WO2007023863A1 - Production method and transport method for very thin copper foil laminated film - Google Patents

Production method and transport method for very thin copper foil laminated film Download PDF

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Publication number
WO2007023863A1
WO2007023863A1 PCT/JP2006/316517 JP2006316517W WO2007023863A1 WO 2007023863 A1 WO2007023863 A1 WO 2007023863A1 JP 2006316517 W JP2006316517 W JP 2006316517W WO 2007023863 A1 WO2007023863 A1 WO 2007023863A1
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WIPO (PCT)
Prior art keywords
foil
copper foil
copper
laminated film
film
Prior art date
Application number
PCT/JP2006/316517
Other languages
French (fr)
Japanese (ja)
Inventor
Hiroto Shimokawa
Original Assignee
Ube Industries, Ltd.
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Publication date
Application filed by Ube Industries, Ltd. filed Critical Ube Industries, Ltd.
Publication of WO2007023863A1 publication Critical patent/WO2007023863A1/en

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/04Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B15/08Layered products comprising a layer of metal comprising metal as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B15/00Layered products comprising a layer of metal
    • B32B15/20Layered products comprising a layer of metal comprising aluminium or copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B7/00Layered products characterised by the relation between layers; Layered products characterised by the relative orientation of features between layers, or by the relative values of a measurable parameter between layers, i.e. products comprising layers having different physical, chemical or physicochemical properties; Layered products characterised by the interconnection of layers
    • B32B7/04Interconnection of layers
    • B32B7/06Interconnection of layers permitting easy separation
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/022Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates
    • H05K3/025Processes for manufacturing precursors of printed circuits, i.e. copper-clad substrates by transfer of thin metal foil formed on a temporary carrier, e.g. peel-apart copper
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00Properties of the layers or laminate
    • B32B2307/70Other properties
    • B32B2307/718Weight, e.g. weight per square meter
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B32LAYERED PRODUCTS
    • B32BLAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2457/00Electrical equipment
    • B32B2457/08PCBs, i.e. printed circuit boards
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • H05K3/282Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability

Definitions

  • the present invention relates to a method for producing an ultra-thin copper foil laminated film that can be stored for a long period of time, is light and easy to transport, and a method for transferring these.
  • Copper foil laminated films with carrier foil are manufactured for the purpose of mounting electronic components such as ICs or LSIs.
  • a copper foil laminated film with carrier foil is manufactured by laminating a copper foil with carrier foil and a heat resistant film by a manufacturer of the heat resistant film, and is transported by the manufacturer of the heat resistant film to the wiring processing manufacturer.
  • the carrier foil tape is manufactured by peeling the carrier foil and wiring the copper foil at a wiring manufacturer.
  • Patent Document 1 discloses a method for producing a flexible laminate in which a metal foil is bonded to at least one surface of a heat-resistant adhesive film, the heat-resistant adhesive film And laminating a laminate having a metal foil and a release layer between at least a pair of metal rolls and a protective film so that the metal foil and the heat-resistant adhesive film are in contact with each other.
  • a method for producing a flexible laminated board comprising at least a step of separating the protective film and a step of separating the release layer from a metal foil cover.
  • Patent Document 1 Japanese Patent Laid-Open No. 2005-205731
  • thin copper foil with carrier foil is manufactured by a copper foil manufacturer, and the manufacturer of heat resistant film is a thin copper foil with carrier foil and heat resistant film. Manufactured and stored together, transported and stored at a wiring processing manufacturer, and then covered by a wiring manufacturer.
  • the carrier foil When the carrier foil is peeled off, the copper foil laminated film with the carrier foil has a shadow such as discoloration on the copper foil surface.
  • the copper foil laminated film with carrier foil is transported, stored and used by the heat-resistant film manufacturer to the wiring processing manufacturer without peeling the carrier foil. For this reason, the carrier foil that is not necessary for wiring processing increases the transportation cost, and handling of heavy objects makes it difficult to carry and can cause danger to workers.
  • An object of the present invention is to provide a method for producing an ultrathin copper foil laminated film which is a copper foil laminated film with a carrier foil, can be stored for a long period of time, is light and easy to carry, and a method for transferring these. To do.
  • the first of the present invention is a method for producing an ultrathin copper foil laminate film, which is produced by the following step (A) or step (B), Is the way
  • a second step (A) is performed in which the copper surface is subjected to a fouling treatment after a short time during which the copper surface is not oxidized.
  • a third step (B) is performed in which the copper surface is further subjected to antifouling treatment within a short time during which the copper surface is not oxidized.
  • the ultra-thin copper foil laminated film when the ultra-thin copper foil laminated film is shipped, the ultra-thin copper foil laminated film is enclosed in the packaging bag after performing the following step (A) or step (B). And transporting the ultrathin copper foil laminated film.
  • a second step (A) is performed in which the copper surface is subjected to a fouling treatment after a short time during which the copper surface is not oxidized.
  • a third step (B) is performed in which the copper surface is further subjected to antifouling treatment within a short time during which the copper surface is not oxidized.
  • the present invention removes the carrier foil in advance and performs the antifouling treatment on the copper foil surface
  • An ultra-thin copper foil laminated film in which a long ultra-thin copper foil is laminated with a heat-resistant film can be produced.
  • the copper surface is further subjected to antifouling treatment within a short time that the copper surface is not oxidized, and further washed with water if necessary and dried. And performing the third step (B).
  • step (A) is a simpler method with fewer steps than the step (B)
  • the removal process does not affect the copper foil.
  • the copper surface is oxidized as a result of removing the carrier foil in the first step
  • Examples of possible oxidation of copper on the surface of the copper include the case where the fouling treatment cannot be performed quickly after the removal of the carrier foil, or the case where the oxidation is unavoidable in the process employed when removing the carrier foil.
  • the received ultrathin copper foil with carrier foil is first oxidized.
  • U prefer to adopt (B).
  • a known method can be used as the method for removing the carrier foil.
  • Ultra-thin copper-clad laminated film force with a foil The method of peeling off a carrier foil, the ultra-thin copper-clad laminated film force with a carrier foil, and the method of removing a carrier foil by etching, etc.
  • etching method for removing the carrier foil in the first step of the step (A) and the step (B) by etching a known etching method can be used, and the surface strength of the carrier foil can be reduced to the thickness of the carrier foil.
  • the carrier foil can be removed by etching with an aqueous iron chloride solution or an ammonium persulfate aqueous solution.
  • a known method can be used as a method for carrying out an antifungal treatment on the copper surface, for example, benzotriazole, benzothiazole, tolyltriazole, alkyl Organic fenders using imidazole, benzylimidazole, etc., An inorganic fender using zinc, chromate, zinc alloy, or the like can be used.
  • the second step (B) when the copper surface is oxidized by removing the carrier foil in the first step, it is necessary to remove the oxidized portion on the copper surface.
  • a known method can be used. For example, pickling with a solution such as a hydrochloric acid solution, a sulfuric acid solution, a sulfuric acid hydrogen peroxide solution, an acidic chelate aqueous solution, or the like. The method of washing with can be used.
  • a pressure member such as a metal roll, preferably a double belt press
  • Laminate a copper foil with a long carrier foil, a long polyimide film with a thermocompression-bonding polyimide layer on one or both sides, and a reinforcing material as necessary (thermocompression-bonding on both sides) (When using polyimide with a polyimide layer, use copper foil with carrier on both sides), preferably at about 150 to 250 ° C, especially higher than 150 ° C and lower than 250 ° C in-line immediately before introduction.
  • Preheat using a preheater such as a hot air supply device or an infrared heater so that it can be preheated for about 2 to 120 seconds, and then use a pair of crimping rolls or a double belt press to heat and press a pair of crimping rolls or a double belt press.
  • a preheater such as a hot air supply device or an infrared heater
  • the temperature of the zone is at least 20 ° C higher than the glass transition temperature of the thermocompression bonding polyimide, in the temperature range of 400 ° C, especially in the temperature range of 30 ° C higher than the glass transition temperature to 400 ° C, Thermocompression bonding under pressure
  • it is subsequently cooled under pressure in a cooling zone, preferably at least 20 ° C lower than the glass transition temperature of the thermocompression bonding polyimide, particularly at least 30 ° C lower.
  • the copper surface is not oxidized for a short time.
  • the copper surface is subjected to an antifouling treatment, followed by washing with water and drying as necessary.
  • the carrier foil is not particularly limited in material, but any material that can be bonded to the ultrathin copper foil and has a role of reinforcing and protecting the ultrathin copper foil, for example, an aluminum foil, Copper foil, grease foil with a metal coating on the surface, and the like can be used.
  • the thickness of the carrier foil is not particularly limited, but is generally preferably 1 to 200 / zm thick, and is generally preferred to be thicker than ultrathin copper foil, especially 5 to: LOO / zm preferable.
  • the carrier foil only needs to be used in such a form that it is planarly bonded to an ultrathin copper foil.
  • the carrier foil since the copper component that becomes the electrolytic copper foil is electrodeposited on the surface of the carrier foil, the carrier foil needs to have at least conductivity.
  • the electrolytic copper foil with carrier foil flows through a continuous manufacturing process, and maintains the state of being joined to the electrolytic copper foil layer at least until the end of the production of the copper clad laminate, thereby facilitating handling.
  • the carrier foil has a role of reinforcing and protecting the electrolytic copper foil in every sense, and therefore the carrier foil needs to have a predetermined strength. If these conditions are satisfied, it can be used as a “carrier foil”, and generally a metal foil is assumed, but it means a concept including a conductive film and the like.
  • Copper foils with carrier foils can generally be broadly classified into bearable types and etchable types.
  • the bearable type is a type in which the carrier foil is peeled off and removed after press molding.
  • the etchable type is a type in which the carrier foil is removed by etching after press molding. Is.
  • ultrathin copper foil a thin copper foil that can be used by being laminated with a carrier foil is used, and this copper foil can be prepared by a known method using the power of electrolysis as described above.
  • the thickness of the ultrathin copper foil may be any thickness as long as it is a copper foil with a carrier foil! /, But is preferably in the range of 0.1 ⁇ m to 8 ⁇ m! / ,.
  • a heat-resistant film having thermocompression bonding or adhesiveness and a copper foil with a carrier foil bonded together in a pressurized state or a pressurized heating state 2) Copper with a known carrier foil, such as a copper foil with a carrier foil that has thermocompression bonding or adhesion on the surface of the copper foil and a heat-resistant film bonded together in a pressurized or heated state. What laminated
  • stacked foil and a heat resistant film can be used.
  • Examples of the heat resistant film include polyimide, aramid, polyphenylene oxide, wholly aromatic polyester, epoxy resin, cyanate ester resin, phenol resole resin, wholly aromatic polyester resin, PPE -Renether) resin, bismaleimide triazine resin, fluorine resin, and the like, and a non-woven fabric of fibers such as glass fiber, polyimide fiber, and aramid fiber can be used.
  • the thickness of the film may be designed according to the purpose of use.
  • the ultra-thin copper foil laminated film produced in the present invention is prepared by enclosing the ultra-thin copper foil laminated film in a packaging bag when shipping the ultra-thin copper foil laminated film.
  • the inert gas can be filled and sealed, and the ultra-thin copper foil laminated film can be packed, transported and shipped.
  • the packing can be made of a resinous resin bag or a resinous film that can wrap a sheet or roll of an ultrathin copper foil laminated film.
  • the resin for packaging known ones can be used.
  • the ultrathin copper foil laminated film should not be damaged, and the acidity of the ultrathin copper foil laminated film is poor as a substrate. It is preferable to have such characteristics.
  • the ultrathin copper foil laminated film produced in this way is suitably used for the production of electric circuit boards and the like. That is, in the method of manufacturing an electric circuit board, after receiving the ultra-thin copper foil laminated film manufactured by the process as described above and possibly shipped and transferred, preferably from the copper foil surface of the ultra-thin copper foil laminated film. Then, the antifouling film covering the copper surface is removed by the above-described antifouling treatment.
  • the removal of the antifouling film can be carried out by a known method depending on the method of the antifouling treatment, but in the case of organic antifouling, washing with an acidic solution (for example, sulfuric acid, hydrochloric acid, etc.) In this case, mechanical surface preparation, electrolytic degreasing, cleaning by microetching, etc. are used.
  • an acidic solution for example, sulfuric acid, hydrochloric acid, etc.
  • the ultra-thin copper foil laminated film from which the protective film has been removed is then processed in the same manner as when the ultra-thin copper-clad laminated film is received with the carrier foil attached to the printed circuit board, COF (Ch ip on Film) substrate, TAB (Tape Automated Bonding) substrate, etc. Can be manufactured.
  • ultra-thin copper foil laminate film YSNAP-3B made by Nippon Electrolytic Co., Ltd. as a copper foil with carrier, and using Ube Industries Upilex 50VT, a heat-resistant polyimide film with a thermocompression-bonding polyimide layer on both sides Temperature: 330 ° C, Crimping pressure: 40kgZcm 2 , Crimping time: Using a double-belt press copper foil layered heat-resistant film manufactured with a double belt press, the carrier foil is removed, and the presence or absence of antifouling treatment The discoloration of the copper foil due to long-term storage was investigated.
  • the carrier foil was peeled off from the copper foil laminated heat-resistant film with a carrier to obtain an ultrathin copper foil laminated film (C) that was not subjected to a fouling treatment on the copper surface.
  • (C) is left in an atmosphere at a temperature of 25 ° C and a humidity of 60% for one month, and the discoloration of the copper foil surface is visually observed.
  • the ultrathin copper foil laminated film ( ⁇ ) and the ultrathin copper foil laminated film ( ⁇ ) do not show any discoloration of the copper foil, but the ultrathin copper foil laminated film (C) has a discolored copper foil. It was.
  • the anti-mold agent is removed from these ultra-thin copper foil laminated films, washed with water and dried to obtain a copper thickness.
  • a copper-plated copper foil laminated film was produced in which copper plating was performed so that the thickness of the film was 18 ⁇ m.
  • the antifungal agent was removed by cleaning by microetching for the ultrathin copper foil laminated film (A) and by washing with sulfuric acid for the ultrathin copper foil laminated film (B).
  • a copper-plated copper foil laminated film (D) was prepared by peeling the carrier foil from the copper foil-laminated heat-resistant film with a carrier and immediately copper-plating so that the copper thickness became 18 ⁇ m.
  • the peel strength between the rums (tensioning speed 50mm, 90 ° peel (conforming to JIS C6471) was measured, and the peel strength was 1.3 to 1.4NZmm.

Abstract

Disclosed is a method for producing a very thin copper foil laminated film comprising (1) a first step wherein a carrier foil is removed from a very thin copper foil laminated film with a carrier foil which is obtained by arranging a very thin copper foil with a carrier foil and a film in layers, and (2) a second step wherein the copper surface is subjected to an anti-rust treatment within a short period of time after removal of the carrier foil in the first step before the copper surface is oxidized. The thus-produced very thin copper foil laminated film can be stored for a long time, and it can be easily transported since it is light weighted.

Description

明 細 書  Specification
極薄銅箔積層フィルムの製造方法、移送方法  Manufacturing method and transfer method of ultra-thin copper foil laminated film
技術分野  Technical field
[0001] 本発明は、長期保管が可能で、軽量で搬送が容易な極薄銅箔積層フィルムの製造 方法及びこれらの移送方法に関する。  [0001] The present invention relates to a method for producing an ultra-thin copper foil laminated film that can be stored for a long period of time, is light and easy to transport, and a method for transferring these.
背景技術  Background art
[0002] IC或 、は LSIなどの電子部品を実装する目的で、キャリア箔付き銅箔積層フィルム が製造されている。  [0002] Copper foil laminated films with carrier foil are manufactured for the purpose of mounting electronic components such as ICs or LSIs.
[0003] キャリア箔付き銅箔積層フィルムは、耐熱性フィルムの製造メーカーがキャリア箔付 き銅箔と耐熱性フィルムとを積層して製造し、耐熱性フィルムの製造メーカーより配線 加工メーカーに輸送され、配線カ卩工メーカーにてキャリア箔を剥がして、銅箔を配線 加工して、キャリア箔テープが製造されている。  [0003] A copper foil laminated film with carrier foil is manufactured by laminating a copper foil with carrier foil and a heat resistant film by a manufacturer of the heat resistant film, and is transported by the manufacturer of the heat resistant film to the wiring processing manufacturer. The carrier foil tape is manufactured by peeling the carrier foil and wiring the copper foil at a wiring manufacturer.
[0004] キャリア箔を剥がしたフレキシブル積層板としては、特許文献 1として、耐熱性接着 フィルムの少なくとも一面に金属箔を貼り合わせてなるフレキシブル積層板の製造方 法であって、前記耐熱性接着フィルムと、金属箔および離型層を有する積層体とを、 金属箔と耐熱性接着性フィルムとが接するように、少なくとも一対の金属ロールの間 にお ヽて保護フィルムを介して熱ラミネートする工程と、前記保護フィルムを分離する 工程と、前記離型層を金属箔カゝら分離する工程とを少なくとも含む、フレキシブル積 層板の製造方法が開示されている。  [0004] As the flexible laminate from which the carrier foil has been peeled off, Patent Document 1 discloses a method for producing a flexible laminate in which a metal foil is bonded to at least one surface of a heat-resistant adhesive film, the heat-resistant adhesive film And laminating a laminate having a metal foil and a release layer between at least a pair of metal rolls and a protective film so that the metal foil and the heat-resistant adhesive film are in contact with each other. There is disclosed a method for producing a flexible laminated board, comprising at least a step of separating the protective film and a step of separating the release layer from a metal foil cover.
特許文献 1:特開 2005— 205731号公報  Patent Document 1: Japanese Patent Laid-Open No. 2005-205731
発明の開示  Disclosure of the invention
発明が解決しょうとする課題  Problems to be solved by the invention
[0005] キャリア箔付き銅箔積層フィルムは、キャリア箔付きの薄い銅箔が銅箔メーカーにて 製造され、耐熱性フィルムの製造メーカーで、キャリア箔付きの薄い銅箔と耐熱性フィ ルムとをはりあわせて製造、保管され、配線加工メーカーに輸送、保管され、配線カロ 工メーカーで配線カ卩ェされて ヽる。 [0005] In copper foil laminated film with carrier foil, thin copper foil with carrier foil is manufactured by a copper foil manufacturer, and the manufacturer of heat resistant film is a thin copper foil with carrier foil and heat resistant film. Manufactured and stored together, transported and stored at a wiring processing manufacturer, and then covered by a wiring manufacturer.
[0006] キャリア箔付き銅箔積層フィルムは、キャリア箔を剥がすと銅箔表面が変色などの影 響を受けるため、長期保管が困難であり、耐熱性フィルムの製造メーカーより、キヤリ ァ箔を剥がすことなくキャリア箔付き銅箔積層フィルムを配線加工メーカーに移送、 保管され、使用されている。そのため、配線加工に不要なキャリア箔により、輸送コス トが高くなり、また重量物を取り扱うため搬送作業が困難で、作業者に危険が及ぶこ とが考えられる。 [0006] When the carrier foil is peeled off, the copper foil laminated film with the carrier foil has a shadow such as discoloration on the copper foil surface. The copper foil laminated film with carrier foil is transported, stored and used by the heat-resistant film manufacturer to the wiring processing manufacturer without peeling the carrier foil. For this reason, the carrier foil that is not necessary for wiring processing increases the transportation cost, and handling of heavy objects makes it difficult to carry and can cause danger to workers.
[0007] 本発明は、キャリア箔付き銅箔積層フィルムで、長期保管が可能で、軽量で搬送が 容易な極薄銅箔積層フィルムの製造方法及びこれらの移送方法を提供することを目 的とする。  [0007] An object of the present invention is to provide a method for producing an ultrathin copper foil laminated film which is a copper foil laminated film with a carrier foil, can be stored for a long period of time, is light and easy to carry, and a method for transferring these. To do.
課題を解決するための手段  Means for solving the problem
[0008] 本発明の第一は、極薄銅箔積層フィルムの製造方法であり、下記の工程 (A)又は 工程 (B)により製造されることを特徴とする極薄銅箔積層フィルムの製造方法である [0008] The first of the present invention is a method for producing an ultrathin copper foil laminate film, which is produced by the following step (A) or step (B), Is the way
•工程 (A) • Process (A)
(1)キャリア箔付き極薄銅箔とフィルムとを積層して得られるキャリア箔付き極薄銅張 積層フィルム力 キャリア箔を除去する第一工程、  (1) Ultra-thin copper-clad laminate film with carrier foil obtained by laminating an ultra-thin copper foil with a carrier foil and a film First step to remove the carrier foil,
(2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されない短時間のう ちに、銅表面に防鲭処理を行う第二工程 (A)とを行う。  (2) After removing the carrier foil in the first step, a second step (A) is performed in which the copper surface is subjected to a fouling treatment after a short time during which the copper surface is not oxidized.
•工程 (B)  • Process (B)
(1)キャリア箔付き極薄銅箔とフィルムとを積層して得られるキャリア箔付き極薄銅張 積層フィルム力 キャリア箔を除去する第一工程、  (1) Ultra-thin copper-clad laminate film with carrier foil obtained by laminating an ultra-thin copper foil with a carrier foil and a film First step to remove the carrier foil,
(2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されている場合、銅 表面の酸ィ匕部分を除去する第二工程 (B)、  (2) After removing the carrier foil in the first step, if the copper surface is oxidized, the second step (B) to remove the acid part of the copper surface,
(3)上記第二工程 (B)により酸ィ匕部分を除去した後、さらに銅表面が酸化されない短 時間のうちに、銅表面に防鲭処理を行う第三工程 (B)とを行う。  (3) After removing the acid oxide portion in the second step (B), a third step (B) is performed in which the copper surface is further subjected to antifouling treatment within a short time during which the copper surface is not oxidized.
[0009] 本発明の第二は、極薄銅箔積層フィルムを出荷するに際し、下記の工程 (A)又は 工程 (B)を行った後、梱包用袋体内に極薄銅箔積層フィルムを封入して梱包し、移 送することを特徴とする極薄銅箔積層フィルムの移送方法である。  [0009] In the second aspect of the present invention, when the ultra-thin copper foil laminated film is shipped, the ultra-thin copper foil laminated film is enclosed in the packaging bag after performing the following step (A) or step (B). And transporting the ultrathin copper foil laminated film.
•工程 (A) ( 1)キャリア箔付き極薄銅箔とフィルムとを積層して得られるキャリア箔付き極薄銅張 積層フィルム力 キャリア箔を除去する第一工程、 • Process (A) (1) Ultra-thin copper-clad laminate film with carrier foil obtained by laminating ultra-thin copper foil with carrier foil and film First step to remove carrier foil,
(2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されない短時間のう ちに、銅表面に防鲭処理を行う第二工程 (A)とを行う。  (2) After removing the carrier foil in the first step, a second step (A) is performed in which the copper surface is subjected to a fouling treatment after a short time during which the copper surface is not oxidized.
•工程 (B)  • Process (B)
( 1)キャリア箔付き極薄銅箔とフィルムとを積層して得られるキャリア箔付き極薄銅張 積層フィルム力 キャリア箔を除去する第一工程、  (1) Ultra-thin copper-clad laminate film with carrier foil obtained by laminating ultra-thin copper foil with carrier foil and film First step to remove carrier foil,
(2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されている場合、銅 表面の酸ィ匕部分を除去する第二工程 (B)、  (2) After removing the carrier foil in the first step, if the copper surface is oxidized, the second step (B) to remove the acid part of the copper surface,
(3)上記第二工程 (B)により酸ィ匕部分を除去した後、さらに銅表面が酸化されない短 時間のうちに、銅表面に防鲭処理を行う第三工程 (B)とを行う。  (3) After removing the acid oxide portion in the second step (B), a third step (B) is performed in which the copper surface is further subjected to antifouling treatment within a short time during which the copper surface is not oxidized.
発明の効果  The invention's effect
[0010] 本発明は、キャリア箔を予め取り除いて、銅箔表面に防鲭処理を行っているため、 [0010] Since the present invention removes the carrier foil in advance and performs the antifouling treatment on the copper foil surface,
1)軽量で搬送が容易で、作業者に危険が及ぶ可能性を低減し、 1) Lightweight and easy to transport, reducing the possibility of danger to workers,
2)同じ巻き幅に加工した場合では、より長い極薄銅箔積層フィルムを取り扱うことが でき、  2) When processed to the same winding width, longer ultrathin copper foil laminated film can be handled,
3)長期保管が可能な、  3) Long-term storage is possible,
長尺の極薄銅箔を耐熱性フィルムと積層した極薄銅箔積層フィルムを製造することが できる。  An ultra-thin copper foil laminated film in which a long ultra-thin copper foil is laminated with a heat-resistant film can be produced.
発明を実施するための最良の形態  BEST MODE FOR CARRYING OUT THE INVENTION
[0011] 極薄銅箔積層フィルムの製造方法の一例を工程 (A)或いは工程 (B)として示す。 [0011] An example of a method for producing an ultrathin copper foil laminated film is shown as step (A) or step (B).
•工程 (A)を以下に示す。  • Process (A) is shown below.
( 1)キャリア箔付き極薄銅張積層フィルム力 キャリア箔を除去し、さらに必要に応じ て酸洗し、水洗し、乾燥する第一工程、  (1) Ultra-thin copper-clad laminated film with carrier foil The first step of removing the carrier foil and then pickling, washing with water and drying if necessary,
(2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されない短時間のう ちに、銅表面に防鲭処理を行い、さらに必要に応じて水洗し、乾燥する第二工程 (A )、  (2) After removing the carrier foil in the first step, after the copper surface is not oxidized for a short period of time, the copper surface is subjected to an anti-fouling treatment, further washed with water if necessary, and then dried. A),
•工程 (B) ( 1)キャリア箔付き極薄銅張積層フィルム力 キャリア箔を除去し、さらに必要に応じ て酸洗し、水洗し、乾燥する第一工程、 • Process (B) (1) Ultra-thin copper-clad laminated film with carrier foil The first step of removing the carrier foil and then pickling, washing with water and drying if necessary.
(2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されている場合、銅 表面の酸化部分を除去し、さらに必要に応じて水洗し、乾燥する第二工程 (B)、 (2) After removing the carrier foil in the first step, when the copper surface is oxidized, the oxidized portion of the copper surface is removed, further washed with water if necessary, and dried (B),
(3)上記第二工程 (B)により酸ィ匕部分を除去した後、さらに銅表面が酸化されない短 時間のうちに、銅表面に防鲭処理を行い、さらに必要に応じて水洗し、乾燥する第三 工程 (B)とを行う。 (3) After removing the acid part in the second step (B), the copper surface is further subjected to antifouling treatment within a short time that the copper surface is not oxidized, and further washed with water if necessary and dried. And performing the third step (B).
[0012] 極薄銅箔積層フィルムの製造方法において、工程 (A)が工程 (B)よりも工程が少な ぐ簡便な方法であるために好まぐさらに積層された銅箔の酸ィ匕物などの除去工程 がなぐ銅箔に影響を及ぼすことがない。し力しながら、第一工程によってキャリア箔 を除去した結果、銅表面が酸化されている場合には工程 (B)を採用することが好まし い。銅表面の酸ィ匕が起こりうる例としては、キャリア箔の除去後に迅速に防鲭処理が できない場合、キャリア箔の除去の際に採用される工程で酸ィ匕が避けられない場合、 極薄銅箔積層フィルムの処理のために銅表面の酸ィ匕が避けられな 、場合、受け入 れたキャリア箔付き極薄銅箔が最初力 酸化されている場合等があり、これらの場合 は工程 (B)を採用することが好ま U、。  [0012] In the method for producing an ultra-thin copper foil laminated film, because the step (A) is a simpler method with fewer steps than the step (B), it is preferable to use a laminated copper foil acid oxide, etc. The removal process does not affect the copper foil. However, if the copper surface is oxidized as a result of removing the carrier foil in the first step, it is preferable to adopt the step (B). Examples of possible oxidation of copper on the surface of the copper include the case where the fouling treatment cannot be performed quickly after the removal of the carrier foil, or the case where the oxidation is unavoidable in the process employed when removing the carrier foil. In some cases, it is not possible to avoid oxidation on the copper surface due to the treatment of the copper foil laminated film. In some cases, the received ultrathin copper foil with carrier foil is first oxidized. U, prefer to adopt (B).
[0013] 極薄銅箔積層フィルムの製造方法にっ 、て説明する。  [0013] A method for producing an ultrathin copper foil laminated film will be described.
[0014] 工程 (A)及び工程 (B)の第一工程にぉ 、て、キャリア箔付き極薄銅張積層フィルム 力もキャリア箔を除去する方法としては、公知の方法を用いることができ、キャリア箔 付き極薄銅張積層フィルム力 キャリア箔を引き剥がす方法、キャリア箔付き極薄銅 張積層フィルム力もキャリア箔をエッチングにより除去する方法などである。  [0014] After the first step of the step (A) and the step (B), as a method for removing the carrier foil, a known method can be used as the method for removing the carrier foil. Ultra-thin copper-clad laminated film force with a foil The method of peeling off a carrier foil, the ultra-thin copper-clad laminated film force with a carrier foil, and the method of removing a carrier foil by etching, etc.
[0015] 工程 (A)及び工程 (B)の第一工程のキャリア箔をエッチングで除去するエッチング 方法としては、公知のエッチング方法を用いることができ、キャリア箔の面力もキャリア 箔の厚みまでを塩化鉄水溶液、過硫酸アンモ-ゥム水溶液などでエッチングして、キ ャリア箔を除去することができる。  [0015] As an etching method for removing the carrier foil in the first step of the step (A) and the step (B) by etching, a known etching method can be used, and the surface strength of the carrier foil can be reduced to the thickness of the carrier foil. The carrier foil can be removed by etching with an aqueous iron chloride solution or an ammonium persulfate aqueous solution.
[0016] 第二工程 (A)及び第三工程 (B)において、銅表面に防鲭処理を行う方法としては 、公知の方法を用いることができ、例えばべンゾトリァゾール、ベンゾチアゾール、トリ ルトリァゾール、アルキルイミダゾール、ベンジルイミダゾール等を用いる有機防鲭、 亜鉛、クロメート、亜鉛合金等を用いる無機防鲭などを用いることができる。 [0016] In the second step (A) and the third step (B), a known method can be used as a method for carrying out an antifungal treatment on the copper surface, for example, benzotriazole, benzothiazole, tolyltriazole, alkyl Organic fenders using imidazole, benzylimidazole, etc., An inorganic fender using zinc, chromate, zinc alloy, or the like can be used.
[0017] 第二工程 (B)において、第一工程のキャリア箔を除去することにより銅表面が酸ィ匕 されている場合、銅表面の酸ィ匕部分を除去する必要がある。銅表面の酸化部分の除 去方法としては、公知の方法を用いることができ、例えば、塩酸系溶液、硫酸系溶液 、硫酸 過酸化水素系溶液等の溶液で酸洗する方法、酸性キレート水溶液などで 洗浄する方法などを用いることができる。 In the second step (B), when the copper surface is oxidized by removing the carrier foil in the first step, it is necessary to remove the oxidized portion on the copper surface. As a method for removing the oxidized portion on the copper surface, a known method can be used. For example, pickling with a solution such as a hydrochloric acid solution, a sulfuric acid solution, a sulfuric acid hydrogen peroxide solution, an acidic chelate aqueous solution, or the like. The method of washing with can be used.
[0018] 上記の各工程で水洗、或いは水洗し、乾燥する方法としては、公知の方法で行うこ とがでさる。 [0018] As a method of washing with water in each of the above steps, or washing with water and drying, a known method can be used.
[0019] キャリア付き銅箔と耐熱性フィルムから、連続して極薄銅箔積層フィルムを製造する 方法の一例を示す。  [0019] An example of a method for continuously producing an ultrathin copper foil laminated film from a copper foil with a carrier and a heat resistant film will be described.
[0020] キャリア箔付き銅箔と耐熱性フィルムとを加圧部材、例えば金属ロール、好適には ダブルベルトプレスなどを使用し、  [0020] Using a copper foil with a carrier foil and a heat-resistant film using a pressure member, such as a metal roll, preferably a double belt press,
(1)長尺状のキャリア箔付き銅箔と、片面或いは両面に熱圧着性ポリイミド層を有す る長尺状のポリイミドフィルム、必要応じて補強材とを重ね合わせて(両面に熱圧着性 ポリイミド層を有するポリイミドを用いる場合は、両面にキャリア付き銅箔を用いる)、好 ましくは導入する直前のインラインで 150〜250°C程度、特に 150°Cより高く 250°C 以下の温度で 2〜120秒間程度予熱できるように熱風供給装置や赤外線加熱機な どの予熱器を用いて予熱して、一対の圧着ロール又はダブルベルトプレスを用いて、 一対の圧着ロール又はダブルベルトプレスの加熱圧着ゾーンの温度が熱圧着性ポリ イミドのガラス転移温度より 20°C以上高 、温度力 400°Cの温度範囲で、特にガラス 転移温度より 30°C以上高い温度から 400°Cの温度範囲で、加圧下に熱圧着し、特 にダブルベルトプレスの場合には引き続いて冷却ゾーンで加圧下に冷却して、好適 には熱圧着性ポリイミドのガラス転移温度より 20°C以上低 、温度、特に 30°C以上低 い温度まで冷却して、積層させ、ロール状に巻き取ることにより、ロール状の片面或い は両面にキャリア箔付き銅張積層ポリイミドフィルムを製造する工程、  (1) Laminate a copper foil with a long carrier foil, a long polyimide film with a thermocompression-bonding polyimide layer on one or both sides, and a reinforcing material as necessary (thermocompression-bonding on both sides) (When using polyimide with a polyimide layer, use copper foil with carrier on both sides), preferably at about 150 to 250 ° C, especially higher than 150 ° C and lower than 250 ° C in-line immediately before introduction. Preheat using a preheater such as a hot air supply device or an infrared heater so that it can be preheated for about 2 to 120 seconds, and then use a pair of crimping rolls or a double belt press to heat and press a pair of crimping rolls or a double belt press. The temperature of the zone is at least 20 ° C higher than the glass transition temperature of the thermocompression bonding polyimide, in the temperature range of 400 ° C, especially in the temperature range of 30 ° C higher than the glass transition temperature to 400 ° C, Thermocompression bonding under pressure However, particularly in the case of a double belt press, it is subsequently cooled under pressure in a cooling zone, preferably at least 20 ° C lower than the glass transition temperature of the thermocompression bonding polyimide, particularly at least 30 ° C lower. A process for producing a copper-clad laminated polyimide film with a carrier foil on one or both sides of a roll by cooling to temperature, laminating and winding up into a roll,
(2)キャリア箔付き銅張積層ポリイミドフィルム力もキャリア箔を除去し、さらに必要に 応じて酸洗し、水洗し、乾燥する工程、  (2) The process of removing the carrier foil from the copper-clad laminated polyimide film with carrier foil, and further pickling, washing with water and drying if necessary,
(3)上記第一工程のキャリア箔を除去することにより銅表面が酸化されない短時間の うちに、銅表面に防鲭処理を行い、さらに必要に応じて水洗し、乾燥する工程、とを 連続して行う。 (3) By removing the carrier foil in the first step, the copper surface is not oxidized for a short time. At the same time, the copper surface is subjected to an antifouling treatment, followed by washing with water and drying as necessary.
[0021] キャリア箔は、特に材質は限定していないが、極薄銅箔とはり合わすことができ、極 薄銅箔を補強し、保護する役割を有するものであればよぐ例えばアルミニウム箔、銅 箔、表面をメタルコーティングした榭脂箔などを用いることができる。  [0021] The carrier foil is not particularly limited in material, but any material that can be bonded to the ultrathin copper foil and has a role of reinforcing and protecting the ultrathin copper foil, for example, an aluminum foil, Copper foil, grease foil with a metal coating on the surface, and the like can be used.
[0022] キャリア箔の厚さは、特に限定されないが、一般に l〜200 /z m厚のものが好ましく 、一般的には極薄銅箔より厚い方が好ましぐ特に 5〜: LOO /z mが好ましい。  [0022] The thickness of the carrier foil is not particularly limited, but is generally preferably 1 to 200 / zm thick, and is generally preferred to be thicker than ultrathin copper foil, especially 5 to: LOO / zm preferable.
[0023] キャリア箔は、極薄銅箔と平面的に貼り合わされたような形態で用いられるものであ ればよい。キャリア箔付電解銅箔の場合では、キャリア箔の表面上に電解銅箔となる 銅成分を電析させるので、キャリア箔には少なくとも導電性を有することが必要となる  [0023] The carrier foil only needs to be used in such a form that it is planarly bonded to an ultrathin copper foil. In the case of an electrolytic copper foil with a carrier foil, since the copper component that becomes the electrolytic copper foil is electrodeposited on the surface of the carrier foil, the carrier foil needs to have at least conductivity.
[0024] そして、このキャリア箔付電解銅箔は、連続した製造工程を流れ、少なくとも銅張積 層板の製造終了時までは、電解銅箔層と接合した状態を維持し、ハンドリングを容易 にし、電解銅箔をあらゆる意味で補強し、保護する役割を持つものであるので、キヤリ ァ箔は所定の強度を有する必要がある。これらのことを満足するものであれば、「キヤ リア箔」としての使用が可能であり、一般的には金属箔が想定されるが、導電性フィル ム等も広く含む概念を意味する。 [0024] The electrolytic copper foil with carrier foil flows through a continuous manufacturing process, and maintains the state of being joined to the electrolytic copper foil layer at least until the end of the production of the copper clad laminate, thereby facilitating handling. The carrier foil has a role of reinforcing and protecting the electrolytic copper foil in every sense, and therefore the carrier foil needs to have a predetermined strength. If these conditions are satisfied, it can be used as a “carrier foil”, and generally a metal foil is assumed, but it means a concept including a conductive film and the like.
[0025] キャリア箔付き銅箔は、一般にビーラブルタイプとエツチヤブルタイプに大別するこ とが可能である。違いを一言で言えば、ビーラブルタイプはプレス成形後にキャリア 箔を引き剥がして除去するタイプのものであり、エツチヤブルタイプとは、プレス成形 後にキャリア箔をエッチング法にて除去するタイプのものである。  [0025] Copper foils with carrier foils can generally be broadly classified into bearable types and etchable types. In short, the bearable type is a type in which the carrier foil is peeled off and removed after press molding. The etchable type is a type in which the carrier foil is removed by etching after press molding. Is.
[0026] 極薄銅箔としては、キャリア箔と積層して用いることができる薄 、銅箔が用いられ、こ の銅箔は上述のように電解法のほ力、公知の方法で作成できる。  [0026] As the ultrathin copper foil, a thin copper foil that can be used by being laminated with a carrier foil is used, and this copper foil can be prepared by a known method using the power of electrolysis as described above.
[0027] 極薄銅箔の厚みは、キャリア箔付きの銅箔であればどのような厚みでもよ!/、が、好ま しくは 0. 1 μ m〜8 μ mの範囲が好まし!/、。  [0027] The thickness of the ultrathin copper foil may be any thickness as long as it is a copper foil with a carrier foil! /, But is preferably in the range of 0.1 μm to 8 μm! / ,.
[0028] キャリア箔付き極薄銅張積層フィルムは、  [0028] An ultra-thin copper-clad laminate film with a carrier foil is
1)熱圧着性或いは接着性を有する耐熱性フィルムと、キャリア箔付き銅箔とを加圧状 態或いは加圧加熱状態で、はりあわせたもの、 2)銅箔表面に熱圧着性或いは接着性を有するキャリア箔付き銅箔と、耐熱性フィル ムとを加圧状態或いは加圧加熱状態で、はりあわせたもの、など、公知のキャリア箔 付き銅箔と耐熱性フィルムとを積層したものを用いることができる。 1) A heat-resistant film having thermocompression bonding or adhesiveness and a copper foil with a carrier foil bonded together in a pressurized state or a pressurized heating state, 2) Copper with a known carrier foil, such as a copper foil with a carrier foil that has thermocompression bonding or adhesion on the surface of the copper foil and a heat-resistant film bonded together in a pressurized or heated state. What laminated | stacked foil and a heat resistant film can be used.
[0029] 耐熱性フィルムとしては、ポリイミド、ァラミド、ポリフエ-レンオキサイド、全芳香族ポ リエステル、エポキシ榭脂、シァネートエステル榭脂、フエノールレゾール榭脂、全芳 香族ポリエステル榭脂、 PPE (ポリフエ-レンエーテル)榭脂、ビスマレイミドトリアジン 榭脂及びフッ素榭脂など、さらにこれらとガラス繊維、ポリイミド繊維、ァラミド繊維など の繊維の不織布との複合フィルムを用いることができる。  [0029] Examples of the heat resistant film include polyimide, aramid, polyphenylene oxide, wholly aromatic polyester, epoxy resin, cyanate ester resin, phenol resole resin, wholly aromatic polyester resin, PPE -Renether) resin, bismaleimide triazine resin, fluorine resin, and the like, and a non-woven fabric of fibers such as glass fiber, polyimide fiber, and aramid fiber can be used.
[0030] フィルムの厚みは、用いる目的に応じて設計すればよい。  [0030] The thickness of the film may be designed according to the purpose of use.
[0031] 本発明で製造された極薄銅箔積層フィルムは、極薄銅箔積層フィルムを出荷する に際し、梱包用袋体内に極薄銅箔積層フィルムを封入して、必要に応じて窒素など の不活性ガスを充填して封入して、極薄銅箔積層フィルムを梱包し、搬送、出荷する ことができる。梱包は、極薄銅箔積層フィルムのシートやロールを包装できる榭脂製 の袋ゃ榭脂製のフィルムなどを用いることができる。梱包用の榭脂としては、公知のも のを用いることができ、例えば、極薄銅箔積層フィルムを傷つけないこと、極薄銅箔 積層フィルムの酸ィ匕など基板としての特性を悪ィ匕させな 、ことなどの特性を有して ヽ ることが好ましい。  [0031] The ultra-thin copper foil laminated film produced in the present invention is prepared by enclosing the ultra-thin copper foil laminated film in a packaging bag when shipping the ultra-thin copper foil laminated film. The inert gas can be filled and sealed, and the ultra-thin copper foil laminated film can be packed, transported and shipped. The packing can be made of a resinous resin bag or a resinous film that can wrap a sheet or roll of an ultrathin copper foil laminated film. As the resin for packaging, known ones can be used. For example, the ultrathin copper foil laminated film should not be damaged, and the acidity of the ultrathin copper foil laminated film is poor as a substrate. It is preferable to have such characteristics.
[0032] このように製造された極薄銅箔積層フィルムは、電気回路基板等の製造に好適に 使用される。即ち、電気回路基板の製造方法では、前述のとおりの工程により製造さ れ、場合により出荷移送された極薄銅箔積層フィルムを受け入れた後、好ましくは極 薄銅箔積層フィルムの銅箔面から、前述の防鲭処理により銅表面を覆っている防鲭 皮膜を除去する。  [0032] The ultrathin copper foil laminated film produced in this way is suitably used for the production of electric circuit boards and the like. That is, in the method of manufacturing an electric circuit board, after receiving the ultra-thin copper foil laminated film manufactured by the process as described above and possibly shipped and transferred, preferably from the copper foil surface of the ultra-thin copper foil laminated film. Then, the antifouling film covering the copper surface is removed by the above-described antifouling treatment.
[0033] 防鲭皮膜の除去は、防鲭処理の方法に依存する公知の方法で行うことができるが 、有機防鲭の場合は酸性溶液 (例えば硫酸、塩酸等)による洗浄、無機防鲭の場合は 機械整面、電解脱脂、マイクロエッチングによる洗浄等が用いられる。  [0033] The removal of the antifouling film can be carried out by a known method depending on the method of the antifouling treatment, but in the case of organic antifouling, washing with an acidic solution (for example, sulfuric acid, hydrochloric acid, etc.) In this case, mechanical surface preparation, electrolytic degreasing, cleaning by microetching, etc. are used.
[0034] 防鲭皮膜を除去した極薄銅箔積層フィルムは、その後は、キャリア箔付きの状態で 極薄銅張積層フィルムを受け入れた場合と同様に処理して、プリント基板、 COF (Ch ip on Film)基板、 TAB (Tape Automated Bonding)基板等の電気回路基板 を製造することができる。 [0034] The ultra-thin copper foil laminated film from which the protective film has been removed is then processed in the same manner as when the ultra-thin copper-clad laminated film is received with the carrier foil attached to the printed circuit board, COF (Ch ip on Film) substrate, TAB (Tape Automated Bonding) substrate, etc. Can be manufactured.
実施例  Example
[0035] 極薄銅箔積層フィルムの製造方法において、外径 176mm、重量 3. 2kgの芯を用 い、キャリア付き銅箔として日本電解社製 YSNAP— 3B又は YSNAP— 5Bを用い、 両面に熱圧着性ポリイミド層を有する耐熱性ポリイミドフィルムである宇部興産社製ュ ーピレックス 25VT或!、はユーピレックス 50VTとを用いて、ロールやダブルベルトプ レスなどの熱圧着装置を使用して、極薄銅箔積層フィルムを製造する場合において 、キャリア箔を取り除いた場合の重量低減率及び卷径の低減率を算出し、その結果 を表 1に示す。  [0035] In the method for producing an ultra-thin copper foil laminated film, YSNAP-3B or YSNAP-5B manufactured by Nihon Electrolytic Co., Ltd. was used as a copper foil with a carrier, using a core with an outer diameter of 176 mm and a weight of 3.2 kg. Using a heat-resistant polyimide film with a pressure-bonding polyimide layer, Ube Industries Co., Ltd. In the case of manufacturing a laminated film, the weight reduction rate and the diameter reduction rate when the carrier foil is removed are calculated, and the results are shown in Table 1.
[0036] 表 1より、キャリア箔付き銅箔積層フィルムより、キャリア箔を取り除くことにより、重量 で 50〜80%程度、卷径で 8〜25%程度の低減効果が認められる。  [0036] From Table 1, by removing the carrier foil from the copper foil laminated film with the carrier foil, a reduction effect of about 50 to 80% by weight and about 8 to 25% by diameter is recognized.
[0037] [表 1] [0037] [Table 1]
Figure imgf000009_0001
Figure imgf000009_0001
[0038] (性能実験例) [0038] (Performance experiment example)
極薄銅箔積層フィルムとして、キャリア付き銅箔として日本電解社製 YSNAP— 3B を用い、両面に熱圧着性ポリイミド層を有する耐熱性ポリイミドフィルムである宇部興 産社製ユーピレックス 50VTを用いて、圧着温度: 330°C、圧着圧力: 40kgZcm2、 圧着時間: 2分の条件でダブルベルトプレスを用いて製造した、キャリア付き銅箔積 層耐熱フィルムを用い、キャリア箔を取り除き、防鲭処理の有無による長期保存による 銅箔の変色を調べた。 Using ultra-thin copper foil laminate film, YSNAP-3B made by Nippon Electrolytic Co., Ltd. as a copper foil with carrier, and using Ube Industries Upilex 50VT, a heat-resistant polyimide film with a thermocompression-bonding polyimide layer on both sides Temperature: 330 ° C, Crimping pressure: 40kgZcm 2 , Crimping time: Using a double-belt press copper foil layered heat-resistant film manufactured with a double belt press, the carrier foil is removed, and the presence or absence of antifouling treatment The discoloration of the copper foil due to long-term storage was investigated.
[0039] キャリア付き銅箔積層耐熱フィルムよりキャリア箔を引き剥がして直ぐに (銅箔表面 が酸ィ匕されない短時間のうちに)、銅表面にクロメート処理を行い、防鲭処理した極 薄銅箔積層フィルム (A)を得た。 [0039] Immediately after peeling off the carrier foil from the copper foil laminated heat-resistant film with carrier (copper foil surface Chromate treatment was performed on the copper surface within a short period of time during which no oxidation occurred, and an anti-thin copper foil laminated film (A) was obtained.
[0040] キャリア付き銅箔積層耐熱フィルムよりキャリア箔を引き剥がして直ぐに (銅箔表面 が酸ィ匕されない短時間のうちに)、銅表面にベンゾトリアゾール処理を行い、防鲭処 理した極薄銅箔積層フィルム (B)を得た。 [0040] Immediately after the carrier foil is peeled off from the copper foil laminated heat-resistant film with a carrier (within a short time when the copper foil surface is not oxidized), the copper surface is treated with benzotriazole for anti-corrosion treatment. A copper foil laminated film (B) was obtained.
[0041] キャリア付き銅箔積層耐熱フィルムよりキャリア箔を引き剥がして、銅表面に防鲭処 理を行うことなぐ極薄銅箔積層フィルム (C)を得た。 [0041] The carrier foil was peeled off from the copper foil laminated heat-resistant film with a carrier to obtain an ultrathin copper foil laminated film (C) that was not subjected to a fouling treatment on the copper surface.
[0042] 極薄銅箔積層フィルム (A)、極薄銅箔積層フィルム(B)及び極薄銅箔積層フィルム [0042] Ultrathin copper foil laminated film (A), ultrathin copper foil laminated film (B), and ultrathin copper foil laminated film
(C)を温度 25°C、湿度 60%の大気下に 1か月放置し、銅箔表面の変色を目視で観 (C) is left in an atmosphere at a temperature of 25 ° C and a humidity of 60% for one month, and the discoloration of the copper foil surface is visually observed.
¾πίした。 ¾πί.
[0043] 極薄銅箔積層フィルム (Α)及び極薄銅箔積層フィルム (Β)は、銅箔の変色は認め られないが、極薄銅箔積層フィルム (C)は銅箔が変色していた。  [0043] The ultrathin copper foil laminated film (Α) and the ultrathin copper foil laminated film (Β) do not show any discoloration of the copper foil, but the ultrathin copper foil laminated film (C) has a discolored copper foil. It was.
[0044] 保存後の極薄銅箔積層フィルム (Α)及び極薄銅箔積層フィルム (Β)を用い、これら の極薄銅箔積層フィルムより防鲭剤を除去、水洗、乾燥させ、銅厚みが 18 μ mにな るように銅メツキを行った銅メツキ銅箔積層フィルムを製造した。尚、防鲭剤の除去は 、極薄銅箔積層フィルム (A)については、マイクロエッチングによる洗浄によって、極 薄銅箔積層フィルム (B)については、硫酸による洗浄にて行った。  [0044] Using the ultra-thin copper foil laminated film (Α) and the ultra-thin copper foil laminated film (Β) after storage, the anti-mold agent is removed from these ultra-thin copper foil laminated films, washed with water and dried to obtain a copper thickness. A copper-plated copper foil laminated film was produced in which copper plating was performed so that the thickness of the film was 18 μm. The antifungal agent was removed by cleaning by microetching for the ultrathin copper foil laminated film (A) and by washing with sulfuric acid for the ultrathin copper foil laminated film (B).
[0045] 得られた銅メツキ銅箔積層フィルムの銅箔とフィルム間のピール強度(張り速度 50 mm、 90° ピーノレ (JIS .C6471に準拠)を柳』定したところ、ピーノレ強度 1. 3〜1. 4N Z mmで teつた。  [0045] When the peel strength between the copper foil and the film of the obtained copper-plated copper foil laminated film (stretching speed 50 mm, 90 ° pinole (in accordance with JIS .C6471)) was determined, the pinole strength 1.3 to 1. Te with 4N Z mm.
[0046] キャリア付き銅箔積層耐熱フィルムよりキャリア箔を引き剥がして直ぐに銅厚みが 18 μ mになるように銅メツキを行った銅メツキ銅箔積層フィルム (D)を製造し、銅箔とフィ ルム間のピール強度(張り速度 50mm、 90° ピール (JIS .C6471に準拠)を測定し たところ、ピール強度 1. 3〜1. 4NZmmであった。  [0046] A copper-plated copper foil laminated film (D) was prepared by peeling the carrier foil from the copper foil-laminated heat-resistant film with a carrier and immediately copper-plating so that the copper thickness became 18 μm. The peel strength between the rums (tensioning speed 50mm, 90 ° peel (conforming to JIS C6471) was measured, and the peel strength was 1.3 to 1.4NZmm.

Claims

請求の範囲 [1] 工程 (A)、即ち (1)キャリア箔付き極薄銅箔とフィルムとを積層して得られるキャリア箔付き極薄銅 張積層フィルム力 キャリア箔を除去する第一工程、および (2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されない短時間 のうちに、銅表面に防鲭処理を行う第二工程 (A) を有する工程 (A)、 または 工程 (B)、即ち (1)キャリア箔付き極薄銅箔とフィルムとを積層して得られるキャリア箔付き極薄銅 張積層フィルム力 キャリア箔を除去する第一工程、 (2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されている場合、 銅表面の酸ィヒ部分を除去する第二工程 (B)、および (3)上記第二工程 (B)により酸ィ匕部分を除去した後、さらに銅表面が酸化されな い短時間のうちに、銅表面に防鲭処理を行う第三工程 (B) を有する工程 (B) を有する極薄銅箔積層フィルムの製造方法。 [2] 製造される極薄銅箔積層フィルムが、ロール状の長尺極薄銅箔積層フィルムである ことを特徴とする請求項 1に記載の方法。 [3] 極薄銅箔積層フィルムの出荷移送方法であって、 工程 (A)、即ち Claims [1] Step (A), that is, (1) Ultrathin copper-clad laminate film with carrier foil obtained by laminating an ultrathin copper foil with carrier foil and a film, a first step of removing carrier foil, And (2) a step (A) or a step having a second step (A) of performing anti-fouling treatment on the copper surface within a short time after the copper foil is not oxidized after removing the carrier foil in the first step. (B), that is, (1) Ultrathin copper-clad laminated film force with carrier foil obtained by laminating an ultrathin copper foil with carrier foil and a film, a first step of removing the carrier foil, (2) the first step above If the copper surface is oxidized after removing the carrier foil by the second step (B) of removing the acid part on the copper surface, and (3) the acid part by the second step (B). After the removal of copper, the third work is carried out on the copper surface within a short time when the copper surface is not oxidized. Method for manufacturing ultra-thin copper foil laminated film having a step (B) with (B). [2] The method according to [1], wherein the produced ultrathin copper foil laminated film is a roll-like long ultrathin copper foil laminated film. [3] A method for shipping and transporting an ultra-thin copper foil laminated film comprising the steps (A), that is,
(1)キャリア箔付き極薄銅箔とフィルムとを積層して得られるキャリア箔付き極薄銅 張積層フィルム力 キャリア箔を除去する第一工程、および  (1) Ultra-thin copper-clad laminated film force with carrier foil obtained by laminating an ultra-thin copper foil with carrier foil and a film, a first step of removing the carrier foil, and
(2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されない短時間 のうちに、銅表面に防鲭処理を行う第二工程 (A)  (2) Second step of performing antifouling treatment on the copper surface within a short time after the copper foil is not oxidized after removing the carrier foil in the first step (A)
を有する工程 (A)、  (A) having the steps
または  Or
工程 (B)、即ち (1)キャリア箔付き極薄銅箔とフィルムとを積層して得られるキャリア箔付き極薄銅 張積層フィルム力 キャリア箔を除去する第一工程、 Step (B), ie (1) Ultra thin copper foil with carrier foil obtained by laminating an ultra thin copper foil with a carrier foil and a film The first step of removing the carrier foil,
(2)上記第一工程によりキャリア箔を除去した後、銅表面が酸化されている場合、 銅表面の酸ィヒ部分を除去する第二工程 (B)、および  (2) After removing the carrier foil in the first step, if the copper surface is oxidized, the second step (B) for removing the oxidic part of the copper surface, and
(3)上記第二工程 (B)により酸ィ匕部分を除去した後、さらに銅表面が酸化されな い短時間のうちに、銅表面に防鲭処理を行う第三工程 (B)  (3) The third step (B) in which the copper surface is further subjected to the anti-fouling treatment within a short time after the acid oxide portion is removed in the second step (B) and the copper surface is not oxidized.
を有する工程 (B)  Step (B) having
を実施し、その後、梱包用袋体内に極薄銅箔積層フィルムを封入して梱包し、移送 することを特徴とする極薄銅箔積層フィルムの移送方法。  After that, the method for transporting an ultra-thin copper foil laminated film is characterized in that the ultra-thin copper foil laminated film is enclosed in a packaging bag, packed, and transported.
[4] 移送される極薄銅箔積層フィルムが、ロール状の長尺極薄銅箔積層フィルムである ことを特徴とする請求項 3に記載の方法。 [4] The method according to [3], wherein the ultrathin copper foil laminated film to be transferred is a roll-like long ultrathin copper foil laminated film.
[5] 請求項 1または 2により製造された極薄銅箔積層フィルムを受け入れる工程と、 前記極薄銅箔積層フィルムの銅箔面から防鲭皮膜を除去する工程と [5] A step of accepting the ultrathin copper foil laminated film produced according to claim 1 or 2, and a step of removing the antifouling film from the copper foil surface of the ultrathin copper foil laminated film;
を有する電気回路基板の製造方法。  A method of manufacturing an electric circuit board having
[6] 請求項 3または 4により梱包された状態で移送された極薄銅箔積層フィルムを受け 入れる工程と、 [6] receiving the ultra-thin copper foil laminated film transferred in the state of being packed according to claim 3 or 4, and
前記極薄銅箔積層フィルムの銅箔面から防鲭皮膜を除去する工程と  Removing the antifouling film from the copper foil surface of the ultrathin copper foil laminated film;
を有する電気回路基板の製造方法。  The manufacturing method of the electric circuit board which has this.
PCT/JP2006/316517 2005-08-23 2006-08-23 Production method and transport method for very thin copper foil laminated film WO2007023863A1 (en)

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009233874A (en) * 2008-03-26 2009-10-15 Ube Ind Ltd Manufacturing method and transferring method of very thin copper foil laminated-film

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004005588A1 (en) * 2002-07-04 2004-01-15 Mitsui Mining & Smelting Co.,Ltd. Electrolytic copper foil with carrier foil
JP2004165411A (en) * 2002-11-13 2004-06-10 Mitsubishi Gas Chem Co Inc Method of manufacturing extremely thin copper foil-plated board excellent in thickness uniformity of copper foil

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2004005588A1 (en) * 2002-07-04 2004-01-15 Mitsui Mining & Smelting Co.,Ltd. Electrolytic copper foil with carrier foil
JP2004165411A (en) * 2002-11-13 2004-06-10 Mitsubishi Gas Chem Co Inc Method of manufacturing extremely thin copper foil-plated board excellent in thickness uniformity of copper foil

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009233874A (en) * 2008-03-26 2009-10-15 Ube Ind Ltd Manufacturing method and transferring method of very thin copper foil laminated-film

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