WO2007034379A3 - Systeme de detection du mouvement d'un corps - Google Patents

Systeme de detection du mouvement d'un corps Download PDF

Info

Publication number
WO2007034379A3
WO2007034379A3 PCT/IB2006/053267 IB2006053267W WO2007034379A3 WO 2007034379 A3 WO2007034379 A3 WO 2007034379A3 IB 2006053267 W IB2006053267 W IB 2006053267W WO 2007034379 A3 WO2007034379 A3 WO 2007034379A3
Authority
WO
WIPO (PCT)
Prior art keywords
detecting motion
elongated grating
grating strip
elongated
motion
Prior art date
Application number
PCT/IB2006/053267
Other languages
English (en)
Other versions
WO2007034379A2 (fr
Inventor
Rene G Klaver
Theo A M Ruijl
Michael J M Renkens
Eijk Jan Van
Original Assignee
Koninkl Philips Electronics Nv
Philips Corp
Rene G Klaver
Theo A M Ruijl
Michael J M Renkens
Eijk Jan Van
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninkl Philips Electronics Nv, Philips Corp, Rene G Klaver, Theo A M Ruijl, Michael J M Renkens, Eijk Jan Van filed Critical Koninkl Philips Electronics Nv
Priority to EP06809297A priority Critical patent/EP1931947A2/fr
Priority to US12/067,358 priority patent/US7902494B2/en
Priority to JP2008531837A priority patent/JP2009509156A/ja
Publication of WO2007034379A2 publication Critical patent/WO2007034379A2/fr
Publication of WO2007034379A3 publication Critical patent/WO2007034379A3/fr

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01D—MEASURING NOT SPECIALLY ADAPTED FOR A SPECIFIC VARIABLE; ARRANGEMENTS FOR MEASURING TWO OR MORE VARIABLES NOT COVERED IN A SINGLE OTHER SUBCLASS; TARIFF METERING APPARATUS; MEASURING OR TESTING NOT OTHERWISE PROVIDED FOR
    • G01D5/00—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable
    • G01D5/26—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light
    • G01D5/32—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light
    • G01D5/34—Mechanical means for transferring the output of a sensing member; Means for converting the output of a sensing member to another variable where the form or nature of the sensing member does not constrain the means for converting; Transducers not specially adapted for a specific variable characterised by optical transfer means, i.e. using infrared, visible, or ultraviolet light with attenuation or whole or partial obturation of beams of light the beams of light being detected by photocells
    • G01D5/36—Forming the light into pulses
    • G01D5/38—Forming the light into pulses by diffraction gratings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Optical Transform (AREA)

Abstract

L'invention concerne un système (1) de détection du mouvement d'un corps (2) comprenant une première bande gravée allongée (4) couplée audit corps et une seconde bande gravée allongée (5) séparée et sensiblement stationnaire croisant la première bande gravée allongée. Le système comprend également un moyen de détection optique (6) destiné à recevoir un ou plusieurs faisceaux lumineux de diffraction au niveau desdites première et seconde bande gravées allongées pour détecter le mouvement dudit corps. L'invention concerne également un procédé de détection du mouvement d'un corps (2) et un système de traitement ou de contrôle d'un corps.
PCT/IB2006/053267 2005-09-21 2006-09-13 Systeme de detection du mouvement d'un corps WO2007034379A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP06809297A EP1931947A2 (fr) 2005-09-21 2006-09-13 Systeme de detection du mouvement d'un corps
US12/067,358 US7902494B2 (en) 2005-09-21 2006-09-13 System for detecting motion of a body
JP2008531837A JP2009509156A (ja) 2005-09-21 2006-09-13 物体の運動を検出するシステム

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US71899005P 2005-09-21 2005-09-21
US60/718,990 2005-09-21

Publications (2)

Publication Number Publication Date
WO2007034379A2 WO2007034379A2 (fr) 2007-03-29
WO2007034379A3 true WO2007034379A3 (fr) 2007-09-07

Family

ID=37714941

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/IB2006/053267 WO2007034379A2 (fr) 2005-09-21 2006-09-13 Systeme de detection du mouvement d'un corps

Country Status (6)

Country Link
US (1) US7902494B2 (fr)
EP (1) EP1931947A2 (fr)
JP (1) JP2009509156A (fr)
KR (1) KR20080045219A (fr)
CN (1) CN101268337A (fr)
WO (1) WO2007034379A2 (fr)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080045219A (ko) * 2005-09-21 2008-05-22 코닌클리케 필립스 일렉트로닉스 엔.브이. 물체의 움직임을 검출하기 위한 시스템
US7636165B2 (en) * 2006-03-21 2009-12-22 Asml Netherlands B.V. Displacement measurement systems lithographic apparatus and device manufacturing method
TWI425318B (zh) * 2006-06-09 2014-02-01 尼康股份有限公司 移動體裝置、曝光裝置和曝光方法以及元件製造方法
DE102008008873A1 (de) 2007-05-16 2008-11-20 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung
DE102007023300A1 (de) 2007-05-16 2008-11-20 Dr. Johannes Heidenhain Gmbh Positionsmesseinrichtung und Anordnung derselben
US9304412B2 (en) * 2007-08-24 2016-04-05 Nikon Corporation Movable body drive method and movable body drive system, pattern formation method and apparatus, exposure method and apparatus, device manufacturing method, and measuring method
WO2009075103A1 (fr) 2007-12-11 2009-06-18 Nikon Corporation Dispositif de corps mobile, dispositif d'exposition, dispositif de formation de motif et procédé de fabrication de dispositif
NL2005013A (en) * 2009-07-31 2011-02-02 Asml Netherlands Bv Positioning system, lithographic apparatus and method.
US9122172B2 (en) 2010-06-04 2015-09-01 Advantech Global, Ltd Reflection shadow mask alignment using coded apertures
US9580792B2 (en) 2010-06-04 2017-02-28 Advantech Global, Ltd Shadow mask alignment using variable pitch coded apertures
KR101839818B1 (ko) * 2010-06-04 2018-03-19 어드밴텍 글로벌, 리미티드 코딩된 어퍼처를 이용한 섀도우 마스크 정렬
NL2006743A (en) * 2010-06-09 2011-12-12 Asml Netherlands Bv Position sensor and lithographic apparatus.
US8687277B2 (en) * 2010-08-11 2014-04-01 Kenneth C. Johnson Stacked-grating light modulator
CN102095378B (zh) * 2010-08-27 2013-07-03 中国科学院长春光学精密机械与物理研究所 一种光栅线位移传感器
DE102010043469A1 (de) * 2010-11-05 2012-05-10 Dr. Johannes Heidenhain Gmbh Optische Positionsmesseinrichtung
NL2008353A (nl) * 2011-03-30 2012-10-02 Asml Netherlands Bv Lithographic apparatus and method.
NL2009197A (en) 2011-08-25 2013-02-27 Asml Netherlands Bv System for detection motion, lithographic apparatus and device manufacturing method.
KR102020076B1 (ko) * 2011-09-06 2019-09-09 가부시키가이샤 니콘 고 콘트라스트 인코더 헤드
TWI468880B (zh) 2012-06-15 2015-01-11 Asml Netherlands Bv 定位系統、微影裝置及器件製造方法
CN106289330B (zh) * 2015-06-26 2019-02-19 北京纳米能源与系统研究所 运动矢量监测单元、监测方法及监测装置
DE102015219810A1 (de) 2015-10-13 2017-04-13 Dr. Johannes Heidenhain Gmbh X-Y-Tisch mit einer Positionsmesseinrichtung
WO2018156702A1 (fr) 2017-02-23 2018-08-30 Nikon Corporation Mesure d'un changement de caractéristique géométrique et/ou de position d'une pièce
US10746534B2 (en) 2017-07-03 2020-08-18 Saudi Arabian Oil Company Smart coating device for storage tank monitoring and calibration

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5738825A (en) * 1993-07-20 1998-04-14 Balzers Aktiengesellschaft Optical biosensor matrix
WO1998039689A1 (fr) * 1997-03-07 1998-09-11 Asm Lithography B.V. Appareil de projection lithographique a unite d'alignement hors axe
WO2001092821A1 (fr) * 2000-05-29 2001-12-06 Forskarpatent I Väst Ab Procede de mesure de position et/ou d'angle au moyen de reseaux
US20040179184A1 (en) * 2002-12-16 2004-09-16 Asml Netherlands B.V. Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby

Family Cites Families (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB991907A (en) * 1961-02-08 1965-05-12 Cooke Conrad Reginald Apparatus for detecting and indicating the extent of relative movement
DE3530439A1 (de) * 1985-08-26 1987-02-26 Siemens Ag Vorrichtung zum justieren einer mit mindestens einer justiermarke versehenen maske bezueglich eines mit mindestens einer gitterstruktur versehenen halbleiterwafers
DE3542514A1 (de) * 1985-12-02 1987-06-04 Zeiss Carl Fa Wegmesseinrichtung
JPH0293307A (ja) * 1988-09-30 1990-04-04 Toshiba Corp 間隙設定方法および装置、位置合せ方法および装置、相対位置合せ方法および装置
NL9000503A (nl) * 1990-03-05 1991-10-01 Asm Lithography Bv Apparaat en werkwijze voor het afbeelden van een maskerpatroon op een substraat.
JPH0432217A (ja) * 1990-05-29 1992-02-04 Toshiba Corp 入射角度設定装置
JPH04142425A (ja) * 1990-10-03 1992-05-15 Toshiba Corp 二軸リニアエンコーダ
JPH04291103A (ja) * 1991-03-20 1992-10-15 Fujitsu Ltd 位置検出装置
EP0577088B2 (fr) * 1992-06-30 2010-10-20 Canon Kabushiki Kaisha Appareil de détection d'information de déplacement
US5652426A (en) * 1993-04-19 1997-07-29 Ricoh Company, Ltd. Optical encoder having high resolution
JPH08210814A (ja) * 1994-10-12 1996-08-20 Canon Inc 光学式変位測定装置
JP3215289B2 (ja) * 1995-04-17 2001-10-02 オークマ株式会社 スケール及びエンコーダ
JP4055827B2 (ja) * 1996-02-15 2008-03-05 エーエスエムエル ネザーランズ ビー． ブイ． リソグラフィ装置の放射線量決定方法、及び該方法実施用テストマスク及び装置
EP1019669B1 (fr) * 1997-09-29 2002-07-24 Dr. Johannes Heidenhain GmbH Dispositif de detection de la position de deux corps
US7016025B1 (en) * 1999-06-24 2006-03-21 Asml Holding N.V. Method and apparatus for characterization of optical systems
ATE448466T1 (de) * 1999-09-16 2009-11-15 Heidenhain Gmbh Dr Johannes Vorrichtung zur positionsbestimmung und ermittlung von führungsfehlern
GB9928483D0 (en) * 1999-12-03 2000-02-02 Renishaw Plc Opto-electronic scale reading apparatus
US6961490B2 (en) * 2000-01-27 2005-11-01 Unaxis-Balzers Aktiengesellschaft Waveguide plate and process for its production and microtitre plate
JP4588227B2 (ja) 2000-02-03 2010-11-24 株式会社ミツトヨ 変位測定装置
US7317531B2 (en) * 2002-12-05 2008-01-08 Kla-Tencor Technologies Corporation Apparatus and methods for detecting overlay errors using scatterometry
TW556296B (en) * 2000-12-27 2003-10-01 Koninkl Philips Electronics Nv Method of measuring alignment of a substrate with respect to a reference alignment mark
TW526573B (en) * 2000-12-27 2003-04-01 Koninkl Philips Electronics Nv Method of measuring overlay
US6603561B2 (en) * 2001-02-20 2003-08-05 Thomas D. Ditto Chromatic diffraction range finder
DE10132521A1 (de) * 2001-07-09 2003-01-30 Heidenhain Gmbh Dr Johannes Positionsmesseinrichtung
JP3803607B2 (ja) * 2002-04-15 2006-08-02 株式会社ジェイテクト ２次元エンコーダ
DE10351560A1 (de) * 2003-11-03 2005-06-02 Metronic Ag Impulsgeber
US7737566B2 (en) * 2005-06-01 2010-06-15 Asml Netherlands B.V. Alignment devices and methods for providing phase depth control
KR20080045219A (ko) * 2005-09-21 2008-05-22 코닌클리케 필립스 일렉트로닉스 엔.브이. 물체의 움직임을 검출하기 위한 시스템
US7863763B2 (en) * 2005-11-22 2011-01-04 Asml Netherlands B.V. Binary sinusoidal sub-wavelength gratings as alignment marks
US7247843B1 (en) * 2006-05-11 2007-07-24 Massachusetts Institute Of Technology Long-range gap detection with interferometric sensitivity using spatial phase of interference patterns
US7564554B2 (en) * 2006-06-30 2009-07-21 Intel Corporation Wafer-based optical pattern recognition targets using regions of gratings

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5738825A (en) * 1993-07-20 1998-04-14 Balzers Aktiengesellschaft Optical biosensor matrix
WO1998039689A1 (fr) * 1997-03-07 1998-09-11 Asm Lithography B.V. Appareil de projection lithographique a unite d'alignement hors axe
WO2001092821A1 (fr) * 2000-05-29 2001-12-06 Forskarpatent I Väst Ab Procede de mesure de position et/ou d'angle au moyen de reseaux
US20040179184A1 (en) * 2002-12-16 2004-09-16 Asml Netherlands B.V. Lithographic apparatus with alignment subsystem, device manufacturing method, and device manufactured thereby

Also Published As

Publication number Publication date
CN101268337A (zh) 2008-09-17
US7902494B2 (en) 2011-03-08
JP2009509156A (ja) 2009-03-05
EP1931947A2 (fr) 2008-06-18
KR20080045219A (ko) 2008-05-22
US20090001260A1 (en) 2009-01-01
WO2007034379A2 (fr) 2007-03-29

Similar Documents

Publication Publication Date Title
WO2007034379A3 (fr) Systeme de detection du mouvement d'un corps
DK2498424T3 (da) Fremgangsmåde og system til kohærent optisk detektion og signalprocessering
DE60128279D1 (de) Optischer Sensor zum Nachweis mehrerer Analyte
NO20031017L (no) Kvalifiseringssystem for testremser
NO20030903D0 (no) Kvalifiseringssystem for testremser
AU2003265989A1 (en) Illumination system for optical inspection
AU2003292018A1 (en) Measuring device for the optical analysis of a test strip
DE602005023615D1 (de) Lasersuchkopf
PL1877415T3 (pl) Nowe strategie znakowania dla czułego wykrywania analitów
WO2006138294A3 (fr) Appareil de bio-essais recourant a l'interferometrie a dephasage
WO2006006148A3 (fr) Procede et appareil d'inspection multimode
DE50204802D1 (de) Sensor zur sitzbelegungserkennung
CY1105025T1 (el) Αναλυση λεπτινης βασιζομενη στην ανιχνευση εκφρασης ang-2
ITCT20000012V0 (it) Sistema di rilevazione esatta misura calzatura
ATE257596T1 (de) Erfassungssystem für sortiervorrichtung
DE502006004809D1 (de) Optischer sensor zur erfassung von objekten in einem überwachungsbereich
EP2189782A3 (fr) Puce à capteur éclairé à réflexion totale
FR2890446B1 (fr) Methode de detection d'interaction intracellulaire entre bio-molecules
WO2008073425A3 (fr) Dosage grande sensibilité de la protéolyse
WO2006103612A3 (fr) Systeme optique pour representer une lumiere de signalisation sur un detecteur
DE69809640T2 (de) Methode zum Nachweis eines Analyten durch Immunchromatographie
SG111257A1 (en) Inspection method and apparatus for determining incipient mechanical failure
FR2844880B1 (fr) PROCEDE PERMETTANT D'EVALUER LA REPONSE TEMPORELLE D'UN CAPTEUR DE NOx
FR2895166B1 (fr) Procede de detection de defaut de fobnctionnement d'un ralentisseur electromagnetique
DE60214316D1 (de) Chirp-Messverfahren

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 2006809297

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 1020087006596

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2008531837

Country of ref document: JP

WWE Wipo information: entry into national phase

Ref document number: 200680034542.4

Country of ref document: CN

NENP Non-entry into the national phase

Ref country code: DE

WWP Wipo information: published in national office

Ref document number: 2006809297

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 12067358

Country of ref document: US