WO2007050704A3 - Synthese de microstructure par lithographie a ecoulement et polymerisation - Google Patents

Synthese de microstructure par lithographie a ecoulement et polymerisation Download PDF

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Publication number
WO2007050704A3
WO2007050704A3 PCT/US2006/041668 US2006041668W WO2007050704A3 WO 2007050704 A3 WO2007050704 A3 WO 2007050704A3 US 2006041668 W US2006041668 W US 2006041668W WO 2007050704 A3 WO2007050704 A3 WO 2007050704A3
Authority
WO
WIPO (PCT)
Prior art keywords
polymerization
microstructure
monomer stream
shape
flow lithography
Prior art date
Application number
PCT/US2006/041668
Other languages
English (en)
Other versions
WO2007050704A2 (fr
Inventor
Patrick S Doyle
Daniel C Pregibon
Dhananjay Dendukuri
Original Assignee
Massachusetts Inst Technology
Patrick S Doyle
Daniel C Pregibon
Dhananjay Dendukuri
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Massachusetts Inst Technology, Patrick S Doyle, Daniel C Pregibon, Dhananjay Dendukuri filed Critical Massachusetts Inst Technology
Priority to CA2626799A priority Critical patent/CA2626799C/fr
Priority to JP2008537919A priority patent/JP4954216B2/ja
Priority to EP06826664.2A priority patent/EP1946186B1/fr
Priority to KR1020087012355A priority patent/KR100928389B1/ko
Priority to AU2006306204A priority patent/AU2006306204B2/en
Publication of WO2007050704A2 publication Critical patent/WO2007050704A2/fr
Publication of WO2007050704A3 publication Critical patent/WO2007050704A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B6/00—Heating by electric, magnetic or electromagnetic fields
    • H05B6/64—Heating using microwaves
    • H05B6/66—Circuits
    • H05B6/68—Circuits for monitoring or control
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C99/00—Subject matter not provided for in other groups of this subclass
    • B81C99/0075—Manufacture of substrate-free structures
    • B81C99/0095—Aspects relating to the manufacture of substrate-free structures, not covered by groups B81C99/008 - B81C99/009
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2035—Exposure; Apparatus therefor simultaneous coating and exposure; using a belt mask, e.g. endless
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
    • B81C2201/00—Manufacture or treatment of microstructural devices or systems
    • B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
    • B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
    • B81C2201/0156—Lithographic techniques
    • B81C2201/0159—Lithographic techniques not provided for in B81C2201/0157

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Electromagnetism (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Polymerisation Methods In General (AREA)
  • Micromachines (AREA)

Abstract

Dans un procédé de synthétisation de microstructures polymères, un monomère s'écoule à une vitesse sélectionnée à travers un canal. Au moins une impulsion façonnée d'éclairage est projetée vers le monomère s'écoulant le conformant selon au moins une microstructure correspondant à la forme de l'impulsion d'éclairage tout en polymérisant la forme microstructurales par impulsion d'éclairage.
PCT/US2006/041668 2005-10-25 2006-10-25 Synthese de microstructure par lithographie a ecoulement et polymerisation WO2007050704A2 (fr)

Priority Applications (5)

Application Number Priority Date Filing Date Title
CA2626799A CA2626799C (fr) 2005-10-25 2006-10-25 Synthese de microstructure par lithographie a ecoulement et polymerisation
JP2008537919A JP4954216B2 (ja) 2005-10-25 2006-10-25 フローリソグラフィおよび重合による高分子微細構造体の合成方法
EP06826664.2A EP1946186B1 (fr) 2005-10-25 2006-10-25 Synthese de microstructure par lithographie a ecoulement et polymerisation
KR1020087012355A KR100928389B1 (ko) 2005-10-25 2006-10-25 흐름 리소그래피 및 중합에 의한 마이크로구조 합성
AU2006306204A AU2006306204B2 (en) 2005-10-25 2006-10-25 Microstructure synthesis by flow lithography and polymerization

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US73005205P 2005-10-25 2005-10-25
US60/730,052 2005-10-25

Publications (2)

Publication Number Publication Date
WO2007050704A2 WO2007050704A2 (fr) 2007-05-03
WO2007050704A3 true WO2007050704A3 (fr) 2007-08-09

Family

ID=37813776

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/041668 WO2007050704A2 (fr) 2005-10-25 2006-10-25 Synthese de microstructure par lithographie a ecoulement et polymerisation

Country Status (6)

Country Link
EP (1) EP1946186B1 (fr)
JP (1) JP4954216B2 (fr)
KR (1) KR100928389B1 (fr)
AU (1) AU2006306204B2 (fr)
CA (1) CA2626799C (fr)
WO (1) WO2007050704A2 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9290816B2 (en) 2010-06-07 2016-03-22 Firefly Bioworks Inc. Nucleic acid detection and quantification by post-hybridization labeling and universal encoding
US9310361B2 (en) 2006-10-05 2016-04-12 Massachusetts Institute Of Technology Multifunctional encoded particles for high-throughput analysis

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7709544B2 (en) 2005-10-25 2010-05-04 Massachusetts Institute Of Technology Microstructure synthesis by flow lithography and polymerization
WO2008146196A1 (fr) 2007-05-25 2008-12-04 Koninklijke Philips Electronics, N.V. Mécanisme de décision de changement de canal et procédé pour un réseau sans fil
KR101104305B1 (ko) * 2009-09-04 2012-01-11 충남대학교산학협력단 다공성 표면을 갖는 야누스 형태의 조직공학용 고분자 마이크로 섬유의 제조방법
JP5661795B2 (ja) * 2009-12-28 2015-01-28 アチラ ラボズ プライベート リミテッドＡｃｈｉｒａ Ｌａｂｓ Ｐｖｔ． Ｌｔｄ． 診断用素子、及び診断用素子を含む診断装置
JP2013515953A (ja) * 2009-12-28 2013-05-09 アチラ ラボズ プライベート リミテッド 診断用ゲル組成物、前記診断用ゲル組成物の製造方法
US10712483B2 (en) * 2015-08-24 2020-07-14 Samsung Electronics Co., Ltd. Photosensitive compositions, quantum dot polymer composite pattern prepared therefrom, and electronic devices including the same
KR102009563B1 (ko) 2017-08-08 2019-08-09 고려대학교 산학협력단 저온 유체 리소그래피 방법 및 저온 유체 리소그래피 시스템
KR102361429B1 (ko) 2018-10-22 2022-02-10 고려대학교 산학협력단 미세입자 제조방법
KR102157961B1 (ko) * 2019-04-29 2020-09-18 연세대학교 산학협력단 컬러 필터를 위한 멀티 도메인 나노 패턴 형성 장치 및 방법

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474886A (en) * 1977-11-28 1979-06-15 Asahi Chem Ind Co Ltd Preparation of polymer micro-spheres
US4929400A (en) * 1986-04-28 1990-05-29 California Institute Of Technology Production of monodisperse, polymeric microspheres
WO2000074927A1 (fr) * 1999-06-04 2000-12-14 Eugenia Kumacheva Procede servant a produire un ensemble tridimensionnel de particules en groupements ordonnes
WO2004076056A2 (fr) * 2003-02-26 2004-09-10 Lake Shore Cryotronics Inc. Reacteur chimique microfluidique pour la fabrication de nanoparticules produites chimiquement
US20050043428A1 (en) * 2003-06-10 2005-02-24 Caneba Gerard T. Spatially controlled, in situ synthesis of polymers
US20050172476A1 (en) * 2002-06-28 2005-08-11 President And Fellows Of Havard College Method and apparatus for fluid dispersion
US20050214737A1 (en) * 2004-03-26 2005-09-29 Dejneka Matthew J Transparent filtered capillaries
WO2005103106A1 (fr) * 2004-04-23 2005-11-03 Eugenia Kumacheva Procede de production de particules polymeres ayant une taille, une forme, une morphologie et une composition selectionnees

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60247515A (ja) * 1984-05-23 1985-12-07 Oosakafu 光学的造形法
JP3815652B2 (ja) * 1999-12-02 2006-08-30 独立行政法人科学技術振興機構 ２光子マイクロ光造形方法およびその装置、２光子マイクロ光造形法によって形成した部品および可動機構
JP2004059802A (ja) * 2002-07-30 2004-02-26 Japan Science & Technology Corp 固体微粒子の製造方法およびその装置
KR100570952B1 (ko) * 2003-02-25 2006-04-13 시즈오까 다이가꾸쵸가 다이효스루 니혼고꾸 중합체의 제조 방법
JP4494998B2 (ja) * 2004-02-10 2010-06-30 綜研化学株式会社 非球状ポリマー定形粒子のマイクロチャンネル式製造方法及びその非球状ポリマー定形粒子。
JP2007090306A (ja) * 2005-09-30 2007-04-12 Kri Inc 微小構造体の製造方法およびマイクロリアクター

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5474886A (en) * 1977-11-28 1979-06-15 Asahi Chem Ind Co Ltd Preparation of polymer micro-spheres
US4929400A (en) * 1986-04-28 1990-05-29 California Institute Of Technology Production of monodisperse, polymeric microspheres
WO2000074927A1 (fr) * 1999-06-04 2000-12-14 Eugenia Kumacheva Procede servant a produire un ensemble tridimensionnel de particules en groupements ordonnes
US20050172476A1 (en) * 2002-06-28 2005-08-11 President And Fellows Of Havard College Method and apparatus for fluid dispersion
WO2004076056A2 (fr) * 2003-02-26 2004-09-10 Lake Shore Cryotronics Inc. Reacteur chimique microfluidique pour la fabrication de nanoparticules produites chimiquement
US20050043428A1 (en) * 2003-06-10 2005-02-24 Caneba Gerard T. Spatially controlled, in situ synthesis of polymers
US20050214737A1 (en) * 2004-03-26 2005-09-29 Dejneka Matthew J Transparent filtered capillaries
WO2005103106A1 (fr) * 2004-04-23 2005-11-03 Eugenia Kumacheva Procede de production de particules polymeres ayant une taille, une forme, une morphologie et une composition selectionnees

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9310361B2 (en) 2006-10-05 2016-04-12 Massachusetts Institute Of Technology Multifunctional encoded particles for high-throughput analysis
US9290816B2 (en) 2010-06-07 2016-03-22 Firefly Bioworks Inc. Nucleic acid detection and quantification by post-hybridization labeling and universal encoding
US9476101B2 (en) 2010-06-07 2016-10-25 Firefly Bioworks, Inc. Scanning multifunctional particles

Also Published As

Publication number Publication date
CA2626799C (fr) 2012-10-23
AU2006306204B2 (en) 2011-05-12
JP2009513789A (ja) 2009-04-02
AU2006306204A1 (en) 2007-05-03
KR20080070684A (ko) 2008-07-30
EP1946186A2 (fr) 2008-07-23
KR100928389B1 (ko) 2009-11-23
JP4954216B2 (ja) 2012-06-13
WO2007050704A2 (fr) 2007-05-03
CA2626799A1 (fr) 2007-05-03
EP1946186B1 (fr) 2017-08-09

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