JPH0651110A - Surface reflecting mirror - Google Patents

Surface reflecting mirror

Info

Publication number
JPH0651110A
JPH0651110A JP20222192A JP20222192A JPH0651110A JP H0651110 A JPH0651110 A JP H0651110A JP 20222192 A JP20222192 A JP 20222192A JP 20222192 A JP20222192 A JP 20222192A JP H0651110 A JPH0651110 A JP H0651110A
Authority
JP
Japan
Prior art keywords
layer
oxygen
film
reflecting layer
tiox
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP20222192A
Other languages
Japanese (ja)
Other versions
JP2637016B2 (en
Inventor
Koichi Furuya
孝一 古屋
Nobuyuki Takeuchi
伸行 竹内
Yoshio Asai
祥生 浅井
Toshiaki Ito
俊明 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP20222192A priority Critical patent/JP2637016B2/en
Publication of JPH0651110A publication Critical patent/JPH0651110A/en
Application granted granted Critical
Publication of JP2637016B2 publication Critical patent/JP2637016B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Optical Elements Other Than Lenses (AREA)
  • Surface Treatment Of Glass (AREA)

Abstract

PURPOSE:To easily form a film excellent in adhesion and reflectance by forming a light reflecting layer consisting of a specified substrate layer, intermediate layer, reflecting layer and protective layer on the surface of a glass. CONSTITUTION:A light reflecting layer is formed on the surface of a glass to constitute the surface reflecting mirror. The light reflecting layer consists of a substrate layer of TiOx (where 0<x<=2) by physical vapor deposition, an intermediate layer of AlOy (where 0<y<=3/2), an Al reflecting layer ands the transparent protective film of oxides, oxynitrides or oxycarbinde are laminated to constitute the mirror. The transparent protective film consists of a single layer of Ti, Si, TiSi, the oxide, oxynitride and oxycarbide of Ta or the plural layers of the appropriately selected materials. The TiOx substrate layer is obtained by sputtering using a titanium target in an oxygen-contg. atmosphere, and the AlOx intermediate layer is obtained by sputtering using an aluminum target in an oxygen-contg. atmosphere.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、自動車用反射ミラー、
液晶プロジェクト用ミラー、バックライト液晶ディスプ
レー用ミラー、その他各種反射ミラーとして多用される
表面反射鏡に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an automobile reflection mirror,
The present invention relates to a surface reflection mirror, which is often used as a mirror for liquid crystal projects, a mirror for backlight liquid crystal displays, and other various reflection mirrors.

【0002】[0002]

【従来技術とその問題点】表面反射鏡としては、ガラス
等の平滑基板にAl等の高反射率を有する金属膜を膜付け
し、あるいは更に透明保護膜を積層することは公知であ
る。
2. Description of the Related Art As a surface reflecting mirror, it is known that a metal film having a high reflectance such as Al is formed on a smooth substrate such as glass, or a transparent protective film is further laminated.

【0003】特開昭61-133902 号には自動車用反射鏡に
おいて、ガラス基板にTiO2からなる薄膜と、その上にAl
-Ti 合金系あるいはAl-Cr 合金系等の反射層を積層する
ことが開示されている。上記膜構成は自動車用反射鏡の
反射率規格に適合せしめるとともに、薄膜と反射層間の
光の干渉作用により各種鏡面色相を得ることを目的とす
るものであって、本発明と目的、構成、効果において相
違する。
Japanese Laid-Open Patent Publication No. 61-133902 discloses an automobile reflector in which a thin film of TiO 2 is formed on a glass substrate and Al is formed on the thin film.
It is disclosed that a reflection layer such as a -Ti alloy system or an Al-Cr alloy system is laminated. The above film structure is intended to obtain various specular hues by the interference effect of light between the thin film and the reflective layer while conforming to the reflectance standard of the automobile reflector, and the present invention and the object, structure and effect. Differ in.

【0004】また特開昭60-178402 号にはハーフミラー
において、ガラス基板にTiO2等の下地薄膜層と、その上
にAlからなる半反射層と、さらにSiO2、SiO あるいはTi
O2等の表面薄膜層を積層することが開示されている。下
地薄膜層としてのTiO2は、それ自体ガラス基板同様のア
モルファス構造をとることができ、ガラス基板との密着
性に優れるが、金属Al層とは材質物性等が異なり、例え
ば金属Alの熱膨張係数が遙かに大きい等の理由からAl層
との密着性において、なお問題を残す。
Further, in Japanese Laid-Open Patent Publication No. 60-178402, a half mirror, in a glass substrate, an underlying thin film layer of TiO 2 or the like, a semi-reflective layer made of Al thereon, and further SiO 2 , SiO or Ti.
Laminating a surface thin film layer such as O 2 is disclosed. TiO 2 as the underlying thin film layer itself can have an amorphous structure similar to that of a glass substrate and has excellent adhesion to a glass substrate, but has different physical properties from the metal Al layer, such as thermal expansion of metal Al. There is still a problem in adhesion with the Al layer because the coefficient is much larger.

【0005】本発明は上記問題点を解消し、容易に膜形
成できる表面反射鏡を提供するものである。
The present invention solves the above problems and provides a surface reflecting mirror which can be easily formed into a film.

【0006】[0006]

【問題点を解決するための手段】本発明は、ガラスの表
面に光反射層を形成した表面反射鏡であって、該光反射
層が物理蒸着法によりTiOx (ただし 0<x ≦2)よりなる
下地層と、AlOy (ただし0<y ≦3/2)よりなる中間層
と、Al反射層、およびこれを保護する透明な酸化物、酸
素窒化物あるいは酸素炭化物膜を積層形成してなるこ
と、さらに透明保護膜がTi、Si、TiSiまたはTaの酸化
物、酸素窒化物または酸素炭化物よりなる単層、または
これらを適宜選択した複数層よりなること、から構成さ
れる。
The present invention is a surface reflecting mirror having a light-reflecting layer formed on the surface of glass, wherein the light-reflecting layer is formed from TiOx (where 0 <x≤2) by physical vapor deposition. A base layer, an intermediate layer made of AlOy (where 0 <y ≤3 / 2), an Al reflection layer, and a transparent oxide, oxynitride or oxygen carbide film for protecting the same. Furthermore, the transparent protective film is composed of a single layer made of an oxide of Ti, Si, TiSi, or Ta, an oxygen nitride, or an oxygen carbide, or a plurality of layers appropriately selected from these.

【0007】前記物理蒸着法とは、スパッタリング法、
真空蒸着法、電子ビーム蒸着法その他の公知の物理的蒸
着手段を含むが、積層成膜が容易なこと、膜の密着性が
良好なこと等を勘案すればスパッタリング法が推奨され
る。
The physical vapor deposition method is a sputtering method,
Although it includes a vacuum vapor deposition method, an electron beam vapor deposition method, and other known physical vapor deposition means, the sputtering method is recommended in consideration of easy laminated film formation, good film adhesion, and the like.

【0008】TiOx下地層は、チタンターゲットを用い酸
素含有雰囲気下でスパッタリングすることにより得ら
れ、ガラス基板同様のアモルファス構造を呈するもの
で、それ自体堅固で特にガラス基板との密着性に優れ
る。
The TiOx underlayer is obtained by sputtering with a titanium target in an oxygen-containing atmosphere, has an amorphous structure similar to that of a glass substrate, and is solid by itself and particularly excellent in adhesion to the glass substrate.

【0009】さらに該下地層と後述Al反射層との密着性
を向上するうえで間にAlOy層を介在させる。AlOy中間層
はアルミニウムターゲットを用い前記同様酸素含有雰囲
気下でスパッタリングするもので、やはりアモルファス
構造を採り、前記TiOx下地層に良好に密着するととも
に、後述Al反射層と同様のアルミニウムを主材とするこ
とによりAl反射層との密着性にも優れる。
Further, an AlOy layer is interposed between the underlayer and the Al reflective layer described later in order to improve the adhesion. The AlOy intermediate layer is one that is sputtered in an oxygen-containing atmosphere using an aluminum target in the same manner as described above, and also adopts an amorphous structure and adheres well to the TiOx underlayer, and mainly uses aluminum similar to the Al reflective layer described later. As a result, the adhesion to the Al reflective layer is also excellent.

【0010】Al反射層は、アルミニウムターゲットを用
い、不活性雰囲気下でスパッタリングするもので、可視
光を反射するうえで充分な膜厚、600A以上に成膜すれば
よい。
The Al reflection layer is formed by sputtering in an inert atmosphere using an aluminum target, and may be formed to a film thickness of 600 A or more, which is sufficient for reflecting visible light.

【0011】Al反射層の上には同様なスパッタリング法
により、所望の雰囲気下で保護膜としてのSi-O、Si-C-
O、Si-N-O、Ti-O、Ti-C-O、Ti-N-O、TiSi-O、Ta-O等の
層を一層ないし複数層膜付け積層するもので、耐候性、
耐擦傷性等を向上せしめることができる。
On the Al reflection layer, Si-O and Si-C- as a protective film are formed in a desired atmosphere by the same sputtering method.
O, Si-NO, Ti-O, Ti-CO, Ti-NO, TiSi-O, Ta-O, etc. are laminated by laminating one or more layers, weather resistance,
It is possible to improve scratch resistance and the like.

【0012】[0012]

【実施例】以下本発明の一例としてのスパッタリング法
を採用した具体的実施例を詳述するが、本発明はこれに
限定されるものではない。
EXAMPLES Specific examples in which a sputtering method is adopted as an example of the present invention will be described in detail below, but the present invention is not limited thereto.

【0013】洗浄、乾燥した適宜サイズのガラス基板を
プラズマスパッタリング法によりTiターゲット採用、酸
素含有雰囲気下でTiOx層を40〜200Aの膜厚範囲で成膜す
る。なおx は 0より大で 2以下の範囲であればよく、好
適にはアルゴン- 酸素( 酸素50〜100 %) 雰囲気下で 1
≦x ≦2 の範囲において、ガラス基板との密着性に優れ
たアモルファス状のTiOxが得られる。膜厚40A 未満では
下地層としての作用が不充分で密着性において満足でき
ず、200Aを越えても密着性がさらに向上するわけではな
く、経済性を阻害する。
A cleaned and dried glass substrate of an appropriate size is used as a Ti target by a plasma sputtering method, and a TiOx layer is formed in a film thickness range of 40 to 200 A in an oxygen-containing atmosphere. It should be noted that x may be in the range of more than 0 and 2 or less, and preferably 1 in an argon-oxygen (oxygen 50 to 100%) atmosphere.
In the range of ≤x≤2, amorphous TiOx having excellent adhesion to the glass substrate can be obtained. If the film thickness is less than 40 A, the function as a base layer is insufficient and the adhesiveness is unsatisfactory. If the film thickness exceeds 200 A, the adhesiveness is not further improved and the economical efficiency is impaired.

【0014】次いでAlターゲット採用、酸素含有雰囲気
下でAlOy層を30〜100Aの膜厚範囲で成膜する。なおy は
0より大で3/2 以下の範囲であればよく、好適にはアル
ゴン- 酸素( 酸素0.5 〜数%) 雰囲気下で 1/2≦y ≦3/
2 の範囲において、TiOx層および後述するAl反射層との
密着性に優れたアモルファス状のAlOy層が得られる。膜
厚30A 未満では中間介在層としての作用が不充分で密着
性において満足できず、100Aを越えても密着性がさらに
向上するわけではなく、経済性を阻害する。
Then, an Al target is adopted and an AlOy layer is formed in a film thickness range of 30 to 100 A in an oxygen-containing atmosphere. Note that y is
It may be in the range of more than 0 and 3/2 or less, preferably 1/2 ≤ y ≤ 3 / in an argon-oxygen (oxygen 0.5 to several%) atmosphere.
In the range of 2, an amorphous AlOy layer having excellent adhesion to the TiOx layer and the Al reflection layer described later can be obtained. If the film thickness is less than 30A, the function as an intermediate intervening layer is insufficient and the adhesiveness is not satisfactory. If the film thickness exceeds 100A, the adhesiveness is not further improved and the economical efficiency is impaired.

【0015】さらにAlターゲット採用、アルゴン雰囲気
下でAl反射層を600 〜1200A の範囲で成膜する。Al層の
膜厚はTiOx、AlOyの膜厚とも関連するが、大略600A以上
であれば、光反射に充分である。
Further, an Al target is adopted, and an Al reflection layer is formed in a range of 600 to 1200 A under an argon atmosphere. The film thickness of the Al layer is related to the film thickness of TiOx and AlOy, but if it is approximately 600 A or more, it is sufficient for light reflection.

【0016】透明保護層を形成するには、Tiターゲッ
ト、Siターゲット、TiSiターゲット、Taターゲット、あ
るいは前記金属の炭化物、窒化物ターゲットを適宜採用
することにより、所望の酸素含有雰囲気下でそれらの酸
化物、酸素窒化物、酸素炭化物を形成でき、さらにはそ
れらの積層膜とすることもできる。膜厚は光をよく透過
し、特に特定の光を吸収して着色を与えない範囲、他方
充分な耐擦傷性、耐候性を与える範囲を勘案し、膜種類
にもよるが100 〜500Aの膜厚範囲とするのが好ましい。
このようにすることにより表面反射鏡を完成するもので
ある。
To form the transparent protective layer, a Ti target, a Si target, a TiSi target, a Ta target, or a carbide or nitride target of the above metal is appropriately adopted to oxidize them in a desired oxygen-containing atmosphere. Materials, oxynitrides, and oxycarbides can be formed, and further, a laminated film thereof can be formed. The film thickness is a range of 100-500A, depending on the type of film, considering the range where light is transmitted well, and in particular, it absorbs specific light and does not give coloring, on the other hand, it gives sufficient scratch resistance and weather resistance. The thickness range is preferable.
By doing so, the surface reflecting mirror is completed.

【0017】〔試験例、比較試験例〕上記製法に則り、
洗浄、乾燥したサイズ600mm ×600mm ×3mm(厚み) のガ
ラス基板に表1に示す膜構成で各種表面鏡を作成した。
[Test Example, Comparative Test Example] In accordance with the above manufacturing method,
Various surface mirrors having the film constitution shown in Table 1 were prepared on a washed and dried glass substrate having a size of 600 mm × 600 mm × 3 mm (thickness).

【0018】該鏡について分光光度計 (U-400 型. 日立
製作所製) により反射率を測定し、JISZ8722に則り可視
光平均反射率を算定した。また接着テープ (スコッチメ
ンディングテープ 3M#800)を膜上に貼着後、これを引き
剥がし、45mmφ当たりの剥離、発生したピンホール数
(個数) を鏡下観察、測定した。
The reflectance of the mirror was measured with a spectrophotometer (U-400 type, manufactured by Hitachi Ltd.), and the visible light average reflectance was calculated according to JIS Z8722. In addition, after attaching adhesive tape (Scotch Mending Tape 3M # 800) on the film, peeling it off, peeling per 45 mmφ, number of pinholes generated
The (number) was observed and measured under a mirror.

【0019】さらに別に膜表面に 6枚重ねのネルを介在
させて100g/cm2の重錘を乗せ、これをストローク距離10
0mm で100 回往復摺動して該摺動部のの透過率の変化(
初期において透過率 0%) を測定した。また50℃、95%R
H の雰囲気中に24hr放置し、曇りその他の変化を観察
し、これらを併せて総合評価した。結果を表1に示す。
Separately, a weight of 100 g / cm 2 was placed on the surface of the film with 6 layers of flannel interposed, and the weight was set to a stroke distance of 10
Sliding 100 times back and forth at 0 mm changes the transmittance of the sliding part (
The transmittance was 0% at the initial stage. Also 50 ℃, 95% R
The sample was left in an H 2 atmosphere for 24 hours, and cloudiness and other changes were observed. The results are shown in Table 1.

【0020】[0020]

【表1】 [Table 1]

【0021】表から明らかなように、本発明の実施の態
様にかかる試験例の範囲において良好であり、他方比較
試験例は2項目ないしそれ以上において劣り、表面反射
鏡として不充分であることが明白であった。
As is apparent from the table, the range of the test example according to the embodiment of the present invention is good, while the comparative test example is inferior in two items or more and is insufficient as a surface reflecting mirror. It was obvious.

【0022】[0022]

【発明の効果】本発明によれば各層相互の密着性が良好
で、耐擦傷性、耐候性等に優れ、また反射率も良好であ
る。
According to the present invention, the adhesion between the layers is good, the scratch resistance, the weather resistance and the like are excellent, and the reflectance is also good.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 伊藤 俊明 三重県松阪市大口町1510番地 セントラル 硝子株式会社テクニカルセンター内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Toshiaki Ito 1510 Oguchi-cho, Matsusaka-shi, Mie Central Glass Co., Ltd. Technical Center

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】ガラスの表面に光反射層を形成した表面反
射鏡であって、該光反射層が物理蒸着法によりTiOx (た
だし 0<x ≦2)よりなる下地層と、AlOy (ただし 0<y
≦3/2)よりなる中間層と、Al反射層、およびこれを保護
する透明な金属酸化物、酸素窒化物あるいは酸素炭化物
の層を積層形成してなる表面反射鏡。
1. A surface-reflecting mirror having a light-reflecting layer formed on the surface of glass, wherein the light-reflecting layer is made of TiOx (where 0 <x ≦ 2) by physical vapor deposition and AlOy (where 0). <Y
A surface reflecting mirror formed by laminating an intermediate layer consisting of ≦ 3/2), an Al reflecting layer, and a layer of a transparent metal oxide, an oxygen nitride or an oxygen carbide that protects the Al reflecting layer.
【請求項2】透明保護層がTi、Si、TiSiまたはTaの酸化
物、酸素窒化物または酸素炭化物よりなる単層、または
これらを適宜選択した複数層よりなることを特徴とする
請求項1記載の表面反射鏡。
2. The transparent protective layer comprises a single layer made of an oxide of Ti, Si, TiSi or Ta, an oxygen nitride or an oxygen carbide, or a plurality of layers selected from these. Surface reflector.
JP20222192A 1992-07-29 1992-07-29 Surface reflector Expired - Fee Related JP2637016B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP20222192A JP2637016B2 (en) 1992-07-29 1992-07-29 Surface reflector

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20222192A JP2637016B2 (en) 1992-07-29 1992-07-29 Surface reflector

Publications (2)

Publication Number Publication Date
JPH0651110A true JPH0651110A (en) 1994-02-25
JP2637016B2 JP2637016B2 (en) 1997-08-06

Family

ID=16453973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP20222192A Expired - Fee Related JP2637016B2 (en) 1992-07-29 1992-07-29 Surface reflector

Country Status (1)

Country Link
JP (1) JP2637016B2 (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6957895B2 (en) 2003-02-28 2005-10-25 Canon Kabushiki Kaisha Reflection mirror and optical equipment using the same
JP2007065261A (en) * 2005-08-31 2007-03-15 Asahi Glass Co Ltd Reflector
KR100698761B1 (en) * 2005-12-21 2007-03-26 주식회사 이엠따블유안테나 Plate with a reflective surface and method for producing the same
JP2009003063A (en) * 2007-06-20 2009-01-08 Central Glass Co Ltd Front surface mirror
WO2022177782A1 (en) * 2021-02-22 2022-08-25 Corning Incorporated Laminates and methods of making the same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5142372B2 (en) 2007-11-26 2013-02-13 株式会社リコー Mirror, optical scanning device, and image forming apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6957895B2 (en) 2003-02-28 2005-10-25 Canon Kabushiki Kaisha Reflection mirror and optical equipment using the same
CN100371739C (en) * 2003-02-28 2008-02-27 佳能株式会社 Reflective mirror and optical instrument therewith
JP2007065261A (en) * 2005-08-31 2007-03-15 Asahi Glass Co Ltd Reflector
KR100698761B1 (en) * 2005-12-21 2007-03-26 주식회사 이엠따블유안테나 Plate with a reflective surface and method for producing the same
WO2007073051A1 (en) * 2005-12-21 2007-06-28 E.M.W. Antenna Co., Ltd. Plate with a reflective surface and method for producing the same
JP2009003063A (en) * 2007-06-20 2009-01-08 Central Glass Co Ltd Front surface mirror
WO2022177782A1 (en) * 2021-02-22 2022-08-25 Corning Incorporated Laminates and methods of making the same

Also Published As

Publication number Publication date
JP2637016B2 (en) 1997-08-06

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