WO2007063652A1 - Photoacid generator composition, cationically photopolymerizable composition, inkjet ink and inkjet recording method using same - Google Patents

Photoacid generator composition, cationically photopolymerizable composition, inkjet ink and inkjet recording method using same Download PDF

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Publication number
WO2007063652A1
WO2007063652A1 PCT/JP2006/320895 JP2006320895W WO2007063652A1 WO 2007063652 A1 WO2007063652 A1 WO 2007063652A1 JP 2006320895 W JP2006320895 W JP 2006320895W WO 2007063652 A1 WO2007063652 A1 WO 2007063652A1
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group
alkyl
ink
alkyl group
compound
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PCT/JP2006/320895
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French (fr)
Japanese (ja)
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Satoshi Masumi
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Konica Minolta Medical & Graphic, Inc.
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    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C381/00Compounds containing carbon and sulfur and having functional groups not covered by groups C07C301/00 - C07C337/00
    • C07C381/12Sulfonium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D333/00Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom
    • C07D333/50Heterocyclic compounds containing five-membered rings having one sulfur atom as the only ring hetero atom condensed with carbocyclic rings or ring systems
    • C07D333/76Dibenzothiophenes
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D405/00Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom
    • C07D405/02Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings
    • C07D405/12Heterocyclic compounds containing both one or more hetero rings having oxygen atoms as the only ring hetero atoms, and one or more rings having nitrogen as the only ring hetero atom containing two hetero rings linked by a chain containing hetero atoms as chain links
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07DHETEROCYCLIC COMPOUNDS
    • C07D409/00Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms
    • C07D409/02Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings
    • C07D409/04Heterocyclic compounds containing two or more hetero rings, at least one ring having sulfur atoms as the only ring hetero atoms containing two hetero rings directly linked by a ring-member-to-ring-member bond
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C08G59/687Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used containing sulfur
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00Inks
    • C09D11/30Inkjet printing inks
    • C09D11/38Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes

Definitions

  • Photoacid generator composition cationic photopolymerizable composition, inkjet ink, and inkjet recording method using the same
  • the present invention relates to a photoacid generator composition having excellent stability and excellent photosensitivity in the near ultraviolet region.
  • the present invention relates to a cationic photopolymerizable yarn composition, an inkjet ink, and an inkjet recording method using the same.
  • Patent Document 1 Japanese Patent Laid-Open No. 2005-97557
  • Patent Document 2 Japanese Patent Laid-Open No. 9-15848
  • Patent Document 3 International Publication No. 04Z29037 Pamphlet
  • the present invention has been made in view of the above-mentioned problems, and its object is to provide a photoacid generator composition containing a sulfonium salt compound excellent in long-term storage stability without releasing benzene, and Cationic photopolymerizable composition, inkjet ink and inkjet recording using the same It is to provide a method.
  • a photoacid generator composition characterized by comprising:
  • Ri to R 17 are each a hydrogen atom, a halogen atom, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an acyl group, a phenoxy group, an ester group, an aryl group, a thioether group, or a thiocarbole group. , Sulfiel groups, sulfo groups, amino groups, amide groups, imide groups, nitrile groups, phosphi groups, phospho groups, phosphoryl groups, and fluoroalkyl groups having 1 to 8 carbon atoms.
  • the groups selected may be the same or different, and the portion other than the functional group of these groups is a C1-C12 saturated aliphatic hydrocarbon group or unsaturated aliphatic carbon group. It may be a hydrogen group, an alicyclic hydrocarbon group, a carbocyclic aromatic hydrocarbon or a bicyclic aromatic hydrocarbon group. R 5 and R 6 may be condensed with each other to form a covalent bond.
  • X is an atomic group that can be a monovalent key.
  • the sulfonium salt excluding the sulfonium salt having the structure represented by the general formula (1) is a sulfo-um salt having a structure represented by the following general formula (A): 2.
  • Ra Ra represents an alkyl group or an aromatic group
  • Z 1 represents an oxygen atom or a sulfur group
  • Ra Ra represents an alkyl group, an aromatic group, an alkoxy group, an aryloxy group, respectively.
  • the photoacid generator composition as described in 1 or 2 above which comprises at least one compound selected from a polycyclic aromatic compound, a strong rubazole derivative and a thixanthone derivative.
  • At least one compound force selected from the polycyclic aromatic compounds, force rubazole derivatives and thixanthone derivatives anthracene, fluorene, pyrene, thalene, phenanthrene, anthraquinone, perylene, carbazole, phenothiazine, thixanthone, thianthrene, 4.
  • the photoacid generator composition according to 3 above which is at least one compound selected from benzanthracene, naphthacene, triphenylene and the following general formula (3).
  • R 21 R 28 has the same meaning as Ri R 17 in the general formula (1).
  • Sulfonium salt power having the structure represented by the general formula (A) The following general formula (B), (C) and (D) power 4.
  • R represents an alkyl group having 1 to 10 carbon atoms
  • R R represents an alkyl group having 1 to 10 carbon atoms
  • 3 3 n 2n + l represents an integer of 1 to: L0), an alkyl group, or an alkyl-substituted or unsubstituted aromatic group), PF,: BF AsF SbF,: B (CF) CIO Br CI or I Represents. ]
  • R represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and R represents a substituent.
  • m4 represents an integer of 0 4
  • R R represents an alkyl group having 1 to 10 carbon atoms
  • Y represents
  • Z-SO Z is C F (n is an integer of 1 10), alkyl group, or alkyl substitution or
  • R represents a hydrogen atom or an alkyl group having 1 to L0 carbon atoms, and R represents a substituent.
  • m5 represents an integer of 0 4
  • RR represents an alkyl group having 1 to 10 carbon atoms
  • Y represents , Z-SO (Z is CF (n is an integer of 1 to 10), alkyl group, or alkyl substitution
  • a cationic photopolymerizable composition comprising the photoacid generator composition according to any one of 1 to 5 above and a cationically polymerizable compound.
  • An ink-jet ink comprising the photoacid generator composition according to any one of 1 to 5 above.
  • An ink-jet ink comprising the cationic photopolymerizable composition according to any one of 6 to 8 above.
  • An ink jet recording method comprising performing ink jet recording on the fibrous recording material using the ink jet ink described in 9 or 10 above.
  • a photoacid generator composition containing a sulfoyuium salt compound excellent in long-term storage stability without releasing benzene, and a cationic photopolymerizable composition and ink jet ink using the same And an ink jet recording method.
  • FIG. 1 is a front view showing a configuration of a main part of a recording apparatus of the present invention.
  • a sulfonium salt having a structure represented by the general formula (1) and a sulfone salt having a structure represented by the general formula (1) By using a photoacid generator composition characterized by containing a sulfo-um salt excluding a humic salt, a sulfoyuum salt compound having excellent long-term storage stability without releasing harmful benzene to the human body. It has been found that a photoacid generator composition can be realized, and the present invention has been achieved.
  • the photoacid generator composition of the present invention contains a sulfo-salt having a structure represented by the general formula (1) as a photoacid generator.
  • the curing inhibition by oxygen does not occur, the curing accuracy is high, and the irradiation energy is high. With sensitivity, it has a sufficient depth of cure and can further suppress the generation of benzene.
  • Ri to R 17 are each a hydrogen atom, a halogen atom, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an acyl group, a phenoxy group, an ester group, an aryl group, or a thioether group.
  • Group power Group selected, which may be the same or different, except for the functional group of these groups, a saturated aliphatic hydrocarbon group or unsaturated aliphatic group having 1 to 12 carbon atoms It may be a hydrocarbon group, an alicyclic hydrocarbon group, a carbocyclic aromatic hydrocarbon group, or a heterocyclic aromatic hydrocarbon group.
  • R 5 and R 6 may be condensed with each other to form a covalent bond.
  • R 1 -R is particularly preferably a hydrogen atom, a halogen atom, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an acyl group, or a fluoroalkyl group having 1 to 8 carbon atoms. , May be the same or different. Also preferred is when R 5 and R 6 condense with each other to form a covalent bond!
  • halogen atom for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are listed. From the viewpoint of active energy ray sensitivity, a fluorine atom is preferable.
  • alkyl group examples include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tertiary butyl group, a neopentyl group, a hexyl group, an isohexyl group, a peptide group, An octyl group, a 2-ethylhexyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, an isotridecyl group, a myristyl group, a palmityl group, a stearyl group, and the like, preferably 1 In particular, a methyl group or an ethyl group is preferable.
  • alkoxy group examples include methoxy group, ethoxy group, propyloxy group, butyloxy group, pentyloxy group, hexyloxy group, peptyloxy group, octyloxy group, noroxy group, decyloxy group, undecyloxy group, dodecyloxy group, tridecyloxy group,
  • a myristyloxy group, a normyloxy group, a stearyloxy group, etc. can be mentioned, Preferably it is a C1-C4 alkoxy group, and especially a methoxy group and an ethoxy group are preferable.
  • fluoroalkyl group examples include a fluormethyl group, a difluoromethyl group, a trifluoromethyl group, a difluoroethyl group, a perfluoroethyl group, and the like, and a trifluoromethyl group is particularly preferable!
  • acyl group examples include a group represented by R—CO— or Ar—CO—.
  • R examples include a linear or branched alkyl group or an alicyclic hydrocarbon group.
  • R include, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tertiary butyl group, a pentyl group, an isopentyl group, a tertiary monopentyl group, a neopentyl group, Hexyl, isohexyl, peptyl, octyl, 2-ethylhexyl, nonyl, decyl, undecyl, dodecyl, tridecyl, isotridecyl, myristyl, palmityl, stearyl Group, cyclopentyl group, cyclohexyl group and the like.
  • Ar include groups represented by the following general formulas (a) to (f).
  • R 18 to R M each represent a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group or an alkoxy group, and they may be the same or different. May be.
  • the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tertiary butyl group, a pentyl group, an isopentyl group, a tertiary pentyl group, a neopentyl group, and a hexyl group.
  • alkoxy group include methoxy group, ethoxy group, propyloxy group, ptyloxy group, pentyloxy group, hexyloxy group, peptyloxy group, octyloxy group, nonyloxy group, decyloxy group, undecyloxy group, dodecyloxy group.
  • Group, tridecyloxy group, myristyloxy group Roh Rumichiruokishi group, Ru can be exemplified Suteariruokishi group, and the like.
  • the groups represented by Ri to R 17 may be the same or different, but preferably all of 1 ⁇ to 1 ⁇ ° are hydrogen atoms.
  • force is, or Ri ⁇ R 5 sac Chi, either force 1 or 2, preferably is other than one hydrogen atom, and all others are hydrogen More preferably, one of the atoms R 1 to R 1Q is one or two, preferably one is other than a hydrogen atom, and the others are all hydrogen atoms! ⁇ 1 ⁇ ! ⁇
  • is a group selected from a methyl group, a fluorine atom, a nitro group, and an acyl group, and the others are all hydrogen atoms.
  • any one of R 6 to R 1Q is a group selected from a methyl group, a fluorine atom, a nitro group, and an acyl group, and the others are all hydrogen atoms. It is also preferred that R 5 and R 6 are condensed with each other to form a covalent bond.
  • R U to R 17 are the same as R -R (except for the case where R 5 and R 6 are condensed to form a covalent bond), and one of them is Ar—CO.
  • Ar—CO Ar—CO.
  • a group and the others are preferably hydrogen atoms.
  • sulfone salt cation (X-) having the structure represented by the general formula (1) according to the present invention include, for example, SbF- and PF-. Can be mentioned.
  • the sulfonium salt having the structure represented by the general formula (1) and the sulfonium salt having the structure represented by the general formula (1) are excluded. It contains a sulfo-um salt.
  • the -um salt is not particularly limited, but is preferably a sulfonium salt having the structure represented by the general formula (A).
  • Ra and Ra are an alkyl group, aromatic group
  • ml represents an integer of 0 to 4
  • nl and pi each represent an integer of 1 to 5
  • Y represents Z—SO (Z represents C F (n
  • n 2n + l represents an integer of 1 to: L0), an alkyl group, or an alkyl-substituted or unsubstituted aromatic group), PF, BF, AsF, SbF, B (CF), CIO, Br , CI or I.
  • the alkyl group may be linear, branched or cyclic.
  • the aromatic group may have a condensed ring which may be an aromatic hydrocarbon ring group or an aromatic heterocyclic group.
  • an aromatic hydrocarbon group for example, a phenyl group, a naphthyl group
  • an aromatic heterocyclic group for example, furyl group, chenyl group, pyridyl group, pyridazyl group, pyrimidyl group, birazyl group, triazyl group, imidazolyl group, pyrazolyl group, thiazolyl group, benzoimidazolyl group, benzoxa Zolyl group, quinazolyl group, phthalazyl group, etc.
  • the above-mentioned alkyl group or aromatic group may further have a substituent, and these substituents may be bonded to each other to form a ring, and have a condensed ring. You can ask.
  • substituents include an alkyl group (for example, a bialkyl group) in addition to the alkyl group described above.
  • alkyl groups eg, ethur groups, propargyl groups, etc.
  • aromatic hydrocarbon groups eg, phenyl groups, naphthyl groups, etc.
  • heteroaromatic groups eg, free radicals.
  • Imidazolyl group for example, pyrazolyl group, thiazolyl group, benzoimidazolyl group, benzoxazolyl group, quinazolyl group, phthalazyl group, etc.
  • heterocyclic group for example, pyrrolidyl group, imidazolidyl group, morpholyl group, oxazolidyl group, etc.
  • alkoxy group for example, , Methoxy group, ethoxy group, propyloxy group, pentyloxy group, hexyloxy group, octyloxy group, dodecyloxy group, etc.
  • cycloalkoxy group for example, cyclopentyloxy group, cyclohexyloxy group, etc.
  • aryloxy group for example, Phenoxy group, naphthyloxy group, etc.
  • alkylthio group for example, methylthio group, ethylthio group, propylthio group, pen
  • Ureido groups for example, methylureido group, ethylureido group, pentylureido group, cyclohexylureido group, octylureido group.
  • the alkyl group or aromatic group represented by Ra or Ra may further have a substituent.
  • Z 1 represents an oxygen atom or a sulfur atom, and Z 1 binds to a benzene ring to which a sulfonium ion is bonded at the para position, preferably bonded to the ortho or para position. preferable.
  • Ra and Ra are an alkyl group, an aromatic group, an alkoxy group, an aryloxy group, an alkyl group, respectively.
  • alkyl group and the aromatic group are groups having the same meanings as Ra and Ra described above.
  • alkoxy group and the aryloxy group have the same meanings as Ra and Ra described above for the oxygen atom.
  • alkoxy group for example, methoxy group, ethoxy group, propyloxy group, pentyloxy group, hexyloxy group, octyloxy group, dodecyloxy group, fluoromethyl group, trifluoromethyl group
  • cycloalkoxy group eg, cyclopentyloxy group, cyclohexyloxy group, etc.
  • aryloxy group eg, phenoxy group, naphthyloxy group, etc.
  • the sulfur atom has the same meaning as Ra and Ra described above.
  • 1 2 is a group in which one group is bonded, and examples thereof include an alkylthio group (for example, a methylthio group, Ethylthio group, propylthio group, pentylthio group, hexylthio group, octylthio group, dodecylthio group, etc., cycloalkylthio group (eg, cyclopentylthio group, cyclohexylthio group, etc.), arylthio group (eg, phenylthio group, naphthylthio group, etc.) Etc.) and the like.
  • the above-mentioned aromatic group, aryloxy group, and arylothio group may have a condensed ring.
  • the above-mentioned alkyl group, aromatic group, alkoxy group, aryloxy group, alkylthio group, and arylothio group may further have a substituent.
  • a plurality of these substituents are bonded to each other to form a ring. It may have a condensed ring.
  • Examples of the substituent include the same groups as the examples of the substituent for Ra described above.
  • Ra an alkyl group represented by Ra
  • an aromatic group an aromatic group
  • the alkoxy group, aryloxy group, alkylthio group, and arylothio group may or may not further have a substituent, but preferably an unsubstituted alkyl group, aromatic group, alkoxy group, aryloxy group, alkylthio group.
  • alkyl group substituted with a fluorine atom examples include a fluoromethyl group and a trifluoromethyl group. , Pentafluoroethyl group, pentafluorophenyl group, etc. That.
  • ml represents an integer of 0 to 4, preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and nl and pi each represent an integer of 1 to 5, preferably 1 Is an integer of -3, more preferably an integer of 1-2.
  • a plurality of Ra, Ra and Ra may be the same or different from each other.
  • Ras may combine to form a ring Ra and Ra or multiple Ras
  • Ra and Ra may combine to form a ring. At least one of Ra is sulfoni
  • Ra is sulfoyuumio
  • Y is Z-SO (Z is C F (n is an integer of 1 to 10), an alkyl group, or alkyl-substituted.
  • C is a force representing I.
  • the sulfoyuium salt compound represented by the general formula (A) according to the present invention is more preferably a compound represented by the general formulas (B) to (D) according to the present invention, A compound represented by formula (B) is preferred.
  • R 1 represents an alkyl group having 1 to 10 carbon atoms.
  • Alkyl group is
  • Examples that may be linear, branched, or cyclic include methyl, ethyl, propyl, isopropyl, tert-butyl, pentyl, hexyl, and heptyl groups. Octyl group, tert-amyl group, cyclopentyl group, cyclohexyl group and the like, and these may further have a substituent. Examples of the substituent are groups having the same meaning as the Ra substituent in the general formula (A) described above. R is preferably an alkyl having 1 to 6 carbon atoms.
  • R 1 and R 2 each represents an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms.
  • the alkyl group is the same as R described above, and the alkoxy group is above the oxygen atom.
  • the group having the same meaning as R described above is a group bonded at one position, and examples include a methoxy group, an ethoxy group,
  • R 1 and R 2 are each preferably charcoal
  • a C1-C6 alkyl group or C1-C6 alkoxy group more preferably a C1-C4 alkyl group or C1-C4 alkoxy group, and most preferably a methyl group or methoxy group. It is a group.
  • Y is synonymous with Y in the general formula (A) described above.
  • R 1 represents an alkyl group having 1 to 10 carbon atoms.
  • Examples of straight-chain, branched, or cyclic examples include methyl, ethyl, propyl, isopropyl, tert-butyl, pentyl, hexyl, and Examples include a butyl group, an octyl group, a tert-amyl group, a cyclopentyl group, a cyclohexyl group, and the like, which may further have a substituent.
  • An example of the substituent is a group having the same meaning as the Ra substituent in the general formula (A) described above.
  • R preferably has 1 to 6 carbon atoms.
  • alkyl group more preferably an alkyl group having 1 to 4 carbon atoms, and most preferably a methyl group.
  • R represents a substituent, and examples of the substituent include the Ra substituent in the general formula (A) described above.
  • m4 represents an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 0 force 1.
  • R 1 and R 2 each represents an alkyl group having 1 to 10 carbon atoms. As the alkyl group,
  • R is synonymous with R.
  • R 1 and R 2 are each preferably an alkyl group having 1 to 6 carbon atoms,
  • alkyl group having 1 to 4 carbon atoms More preferred is an alkyl group having 1 to 4 carbon atoms, and most preferred is a methyl group.
  • Y is above
  • R 1 represents a hydrogen atom or an alkyl group having 1 to: LO. Finished
  • the alkyl group is the same as the substituent for R described above.
  • R is preferably a hydrogen atom
  • an alkyl group having 1 to 6 carbon atoms more preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
  • R represents a substituent.
  • m5 represents an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 0 or 1.
  • R 1 and R 2 each represent an alkyl group having 1 to 10 carbon atoms.
  • alkyl group having 1 to 10 carbon atoms.
  • R is synonymous with R.
  • R 1 and R 2 are each preferably an alkyl group having 1 to 6 carbon atoms,
  • alkyl group having 1 to 4 carbon atoms More preferred is an alkyl group having 1 to 4 carbon atoms, and most preferred is a methyl group.
  • Y is above
  • the photoacid generator composition of the present invention preferably contains at least one compound selected from a polycyclic aromatic compound, a strong rubazole derivative and a thixanthone derivative together with the photoacid generator described above. Furthermore, anthracene, fluorene, pyrene, thalene, phenanthrene, anthraquinone, perylene, carbazole, phenothiazine, thixanthone, thianthrene, benzanthracene, naphthacene, triphenylene, and at least one compound selected from the following general formula (3) are contained. It is preferable to do.
  • the polycyclic aromatic compound that can be used in the present invention is preferably a naphthalene derivative, anthracene derivative, a taricene derivative, or a phenanthrene derivative.
  • Substituent al As the alkoxy group those having 1 to 18 carbon atoms are preferred, and those having 1 to 8 carbon atoms are particularly preferred.
  • As the aralkyloxy group those having 7 to 10 carbon atoms are preferable, and in particular, a benzyloxy group and phenethyloxy group having 7 to 8 carbon atoms are preferable.
  • Anthracene derivatives such as 1,4 dimethoxychrysene, 1,4 methoxychrysene, 1,4 dipropoxytalicene, 1,4-dibenzyloxytalicene, 1,4-di at methylbenziloxychrysene, etc., 9 hydroxy
  • examples thereof include phenanthrene derivatives such as phenanthrene, 9,10 dimethoxyphenanthrene, and 9,10 diethoxyphenanthrene.
  • a methoxy group and an ethoxy group are particularly preferable as the alkoxy group preferred by the 9,10 dialkoxyanthracene derivative which may have an alkyl group having 1 to 4 carbon atoms as a substituent.
  • Examples of strong rubazole derivatives include N-methylcarbazole, N-ethylcarbazole (hereinafter referred to as “NEC”), N-propylcarbazole, N-butylcarbazole, N-vinylcarbazole, 1, 3, 6, 8 , 9 Pentamethylcarbazole, 1, 4, 5, 8, 9 Pentamethylcarbazole (hereinafter referred to as “NMPC”), 3-formyl N-ethylcarbazole, N-phenylcarbazole, N-ethyl-3, 6— Bis (benzoyl) rubazole (hereinafter referred to as “NEBC”), 9, 9 ′ Jetyl 3, 3 ′ —dicarbazole (hereinafter referred to as “NEDC”), and the like.
  • NEC N-methylcarbazole
  • N-ethylcarbazole hereinafter referred to as “NEC”
  • N-propylcarbazole N-butyl
  • thixanthone derivatives include thixanthone, 2,4 dimethylthioxanthone, 2,4 jetylthioxanthone, isopropylthioxanthone 2 chlorothixanthone, and the like.
  • R 21 to R 28 have the same meanings as Ri to R 17 in the general formula (1).
  • the cationic photopolymerizable composition of the present invention is characterized by containing a cationic polymerizable compound together with the photoacid generator composition of the present invention.
  • cationically polymerizable compound As the cationically polymerizable compound according to the present invention, various known cationically polymerizable monomers can be used. Particularly, JP-A-6-9714, JP-A-2001-31892, JP-A-2001- Epoxy compounds, vinyl ether compounds, and oxetanes shown in column f of 40068, JP 2001-55507, JP 2001-310938, JP 2001-310937, JP 2001-220526. A compound is preferred.
  • the epoxy compound include the following aromatic epoxides, alicyclic epoxides, and aliphatic epoxides.
  • a preferable aromatic epoxide is a di- or diol produced by the reaction of a polyhydric phenol having at least one aromatic nucleus or an alkylene oxide-attached cage thereof and epichlorohydrin.
  • Polyglycidyl ethers such as di- or polyglycidyl ethers of bisphenol A or alkylene oxide adducts thereof, di- or polyglycidyl ethers of hydrogenated bisphenol A or alkylene oxide-attached bodies, and novolac type epoxy resins Etc.
  • examples of the alkylene oxide include ethylene oxide and propylene oxide.
  • alicyclic epoxide a compound having at least one cycloalkane ring such as cyclohexene or cyclopentene ring is epoxidized with an appropriate oxidizing agent such as hydrogen peroxide or peracid.
  • an appropriate oxidizing agent such as hydrogen peroxide or peracid.
  • the resulting cyclohexene oxide or cyclopentene oxide-containing compound is preferred.
  • Preferred aliphatic epoxides include aliphatic polyhydric alcohols or di- or polyglycidyl ethers of their alkylene oxide adducts, typical examples of which include diglycidyl ether of ethylene glycol, propylene Polyglycidyl of polyhydric alcohol such as diglycidyl ether of glycol or diglycidyl ether of alkylene glycol such as diglycidyl ether of 1,6-hexanediol, di- or triglycidyl ether of diglycidyl ether of glycerin or alkylene oxide thereof Of polyalkylene glycols such as diglycidyl ethers of ethers, polyethylene glycols or alkylene oxides thereof, and diglycidyl ethers of polyethylene glycols or alkylene oxides thereof. Glycidyl ether, and the like.
  • examples of the alkylene oxide include ethylene oxide and propylene oxide.
  • epoxides in view of fast curability, aromatic epoxides and alicyclic epoxides are preferred, and alicyclic epoxides are particularly preferred.
  • one of the epoxides may be used alone, or two or more may be used in appropriate combination.
  • the alicyclic epoxy compound is described in JP-A-2005-139425.
  • the compounds represented by the general formulas (A), (I) to (VI) are preferred.
  • Examples of the butyl ether compound that can be preferably added to the present invention include known vinyl ether compounds.
  • Di- or tributyl ether compounds such as methanol divinyl ether and trimethylolpropane trivinyl ether, ethyl vinyl ether, n -butyl vinyl ether, isobutyl vinyl ether, octadecyl vinyl ether, cyclohexyl vinyl ether, hydroxybutynole vinylenole Ethenore, 2-ethynolehexinolevinoleetenore,
  • vinyl ether compounds in consideration of curability, adhesion, and surface hardness, di- or trivinyl ether compounds are preferred, and in particular dibuty ether compounds are preferred.
  • one of the above vinyl ether compounds may be used alone, or two or more may be used in appropriate combination.
  • the oxetane compound that can be used in the present invention is a compound having an oxetane ring, and is described in Japanese Patent Application Laid-Open No. 2001-220526, 2001-310937. Any known oxetane compound can be used.
  • a compound represented by the general formula ( ⁇ ) described in JP-A-2005-139425 is preferred, specifically, described in paragraph No. 0218 of the same specification, ⁇ -1 to ⁇ -13. Etc.
  • a monofunctional oxetane compound containing one oxetane ring and a polyfunctional oxetane compound containing two or more oxetane rings may be used in combination. Is more preferable for improving the film strength after curing. However, when a compound having 5 or more oxetane rings is used, the viscosity of the photocurable composition is increased, which makes it difficult to handle and increases the glass transition temperature of the photocurable composition. The cured product is not sufficiently sticky.
  • the compound having an oxetane ring used in the present invention is preferably a compound having 1 to 4 oxetane rings.
  • the cationically polymerizable compound is preferably 25 to 90% by mass of a compound having an oxetane ring, 10 to 70% by mass of a compound having an oxsilane group, and a vinyl ether compound.
  • a compound having an oxetane ring 10 to 70% by mass of a compound having an oxsilane group, and a vinyl ether compound.
  • various additives other than those described above can be used.
  • leveling additives, matting agents, polyester resin, polyurethane resin, bull resin, acrylic resin, rubber resin, waxes to adjust film properties should be added.
  • any known basic compound can be used. Representative examples include basic alkali metal compounds, basic alkaline earth metal compounds, and amines. Organic organic compounds.
  • the cationic photopolymerizable composition of the present invention preferably contains a pigment.
  • Examples of the pigment used in the present invention include carbon-based pigments such as carbon black, carbon refined, and carbon nanotubes, iron black, cobalt blue, zinc oxide, titanium oxide, chromium oxide, and iron oxide.
  • pigments include
  • a ball mill, a sand mill, an attritor, a roll mill, an agitator, a Henschel mixer, a colloid mill, an ultrasonic homogenizer, a pearl mill, a wet jet mill, a paint shaker, or the like can be used.
  • a dispersing agent can be added when dispersing the pigment.
  • the dispersant it is preferable to use a polymer dispersant, for example, Avecia Solsperse series and Ajinomoto Fine Techno PB series.
  • a synergist according to various pigments can be used as a dispersion aid.
  • the dispersants and dispersion aids are preferably added in an amount of 1 to 50 parts by mass with respect to 100 parts by mass of the pigment.
  • the dispersion medium is a solvent or a polymerizable compound.
  • the photocurable ink of the present invention is preferably solvent-free because it is reacted and cured after printing. If the solvent remains in the cured image, the solvent resistance deteriorates and the VOC problem of the remaining solvent occurs. Therefore, it is preferable in view of dispersibility that the dispersion medium is not a solvent but a polymerizable compound, and among them, a monomer having the lowest viscosity is selected.
  • the ink-jet ink of the present invention contains at least the photoacid generator composition of the present invention or the cationic photopolymerizable composition of the present invention.
  • the inkjet ink of the present invention in addition to the constituent elements described in the photoacid generator composition of the present invention or the cationic photopolymerizable composition of the present invention, for example, a leveling additive, a matting agent, etc.
  • a leveling additive for example, a matting agent, etc.
  • Polyester-based resin, polyurethane-based resin, vinyl-based resin, acrylic-based resin, rubber-based resin, and waxes for adjusting film physical properties can be added.
  • any known basic compound can be used, but representative examples include basic alkali metal compounds, basic alkaline earth metal compounds, and amines. And basic organic compounds. It is also possible to combine radically polymerizable monomers and initiators into radical cation hybrid curable inks.
  • the viscosity at 25 ° C is preferably 7 to 50 mPa's.
  • various non-absorbable plastics and films used for so-called soft packaging, as well as ordinary uncoated paper and coated paper can be used.
  • PET polyethylene terephthalate
  • OPS stretched polystyrene
  • OPP stretched polypropylene
  • NMC stretched nylon
  • PVC polychlorinated butyl
  • PET polyethylene
  • TAC tria A cetyl cellulose
  • Other plastics that can be used include polycarbonate, acrylic resin, ABS, polyacetal, polybutyl alcohol (PVA), and rubbers. It can also be applied to metals and glass.
  • the configuration of the present invention is effective particularly when an image is formed on a PET film, an OPS film, an OPP film, an ONy film, and a PVC film that can be shrunk by heat.
  • the film is easily curled or deformed due to curing shrinkage of the ink or heat generated during the curing reaction, it is difficult for the ink film to be followed by the force to follow the shrinkage of the base material.
  • a fabric having natural fiber or synthetic fiber strength can also be used.
  • Specific examples include cotton, silk, Trevira CS (polyester: made from hextone), Tyvek (polyethylene: made from Dubon), turbolin (salt vine), nylon, and the like.
  • the total ink film thickness after recording ink on the recording material and curing by irradiation with actinic rays is 2 to 20 m.
  • the recording material is often a thin plastic material!
  • Ink ejection with a thick film thickness is not preferable.
  • total ink film thickness means the maximum value of the film thickness of the ink drawn on the recording material, and even with a single color, the other two colors (secondary color) or three colors are superimposed. Even when 4-color superposition (white ink base) is recorded, the meaning of the total ink film thickness is the same.
  • the actinic ray is irradiated for 0.001 to 2.0 seconds after ink printing as the actinic ray irradiation condition, more preferably 0.001. Seconds to 1.0 seconds. In order to form a high-definition image, it is particularly important that the irradiation timing is as early as possible.
  • the method of irradiating actinic rays in two stages, first irradiating actinic rays between 0.001 and 2.0 seconds after ink printing, and further irradiating actinic rays after the completion of all printing Is also one of the preferred embodiments.
  • a light source with high illuminance in which the total power consumption of the light source exceeds lkW'hr is usually used in order to suppress dot spread and bleeding after ink landing.
  • these light sources are used, particularly in printing on a shrink label or the like, the shrinkage of the recording material is so large that it cannot be used.
  • the total power consumption of the light source for irradiating active light is less than lkW'hr.
  • Examples of light sources with a total power consumption of less than lkW'hr include, but are not limited to, fluorescent tubes, cold cathode tubes, LEDs and the like.
  • FIG. 1 is a front view showing the configuration of the main part of the recording apparatus.
  • the recording apparatus 1 includes a head carriage 2, a recording head 3, an irradiation unit 4, a platen unit 5, and the like.
  • a platen section 5 is installed under the recording material P.
  • the platen section 5 has a function of absorbing ultraviolet rays and absorbs excess ultraviolet rays that have passed through the recording material P. As a result, high-definition images can be reproduced very stably.
  • the recording material P is guided by the guide member 6 and moves from the front side to the back side in Fig. 1 by the operation of the conveying means (not shown).
  • Head scanning means (not shown) scans the recording head 3 held by the head carriage 2 by reciprocating the head carriage 2 in the Y direction in FIG.
  • the head carriage 2 is installed on the upper side of the recording material P, and a plurality of recording heads 3 to be described later are arranged in accordance with the number of colors used for image printing on the recording material P, and the discharge ports are arranged on the lower side.
  • the head carriage 2 is installed on the main body of the recording apparatus 1 in such a manner that it can reciprocate in the Y direction in FIG. 1, and reciprocates in the Y direction in FIG. 1 by driving the head scanning means.
  • the head carriage 2 is white (W), yellow (Y), magenta (M), shean (C), black (K), light yellow (Ly), light magenta (Lm), Drawing as if the light cyan (Lc), light black (Lk), and white (W) recording heads 3 were to be stored!
  • the number of colors is determined as appropriate.
  • the recording head 3 has an actinic ray curable ink supplied by an ink supply means (not shown).
  • the discharge roller is also discharged toward the recording material P by the operation of a plurality of discharge means (not shown) provided therein (for example, UV curable ink).
  • the UV ink discharged from the recording head 3 is composed of a coloring material, a polymerizable monomer, an initiator, etc., and the monomer crosslinks when the initiator acts as a catalyst when irradiated with ultraviolet rays. It has the property of being cured by a polymerization reaction.
  • the recording head 3 has a certain area (landing) in the recording material P during the scan that moves from one end of the recording material P to the other end of the recording material P in the Y direction in FIG. UV ink is ejected as ink droplets onto the possible region), and ink droplets are landed on the landable region.
  • the recording material P is appropriately moved in the forward direction in FIG. 1 by the transport means, and head scanning is performed again. While performing scanning by means, the recording head 3 discharges UV ink to the next landable area adjacent in the rear direction in FIG.
  • the irradiation means 4 includes an ultraviolet lamp that emits ultraviolet light in a specific wavelength region with stable exposure energy and a filter that transmits ultraviolet light of a specific wavelength.
  • ultraviolet lamps that emits ultraviolet light in a specific wavelength region with stable exposure energy
  • Ride lamp, cold cathode tube, hot cathode tube, mercury lamp or black light are preferred.
  • a low-pressure mercury lamp, a hot cathode tube, a cold cathode tube, and a germicidal lamp that emit ultraviolet light having a wavelength of 254 nm are preferable because they can prevent bleeding and efficiently control the dot diameter.
  • black light as the radiation source of the irradiation means 4
  • the irradiation means 4 for hardening the UV ink can be produced at low cost.
  • the irradiation means 4 is provided by the recording device (UV inkjet printer) 1 in the landable area where the recording head 3 ejects UV ink by one scan by driving the head scanning means. It has almost the same shape as the largest one that can be determined, or a shape larger than the landable area.
  • the irradiating means 4 is installed on both sides of the head carriage 2 so as to be substantially parallel to the recording material P.
  • the entire recording head 3 is not only shielded, but in addition, the recording head is determined by the distance hi between the irradiation means 4 and the recording material P. It is effective to increase the distance h2 between the ink ejection part 31 and the recording material P in Fig. 3 (hl ⁇ h2), or to increase the distance d between the recording head 3 and the irradiation means 4 (d is increased). is there. Further, it is more preferable that the space between the recording head 3 and the irradiation means 4 is a bellows structure 7.
  • the wavelength of the ultraviolet rays irradiated by the irradiation means 4 can be appropriately changed by replacing the ultraviolet lamp or filter provided in the irradiation means 4.
  • a pigment dispersion a was prepared by dispersing the pigment according to the following method.
  • OXT221 (Oxetane compound manufactured by Toa Gosei Co., Ltd.) 72 parts After cooling to room temperature, add 20 parts of Pigment Blue 15: 4 (manufactured by Dainichi Seika Co., Ltd.) and add it to a glass bottle with 200 g of Zircoyu beads of 0.3 mm Sealed and sealed, and dispersed with a paint shaker for 4 hours, after which the zircoyour beads were removed to obtain a pigment dispersion a.
  • Pigment Blue 15: 4 manufactured by Dainichi Seika Co., Ltd.
  • Inks 1 to 7 were prepared by sequentially adding and mixing the additives listed in Table 1.
  • the numerical values listed in Table 1 are addition amounts (parts).
  • OXT-101 Toagosei Co., Ltd.
  • OXT -212 Toagosei Co., Ltd.
  • OXT-221 Made by Toagosei
  • UVI6992 Propion carbonate 50% solution manufactured by Dow Chemical Company SP152: Sulfonium salt (Asahi Denka Kogyo Co., Ltd.)
  • KF— 351 Silicone oil manufactured by Shin-Etsu Chemical [0139] [Chemical 14]
  • the above-prepared cured composition ink is loaded into an ink jet recording apparatus having the constitutional power shown in FIG. 1 equipped with a piezo-type ink jet nozzle, and the recording material is 600 mm wide and 20 m long Trevira CS (polyester film, hexone
  • the following image recording was continuously carried out on the earthenware.
  • the ink supply system was an ink tank, supply pipe, front chamber ink tank just before the head, pipe with filter, and piezo head force. Heating was performed from the front chamber tank to the head and heated to 50 ° C.
  • the head portion was heated in accordance with the viscosity of each curable composition ink, and was driven so that it could be ejected at a resolution of 720 ⁇ 720 dpi, so that the curable composition ink described above was continuously ejected.
  • the recording material was adjusted to 40 ° C with a surface heater and a cooling device.
  • 120WZcm metal nanoride lamps on both sides of the carriage (MAL 400NL manufactured by Nihon Batteries) were irradiated with UV light of '400mWZcm 2 and cured instantaneously (less than 0.5 seconds after landing).
  • Ink discharge was printed with a minimum droplet volume of 4 pl and a maximum liquid volume of 80 pl.
  • Inkjet images were formed at a temperature of 23 ° C and a humidity of 30%.
  • Table 2 shows the results obtained as described above.
  • the ink having the constitutional power defined in the present invention is excellent in the bleeding resistance of the formed image and the ejection stability after continuous ejection compared to the comparative example. It turns out that it is excellent.
  • Pigment Black 7 Mitsubishi Chemical Corporation # 52
  • Pigment Black 7 Mitsubishi Chemical Co., Ltd.
  • Pigment Blue 15 4 (manufactured by Dainichi Seika).
  • Chemical MA7 Pigment Blue 15: 4 (Sanyo Dye) Pigment Red 122 (Daiichi Seika CFR321), Pigment Violetl9 (Daiichi Seika CFR338-3)
  • Pigment Yellow 138 (Daiichi Seika CFY340 )
  • Pigmen t Yellow 151 (Lanxess E4GN—GT)
  • Pigment Yellow 180 (Daiichi Seika Chemical CFY313— 2)
  • Pigment Yellow 180 (Clariant?
  • each ink was prepared.
  • the ink according to the constitution defined in the present invention is similar to the result in Example 1 with respect to the comparative example. It was confirmed that the formed image was excellent in bleeding resistance and excellent in discharge stability after continuous discharge.

Abstract

Disclosed is a photoacid generator composition containing a sulfonium salt compound which does not discharge benzene while being excellent in long-term storage stability. Also disclosed are a cationically photopolymerizable composition containing such a photoacid generator composition, an inkjet ink and an inkjet recording method. The photoacid generator composition is characterized by containing a sulfonium salt having a structure represented by the general formula (1) below and a sulfonium salt other than the sulfonium salt having a structure represented by the general formula (1) below.

Description

光酸発生剤組成物、カチオン系光重合性組成物、インクジェットインク及 びそれを用いるインクジェット記録方法  Photoacid generator composition, cationic photopolymerizable composition, inkjet ink, and inkjet recording method using the same
技術分野  Technical field
[0001] 本発明は、安定性に優れ、近紫外線領域での感光性に優れた光酸発生剤組成物 The present invention relates to a photoacid generator composition having excellent stability and excellent photosensitivity in the near ultraviolet region.
、カチオン系光重合性糸且成物、インクジェットインク及びそれを用いるインクジェット記 録方法に関するものである。 The present invention relates to a cationic photopolymerizable yarn composition, an inkjet ink, and an inkjet recording method using the same.
背景技術  Background art
[0002] 近年、光力チオン硬化性組成物は、酸素による重合阻害がないこと、低臭気で低 粘度なモノマーが新たに開発されてきていることから、注目されている。また、フオトレ ジストの分野でも、有効な化学増幅型レジストとして注目されている。例えば、ベンゼ ンの発生がなく、射出性、硬化物の密着性に優れていることが示されている(例えば [0002] In recent years, light-powered thione curable compositions have attracted attention because they have no polymerization inhibition by oxygen and new odor and low viscosity monomers have been developed. It is also attracting attention as an effective chemically amplified resist in the field of photoresists. For example, it has been shown that there is no generation of benzene, and excellent injection properties and cured product adhesion (for example,
、特許文献 1参照。 ) oし力しながら、インクジヱット記録方式以外の用途に用いる場合 、インクジェットインク組成物の安定性が満足できないことが判明した。また、フオトレ ジスト用の新規の光酸発生剤が開示されている (例えば、特許文献 2参照。 )0また、 近紫外領域に感光性を持つ開始剤が開示されている (例えば、特許文献 3参照。 )0 しかしながら、これら提案されている光酸発生剤は、硬化性組成物を構成するとき、 モノマーへの溶解性が不十分で、特に、インクジェットインク用に用いた場合、長期間 にわたり保存された際に、射出性が十分満足できる特性でないことが判明した。 特許文献 1:特開 2005 - 97557号公報 See Patent Document 1. ) It was found that the stability of the ink-jet ink composition could not be satisfied when used for applications other than the ink jet recording system while applying force. In addition, a novel photoacid generator for photoregister is disclosed (for example, see Patent Document 2). 0 Also, an initiator having photosensitivity in the near ultraviolet region is disclosed (for example, Patent Document 3). 0 ) However, these proposed photoacid generators have insufficient solubility in monomers when constituting a curable composition, and particularly when used for inkjet inks, they are stored for a long period of time. As a result, it was found that the injection properties were not sufficiently satisfactory. Patent Document 1: Japanese Patent Laid-Open No. 2005-97557
特許文献 2:特開平 9 - 15848号公報  Patent Document 2: Japanese Patent Laid-Open No. 9-15848
特許文献 3:国際公開第 04Z29037号パンフレット  Patent Document 3: International Publication No. 04Z29037 Pamphlet
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0003] 本発明は、上記課題に鑑みなされたものであり、その目的は、ベンゼンの放出がな ぐ長期保存安定性に優れたスルホ二ゥム塩化合物を含む光酸発生剤組成物と、そ れを用いたカチオン系光重合性組成物、インクジェットインク及びインクジェット記録 方法を提供することにある。 [0003] The present invention has been made in view of the above-mentioned problems, and its object is to provide a photoacid generator composition containing a sulfonium salt compound excellent in long-term storage stability without releasing benzene, and Cationic photopolymerizable composition, inkjet ink and inkjet recording using the same It is to provide a method.
課題を解決するための手段  Means for solving the problem
[0004] 本発明の上記目的は、以下の構成により達成される。  [0004] The above object of the present invention is achieved by the following configurations.
[0005] 1.下記一般式(1)で表される構造を有するスルホニゥム塩と、該一般式(1)で表さ れる構造を有するスルホ -ゥム塩を除くスルホ -ゥム塩とを含有することを特徴とする 光酸発生剤組成物。 [0005] 1. Contains a sulfonium salt having a structure represented by the following general formula (1) and a sulfo-um salt excluding the sulfo-um salt having a structure represented by the general formula (1) A photoacid generator composition characterized by comprising:
[0006] [化 1]  [0006] [Chemical 1]
Figure imgf000004_0001
Figure imgf000004_0001
[0007] 〔式中、 Ri〜R17は、それぞれ水素原子、ハロゲン原子、ニトロ基、水酸基、アルキル 基、アルコキシ基、ァシル基、フエノキシ基、エステル基、ァリール基、チォエーテル 基、チォカルボ-ル基、スルフィエル基、スルホ-ル基、アミノ基、アミド基、イミド基、 二トリル基、ホスフィ-基、ホスホ-ォ基、ホスホリル基、及び炭素数 1〜8のフルォロ アルキル基カゝらなる群カゝら選ばれる基であって、同一であっても異なっていてもよく、 これらの基の官能基以外の部分は、炭素数 1〜12の、飽和脂肪族炭化水素基、不 飽和脂肪族炭化水素基、脂環式炭化水素基、炭素環式芳香族炭化水素または複 素環式芳香族炭化水素基であってもよい。また、 R5及び R6は互いに縮合して共有結 合となってもよい。 Xは、 1価のァ-オンになりうる原子団である。〕 [Wherein Ri to R 17 are each a hydrogen atom, a halogen atom, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an acyl group, a phenoxy group, an ester group, an aryl group, a thioether group, or a thiocarbole group. , Sulfiel groups, sulfo groups, amino groups, amide groups, imide groups, nitrile groups, phosphi groups, phospho groups, phosphoryl groups, and fluoroalkyl groups having 1 to 8 carbon atoms. The groups selected may be the same or different, and the portion other than the functional group of these groups is a C1-C12 saturated aliphatic hydrocarbon group or unsaturated aliphatic carbon group. It may be a hydrogen group, an alicyclic hydrocarbon group, a carbocyclic aromatic hydrocarbon or a bicyclic aromatic hydrocarbon group. R 5 and R 6 may be condensed with each other to form a covalent bond. X is an atomic group that can be a monovalent key. ]
2.前記一般式(1)で表される構造を有するスルホ二ゥム塩を除くスルホ二ゥム塩は 、下記一般式 (A)で表される構造を有するスルホ -ゥム塩であることを特徴とする前 記 1に記載の光酸発生剤組成物。  2. The sulfonium salt excluding the sulfonium salt having the structure represented by the general formula (1) is a sulfo-um salt having a structure represented by the following general formula (A): 2. The photoacid generator composition as described in 1 above, wherein
[0008]
Figure imgf000005_0001
[0008]
Figure imgf000005_0001
[0009] 〔式中、 Ra Raは各々アルキル基または芳香族基を表し、 Z1は酸素原子または硫 [Wherein Ra Ra represents an alkyl group or an aromatic group, and Z 1 represents an oxygen atom or a sulfur group.
1 2  1 2
黄原子を表し、 Ra Raは各々アルキル基、芳香族基、アルコキシ基、ァリールォキ  Represents a yellow atom, and Ra Ra represents an alkyl group, an aromatic group, an alkoxy group, an aryloxy group, respectively.
3 4  3 4
シ基、アルキルチオ基またはァリールチオ基を表し、 mlは 0 4の整数を表し、 nl及 び piは各々 1 5の整数を表し、 Yは、 Z— SO (Zは C F (nは 1 10の整数)、ァ  Represents an integer of 0 4; nl and pi each represent an integer of 15; Y represents Z—SO (Z is CF (n is an integer of 1 10); )
3 n 2n+l  3 n 2n + l
ルキル基、またはアルキル置換もしくは無置換の芳香族基を表す)、 PF BF AsF  Represents an alkyl group or an alkyl-substituted or unsubstituted aromatic group), PF BF AsF
6 4  6 4
SbF B (C F ) CIO Br CIまたは Iを表す。〕  SbF B (C F) CIO Br CI or I is represented. ]
6 6 6 5 4 4  6 6 6 5 4 4
3.多環芳香族化合物、力ルバゾール誘導体及びチォキサントン誘導体カゝら選ば れる少なくとも 1種の化合物を含有することを特徴とする前記 1または 2に記載の光酸 発生剤組成物。  3. The photoacid generator composition as described in 1 or 2 above, which comprises at least one compound selected from a polycyclic aromatic compound, a strong rubazole derivative and a thixanthone derivative.
[0010] 4.前記多環芳香族化合物、力ルバゾール誘導体及びチォキサントン誘導体から 選ばれる少なくとも 1種の化合物力 アントラセン、フルオレン、ピレン、タリセン、フエ ナントレン、アントラキノン、ペリレン、カルバゾール、フエノチアジン、チォキサントン、 チアントレン、ベンズアントラセン、ナフタセン、トリフエ-レン及び下記一般式(3)から 選ばれる少なくとも 1つの化合物であることを特徴とする前記 3に記載の光酸発生剤 組成物。  [0010] 4. At least one compound force selected from the polycyclic aromatic compounds, force rubazole derivatives and thixanthone derivatives anthracene, fluorene, pyrene, thalene, phenanthrene, anthraquinone, perylene, carbazole, phenothiazine, thixanthone, thianthrene, 4. The photoacid generator composition according to 3 above, which is at least one compound selected from benzanthracene, naphthacene, triphenylene and the following general formula (3).
[0011] [化 3]
Figure imgf000005_0002
[0011] [Chemical 3]
Figure imgf000005_0002
[0012] 〔式中、 R21 R28は、前記一般式(1)における Ri R17と同義である。〕 [In the formula, R 21 R 28 has the same meaning as Ri R 17 in the general formula (1). ]
5.前記一般式 (A)で表される構造を有するスルホ二ゥム塩力 下記一般式 (B)、 ( C)及び (D)力 選ばれる少なくとも 1種であることを特徴とする前記 2 4の 、ずれか 1項に記載の光酸発生剤組成物。 [0013] [ィ匕 4] 5. Sulfonium salt power having the structure represented by the general formula (A) The following general formula (B), (C) and (D) power 4. The photoacid generator composition according to item 1 of 4. [0013] [I 匕 4]
Figure imgf000006_0001
Figure imgf000006_0001
[0014] 〔式中、 R は炭素数 1 10のアルキル基を表し、 R R は各々炭素数 1 10のァ [In the formula, R represents an alkyl group having 1 to 10 carbon atoms, and R R represents an alkyl group having 1 to 10 carbon atoms.
31 32 33  31 32 33
ルキル基または炭素数 1 10のアルコキシ基を表し、 Yは、 Z— SO (Zは C F (n  Represents an alkyl group or an alkoxy group having 1 to 10 carbon atoms, Y is Z—SO (Z is C F (n
3 3 n 2n+l は 1〜: L0の整数)、アルキル基、またはアルキル置換もしくは無置換の芳香族基を表 す)、 PF、: BF AsF SbF、: B (C F ) CIO Br CIまたは Iを表す。〕  3 3 n 2n + l represents an integer of 1 to: L0), an alkyl group, or an alkyl-substituted or unsubstituted aromatic group), PF,: BF AsF SbF,: B (CF) CIO Br CI or I Represents. ]
6 4 6 6 6 5 4 4  6 4 6 6 6 5 4 4
[0015] [化 5] (C)  [0015] [Chemical 5] (C)
Figure imgf000006_0002
Figure imgf000006_0002
[0016] 〔式中、 R は水素原子または炭素数 1 10のアルキル基を表し、 R は置換基を表し  [In the formula, R represents a hydrogen atom or an alkyl group having 1 to 10 carbon atoms, and R represents a substituent.]
41 42  41 42
m4は 0 4の整数を表し、 R R は各々炭素数 1 10のアルキル基を表し、 Yは  m4 represents an integer of 0 4, R R represents an alkyl group having 1 to 10 carbon atoms, and Y represents
43 44 4 Z-SO (Zは C F (nは 1 10の整数)、アルキル基、またはアルキル置換もしく  43 44 4 Z-SO (Z is C F (n is an integer of 1 10), alkyl group, or alkyl substitution or
3 n 2n+l  3 n 2n + l
は無置換の芳香族基を表す)、 PF BF AsF SbF B (C F ) CIO Br  Represents an unsubstituted aromatic group), PF BF AsF SbF B (C F) CIO Br
6 4 6 6 6 5 4 4 αま たは Iを表す。〕  6 4 6 6 6 5 4 4 Represents α or I. ]
[0017] [化 6] (D  [0017] [Chemical 6] (D
Figure imgf000006_0003
Figure imgf000006_0003
〔式中、 R は水素原子または炭素数 1〜: L0のアルキル基を表し、 R は置換基を表し  [In the formula, R represents a hydrogen atom or an alkyl group having 1 to L0 carbon atoms, and R represents a substituent.
51 52 51 52
m5は 0 4の整数を表し、 R R は各々炭素数 1 10のアルキル基を表し、 Yは 、 Z-SO (Zは C F (nは 1〜10の整数)、アルキル基、またはアルキル置換もしくm5 represents an integer of 0 4, RR represents an alkyl group having 1 to 10 carbon atoms, and Y represents , Z-SO (Z is CF (n is an integer of 1 to 10), alkyl group, or alkyl substitution
3 n 2n+l 3 n 2n + l
は無置換の芳香族基を表す)、 PF、 BF、 AsF、 SbF、 B (C F ) 、 CIO、 Br、じほ  Represents an unsubstituted aromatic group), PF, BF, AsF, SbF, B (C F), CIO, Br, Jiho
6 4 6 6 6 5 4 4 たは Iを表す。〕  6 4 6 6 6 5 4 4 or I ]
6.前記 1〜5のいずれか 1項に記載の光酸発生剤組成物と、カチオン重合性化合 物とを含有することを特徴とするカチオン系光重合性組成物。  6. A cationic photopolymerizable composition comprising the photoacid generator composition according to any one of 1 to 5 above and a cationically polymerizable compound.
[0019] 7.前記カチオン重合性化合物が、エポキシ化合物、ォキセタンィ匕合物及びビニル エーテルィ匕合物力 選ばれる少なくとも 1種であることを特徴とする前記 6に記載の力 チオン系光重合性組成物。 [0019] 7. The force thione photopolymerizable composition as described in 6 above, wherein the cationically polymerizable compound is at least one selected from the group consisting of an epoxy compound, an oxetane compound and a vinyl ether compound. .
[0020] 8.顔料を含有することを特徴とする前記 6または 7に記載のカチオン系光重合性組 成物。 [0020] 8. The cationic photopolymerizable composition as described in 6 or 7 above, which contains a pigment.
[0021] 9.前記 1〜5のいずれか 1項に記載の光酸発生剤組成物を用いることを特徴とする インクジェットインク。  [0021] 9. An ink-jet ink comprising the photoacid generator composition according to any one of 1 to 5 above.
[0022] 10.前記 6〜8のいずれか 1項に記載のカチオン系光重合性組成物を用いることを 特徴とするインクジェットインク。  [0022] 10. An ink-jet ink comprising the cationic photopolymerizable composition according to any one of 6 to 8 above.
[0023] 11.繊維状記録材料に、前記 9または 10に記載のインクジェットインクを用いてイン クジェット記録することを特徴とするインクジェット記録方法。 [0023] 11. An ink jet recording method comprising performing ink jet recording on the fibrous recording material using the ink jet ink described in 9 or 10 above.
発明の効果  The invention's effect
[0024] 本発明により、ベンゼンの放出がなぐ長期保存安定性に優れたスルホユウム塩ィ匕 合物を含む光酸発生剤組成物と、それを用いたカチオン系光重合性組成物、インク ジェットインク及びインクジェット記録方法を提供することができた。  [0024] According to the present invention, a photoacid generator composition containing a sulfoyuium salt compound excellent in long-term storage stability without releasing benzene, and a cationic photopolymerizable composition and ink jet ink using the same And an ink jet recording method.
図面の簡単な説明  Brief Description of Drawings
[0025] [図 1]本発明の記録装置の要部の構成を示す正面図である。 FIG. 1 is a front view showing a configuration of a main part of a recording apparatus of the present invention.
符号の説明  Explanation of symbols
[0026] 1 記録装置 [0026] 1 Recording device
2 ヘッドキャリッジ  2 Head carriage
3 記録ヘッド  3 Recording head
31 インク吐出口  31 Ink outlet
4 照射手段 5 プラテン部 4 Irradiation means 5 Platen section
6 ガイド部材  6 Guide member
7 蛇腹構造  7 Bellows structure
P 記録材料  P Recording material
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0027] 以下、本発明を実施するための最良の形態について詳細に説明する。 Hereinafter, the best mode for carrying out the present invention will be described in detail.
[0028] 本発明者は、上記課題に鑑み鋭意検討を行った結果、前記一般式(1)で表される 構造を有するスルホニゥム塩と、前記一般式(1)で表される構造を有するスルホニゥ ム塩を除くスルホ -ゥム塩とを含有することを特徴とする光酸発生剤組成物により、人 体に有害なベンゼンの放出がなぐ長期保存安定性に優れたスルホユウム塩ィ匕合物 を含む光酸発生剤組成物を実現できることを見出し、本発明に至った次第である。 [0028] As a result of intensive studies in view of the above problems, the present inventor has found that a sulfonium salt having a structure represented by the general formula (1) and a sulfone salt having a structure represented by the general formula (1). By using a photoacid generator composition characterized by containing a sulfo-um salt excluding a humic salt, a sulfoyuum salt compound having excellent long-term storage stability without releasing harmful benzene to the human body. It has been found that a photoacid generator composition can be realized, and the present invention has been achieved.
[0029] 以下、本発明の詳細について説明する。 [0029] Details of the present invention will be described below.
[0030] 《光酸発生剤組成物》 <Photo acid generator composition>
(一般式 (1)で表される化合物)  (Compound represented by the general formula (1))
本発明の光酸発生剤組成物は、光酸発生剤として前記一般式(1)で表される構造 を有するスルホ -ゥム塩を含有することを特徴とする。  The photoacid generator composition of the present invention contains a sulfo-salt having a structure represented by the general formula (1) as a photoacid generator.
[0031] 本発明に係る前記一般式(1)で表される構造を有するスルホ -ゥム塩を用いること により、酸素による硬化阻害が起こらず、硬化精度がよぐかつ照射エネルギーに対 し高感度で、十分な硬化深度を有し、更にベンゼンの発生を抑制することができる。  [0031] By using the sulfonium salt having the structure represented by the general formula (1) according to the present invention, the curing inhibition by oxygen does not occur, the curing accuracy is high, and the irradiation energy is high. With sensitivity, it has a sufficient depth of cure and can further suppress the generation of benzene.
[0032] 前記一般式(1)において、 Ri〜R17は、それぞれ水素原子、ハロゲン原子、ニトロ基 、水酸基、アルキル基、アルコキシ基、ァシル基、フ ノキシ基、エステル基、ァリール 基、チォエーテル基、チォカルボ-ル基、スルフィエル基、スルホ-ル基、アミノ基、 アミド基、イミド基、二トリル基、ホスフィ-基、ホスホ-ォ基、ホスホリル基、及び炭素 数 1〜8のフルォロアルキル基からなる群力 選ばれる基であって、同一であっても異 なっていてもよぐこれらの基の官能基以外の部分は、炭素数 1〜12の、飽和脂肪族 炭化水素基、不飽和脂肪族炭化水素基、脂環式炭化水素基、炭素環式芳香族炭 化水素または複素環式芳香族炭化水素基であってもよい。また、 R5及び R6は互いに 縮合して共有結合となってもよい。 Xは、 1価のァ-オンになりうる原子団である。 [0033] 前記一般式(1)において、 R -R として特に好ましくは、水素原子、ハロゲン原子 、ニトロ基、水酸基、アルキル基、アルコキシ基、ァシル基または炭素数 1〜8のフル ォロアルキル基であり、同一であっても異なっていてもよい。また、 R5及び R6が互いに 縮合して共有結合となって!/ヽる場合も好ま ヽ。 In the general formula (1), Ri to R 17 are each a hydrogen atom, a halogen atom, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an acyl group, a phenoxy group, an ester group, an aryl group, or a thioether group. , Thiocarbol group, sulfiel group, sulfol group, amino group, amide group, imide group, nitrile group, phosphide group, phosphoro group, phosphoryl group, and a fluoroalkyl group having 1 to 8 carbon atoms Group power Group selected, which may be the same or different, except for the functional group of these groups, a saturated aliphatic hydrocarbon group or unsaturated aliphatic group having 1 to 12 carbon atoms It may be a hydrocarbon group, an alicyclic hydrocarbon group, a carbocyclic aromatic hydrocarbon group, or a heterocyclic aromatic hydrocarbon group. R 5 and R 6 may be condensed with each other to form a covalent bond. X is an atomic group that can be a monovalent key. In the general formula (1), R 1 -R is particularly preferably a hydrogen atom, a halogen atom, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an acyl group, or a fluoroalkyl group having 1 to 8 carbon atoms. , May be the same or different. Also preferred is when R 5 and R 6 condense with each other to form a covalent bond!
[0034] ハロゲン原子としては、例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙 げられる力 活性エネルギー線感受性の点で、フッ素原子が好ましい。アルキル基と しては、例えば、メチル基、ェチル基、プロピル基、イソプロピル基、ブチル基、イソブ チル基、ターシヤリブチル基、ネオペンチル基、へキシル基、イソへキシル基、ぺプチ ル基、ォクチル基、 2—ェチルへキシル基、ノニル基、デシル基、ゥンデシル基、ドデ シル基、トリデシル基、イソトリデシル基、ミリスチル基、パルミチル基、ステアリル基等 を挙げることができ、好ましくは炭素数 1〜4のアルキル基がよぐ特に、メチル基、ェ チル基が好ましい。アルコキシ基としては、メトキシ基、エトキシ基、プロピルォキシ基 、ブチルォキシ基、ペンチルォキシ基、へキシルォキシ基、ぺプチルォキシ基、オタ チルォキシ基、ノ-ルォキシ基、デシルォキシ基、ゥンデシルォキシ基、ドデシルォキ シ基、トリデシルォキシ基、ミリスチルォキシ基、ノ ルミチルォキシ基、ステアリルォキ シ基等を挙げることができ、好ましくは、炭素数 1〜4のアルコキシ基であり、特に、メト キシ基、エトキシ基が好ましい。フルオアルキル基としては、フルオメチル基、ジフル オメチル基、トリフルォロメチル基、ジフルォロェチル基、パーフルォロェチル基等を 挙げることができ、特にトリフルォロメチル基が好まし!/、。  [0034] As the halogen atom, for example, a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom are listed. From the viewpoint of active energy ray sensitivity, a fluorine atom is preferable. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tertiary butyl group, a neopentyl group, a hexyl group, an isohexyl group, a peptide group, An octyl group, a 2-ethylhexyl group, a nonyl group, a decyl group, an undecyl group, a dodecyl group, a tridecyl group, an isotridecyl group, a myristyl group, a palmityl group, a stearyl group, and the like, preferably 1 In particular, a methyl group or an ethyl group is preferable. Examples of the alkoxy group include methoxy group, ethoxy group, propyloxy group, butyloxy group, pentyloxy group, hexyloxy group, peptyloxy group, octyloxy group, noroxy group, decyloxy group, undecyloxy group, dodecyloxy group, tridecyloxy group, A myristyloxy group, a normyloxy group, a stearyloxy group, etc. can be mentioned, Preferably it is a C1-C4 alkoxy group, and especially a methoxy group and an ethoxy group are preferable. Examples of the fluoroalkyl group include a fluormethyl group, a difluoromethyl group, a trifluoromethyl group, a difluoroethyl group, a perfluoroethyl group, and the like, and a trifluoromethyl group is particularly preferable!
[0035] ァシル基としては、 R— CO—または Ar— CO—で表される基を挙げることができる 。この Rとしては、直鎖または分岐鎖のアルキル基または脂環式炭化水素基を挙げる ことができる。  Examples of the acyl group include a group represented by R—CO— or Ar—CO—. Examples of R include a linear or branched alkyl group or an alicyclic hydrocarbon group.
[0036] Rの具体例としては、例えば、メチル基、ェチル基、プロピル基、イソプロピル基、ブ チル基、イソブチル基、ターシヤリブチル基、ペンテル基、イソペンチル基、ターシャリ 一ペンチル基、ネオペンチル基、へキシル基、イソへキシル基、ぺプチル基、ォクチ ル基、 2—ェチルへキシル基、ノニル基、デシル基、ゥンデシル基、ドデシル基、トリ デシル基、イソトリデシル基、ミリスチル基、パルミチル基、ステアリル基、シクロペンチ ル基、シクロへキシル基等を挙げることができる。 [0037] Arとしては、下記一般式 (a)〜 (f)で表される基を挙げることができる。 [0036] Specific examples of R include, for example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tertiary butyl group, a pentyl group, an isopentyl group, a tertiary monopentyl group, a neopentyl group, Hexyl, isohexyl, peptyl, octyl, 2-ethylhexyl, nonyl, decyl, undecyl, dodecyl, tridecyl, isotridecyl, myristyl, palmityl, stearyl Group, cyclopentyl group, cyclohexyl group and the like. [0037] Examples of Ar include groups represented by the following general formulas (a) to (f).
[0038] [化 7] [0038] [Chemical 7]
Figure imgf000010_0001
Figure imgf000010_0002
Figure imgf000010_0001
Figure imgf000010_0002
[0039] 上記一般式 (a)〜 (f)にお 、て、 R18〜RMはそれぞれ水素原子、ハロゲン原子、水 酸基、アルキル基またはアルコキシ基を表し、同一であっても異なっていてもよい。 In the above general formulas (a) to (f), R 18 to R M each represent a hydrogen atom, a halogen atom, a hydroxyl group, an alkyl group or an alkoxy group, and they may be the same or different. May be.
[0040] 上記一般式 (a)〜 (f)における R18〜R63の具体例としては、ハロゲン原子としては、 例えば、フッ素原子、塩素原子、臭素原子、ヨウ素原子が挙げられる。アルキル基と しては、例えば、メチル基、ェチル基、プロピル基、イソプロピル基、ブチル基、イソブ チル基、ターシヤリブチル基、ペンチル基、イソペンチル基、ターシャリペンチル基、 ネオペンチル基、へキシル基、イソへキシル基、ぺプチル基、ォクチル基、 2—ェチ ルへキシル基、ノニル基、デシル基、ゥンデシル基、ドデシル基、トリデシル基、イソト リデシル基、ミリスチル基、パルミチル基、ステアリル基等を挙げることができ、アルコ キシ基としては、メトキシ基、エトキシ基、プロピルォキシ基、プチルォキシ基、ペンチ ルォキシ基、へキシルォキシ基、ぺプチルォキシ基、ォクチルォキシ基、ノニルォキ シ基、デシルォキシ基、ゥンデシルォキシ基、ドデシルォキシ基、トリデシルォキシ基 、ミリスチルォキシ基、ノ ルミチルォキシ基、ステアリルォキシ基等を挙げることができ る。 [0040] Specific examples of R 18 to R 63 in the general formula (a) ~ (f), as the halogen atom, e.g., fluorine atom, chlorine atom, bromine atom, and an iodine atom. Examples of the alkyl group include a methyl group, an ethyl group, a propyl group, an isopropyl group, a butyl group, an isobutyl group, a tertiary butyl group, a pentyl group, an isopentyl group, a tertiary pentyl group, a neopentyl group, and a hexyl group. , Isohexyl group, peptyl group, octyl group, 2-ethylhexyl group, nonyl group, decyl group, undecyl group, dodecyl group, tridecyl group, isotridecyl group, myristyl group, palmityl group, stearyl group, etc. Examples of the alkoxy group include methoxy group, ethoxy group, propyloxy group, ptyloxy group, pentyloxy group, hexyloxy group, peptyloxy group, octyloxy group, nonyloxy group, decyloxy group, undecyloxy group, dodecyloxy group. Group, tridecyloxy group, myristyloxy group Roh Rumichiruokishi group, Ru can be exemplified Suteariruokishi group, and the like.
[0041] 本発明に係る一般式(1)において、 Ri〜R17で表される基は同一であっても異なつ ていてもよいが、好ましくは 1^〜1^°の全てが水素原子である力、あるいは Ri〜R5のう ち、いずれ力 1または 2個、好ましくは 1個が水素原子以外であり、その他は全て水素 原子であって、 R6〜R1Qのうち、いずれ力 1または 2個、好ましくは 1個が水素原子以 外であり、その他は全て水素原子であることが好ましぐより好ましくは!^1〜!^ の全て が水素原子であるか、あるいは 〜 のうち、いずれか 1個がメチル基、フッ素原子、 ニトロ基、ァシル基カゝら選ばれる基であり、その他は全て水素原子であって、 R6〜R1Q のうちいずれか 1個がメチル基、フッ素原子、ニトロ基、ァシル基から選ばれる基であ り、その他は全て水素原子であることが好ましい。また、 R5及び R6が互いに縮合して 共有結合となって 、る場合も好ま 、。 In the general formula (1) according to the present invention, the groups represented by Ri to R 17 may be the same or different, but preferably all of 1 ^ to 1 ^ ° are hydrogen atoms. force is, or Ri~R 5 sac Chi, either force 1 or 2, preferably is other than one hydrogen atom, and all others are hydrogen More preferably, one of the atoms R 1 to R 1Q is one or two, preferably one is other than a hydrogen atom, and the others are all hydrogen atoms! ^ 1 ~! ^ Are all hydrogen atoms, or any one of ~ is a group selected from a methyl group, a fluorine atom, a nitro group, and an acyl group, and the others are all hydrogen atoms. It is preferable that any one of R 6 to R 1Q is a group selected from a methyl group, a fluorine atom, a nitro group, and an acyl group, and the others are all hydrogen atoms. It is also preferred that R 5 and R 6 are condensed with each other to form a covalent bond.
[0042] RU〜R17は、前記 R -R と同様である(ただし、 R5及び R6が互いに縮合して共有結 合となっている場合を除く)力 中でも 1個が Ar— CO—基であり、他は水素原子であ ることが好ましい。 [0042] R U to R 17 are the same as R -R (except for the case where R 5 and R 6 are condensed to form a covalent bond), and one of them is Ar—CO. —A group and the others are preferably hydrogen atoms.
[0043] 以下に、本発明に係る一般式(1)で表される構造を有するスルホニゥム塩のカチォ ン部の具体例を示すが、本発明はこれら例示する化合物に限定されるものではない  [0043] Specific examples of the cationic moiety of the sulfonium salt having the structure represented by the general formula (1) according to the present invention are shown below, but the present invention is not limited to these exemplified compounds.
[0044] [化 8] [0044] [Chemical 8]
Figure imgf000011_0001
Figure imgf000011_0001
[0045] [化 9] [0045] [Chemical 9]
Figure imgf000012_0001
Figure imgf000012_0001
[0046] また、本発明に係る一般式(1)で表される構造を有するスルホ -ゥム塩のァ-オン 部 (X—)の好ましい具体例としては、例えば、 SbF―、 PF—を挙げることができる。 [0046] In addition, preferred specific examples of the sulfone salt cation (X-) having the structure represented by the general formula (1) according to the present invention include, for example, SbF- and PF-. Can be mentioned.
6 6  6 6
[0047] (一般式 (A)で表される化合物)  [0047] (Compound represented by formula (A))
本発明の光酸発生剤組成物においては、上記説明した一般式(1)で表される構造 を有するスルホニゥム塩と共に、一般式(1)で表される構造を有するスルホ二ゥム塩 を除くスルホ -ゥム塩を含有することを特徴とする。  In the photoacid generator composition of the present invention, the sulfonium salt having the structure represented by the general formula (1) and the sulfonium salt having the structure represented by the general formula (1) are excluded. It contains a sulfo-um salt.
[0048] 本発明にお 、て、一般式(1)で表される構造を有するスルホ -ゥム塩を除くスルホ[0048] In the present invention, sulfo excluding the sulfo-um salt having the structure represented by the general formula (1).
-ゥム塩としては、特に制限はないが、前記一般式 (A)で表される構造を有するスル ホニゥム塩であることが好まし 、。 The -um salt is not particularly limited, but is preferably a sulfonium salt having the structure represented by the general formula (A).
[0049] 前記一般式 (A)にお 、て、 Ra、 Raは各々アルキル基または芳香族基を表し、 Z1 [0049] Te you, the general formula (A), Ra, Ra each represents an alkyl group or an aromatic group, Z 1
1 2  1 2
は酸素原子または硫黄原子を表し、 Ra、 Raは各々アルキル基、芳香族基、アルコ  Represents an oxygen atom or a sulfur atom, and Ra and Ra are an alkyl group, aromatic group,
3 4  3 4
キシ基、ァリールォキシ基、アルキルチオ基またはァリールチオ基を表し、 mlは 0〜 4の整数を表し、 nl及び piは各々 1〜5の整数を表し、 Yは、 Z—SO (Zは C F (n  Represents an oxy group, an aryloxy group, an alkylthio group, or an allylthio group, ml represents an integer of 0 to 4, nl and pi each represent an integer of 1 to 5, Y represents Z—SO (Z represents C F (n
3 n 2n+l は 1〜: L0の整数)、アルキル基、またはアルキル置換もしくは無置換の芳香族基を表 す)、 PF、: BF、 AsF、 SbF、: B (C F )、 CIO、 Br、 CIまたは Iを表す。  3 n 2n + l represents an integer of 1 to: L0), an alkyl group, or an alkyl-substituted or unsubstituted aromatic group), PF, BF, AsF, SbF, B (CF), CIO, Br , CI or I.
6 4 6 6 6 5 4 4  6 4 6 6 6 5 4 4
[0050] アルキル基としては、直鎖でも分岐を有していても環状になっていてもよぐ例えば 、メチル基、ェチル基、プロピル基、イソプロピル基、 tert—ブチル基、ペンチル基、 へキシル基、ォクチル基、ドデシル基、トリデシル基、テトラデシル基、ペンタデシル 基、シクロペンチル基、シクロへキシル基等が挙げられる。 [0051] 芳香族基としては、芳香族炭化水素環基でも芳香族複素環基でもよぐ縮合環を 有していてもよぐ例えば、芳香族炭化水素基 (例えば、フ ニル基、ナフチル基等) 、芳香族複素環基 (例えば、フリル基、チェニル基、ピリジル基、ピリダジル基、ピリミ ジル基、ビラジル基、トリアジル基、イミダゾリル基、ピラゾリル基、チアゾリル基、ベン ゾイミダゾリル基、ベンゾォキサゾリル基、キナゾリル基、フタラジル基等)等が挙げら れる。 [0050] The alkyl group may be linear, branched or cyclic. For example, a methyl group, an ethyl group, a propyl group, an isopropyl group, a tert-butyl group, a pentyl group, a hexyl group. Group, octyl group, dodecyl group, tridecyl group, tetradecyl group, pentadecyl group, cyclopentyl group, cyclohexyl group and the like. [0051] The aromatic group may have a condensed ring which may be an aromatic hydrocarbon ring group or an aromatic heterocyclic group. For example, an aromatic hydrocarbon group (for example, a phenyl group, a naphthyl group) Etc.), an aromatic heterocyclic group (for example, furyl group, chenyl group, pyridyl group, pyridazyl group, pyrimidyl group, birazyl group, triazyl group, imidazolyl group, pyrazolyl group, thiazolyl group, benzoimidazolyl group, benzoxa Zolyl group, quinazolyl group, phthalazyl group, etc.).
[0052] 上述したアルキル基または芳香族基は、さらに置換基を有していていもよぐこれら の置換基は複数が互いに結合して環を形成して ヽてもよく、縮合環を有して ヽてもよ い。該置換基の例としては、上述したアルキル基の他に、ァルケ-ル基 (例えば、ビ [0052] The above-mentioned alkyl group or aromatic group may further have a substituent, and these substituents may be bonded to each other to form a ring, and have a condensed ring. You can ask. Examples of the substituent include an alkyl group (for example, a bialkyl group) in addition to the alkyl group described above.
-ル基、ァリル基等)、アルキ-ル基 (例えば、ェチュル基、プロパルギル基等)、芳 香族炭化水素基 (例えば、フ ニル基、ナフチル基等)、複素芳香族基 (例えば、フリ ル基、チェニル基、ピリジル基、ピリダジル基、ピリミジル基、ビラジル基、トリアジル基-Alkyl groups, aryl groups, etc.), alkyl groups (eg, ethur groups, propargyl groups, etc.), aromatic hydrocarbon groups (eg, phenyl groups, naphthyl groups, etc.), heteroaromatic groups (eg, free radicals). Group, chenyl group, pyridyl group, pyridazyl group, pyrimidyl group, birazyl group, triazyl group
、イミダゾリル基、ピラゾリル基、チアゾリル基、ベンゾイミダゾリル基、ベンゾォキサゾリ ル基、キナゾリル基、フタラジル基等)、ヘテロ環基 (例えば、ピロリジル基、イミダゾリ ジル基、モルホリル基、ォキサゾリジル基等)、アルコキシ基 (例えば、メトキシ基、エト キシ基、プロピルォキシ基、ペンチルォキシ基、へキシルォキシ基、ォクチルォキシ 基、ドデシルォキシ基等)、シクロアルコキシ基 (例えば、シクロペンチルォキシ基、シ クロへキシルォキシ基等)、ァリールォキシ基 (例えば、フエノキシ基、ナフチルォキシ 基等)、アルキルチオ基 (例えば、メチルチオ基、ェチルチオ基、プロピルチオ基、ぺ ンチルチオ基、へキシルチオ基、ォクチルチオ基、ドデシルチオ基等)、シクロアルキ ルチオ基 (例えば、シクロペンチルチオ基、シクロへキシルチオ基等)、ァリールチオ 基 (例えば、フエ二ルチオ基、ナフチルチオ基等)、アルコキシカルボ-ル基 (例えば 、メチルォキシカルボ-ル基、ェチルォキシカルボ-ル基、ブチルォキシカルボ-ル 基、ォクチルォキシカルボニル基、ドデシルォキシカルボニル基等)、ァリールォキシ カルボ-ル基(例えば、フエ-ルォキシカルボ-ル基、ナフチルォキシカルボ-ル基 等)、スルファモイル基(例えば、アミノスルホ -ル基、メチルアミノスルホ -ル基、ジメ チルアミノスルホ -ル基、ブチルアミノスルホ -ル基、へキシルアミノスルホ -ル基、シ クロへキシルアミノスルホ -ル基、ォクチルアミノスルホ -ル基、ドデシルアミノスルホ -ル基、フエ-ルアミノスルホ -ル基、ナフチルアミノスルホ -ル基、 2—ピリジルァミノ スルホ -ル基等)、ァシル基(例えば、ァセチル基、ェチルカルボ-ル基、プロピル力 ルボニル基、ペンチルカルボ-ル基、シクロへキシルカルボ-ル基、ォクチルカルボ ニル基、 2—ェチルへキシルカルボ-ル基、ドデシルカルポ-ル基、フエ-ルカルボ -ル基、ナフチルカルボ-ル基、ピリジルカルボニル基等)、ァシルォキシ基 (例えば 、ァセチルォキシ基、ェチルカルボ-ルォキシ基、ブチルカルボ-ルォキシ基、オタ チルカルボ-ルォキシ基、ドデシルカルポ-ルォキシ基、フエ-ルカルポ-ルォキシ 基等)、アミド基 (例えば、メチルカルボ-ルァミノ基、ェチルカルボ-ルァミノ基、ジメ チルカルボ-ルァミノ基、プロピルカルボ-ルァミノ基、ペンチルカルボ-ルァミノ基、 シクロへキシルカルボ-ルァミノ基、 2—ェチルへキシルカルボ-ルァミノ基、ォクチ ルカルボ-ルァミノ基、ドデシルカルボ-ルァミノ基、フエ-ルカルポ-ルァミノ基、ナ フチルカルボニルァミノ基等)、力ルバモイル基 (例えば、ァミノカルボニル基、メチル ァミノカルボ-ル基、ジメチルァミノカルボ-ル基、プロピルアミノカルボ-ル基、ペン チルァミノカルボ-ル基、シクロへキシルァミノカルボ-ル基、ォクチルァミノカルボ- ル基、 2—ェチルへキシルァミノカルボ-ル基、ドデシルァミノカルボ-ル基、フエ- ルァミノカルボ-ル基、ナフチルァミノカルボ-ル基、 2—ピリジルァミノカルボ-ル基 等)、ウレイド基 (例えば、メチルウレイド基、ェチルウレイド基、ペンチルゥレイド基、シ クロへキシルウレイド基、ォクチルゥレイド基、ドデシルウレイド基、フエニルウレイド基 、ナフチルウレイド基、 2—ピリジルアミノウレイド基等)、スルフィエル基 (例えば、メチ ルスルフィ-ル基、ェチルスルフィ-ル基、ブチルスルフィ-ル基、シクロへキシルス ルフィ-ル基、 2—ェチルへキシルスルフィ-ル基、ドデシルスルフィ-ル基、フエ- ルスルフィ-ル基、ナフチルスルフィ-ル基、 2—ピリジルスルフィエル基等)、アルキ ルスルホ -ル基(例えば、メチルスルホ -ル基、ェチルスルホ -ル基、ブチルスルホ -ル基、シクロへキシルスルホ -ル基、 2—ェチルへキシルスルホ -ル基、ドデシルス ルホ -ル基等)、ァリールスルホ -ル基(フエ-ルスルホ-ル基、ナフチルスルホ-ル 基、 2—ピリジルスルホ -ル基等)、アミノ基 (例えば、アミノ基、ェチルァミノ基、ジメチ ルァミノ基、ブチルァミノ基、シクロペンチルァミノ基、 2—ェチルへキシルァミノ基、ド デシルァミノ基、ァ-リノ基、ナフチルァミノ基、 2—ピリジルァミノ基等)、ハロゲン原 子 (例えば、フッ素原子、塩素原子、臭素原子等)、フッ化炭化水素基 (例えば、フル ォロメチル基、トリフルォロメチル基、ペンタフルォロェチル基、ペンタフルォロフエ- ル基等)、シァノ基、ニトロ基、ヒドロキシ基、メルカプト基、シリル基 (例えば、トリメチル シリル基、トリイソプロビルシリル基、トリフ -ルシリル基、フ -ルジェチルシリル基 等)等が挙げられる。これらの置換基は、上記の置換基によってさらに置換されてい てもよく、また、これらの置換基は複数が互いに結合して環を形成していてもよい。 , Imidazolyl group, pyrazolyl group, thiazolyl group, benzoimidazolyl group, benzoxazolyl group, quinazolyl group, phthalazyl group, etc.), heterocyclic group (for example, pyrrolidyl group, imidazolidyl group, morpholyl group, oxazolidyl group, etc.), alkoxy group (for example, , Methoxy group, ethoxy group, propyloxy group, pentyloxy group, hexyloxy group, octyloxy group, dodecyloxy group, etc.), cycloalkoxy group (for example, cyclopentyloxy group, cyclohexyloxy group, etc.), aryloxy group (for example, Phenoxy group, naphthyloxy group, etc.), alkylthio group (for example, methylthio group, ethylthio group, propylthio group, pentylthio group, hexylthio group, octylthio group, dodecylthio group, etc.), cycloalkylthio group (for example, cyclo Nylthio group, cyclohexylthio group, etc.), arylthio group (for example, phenylthio group, naphthylthio group, etc.), alkoxy carbo yl group (for example, methyloxy carbo yl group, eth oxy carbo yl group, Butyloxycarbonyl group, octyloxycarbonyl group, dodecyloxycarbonyl group, etc.), aryloxycarbonyl group (for example, phenylcarbol group, naphthyloxycarbonyl group, etc.), sulfamoyl group (For example, aminosulfol group, methylaminosulfol group, dimethylaminosulfol group, butylaminosulfol group, hexylaminosulfol group, cyclohexylaminosulfol group, octyl) Aminosulfo group, dodecylaminosulfo Group, phenylaminosulfol group, naphthylaminosulfol group, 2-pyridylaminosulfol group, etc.), acyl group (eg, acetyl group, ethylcarbonyl group, propyl group carbonyl group, pentylcarbonyl group) Group, cyclohexyl carbonyl group, octyl carbonyl group, 2-ethyl hexyl carbonyl group, dodecyl carbo ol group, phenyl carbo yl group, naphthyl carbo yl group, pyridyl carbonyl group, etc.), isyloxy group (for example, , Acetyloxy group, ethyl carbo-loxy group, butyl carbo-loxy group, octyl carbo-loxy group, dodecyl carbo-loxy group, phenyl carbo-loxy group, etc.), amide group (for example, methyl carbo-lamino group, ethyl carbo-lamino group, dimethyl group) Tyl carbolumino group, propyl carbolumino group, pentyl carbole Amino group, cyclohexyl carbolumino group, 2-ethyl hexyl carbolumino group, octyl carbolumino group, dodecyl carbolumino group, phenyl carbolumino group, naphthyl carbonylamino group, etc.) Groups (e.g., aminocarbonyl group, methylaminocarbol group, dimethylaminocarbol group, propylaminocarbol group, pentylaminocarboro group, cyclohexylaminocarboro group, octylamino) Carbon group, 2-ethylhexylaminocarbol group, dodecylaminocarbol group, phenolaminocarbol group, naphthylaminocarbole group, 2-pyridylaminocarbol group, etc. ), Ureido groups (for example, methylureido group, ethylureido group, pentylureido group, cyclohexylureido group, octylureido group). Group, dodecylureido group, phenylureido group, naphthylureido group, 2-pyridylaminoureido group, etc.), sulfier group (for example, methylsulfuryl group, ethylsulfuryl group, butylsulfuryl group, cyclohexylsulfuryl group) 2-ethylhexylsulfyl group, dodecylsulfyl group, phenylsulfyl group, naphthylsulfyl group, 2-pyridylsulfyl group, etc.), alkylsulfol group (for example, methylsulfo- group) Group, ethylsulfol group, butylsulfol group, cyclohexylsulfol group, 2-ethylhexylsulfol group, dodecylsulfol group, etc.), arylsulfol group (phenylsulfol group, naphthyl) Sulfo group, 2-pyridyl sulfo group, etc.), amino group (eg, amino group, ethylamino group, dimethylamino group) Groups, butyramino groups, cyclopentylamino groups, 2-ethylhexylamino groups, dodecylamino groups, arlino groups, naphthylamino groups, 2-pyridylamino groups, etc.), halogen sources (For example, fluorine atom, chlorine atom, bromine atom, etc.), fluorinated hydrocarbon group (for example, fluoromethyl group, trifluoromethyl group, pentafluoroethyl group, pentafluorophenyl group, etc.) , A cyano group, a nitro group, a hydroxy group, a mercapto group, a silyl group (for example, a trimethylsilyl group, a triisopropyl silyl group, a tributylsilyl group, a fluorethylsilyl group, etc.). These substituents may be further substituted with the above substituents, and a plurality of these substituents may be bonded to each other to form a ring.
[0053] Ra、 Raで表されるアルキル基または芳香族基は、さらに置換基を有して ヽても有 [0053] The alkyl group or aromatic group represented by Ra or Ra may further have a substituent.
1 2  1 2
していなくてもよいが、好ましくは、無置換のアルキル基または芳香族基である力、ま たはハロゲン原子が置換したアルキル基またはアルコキシ基が置換した芳香族基で あり、より好ましくは、無置換のアルキル基または芳香族基である力 またはフッ素原 子が置換したアルキル基、またはアルコキシ基が置換した芳香族基であり、フッ素原 子が置換したアルキル基の例としてはフルォロメチル基、トリフルォロメチル基、ペン タフルォロェチル基、ペンタフルォロフエ-ル基等を挙げることができる。  May be an unsubstituted alkyl group or an aromatic group, or an aromatic group substituted by an alkyl group or an alkoxy group substituted with a halogen atom, more preferably Examples of an alkyl group substituted with an alkyl group substituted with an alkyl group substituted with an alkyl group or an aromatic group, or an aromatic group substituted with an alkoxy group, such as a fluoromethyl group or a trifluoromethyl group. Examples thereof include a fluoromethyl group, a pentafluoroethyl group, and a pentafluorophenyl group.
[0054] Z1は酸素原子または硫黄原子を表し、 Z1はスルホ -ゥムイオンが結合したベンゼン 環に対して、オルト位またはパラ位に結合することが好ましぐパラ位で結合すること 力 り好ましい。 [0054] Z 1 represents an oxygen atom or a sulfur atom, and Z 1 binds to a benzene ring to which a sulfonium ion is bonded at the para position, preferably bonded to the ortho or para position. preferable.
[0055] Ra、 Raは各々アルキル基、芳香族基、アルコキシ基、ァリールォキシ基、アルキ  [0055] Ra and Ra are an alkyl group, an aromatic group, an alkoxy group, an aryloxy group, an alkyl group, respectively.
3 4  3 4
ルチオ基、ァリールチオ基を表す。  Represents a ruthio group and an arylthio group.
[0056] アルキル基、芳香族基としては、上述した Ra、 Raと同義の基を表す。  [0056] The alkyl group and the aromatic group are groups having the same meanings as Ra and Ra described above.
1 2  1 2
[0057] アルコキシ基、該ァリールォキシ基としては、酸素原子に上述した Ra、 Raと同義  [0057] The alkoxy group and the aryloxy group have the same meanings as Ra and Ra described above for the oxygen atom.
1 2 の基が一箇所結合した基であり、例としてはアルコキシ基 (例えば、メトキシ基、ェトキ シ基、プロピルォキシ基、ペンチルォキシ基、へキシルォキシ基、ォクチルォキシ基、 ドデシルォキシ基、フルォロメチル基、トリフルォロメチル基、ペンタフルォロェチル基 、ペンタフルオロフェ-ル基等)、シクロアルコキシ基(例えば、シクロペンチルォキシ 基、シクロへキシルォキシ基等)、ァリールォキシ基 (例えば、フエノキシ基、ナフチル ォキシ基等)等が挙げられる。  1 is a group in which two groups are bonded at one position, and examples thereof include an alkoxy group (for example, methoxy group, ethoxy group, propyloxy group, pentyloxy group, hexyloxy group, octyloxy group, dodecyloxy group, fluoromethyl group, trifluoromethyl group) Methyl group, pentafluoroethyl group, pentafluorophenyl group, etc.), cycloalkoxy group (eg, cyclopentyloxy group, cyclohexyloxy group, etc.), aryloxy group (eg, phenoxy group, naphthyloxy group, etc.) Etc.
[0058] アルキルチオ基、ァリールチオ基としては、硫黄原子に上述した Ra、 Raと同義の  [0058] As the alkylthio group and the arylthio group, the sulfur atom has the same meaning as Ra and Ra described above.
1 2 基が一箇所結合した基であり、例としては、アルキルチオ基 (例えば、メチルチオ基、 ェチルチオ基、プロピルチオ基、ペンチルチオ基、へキシルチオ基、ォクチルチオ基 、ドデシルチオ基等)、シクロアルキルチオ基 (例えば、シクロペンチルチオ基、シクロ へキシルチオ基等)、ァリールチオ基 (例えば、フエ-ルチオ基、ナフチルチオ基等) 等が挙げられる。上述した芳香族基、ァリールォキシ基、ァリールチオ基は縮合環を 有していてもよい。 1 2 is a group in which one group is bonded, and examples thereof include an alkylthio group (for example, a methylthio group, Ethylthio group, propylthio group, pentylthio group, hexylthio group, octylthio group, dodecylthio group, etc., cycloalkylthio group (eg, cyclopentylthio group, cyclohexylthio group, etc.), arylthio group (eg, phenylthio group, naphthylthio group, etc.) Etc.) and the like. The above-mentioned aromatic group, aryloxy group, and arylothio group may have a condensed ring.
[0059] 上述したアルキル基、芳香族基、アルコキシ基、ァリールォキシ基、アルキルチオ 基、ァリールチオ基はさらに置換基を有していていもよぐこれらの置換基は複数が 互いに結合して環を形成していてもよぐ縮合環を有していてもよい。該置換基の例 としては、上述した Raの置換基の例と同義の基を挙げることができ、これらの置換基  [0059] The above-mentioned alkyl group, aromatic group, alkoxy group, aryloxy group, alkylthio group, and arylothio group may further have a substituent. A plurality of these substituents are bonded to each other to form a ring. It may have a condensed ring. Examples of the substituent include the same groups as the examples of the substituent for Ra described above.
1  1
は、さらに置換基によって置換されていてもよぐまた、これらの置換基は複数が互い に結合して環を形成していてもよい。 Ra、 Raで表されるアルキル基、芳香族基、ァ  May be further substituted with a substituent, and a plurality of these substituents may be bonded to each other to form a ring. Ra, an alkyl group represented by Ra, an aromatic group,
3 4  3 4
ルコキシ基、ァリールォキシ基、アルキルチオ基、ァリールチオ基はさらに置換基を 有していても、有していなくてもよいが、好ましくは無置換のアルキル基、芳香族基、 アルコキシ基、ァリールォキシ基、アルキルチオ基、ァリールチオ基であるか、または ノ、ロゲン原子が置換したアルキル基、またはアルコキシ基が置換した芳香族基であり 、より好ましくは、無置換のアルキル基、芳香族基、アルコキシ基、ァリールォキシ基 、アルキルチオ基、ァリールチオ基であるか、またはフッ素原子が置換したアルキル 基、またはアルコキシ基が置換した芳香族基であり、フッ素原子が置換したアルキル 基の例としてはフルォロメチル基、トリフルォロメチル基、ペンタフルォロェチル基、ぺ ンタフルオロフェニル基等を挙げることができる。  The alkoxy group, aryloxy group, alkylthio group, and arylothio group may or may not further have a substituent, but preferably an unsubstituted alkyl group, aromatic group, alkoxy group, aryloxy group, alkylthio group. A group, an arylthio group, or an alkyl group substituted with a rogen atom, or an aromatic group substituted with an alkoxy group, more preferably an unsubstituted alkyl group, aromatic group, alkoxy group, aryloxy group An alkylthio group, an arylthio group, an alkyl group substituted with a fluorine atom, or an aromatic group substituted with an alkoxy group. Examples of the alkyl group substituted with a fluorine atom include a fluoromethyl group and a trifluoromethyl group. , Pentafluoroethyl group, pentafluorophenyl group, etc. That.
[0060] mlは 0〜4の整数を表し、好ましく 0〜3の整数であり、より好ましくは 0〜2の整数で あり、 nl及び piは各々 1〜5の整数を表し、各々好ましくは 1〜3の整数であり、より 好ましくは各々 1〜 2の整数である。  [0060] ml represents an integer of 0 to 4, preferably an integer of 0 to 3, more preferably an integer of 0 to 2, and nl and pi each represent an integer of 1 to 5, preferably 1 Is an integer of -3, more preferably an integer of 1-2.
[0061] 複数個の Ra、 Ra、 Raは、各々同じでも異なってもよぐ Raと Raあるいは複数個  [0061] A plurality of Ra, Ra and Ra may be the same or different from each other.
2 3 4 1 2  2 3 4 1 2
の Ra同士が結合して環を形成してもよぐ Raと Raあるいは複数個の Ra同士が結 Ras may combine to form a ring Ra and Ra or multiple Ras
2 2 3 3 合して環を形成してもよぐ Raと Raあるいは複数個の Ra同士が結合して環を形成 2 2 3 3 Combined to form a ring Ra and Ra or multiple Ras combine to form a ring
2 4 4  2 4 4
してもよく、 Raと Raが結合して環を形成してもよい。 Raの少なくとも一つはスルホ二  Alternatively, Ra and Ra may combine to form a ring. At least one of Ra is sulfoni
2 4 3  2 4 3
ゥムイオンが結合したベンゼン環に対して、オルト位またはパラ位に結合することが好 ましぐパラ位で結合することがより好ましい。 Raの少なくとも一つはスルホユウムィォ It is preferable to bond to the ortho or para position with respect to the benzene ring to which the muon ion is bonded. It is more preferable to bond at the para position. At least one of Ra is sulfoyuumio
4  Four
ンが結合したベンゼン環に対して、オルト位またはパラ位に結合することが好ましぐ ノ ラ位で結合することがより好まし ヽ。  It is preferable to bond at the ortho or para position to the benzene ring to which the bond is bonded. It is more preferable to bond at the normal position.
[0062] Yは、 Z-SO (Zは C F (nは 1〜10の整数)、アルキル基、またはアルキル置換 [0062] Y is Z-SO (Z is C F (n is an integer of 1 to 10), an alkyl group, or alkyl-substituted.
3 n 2n+l  3 n 2n + l
もしくは無置換の芳香族基を表す)、 PF、 BF、 AsF、 SbF、 B (C F ) 、 CIO、 Brゝ  Or represents an unsubstituted aromatic group), PF, BF, AsF, SbF, B (C F), CIO, Br ゝ
6 4 6 6 6 5 4 4 6 4 6 6 6 5 4 4
Cほたは Iを表す力 好ましくは、 PF、 CF SO、 BF、 AsF、 B (C F )、である。 C is a force representing I. Preferably, PF, CFSO, BF, AsF, and B (C F).
6 3 3 4 6 6 5 4  6 3 3 4 6 6 5 4
[0063] 本発明に係る一般式 (A)で表されるスルホユウム塩ィ匕合物としては、更には本発明 に係る前記一般式 (B)〜 (D)で表される化合物が好ましく、特に一般式 (B)で表され る化合物が好ましい。  [0063] The sulfoyuium salt compound represented by the general formula (A) according to the present invention is more preferably a compound represented by the general formulas (B) to (D) according to the present invention, A compound represented by formula (B) is preferred.
[0064] (一般式 (B)で表される化合物)  [0064] (Compound represented by formula (B))
前記一般式 (B)において、 R は炭素数 1〜10のアルキル基を表す。アルキル基は  In the general formula (B), R 1 represents an alkyl group having 1 to 10 carbon atoms. Alkyl group is
31  31
直鎖でも分岐を有していても、環状になっていてもよぐ例としてはメチル基、ェチル 基、プロピル基、イソプロピル基、 tert—ブチル基、ペンチル基、へキシル基、へプチ ル基、ォクチル基、 tert—ァミル基、シクロペンチル基、シクロへキシル基等が挙げら れ、これらはさらに置換基を有していてもよい。置換基の例としては、上述した一般式 (A)における Raの置換基と同義の基である。 R は好ましくは炭素数 1〜6のアルキ  Examples that may be linear, branched, or cyclic include methyl, ethyl, propyl, isopropyl, tert-butyl, pentyl, hexyl, and heptyl groups. Octyl group, tert-amyl group, cyclopentyl group, cyclohexyl group and the like, and these may further have a substituent. Examples of the substituent are groups having the same meaning as the Ra substituent in the general formula (A) described above. R is preferably an alkyl having 1 to 6 carbon atoms.
1 31  1 31
ル基であり、より好ましくは炭素数 1〜4のアルキル基である。  More preferably an alkyl group having 1 to 4 carbon atoms.
[0065] R 、R は各々炭素数 1〜10のアルキル基または炭素数 1〜10のアルコキシ基を [0065] R 1 and R 2 each represents an alkyl group having 1 to 10 carbon atoms or an alkoxy group having 1 to 10 carbon atoms.
32 33  32 33
表す。アルキル基は上述した R と同義の基であり、アルコキシ基は、酸素原子に上  To express. The alkyl group is the same as R described above, and the alkoxy group is above the oxygen atom.
31  31
述した R と同義の基が一箇所結合した基であり、例としてはメトキシ基、エトキシ基、 The group having the same meaning as R described above is a group bonded at one position, and examples include a methoxy group, an ethoxy group,
31 31
プロピルォキシ基、イソプロピルォキシ基、 tert—ブチルォキシ基、ペンチルォキシ 基、へキシルォキシ基、ヘプチルォキシ基、ォクチルォキシ基、シクロペンチルォキ シ基、シクロへキシルォキシ基等を挙げることができる。 R 、R は、各々好ましくは炭  Examples thereof include a propyloxy group, an isopropyloxy group, a tert-butyloxy group, a pentyloxy group, a hexyloxy group, a heptyloxy group, an octyloxy group, a cyclopentyloxy group, and a cyclohexyloxy group. R 1 and R 2 are each preferably charcoal
32 33  32 33
素数 1〜6のアルキル基または炭素数 1〜6のアルコキシ基であり、より好ましくは炭 素数 1〜4のアルキル基または炭素数 1〜4のアルコキシ基であり、最も好ましくはメ チル基またはメトキシ基である。 Yは上述した一般式 (A)における Yと同義である。  A C1-C6 alkyl group or C1-C6 alkoxy group, more preferably a C1-C4 alkyl group or C1-C4 alkoxy group, and most preferably a methyl group or methoxy group. It is a group. Y is synonymous with Y in the general formula (A) described above.
3  Three
[0066] (一般式 (C)で表される化合物)  [0066] (Compound represented by formula (C))
一般式(C)において、 R は炭素数 1〜10のアルキル基を表す。アルキル基として は、直鎖でも分岐を有していても、環状になっていてもよぐ例としてはメチル基、ェ チル基、プロピル基、イソプロピル基、 tert—ブチル基、ペンチル基、へキシル基、へ プチル基、ォクチル基、 tert—ァミル基、シクロペンチル基、シクロへキシル基等が挙 げられ、これらはさらに置換基を有していてもよい。置換基の例としては、上述した一 般式 (A)における Raの置換基と同義の基である。 R は好ましくは炭素数 1〜6のァ In the general formula (C), R 1 represents an alkyl group having 1 to 10 carbon atoms. As an alkyl group Examples of straight-chain, branched, or cyclic examples include methyl, ethyl, propyl, isopropyl, tert-butyl, pentyl, hexyl, and Examples include a butyl group, an octyl group, a tert-amyl group, a cyclopentyl group, a cyclohexyl group, and the like, which may further have a substituent. An example of the substituent is a group having the same meaning as the Ra substituent in the general formula (A) described above. R preferably has 1 to 6 carbon atoms.
1 41  1 41
ルキル基であり、より好ましくは炭素数 1〜4のアルキル基であり、最も好ましくはメチ ル基である。  An alkyl group, more preferably an alkyl group having 1 to 4 carbon atoms, and most preferably a methyl group.
[0067] R は置換基を表し、該置換基としては上述した一般式 (A)における Raの置換基と  [0067] R represents a substituent, and examples of the substituent include the Ra substituent in the general formula (A) described above.
42 1 同義の基である。  42 1 Synonymous group.
[0068] m4は 0〜4の整数を表し、好ましくは 0〜2の整数であり、より好ましくは 0力 1である [0069] R 、R は各々炭素数 1〜10のアルキル基を表す。アルキル基としては、上述した  [0068] m4 represents an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 0 force 1. [0069] R 1 and R 2 each represents an alkyl group having 1 to 10 carbon atoms. As the alkyl group,
43 44  43 44
R と同義の基である。 R 、R は各々好ましくは炭素数 1〜6のアルキル基であり、よ R is synonymous with R. R 1 and R 2 are each preferably an alkyl group having 1 to 6 carbon atoms,
31 43 44 31 43 44
り好ましくは炭素数 1〜4のアルキル基であり、最も好ましくはメチル基である。 Yは上  More preferred is an alkyl group having 1 to 4 carbon atoms, and most preferred is a methyl group. Y is above
4 述した一般式 (A)における Yと同義である。  4 Synonymous with Y in formula (A).
[0070] (一般式 (D)で表される化合物) [0070] (Compound represented by formula (D))
一般式 (D)において、 R は水素原子または炭素数 1〜: LOのアルキル基を表す。了  In the general formula (D), R 1 represents a hydrogen atom or an alkyl group having 1 to: LO. Finished
51  51
ルキル基としては、上述した R の置換基と同義の基である。 R は好ましくは水素原  The alkyl group is the same as the substituent for R described above. R is preferably a hydrogen atom
31 51  31 51
子または炭素数 1〜6のアルキル基であり、より好ましくは水素原子または炭素数 1〜 4のアルキル基である。  Or an alkyl group having 1 to 6 carbon atoms, more preferably a hydrogen atom or an alkyl group having 1 to 4 carbon atoms.
[0071] R は置換基を表す。置換基としては上述した一般式 (A)における Raの置換基と  [0071] R represents a substituent. As the substituent, the substituent of Ra in the general formula (A) described above and
52 1 同義の基である。  52 1 Synonymous group.
[0072] m5は 0〜4の整数を表し、好ましくは 0〜2の整数であり、より好ましくは 0か 1である  [0072] m5 represents an integer of 0 to 4, preferably an integer of 0 to 2, more preferably 0 or 1.
R 、R は各々炭素数 1〜10のアルキル基を表す。アルキル基としては、上述したR 1 and R 2 each represent an alkyl group having 1 to 10 carbon atoms. As the alkyl group,
53 54 53 54
R と同義の基である。 R 、R は各々好ましくは炭素数 1〜6のアルキル基であり、よ R is synonymous with R. R 1 and R 2 are each preferably an alkyl group having 1 to 6 carbon atoms,
31 53 54 31 53 54
り好ましくは炭素数 1〜4のアルキル基であり、最も好ましくはメチル基である。 Yは上  More preferred is an alkyl group having 1 to 4 carbon atoms, and most preferred is a methyl group. Y is above
5 述した一般式 (A)における Yと同義である。 [0074] 以下に、本発明に係る前記一般式 (A)〜(D)で表されるトリアリールスルホニゥム 塩ィ匕合物の具体例を示すが、本発明はこれらに限定されるものではない。 5 It is synonymous with Y in the general formula (A) described above. [0074] Specific examples of the triarylsulfonium salt compound represented by the general formulas (A) to (D) according to the present invention are shown below, but the present invention is not limited thereto. is not.
[0075] [化 10] [0075] [Chemical 10]
One
 One
一 一 , One
Figure imgf000019_0001
Figure imgf000019_0001
。 y  . y
Figure imgf000019_0002
Figure imgf000019_0002
[0076] [化 11] [0076] [Chemical 11]
Figure imgf000020_0001
Figure imgf000020_0001
[0078] [化 13] [0078] [Chemical 13]
Figure imgf000021_0001
Figure imgf000021_0001
[0079] これらのィ匕合物は、 Bull. Chem. Soc. Jpn. , 42, 312 (1969) .、J. Polym. Sci . , Poly. m. Chem. Ed. , 17, 2877 (1979) .、特開平 11— 80118号、特開 200 2— 241474号、特開 2005— 139425号、米国特許第 4404459号記載の方法に 準じて合成することができる。  [0079] These compounds are described in Bull. Chem. Soc. Jpn., 42, 312 (1969)., J. Polym. Sci., Poly. M. Chem. Ed., 17, 2877 (1979). The compounds can be synthesized according to the methods described in JP-A-11-80118, JP-A-2002-241474, JP-A-2005-139425, and US Pat. No. 4,440,459.
[0080] (多環芳香族化合物、力ルバゾール誘導体及びチォキサントン誘導体)  [0080] (Polycyclic aromatic compounds, strong rubazole derivatives and thixanthone derivatives)
本発明の光酸発生剤組成物においては、上記説明した光酸発生剤と共に、多環 芳香族化合物、力ルバゾール誘導体及びチォキサントン誘導体から選ばれる少なく とも 1種の化合物を含有することが好ましぐ更には、アントラセン、フルオレン、ピレン 、タリセン、フエナントレン、アントラキノン、ペリレン、カルバゾール、フエノチアジン、 チォキサントン、チアントレン、ベンズアントラセン、ナフタセン、トリフエ二レン及び下 記一般式(3)から選ばれる少なくとも 1つの化合物を含有することが好ましい。  The photoacid generator composition of the present invention preferably contains at least one compound selected from a polycyclic aromatic compound, a strong rubazole derivative and a thixanthone derivative together with the photoacid generator described above. Furthermore, anthracene, fluorene, pyrene, thalene, phenanthrene, anthraquinone, perylene, carbazole, phenothiazine, thixanthone, thianthrene, benzanthracene, naphthacene, triphenylene, and at least one compound selected from the following general formula (3) are contained. It is preferable to do.
[0081] 本発明で用いることのできる多環芳香族化合物としては、ナフタレン誘導体、アント ラセン誘導体、タリセン誘導体、フエナントレン誘導体が好ましい。置換基であるアル コキシ基としては、炭素数 1〜18のものが好ましぐ特に炭素数 1〜8のものが好まし い。ァラルキルォキシ基としては、炭素数 7〜10のものが好ましぐ特に炭素数 7〜8 のべンジルォキシ基、フエネチルォキシ基が好まし 、。 [0081] The polycyclic aromatic compound that can be used in the present invention is preferably a naphthalene derivative, anthracene derivative, a taricene derivative, or a phenanthrene derivative. Substituent al As the alkoxy group, those having 1 to 18 carbon atoms are preferred, and those having 1 to 8 carbon atoms are particularly preferred. As the aralkyloxy group, those having 7 to 10 carbon atoms are preferable, and in particular, a benzyloxy group and phenethyloxy group having 7 to 8 carbon atoms are preferable.
具体的には、 1—ナフトール、 2 ナフトール、 1—メトキシナフタレン、 1—ステアリ ルォキシナフタレン、 2—メトキシナフタレン、 2 ドデシルォキシナフタレン、 4ーメト キシ 1 ナフトール、グリシジルー 1 ナフチルエーテル、 2—(2—ナフトキシ)ェチ ルビニルエーテル、 1 , 4ージヒドロキシナフタレン、 1 , 5 ジヒドロキシナフタレン、 1 , 6 ジヒドロキシナフタレン、 2, 7 ジヒドロキシナフタレン、 2, 7 ジメトキシナフタレ ン、 1 , 1' ーチォビス(2 ナフトール)、 1 , 1' ビー 2 ナフトール、 1 , 5 ナフチ ルジグリシジルエーテル、 2, 7 ジ(2 ビュルォキシェチル)ナフチルエーテル、 4 —メトキシ— 1 ナフトール、 ESN— 175 (新日鉄化学社製のエポキシ榭脂)または そのシリーズ、ナフトール誘導体とホルマリンとの縮合体等のナフタレン誘導体、 9, 1 0 ジメトキシアントラセン、 2 ェチルー 9, 10 ジメトキシアントラセン、 2—tブチル - 9, 10 ジメトキシアントラセン、 2, 3 ジメチノレー 9, 10 ジメトキシアントラセン、 9ーメトキシ 10—メチルアントラセン、 9, 10 ジェトキシアントラセン、 2 ェチルー 9, 10 ジェトキシアントラセン、 2 tブチルー 9, 10 ジェトキシアントラセン、 2, 3 ジメチルー 9, 10 ジェトキシアントラセン、 9 エトキシ 10—メチルアントラセン 、 9, 10 ジプロポキシアントラセン、 2 ェチルー 9, 10 ジプロポキシアントラセン 、 2 tブチノレ 9, 10 ジプロポキシアントラセン、 2, 3 ジメチノレー 9, 10 ジプロ ポキシアントラセン、 9 イソプロポキシ 10—メチルアントラセン、 9, 10 ジベンジ ルォキシアントラセン、 2 ェチルー 9, 10 ジベンジルォキシアントラセン、 2—tブ チルー 9, 10 ジベンジルォキシアントラセン、 2, 3 ジメチルー 9, 10 ジベンジ ルォキシアントラセン、 9一べンジルォキシ 10—メチルアントラセン、 9, 10 ジー a メチルベンジルォキシアントラセン、 2 ェチルー 9, 10 ジー α メチルベン ジルォキシアントラセン、 2—tブチルー 9, 10 ジー at メチルベンジルォキシアン トラセン、 2, 3 ジメチルー 9, 10 ジー at メチルベンジルォキシアントラセン、 9 ( a—メチルベンジルォキシ) 10—メチルアントラセン、 9, 10 ジ(2 ヒドロキシェ トキシ)アントラセン、 2 ェチルー 9, 10 ジ(2 カルボキシエトキシ)アントラセン等 のアントラセン誘導体、 1, 4 ジメトキシクリセン、 1, 4 ジェトキシクリセン、 1, 4 ジ プロポキシタリセン、 1, 4ージベンジルォキシタリセン、 1, 4ージー at メチルベンジ ルォキシクリセン等のタリセン誘導体、 9 ヒドロキシフエナントレン、 9, 10 ジメトキ シフエナントレン、 9, 10 ジエトキシフエナントレン等のフエナントレン誘導体などを 挙げることができる。これら誘導体の中でも、特に、炭素数 1〜4のアルキル基を置換 基として有していても良い 9, 10 ジアルコキシアントラセン誘導体が好ましぐアルコ キシ基としてはメトキシ基、エトキシ基が好ましい。 Specifically, 1-naphthol, 2 naphthol, 1-methoxynaphthalene, 1-stearyloxynaphthalene, 2-methoxynaphthalene, 2 dodecyloxynaphthalene, 4-methoxy 1 naphthol, glycidyl 1 naphthyl ether, 2- (2 —Naphthoxy) ethyl vinyl ether, 1,4-dihydroxynaphthalene, 1,5 dihydroxynaphthalene, 1,6 dihydroxynaphthalene, 2,7 dihydroxynaphthalene, 2,7 dimethoxynaphthalene, 1,1′-thiobis (2 naphthol) 1, 1'B 2 naphthol, 1,5 naphthyl diglycidyl ether, 2,7 di (2 buroxetyl) naphthyl ether, 4-methoxy-1-naphthol, ESN-175 (Epoxy cage made by Nippon Steel Chemical Co., Ltd.) Naphthalenes such as condensates of naphthol derivatives and formalin Derivatives 9, 10, 10 Dimethoxyanthracene, 2 Ethyl-9,10 Dimethoxyanthracene, 2-tbutyl-9,10 Dimethoxyanthracene, 2,3 Dimethynole 9,10 Dimethoxyanthracene, 9-methoxy 10-Methylanthracene, 9,10 Toxianthracene, 2 ethyl 9,10 Jetoxyanthracene, 2 tButyl 9,10 Jetoxyanthracene, 2,3 Dimethyl 9,10 Jetoxyanthracene, 9 Ethoxy 10-methylanthracene, 9, 10 Dipropoxyanthracene, 2 Ethyl 9 , 10 Dipropoxyanthracene, 2 t Butinole 9, 10 Dipropoxyanthracene, 2, 3 Dimethylolene 9, 10 Dipropoxyanthracene, 9 Isopropoxy 10-Methylanthracene, 9, 10 Dibenzyloxyanthracene, 2 Ethyl 9, 10 Dibenzyl Oxyanthracene, 2—t Butyl-9,10 Dibenzyloxyanthracene, 2,3 Dimethyl-9,10 Dibenzyloxyanthracene, 9-Benzyloxy 10-methylanthracene, 9,10 dia a Methylbenzyloxyanthracene, 2 ethyloxy 9,10 Methyl benzyl dioxyanthracene, 2-t-butyl-9,10 ee at methyl benzyloxy anthracene, 2, 3 dimethyl 9, 10 ee at methyl benzyloxy anthracene, 9 (a-methyl benzyloxy) 10-methyl anthracene 9, 10 di (2 hydroxyethoxy) anthracene, 2 ethyl 9,10 di (2 carboxyethoxy) anthracene, etc. Anthracene derivatives such as 1,4 dimethoxychrysene, 1,4 methoxychrysene, 1,4 dipropoxytalicene, 1,4-dibenzyloxytalicene, 1,4-di at methylbenziloxychrysene, etc., 9 hydroxy Examples thereof include phenanthrene derivatives such as phenanthrene, 9,10 dimethoxyphenanthrene, and 9,10 diethoxyphenanthrene. Among these derivatives, a methoxy group and an ethoxy group are particularly preferable as the alkoxy group preferred by the 9,10 dialkoxyanthracene derivative which may have an alkyl group having 1 to 4 carbon atoms as a substituent.
[0083] 力ルバゾール誘導体としては、例えば、 N—メチルカルバゾール、 N ェチルカル バゾール(以下、「NEC」という。)、 N プロピルカルバゾール、 N ブチルカルバゾ ール、 N—ビニルカルバゾール、 1, 3, 6, 8, 9 ペンタメチルカルバゾール、 1, 4, 5, 8, 9 ペンタメチルカルバゾール(以下、「NMPC」という。)、 3—ホルミル N— ェチルカルバゾール、 N—フエ二ルカルバゾール、 N ェチルー 3, 6—ビス(ベンゾ ィル)一力ルバゾール(以下、「NEBC」という。 )、 9, 9' ジェチルー 3, 3' —ジカ ルバゾール(以下、「NEDC」という。)等を挙げることができる。  [0083] Examples of strong rubazole derivatives include N-methylcarbazole, N-ethylcarbazole (hereinafter referred to as "NEC"), N-propylcarbazole, N-butylcarbazole, N-vinylcarbazole, 1, 3, 6, 8 , 9 Pentamethylcarbazole, 1, 4, 5, 8, 9 Pentamethylcarbazole (hereinafter referred to as “NMPC”), 3-formyl N-ethylcarbazole, N-phenylcarbazole, N-ethyl-3, 6— Bis (benzoyl) rubazole (hereinafter referred to as “NEBC”), 9, 9 ′ Jetyl 3, 3 ′ —dicarbazole (hereinafter referred to as “NEDC”), and the like.
[0084] また、チォキサントン誘導体としては、例えば、チォキサントン、 2, 4 ジメチルチオ キサントン、 2, 4 ジェチルチオキサントン、イソプロピルチオキサントン 2 クロロチ ォキサントン等を挙げることができる。  [0084] Examples of thixanthone derivatives include thixanthone, 2,4 dimethylthioxanthone, 2,4 jetylthioxanthone, isopropylthioxanthone 2 chlorothixanthone, and the like.
[0085] また、前記一般式(3)において、 R21〜R28は前記一般式(1)における Ri〜R17と同 義である。 [0085] In the general formula (3), R 21 to R 28 have the same meanings as Ri to R 17 in the general formula (1).
[0086] 《カチオン系光重合性組成物》  [0086] << Cationic Photopolymerizable Composition >>
本発明のカチオン系光重合性組成物にぉ ヽては、本発明の光酸発生剤組成物と 共に、カチオン重合性化合物を含有することを特徴とする。  The cationic photopolymerizable composition of the present invention is characterized by containing a cationic polymerizable compound together with the photoacid generator composition of the present invention.
[0087] (カチオン重合性化合物) [0087] (Cationically polymerizable compound)
本発明に係るカチオン重合性ィ匕合物としては、各種公知のカチオン重合性のモノ マーを適用することができる力 特に、特開平 6— 9714号、特開 2001— 31892号、 特開 2001— 40068号、特開 2001— 55507号、特開 2001— 310938号、特開 20 01— 310937号、特開 2001— 220526号に f列示されているエポキシィ匕合物、ビニ ルエーテルィ匕合物、ォキセタンィ匕合物が好ましい。 [0088] エポキシ化合物には、以下の芳香族エポキシド、脂環式エポキシド及び脂肪族ェ ポキシド等が挙げられる。 As the cationically polymerizable compound according to the present invention, various known cationically polymerizable monomers can be used. Particularly, JP-A-6-9714, JP-A-2001-31892, JP-A-2001- Epoxy compounds, vinyl ether compounds, and oxetanes shown in column f of 40068, JP 2001-55507, JP 2001-310938, JP 2001-310937, JP 2001-220526. A compound is preferred. [0088] Examples of the epoxy compound include the following aromatic epoxides, alicyclic epoxides, and aliphatic epoxides.
[0089] 芳香族エポキシドとして好ましいものは、少なくとも 1個の芳香族核を有する多価フ ェノール或いはそのアルキレンオキサイド付カ卩体とェピクロルヒドリンとの反応によつ て製造されるジ又はポリグリシジルエーテルであり、例えば、ビスフエノール A或いは そのアルキレンオキサイド付加体のジ又はポリグリシジルエーテル、水素添加ビスフ ェノール A或いはそのアルキレンオキサイド付カ卩体のジ又はポリグリシジルエーテル、 並びにノボラック型エポキシ榭脂等が挙げられる。ここでアルキレンオキサイドとして は、エチレンオキサイド及びプロピレンオキサイド等が挙げられる。  [0089] A preferable aromatic epoxide is a di- or diol produced by the reaction of a polyhydric phenol having at least one aromatic nucleus or an alkylene oxide-attached cage thereof and epichlorohydrin. Polyglycidyl ethers, such as di- or polyglycidyl ethers of bisphenol A or alkylene oxide adducts thereof, di- or polyglycidyl ethers of hydrogenated bisphenol A or alkylene oxide-attached bodies, and novolac type epoxy resins Etc. Here, examples of the alkylene oxide include ethylene oxide and propylene oxide.
[0090] 脂環式エポキシドとしては、少なくとも 1個のシクロへキセン又はシクロペンテン環等 のシクロアルカン環を有する化合物を、過酸化水素、過酸等の適当な酸化剤でェポ キシィ匕することによって得られる、シクロへキセンオキサイド又はシクロペンテンォキサ イド含有化合物が好ましい。  [0090] As the alicyclic epoxide, a compound having at least one cycloalkane ring such as cyclohexene or cyclopentene ring is epoxidized with an appropriate oxidizing agent such as hydrogen peroxide or peracid. The resulting cyclohexene oxide or cyclopentene oxide-containing compound is preferred.
[0091] 脂肪族エポキシドの好まし 、ものとしては、脂肪族多価アルコール或いはそのアル キレンオキサイド付加体のジ又はポリグリシジルエーテル等があり、その代表例として は、エチレングリコールのジグリシジルエーテル、プロピレングリコールのジグリシジル エーテル又は 1, 6—へキサンジオールのジグリシジルエーテル等のアルキレングリコ ールのジグリシジルエーテル、グリセリン或いはそのアルキレンオキサイド付カ卩体のジ 又はトリグリシジルエーテル等の多価アルコールのポリグリシジルエーテル、ポリェチ レングリコール或いはそのアルキレンオキサイド付カ卩体のジグリシジルエーテル、ポリ プロピレングリコール或いはそのアルキレンオキサイド付カ卩体のジグリシジルエーテ ル等のポリアルキレングリコールのジグリシジルエーテル等が挙げられる。ここでアル キレンオキサイドとしては、エチレンオキサイド及びプロピレンオキサイド等が挙げられ る。 [0091] Preferred aliphatic epoxides include aliphatic polyhydric alcohols or di- or polyglycidyl ethers of their alkylene oxide adducts, typical examples of which include diglycidyl ether of ethylene glycol, propylene Polyglycidyl of polyhydric alcohol such as diglycidyl ether of glycol or diglycidyl ether of alkylene glycol such as diglycidyl ether of 1,6-hexanediol, di- or triglycidyl ether of diglycidyl ether of glycerin or alkylene oxide thereof Of polyalkylene glycols such as diglycidyl ethers of ethers, polyethylene glycols or alkylene oxides thereof, and diglycidyl ethers of polyethylene glycols or alkylene oxides thereof. Glycidyl ether, and the like. Here, examples of the alkylene oxide include ethylene oxide and propylene oxide.
[0092] これらのエポキシドのうち、速硬化性を考慮すると、芳香族エポキシド及び脂環式ェ ポキシドが好ましぐ特に脂環式エポキシドが好ましい。本発明では、上記エポキシド の 1種を単独で使用してもよいが、 2種以上を適宜組み合わせて使用してもよい。  [0092] Among these epoxides, in view of fast curability, aromatic epoxides and alicyclic epoxides are preferred, and alicyclic epoxides are particularly preferred. In the present invention, one of the epoxides may be used alone, or two or more may be used in appropriate combination.
[0093] 本発明においては、脂環式エポキシ化合物としては、特開 2005— 139425号に記 載されて!、る一般式 (A)、 (I)〜 (VI)で表される化合物が好ま 、。 [0093] In the present invention, the alicyclic epoxy compound is described in JP-A-2005-139425. The compounds represented by the general formulas (A), (I) to (VI) are preferred.
[0094] 本発明に好ましく添加できるビュルエーテルィ匕合物としては、公知のビニルエーテ ル化合物を挙げることができる。例えば、エチレングリコールジビュルエーテル、ジェ チレングリコールジビニノレエーテル、トリエチレングリコールジビニノレエーテル、プロピ レングリコールジビニノレエーテル、ジプロピレングリコールジビニノレエーテル、ブタン ジオールジビニルエーテル、へキサンジオールジビニルエーテル、シクロへキサンジ メタノールジビニルエーテル、トリメチロールプロパントリビニルエーテル等のジ又はト リビュルエーテル化合物、ェチルビ-ルエーテル、 n—ブチルビ-ルエーテル、イソ ブチルビ-ルエーテル、ォクタデシルビ-ルエーテル、シクロへキシルビニルエーテ ノレ、ヒドロキシブチノレビニノレエーテノレ、 2—ェチノレへキシノレビニノレエーテノレ、シクロへ キサンジメタノールモノビニルエーテル、 n—プロピルビニルエーテル、イソプロピルビ -ルエーテル、イソプロぺ-ルエーテル o プロピレンカーボネート、ドデシルビ- ルエーテル、ジエチレングリコールモノビュルエーテル、ォクタデシルビ-ルエーテ ル等のモノビュルエーテル化合物等が挙げられる。 [0094] Examples of the butyl ether compound that can be preferably added to the present invention include known vinyl ether compounds. For example, ethylene glycol dibutyl ether, polyethylene glycol divininole ether, triethylene glycol divininole ether, propylene glycol divininole ether, dipropylene glycol divininole ether, butane diol divinyl ether, hexanediol divinyl ether, cyclohexane divinyl ether Di- or tributyl ether compounds such as methanol divinyl ether and trimethylolpropane trivinyl ether, ethyl vinyl ether, n -butyl vinyl ether, isobutyl vinyl ether, octadecyl vinyl ether, cyclohexyl vinyl ether, hydroxybutynole vinylenole Ethenore, 2-ethynolehexinolevinoleetenore, cyclohexanedimethanol monovinyl ether, n-propylbiene Examples thereof include monobutyl ether compounds such as nyl ether, isopropyl vinyl ether, isopropylene ether o propylene carbonate, dodecyl vinyl ether, diethylene glycol monobutyl ether, and octadecyl vinyl ether.
[0095] これらのビニルエーテルィ匕合物のうち、硬化性、密着性、表面硬度を考慮すると、 ジ又はトリビニルエーテルィ匕合物が好ましぐ特にジビュルエーテルィ匕合物が好まし い。本発明では、上記ビニルエーテルィ匕合物の 1種を単独で使用してもよいが、 2種 以上を適宜組み合わせて使用してもょ 、。  [0095] Among these vinyl ether compounds, in consideration of curability, adhesion, and surface hardness, di- or trivinyl ether compounds are preferred, and in particular dibuty ether compounds are preferred. In the present invention, one of the above vinyl ether compounds may be used alone, or two or more may be used in appropriate combination.
[0096] 本発明で用いることのできるォキセタンィ匕合物としては、ォキセタン環を有する化合 物であり、 f列え ίま、特開 2001— 220526号、同 2001— 310937号【こ紹介されて!ヽ るような公知のあらゆるォキセタンィ匕合物を使用できる。特に、特開 2005— 139425 号に記載されている一般式 (Ε)で表される化合物が好ましぐ具体的には同明細書 段落番号 0218に記載されて 、る Ε— 1〜Ε— 13等を挙げることができる。  [0096] The oxetane compound that can be used in the present invention is a compound having an oxetane ring, and is described in Japanese Patent Application Laid-Open No. 2001-220526, 2001-310937. Any known oxetane compound can be used. In particular, a compound represented by the general formula (Ε) described in JP-A-2005-139425 is preferred, specifically, described in paragraph No. 0218 of the same specification, る -1 to Ε-13. Etc.
[0097] また、本発明の光硬化性組成物においては、ォキセタン環を 1個含有する単官能 ォキセタンィ匕合物とォキセタン環を 2個以上含有する多官能ォキセタンィ匕合物とを併 用することが、硬化後の膜強度を向上させる上で更に好ましい。ただし、ォキセタン 環を 5個以上有する化合物を使用すると、光硬化性組成物の粘度が高くなるため、 取扱いが困難になったり、また光硬化性組成物のガラス転移温度が高くなるため、得 られる硬化物の粘着性が十分でなくなってしまう。本発明で使用するォキセタン環を 有する化合物は、ォキセタン環を 1〜4個有する化合物が好ま 、。 [0097] In the photocurable composition of the present invention, a monofunctional oxetane compound containing one oxetane ring and a polyfunctional oxetane compound containing two or more oxetane rings may be used in combination. Is more preferable for improving the film strength after curing. However, when a compound having 5 or more oxetane rings is used, the viscosity of the photocurable composition is increased, which makes it difficult to handle and increases the glass transition temperature of the photocurable composition. The cured product is not sufficiently sticky. The compound having an oxetane ring used in the present invention is preferably a compound having 1 to 4 oxetane rings.
[0098] 本発明にお 、て、好ましくは、カチオン重合性ィ匕合物として、ォキセタン環を有する 化合物を 25〜90質量%、ォキシラン基を有する化合物を 10〜70質量%、ビニルェ 一テル化合物 0〜40質量%とを含有することであり、この構成とすることにより、硬化 性及び吐出安定性がともに向上する。  [0098] In the present invention, the cationically polymerizable compound is preferably 25 to 90% by mass of a compound having an oxetane ring, 10 to 70% by mass of a compound having an oxsilane group, and a vinyl ether compound. In this structure, both curability and ejection stability are improved.
[0099] 〔各種添加剤〕  [0099] [Various additives]
本発明のカチオン系光重合性組成物においては、上記説明した以外に様々な添 加剤を用いることができる。例えば、レべリング添加剤、マット剤、膜物性を調整する ためのポリエステル系榭脂、ポリウレタン系榭脂、ビュル系榭脂、アクリル系榭脂、ゴ ム系榭脂、ワックス類を添加することができる。また、保存安定性を改良する目的で、 公知のあらゆる塩基性ィ匕合物を用いることができる力 代表的なものとして、塩基性 アルカリ金属化合物、塩基性アルカリ土類金属化合物、ァミンなどの塩基性有機化 合物などが挙げられる。  In the cationic photopolymerizable composition of the present invention, various additives other than those described above can be used. For example, leveling additives, matting agents, polyester resin, polyurethane resin, bull resin, acrylic resin, rubber resin, waxes to adjust film properties should be added. Can do. In addition, for the purpose of improving storage stability, any known basic compound can be used. Representative examples include basic alkali metal compounds, basic alkaline earth metal compounds, and amines. Organic organic compounds.
[0100] 〔顔料〕  [0100] [Pigment]
本発明のカチオン系光重合性組成物においては、顔料を含有することが好ましい  The cationic photopolymerizable composition of the present invention preferably contains a pigment.
[0101] 本発明に用いる顔料としては、カーボンブラック、カーボンリファインド、およびカー ボンナノチューブのような炭素系顔料、鉄黒、コバルトブルー、酸化亜鉛、酸化チタン 、酸化クロム、および酸化鉄のような金属酸化物顔料、硫化亜鉛のような硫化物顔料 、フタロシアニン系顔料、金属の硫酸塩、炭酸塩、ケィ酸塩、およびリン酸塩のような 塩からなる顔料、並びにアルミ粉末、ブロンズ粉末、および亜鉛粉末のような金属粉 末等の無機顔料、ニトロ顔料、ァ-リンブラック、ナフトールグリーン Bのような-トロソ 顔料、ボルドー 10B、レーキレッド 4Rおよびクロモフタールレッドのようなァゾ顔料(ァ ゾレーキ、不溶性ァゾ顔料、縮合ァゾ顔料、キレートァゾ顔料などを含む。)、ピーコッ タブノレ一レーキおよびローダミンレーキのようなレーキ顔料、フタロシア-ンブノレ一の ようなフタロシアニン顔料、多環式顔料 (ペリレン顔料、ペリノン顔料、アントラキノン顔 料、キナクリドン顔料、ジォキサン顔料、チォインジゴ顔料、イソインドリノン顔料、キノ フラノン顔料など)、チォインジゴレッドおよびインダトロンブルーのようなスレン顔料、 キナクリドン顔料、キナクリジン顔料、並びにイソインドリノン顔料のような有機系顔料 を使用することちできる。 [0101] Examples of the pigment used in the present invention include carbon-based pigments such as carbon black, carbon refined, and carbon nanotubes, iron black, cobalt blue, zinc oxide, titanium oxide, chromium oxide, and iron oxide. Metal oxide pigments, sulfide pigments such as zinc sulfide, phthalocyanine pigments, pigments composed of salts such as metal sulfates, carbonates, kaates, and phosphates, and aluminum powders, bronze powders, and Inorganic pigments such as metal powders such as zinc powder, nitro pigments, alin black, naphthol green B-toroso pigments, Bordeaux 10B, lake red 4R and azo pigments such as chromoftal red (azo lake) , Insoluble azo pigments, condensed azo pigments, chelate azo pigments, etc.), peacotton lakes and rhodamines Lake pigments such as a rk, Futaroshia - phthalocyanine pigments such as Nbunore mono-, polycyclic pigments (perylene pigments, perinone pigments, anthraquinone Pigments, quinacridone pigments, Jiokisan pigments, Chioinjigo pigments, isoindolinone pigments, keno Furanone pigments), selenium pigments such as thioindigo red and indatron blue, quinacridone pigments, quinacridine pigments, and organic pigments such as isoindolinone pigments.
[0102] 顔料の具体例としては、 [0102] Specific examples of pigments include
C. I Pigmen Yellow— 1、 3、 12、 13、 14、 17、 42、 81、 83、 87、 95、 109、 1 14、 120、 128、 129、 138、 150、 151、 154、 180、 185、  C. I Pigmen Yellow—1, 3, 12, 13, 14, 17, 42, 81, 83, 87, 95, 109, 1 14, 120, 128, 129, 138, 150, 151, 154, 180, 185 ,
C. I Pigmen Orange— 16、 36、 38、  C. I Pigmen Orange— 16, 36, 38,
C. I Pigmen Red— 5、 22、 38、 48 : 1、 48 : 2、 48 :4、 49 : 1、 53 : 1、 57 : 1、 63 : 1、 101、 122、 123、 144、 146、 168、 184、 185、 202、  C. I Pigmen Red—5, 22, 38, 48: 1, 48: 2, 48: 4, 49: 1, 53: 1, 57: 1, 63: 1, 101, 122, 123, 144, 146, 168, 184, 185, 202,
C. I Pigmen Violet— 19、 23、  C. I Pigmen Violet—19, 23,
C. I Pigmen Blue— 15 : 1、 15 : 3、 15 :4、 18、 27、 29、 60、  C. I Pigmen Blue—15: 1, 15: 3, 15: 4, 18, 27, 29, 60,
C. I Pigmen Green— 7、 36、  C. I Pigmen Green—7, 36,
C. I Pigmen White— 6、 18、 21、  C. I Pigmen White—6, 18, 21,
C. I Pigmen Black— 7、等を挙げることができる。  C. I Pigmen Black—7, etc.
[0103] 上記顔料の分散には、例えば、ボールミル、サンドミル、アトライター、ロールミル、 アジテータ、ヘンシェルミキサ、コロイドミル、超音波ホモジナイザー、パールミル、湿 式ジェットミル、ペイントシェーカー等を用いることができる。また、顔料の分散を行う 際に、分散剤を添加することも可能である。分散剤としては、高分子分散剤を用いる ことが好ましぐ高分子分散剤としては、例えば、 Avecia社の Solsperseシリーズや、 味の素ファインテクノ社の PBシリーズが挙げられる。また、分散助剤として、各種顔料 に応じたシナージストを用いることも可能である。これらの分散剤および分散助剤は、 顔料 100質量部に対し、 1〜50質量部添加することが好ましい。分散媒体は、溶剤 または重合性ィ匕合物を用いて行うが、本発明の光硬化型インクでは、印字後に反応 •硬化させるため、無溶剤であることが好ましい。溶剤が硬化画像に残ってしまうと、 耐溶剤性の劣化、残留する溶剤の VOCの問題が生じる。よって、分散媒体は溶剤 では無く重合性ィ匕合物、その中でも最も粘度の低 、モノマーを選択することが分散 適性上好ましい。 [0103] For the dispersion of the pigment, for example, a ball mill, a sand mill, an attritor, a roll mill, an agitator, a Henschel mixer, a colloid mill, an ultrasonic homogenizer, a pearl mill, a wet jet mill, a paint shaker, or the like can be used. Further, a dispersing agent can be added when dispersing the pigment. As the dispersant, it is preferable to use a polymer dispersant, for example, Avecia Solsperse series and Ajinomoto Fine Techno PB series. In addition, a synergist according to various pigments can be used as a dispersion aid. These dispersants and dispersion aids are preferably added in an amount of 1 to 50 parts by mass with respect to 100 parts by mass of the pigment. The dispersion medium is a solvent or a polymerizable compound. The photocurable ink of the present invention is preferably solvent-free because it is reacted and cured after printing. If the solvent remains in the cured image, the solvent resistance deteriorates and the VOC problem of the remaining solvent occurs. Therefore, it is preferable in view of dispersibility that the dispersion medium is not a solvent but a polymerizable compound, and among them, a monomer having the lowest viscosity is selected.
[0104] 《インクジェットインク》 本発明のインクジェットインクにおいては、少なくとも本発明の光酸発生剤組成物、 あるいは本発明のカチオン系光重合性組成物を含有することを特徴とする。 [0104] Inkjet ink The ink-jet ink of the present invention contains at least the photoacid generator composition of the present invention or the cationic photopolymerizable composition of the present invention.
[0105] 本発明のインクジェットインクにおいては、本発明の光酸発生剤組成物、あるいは 本発明のカチオン系光重合性組成物で記載した構成要素の他に、例えば、レベリン グ添加剤、マット剤、膜物性を調整するためのポリエステル系榭脂、ポリウレタン系榭 脂、ビニル系榭脂、アクリル系榭脂、ゴム系榭脂、ワックス類を添加することができる。 また、保存安定性を改良する目的で、公知のあらゆる塩基性ィ匕合物を用いることがで きるが、代表的なものとして、塩基性アルカリ金属化合物、塩基性アルカリ土類金属 化合物、ァミンなどの塩基性有機化合物などがあげられる。また、ラジカル重合性モ ノマーと開始剤を組み合わせ、ラジカル'カチオンのハイブリッド型硬化インクとするこ とも可能である。 [0105] In the inkjet ink of the present invention, in addition to the constituent elements described in the photoacid generator composition of the present invention or the cationic photopolymerizable composition of the present invention, for example, a leveling additive, a matting agent, etc. Polyester-based resin, polyurethane-based resin, vinyl-based resin, acrylic-based resin, rubber-based resin, and waxes for adjusting film physical properties can be added. For the purpose of improving storage stability, any known basic compound can be used, but representative examples include basic alkali metal compounds, basic alkaline earth metal compounds, and amines. And basic organic compounds. It is also possible to combine radically polymerizable monomers and initiators into radical cation hybrid curable inks.
[0106] また、本発明のインクジェットインクにおいては、インクジェット画像形成に用いる場 合は、 25°Cにおける粘度が 7〜50mPa' sであることが好ましい。  [0106] Further, in the inkjet ink of the present invention, when used for inkjet image formation, the viscosity at 25 ° C is preferably 7 to 50 mPa's.
[0107] 《記録材料》  [0107] Recording material
本発明で用いることのできる記録材料としては、通常の非コート紙、コート紙などの 他、いわゆる軟包装に用いられる各種非吸収性のプラスチックおよびそのフィルムを 用いることができ、各種プラスチックフィルムとしては、例えば、ポリエチレンテレフタレ ート(PET)フィルム、延伸ポリスチレン(OPS)フィルム、延伸ポリプロピレン(OPP)フ イルム、延伸ナイロン(ONy)フィルム、ポリ塩化ビュル(PVC)フィルム、ポリエチレン( PE)フィルム、トリァセチルセルロース(TAC)フィルム等を挙げることができる。その 他のプラスチックとしては、ポリカーボネート、アクリル榭脂、 ABS、ポリアセタール、ポ リビュルアルコール (PVA)、ゴム類などが使用できる。また、金属類や、ガラス類にも 適用可能である。これらの記録材料の中でも、特に熱でシュリンク可能な、 PETフィ ルム、 OPSフィルム、 OPPフィルム、 ONyフィルム、 PVCフィルムへ画像を开成する 場合に本発明の構成は、有効となる。これらの基材は、インクの硬化収縮、硬化反応 時の発熱などにより、フィルムのカール、変形が生じやすいば力りでなぐインク膜が 基材の収縮に追従し難い。  As the recording material that can be used in the present invention, various non-absorbable plastics and films used for so-called soft packaging, as well as ordinary uncoated paper and coated paper, can be used. For example, polyethylene terephthalate (PET) film, stretched polystyrene (OPS) film, stretched polypropylene (OPP) film, stretched nylon (ONy) film, polychlorinated butyl (PVC) film, polyethylene (PE) film, tria A cetyl cellulose (TAC) film etc. can be mentioned. Other plastics that can be used include polycarbonate, acrylic resin, ABS, polyacetal, polybutyl alcohol (PVA), and rubbers. It can also be applied to metals and glass. Among these recording materials, the configuration of the present invention is effective particularly when an image is formed on a PET film, an OPS film, an OPP film, an ONy film, and a PVC film that can be shrunk by heat. In these base materials, if the film is easily curled or deformed due to curing shrinkage of the ink or heat generated during the curing reaction, it is difficult for the ink film to be followed by the force to follow the shrinkage of the base material.
[0108] これら、各種プラスチックフィルムの表面エネルギーは大きく異なり、記録材料によ つてインク着弾後のドット径が変わってしまうことが、従来力も問題となっていた。本発 明の構成では、表面エネルギーの低い OPPフィルム、 OPSフィルムや表面エネルギ 一の比較的大き 、PETまでを含む、表面エネルギーが 35〜60mNZmの広範囲の 記録材料に良好な高精細な画像を形成できる。 [0108] The surface energy of these various plastic films varies greatly, Therefore, the dot strength after ink landing has changed, and the conventional power has also been a problem. With the configuration of the present invention, good high-definition images are formed on a wide range of recording materials with a surface energy of 35 to 60 mNZm, including OPP films with low surface energy, OPS films, relatively large surface energy, and even PET. it can.
[0109] 更に、天然繊維あるいは合成繊維力も成る布地を用いることができる。具体的には 、木綿、絹、トレビラ CS (ポリエステル:へキストネ土製)、タイベック (ポリエチレン:デュ ボン社製)、ターボリン (塩ィ匕ビュル)、ナイロン等がある。  [0109] Furthermore, a fabric having natural fiber or synthetic fiber strength can also be used. Specific examples include cotton, silk, Trevira CS (polyester: made from hextone), Tyvek (polyethylene: made from Dubon), turbolin (salt vine), nylon, and the like.
[0110] 《インクジ ット記録方法》  [0110] <Ink jet recording method>
本発明では、記録材料上にインクを記録し、活性光線を照射して硬化した後の総ィ ンク膜厚が 2〜20 mであることが好ましい。記録材料が薄いプラスチック材料であ ることが多!、軟包装印刷分野では、前述した記録材料のカール'皺の問題でだけで なぐ印刷物全体のこし'質感が変わってしまうという問題が有るため、過剰な膜厚の インク吐出は好ましくない。  In the present invention, it is preferable that the total ink film thickness after recording ink on the recording material and curing by irradiation with actinic rays is 2 to 20 m. The recording material is often a thin plastic material! In the flexible packaging printing field, there is a problem that the texture of the entire printed matter changes due to the above-mentioned problem of curling of the recording material. Ink ejection with a thick film thickness is not preferable.
[0111] 尚、ここで「総インク膜厚」とは記録材料に描画されたインクの膜厚の最大値を意味 し、単色でも、それ以外の 2色重ね(2次色)、 3色重ね、 4色重ね(白インクベース)の 記録を行った場合でも総インク膜厚の意味するところは同様である。  [0111] Here, "total ink film thickness" means the maximum value of the film thickness of the ink drawn on the recording material, and even with a single color, the other two colors (secondary color) or three colors are superimposed. Even when 4-color superposition (white ink base) is recorded, the meaning of the total ink film thickness is the same.
[0112] 本発明の印刷方法においては、活性光線の照射条件として、インク印字後 0. 001 秒〜 2. 0秒の間に活性光線が照射されることが好ましぐより好ましくは 0. 001秒〜 1. 0秒である。高精細な画像を形成するためには、照射タイミングが出来るだけ早い ことが特に重要となる。  [0112] In the printing method of the present invention, it is preferable that the actinic ray is irradiated for 0.001 to 2.0 seconds after ink printing as the actinic ray irradiation condition, more preferably 0.001. Seconds to 1.0 seconds. In order to form a high-definition image, it is particularly important that the irradiation timing is as early as possible.
[0113] また、活性光線を照射を 2段階に分け、まずインク印字後 0. 001〜2. 0秒の間に 活性光線を照射し、かつ、全印字終了後、更に活性光線を照射する方法も好ましい 態様の 1つである。活性光線の照射を 2段階に分けることで、よりインク硬化の際に起 こる記録材料の収縮を抑えることが可能となる。  [0113] The method of irradiating actinic rays in two stages, first irradiating actinic rays between 0.001 and 2.0 seconds after ink printing, and further irradiating actinic rays after the completion of all printing Is also one of the preferred embodiments. By dividing the actinic ray irradiation into two stages, it is possible to suppress the shrinkage of the recording material that occurs during ink curing.
[0114] 従来、 UVインク印刷方式では、インク着弾後のドット広がり、滲みを抑制のために、 光源の総消費電力が lkW'hrを超える高照度の光源が用いられるのが通常であつ た。し力しながら、これらの光源を用いると、特に、シュリンクラベルなどへの印字では 、記録材料の収縮があまりにも大きぐ実質上使用出来ないのが現状であった。 [0115] 本発明では、 254nmの波長領域に最高照度をもつ活性光線を用いることが好まし ぐ総消費電力が lkW'hr以上の光源を用いても、高精細な画像を形成出来、且つ 、記録材料の収縮も実用上許容レベル内に収められる。 [0114] Conventionally, in the UV ink printing method, a light source with high illuminance in which the total power consumption of the light source exceeds lkW'hr is usually used in order to suppress dot spread and bleeding after ink landing. However, when these light sources are used, particularly in printing on a shrink label or the like, the shrinkage of the recording material is so large that it cannot be used. [0115] In the present invention, it is preferable to use an actinic ray having the highest illuminance in the wavelength region of 254 nm. Even if a light source with a total power consumption of lkW'hr or more is used, a high-definition image can be formed, and The shrinkage of the recording material is within a practically acceptable level.
[0116] 本発明においては、更に活性光線を照射する光源の総消費電力が lkW'hr未満 であることが好ましい。総消費電力が lkW'hr未満の光源の例としては、蛍光管、冷 陰極管、 LEDなどがある力 これらに限定されない。  [0116] In the present invention, it is preferable that the total power consumption of the light source for irradiating active light is less than lkW'hr. Examples of light sources with a total power consumption of less than lkW'hr include, but are not limited to, fluorescent tubes, cold cathode tubes, LEDs and the like.
[0117] 以下、本発明のインクジェット記録方法で適用可能な記録装置について、図面を適 宜参照しながら説明する。  Hereinafter, a recording apparatus applicable to the ink jet recording method of the present invention will be described with reference to the drawings as appropriate.
[0118] 図 1は、記録装置の要部の構成を示す正面図である。記録装置 1は、ヘッドキヤリツ ジ 2、記録ヘッド 3、照射手段 4、プラテン部 5等を備えて構成される。この記録装置 1 は、記録材料 Pの下にプラテン部 5が設置されている。プラテン部 5は、紫外線を吸収 する機能を有しており、記録材料 Pを通過してきた余分な紫外線を吸収する。その結 果、高精細な画像を非常に安定に再現できる。  FIG. 1 is a front view showing the configuration of the main part of the recording apparatus. The recording apparatus 1 includes a head carriage 2, a recording head 3, an irradiation unit 4, a platen unit 5, and the like. In this recording apparatus 1, a platen section 5 is installed under the recording material P. The platen section 5 has a function of absorbing ultraviolet rays and absorbs excess ultraviolet rays that have passed through the recording material P. As a result, high-definition images can be reproduced very stably.
[0119] 記録材料 Pは、ガイド部材 6に案内され、搬送手段(図示せず)の作動により、図 1に おける手前から奥の方向に移動する。ヘッド走査手段(図示せず)は、ヘッドキヤリツ ジ 2を図 1における Y方向に往復移動させることにより、ヘッドキャリッジ 2に保持され た記録ヘッド 3の走査を行なう。  [0119] The recording material P is guided by the guide member 6 and moves from the front side to the back side in Fig. 1 by the operation of the conveying means (not shown). Head scanning means (not shown) scans the recording head 3 held by the head carriage 2 by reciprocating the head carriage 2 in the Y direction in FIG.
[0120] ヘッドキャリッジ 2は記録材料 Pの上側に設置され、記録材料 P上の画像印刷に用 いる色の数に応じて後述する記録ヘッド 3を複数個、吐出口を下側に配置して収納 する。ヘッドキャリッジ 2は、図 1における Y方向に往復自在な形態で記録装置 1本体 に対して設置されており、ヘッド走査手段の駆動により、図 1における Y方向に往復 移動する。  [0120] The head carriage 2 is installed on the upper side of the recording material P, and a plurality of recording heads 3 to be described later are arranged in accordance with the number of colors used for image printing on the recording material P, and the discharge ports are arranged on the lower side. Store. The head carriage 2 is installed on the main body of the recording apparatus 1 in such a manner that it can reciprocate in the Y direction in FIG. 1, and reciprocates in the Y direction in FIG. 1 by driving the head scanning means.
[0121] なお、図 1ではヘッドキャリッジ 2がホワイト(W)、イェロー(Y)、マゼンタ(M)、シァ ン (C)、ブラック (K)、ライトイェロー (Ly)、ライトマゼンタ (Lm)、ライトシアン (Lc)、ラ イトブラック(Lk)、ホワイト(W)の記録ヘッド 3を収納するものとして描図を行なって!/ヽ る力 実施の際にはヘッドキャリッジ 2に収納される記録ヘッド 3の色数は適宜決めら れるものである。  [0121] In FIG. 1, the head carriage 2 is white (W), yellow (Y), magenta (M), shean (C), black (K), light yellow (Ly), light magenta (Lm), Drawing as if the light cyan (Lc), light black (Lk), and white (W) recording heads 3 were to be stored! The number of colors is determined as appropriate.
[0122] 記録ヘッド 3は、インク供給手段(図示せず)により供給された活性光線硬化型イン ク(例えば UV硬化インク)を、内部に複数個備えられた吐出手段(図示せず)の作動 により、吐出ロカも記録材料 Pに向けて吐出する。記録ヘッド 3により吐出される UV インクは色材、重合性モノマー、開始剤等を含んで組成されており、紫外線の照射を 受けることで開始剤が触媒として作用することに伴なうモノマーの架橋、重合反応に よって硬化する性質を有する。 The recording head 3 has an actinic ray curable ink supplied by an ink supply means (not shown). The discharge roller is also discharged toward the recording material P by the operation of a plurality of discharge means (not shown) provided therein (for example, UV curable ink). The UV ink discharged from the recording head 3 is composed of a coloring material, a polymerizable monomer, an initiator, etc., and the monomer crosslinks when the initiator acts as a catalyst when irradiated with ultraviolet rays. It has the property of being cured by a polymerization reaction.
[0123] 記録ヘッド 3は記録材料 Pの一端からヘッド走査手段の駆動により、図 1における Y 方向に記録材料 Pの他端まで移動する走査の間に、記録材料 Pにおける一定の領 域 (着弾可能領域)に対して UVインクをインク滴として吐出し、該着弾可能領域にィ ンク滴を着弾させる。 [0123] The recording head 3 has a certain area (landing) in the recording material P during the scan that moves from one end of the recording material P to the other end of the recording material P in the Y direction in FIG. UV ink is ejected as ink droplets onto the possible region), and ink droplets are landed on the landable region.
[0124] 上記走査を適宜回数行ない、 1領域の着弾可能領域に向けて UVインクの吐出を 行なった後、搬送手段で記録材料 Pを図 1における手前力 奥方向に適宜移動させ 、再びヘッド走査手段による走査を行ないながら、記録ヘッド 3により上記着弾可能 領域に対し、図 1における奥方向に隣接した次の着弾可能領域に対して UVインクの 吐出を行なう。  [0124] After the above scanning is performed as many times as necessary and UV ink is discharged toward one landable area, the recording material P is appropriately moved in the forward direction in FIG. 1 by the transport means, and head scanning is performed again. While performing scanning by means, the recording head 3 discharges UV ink to the next landable area adjacent in the rear direction in FIG.
[0125] 上述の操作を繰り返し、ヘッド走査手段及び搬送手段と連動して記録ヘッド 3から UVインクを吐出することにより、記録材料 P上に UVインク滴の集合体力 なる画像 が形成される。  [0125] The above operation is repeated, and UV ink is ejected from the recording head 3 in conjunction with the head scanning means and the conveyance means, whereby an image having the collective force of UV ink droplets is formed on the recording material P.
[0126] 照射手段 4は特定の波長領域の紫外線を安定した露光エネルギーで発光する紫 外線ランプ及び特定の波長の紫外線を透過するフィルターを備えて構成される。ここ で、紫外線ランプとしては、水銀ランプ、メタルノヽライドランプ、エキシマーレーザー、 紫外線レーザー、冷陰極管、熱陰極管、ブラックライト、 LED (light emitting dio de)等が適用可能であり、帯状のメタルノヽライドランプ、冷陰極管、熱陰極管、水銀ラ ンプもしくはブラックライトが好ま ヽ。特に波長 254nmの紫外線を発光する低圧水 銀ランプ、熱陰極管、冷陰極管及び殺菌灯が滲み防止、ドット径制御を効率よく行な え、好ましい。ブラックライトを照射手段 4の放射線源に用いることで、 UVインクを硬 化するための照射手段 4を安価に作製することができる。  The irradiation means 4 includes an ultraviolet lamp that emits ultraviolet light in a specific wavelength region with stable exposure energy and a filter that transmits ultraviolet light of a specific wavelength. Here, mercury lamps, metal nanoride lamps, excimer lasers, ultraviolet lasers, cold cathode tubes, hot cathode tubes, black lights, LEDs (light emitting diodes), etc. are applicable as ultraviolet lamps.ヽ Ride lamp, cold cathode tube, hot cathode tube, mercury lamp or black light are preferred. In particular, a low-pressure mercury lamp, a hot cathode tube, a cold cathode tube, and a germicidal lamp that emit ultraviolet light having a wavelength of 254 nm are preferable because they can prevent bleeding and efficiently control the dot diameter. By using black light as the radiation source of the irradiation means 4, the irradiation means 4 for hardening the UV ink can be produced at low cost.
[0127] 照射手段 4は、記録ヘッド 3がヘッド走査手段の駆動による 1回の走査によって UV インクを吐出する着弾可能領域のうち、記録装置 (UVインクジェットプリンタ) 1で設 定できる最大のものとほぼ同じ形状か、着弾可能領域よりも大きな形状を有する。 [0127] The irradiation means 4 is provided by the recording device (UV inkjet printer) 1 in the landable area where the recording head 3 ejects UV ink by one scan by driving the head scanning means. It has almost the same shape as the largest one that can be determined, or a shape larger than the landable area.
[0128] 照射手段 4はヘッドキャリッジ 2の両脇に、記録材料 Pに対してほぼ平行に、固定し て設置される。 The irradiating means 4 is installed on both sides of the head carriage 2 so as to be substantially parallel to the recording material P.
[0129] 前述したようにインク吐出部の照度を調整する手段としては、記録ヘッド 3全体を遮 光することはもちろんであるが、加えて照射手段 4と記録材料 Pの距離 hiより、記録 ヘッド 3のインク吐出部 31と記録材料 Pとの距離 h2を大きくしたり(hl <h2)、記録へ ッド 3と照射手段 4との距離 dを離したり(dを大きく)することが有効である。また、記録 ヘッド 3と照射手段 4の間を蛇腹構造 7にすると更に好ましい。  As described above, as a means for adjusting the illuminance of the ink discharge portion, the entire recording head 3 is not only shielded, but in addition, the recording head is determined by the distance hi between the irradiation means 4 and the recording material P. It is effective to increase the distance h2 between the ink ejection part 31 and the recording material P in Fig. 3 (hl <h2), or to increase the distance d between the recording head 3 and the irradiation means 4 (d is increased). is there. Further, it is more preferable that the space between the recording head 3 and the irradiation means 4 is a bellows structure 7.
[0130] ここで、照射手段 4で照射される紫外線の波長は、照射手段 4に備えられた紫外線 ランプまたはフィルターを交換することで適宜変更することができる。  Here, the wavelength of the ultraviolet rays irradiated by the irradiation means 4 can be appropriately changed by replacing the ultraviolet lamp or filter provided in the irradiation means 4.
実施例  Example
[0131] 以下、実施例を挙げて本発明を具体的に説明するが、本発明はこれらに限定され るものではない。なお、実施例において「部」あるいは「%」の表示を用いる力 特に 断りがない限り「質量部」ある!/、は「質量%」を表す。  [0131] Hereinafter, the present invention will be specifically described with reference to examples, but the present invention is not limited thereto. In the examples, “part” or “%” is used as a force to indicate “part by mass” unless otherwise specified. “/” Represents “% by mass”.
[0132] 実施例 1  [0132] Example 1
《顔料分散液 aの調製》  <Preparation of pigment dispersion a>
下記の方法に従って、顔料を分散して顔料分散液 aを調製した。  A pigment dispersion a was prepared by dispersing the pigment according to the following method.
[0133] 以下の各化合物をステンレスビーカーに入れ、 65°Cホットプレート上で加熱しなが ら 1時間加熱撹拌溶解した。 [0133] Each of the following compounds was placed in a stainless beaker and dissolved by stirring with heating for 1 hour while heating on a 65 ° C hot plate.
[0134] PB822 (味の素ファインテクノネ土製分散剤) 8部 [0134] PB822 (Ajinomoto Fine Technone Earth Dispersant) 8 parts
OXT221 (東亜合成社製ォキセタンィ匕合物) 72部 室温まで冷却した後、 Pigment Blue 15 :4 (大日精化社製)を 20部を加えて、 直径 0. 3mmのジルコユアビーズ 200gと共にガラス瓶に入れ密栓し、ペイントシエ一 カーにて 4時間分散処理した後、ジルコユアビーズを除去し、顔料分散液 aとした。  OXT221 (Oxetane compound manufactured by Toa Gosei Co., Ltd.) 72 parts After cooling to room temperature, add 20 parts of Pigment Blue 15: 4 (manufactured by Dainichi Seika Co., Ltd.) and add it to a glass bottle with 200 g of Zircoyu beads of 0.3 mm Sealed and sealed, and dispersed with a paint shaker for 4 hours, after which the zircoyour beads were removed to obtain a pigment dispersion a.
[0135] 《インクの調製》 [0135] <Preparation of ink>
表 1に記載の各添加剤を順次添加、混合して、インク 1〜7を調製した。なお、表 1 に記載の数値は、添加量 (部)である。  Inks 1 to 7 were prepared by sequentially adding and mixing the additives listed in Table 1. The numerical values listed in Table 1 are addition amounts (parts).
[0136] [表 1]
Figure imgf000033_0001
[0136] [Table 1]
Figure imgf000033_0001
[0137] なお、表 1に略称で記載の各添加剤の詳細は、以下の通りである。  [0137] The details of the additives abbreviated in Table 1 are as follows.
[0138] 〔光重合性化合物〕 [Photopolymerizable compound]
OXT- 101:東亞合成社製  OXT-101: Toagosei Co., Ltd.
OXT -212:東亞合成社製  OXT -212: Toagosei Co., Ltd.
OXT- 221:東亞合成社製  OXT-221: Made by Toagosei
〔光重合開始剤:光酸発生剤〕  (Photopolymerization initiator: photoacid generator)
UVI6992:ダウ ·ケミカル社製 プロピオンカーボネート 50%液 SP152:スルホ二ゥム塩 (旭電化工業社製)  UVI6992: Propion carbonate 50% solution manufactured by Dow Chemical Company SP152: Sulfonium salt (Asahi Denka Kogyo Co., Ltd.)
〔增感剤〕  [Sensitizer]
DBA: 9, 10—ジブトキシアントラセン  DBA: 9, 10—Dibutoxyanthracene
〔塩基性化合物〕  [Basic compounds]
* A:トリイソパノールプロパン  * A: Triisopanol propane
〔界面活性剤〕  [Surfactant]
KF— 351:信越化学社製 シリコーンオイル [0139] [化 14] KF— 351: Silicone oil manufactured by Shin-Etsu Chemical [0139] [Chemical 14]
Figure imgf000034_0001
Figure imgf000034_0001
[0140] 《インクジェット画像形成方法》 [0140] <Inkjet image forming method>
ピエゾ型インクジェットノズルを備えた図 1に記載の構成力もなるインクジェット記録 装置に、上記調製した各硬化組成物インクを装填し、記録材料として巾 600mm、長 さ 20mのトレビラ CS (ポリエステルフィルム、へキストネ土製)へ、下記の画像記録を連 続して行った。インク供給系は、インクタンク、供給パイプ、ヘッド直前の前室インクタ ンク、フィルター付き配管、ピエゾヘッド力 なり、前室タンクからヘッド部分まで断熱 して 50°Cの加温を行った。なお、各硬化組成物インクの粘度にあわせてヘッド部を 加温し、 720 X 720dpiの解像度で吐出できるよう駆動して、上記記載の硬化組成物 インクを連続吐出した。また、記録材料は面ヒーター及び冷却装置により 40°Cになる ように調整した。着弾した後、キャリッジ両脇の 120WZcmメタルノヽライドランプ(日本 電池製 MAL 400NL) '400mWZcm2の紫外線を照射し、瞬時 (着弾後 0. 5秒 未満)に硬化させた。インク吐出量は、最小液滴量を 4pl、最大液適量 80plでそれぞ れ印字を行った。また、インクジェット画像の形成は、気温 23°C湿度 30%で行った。 The above-prepared cured composition ink is loaded into an ink jet recording apparatus having the constitutional power shown in FIG. 1 equipped with a piezo-type ink jet nozzle, and the recording material is 600 mm wide and 20 m long Trevira CS (polyester film, hexone The following image recording was continuously carried out on the earthenware. The ink supply system was an ink tank, supply pipe, front chamber ink tank just before the head, pipe with filter, and piezo head force. Heating was performed from the front chamber tank to the head and heated to 50 ° C. The head portion was heated in accordance with the viscosity of each curable composition ink, and was driven so that it could be ejected at a resolution of 720 × 720 dpi, so that the curable composition ink described above was continuously ejected. The recording material was adjusted to 40 ° C with a surface heater and a cooling device. After landing, 120WZcm metal nanoride lamps on both sides of the carriage (MAL 400NL manufactured by Nihon Batteries) were irradiated with UV light of '400mWZcm 2 and cured instantaneously (less than 0.5 seconds after landing). Ink discharge was printed with a minimum droplet volume of 4 pl and a maximum liquid volume of 80 pl. Inkjet images were formed at a temperature of 23 ° C and a humidity of 30%.
[0141] 《形成画像の評価》 [0141] << Evaluation of formed image >>
〔にじみ耐性の評価〕  [Evaluation of bleeding resistance]
印字硬化させたサンプルを 24時間放置した後、にじみ具合を目視観察し、下記の 基準に従って、にじみ耐性の評価を行った。  After the print-cured sample was allowed to stand for 24 hours, the degree of bleeding was visually observed, and the bleeding resistance was evaluated according to the following criteria.
[0142] 5 :にじみの発生が全く認められない [0142] 5: No bleeding is observed
4:ほぼにじみの発生は認められな ヽ  4: Almost no bleeding is observed に
3 :僅かににじみの発生は認められる力 実用上許容される品質である 2:にじみの発生が認められ、実用上問題とされる品質である  3: Slight bleed is recognized Power that is acceptable for practical use 2: Smoke is observed and is a practically problematic quality
1:激しいにじみが発生し、使用に耐えな 、品質である  1: Severe blurring occurs, the quality is unbearable
〔吐出安定性の評価〕  [Evaluation of ejection stability]
上記画像形成方法で 1時間の連続射出を行った後、 目標濃度で 6ポイント MS明朝 体文字を印字し、文字のガサツキをルーペで拡大評価し、下記の基準に則り文字品 質を評価し、これを吐出安定性の尺度とした。 After one hour of continuous injection with the above image forming method, 6 points at the target density MS Mincho Characters were printed, the texture of the characters was magnified with a loupe, character quality was evaluated according to the following criteria, and this was used as a measure of ejection stability.
[0143] 5 :ガサツキなし [0143] 5: No roughness
4 :僅かにガサツキが見える  4: Slight rustling is visible
3 :ガサツキが見えるが、文字として判別でき、ギリギリ使えるレベル  3: Although you can see rustling, it can be recognized as letters and can be used at the last minute
2:ガザツキがあり、文字がかすれて!/、て使えな!/、レベル  2: There is a rustling, the letters are faint! /, Can be used! /, Level
1
Figure imgf000035_0001
、レベル
1
Figure imgf000035_0001
,level
以上により得られた結果を、表 2に示す。  Table 2 shows the results obtained as described above.
[0144] [表 2] [0144] [Table 2]
Figure imgf000035_0002
Figure imgf000035_0002
[0145] 表 2に記載の結果より明らかなように、本発明で規定する構成力もなるインクは、比 較例に対し、形成した画像のにじみ耐性に優れ、かつ連続吐出後の吐出安定性に 優れていることが分かる。 [0145] As is clear from the results shown in Table 2, the ink having the constitutional power defined in the present invention is excellent in the bleeding resistance of the formed image and the ejection stability after continuous ejection compared to the comparative example. It turns out that it is excellent.
[0146] 実施例 2  [0146] Example 2
実施例 1に記載のインク 1 7の調製において、顔料である Pigment Blue 15 :4 (大日精化社製)に代えて、それぞれ Pigment Black 7 (三菱化学社製 # 52) Pi gment Black 7 (三菱化学社製 MA7) Pigment Blue 15 :4 (山陽色素社製) Pigment Red 122 (大日精化社製 CFR321)、 Pigment Violetl9 (大日精化 社製 CFR338— 3) Pigment Yellow 138 (大日精化社製 CFY340) Pigmen t Yellow 151 (ランクセス社製 E4GN— GT) Pigment Yellow 180 (大日精 化社製 CFY313— 2)、 Pigment Yellow 180 (クラリァント社製?^^0 61:111 Yell ow HG)を用いた以外は同様にして、各インクを調製した。この顔料種の異なる各 色インクを用いて、実施例 1と同様に評価を行った結果、実施例 1の結果と同様に、 本発明で規定する構成カゝらなるインクは、比較例に対し、形成した画像のにじみ耐性 に優れ、かつ連続吐出後の吐出安定性に優れて 、ることを確認することができた。 [0147] また、実施例 1に記載のインク 1〜7の調製において、ェポシキ化合物である C202 1Pに代えて、トリエチレングリコールジビュルエーテル、セロキサイド 2000 (ダイセル 化学工業社製)、セロキサイド 3000 (ダイセルィ匕学工業社製)、 EXP— 1を用いた以 外は同様にして各インクを調製し、この各インクを用いて、実施例 1と同様に評価を行 つた結果、実施例 1の結果と同様に、本発明で規定する構成力もなるインクは、比較 例に対し、形成した画像のにじみ耐性に優れ、かつ連続吐出後の吐出安定性に優 れて 、ることを確認することができた。 In the preparation of ink 17 described in Example 1, Pigment Black 7 (Mitsubishi Chemical Corporation # 52) Pigment Black 7 (Mitsubishi Chemical Co., Ltd.) was used instead of Pigment Blue 15: 4 (manufactured by Dainichi Seika). Chemical MA7) Pigment Blue 15: 4 (Sanyo Dye) Pigment Red 122 (Daiichi Seika CFR321), Pigment Violetl9 (Daiichi Seika CFR338-3) Pigment Yellow 138 (Daiichi Seika CFY340 ) Pigmen t Yellow 151 (Lanxess E4GN—GT) Pigment Yellow 180 (Daiichi Seika Chemical CFY313— 2), Pigment Yellow 180 (Clariant? ^^ 0 61: 111 Yell ow HG) Similarly, each ink was prepared. As a result of evaluation in the same manner as in Example 1 using each color ink having a different pigment type, the ink according to the constitution defined in the present invention is similar to the result in Example 1 with respect to the comparative example. It was confirmed that the formed image was excellent in bleeding resistance and excellent in discharge stability after continuous discharge. [0147] In addition, in the preparation of inks 1 to 7 described in Example 1, instead of the epoxy compound C202 1P, triethylene glycol dibule ether, Celoxide 2000 (manufactured by Daicel Chemical Industries), Celoxide 3000 (Daiceli) Each ink was prepared in the same manner except that EXP-1 was used, and the evaluation was performed in the same manner as in Example 1 using each ink. Similarly, it was confirmed that the ink having the constitutional power defined in the present invention was excellent in the bleeding resistance of the formed image and superior in the ejection stability after continuous ejection compared to the comparative example. .
[0148] [化 15]
Figure imgf000036_0001
[0148] [Chemical 15]
Figure imgf000036_0001

Claims

請求の範囲 下記一般式(1)で表される構造を有するスルホニゥム塩と、該一般式(1)で表される 構造を有するスルホ -ゥム塩を除くスルホ -ゥム塩とを含有することを特徴とする光酸 発生剤組成物。 Claims: A sulfonium salt having a structure represented by the following general formula (1) and a sulfo-um salt excluding the sulfo-um salt having the structure represented by the general formula (1) A photoacid generator composition characterized by the above.
[化 1][Chemical 1]
Figure imgf000037_0001
Figure imgf000037_0001
〔式中、 Ri〜R17は、それぞれ水素原子、ハロゲン原子、ニトロ基、水酸基、アルキル 基、アルコキシ基、ァシル基、フエノキシ基、エステル基、ァリール基、チォエーテル 基、チォカルボ-ル基、スルフィエル基、スルホ-ル基、アミノ基、アミド基、イミド基、 二トリル基、ホスフィ-基、ホスホ-ォ基、ホスホリル基、及び炭素数 1〜8のフルォロ アルキル基カゝらなる群カゝら選ばれる基であって、同一であっても異なっていてもよく、 これらの基の官能基以外の部分は、炭素数 1〜12の、飽和脂肪族炭化水素基、不 飽和脂肪族炭化水素基、脂環式炭化水素基、炭素環式芳香族炭化水素または複 素環式芳香族炭化水素基であってもよい。また、 R5及び R6は互いに縮合して共有結 合となってもよい。 Xは、 1価のァ-オンになりうる原子団である。〕 [In the formula, Ri to R 17 are a hydrogen atom, a halogen atom, a nitro group, a hydroxyl group, an alkyl group, an alkoxy group, an acyl group, a phenoxy group, an ester group, an aryl group, a thioether group, a thiocarbon group, and a sulfier group, respectively. , Sulfo group, amino group, amide group, imide group, nitrile group, phosphide group, phospho group, phosphoryl group, and a group of 1 to 8 fluoroalkyl groups. The groups other than the functional groups of these groups may be a saturated aliphatic hydrocarbon group, an unsaturated aliphatic hydrocarbon group having 1 to 12 carbon atoms, It may be an alicyclic hydrocarbon group, a carbocyclic aromatic hydrocarbon group or a bicyclic aromatic hydrocarbon group. R 5 and R 6 may be condensed with each other to form a covalent bond. X is an atomic group that can be a monovalent key. ]
前記一般式(1)で表される構造を有するスルホ二ゥム塩を除くスルホ二ゥム塩は、下 記一般式 (A)で表される構造を有するスルホニゥム塩であることを特徴とする請求の 範囲第 1項に記載の光酸発生剤組成物。 The sulfonium salt excluding the sulfonium salt having a structure represented by the general formula (1) is a sulfonium salt having a structure represented by the following general formula (A): The photoacid generator composition according to claim 1.
[化 2] [Chemical 2]
Figure imgf000037_0002
Figure imgf000037_0002
〔式中、 Ra、 Raは各々アルキル基または芳香族基を表し、 Z1は酸素原子または硫 黄原子を表し、 Ra、 Raは各々アルキル基、芳香族基、アルコキシ基、ァリールォキ [In the formula, Ra and Ra each represents an alkyl group or an aromatic group, and Z 1 represents an oxygen atom or a sulfur group. Represents yellow atom, Ra and Ra are alkyl group, aromatic group, alkoxy group, aryloxy
3 4  3 4
シ基、アルキルチオ基またはァリールチオ基を表し、 mlは 0〜4の整数を表し、 nl及 び piは各々 1〜5の整数を表し、 Yは、 Z— SO (Zは C F (nは 1〜10の整数)、ァ  Represents an integer of 0 to 4, nl and pi each represents an integer of 1 to 5, Y represents Z—SO (Z represents CF (n represents 1 to 5), 10)
3 n 2n+l  3 n 2n + l
ルキル基、またはアルキル置換もしくは無置換の芳香族基を表す)、 PF、 BF、 AsF  Represents an alkyl group or an alkyl-substituted or unsubstituted aromatic group), PF, BF, AsF
6 4 6 4
、 SbF、 B (C F )、 CIO、 Br、 CIまたは Iを表す。〕 , SbF, B (C F), CIO, Br, CI or I. ]
6 6 6 5 4 4  6 6 6 5 4 4
[3] 多環芳香族化合物、力ルバゾール誘導体及びチォキサントン誘導体から選ばれる少 なくとも 1種の化合物を含有することを特徴とする請求の範囲第 1項または第 2項に記 載の光酸発生剤組成物。  [3] Photoacid generation according to claim 1 or 2, characterized in that it contains at least one compound selected from polycyclic aromatic compounds, strong rubazole derivatives and thixanthone derivatives. Agent composition.
[4] 前記多環芳香族化合物、力ルバゾール誘導体及びチォキサントン誘導体力 選ば れる少なくとも 1種の化合物力 アントラセン、フルオレン、ピレン、タリセン、フエナント レン、アントラキノン、ペリレン、カルバゾール、フエノチアジン、チォキサントン、チアン トレン、ベンズアントラセン、ナフタセン、トリフエ-レン及び下記一般式(3)から選ば れる少なくとも 1つの化合物であることを特徴とする請求の範囲第 3項に記載の光酸 発生剤組成物。  [4] The polycyclic aromatic compound, the force rubazole derivative and the thixanthone derivative force At least one compound force selected 4. The photoacid generator composition according to claim 3, which is at least one compound selected from anthracene, naphthacene, triphenylene and the following general formula (3).
[化 3]
Figure imgf000038_0001
[Chemical 3]
Figure imgf000038_0001
〔式中、 R21〜R2°は、前記一般式(1)における Ri〜R17と同義である。〕 [Wherein, R 21 to R 2 ° has the same meaning as Ri to R 17 in the general formula (1). ]
前記一般式 (A)で表される構造を有するスルホニゥム塩が、下記一般式 (B)、(C)及 び (D)力も選ばれる少なくとも 1種であることを特徴とする請求の範囲第 2項〜第 4項 の!、ずれか 1項に記載の光酸発生剤組成物。  The sulfone salt having a structure represented by the general formula (A) is at least one selected from the following general formulas (B), (C) and (D): The photoacid generator composition according to item 1 to item 4 in item 1 to item 4.
[化 4]  [Chemical 4]
Figure imgf000038_0002
Figure imgf000038_0002
〔式中、 R は炭素数 1〜10のアルキル基を表し、 R 、R は各々炭素数 1〜10のァ ルキル基または炭素数 1〜10のアルコキシ基を表し、 Yは、 Z— SO (Zは C F (n [In the formula, R represents an alkyl group having 1 to 10 carbon atoms, and R 1 and R 2 each represent an alkyl group having 1 to 10 carbon atoms. Represents an alkyl group or an alkoxy group having 1 to 10 carbon atoms, Y is Z—SO (Z is CF (n
3 3 n 2n+l は 1〜: L0の整数)、アルキル基、またはアルキル置換もしくは無置換の芳香族基を表 す)、 PF、: BF 、 AsF 、 SbF、: B (C F ) 、 CIO 、 Br、 CIまたは Iを表す。〕  3 3 n 2n + l represents an integer of 1 to: L0), an alkyl group, or an alkyl-substituted or unsubstituted aromatic group), PF ,: BF, AsF, SbF ,: B (CF), CIO, Represents Br, CI or I. ]
6 4 6 6 6 5 4 4  6 4 6 6 6 5 4 4
[化 5]  [Chemical 5]
—般^ c) —General ^ c)
Figure imgf000039_0001
Figure imgf000039_0001
〔式中、 R は水素原子または炭素数 1〜: L0のアルキル基を表し、 R は置換基を表し [In the formula, R represents a hydrogen atom or an alkyl group having 1 to L0 carbon atoms, and R represents a substituent.
41 42  41 42
、 m4は 0〜4の整数を表し、 R 、 R は各々炭素数 1〜10のアルキル基を表し、 Yは  M4 represents an integer of 0 to 4, R 1 and R 2 each represents an alkyl group having 1 to 10 carbon atoms, and Y represents
43 44 4 43 44 4
、 Z-SO (Zは C F (nは 1〜10の整数)、アルキル基、またはアルキル置換もしく , Z-SO (Z is C F (n is an integer from 1 to 10), alkyl group, or alkyl substitution
3 n 2n+l  3 n 2n + l
は無置換の芳香族基を表す)、 PF 、 BF 、 AsF 、 SbF 、 B (C F ) 、 CIO 、 Br、  Represents an unsubstituted aromatic group), PF, BF, AsF, SbF, B (C F), CIO, Br,
6 4 6 6 6 5 4 4 αま たは Iを表す。〕  6 4 6 6 6 5 4 4 Represents α or I. ]
[化 6]  [Chemical 6]
"^式 "^ Expression
Figure imgf000039_0002
Figure imgf000039_0002
〔式中、 R は水素原子または炭素数 1〜: L0のアルキル基を表し、 R は置換基を表し [In the formula, R represents a hydrogen atom or an alkyl group having 1 to L0 carbon atoms, and R represents a substituent.
51 52  51 52
、 m5は 0〜4の整数を表し、 R 、 R は各々炭素数 1〜10のアルキル基を表し、 Yは  , M5 represents an integer of 0 to 4, R and R each represents an alkyl group having 1 to 10 carbon atoms, and Y represents
53 54 5 53 54 5
、 Z-SO (Zは C F (nは 1〜10の整数)、アルキル基、またはアルキル置換もしく , Z-SO (Z is C F (n is an integer from 1 to 10), alkyl group, or alkyl substitution
3 n 2n+l  3 n 2n + l
は無置換の芳香族基を表す)、 PF 、 BF 、 AsF 、 SbF 、 B (C F ) 、 CIO 、 Br、  Represents an unsubstituted aromatic group), PF, BF, AsF, SbF, B (C F), CIO, Br,
6 4 6 6 6 5 4 4 aま たは Iを表す。〕  6 4 6 6 6 5 4 4 Represents a or I. ]
[6] 請求の範囲第 1項〜第 5項のいずれか 1項に記載の光酸発生剤組成物と、カチオン 重合性化合物とを含有することを特徴とするカチオン系光重合性組成物。  [6] A cationic photopolymerizable composition comprising the photoacid generator composition according to any one of claims 1 to 5 and a cationically polymerizable compound.
[7] 前記カチオン重合性化合物が、エポキシィ匕合物、ォキセタン化合物及びビュルエー テルィ匕合物力 選ばれる少なくとも 1種であることを特徴とする請求の範囲第 6項に記 載のカチオン系光重合性組成物。 [7] The cationically polymerizable compound comprises an epoxy compound, an oxetane compound, and a buler The cationic photopolymerizable composition according to claim 6, characterized in that it is at least one selected from telly compound strength.
[8] 顔料を含有することを特徴とする請求の範囲第 6項または第 7項に記載のカチオン系 光重合性組成物。 [8] The cationic photopolymerizable composition according to claim 6 or 7, characterized by containing a pigment.
[9] 請求の範囲第 1項〜第 5項のいずれか 1項に記載の光酸発生剤組成物を用いること を特徴とするインクジェットインク。  [9] An ink-jet ink comprising the photoacid generator composition according to any one of claims 1 to 5.
[10] 請求の範囲第 6項〜第 8項のいずれか 1項に記載のカチオン系光重合性組成物を 用いることを特徴とするインクジェットインク。 [10] An ink-jet ink comprising the cationic photopolymerizable composition according to any one of claims 6 to 8.
[11] 繊維状記録材料に、請求の範囲第 9項または第 10項に記載のインクジェットインクを 用いてインクジェット記録することを特徴とするインクジェット記録方法。 [11] An ink jet recording method comprising performing ink jet recording on a fibrous recording material using the ink jet ink according to claim 9 or 10.
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JP2010121078A (en) * 2008-11-21 2010-06-03 Konica Minolta Ij Technologies Inc Photoacid generator for use in active ray-curable type inkjet ink, active ray-curable type inkjet ink, inkjet recording method, method for manufacturing triaryl sulfonium salt, and solid photoacid generator for use in active ray-curable type inkjet ink

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