JPS638605A - Reflection mirror consisting of synthetic resin member - Google Patents

Abstract

PURPOSE:To improve corrosion resistance and the adhesiveness of a reflective surface and to reduce the cost of the titled mirror by forming respective layers consisting of SiO, Cr and Cu in this order on the surface of a substrate consisting of a synthetic resin member and forming an oxide layer of Cu as the upper layer of the Cu layer further thereon. CONSTITUTION:The respective layers consisting of SiO, Sr and Cu are formed in this order on the surface of the substrate consisting of the synthetic resin member and the oxide layer of Cu is further formed as the upper layer of at least the Cu layer thereon. The synthetic resin member is preferably a polystyrene or the like which is precisely molded by casting or injection. The substrate, the surface of which is subjected to supergrinding, is used. A 1st layer to be laminated is the SiO layer and a 2nd layer the Cr layer, which are formed to improve the adhesiveness of the Cu to be laminated as a 3rd layer to the substrate surface. The SiO layer having about 0.5lambda optical film thickness is preferably laminated by a vacuum deposition method and the Cr layer having about 300-500Angstrom mechanical film thickness is preferably laminated by the vacuum deposition method. The satisfactory adhesiveness and corrosion resistance are thereby obtd.

Description

DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a reflecting mirror made of a synthetic resin member that can be used in laser beam printers, particularly 45'' mirrors and polygon mirrors in laser optical systems.

[Conventional technology]

Conventionally, a reflecting mirror as an optical system member, especially a 45@mirror,
The polygon mirror has C as the first layer on the surface of the glass member.
A copper-based material is used with r as the second layer,
In order to improve the corrosion resistance of the coated copper, it is heated to a high temperature,
A protective film was formed on the upper layer of copper, which also served as a reflection enhancer.

In order to reduce the manufacturing cost of reflective mirrors, an attempt was made to use a synthetic resin substrate with copper vacuum-deposited on the surface instead of glass, but in this case, the substrate was heated to a high temperature. The copper film cannot be deposited in a vacuum, and the deposited copper has insufficient corrosive properties, which has hindered its practical application.

In addition, even if the surface of the synthetic resin board is precisely finished,
When copper was applied directly to the surface under vacuum, the adhesion of the copper was insufficient and there was a problem with durability.

An object of the present invention is to solve the above-mentioned problems and to provide a reflective mirror with sufficient adhesion and corrosion resistance while using synthetic resin members, thereby making it possible to reduce the manufacturing cost of a single reflective mirror. It is.

[Means for solving problems]

In the present invention, SiO,
C: each layer of r and Cu is formed in this order,
The reflective mirror is made of a synthetic resin member, characterized in that at least a Cu oxide layer is further formed as an upper layer of the Cu layer.

The reflecting mirror of the present invention is particularly suitable for near-infrared reflecting mirrors such as 45° mirrors and polygon mirrors in laser optical systems.

The synthetic resin member used in the present invention is preferably precision cast or injection molded polystyrene, acrylonitrile-styrene copolymer, polymethyl methacrylate, polycarbonate, etc., and the substrate surface is usually super ground before being subjected to lamination. .

The first layer to be laminated is a Si0 layer, the second layer is a Cr layer,
These are to improve the adhesion of Gu to the substrate surface, which is laminated as the third layer.The Si0 layer has an optical thickness of about 0.5 layers and is laminated by the vacuum base layer method. is preferable. In addition, the Cr layer has a mechanical thickness of 300 to 500A.
It is preferable to laminate a certain amount of materials by vacuum evaporation.

In the present invention, the Cu layer is laminated above the Cr layer, and it is necessary that at least a Cu oxide layer is formed as an upper layer of the Cu layer. This purpose is provided for the purpose of improving the corrosion resistance of the Cr layer, and this purpose can be more effectively achieved if a Cu oxide layer is also formed between the Cr layer and the Cu layer.

It is preferable that the Cu layer has a mechanical thickness of about 1000 A and is formed by vacuum evaporation, and the Cu oxide layer preferably has a mechanical thickness of about 50 to 400 A, and the means for forming it is a vacuum degree of 1. It is preferable to activate reactive vapor deposition of Cu in a high-frequency plasma atmosphere in an oxygen environment of about 3 x 10' Torr, but when forming it as an upper layer of a Cu layer, the surface of the Cu layer is evacuated after the formation of the Cu layer. degree 2~4
The surface of the Cu layer is oxidized to form an oxide layer when exposed to a high-frequency plasma atmosphere in an oxygen environment of approximately ×1O'' Torr for several minutes, so it is suitable for use in place of the Cu activation reactive vapor deposition method described above. I can do it.

The reflecting mirror of the present invention has a low refractive index and an optical thickness of 1 on the Cu oxide layer formed as described above for the purpose of increasing reflection.
A metal oxide film with a high refractive index and an optical thickness of 7. It is preferable to form a metal oxide film, as this will result in a reflecting mirror of better quality. Metal oxide with low refractive index and optical thickness τ is A1□
03 or 5102, the metal oxide with a high refractive index and optical thickness range is TiO2, CeO2, ZrO2, Ta205 or a mixture of ZrO2 and TlO2, and the uppermost surface hardening layer is preferably 5i02, and the formation of these oxide films As in the case of forming an oxide film of Cu, the method is lXlO4~3
Preferably, this is carried out by activated reactive vapor deposition of the respective metal or lower order oxide in a high frequency plasma atmosphere in an oxygen environment of x10'' Torr.

Although the present invention is originally a reflective mirror made of a synthetic resin member, the film forming means employed to manufacture this can also be applied when the member is made of glass or light metal such as aluminum, and the film forming means may be Since everything is carried out at low temperatures, when applied to the manufacture of reflective mirrors using members other than synthetic resins, the film can be taken out of the film forming apparatus immediately after being formed, and therefore the manufacturing cost can be reduced.

〔Effect of the invention〕

The reflecting mirror of the present invention has excellent corrosion resistance and excellent adhesion between the reflecting surfaces, and since it is formed on a synthetic resin member, it can be manufactured at low cost. Further, by further providing a reflection increasing layer and a surface hardening layer on the Cu Mide layer, it is possible to obtain a material having excellent wear resistance and solvent resistance, and particularly excellent reflection characteristics in the near-infrared region.

〔Example〕

The present invention will be further explained below by giving examples with reference to the drawings.

Example 1 A polygon mirror whose structural cross-sectional view is shown in FIG. 1 was fabricated using the following film forming method.

After super-grinding the surface of the polycarinate polygon mirror member 1.1 obtained by precision casting, it was subjected to a vacuum test at 2 x 10' Torr.

The optical film thickness is 0.5 mm (design wavelength input = 480 na+)
Then, at the same degree of vacuum, Cr was deposited until the mechanical thickness reached 400 A to form a Cr layer 3.1. Next, Cu was applied at the same vacuum level until the mechanical film thickness reached 100OA.
was deposited to form a Cu layer 4.1.

Next, the degree of vacuum is increased to 2 by introducing oxygen into the Kiwaka device.
The Cu oxide layer 5. A polygon mirror of the present invention was obtained by forming a film of 1.

Example 2 A polygon mirror whose structural cross-sectional view is shown in FIG. 2 was manufactured using the following film forming method.

After super-grinding the surface of a polygon mirror member 1.1 made of polymethyl methacrylate obtained by injection precision molding, a Si0 layer 2.1 and a Cr layer 3.1 were sequentially formed using the same method as in Example 1. .

Next, the degree of vacuum is increased to 2 by introducing oxygen into the evaporation equipment.
Activated reactive vapor deposition of Cu was carried out in an oxygen environment with high frequency plasma (applied high frequency 13.56 MHz, 100 W) at X 10" Torr until a mechanical film thickness of 150 A was reached, and a Cu oxide layer of 3.2 was deposited.

Then, Cu layer 4.1 and C
The Cu layer 4 is formed by sequentially stacking the oxide layers 5.1 of
．． A polygonal mirror of the invention was obtained in which 1 was sandwiched with Cu oxide layers 3.2 and 5.1.

Example 3 A polygon mirror whose structural cross-sectional view is shown in FIG. 1 was fabricated using the following film forming method.

After super-grinding the surface of the polygon mirror member 1.1 made of acrylonitrile-styrene copolymer obtained by injection precision molding, a Si0 layer 2.1, a Cr layer 3.1 and a Cu layer were formed in the same manner as in Example 1. Layers 4 and 1 were deposited sequentially.

Next, the degree of vacuum is increased to 3 by introducing oxygen into the Kiwaka device.
X 10″ Tarr, high frequency plasma in oxygen environment (applied high frequency 13.56 MHz, 150 W
) By exposing to the atmosphere for 4.5 minutes, approximately 10 OA from the surface of the previously formed Cu layer 4.1 was removed from the copper oxide layer 5.
1, a polygon mirror of the present invention was obtained.

Example 4 A polygon mirror whose structural cross-sectional view is shown in FIG. 3 was fabricated using the following film forming method.

After super-grinding the surface of the polystyrene polygon mirror member 1.1 obtained by precision casting, a Si0 layer 2.1 and a Cr layer 3.1 were formed using the same method as in Example 1.
, A Cu layer 4.1 and a Cu oxide layer 5.1 were sequentially formed.

Next, activated reactive vapor deposition of low-order Al2O3 was performed in a high-frequency plasma (applied high frequency 13.5 [i MHz, 100 W) atmosphere in an oxygen environment of 3 x 10'' Torr to an optical film thickness τ (
The process was continued until the design wavelength input = 700r++++) was reached, a high-order Al2O3 layer 6.1 was formed, and further 3 x 1
High-frequency plasma in an oxygen environment of 0-Tarr (applied high frequency 13.56 MHz.

Activation reactive corporate deposition of low-order TiO is carried out in an atmosphere (too w) until reaching the optical film thickness (design wavelength input = 450 nm), a high-order TiO2 layer 7.1 is formed, and finally Ura frequency plasma in oxygen environment of 1.5 X 10' Torr (applied high frequency 13.513 MHz, 100
W) Activated reactive vapor deposition of low-order SiO in an atmosphere was performed until reaching an optical film thickness of 0.05 mm (design wavelength input = 40 Or+m) to form a surface hardened film of 5102 layers 8.1, and the present invention I got a polygon mirror.

Example 5 In Example 4 instead of the TiO2 layer 7.1.

CeO2, ZrO2, Ta205 or ZrO2 and T
Layer 7.1 consisting of a mixture of lO2 and
In a high-frequency plasma (applied high frequency 13.58 MHz, 100 W) atmosphere in an oxygen environment of IQ-~3×1O → Torr, the activated reactive vapor deposition of each metal or lower oxide was performed to an optical thickness of gold (designed). Wavelength input = 450na+
) A polygon mirror of the present invention was obtained by forming a laminated film in the same manner as in Example 4, except that the film was formed by performing the following steps until reaching ).

Figure 4 shows the spectral reflectance characteristics (S polarization) of the reflectors obtained in Examples 4 and 5. As can be seen from the figure, the reflectors have a high reflectance at near-infrared wavelengths. have. In addition, the reflection-enhancing film of the conventional near-infrared reflector makes the optical member 2
The film was heated to around 50°C, then formed, and then cooled for several hours before being taken out of the evaporation apparatus, whereas in Examples 4 and 5, the film formation process was performed at a low temperature, so the film was taken out of the evaporation apparatus immediately after film formation. Therefore, it is possible to significantly reduce costs, and at the same time, the present invention can be applied to conventional optical members (glass materials, light metal grinding members).

In order to examine the strength of the reflective mirrors of the synthetic resin members obtained in Examples 4 and 5, four tests were conducted: T: antecedent test, abrasion resistance test, solvent resistance test, and environmental resistance test. The contents of each test are as shown below.

1) Adhesion test: After adhering cellophane tape to the surface of the reflector, the test is repeated 15 times by quickly removing it at an angle almost perpendicular to the surface to determine whether the deposited film peels off.

2) Abrasion resistance test: Wipe the surface of the above reflector with lens wiping paper (
Using a reciprocating abrasion tester, rub the measuring tip wrapped in Silpon paper 50 times at a pressure of 3 kg/am' to see if any abnormalities occur.

3) #Solvent test: Rub the surface of the above reflecting mirror 50 times with a lens wiping paper (silpon paper) containing a mixture of nityl and alcohol (7:3) at a pressure of 500 g/cm' to detect any abnormalities. Check whether this occurs.

4) Environmental Resistance Test 2 The above reflecting mirror is left in a constant temperature and humidity chamber at a temperature of 45° C. and a relative humidity of 95% for 1000 hours, and it is examined whether any abnormality occurs.

The results of these four tests showed that no abnormality was observed in any of the tests, and the reflectors obtained in Examples 4 and 5 were superior to the films made by conventional high-temperature film formation methods on glass members and light metals (mainly aluminum). The film was found to be extremely strong.

[Brief explanation of the drawing]

1 to 3 are structural cross-sectional views of the reflecting mirror of the present invention,
FIG. 4 is a graph showing the spectral reflectance characteristics of the reflecting mirrors obtained in Examples 4 and 5 of the present invention. The horizontal axis represents wavelength, the vertical axis represents reflectance, and θ represents the incident angle of light. 1.1 = Substrate of synthetic resin member 2.1: SiO 3,1: Or 3.2: Cu oxide 4.1: Cu 5.1: Cu oxide 6.1; Low refractive index metal oxide Material 7.1: High refractive index metal oxide 8.1: Low refractive index metal oxide

Claims (1)

[Claims] 1. Each layer of SiO, Cr and Cu is formed in this order on the surface of a substrate made of a synthetic resin member, and at least a Cu oxide layer is further formed as an upper layer of the Cu layer. A reflective mirror made of a synthetic resin member, characterized in that: 2. The reflecting mirror according to claim 1, wherein a Cu oxide layer is further formed between the Cr layer and the Cu layer. 3. On the Cu oxide layer formed as the upper layer of the Cu layer, a metal oxide film with a low refractive index and an optical thickness of λ/4, and a metal oxide film with a high refractive index and an optical thickness of λ/2 are further applied. metal oxide coating,
and a metal oxide coating having a low refractive index and an optical thickness of approximately 0.05λ, each layer being formed in this order. 4. The metal oxide with a low refractive index and an optical thickness of λ/4 is A
l_2O_3 or SiO_2, and the metal oxide with the high refractive index and optical thickness λ/2 is TiO_2, CeO_2.
2, ZrO_2, Ta_2O_5 or ZrO_2 and T
4. The reflecting mirror according to claim 3, wherein the metal oxide is a mixture of iO_2 and has a low refractive index and an optical thickness of about 0.05λ is SiO_2.