WO2007003615A1 - Procede pour nettoyer des surfaces au moyen d'ions de fluorure - Google Patents

Procede pour nettoyer des surfaces au moyen d'ions de fluorure Download PDF

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Publication number
WO2007003615A1
WO2007003615A1 PCT/EP2006/063777 EP2006063777W WO2007003615A1 WO 2007003615 A1 WO2007003615 A1 WO 2007003615A1 EP 2006063777 W EP2006063777 W EP 2006063777W WO 2007003615 A1 WO2007003615 A1 WO 2007003615A1
Authority
WO
WIPO (PCT)
Prior art keywords
cleaning
nozzle
chamber
halogen ions
ions
Prior art date
Application number
PCT/EP2006/063777
Other languages
German (de)
English (en)
Inventor
Ursus KRÜGER
Raymond Ullrich
Original Assignee
Siemens Aktiengesellschaft
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Aktiengesellschaft filed Critical Siemens Aktiengesellschaft
Publication of WO2007003615A1 publication Critical patent/WO2007003615A1/fr

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
    • F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
    • F01D25/00—Component parts, details, or accessories, not provided for in, or of interest apart from, other groups
    • F01D25/002—Cleaning of turbomachines
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents

Definitions

  • the invention relates to a method for cleaning crack-prone surfaces, in which during a marketsprozes ⁇ ses the surface is exposed in a closed cleaning chamber halogen ions.
  • Such a purification process is also called fluoride ion
  • FIC Fluorescence Indicaciones the FIC the tive surface to be cleaned with gaseous ak ⁇ fluoride ion or in a wet-chemical process is subjected to fluoride ions, in this case the surface is cleaned by, for example, oxide compounds are converted into volatile fluorine or fluoride compounds.
  • FIC should generally stand for purification processes that can be carried out in place of fluoride ions, even with other halogen ions.
  • surfaces made of superalloy materials can be cleaned as nenschaufeln for example for the production of Turbi ⁇ used.
  • CMAS calcium magnesium aluminum-silicon oxides
  • the object of the invention is to provide a method for cleaning surfaces subject to cracking with fluoride ions, with which also the cracks can be cleaned comparatively efficiently.
  • This object is achieved by the method mentioned in the fact that the halogen ions are accelerated with a directed to the surface to be cleaned nozzle, wherein the required process pressure in the cleaning ⁇ chamber is kept constant. With the nozzle, a jet is thus generated, which contains halogen ions, so that they impinge with a caused by the nozzle kinetic energy to the surface to be cleaned. This energy leads to a support of the desired chemical reactions to dissolve the contamination on the surface to be cleaned, in particular the CMAS.
  • the kineti ⁇ specific energy of the halogen ions advantageously supports penetration thereof into the cracks to be cleaned of the surface, so that the cleaning there efficient expires. Due to the constant introduction of additional halogen ions in the cleaning process, suction of the ions must take place simultaneously to maintain the required process pressure. This causes advantageously additionally a continuous exchange of the process gas in the cleaning device, so that spent Pro ⁇ zessgas, the reaction products occurring during the FIC that is constantly exchanged for halogen ions.
  • the cleaning efficiency of the ⁇ -approval process in the cracks can be increased advantageously. It has been shown that, surprisingly, the activity of the fluoride ions is not the determining factor for the necessary cleaning time for the cracked surfaces, but rather the diffusion of particles into and out of the crack which takes place only slowly in the crack due to the narrow space ratio ripped out, so the out ⁇ exchange of reactive fluoride ions and in cleaning resulting fluorine compounds, for example, have bound components of the CMAS itself.
  • the effect of the cleaning process can be improved if the cleaning process is carried out alternately with a process the exchange of substances in the cracks supporting diffusion, wherein the cleaning chamber is eva ⁇ kuiert.
  • the evacuation of the cleaning chamber additionally causes the diffusion of the volatile fluoride compounds resulting from the crack when the FIC is carried out.
  • these fluorine compounds advantageously do not hinder the newly added fluoride ions of the subsequent cleaning interval from degrading further CMAS in the crack.
  • the halogen ions are contained in a process gas, which also contains a carrier gas, in particular water ⁇ material.
  • a process gas which also contains a carrier gas, in particular water ⁇ material.
  • the mixture of the halogen ions with a carrier gas advantageously allows easier handling of the process gas so that it can be accelerated more effectively by means of the nozzle. It is particularly advantageous to use a cold spray nozzle as the nozzle.
  • cold spray nozzles nozzle structures are referred to, which are used in a conventional manner for the coating of components by means of cold spray coating (cold spray coating).
  • the coating material is in
  • the method of cold gas spraying can be, for example, the
  • Is evacuated in the implementation of the purification process between ⁇ through it is advantageous if is blown onto the surface to be cleaned during the upper ⁇ Diffu ⁇ sion process at time intervals with the nozzle, a I- nertgas, especially hydrogen.
  • the Inertgasmoleküle be in the form of pressure pulses accelerated in the manner described above to the surface of the component to be cleaned and penetrate as ⁇ forth in particular in any cracks one.
  • the molecules of the inert gas volatile fast so it is no obstacle for the subsequent FIC step len representation.
  • the invention relates to a marketsanla ⁇ ge or coating system.
  • the cleaning system is in ⁇ example from the aforementioned EP 0 209 307 Al and the coating system from the aforementioned US 2004/0037954 Al known. While the cleaning system described le ⁇ diglich the application of the FIC process with regular conducting interposed Desoptions Colouren struc- net, the coating system may be used only for the cold spray coating.
  • the object is to modify a cleaning installation or coating installation in such a way that with the aid of this installation a FIC process with comparatively effective cleaning of cracks on the surface to be cleaned can be carried out.
  • the coating system with a chamber which accommodates a holder for a workpiece and an orientable on the workpiece nozzle solves the problem according to the invention characterized in that the chamber wall and the nozzle with a protection against the on ⁇ handle are provided of halogen ions.
  • the single FIGURE shows the schematic ⁇ tical structure of an embodiment of a cleaning ⁇ device for performing the method according to the invention.
  • a cleaning device has a cleaning chamber 11, which contains a holder 12 for one or more turbine blades 13. After insertion of the afflicted with egg nem crack 14 turbine blade 13 in the holder 12, the cleaning chamber 11 can be closed and initially sucked air by a vacuum pump 15 to ⁇ . Then, a valve 16a is closed to relieve the vacuum pump and opening a valve 16b, so that container can be pumped into the supply line 21 18 by means of a pressure pump 17, a process gas from a supply ⁇ leading to a nozzle 22 leads (this hereinafter more) ,
  • the ⁇ process gas can, for example, consist of hydrogen and hydrogen fluoride, so that forms a fluorine inert hydrogen atmosphere in the cleaning chamber. 11 This provides fluoride ions with which the cleaning of the turbine blade 13 takes place.
  • the reactivity of the fluoride ions can be increased by means of a microwave generator 19. Furthermore, a Schuvor ⁇ direction 20 is provided, with which the interior of the cleaning chamber 11, including the turbine blade 13 can be heated to temperatures between 875 and 1095 0 C.
  • the cleaning process is ended and the process gas is sucked off via the vacuum pump 15. Due to the high vacuum forming in the cleaning chamber, in particular the fluorine compounds also diffuse out of the crack 14, which is why the pumping out of the process gas from the tire Cleaning chamber is referred to as a diffusion process.
  • a further cleaning process is started in the manner described above, is introduced into the means of the pressure pump 17 with a new ⁇ process gas into the starskam- mer. 11
  • the defined cycle time for each makespro ⁇ process and the respective diffusion process depend on the system parameters such as the capacity of the line of vacuum pe and the pressure pump and the power of Mikrowellengenera ⁇ tors 19 from. Furthermore, the special conditions of the components to be cleaned are observed. Thus, the optimum cycle times are to be determined on a trial basis in each case for the application, the aim of the optimization being a shortest possible duration of the cleaning process, consisting of alternating cleaning processes and diffusion processes.
  • the supply line 21 for the process gas in the reservoir 18 leads directly to the nozzle 22, which is designed as a cold spray nozzle, where the process gas is accelerated toward the crack 14.
  • the result is a cold gas jet 23 (indicated by an arrow), which leads to a deeper penetration of fluoride ions in the crack 14.
  • the nozzle 22 is alignably supported by a hinge 24 in the stationary suspension 25, so that by aligning the nozzle 22 components of different geometry in the chamber 11 can be subjected to the FIC method.
  • the apparatus according to FIG. 1 can preferably be produced from a coating plant which is modified in such a way that the walls of the chamber 11 are protected against attack by halogen ions.
  • the nozzle 22 must be protected against attack by the promoted halogen ions. This can be done, for example, by a suitable achieve coating resistant to attack by halogen ions.
  • a cleaning device suitable for example, for the FIC method, into which a nozzle 22 is additionally installed.
  • a nozzle 22 is additionally installed.

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Cleaning In General (AREA)
  • Chemical Vapour Deposition (AREA)
  • Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)

Abstract

L'invention concerne un procédé pour nettoyer des surfaces de préférence fissurées, par exemple, des aubes de turbine (13). Selon l'invention, un gaz de traitement (23) est utilisé avec des ions d'halogène (de préférence des ions de fluorure) pour enlever de la surface et des fissures des oxydes spéciaux désignés, par exemple, par le sigle CMAS. L'invention vise à améliorer l'efficacité de ce procédé pour le nettoyage de fissures. A cet effet, le gaz de traitement servant au nettoyage est accéléré par une tuyère et dirigé sur la surface à nettoyer. La présente invention porte également sur une installation de nettoyage modifiée adaptée à ce procédé et sur une installation de pulvérisation à froid transformée pour réaliser ledit procédé. Ce procédé de nettoyage, outre pour des aubes de turbine, peut également être appliqué à d'autres éléments oxydés de turbine, de sorte que ces éléments, comme les aubes de turbine, peuvent être réutilisés. D'autres surfaces sales peuvent également être nettoyées de manière plus efficace par ledit procédé.
PCT/EP2006/063777 2005-07-06 2006-07-03 Procede pour nettoyer des surfaces au moyen d'ions de fluorure WO2007003615A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005032685.4 2005-07-06
DE200510032685 DE102005032685B4 (de) 2005-07-06 2005-07-06 Verfahren zum Reinigen von Oberflächen mit Halogenionen und Reinigungsanlage

Publications (1)

Publication Number Publication Date
WO2007003615A1 true WO2007003615A1 (fr) 2007-01-11

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2006/063777 WO2007003615A1 (fr) 2005-07-06 2006-07-03 Procede pour nettoyer des surfaces au moyen d'ions de fluorure

Country Status (2)

Country Link
DE (1) DE102005032685B4 (fr)
WO (1) WO2007003615A1 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007048696A1 (fr) * 2005-10-26 2007-05-03 Siemens Aktiengesellschaft Procede de nettoyage aux ions fluor de composants oxydes ou attaques par la corrosion
WO2013033295A1 (fr) * 2011-08-31 2013-03-07 General Electric Company Processus de nettoyage localisé et appareil pour ledit processus
CN103785647A (zh) * 2012-10-26 2014-05-14 上海华虹宏力半导体制造有限公司 离子注入设备自动清洁离子腔体以提高部件寿命的方法
WO2024102615A1 (fr) * 2022-11-09 2024-05-16 Ge Infrastructure Technology Llc Systèmes de nettoyage aux ions fluorure

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG157262A1 (en) * 2008-06-06 2009-12-29 Turbine Overhaul Services Pte Microwave assisted chemical stripping of coatings
DE102008043787B3 (de) * 2008-11-17 2010-07-22 Alstom Technology Ltd. Vorrichtung zur Reinigung oxidierter oder korrodierter Bauteile in Gegenwart eines halogenhaltigen Gasgemisches
US9353625B2 (en) 2009-01-13 2016-05-31 General Electric Technology Gmbh Device for cleaning oxidized or corroded components in the presence of a halogenous gas mixture
DE102013009843B4 (de) * 2013-06-12 2022-09-15 Arianegroup Gmbh Verfahren zur Reinigung von Turbinenschaufeln
EP3006602B1 (fr) 2014-10-09 2017-04-12 Airbus DS GmbH Procédé destiné au nettoyage d'aubes de turbines
US9689076B2 (en) 2014-10-10 2017-06-27 Airbus Ds Gmbh Method of cleaning turbine blades

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2144669A (en) * 1982-12-07 1985-03-13 Standard Telephones Cables Ltd Cleaning electrical contacts
EP0209307A1 (fr) * 1985-07-15 1987-01-21 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Nettoyage d'objets métalliques
JPH11286023A (ja) * 1998-04-03 1999-10-19 Ulvac Corp プラズマクリーニング方法及びプラズマクリーニング装置
US20050035085A1 (en) * 2003-08-13 2005-02-17 Stowell William Randolph Apparatus and method for reducing metal oxides on superalloy articles

Family Cites Families (3)

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US4098450A (en) * 1977-03-17 1978-07-04 General Electric Company Superalloy article cleaning and repair method
US5685917A (en) * 1995-12-26 1997-11-11 General Electric Company Method for cleaning cracks and surfaces of airfoils
US6416589B1 (en) * 1999-02-18 2002-07-09 General Electric Company Carbon-enhanced fluoride ion cleaning

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2144669A (en) * 1982-12-07 1985-03-13 Standard Telephones Cables Ltd Cleaning electrical contacts
EP0209307A1 (fr) * 1985-07-15 1987-01-21 The Secretary of State for Defence in Her Britannic Majesty's Government of the United Kingdom of Great Britain and Nettoyage d'objets métalliques
JPH11286023A (ja) * 1998-04-03 1999-10-19 Ulvac Corp プラズマクリーニング方法及びプラズマクリーニング装置
US20050035085A1 (en) * 2003-08-13 2005-02-17 Stowell William Randolph Apparatus and method for reducing metal oxides on superalloy articles

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
DATABASE WPI Week 200001, Derwent World Patents Index; AN 2000-006679, XP002402281 *
MIGLIETTI W ET AL: "Advantages of fluoride ion cleaning at sub-atmospheric pressure", ENG FAILURE ANAL; ENGINEERING FAILURE ANALYSIS JUN 1998 ELSEVIER SCI LTD, EXETER, ENGL, vol. 5, no. 2, June 1998 (1998-06-01), pages 149 - 169, XP002402336 *

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007048696A1 (fr) * 2005-10-26 2007-05-03 Siemens Aktiengesellschaft Procede de nettoyage aux ions fluor de composants oxydes ou attaques par la corrosion
WO2013033295A1 (fr) * 2011-08-31 2013-03-07 General Electric Company Processus de nettoyage localisé et appareil pour ledit processus
CN103781942A (zh) * 2011-08-31 2014-05-07 通用电气公司 局部清洁方法及设备
US9205509B2 (en) 2011-08-31 2015-12-08 General Electric Company Localized cleaning process and apparatus therefor
CN103785647A (zh) * 2012-10-26 2014-05-14 上海华虹宏力半导体制造有限公司 离子注入设备自动清洁离子腔体以提高部件寿命的方法
WO2024102615A1 (fr) * 2022-11-09 2024-05-16 Ge Infrastructure Technology Llc Systèmes de nettoyage aux ions fluorure

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Publication number Publication date
DE102005032685A1 (de) 2007-01-11
DE102005032685B4 (de) 2007-06-14

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