicel Chemical Industries), allylcyclohexenedioxide, 3, 4 epoxy-4-methylcyclohexyl 2 propylene oxide, 2- (3, 4 epoxycyclo Hexyl 5,5-spiro 3, 4 epoxy) cyclo Xan m dioxane, bis (3,4-epoxycyclohexyl) adipate (such as “Syracure UVR-6128” manufactured by Union Carbide), bis (3,4-epoxycyclohexylmethyl) adipate, bis (3,4-epoxy) (Cyclohexenole) ether, bis (3,4-epoxycyclohexylmethyl) ether, bis (3,4-epoxycyclohexyl) jetylsiloxane and the like.
[0053] 反応性化合物(C)であるビ-ルイ匕合物類としては、ビュルエーテル類、スチレン類 、その他のビュル化合物が挙げられる。ビュルエーテル類としてはェチルビ-ルエー テノレ、プロピノレビニノレエーテノレ、ヒドロキシェチノレビニノレエーテノレ、エチレングリコー ルジビュルエーテル等が挙げられる。スチレン類としてはスチレン、メチルスチレン、 ェチルスチレン等が挙げられる。その他のビ-ルイ匕合物としてはトリアリルイソシァヌ
レート等が挙げられる。 [0053] Examples of the beryl compound as the reactive compound (C) include butyl ethers, styrenes, and other bur compounds. Examples of bur ethers include ethyl bilene ethere, propino levino eno ethenore, hydroxy ethino levino eno ethenore, and ethylene glycol dibule ether. Examples of styrenes include styrene, methyl styrene, ethyl styrene and the like. Other Birui compound is triallyl isocyanu Rate and the like.
[0054] これらのうち、反応性化合物(C)としてラジカル硬化型の (メタ)アタリレート類が好ま しい。カチオン反応型のエポキシィ匕合物類の場合、カルボン酸とエポキシ基が反応 してしまうため使用時に混合する 2液混合型にすることが必要である。 [0054] Of these, as the reactive compound (C), radical-curable (meth) acrylates are preferred. In the case of cation-reactive epoxy compounds, carboxylic acid and epoxy group react, so it is necessary to use a two-component mixed type that is mixed at the time of use.
[0055] 上記のエポキシカルボキシレートイ匕合物(A)又はポリカルボン酸化合物(B)と、ェ ポキシカルボキシレート化合物 (A)及びポリカルボン酸ィ匕合物(B)以外の反応性ィ匕 合物(C)とを混合せしめて、本発明の活性エネルギー線硬化型光学用組成物を得る ことができる。 [0055] The above-described epoxy carboxylate compound (A) or polycarboxylic acid compound (B) and a reactive compound other than the epoxycarboxylate compound (A) and the polycarboxylic acid compound (B). By mixing with compound (C), the active energy ray-curable optical composition of the present invention can be obtained.
[0056] 本発明の活性エネルギー線硬化型光学用組成物は、反応性化合物(C)を含有す る場合、該組成物中にエポキシカルボキシレート化合物 (A)又はポリカルボン酸ィ匕 合物(B)を 90〜5重量%、好ましくは 80〜10重量%、反応性ィ匕合物(C)を 3〜90重 量%、好ましくは 13〜80重量%含む。必要に応じて適宜その他の成分を含んでもよ い。 [0056] When the active energy ray-curable optical composition of the present invention contains the reactive compound (C), the epoxy carboxylate compound (A) or the polycarboxylic acid compound ( B) is 90 to 5% by weight, preferably 80 to 10% by weight, and the reactive compound (C) is 3 to 90% by weight, preferably 13 to 80% by weight. Other components may be included as necessary.
[0057] 本発明の活性エネルギー線硬化型光学用組成物は活性エネルギー線の照射によ つて硬化する。ここで活性エネルギー線としては、紫外線、可視光線、赤外線、 X線、 ガンマ一線、レーザー光線等の電磁波、アルファ一線、ベータ線、電子線等の粒子 線等が挙げられる。本発明の活性エネルギー線硬化型光学用組成物の用途により 適宜選択し得るが、中でも紫外線、レーザー光線、可視光線又は電子線が好ましい 活性エネルギー線による硬化の際には、例えば、キセノンランプ、カーボンアーク、 殺菌灯、紫外線用蛍光ランプ、中圧水銀ランプ、高圧水銀ランプ、超高圧水銀ランプ 、無電極ランプ、メタルハライドランプ、あるいは走査型、カーテン型電子線加速器に よる電子線等の光源を使用することができる。又、本発明の活性エネルギー線硬化 型光学用組成物を紫外線照射により硬化する場合、硬化に必要な紫外線照射量は 300〜3000mjZcm2程度でよ!ヽ。 [0057] The active energy ray-curable optical composition of the present invention is cured by irradiation with active energy rays. Examples of the active energy rays include electromagnetic waves such as ultraviolet rays, visible rays, infrared rays, X-rays, gamma rays, and laser rays, and particle rays such as alpha rays, beta rays, and electron beams. The active energy ray-curable optical composition of the present invention can be appropriately selected depending on the use, but among these, ultraviolet rays, laser beams, visible rays, or electron beams are preferable. For curing with active energy rays, for example, a xenon lamp, a carbon arc, etc. Use light sources such as germicidal lamps, fluorescent lamps for ultraviolet rays, medium-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, electrodeless lamps, metal halide lamps, or electron beams from scanning or curtain-type electron beam accelerators. Can do. In addition, when the active energy ray-curable optical composition of the present invention is cured by ultraviolet irradiation, the amount of ultraviolet irradiation necessary for curing may be about 300 to 3000 mjZcm 2 .
本発明にはこれら硬化物である高屈折率榭脂も含まれる。 The present invention also includes a high refractive index resin which is a cured product.
[0058] 更に、本発明の活性エネルギー線硬化型光学用組成物に耐光性を付与させること を目的として光安定剤 (D)を添加することが好ましい。光安定剤とは、光が長期間当
たる際の変色や脆ィ匕を防止するために添加される化合物の総称である。本発明の活 性エネルギー線硬化型光学用組成物は芳香環をその骨格中に有しているために、 光安定剤を添加することにより光学材料用途としての耐光性をより高めることができる [0058] Furthermore, it is preferable to add a light stabilizer (D) for the purpose of imparting light resistance to the active energy ray-curable optical composition of the present invention. A light stabilizer means that light is applied for a long time. A generic term for compounds added to prevent discoloration and brittleness when dripping. Since the active energy ray-curable optical composition of the present invention has an aromatic ring in its skeleton, the light resistance as an optical material can be further improved by adding a light stabilizer.
[0059] 光安定剤 (D)としては、紫外線吸収剤、酸化防止剤等として使用される化合物も含 まれる。 [0059] The light stabilizer (D) includes compounds used as ultraviolet absorbers, antioxidants, and the like.
光安定剤(D)としては、ビス(1, 2, 2, 6, 6 ペンタメチル一 4 ピペリジル) [ [3, 5 ビス(1, 1ージメチルェチル)ー4ーヒドロキシフエ-ル]メチル]ブチルマロネート( 例えば、チバスべシャリティケミカルズ製 Tinuvin 144等)等のヒンダードアミン系 光安定剤が挙げられる。 As the light stabilizer (D), bis (1, 2, 2, 6, 6 pentamethyl-4-piperidyl) [[3,5 bis (1,1-dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate (for example, Hindered amine light stabilizers such as Tinuvin 144 manufactured by Ciba Specialty Chemicals).
[0060] 光安定剤(D)としては、例えば、 2—(2 ヒドロキシー5 t—ブチルフエ-ル)—2 H ベンゾトリアゾール(例えば、チバスべシャリティケミカルズ製 Tinuvin PS等)、 3 - (2H ベンゾトリアゾール—2—ィル) - 5- (1, 1—ジメチルェチル)—4 ヒドロ キシベンゼンプロパン酸分岐及び直鎖(C7— C9)アルキルエステル(例えば、チバ スぺシャリティケミカルズ製 Tinuvin 99— 2等)、 3— (2H ベンゾトリアゾール 2 ィル) - 5- (1, 1ージメチルェチル)ー4ーヒドロキシベンゼンプロパン酸分岐及 び直鎖(C7— C9)アルキルエステル(例えば、チバスべシャリティケミカルズ製 Tinuv in 384— 2等)、 2— (2H ベンゾトリアゾール 2—ィル) 4, 6 ビス(1—メチル - 1—フエ-ルェチル)フエノール(例えば、チバスべシャリティケミカルズ製 Tinuvin[0060] Examples of the light stabilizer (D) include 2- (2 hydroxy-5 t-butylphenol) -2H benzotriazole (for example, Tinuvin PS manufactured by Ciba Specialty Chemicals), 3-(2H benzo Triazole-2-yl) -5- (1,1-dimethylethyl) -4 hydroxybenzenepropanoic acid branched and straight chain (C7-C9) alkyl esters (for example, Tinuvin 99-2 from Ciba Specialty Chemicals) ), 3- (2H benzotriazole 2-yl) -5- (1,1-dimethylethyl) -4-hydroxybenzenepropanoic acid branched and straight chain (C7-C9) alkyl esters (eg, Tinuv from Ciba Specialty Chemicals) in 384-2 etc.), 2- (2H benzotriazole 2-yl) 4, 6 Bis (1-methyl-1-fe-ruethyl) phenol (eg, Tinuvin from Ciba Specialty Chemicals)
900等)等のベンゾトリアゾール系紫外線吸収剤; 2— (4, 6 ビス(2, 4 ジメチル フエ-ル)一 1, 3, 5 トリァジン一 2—ィル) 5 ヒドロキシフエ-ルと、ォキシラン([ (C10-C 16主として C 12— C 13アルキルォキシ)メチル]ォキシラン)との反応生成 物(例えば、チバスべシャリティケミカルズ製 Tinuvin 400等)、 2— (2, 4ージヒドロ キシフエ-ル)一 4, 6 ビス(2, 4 ジメチルフエ-ル) 1, 3, 5 トリァジンと(2— ェチルへキシル)ーグリシド酸エステルとの反応生成物(例えば、チバスべシャリティ ケミカルズ製 Tinuvin 405等)、 2, 4 ビス [2 ヒドロキシ一 4 ブトキシフエ-ル] —6— (2, 4 ジブトキシフエ-ル)— 1, 3, 5 トリァジン(例えば、チバスぺシャリテ ィケミカルズ製 Tinuvin 460等)等のヒドロキシフエ-ルトリアジン (HPT)系紫外線
吸収剤が挙げられる。 Benzotriazole-based UV absorbers such as 2)-(4,6 bis (2,4 dimethylphenol) -1,1,3,5 triazine-2-yl) 5 hydroxyphenol and oxysilane ( Products of reaction with [(C10-C 16 mainly C 12—C 13 alkyloxy) methyl] oxysilane) (for example, Tinuvin 400 manufactured by Ciba Specialty Chemicals), 2— (2,4-dihydroxyphenyl) , 6 bis (2,4 dimethylphenol) 1, 3, 5 product of reaction of triazine with (2-ethylhexyl) -glycidic acid ester (eg Tinuvin 405 from Ciba Specialty Chemicals), 2, 4 bis [2 Hydroxy 4-butoxyphenyl] —6— (2, 4 Dibutoxyphenyl) — 1, 3, 5 Triazine (eg Tinuvin 460 from Ciba Specialty Chemicals) etc. Hydroxytritriazine (HPT) Ultraviolet rays An absorbent is mentioned.
硬化反応に用いる活性エネルギー線が紫外線である場合には、ヒドロキシフエ-ル トリアジン (HPT)系紫外線吸収剤が効果的である。 In the case where the active energy ray used for the curing reaction is ultraviolet rays, hydroxyphenyl triazine (HPT) ultraviolet absorbers are effective.
[0061] 又、光安定剤(D)としては、例えば、テトラキス(2, 4 ジー t ブチルフエ-ル) [1 , 1ービフエ-ル ]—4, 4, 一ジィルビスホスフォナイト(例えば、チバスべシャリティケミ カルズ製 IRGAFOS XP40等)、ビス(2, 4 ジ— t ブチルフエ-ル)ペンタエリス リトールジホスファイト(例えば、チバスべシャリティケミカルズ製 IRGAFOS XP60等 )等のホスファイト系酸ィ匕防止剤、或いは、ペンタエリスリトールテトラキス [3— (3, 5 ージー t ブチル 4 ヒドロキシフエ-ル)プロピオネート(例えば、チバスぺシャリテ ィケミカルズ製 IRGANOX 1010等)、チオジェチレンビス [3— (3, 5 ジ— t—ブ チルー 4ーヒドロキシフエ-ル)プロピオネート] (例えば、チバスべシャリティケミカル ズ製 IRGANOX 1035等)、 4, 6 ビス(ォクチルチオメチル) o—タレゾール(例 えば、チバスべシャリティケミカノレズ製 IRGANOX 1520L等)等のヒンダードフエノ ール系酸ィ匕防止剤が挙げられる。 [0061] As the light stabilizer (D), for example, tetrakis (2,4 tert-butylphenol) [1,1,2-biphenyl] -4,4,1 dilbisphosphonite (eg Cibas) Phosphite-based anti-oxidants such as IRGAFOS XP40 manufactured by Chemicals Chemicals, Inc.), bis (2,4 di-t-butylphenol) pentaerythritol diphosphite (eg IRGAFOS XP60 manufactured by Ciba Specialty Chemicals Co., Ltd.) Or pentaerythritol tetrakis [3— (3,5 tert-butyl 4-hydroxyphenol) propionate (eg, IRGANOX 1010 manufactured by Ciba Specialty Chemicals), thiojetylene bis [3— (3,5 di- t-butyl 4-hydroxyphenyl) propionate] (for example, IRGANOX 1035 manufactured by Ciba Specialty Chemicals), 4, 6 bis (octylthiomethyl) o-taresol (for example, And hindered phenolic acid inhibitors such as IRGANOX 1520L manufactured by Ciba Specialty Chemicals.
[0062] 光安定剤(D)を使用する場合、上記のものから 1種又は 2種以上を用いればよい。 [0062] When the light stabilizer (D) is used, one or more of the above may be used.
光安定剤 (D)を使用する場合、本発明の活性エネルギー線硬化型光学用組成物 におけるその使用割合は、該組成物中 0. 1〜5重量%が好ましぐ更に好ましくは 0 . 5〜3重量%である。これよりも少ない場合には充分な安定剤としての効果が発揮さ れず、多すぎる場合には活性エネルギー線による硬化反応を阻害することがある。 When the light stabilizer (D) is used, the use ratio in the active energy ray-curable optical composition of the present invention is preferably 0.1 to 5% by weight, more preferably 0.5. ~ 3% by weight. When the amount is less than this, the effect as a sufficient stabilizer is not exhibited, and when the amount is too large, the curing reaction by active energy rays may be inhibited.
[0063] この他、本発明の活性エネルギー線硬化型光学用組成物を各種用途に適合させ る目的で、該組成物の 70重量%を上限にその他の成分をカ卩えることもできる。その 他の成分としては光重合開始剤、着色材料、その他の添加剤等が挙げられる。 [0063] In addition, for the purpose of adapting the active energy ray-curable optical composition of the present invention to various applications, other components may be added up to 70% by weight of the composition. Other components include photopolymerization initiators, coloring materials, other additives, and the like.
[0064] 該光重合開始剤としては、例えば、ベンゾイン、ベンゾインメチルエーテル、ベンゾ インェチルエーテル、ベンゾインプロピルエーテル、ベンゾインイソブチノレエーテノレ 等のベンゾイン類;ァセトフエノン、 2, 2—ジエトキシ一 2—フエ-ルァセトフエノン、 2, 2—ジエトキシ一 2—フエ-ルァセトフエノン、 1, 1—ジクロロアセトフエノン、 2—ヒドロ キシ 2—メチルーフェニルプロパン 1 オン、ジエトキシァセトフエノン、 1ーヒドロ キシンクロへキシルフエ-ルケトン、 2—メチルー 1 [4 (メチルチオ)フエ-ル ] 2
-モルホリノ一プロパン 1—オン等のァセトフエノン類; 2 -ェチルアントラキノン、 2 —tーブチルアントラキノン、 2—クロ口アントラキノン、 2—アミルアントラキノン等のァ ントラキノン類; 2, 4 ジェチルチオキサントン、 2 イソプロピルチォキサントン、 2— クロ口チォキサントン等のチォキサントン類;ァセトフエノンジメチルケタール、ベンジ ルジメチルケタール等のケタール類;ベンゾフエノン、 4一べンゾィルー 4,ーメチルジ フエ-ルスルフイド、 4, 4,一ビスメチルァミノべンゾフエノン等のベンゾフエノン類; 2, 4, 6 トリメチルベンゾィルジフエ-ルホスフィンォキシド、ビス(2, 4, 6 トリメチル ベンゾィル) フエ-ルホスフィンォキシド等のホスフィンォキシド類等のラジカル型開 始剤が挙げられる。 [0064] Examples of the photopolymerization initiator include benzoins such as benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin propyl ether, and benzoin isobutinoreethenole; acetophenone, 2,2-diethoxy-1- Phenolacetophenone, 2, 2-diethoxy-1, 2-phenacetophenone, 1,1-dichloroacetophenone, 2-hydroxy 2-methyl-phenylpropane 1-one, diethoxyacetophenone, 1-hydroxyxin cyclohexylphene Luketone, 2-methyl-1 [4 (methylthio) phenol] 2 Acetophenones such as 2-morpholinopropane 1-one; 2-anthylanthraquinone, 2-tert-butylanthraquinone, 2-chloro anthraquinone, anthraquinones such as 2-amylanthraquinone; 2, 4 jetylthioxanthone Thioxanthones such as thixanthone and 2-chlorothixanthone; ketals such as acetophenone dimethyl ketal and benzil dimethyl ketal; 2, 4, 6 Trimethylbenzoyl diphosphine phosphine oxide, radical type initiators such as bis (2, 4, 6 trimethyl benzoyl) phosphine phosphoxide, etc. Can be mentioned.
[0065] その他の光重合開始剤としては、ボーレート系開始剤である日本感光色素製 NK [0065] As other photopolymerization initiators, Nippon Senshoku Dye NK, a borate initiator, is used.
3876、 NK— 3881等;光酸発生剤である、例えば、 9 フエ-ルァクリジン、 2, 2, —ビス(o クロ口フエ-ル)一 4, 4,, 5, 5,一テトラフエ-ル一 1, 2 ビイミダゾール( 黒金化成製ビイミダゾール等)、 2, 2—ァゾビス(2—ァミノ プロパン)ジヒドロクロリド (和光純薬製 V50等)、 2, 2 ァゾビス [2— (イミダソリン一 2ィル)プロパン]ジヒドロタ ロリド(和光純薬製 VA044等)、 [ィーター 5— 2—4—(シクロペンタデシル)(1, 2, 3 , 4, 5, 6,ィータ) (メチルェチル) ベンゼン]鉄(Π)へキサフルォロホスホネート( チバガイギー製 Irgacure 261等)等のカチオン型開始剤が挙げられる。 3876, NK-3881, etc .; photoacid generators, for example, 9-phenolacridine, 2, 2, —bis (o-cross-hole), 4, 4 ,, 5, 5, one tetraphenol 1, 2 Biimidazole (Kurokin Kasei Biimidazole, etc.), 2, 2-azobis (2-aminopropane) dihydrochloride (Wako Pure Chemicals V50, etc.), 2, 2 Azobis [2— (Imidazoline 1 2 yl ) Propane] dihydrotalolide (VA044, etc., manufactured by Wako Pure Chemical Industries, Ltd.), [eater 5-2-4- (cyclopentadecyl) (1, 2, 3, 4, 5, 6, ita) (methylethyl) benzene] iron ) Cationic initiators such as hexafluorophosphonate (Irgacure 261, etc., manufactured by Ciba Geigy).
[0066] 又、ァゾビスイソブチ口-トリル等のァゾ系開始剤、過酸化ベンゾィル等の熱に感応 する過酸ィ匕物系ラジカル型開始剤等を光重合開始剤と併せて用いてもよい。また、ラ ジカル型とカチオン型の双方の開始剤を併せて用いてもょ 、。 [0066] Further, an azo-based initiator such as azobisisobutyryl-tolyl, or a peroxide-based radical-type initiator sensitive to heat such as benzoyl peroxide may be used in combination with the photopolymerization initiator. Also, use both radical and cationic initiators together.
本発明の活性エネルギー線硬化型光学用組成物にこれらの開始剤を含有する場 合、該組成物に対するその含有率は 0. 1〜10%程度である。 When the active energy ray-curable optical composition of the present invention contains these initiators, the content of the initiator is about 0.1 to 10%.
[0067] 着色材料としては、例えば、フタロシアニン系、ァゾ系、キナクリドン系等の有機顔 料、酸化チタン、カーボンブラック、ベンガラ、酸化亜鉛、硫酸バリウム、タルク等の無 機顔料、公知一般の着色及び体質顔料を使用することができる。 [0067] Examples of coloring materials include organic pigments such as phthalocyanine, azo, and quinacridone, organic pigments such as titanium oxide, carbon black, bengara, zinc oxide, barium sulfate, and talc, and publicly known general coloring. And extender pigments can be used.
[0068] その他の添加剤としては、例えば、メラミン等の熱硬化触媒、タルク、硫酸バリウム、 炭酸カルシウム、炭酸マグネシウム、チタン酸バリウム、水酸ィ匕アルミニウム、酸ィ匕ァ ルミ-ゥム、シリカ、クレー等の充填剤、ァエロジル等のチキソトロピー付与剤、フタ口
シァニンブルー、フタロシアニングリーン、酸化チタン、シリコーン、フッ素系のレペリ ング剤や消泡剤、ハイドロキノン、ハイドロキノンモノメチルエーテル等の重合禁止剤 等を使用することができる。 [0068] Examples of other additives include thermosetting catalysts such as melamine, talc, barium sulfate, calcium carbonate, magnesium carbonate, barium titanate, hydroxyaluminum hydroxide, acidic aluminum, silica. , Fillers such as clay, thixotropy imparting agents such as Aerosil, lid opening It is possible to use cyanine blue, phthalocyanine green, titanium oxide, silicone, fluorine-based repellents and antifoaming agents, polymerization inhibitors such as hydroquinone and hydroquinone monomethyl ether, and the like.
[0069] 更に、本発明の活性エネルギー線硬化型光学用組成物には、他に活性エネルギ 一線に反応性を示さない榭脂類 (所謂、イナートポリマー)を用いることもできる。この ような榭脂の例としては、上記以外のエポキシ榭脂、フエノール榭脂、ウレタン榭脂、 ポリエステル榭脂、ケトンホルムアルデヒド榭脂、クレゾール榭脂、キシレン榭脂、ジァ リルフタレート樹脂、スチレン樹脂、グアナミン樹脂、天然若しくは合成ゴム、アクリル 榭脂、ポリオレフイン榭脂、又は、これらの変性物が挙げられる。これらは、該組成物 中 40重量%までの範囲にお!、て用いることが好まし!/、。 [0069] Further, in the active energy ray-curable optical composition of the present invention, rosins (so-called inert polymers) that are not reactive with the active energy ray can also be used. Examples of such resins include epoxy resins other than the above, phenol resins, urethane resins, polyester resins, ketone formaldehyde resins, cresol resins, xylene resins, diallyl phthalate resins, styrene resins. , Guanamine resin, natural or synthetic rubber, acrylic resin, polyolefin resin, or modified products thereof. These are preferably used in the range of up to 40% by weight in the composition!
[0070] 又、使用目的に応じて粘度を調整する目的で、該組成物中 60重量%程度、好まし くは 50重量%程度までの範囲において溶剤を添加することもできる。例えば、前記の カルボキシレートイ匕反応及び酸付加工程における溶剤等を用いてもょ 、。 [0070] For the purpose of adjusting the viscosity according to the purpose of use, a solvent may be added in the composition in the range of about 60% by weight, preferably about 50% by weight. For example, a solvent in the above-mentioned carboxylate reaction and acid addition step may be used.
[0071] 本発明には、上記の活性エネルギー線硬化型光学用組成物を含有し、光学的に 光を屈折させることを目的として用いられる光学用材料も含まれる。 [0071] The present invention also includes an optical material containing the above active energy ray-curable optical composition and used for the purpose of optically refracting light.
光学用用途としては、例えば、凸レンズ、凹レンズ、マイクロレンズ、フレネルレンズ 、レンチキュラーレンズ等のレンズ材料;液晶表示装置等に用いられる導光材料;板 状に加工したシートやフィルム、ディスク等;未硬化の組成物に微細加工された「型」 を押し当て微細な成形を行う、所謂、ナノインプリント材料;更には素子を保護するた めの封止材、特に発光ダイオード、光電変換素子等の封止材料等が挙げられる。 Optical applications include, for example, lens materials such as convex lenses, concave lenses, micro lenses, Fresnel lenses, and lenticular lenses; light guide materials used in liquid crystal display devices; sheets and films processed into plates, disks, etc .; uncured A so-called nanoimprint material, which is formed by pressing a finely processed “mold” into the composition; a sealing material for protecting the element, particularly a sealing material for a light emitting diode, a photoelectric conversion element, etc. Etc.
[0072] 又、本発明の光学用組成物は、ハードコート、トップコート、オーバープリントニス、 クリャコート等の塗工材料;ラミネート用、光ディスク用他各種接着剤、粘着剤等の接 着材料;ソノレダーレジスト、エッチングレジスト、マイクロマシン用レジスト等のレジスト 材料等の高屈折率を求められる皮膜形成用にも好適に用いられる。更には、皮膜形 成用材料を一時的に剥離性基材に塗工しフィルム化した後、本来目的とする基材に 貼合し皮膜を形成させる、所謂、ドライフィルムとしても使用できる。 [0072] The optical composition of the present invention comprises a coating material such as a hard coat, a top coat, an overprint varnish, and a clear coat; an adhesive material such as a laminate, an optical disc, and various other adhesives; an adhesive; It is also suitably used for film formation that requires a high refractive index, such as a resist material such as a ladder resist, etching resist, or micromachine resist. Furthermore, it can be used as a so-called dry film in which a film-forming material is temporarily applied to a peelable substrate to form a film and then bonded to the originally intended substrate to form a film.
中でも、高屈折率性に基づき、凸レンズ、凹レンズ、マイクロレンズ、フレネルレンズ 、レンチキュラーレンズ等のレンズ材料や、ハードコート、トップコート、オーバープリン
トニス、クリャコート等の塗工材料としての使用が特に好ましい。 Above all, based on high refractive index, lens materials such as convex lens, concave lens, micro lens, Fresnel lens, lenticular lens, hard coat, top coat, overprint Use as a coating material such as tonis and clear coat is particularly preferred.
[0073] 又、ポリカルボン酸ィ匕合物(B)を含有する活性エネルギー線硬化型光学用組成物 の場合、上記の用途にカ卩えて、カルボキシル基によって基材への密着性が高まるた めプラスチック基材若しくは金属基材を被覆するための用途として用 、ることもできる 。該組成物はアルカリ溶液に可溶性となる特徴を生カゝして、高屈折率を求められるァ ルカリ現像性光学用レジスト材料組成物として用いることもできる。即ち、基材上に該 組成物の皮膜層を形成し、紫外線等の活性エネルギー線を部分的に照射し、未照 射部をアルカリ溶液等で溶解させ除去して描画するために使用される。 [0073] Further, in the case of the active energy ray-curable optical composition containing the polycarboxylic acid compound (B), the adhesion to the base material was enhanced by the carboxyl group in view of the above-mentioned use. Therefore, it can be used as an application for coating a plastic substrate or a metal substrate. The composition can also be used as a resist material composition for alkali developable optics that requires a high refractive index by taking advantage of its solubility in an alkaline solution. That is, it is used for forming a film layer of the composition on a substrate, partially irradiating active energy rays such as ultraviolet rays, and dissolving and removing unirradiated portions with an alkaline solution or the like to draw. .
[0074] 皮膜形成の方法としては特に制限されず、グラビア等の凹版印刷方式、フレキソ等 の凸版印刷方式、シルクスクリーン等の孔版印刷方式、オフセット等の平版印刷方式 、口■ ~"ノレコ^ ~"タ' ~"、ナイフコ^ ~" ' ~"、ダイコ1 ~~タ' ~" 力' ~"テンコ. ~"タ' ~"、スピンコ1 ~~タ' ~" 等の各種塗工方式を任意に採用できる。 [0074] The method of forming the film is not particularly limited, and intaglio printing method such as gravure, relief printing method such as flexo, stencil printing method such as silk screen, lithographic printing method such as offset, etc. Various coating methods such as "Ta '~", Knife co ^ ~ "'~", Daiko 1 ~~ Ta '~ "Power" ~ "Tenko. ~"Ta' ~ ", Spinco 1 ~~ Ta '~", etc. Can be arbitrarily adopted.
[0075] 本発明にお ヽて高屈折率榭脂とは、活性エネルギー線を照射し得られる硬化物を J IS K7142 : 1996に従い屈折率を測定して、凡そ 1. 55以上の値となる榭脂である [0075] In the present invention, a high refractive index resin is a value obtained by measuring the refractive index of a cured product obtained by irradiating active energy rays in accordance with J IS K7142: 1996, which is approximately 1.55 or more. Is greaves
[0076] 本発明には、上記の活性エネルギー線硬化型光学用組成物を基材上に皮膜形成 [0076] In the present invention, the active energy ray-curable optical composition is formed into a film on a substrate.
-硬化させ得られる高屈折率榭脂の少なくとも二層以上の層をもってなる光学多層材 料も含まれる。 -An optical multilayer material comprising at least two layers of a high refractive index resin obtained by curing is also included.
実施例 Example
[0077] 以下、本発明を実施例により更に詳細に説明するが、本発明はこれら実施例に限 定されるものではない。又、実施例中で特に断りがない限り、部は重量部を示す。な お、実施例中の各物性値は以下の方法で測定した。 [0077] Hereinafter, the present invention will be described in more detail by way of examples, but the present invention is not limited to these examples. Moreover, unless otherwise indicated in an Example, a part shows a weight part. The physical property values in the examples were measured by the following methods.
( 1)エポキシ当量: JIS— Κ7236: 2001に記載の方法で測定。 (1) Epoxy equivalent: Measured by the method described in JIS—Κ7236: 2001.
(2)硬度: JIS Κ5600— 5— 4: 1999に記載の方法で測定。 (2) Hardness: Measured by the method described in JIS Κ5600-5-4-4: 1999.
(3)屈折率: JIS K7142 : 1996に記載の方法で測定。 (3) Refractive index: Measured by the method described in JIS K7142: 1996.
[0078] 合成例 1 1、合成例 1 2 エポキシカルボキシレートイ匕合物(Α)の合成 [0078] Synthesis Example 1 1, Synthesis Example 1 2 Synthesis of Epoxy Carboxylate Compound (I)
エポキシ榭脂 (a)としてテトラフエ-ルェタン骨格構造を有するエポキシ榭脂である 日本化薬製 GTR— 1800 (エポキシ価 170g/eq)を 85g、分子中にエチレン性不飽
和基とカルボキシ基を併せ持つ化合物 (b)としてアクリル酸 (略称 AA、分子量 = 72) を表 1中に記載した量、触媒としてトリフエニルホスフィンを 1. 5g、溶剤としてプロピレ ングリコールモノメチルエーテルモノアセテートを 52g混合し、 100°Cで 24時間反応 させた。 85g of Nippon Kayaku GTR-1800 (epoxy value 170g / eq), which is an epoxy resin having a tetrafluoroethane structure as epoxy resin (a), is ethylenically unsaturated in the molecule. The amount of acrylic acid (abbreviation AA, molecular weight = 72) listed in Table 1 as the compound (b) having both a sum group and a carboxy group, 1.5 g of triphenylphosphine as a catalyst, and propylene glycol monomethyl ether monoacetate as a solvent Were mixed and reacted at 100 ° C for 24 hours.
[0079] 合成例 1 3 エポキシカルボキシレート化合物(A)の合成 Synthesis Example 1 3 Synthesis of epoxycarboxylate compound (A)
エポキシ榭脂 (a)としてテトラフエ-ルェタン構造を有するエポキシ榭脂であるジャ パンエポキシレジン製 jER1031S (エポキシ価 200g/eq)を 100g、アクリル酸(略称 AA、分子量 = 72)を表 1中に記載した量混合し反応させた。反応条件等は、合成例 1— 1、合成例 1 2と同じである。 Epoxy resin (a) as epoxy resin having tetraphenol structure made of Japan Epoxy Resin jER1031S (epoxy value 200g / eq) 100g, acrylic acid (abbreviation AA, molecular weight = 72) are listed in Table 1. The amounts were mixed and reacted. Reaction conditions and the like are the same as those in Synthesis Example 1-1 and Synthesis Example 12.
[0080] 比較合成例 1 1 エポキシカルボキシレートイ匕合物の合成 [0080] Comparative Synthesis Example 1 1 Synthesis of Epoxy Carboxylate Compound
エポキシ榭脂 (a)の替わりとして多官能ビスフエノール A型榭脂である日本化薬製 NER— 1202 (エポキシ価 292gZeq)を 146g、アクリル酸(略称 AA、分子量 = 72) を表 1中に記載した量混合し反応させた。表 1には、サンプルの仕上がり酸価も併せ て記載した。反応条件等は、合成例 1— 1、合成例 1—2と同じである。 As an alternative to epoxy resin (a), NERg 1202 (epoxy value 292gZeq), a multifunctional bisphenol A type resin, 146g and acrylic acid (abbreviation AA, molecular weight = 72) are listed in Table 1. The amounts were mixed and reacted. Table 1 also shows the finished acid value of the sample. The reaction conditions and the like are the same as those in Synthesis Example 1-1 and Synthesis Example 1-2.
[0081] [表 1] [0081] [Table 1]
合成例 2— 1、合成例 2— 2 ポリカルボン酸ィ匕合物(B)の合成 Synthesis Example 2-1 and Synthesis Example 2-2 Synthesis of polycarboxylic acid compound (B)
合成例 1— 1にお 、て得られたエポキシカルボキシレートイ匕合物 (A)に、多塩基酸 無水物(c)としてテトラヒドロ無水フタル酸を表 2中に記載の量を加え、固形分が 65重 量0 /0となるよう溶剤としてプロピレングリコールモノメチルエーテルモノアセテートを添 加し、 100°Cにて 10時間加熱して付加反応させポリカルボン酸ィ匕合物(B)溶液を得
た。表 2における設定酸価とは、最終的に得られるポリカルボン酸ィ匕合物に関する所 望の固形分酸価を意味する。この設定酸価を達成するための計算量である多塩基 酸無水物(c)を用いた。 In Synthesis Example 1-1, the amount of tetrahydrophthalic anhydride shown in Table 2 was added as the polybasic acid anhydride (c) to the epoxy carboxylate compound (A) obtained above, resulting There was added pressure of propylene glycol monomethyl ether monoacetate as a solvent so as to be 65 by weight 0/0, by addition reaction by heating for 10 hours at 100 ° C polycarboxylic Sani匕合was (B) solution It was. The set acid value in Table 2 means the desired solid acid value for the finally obtained polycarboxylic acid compound. The polybasic acid anhydride (c), which is a calculated amount for achieving the set acid value, was used.
[0083] [表 2] [0083] [Table 2]
[0084] 実施例 1— 1、実施例 1— 2、実施例 1— 3、実施例 1—4 :活性エネルギー線硬化型 光学用組成物の調製と評価 [0084] Example 1-1, Example 1-2, Example 1-3, Example 1-4: Preparation and evaluation of active energy ray-curable optical composition
合成例 1— 1、合成例 1— 2、合成例 1— 3、合成例 2— 2において合成したエポキシ カルボキシレートイ匕合物(A)又はポリカルボン酸化合物(B)を 20g、ラジカル硬化型 の単量体であり反応性ィ匕合物(C)としてのジペンタエリスリトールへキサアタリレート を 4g、紫外線反応型光重合開始剤としてィルガキュア 184を 1. 5g混合し加熱溶解 して、光学用組成物を得た。 Synthesis Example 1-1, Synthesis Example 1-2, Synthesis Example 1-3, Synthesis Example 2-2 Epoxy carboxylate compound (A) or polycarboxylic acid compound (B) 20g, radical curable type 4g of dipentaerythritol hexaatalylate as a reactive compound (C) and 1.5g of Irgacure 184 as an ultraviolet-reactive photopolymerization initiator are mixed and dissolved by heating. A composition was obtained.
[0085] これを、乾燥時の膜厚 20ミクロンになるようハンドアプリケータによってポリカーボネ ート板上に塗工し、 80°Cで 30分間電気オーブンにて溶剤乾燥した。乾燥後、高圧 水銀ランプを具備した紫外線垂直露光装置 (オーク製作所製)によって照射線量 10[0085] This was coated on a polycarbonate plate with a hand applicator so as to have a film thickness of 20 microns when dried, and solvent-dried in an electric oven at 80 ° C for 30 minutes. After drying, the irradiation dose is 10% using a UV vertical exposure device (Oak Seisakusho) equipped with a high-pressure mercury lamp.
OOmiZcm2の紫外線を照射し硬化させ光学用材料を得た。 The ultraviolet OOmiZcm 2 was obtained by irradiating the optical material is cured.
[0086] この光学用材料の塗膜の硬度 (鉛筆硬度)を JIS 1¾600— 5—4 : 1999にょり測 定し、更に耐衝撃性の試験 (重り落下試験)を IS06272— 1: 2002によって実施し、 それらの結果を表 3に示した。重り落下試験では「目視にて傷なし」を「傷なし」、「塗 膜表面に目視確認できる傷あり」を「傷あり」と評価した。 [0086] The film hardness (pencil hardness) of this optical material was measured according to JIS 1¾600-5-4: 1999, and an impact resistance test (weight drop test) was conducted according to IS06272-1: 2002. The results are shown in Table 3. In the weight drop test, “no scratches visually” was evaluated as “no scratches”, and “scratches that can be visually confirmed on the coating surface” were evaluated as “scratches”.
[0087] 上記組成物をポリプロピレン板上に同様の方法によって塗工、乾燥、硬化反応させ て塗膜を得、硬化後の塗膜を剥離した。 JIS K7142 : 1996に従って剥離した塗膜 の屈折率を測定し、表 3に示した。 [0087] The above composition was applied onto a polypropylene plate by the same method, dried and cured to obtain a coating film, and the cured coating film was peeled off. The refractive index of the coating film peeled according to JIS K7142: 1996 was measured and shown in Table 3.
[0088] 比較例 1 1 :
比較合成例 1— 1で合成した反応性エポキシカルボキシレートイ匕合物を、実施例 1 一 1と同様な方法で組成物を調製し、塗膜の硬度、耐衝撃性及び屈折率を評価した 。その結果を表 3に示した。 [0088] Comparative Example 1 1: Comparative Synthetic Example 1-1 A reactive epoxycarboxylate compound synthesized in Example 1 was prepared in the same manner as in Example 1-11, and the hardness, impact resistance and refractive index of the coating film were evaluated. . The results are shown in Table 3.
[表 3] 塗膜物性 [Table 3] Physical properties of coating film
[0090] 以上の結果から、比較例のエポキシ榭脂より調製された組成物の硬化物と比較し て、本発明の特定のエポキシ榭脂より調製された組成物の硬化物は、強靭で硬度が 高ぐ又、高い屈折率を有しており、光学用途に適することが判った。 [0090] From the above results, the cured product of the composition prepared from the specific epoxy resin of the present invention is tougher and harder than the cured product of the composition prepared from the epoxy resin of the comparative example. However, it has a high refractive index and is suitable for optical applications.
更に、実施例 1—1と実施例 1—3を比較することで、エポキシ当量が 180g/当量 よりも小さいエポキシ榭脂 (a)から調製された組成物の硬化物は、より強靭な硬化物 を与えることが示された。 Further, by comparing Example 1-1 and Example 1-3, the cured product of the composition prepared from epoxy resin ( a ) having an epoxy equivalent of less than 180 g / equivalent is a tougher cured product. Was shown to give.
[0091] 実施例 2:活性エネルギー線硬化型光学用レジストの調製と評価 [0091] Example 2: Preparation and evaluation of active energy ray-curable optical resist
合成例 2— 1で得られたポリカルボン酸ィ匕合物(B)を 20g、反応性化合物(C)として のラジカル反応型の単量体であるジペンタエリスリトールへキサアタリレートを 4g、紫 外線反応型光重合開始剤としてのィルガキュア 184を 1. 5g混合し加熱溶解して光 学用組成物を得た。 20 g of the polycarboxylic acid compound (B) obtained in Synthesis Example 2-1, 4 g of dipentaerythritol hexaatalylate, a radical-reactive monomer as the reactive compound (C), purple 1.5 g of Irgacure 184 as an external-reactive photopolymerization initiator was mixed and dissolved by heating to obtain an optical composition.
[0092] これを乾燥時の膜厚 20ミクロンになるようハンドアプリケータによって石英板上に塗 ェし、 80°Cで 30分間電気オーブンにて溶剤乾燥をした。乾燥後、塗工物の上からマ スクパターンを覆 ヽかぶせ高圧水銀ランプを具備した紫外線垂直露光装置 (オーク 製作所製)によって照射線量 lOOOmjZcm2の紫外線を照射し硬化させ光学用材料
を得た。次いで、 1重量%炭酸ナトリウム水溶液をスプレーし、未露光部を溶解して現 像した。 [0092] This was coated on a quartz plate with a hand applicator so as to have a film thickness of 20 microns when dried, and solvent-dried in an electric oven at 80 ° C for 30 minutes. After drying, cover the mask pattern from the top of the coated material and cure it by irradiating with UV radiation of lOOOmjZcm 2 with UV vertical exposure equipment (Oak Seisakusho) equipped with a high-pressure mercury lamp. Got. Subsequently, a 1% by weight aqueous sodium carbonate solution was sprayed to dissolve the unexposed area and imaged.
その結果、パターンを形成させることができ、本発明のポリカルボン酸ィ匕合物(B)は レジスト適性を有することが示された。 As a result, a pattern could be formed, indicating that the polycarboxylic acid compound (B) of the present invention has resist suitability.
[0093] 実施例 3— 1、実施例 3— 2 :光安定剤について [0093] Example 3-1 and Example 3-2: Light stabilizer
実施例 1—1にて得られた組成物に、光安定剤(D)として同組成物 5gに対し、 2, 4 —ビス [2 ヒドロキシ一 4 ブトキシフエ-ル]— 6— (2, 4 ジブトキシフエ-ル)一 1 , 3, 5 トリァジン(商品名:チバスべシャリティケミカルズ製 Tinuvin 460)を 40mg 、ビス(1, 2, 2, 6, 6 ペンタメチル— 4 ピペリジル) [ [3, 5 ビス(1, 1—ジメチル ェチル)ー4ーヒドロキシフエ-ル]メチル]ブチルマロネート(商品名:チバスぺシャリ ティケミカルズ製 Tinuvin 144;ヒンダードアミン系光安定剤)を 40mg、及びビス(2 , 4ージー t—ブチルフエ-ル)ペンタエリスリトールジホスファイト(商品名:チバスぺシ ャリティケミカルズ製 IRGAFOS XP60;酸化防止剤)を 20mgを添加し、乾燥時の 膜厚が 20ミクロンになるようにハンドアプリケータによって石英ガラス板上に塗工した 。次いで、 80°Cで 30分間電気オーブンにて溶剤乾燥をし、その後、高圧水銀ランプ を具備した紫外線垂直露光装置 (オーク製作所製)によって照射線量 lOOOmiZcm 2の紫外線を照射し硬化させ光学用材料を得た (実施例 3— 1)。 To the composition obtained in Example 1-1, 5 g of the same composition as a light stabilizer (D) was added 2, 4-bis [2 hydroxy-4-butoxyphenol] -6- (2, 4 dibutoxyphenol. -1) 1, 3, 5 Triazine (trade name: Tinuvin 460 manufactured by Ciba Specialty Chemicals), 40 mg bis (1, 2, 2, 6, 6 pentamethyl-4 piperidyl) [[3,5 Bis (1 , 1-dimethylethyl) -4-hydroxyphenyl] methyl] butyl malonate (trade name: Tinuvin 144 manufactured by Ciba Specialty Chemicals; hindered amine light stabilizer) and bis (2,4-di-tert-butylphenol) E) Add 20 mg of pentaerythritol diphosphite (trade name: IRGAFOS XP60 manufactured by Ciba Specialty Chemicals; antioxidant), and use a quartz glass plate with a hand applicator so that the film thickness when dried is 20 microns. Coated on top. Next, the solvent is dried in an electric oven at 80 ° C for 30 minutes. After that, the optical material is cured by irradiating with an ultraviolet ray with an irradiation dose of lOOOmiZcm 2 using an ultraviolet vertical exposure device (Oak Manufacturing) equipped with a high-pressure mercury lamp. Obtained (Example 3-1).
光安定剤 (D)を用いな!/、以外は上記と同様にして、光学用材料を得た(実施例 3 2)。 An optical material was obtained in the same manner as above except that the light stabilizer (D) was not used! / (Example 32).
[0094] これらの光学用材料にフエドメータによって 1000時間の光照射を行い、耐光性試 験を実施した。 450nmにおける光の透過性を測定し、耐光性試験実施後の透過率 Z実施前の透過率の比を求め表 4に示した。 [0094] These optical materials were irradiated with light for 1000 hours by a Fedometer, and a light resistance test was conducted. The transmittance of light at 450 nm was measured, and the transmittance after the light resistance test was conducted.
[0095] [表 4]
光安定性 [0095] [Table 4] Light stability
[0096] 以上の結果から、光安定剤 (D)の添加により光安定性の向上が図られ光学用材料 として有用であることが示された。 [0096] From the above results, it was shown that the addition of the light stabilizer (D) improves the light stability and is useful as an optical material.
産業上の利用可能性 Industrial applicability
[0097] 本発明の特定構造を有するエポキシ榭脂から誘導される活性エネルギー線硬化型 光学用組成物は、比較的強靭な高!、屈折率を有する透明性に優れる硬化物を提供 する。又、酸変性することでアルカリ現像可能な光学用レジストとしても用いられうる。 又、成形材料、皮膜形成用材料として使用でき、例えば、レンズ等の光学部品、塗料 、フィルム等に好適に利用することができる。
The active energy ray-curable optical composition derived from an epoxy resin having a specific structure according to the present invention provides a cured product that is relatively tough and has a refractive index and excellent transparency. It can also be used as an optical resist that can be alkali-developed by acid modification. Further, it can be used as a molding material or a film forming material, and can be suitably used for optical parts such as lenses, paints, films, and the like.
Claims
[化 1] [Chemical 1]
(式中、 R〜Rは各々同一でも異なっていてもよぐ水素原子、ハロゲン原子又は炭 (Wherein R to R may be the same or different from each other, hydrogen atom, halogen atom or carbon
1 8 1 8
素数 1〜4のアルキル基を示す。 ) A prime number 1 to 4 alkyl group is shown. )
下記一般式(1)で示されるエポキシ榭脂 (a)に、分子中にエチレン性不飽和基と力 ルボキシル基を併せ持つ化合物(b)を反応せしめて得られるエポキシカルボキシレ ート化合物 (A)に、更に多塩基酸無水物(c)を反応せしめて得られるポリカルボン酸 化合物(B)を含む、活性エネルギー線硬化型光学用組成物。 An epoxy carboxylate compound (A) obtained by reacting an epoxy resin (a) represented by the following general formula (1) with a compound (b) having both an ethylenically unsaturated group and a force carboxyl group in the molecule (A) And a polycarboxylic acid compound (B) obtained by further reacting the polybasic acid anhydride (c) with an active energy ray-curable optical composition.
[化 2]
[Chemical 2]
[3] 一般式(1)の R〜Rが水素原子であり、分子中にエチレン性不飽和基とカルボキ [3] R to R in the general formula (1) are hydrogen atoms, and ethylenically unsaturated groups and
1 8 1 8
シル基を併せ持つ化合物 (b)が (メタ)アクリル酸又は桂皮酸である、請求項 1又は 2 に記載の組成物。 The composition according to claim 1 or 2, wherein the compound (b) having a sil group is (meth) acrylic acid or cinnamic acid.
[4] 更に、エポキシカルボキシレート化合物(A)及びエポキシカルボキシレート化合物( [4] Furthermore, the epoxycarboxylate compound (A) and the epoxycarboxylate compound (
A)に多塩基酸無水物(c)を反応せしめて得られるポリカルボン酸ィ匕合物(B)以外の 反応性化合物(C)を含む、請求項 1〜3のいずれか 1項に記載の組成物。 The reactive compound (C) other than the polycarboxylic acid compound (B) obtained by reacting the polybasic acid anhydride (c) with A) is described in any one of claims 1 to 3. Composition.
[5] 更に、光安定剤 (D)を含む、請求項 1に記載の組成物。 [5] The composition according to claim 1, further comprising a light stabilizer (D).
[6] 請求項 1に記載の組成物に活性エネルギー線を照射して得られる硬化物である、 高屈折率榭脂。 [6] A high refractive index resin that is a cured product obtained by irradiating the composition according to claim 1 with active energy rays.
[7] 請求項 6の榭脂の層を有する、光学用材料。 7. An optical material having the resin layer according to claim 6.
[8] 請求項 1に記載の組成物を含有してなる、光学用材料。
[8] An optical material comprising the composition according to claim 1.
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JP2010160300A (en) * | 2009-01-08 | 2010-07-22 | Toray Ind Inc | Negative photosensitive resin composition and touch panel material using the same |
WO2010104191A1 (en) * | 2009-03-09 | 2010-09-16 | Panasonic Electric Works Co., Ltd. | Transparent film |
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JP2012163735A (en) * | 2011-02-07 | 2012-08-30 | Toyo Ink Sc Holdings Co Ltd | Photosensitive resin composition, and protective film and insulating film for touch panel using the composition |
WO2015080146A1 (en) * | 2013-11-28 | 2015-06-04 | 日本化薬株式会社 | Active energy ray-curable resin composition, and spacer for display elements and/or color filter protective film using same |
KR20160110139A (en) | 2015-03-13 | 2016-09-21 | 닛뽄 가야쿠 가부시키가이샤 | Carboxyl group-containing reactive compound, curable resin composition using the same, and use thereof |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0381320A (en) * | 1989-08-24 | 1991-04-05 | Mitsui Toatsu Chem Inc | Epoxy resin lens and production thereof |
JPH05306320A (en) * | 1992-01-31 | 1993-11-19 | Mitsui Toatsu Chem Inc | Internal mold-release agent composed of sulfur-containing phosphoric acid ester |
JP2004315744A (en) * | 2003-04-18 | 2004-11-11 | Omron Corp | Curable resin composition giving cured product having excellent resistance to light |
JP2005129139A (en) * | 2003-10-23 | 2005-05-19 | Fuji Photo Film Co Ltd | Magnetic recording medium |
JP2005200527A (en) * | 2004-01-15 | 2005-07-28 | Nippon Kayaku Co Ltd | Method of producing crystalline epoxy compound |
-
2007
- 2007-07-05 JP JP2008523733A patent/JPWO2008004630A1/en not_active Withdrawn
- 2007-07-05 WO PCT/JP2007/063491 patent/WO2008004630A1/en active Application Filing
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0381320A (en) * | 1989-08-24 | 1991-04-05 | Mitsui Toatsu Chem Inc | Epoxy resin lens and production thereof |
JPH05306320A (en) * | 1992-01-31 | 1993-11-19 | Mitsui Toatsu Chem Inc | Internal mold-release agent composed of sulfur-containing phosphoric acid ester |
JP2004315744A (en) * | 2003-04-18 | 2004-11-11 | Omron Corp | Curable resin composition giving cured product having excellent resistance to light |
JP2005129139A (en) * | 2003-10-23 | 2005-05-19 | Fuji Photo Film Co Ltd | Magnetic recording medium |
JP2005200527A (en) * | 2004-01-15 | 2005-07-28 | Nippon Kayaku Co Ltd | Method of producing crystalline epoxy compound |
Cited By (17)
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JP2008179796A (en) * | 2006-12-26 | 2008-08-07 | Mitsui Chemicals Inc | Compound having (meth)acryloyl group and glycydyl group, and polymerizable composition containing the same |
JP2009244402A (en) * | 2008-03-28 | 2009-10-22 | Fujifilm Corp | Curable composition for nanoimprint, micropattern, method of manufacturing the same, color filter, display device, and method of manufacturing processing substrate |
JP2010160300A (en) * | 2009-01-08 | 2010-07-22 | Toray Ind Inc | Negative photosensitive resin composition and touch panel material using the same |
JP2010228446A (en) * | 2009-03-03 | 2010-10-14 | Fujifilm Corp | Barrier laminate, gas barrier film, and device using these |
US8987364B2 (en) | 2009-03-09 | 2015-03-24 | Panasonic Intellectual Property Management Co., Ltd. | Transparent film |
WO2010104191A1 (en) * | 2009-03-09 | 2010-09-16 | Panasonic Electric Works Co., Ltd. | Transparent film |
CN102349002A (en) * | 2009-03-09 | 2012-02-08 | 松下电工株式会社 | Transparent film |
US20120058320A1 (en) * | 2009-03-09 | 2012-03-08 | Panasonic Electric Works Co. Ltd | Transparent film |
TWI403531B (en) * | 2009-03-09 | 2013-08-01 | Panasonic Corp | Transparent film |
JP2011107538A (en) * | 2009-11-19 | 2011-06-02 | Panasonic Electric Works Co Ltd | Reflecting plate |
JP2012163735A (en) * | 2011-02-07 | 2012-08-30 | Toyo Ink Sc Holdings Co Ltd | Photosensitive resin composition, and protective film and insulating film for touch panel using the composition |
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KR20160090282A (en) | 2013-11-28 | 2016-07-29 | 닛뽄 가야쿠 가부시키가이샤 | Active energy ray-curable resin composition, and spacer for display elements and/or color filter protective film using same |
JPWO2015080146A1 (en) * | 2013-11-28 | 2017-03-16 | 日本化薬株式会社 | Active energy ray curable resin composition, and display element spacer and / or color filter protective film using the same |
CN105745576B (en) * | 2013-11-28 | 2019-12-17 | 日本化药株式会社 | Active energy ray-curable resin composition and spacer for display element and/or color filter protective film using same |
KR20160110139A (en) | 2015-03-13 | 2016-09-21 | 닛뽄 가야쿠 가부시키가이샤 | Carboxyl group-containing reactive compound, curable resin composition using the same, and use thereof |
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