JPH06312467A - Optical member and optical component - Google Patents

Abstract

PURPOSE:To improve adhesive properties of a base material with an optical film and to prevent peeling, etc., of the film by providing a layer made of a specific ingredient on a surface of the material made of specific resin to constitute the member, and laminating the film on the member to constitute an optical component. CONSTITUTION:A layer containing Ta2O5 as a main ingredient is provided on a surface of a base material made of thermoplastic norbornene thereby to constitute an optical member. An optical film is laminated on the member thereby to constitute an optical component. Further, a dielectric multilayer film or a metal film is formed of the optical film. Thus, adhesive properties of the base material with the optical film are improved, peeling of the optical film is suppressed, and occurrence of a microcrack, etc., is prevented irrespective of a temperature change, etc.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical member and an optical component. More specifically, the present invention relates to an optical member which is made of a thermoplastic norbornene-based resin and which allows an optical film to be adhered and laminated, and an optical film laminated on the optical member. Regarding optical components.

[0002]

2. Description of the Related Art Although glass products have been used for various optical parts, they are being replaced by thermoplastic resin optical material products such as acrylic resin and polycarbonate resin in view of mass productivity and price. This is because the thermoplastic resin optical material molded product is lighter in weight than the glass molded product and a molded product having a complicated shape such as an aspherical shape can be easily molded.

On the surfaces of these optical components, a dielectric multilayer film is sometimes used as an optical film. For example,
In the case of an optical component such as a lens that transmits light, an antireflection film that is a dielectric multilayer film is often formed and used. This is because the incident light is partially reflected on the surface of the base material and further reflected on the emission interface from the base material due to the difference in the refractive index of the base material and the refractive index of the light incident medium, air. This is because it is easy to increase the light transmittance, and by providing the antireflection film, it is possible to reduce the reflection loss at the incident / outgoing interface.

However, the thermoplastic optical material resin molded product is
Generally, when a base material is heated when it is formed, the base material is easily deformed. Since the thermal expansion coefficient is large, micro cracks occur in the dielectric multilayer film in an environment with temperature change, and further, the dielectric multilayer film peels from the base material. There was a problem in terms of adhesion.

Further, among the optical components, in the case of an optical component having a metal film as an optical film, there is a similar problem of adhesion between the reflection layer and the base material.

In the dielectric multilayer film, an undercoat treatment with a silicon resin is performed, or the material of the first layer on the base material (layer in contact with the base material) is SiO, SiO ₂ , Ce.
It is known that these problems are improved by using O ₂ , Ta ₂ O _5, etc. (Japanese Patent Laid-Open No. 1-2807).
No. 01, No. 50-35211, No. 6
3-5723, JP-A-63-81402,
JP-A-63-81403, JP-A-63-8140
No. 4, etc.).

Recently, a thermoplastic norbornene-based resin has been attracting attention as an optical material excellent in moisture resistance, water resistance and heat resistance. However, in the thermoplastic norbornene-based resin molded product, the undercoat is easily peeled off even if the undercoat treatment with the conventionally used silicone resin is performed, and the undercoat is used in precision molded optical parts such as aspherical lenses. There was a problem that the shape changed. In addition, even if SiO, SiO ₂ , or CeO ₂ is vacuum-deposited on a thermoplastic norbornene-based resin molded product, the adhesion is insufficient, and microcracks may occur in the laminated optical film when used in an environment with temperature change. There was a problem of doing. As a result, it has been difficult to obtain an optical component in which an optical film is formed on a substrate made of a thermoplastic norbornene-based resin with good adhesion.

[0008]

DISCLOSURE OF INVENTION Problems to be Solved by the Invention The inventors of the present invention have earnestly studied to develop an optical component in which an optical film is laminated with good adhesion using a thermoplastic saturated norbornene resin molded product as a base material, and as a result, Ta ₂ O _{5 is obtained.} It was found that an optical component having excellent adhesion between the base material and the optical film can be obtained by forming a layer containing as a main component on the base material, and completed the present invention.

[0009]

Thus, according to the present invention, an optical member having a layer containing Ta ₂ O ₅ as a main component on the surface of a substrate made of a thermoplastic norbornene resin, and an optical film laminated on the optical member. An optical component is provided.

(Thermoplastic Norbornene Resin) The thermoplastic norbornene resin used in the present invention is disclosed in JP-A-3-14.
882, JP-A-3-122137, and JP-A-4-63.
Nos. 807 and the like, specifically, ring-opening polymers of norbornene-based monomers, hydrogenated products thereof, addition-type polymers of norbornene-based monomers, norbornene-based monomers and olefins. Examples thereof include addition type polymers and modified products of these polymers.

The norbornene-based monomer is also a monomer known in the above-mentioned publications, JP-A-2-227424 and JP-A-2-276842, and examples thereof include norbornene, its alkyl, alkylidene and aromatic substituted derivatives. And halogens, hydroxyl groups of these substituted or unsubstituted olefins,
Polar group substituents such as ester group, alkoxy group, cyano group, amide group, imide group and silyl group, for example, 2-norbornene, 5-methyl-2-norbornene, 5,5-dimethyl-2-norbornene, 5- Ethyl-2-norbornene, 5-butyl-2-norbornene, 5-ethylidene-
2-norbornene, 5-methoxycarbonyl-2-norbornene, 5-cyano-2-norbornene, 5-methyl-5-methoxycarbonyl-2-norbornene, 5-phenyl-2-norbornene, 5-phenyl-5-methyl- 2-norbornene and the like; multimers of cyclopentadiene, derivatives and substitution products similar to the above, for example, dicyclopentadiene, 2,3-dihydrodicyclopentadiene, 1,4: 5,8-dimethano-1,2, 3, 4, 4
a, 5,8,8a-2,3-cyclopentadienonaphthalene, 6-methyl-1,4: 5,8-dimethano-1,
4,4a, 5,6,7,8,8a-octahydronaphthalene, 6-ethyl-1,4: 5,8-dimethano-1,
4,4a, 5,6,7,8,8a-octahydronaphthalene, 1,4: 5,10: 6,9-trimethano-1,
2, 3, 4, 4a, 5, 5a, 6, 9, 9a, 10, 1
0a-dodecahydro-2,3-cyclopentadienoanthracene and the like; adducts of cyclopentadiene and tetrahydroindene and the like, derivatives and substituents similar to the above,
For example, 1,4-methano-1,4,4a, 4b, 5
8,8a, 9a-octahydrofluorene, 5,8-methano-1,2,3,4,4a, 5,8,8a-octahydro-2,3-cyclopentadienonaphthalene, and the like.

The norbornene-based monomer may be polymerized by a known method, and if necessary, it is a thermoplastic saturated norbornene-based resin by copolymerizing with another copolymerizable monomer or by hydrogenating. It can be a thermoplastic norbornene-based polymer hydrogenated product. Further, a polymer or a polymer hydrogenated product is subjected to a method known in JP-A-3-95235 or the like to obtain an α, β-unsaturated carboxylic acid and / or a derivative thereof, a styrene-based hydrocarbon, an olefin-based unsaturated bond and a hydrolyzed product. It may be modified by using an organosilicon compound having a decomposable group or an unsaturated epoxy monomer. In addition, in order to obtain a resin excellent in moisture resistance and chemical resistance, a thermoplastic norbornene-based resin containing no polar group is preferable.

The molecular weight is GP using cyclohexane as a solvent.
The number average molecular weight measured by C (gel permeation chromatography) analysis is suitably from 1 to 200,000. In addition, in the case of hydrogenation, the hydrogenation rate is 90% or more, preferably 95% or more, and more preferably 99% or more in order to improve the light resistance and weathering resistance.

If desired, the thermoplastic saturated norbornene-based resin used in the present invention may include a phenol-based or phosphorus-based antioxidant, a phenol-based thermal deterioration inhibitor, a benzophenone-based ultraviolet stabilizer, an amine-based resin, or the like. Various additives such as an antistatic agent, a lubricant such as an ester of an aliphatic alcohol, a partial ester of a polyhydric alcohol and a partial ether; Further, other resins and the like can be mixed and used as long as the object of the present invention is not impaired.

(Molded Product) The base material used as the optical member of the present invention by laminating a layer containing Ta ₂ O ₅ as a main component is a molded product of a thermoplastic norbornene resin, which itself, a lens, a prism or the like. , Which can be used as optical parts of
It serves as a substrate for optical components such as various filters, mirrors, and optical discs. The method for molding the thermoplastic norbornene-based resin is not particularly limited. A general molding method for a thermoplastic resin such as injection molding, melt extrusion, hot pressing, solvent casting and inflation can be used.

(Manufacturing Method of Optical Member) In the present invention, an optical member is manufactured by forming a layer containing Ta ₂ O ₅ as a main component on a base material which is a thermoplastic norbornene resin molded product. As a forming method, a vacuum vapor deposition method, a reflective vapor deposition method, an ion plating method, a sputtering method, an ion beam assisted method, or the like is used, and a vacuum vapor deposition method is generally used. The vapor deposition conditions are not particularly limited except the substrate temperature during vapor deposition. The substrate temperature during vapor deposition needs to be lower than or equal to the heat distortion temperature of the thermoplastic norbornene resin used, and is generally 120 ° C. or lower, preferably 80 ° C. or lower, and even more preferably 60 ° C. or lower.

Further, when forming a layer containing Ta ₂ O ₅ as a main component on the substrate, it is preferable to wash as a pretreatment in order to remove dirt and dust adhering to the surface. A well-known method is preferably used for cleaning the base material. For example, an aqueous cleaning method using a surfactant, rinsing with pure water, pulling with warm pure water, and finally drying with warm air, isopropyl alcohol, Freon 113 After draining with an organic compound such as an organic silicon compound, there is a method of finally vapor-drying with a solvent such as Freon 113 or polyfluorocarbon. Also,
As a pretreatment of the substrate before vapor deposition, it is preferable to carry out sputter cleaning with active gas ions or inert gas ions using an ion beam. By these pretreatments, the adhesion between the layer containing Ta ₂ O ₅ as the main component and the substrate is improved.

The layer formed is Ta₂O_Five50% by weight or less
Above 70% by weight, more preferably 90% by weight
It is contained in an amount of not less than%, particularly preferably not less than 95% by weight. Including
If the content is low, the adhesiveness will decrease. Depending on the purpose of the optical component
For Ta₂O_FiveThe layer containing as a main component must be transparent.
It is important and because of that, Ta₂O_FiveContent of ingredients other than
Is preferably low. Also, Ta₂O_FiveAs ingredients other than
For ZrO₂, CeO₂ , Y₂O₃, TiO₂, Ti
₃O_Five, SiO, Nb₂O_FiveEtc. are preferred. In addition,
Zr is used for the reason of preventing coloring caused by the manufacturing method.₂O_FiveEspecially
preferable.

In the vacuum vapor deposition method, an evaporation source containing Ta ₂ O ₅ is vaporized by an electron gun, resistance heating or the like and vapor-deposited on the surface of the substrate. Various conditions for vapor deposition are not particularly limited, and a method used in general vapor deposition may be used. However, Ta ₂ O ₅
If only Ta ₂ O ₅ is vaporized by using an electron gun or resistance heating as an evaporation source, the vaporized Ta ₂ O ₅ may lack oxygen atoms. Therefore, the layer formed by vapor deposition is colored. , May absorb light. If this layer needs to be transparent as described above, the colored one cannot be used. Such defective products are generated by adding oxygen at the time of evaporation to 2 × 10 ^{−5 to} 5 × 10 ⁻³ Torr.
It can be lowered to some extent by vapor deposition at a moderate pressure.

More preferably, ZrO is used as the evaporation source.
₂Content is 3 to 50% by weight, more preferably 10 to 40%
% Ta, particularly preferably 20-35% by weight Ta₂O_FiveAnd Z
_rO₂ When the mixture is used, the deposited film does not become colored.
A stable and transparent product can be obtained. At this time, steam
ZrO during deposition₂The content of is lower than that in the evaporation source
And the Zr content is very small,₂O_FiveContent 9
Easy to use 0 wt% or more, preferably 95 wt% or more
Can be obtained.

(Optical Member) In the optical member of the present invention, a layer containing Ta ₂ O ₅ as a main component is formed on a base material which is a thermoplastic norbornene resin molded product. The thickness of this layer varies depending on whether or not this layer is used as a part of a multilayer film, but in general, when used in an optical component for a light ray having a wavelength of 400 to 1000 nm, the thickness is 1 nm to 600 nm.
The thickness is about nm, preferably about 2 nm to 500 nm.
If it is too thin, the adhesion between the layer laminated on the layer containing Ta ₂ O ₅ as the main component and the substrate will be poor, and if it is too thick, it will be difficult to adjust the optical characteristics of the optical film.

(Optical Component) The optical component of the present invention is formed by laminating an optical film on the optical member of the present invention, and specifically, a lens, an optical disk substrate, a retardation plate formed by forming an antireflection multilayer film. , A diffraction grating plate, etc .; a beam splitter formed by forming a semitransparent multilayer film; a monochromatic filter formed by laminating monochromatic filter multilayer films; a bandpass filter formed by laminating bandpass filter multilayer films; a multilayer reflective film formation Optical disk substrate and the like; car interior mirrors and optical disk substrates and polygon mirrors and the like that are formed with a metal reflection film; half mirrors and the like that are formed with a metal anti-transparent film;
Etc. are illustrated.

(Dielectric Multilayer Film) Examples of the dielectric multilayer film formed by the optical component of the present invention include antireflection multilayer film, semitransparent multilayer film, monochromatic filter multilayer film, bandpass filter multilayer film, reflective multilayer film. is there.

The structure of the antireflection multilayer film is the same as that of the above-mentioned Japanese Patent Application Laid-Open No. 63-63, except that a layer containing Ta ₂ O ₅ as a main component of an optical member which is a high refractive index dielectric layer is used as the first layer on the substrate side. 8140
No. 2, JP-A-63-81403 and JP-A-63.
-81404, JP-A-1-273001,
This is the same as the antireflection multilayer film known in JP-A-4-137234. Anti-reflection multilayer film is V coat film (specific wavelength anti-reflection film), multi-coat film (broad band anti-reflection film)
But it's okay. It may have a two-layer structure, a three-layer structure, or a four-layer structure. In addition, by making the thickness of the layer containing Ta ₂ O ₅ as a main component of the optical member thin, it does not substantially function as a part of the reflective multilayer film and reflects other layers formed on the layer. It can also function as the first layer of the prevention multilayer film.

The semi-transparent multilayer film is described in "Optical and Thin Film Technical Manual, Supplement and Revised Edition" (edited by Optronics, editorial department, 1992).
, August pp. 298-301), "Optical thin film"
(HA Macleod, Nikkan Kogyo Shimbun, 198.
Published in November 9th, original title "THINFILM OPTIC
AL FILTERS ”, pp. 176-180), and transmits a part of light of a specific wavelength and reflects a part thereof. The structure determines the dielectric used for each layer, the thickness of each layer, etc. according to the design of the target wavelength, the transmittance at the target wavelength, the reflectance, and the like. The semi-transparent multilayer film is formed on the optical member of the present invention by laminating the first layer on the optical member.
A layer containing ₂ O ₅ as a main component may be formed as the first layer.

The multilayer reflective film is known in JP-A-3-12835, and reflects only light rays in the vicinity of the target wavelength and transmits other light rays. The multilayer reflective film has a thickness of ¼ of the target wavelength and is formed by alternately stacking high-refractive index dielectric layers and low-refractive index dielectric layers. The multilayer reflective film may also be formed by laminating the first layer on the optical member of the present invention, or may be formed on the optical member as the first layer, the layer containing Ta ₂ O ₅ as a main component.

Monochromatic filters Multilayer films and bandpass filters are described in "Optical / Thin Film Technical Manual" (described above, Nos. 284 to 289).
Page), "Optical thin film" (edited by Shiro Fujiwara, Kyoritsu Shuppan, 1985)
Published in February 1998, pp. 110-123) and the like. The monochromatic filter multilayer film transmits only light rays in the vicinity of a specific wavelength, and the bandpass filter transmits light rays in a specific area.
The structure of these filter multilayer films is also known,
The first layer may be formed by laminating on the optical member of the present invention, or the layer containing Ta ₂ O ₅ as a main component on the optical member may be formed as the first layer.

In order to form the dielectric multilayer film, each layer made of a dielectric material is sequentially laminated on the layer containing Ta ₂ O ₅ as a main component of the optical member. As a method for laminating, generally, a method such as a vacuum vapor deposition method, an ion plating method, a sputtering method or the like can be applied. Further, the thickness of each layer is determined according to the wavelength of the light ray for the purpose of antireflection, the refractive index of the material used, and the like.

Generally, the vacuum evaporation method which is often used for forming a dielectric multilayer film uses an oil rotary pump, an oil diffusion pump, a cryopump, or the like in the vacuum chamber at a pressure of 10 ⁻⁶ to ⁻⁶ .
After evacuation to about 10 ₋₄ Torr, oxygen gas is introduced into the vacuum chamber at about 2 × 10 ^{−5 to} 5 × 10 ⁻³ Torr, if necessary, and vapor deposition is performed in an oxygen atmosphere.

As the evaporation method, either an electron beam heating method or a resistance heating method can be adopted. The temperature at the time of vapor deposition needs to be lower than the heat distortion temperature of the substrate.
C. or lower, preferably 80.degree. C. or lower, and even more preferably 60.degree. C. or lower.

For example, in the case of an antireflection multilayer film, as the dielectric material, which is a vapor deposition material having a high refractive index, used for the layers other than the first layer, ZrO ₂ , TiO ₂ , Ti ₃ O ₅ , SiO and Ta ₂ O _{5 are used.} ,
A mixture selected from Y ₂ O ₃ , PrO ₂ , ZnS, Nb ₂ O _5, etc., or a vapor deposition material of these is also used. Al ₂ O ₃ , CeF ₃ or the like can be used as the dielectric material having an intermediate refractive index, and Mg can be used as the dielectric material having a low refractive index.
F ₂ , Al ₂ O ₃ or the like can be used.

(Metal film) The metal film formed by the optical component of the present invention is a total light-reflecting metal reflective film of gold, platinum, silver, copper, aluminum, rhodium, chromium, or the like, and its thickness. It is a semi-transparent film or the like obtained by adjusting. These are "Optical thin film" (published by Nikkan Kogyo Shimbun Co., Ltd., pages 159-172), "Optical thin film users'handbook" (JD Rancourt, Nikkan Kogyo Shimbun, October 1991, Original title "OPTICAL
THIN FILMS USERS 'HANDBOO
K ”, pp. 111-118) and the like.

The method for forming these metal reflection films is not particularly limited, and known methods such as a vacuum vapor deposition method, a sputtering method and an ion plating method can be used. In addition, a protective film may be provided on the metal surface to prevent the metal film from being damaged.

In the case of an optical component having a reflective film, it may not be necessary for the light beam to be reflected on the surface of the optical component and for the light beam to pass through the base material. In such a case, even an optical member having a colored layer containing Ta ₂ O ₅ as a main component as described above can be used as a material for the optical component of the present invention having a reflective film. In that case, an enhanced reflection film may be formed on the metal film.

[0035]

[Examples] The following is a reference order, examples, and comparative examples.
The present invention will be specifically described. The reflectance and the transmittance are measured with a spectrophotometer (U-4000 type, manufactured by Hitachi) by applying light from the optical film side, and the wavelength of the measured light beam is 550 nm unless otherwise specified. For film adhesion, make 11 cuts on the multi-layer film formed on the base material molded product with a cutter at 1 mm intervals and intersect each other at right angles to each other.
100 square grids each having a size of mm were made, cellophane adhesive tape (manufactured by Sekisui Chemical Co., Ltd.) was attached, the adhesive tape was pulled by a vertical fragrance with respect to the surface, and peeled off. The high temperature test is conducted at 80 ℃ for the obtained optical parts.
After being left in the oven for 96 hours, the state of the laminated film is visually observed by returning to room temperature, and the heat cycle test is carried out by heating the optical component obtained at -30 ° C for 30 minutes, at 80 ° C for 30 minutes, and then for decreasing the temperature. Was observed with an optical microscope for the presence or absence of microcracks in the laminated film after 24 cycles (2 days) of a heat cycle test of 1/30 cycles and 2 hours at a constant speed.

Reference Example 1 Thermoplastic norbornene resin (ZEONEX 280,
Made by Nippon Zeon, molecular weight about 28,000, glass transition temperature 140 ° C, hydrogenation rate 99.7% or more), resin temperature 30
Injection molding at 0 ℃, mold temperature 100 ℃, thickness 2mm,
A 50 mm square flat plate was prepared. This flat plate was ultrasonically cleaned at 1200 W and 26 kHz for 60 seconds in a 3% aqueous solution of an alkaline detergent (SE-10, manufactured by Sonic Fellow), and rinsed in pure water by ultrasonic cleaning at 600 W and 26 kHz for 60 seconds. Alkaline detergent (SE-10) again
After performing ultrasonic cleaning at 1200 W and 26 kHz for 60 seconds in a 3% aqueous solution, rinsing for 60 seconds by ultrasonic cleaning at 600 W and 26 kHz in pure water was repeated 4 times,
It was immersed in pure water twice for rinsing, further immersed in warm pure water for rinsing, and then dried with warm air.

Example 1 On the flat plate obtained in Reference Example 1, a mixture of 75% by weight of Ta ₂ O _{5 and} 25% by weight of ZrO ₂ was used as a vapor deposition material, oxygen gas was introduced, and the pressure in the chamber was 6 ×. 10 ^-5 Tor
Then, a vapor deposition film was formed by a vacuum vapor deposition method to obtain an optical member of the present invention. The refractive index of the deposited film is 2.04 and the thickness is about 2
7.5 nm, i.e., wavelength 550 nm (hereinafter, lambda ₀ to) optical thickness for light of was about 0.10λ _0. The vapor-deposited film was analyzed by an X-ray microanalyzer (analysis accuracy of about 1%), but ZrO ₅ could not be detected.

On the Ta ₂ O ₅ of this optical member, a second layer of SiO ₂ having a refractive index of 1.46 and an optical film thickness of 0.08λ ₀ was formed.
Layer is formed by vapor deposition, and the third layer has a refractive index of 2.0.
4. A Ta ₂ O ₅ layer having an optical thickness of 0.20λ ₀ is formed by vapor deposition, and a SiO ₂ layer having a refractive index of 2.04 and an optical thickness of 0.25λ ₀ is vapor-deposited as a fourth layer. By forming, an optical component of the present invention having an antireflection film composed of four layers was obtained.

The reflectance is 0.5% and the film adhesion is 99/10.
0, no abnormality was found in the high temperature test, and no microcracks were found in the heat cycle test.

Comparative Example 1 TiO ₂ (having a refractive index of 2.0 after vapor deposition) was used as the material for the first layer.
An optical component having an antireflection film was obtained in the same manner as in Example 1 except that 6) was used. The reflectance was 0.4%, the film adhesion was 14/100, a part was peeled off in the high temperature test, and the occurrence of microcracks was also recognized in the heat cycle test.

Example 2 An optical member of the present invention was obtained in the same manner as in Example 1 except that the optical thickness of the Ta ₂ O ₅ layer was adjusted to 0.05λ ₀ . On top of this Ta ₂ O ₅ layer 100 aluminum
In the present invention having a metal reflective film, CeF ₃ (refractive index 1.56 after vapor deposition) was vapor-deposited to a thickness of nm, and CeF ₃ (refractive index after vapor deposition 1.56) was vapor-deposited thereon to an optical film thickness of 0.25λ ₀ . I got the optics. Reflectivity is 95.9%, film adhesion is 98/100
Met.

Comparative Example 2 Instead of Ta ₂ O ₅ , CeO ₂ (refractive index 1.9 after vapor deposition was used.
An optical component having an antireflection film was obtained in the same manner as in Example 1 except that 5) was used. The reflectance was 95.8% and the film adhesion was 8/100.

Example 3 SiO ₂ having a refractive index of 1.45 and an optical film thickness of 0.29λ ₀ was formed as a second layer on Ta ₂ O ₅ of the optical member obtained in Example 1.
Layer is formed by vapor deposition, and the refractive index is 1.9 as the third layer.
5. A CeO ₂ layer having an optical thickness of 0.225λ ₀ is formed by vapor deposition, and a fourth layer of S having an optical thickness of 0.25λ ₀ is formed.
An iO ₂ layer is formed by vapor deposition, a CeO ₂ layer with an optical thickness of 0.158λ ₀ is formed as a fifth layer, and a sixth layer is formed with an optical thickness of 0.25λ ₀ . A layer of SiO ₂ was formed by vapor deposition to obtain an optical component of the present invention having a semitransparent multilayer film consisting of 6 layers.

The reflectance was 26%, the transmittance was 74%, and the film adhesion was 95/100.

Comparative Example 3 As a material for the first layer, CeO ₂ (having a refractive index of 1.9 after vapor deposition) was used.
An optical component having an antireflection film was obtained in the same manner as in Example 1 except that 5) was used. 28% reflectance, 72 transmittance
%, The film adhesion was 8/100.

Example 4 An optical member of the present invention was obtained in the same manner as in Example 1 except that the optical thickness of the Ta ₂ O ₅ layer was 0.125λ ₀ . The Ta on Ta ₂ O ₅ of the optical member obtained in ₂ O Example 1 on the layer of _5, as the second layer, the refractive index of 1.45,
A SiO ₂ layer having an optical thickness of 0.29λ ₀ is formed by vapor deposition, and a third layer has a refractive index of 1.95 and an optical thickness of 0.2.
Is formed by depositing a layer of CeO ₂ of 5 [lambda] _0, the fourth layer, formed by depositing a layer of SiO ₂ optical film thickness 0.25 [lambda _0, the fifth layer, an optical film thickness 0.25 [lambda C of ₀
A layer of eO ₂ is formed by vapor deposition, a sixth layer of SiO ₂ having an optical thickness of 0.25λ ₀ is formed by vapor deposition, and a seventh layer of optical thickness of 0.25λ ₀ is formed. A layer of CeO ₂ was formed by vapor deposition to obtain an optical component of the present invention having a band-pass filter multilayer film consisting of 7 layers.

Transmittance at 550 nm is 39%, 650 nm
Had a transmittance of 95% and a film adhesion of 93/100.

Comparative Example 4 As the material for the first layer, CeO ₂ (having a refractive index of 1.9 after vapor deposition) was used.
An optical component having an antireflection film was obtained in the same manner as in Example 1 except that 5) was used. The transmittance at 550 nm is 41%,
The transmittance at 650 nm was 94%, and the film adhesion was 7/100.

[0049]

EFFECT OF THE INVENTION An optical component having an optical film produced by using the optical member of the present invention has excellent adhesion between a molded article substrate made of a thermoplastic norbornene resin and the optical film, and the optical film peels off. It is difficult to cause microcracks and the like even when used in an environment where the temperature changes.

Claims (4)

[Claims] 1. A group comprising a thermoplastic norbornene-based resin
Ta on the material surface₂O_Five Optical part having a layer mainly containing
Material. 2. An optical component formed by laminating an optical film on the optical member according to claim 1. 3. The optical component according to claim 2, wherein the optical film comprises a dielectric multilayer film. 4. The optical film is formed by forming a metal film.
The optical components described.