WO2007073051A1 - Plate with a reflective surface and method for producing the same - Google Patents

Plate with a reflective surface and method for producing the same Download PDF

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Publication number
WO2007073051A1
WO2007073051A1 PCT/KR2006/005399 KR2006005399W WO2007073051A1 WO 2007073051 A1 WO2007073051 A1 WO 2007073051A1 KR 2006005399 W KR2006005399 W KR 2006005399W WO 2007073051 A1 WO2007073051 A1 WO 2007073051A1
Authority
WO
WIPO (PCT)
Prior art keywords
layer
plate
substrate
reflective property
thickness
Prior art date
Application number
PCT/KR2006/005399
Other languages
French (fr)
Inventor
Byung Hoon Ryou
Won Mo Sung
Min Su Kim
Original Assignee
E.M.W. Antenna Co., Ltd.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by E.M.W. Antenna Co., Ltd. filed Critical E.M.W. Antenna Co., Ltd.
Publication of WO2007073051A1 publication Critical patent/WO2007073051A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/26—Reflecting filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133553—Reflecting elements

Definitions

  • the present invention relates to a plate having a reflective property and method of fabricating the same, and more particularly to, such a plate having a reflective property, which is formed by deposition of an oxide layer and method of fabricating the same.
  • FIG. 3 is a perspective view illustrating a cellular phone including a window for protecting a display unit.
  • the window 64 for protecting the display unit includes a central part 66 formed of a transparent substrate made of as glass or acryl and a peripheral part 64 having metals such as Ni, Cr, Al, Cu, Ag, etc., or oxides such as such as Al O , SiO , TiO , ZnO etc., coated on the rear surface of the
  • a high-reflectivity material is coated on the rear surface of the transparent substrate made of as glass or acryl so as to allow a reflective property such as a mirror to be endowed to the peripheral part 68 of the display unit-protecting window.
  • the reflectivity of the transparent substrate varies depending on a material coated on the rear surface of the transparent substrate.
  • a portable information terminal including a window made of such a material exhibits an excellent outer appearance as well as enables the user to easily and simply see his or her feature without carrying a hand mirror.
  • a technique is well known in which metals such as Ni, Cr, Al, etc., are deposited on or oxides such as such as SiO and TiO are alternately deposited repeatedly on the rear surface of the transparent substrate made of as glass or acryl so as to allow the window having the reflective property to boast a beautiful gloss.
  • the static electricity infiltrating into the display unit may give a fatal damage to the display unit.
  • a metal material deposited on the rear surface of the transparent substrate can erode over time, in which case, an intrinsic luster of the deposited metal is lost.
  • Ni and Cr which are heavy metals are deposited in a very small amount, they may be detrimental to the human body and contribute to various diseases as well as their process by-products may cause a serious damage to environment and ecosystem.
  • Such a technique which alternately deposits oxides such as such as SiO and TiO repeatedly on the rear surface of the transparent substrate to manufacture the display unit-protecting window, also encounters the following problems. That is, since TiO does not exhibit a luster of an extent equivalent to that of Ni and Cr, SiO and TiO are alternately deposited repeatedly on the rear surface of the transparent substrate 15 to 20 times so as to obtain a desired luster, which requires excessive time and cost and makes it difficult to accurately and stably achieve the desired luster. Disclosure of Invention
  • Another object of the present invention is to provide a method of fabricating a plate having a reflective property, in which the plate is resistant to infiltration of static electricity into the display unit, is easily not eroded, and is not detrimental to environment.
  • a method of fabricating a plate having a reflective property comprising: preparing a substrate; depositing a SiO on the prepared substrate to a predetermined thickness to thereby form a first layer 100; and depositing a Ti O on the first layer to a predetermined thickness to thereby form a second layer 200.
  • the thickness of the first layer is 300A and the thickness of the second layer is 10OA.
  • the preparing the substrate comprises depositing an SiO on the substrateto a predetermined thickness to thereby form a third layer.
  • the thickness of the first layer is 150A
  • the thickness of the second layer is IOOA
  • the thickness of the third layer is 200A.
  • a plate having a reflective property fabricated by the plate fabricating method.
  • a plate having a reflective property comprising: a substrate; a first layer formed by depositing an SiO on the substrateto a predetermined thickness; and a second layer formed by depositing a Ti O on the first layer to a predetermined thickness.
  • the plate having a reflective property further comprises a third layer formed by depositing an SiO on the substrate to a predetermined thickness, and the first layer is formed on the third layer.
  • FIG. 1 is a cross-sectional view illustrating a layered structure of a plate fabricated by a method of fabricating a plate having a reflective property according to one embodiment of the present invention
  • FIG. 2 is a cross-sectional view illustrating a layered structure of a plate fabricated by a method of fabricating a plate having a reflective property according to another embodiment of the present invention.
  • FIG. 3 is a perspective view illustrating a cellular phone including a window for protecting a display unit. Best Mode for Carrying Out the Invention
  • FIG. 1 is a cross-sectional view illustrating a layered structure of a plate fabricated by a method of fabricating a plate having a reflective property according to one embodiment of the present invention.
  • the method of fabricating a plate having a reflective property comprises: depositing an SiO 120 on a substrate 400 to a predetermined thickness to thereby form a first layer 100; and depositing a Ti O 220 on the first layer to a predetermined thickness to thereby form a second layer 200.
  • the substrate 400 may be made of a transparent material so that a user can identify contents displayed on the display unit therethrough.
  • a material of the transparent substrate 400 may use glass, acryl, polyester, polycarbonate, polymethyl methacrylate (PMMA), etc.
  • a Ti O 220 of a high refractive index is deposited on the first layer to a predetermined thickness to form a second layer 200, so that a plate having a reflective property can be fabricated.
  • a user can identify the reflective property of the substrate through the direction of arrows indicated by reference numeral 500. Since the Ti O exhibits a luster of an extent equivalent to that of Ni and Cr, it is possible to obtain a desired luster.
  • the thickness 120 of the first layer may be 300A and the thickness 220 of the second layer may be 10OA. These thicknesses are merely examples, and various combinations of the thickness 120 of the first layer and the thickness 220 of the second layer are enabled so as to have a desired reflective property and luster.
  • the deposition method may use an electron beam deposition (EBD) which can be easily performed by those skilled in the art.
  • ELD electron beam deposition
  • the substrate 400 in order for the deposition to be easily performed, the substrate 400 must be heated up to a temperature at which the substrate can be combined with a to-be-deposited material.
  • the substrate such as glass or acryl
  • a pre-treatment of etching the surface of the substrate is performed using argon (Ar) plasma and then the deposition may be performed using an electron beam evaporator.
  • Ar argon
  • any deposition method is possible which can be conducted by those skilled in the art besides the electron beam deposition.
  • the method of fabricating a plate having a reflective property according to one embodiment of the present invention enables the fabricating time and cost to be reduced due to a simple fabricating process, and makes it possible to stably achieve a beautiful luster as employing Ti O .
  • the plate fabricated by a method of fabricating a plate having a reflective property according to this embodiment is resistant to infiltration of static electricity to the display unit as not having a metallic layer deposited thereon, is easily not eroded over time to thereby prevent damage of a luster, and is not detrimental to environment.
  • the method of fabricating a plate having a reflective property according to the present invention is also called "omega ( ⁇ ) deposition".
  • FIG. 2 is a cross-sectional view illustrating a layered structure of a plate fabricated by a method of fabricating a plate having a reflective property according to another embodiment of the present invention.
  • the method of fabricating a plate having a reflective property comprises: depositing an SiO320 on a substrate 400 to a predetermined thickness to thereby form a third layer 300; depositing an SiO 120 on the third layer to a predetermined thickness to thereby form a first layer 100; and depositing a Ti O 220 on the first layer to a predetermined thickness to thereby form a second layer 200.
  • the same reference numerals will be used to designate the same elements as in the previous embodiment, and their detailed description will be avoided.
  • the thickness 120 of the first layer may be 150A the thickness
  • the thickness 320 of the third layer may be 200A. These thicknesses are merely examples, and various combinations of the thickness 120 of the first layer, the thickness 220 of the second layer and the thickness 320 of the third layer are enabled so as to have a desired reflective property and luster.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Mathematical Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

There is herein disclosed a method of fabricating a plate having a reflective property, comprising: depositing an SiO2 on a substrate to a predetermined thickness to thereby form a first layer; and depositing a Ti3 O5 on the first layer to a predetermined thickness to thereby form a second layer. According to the present invention, it is possible to provide a method of fabricating a plate having a reflective property, in which the plate is resistant to infiltration of static electricity of the display unit, is easily not eroded, and can stably achieve a beautiful luster while being not detrimental to environment.

Description

Description
PLATE WITH A REFLECTIVE SURFACE AND METHOD FOR
PRODUCING THE SAME
Technical Field
[1] The present invention relates to a plate having a reflective property and method of fabricating the same, and more particularly to, such a plate having a reflective property, which is formed by deposition of an oxide layer and method of fabricating the same. Background Art
[2] Currently, information terminals such as cellular phones, personal digital assistants
(PDAs) are widely being spread around the world. A liquid crystal display (LCD) is used as a display unit for such a portable information terminal. The display unit typically includes a window provided on the front surface thereof to protect the display unit. FIG. 3 is a perspective view illustrating a cellular phone including a window for protecting a display unit. As shown in FIG. 3, the window 64 for protecting the display unit includes a central part 66 formed of a transparent substrate made of as glass or acryl and a peripheral part 64 having metals such as Ni, Cr, Al, Cu, Ag, etc., or oxides such as such as Al O , SiO , TiO , ZnO etc., coated on the rear surface of the
2 3 2 2 2, transparent substrate. A user can identify contents displayed on the display unit through the central part 66 formed of only the transparent substrate.
[3] A high-reflectivity material is coated on the rear surface of the transparent substrate made of as glass or acryl so as to allow a reflective property such as a mirror to be endowed to the peripheral part 68 of the display unit-protecting window. The reflectivity of the transparent substrate varies depending on a material coated on the rear surface of the transparent substrate. A portable information terminal including a window made of such a material exhibits an excellent outer appearance as well as enables the user to easily and simply see his or her feature without carrying a hand mirror. A technique is well known in which metals such as Ni, Cr, Al, etc., are deposited on or oxides such as such as SiO and TiO are alternately deposited repeatedly on the rear surface of the transparent substrate made of as glass or acryl so as to allow the window having the reflective property to boast a beautiful gloss.
[4] However, such a technique, which deposits metals such as Ni, Cr, Al, etc., on the rear surface of the transparent substrate to manufacture the display unit-protecting window, entails the following shortcomings. That is, metals such as Ni, Cr, Al, etc., is high in electric conductivity, and hence a path is provided which can allow static electricity to easily infiltrate into the display unit, which may give a damage to main chips built inside the portable information terminal. The display unit such as an LCD is the most sensitive to an electrostatic discharge (ESD) test which allows one of factors for performance examination of the portable information terminal, i.e., static electricity to infiltrate into the terminal so as to measure the effect of static electricity on the terminal. In this case, the static electricity infiltrating into the display unit may give a fatal damage to the display unit. In addition, a metal material deposited on the rear surface of the transparent substrate can erode over time, in which case, an intrinsic luster of the deposited metal is lost. Besides, although Ni and Cr which are heavy metals are deposited in a very small amount, they may be detrimental to the human body and contribute to various diseases as well as their process by-products may cause a serious damage to environment and ecosystem.
[5] Such a technique, which alternately deposits oxides such as such as SiO and TiO repeatedly on the rear surface of the transparent substrate to manufacture the display unit-protecting window, also encounters the following problems. That is, since TiO does not exhibit a luster of an extent equivalent to that of Ni and Cr, SiO and TiO are alternately deposited repeatedly on the rear surface of the transparent substrate 15 to 20 times so as to obtain a desired luster, which requires excessive time and cost and makes it difficult to accurately and stably achieve the desired luster. Disclosure of Invention
Technical Problem
[6] Accordingly, it is an object of the present inventors to provide a method of fabricating a plate having a reflective property, in which fabricating time and cost is reduced, and an excellent luster can be achieved stably.
[7] Another object of the present invention is to provide a method of fabricating a plate having a reflective property, in which the plate is resistant to infiltration of static electricity into the display unit, is easily not eroded, and is not detrimental to environment. Technical Solution
[8] To accomplish the above objects, according to one aspect of the present invention, there is provided a method of fabricating a plate having a reflective property, the method comprising: preparing a substrate; depositing a SiO on the prepared substrate to a predetermined thickness to thereby form a first layer 100; and depositing a Ti O on the first layer to a predetermined thickness to thereby form a second layer 200.
[9] Preferably, the thickness of the first layer is 300A and the thickness of the second layer is 10OA.
[10] The preparing the substrate comprises depositing an SiO on the substrateto a predetermined thickness to thereby form a third layer. [11] Preferably, the thickness of the first layer is 150A the thickness of the second layer is IOOA and the thickness of the third layer is 200A.
[12] To accomplish the above objects, according to another aspect of the present invention, there is also provided a plate having a reflective property fabricated by the plate fabricating method.
[13] To accomplish the above objects, according to another aspect of the present invention, there is also provided a plate having a reflective property, comprising: a substrate; a first layer formed by depositing an SiO on the substrateto a predetermined thickness; and a second layer formed by depositing a Ti O on the first layer to a predetermined thickness.
[14] Preferably, the plate having a reflective property further comprises a third layer formed by depositing an SiO on the substrate to a predetermined thickness, and the first layer is formed on the third layer.
Advantageous Effects
[15] As described above, according to the present invention, it is possible to provide a method of fabricating a plate having a reflective property, in which fabricating time and cost is reduced, and an excellent luster can be achieved stably.
[16] Also, according to the present invention, it is possible to provide a method of fabricating a plate having a reflective property, in which the plate is resistant to infiltration of static electricity of the display unit, is easily not eroded, and is not detrimental to environment. Brief Description of the Drawings
[17] FIG. 1 is a cross-sectional view illustrating a layered structure of a plate fabricated by a method of fabricating a plate having a reflective property according to one embodiment of the present invention;
[18] FIG. 2 is a cross-sectional view illustrating a layered structure of a plate fabricated by a method of fabricating a plate having a reflective property according to another embodiment of the present invention; and
[19] FIG. 3 is a perspective view illustrating a cellular phone including a window for protecting a display unit. Best Mode for Carrying Out the Invention
[20] Now, embodiments of present invention will be described in more detail hereinafter with reference to the accompanying drawings.
[21] As used herein, the phase "on a substrate" is intended to include "just on a substrate while being adjacent to the substrate" as well as "above a substrate, but not adjacent to the substrate". An example of the latter may include "just on another material layer formed just on a substrate". A transparent layer may be used as the other material layer [22] FIG. 1 is a cross-sectional view illustrating a layered structure of a plate fabricated by a method of fabricating a plate having a reflective property according to one embodiment of the present invention.
[23] Referring to FIG. 1, the method of fabricating a plate having a reflective property according to one embodiment of the present invention comprises: depositing an SiO 120 on a substrate 400 to a predetermined thickness to thereby form a first layer 100; and depositing a Ti O 220 on the first layer to a predetermined thickness to thereby form a second layer 200.
[24] In case where the substrate 400 is used as a window for protecting a display unit, it may be made of a transparent material so that a user can identify contents displayed on the display unit therethrough.
[25] A material of the transparent substrate 400 may use glass, acryl, polyester, polycarbonate, polymethyl methacrylate (PMMA), etc.
[26] After an SiO 120 of a low refractive index has been deposited on the substrate 400 to a predetermined thickness to form a first layer 100, a Ti O 220 of a high refractive index is deposited on the first layer to a predetermined thickness to form a second layer 200, so that a plate having a reflective property can be fabricated. A user can identify the reflective property of the substrate through the direction of arrows indicated by reference numeral 500. Since the Ti O exhibits a luster of an extent equivalent to that of Ni and Cr, it is possible to obtain a desired luster. In order to fabricate a plate having an excellent reflective property and a beautiful luster, the thickness 120 of the first layer may be 300A and the thickness 220 of the second layer may be 10OA. These thicknesses are merely examples, and various combinations of the thickness 120 of the first layer and the thickness 220 of the second layer are enabled so as to have a desired reflective property and luster.
[27] The deposition method may use an electron beam deposition (EBD) which can be easily performed by those skilled in the art. In this case, in order for the deposition to be easily performed, the substrate 400 must be heated up to a temperature at which the substrate can be combined with a to-be-deposited material. But, in case of the substrate such as glass or acryl, there is a limitation in raising the temperature of the substrate. Thus, in place of raising the temperature of the substrate, a pre-treatment of etching the surface of the substrate is performed using argon (Ar) plasma and then the deposition may be performed using an electron beam evaporator. Alternatively, any deposition method is possible which can be conducted by those skilled in the art besides the electron beam deposition.
[28] The method of fabricating a plate having a reflective property according to one embodiment of the present invention enables the fabricating time and cost to be reduced due to a simple fabricating process, and makes it possible to stably achieve a beautiful luster as employing Ti O . In addition, the plate fabricated by a method of fabricating a plate having a reflective property according to this embodiment is resistant to infiltration of static electricity to the display unit as not having a metallic layer deposited thereon, is easily not eroded over time to thereby prevent damage of a luster, and is not detrimental to environment.
[29] In addition to this embodiment, the method of fabricating a plate having a reflective property according to the present invention is also called "omega (Ω) deposition".
[30] FIG. 2 is a cross-sectional view illustrating a layered structure of a plate fabricated by a method of fabricating a plate having a reflective property according to another embodiment of the present invention.
[31] Referring to FIG. 2, the method of fabricating a plate having a reflective property according to this embodiment comprises: depositing an SiO320 on a substrate 400 to a predetermined thickness to thereby form a third layer 300; depositing an SiO 120 on the third layer to a predetermined thickness to thereby form a first layer 100; and depositing a Ti O 220 on the first layer to a predetermined thickness to thereby form a second layer 200. In this embodiment, it is noted that the same reference numerals will be used to designate the same elements as in the previous embodiment, and their detailed description will be avoided.
[32] SiO, SiO and Ti O each having different refractive indexes and reflectivities are sequentially deposited on the substrate 400 in this order so as to induce an optical interaction so that a plate having an excellent reflective property and a beautiful luster can be fabricated. In order to fabricate the plate having an excellent reflective property and a beautiful luster, the thickness 120 of the first layer may be 150A the thickness
220 of the second layer may be IOOA and the thickness 320 of the third layer may be 200A. These thicknesses are merely examples, and various combinations of the thickness 120 of the first layer, the thickness 220 of the second layer and the thickness 320 of the third layer are enabled so as to have a desired reflective property and luster. [33] While the present invention has been described with reference to the particular illustrative embodiments, it is not to be restricted by the embodiments but only by the appended claims. It is to be appreciated that those skilled in the art can change or modify the embodiments without departing from the scope and spirit of the present invention.

Claims

Claims
[1] A method of fabricating a plate having a reflective property, the method comprising: preparing a substrate; depositing a SiO on the prepared substrateto a predetermined thickness to thereby form a first layer; and depositing a Ti O on the first layer to a predetermined thickness to thereby form a second layer.
[2] The method as defined in claim 1, wherein the thickness of the first layer is 300A and the thickness of the second layer is 10OA.
[3] The method as defined in claim 1, wherein the preparing the substrate comprises depositing an SiO on the substrate to a predetermined thickness to thereby form a third layer.
[4] The method as defined in claim 3, wherein the thickness of the first layer is 150A the thickness of the second layer is IOOA and the thickness of the third layer is
200A. [5] A plate having a reflective property fabricated by the method as defined in any one of claims 1 to 4. [6] A plate having a reflective property, comprising: a substrate; a first layer formed by depositing an SiO on the substrate to a predetermined thickness; and a second layer formed by depositing a Ti O on the first layer to a predetermined thickness. [7] The plate as defined in claim 6, wherein the plate further comprises a third layer formed by depositing an SiOon the prepared substrateto a predetermined thickness, and the first layer is formed on the third layer.
PCT/KR2006/005399 2005-12-21 2006-12-12 Plate with a reflective surface and method for producing the same WO2007073051A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
KR10-2005-0126675 2005-12-21
KR1020050126675A KR100698761B1 (en) 2005-12-21 2005-12-21 Plate with a reflective surface and method for producing the same

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Cited By (1)

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CN104561899A (en) * 2014-12-25 2015-04-29 江西昌佳鑫科技有限公司 Vacuum coating camera cover plate and preparation method thereof

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JPH05150105A (en) * 1991-12-02 1993-06-18 Tokyo Tokushu Glass Kk Metal-surfaced mirror and production thereof
JPH0651110A (en) * 1992-07-29 1994-02-25 Central Glass Co Ltd Surface reflecting mirror
JPH06312467A (en) * 1993-03-31 1994-11-08 Nippon Zeon Co Ltd Optical member and optical component
US20040075910A1 (en) * 2002-09-09 2004-04-22 Shinmaywa Industries, Ltd. Optical antireflection film and process for forming the same
US20040191682A1 (en) * 2001-08-03 2004-09-30 Marechal Nadine Genevieve Scratch masking coatings for optical substrates
KR200397439Y1 (en) * 2005-07-19 2005-10-04 (주) 태양기전 Cellular phone case

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JP2002006764A (en) 2000-06-19 2002-01-11 Sumitomo Chem Co Ltd Display window material for portable telephone

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JPH05150105A (en) * 1991-12-02 1993-06-18 Tokyo Tokushu Glass Kk Metal-surfaced mirror and production thereof
JPH0651110A (en) * 1992-07-29 1994-02-25 Central Glass Co Ltd Surface reflecting mirror
JPH06312467A (en) * 1993-03-31 1994-11-08 Nippon Zeon Co Ltd Optical member and optical component
US20040191682A1 (en) * 2001-08-03 2004-09-30 Marechal Nadine Genevieve Scratch masking coatings for optical substrates
US20040075910A1 (en) * 2002-09-09 2004-04-22 Shinmaywa Industries, Ltd. Optical antireflection film and process for forming the same
KR200397439Y1 (en) * 2005-07-19 2005-10-04 (주) 태양기전 Cellular phone case

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN104561899A (en) * 2014-12-25 2015-04-29 江西昌佳鑫科技有限公司 Vacuum coating camera cover plate and preparation method thereof

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