WO2006095869A1

WO2006095869A1 - Material of female die for barrier rib pattern formation, method of forming female die for barrier rib pattern formation, method of forming barrier rib pattern, and plasma display panel

Info

Publication number: WO2006095869A1
Application number: PCT/JP2006/304787
Authority: WO
Inventors: Minoru Hanaoka; Keiji Oda; Takayoshi Tanabe; Katsuyuki Takase; Zen Komiya
Original assignee: Pioneer Corporation; Jsr Corporation
Priority date: 2005-03-11
Filing date: 2006-03-10
Publication date: 2006-09-14
Also published as: JP2006252996A

Abstract

In the employment of additive method in the formation of barrier rib, it is intended to form a barrier rib (female die for barrier rib formation) having satisfactory height and desirable sectional configuration by one-time exposure. Female die (4A) of trapezoidal section with broad bottom plane can be provided by forming photosensitive resin film (4) for formation of female die (4A) from a liquid photohardening composition comprising a polyfunctional compound with radical reactivity, a photopolymerization initiator and a photosensitizer, which liquid photohardening composition exhibits a light transmittance of 10 to 60% at maximum emission wavelength of an irradiation light source for use in hardening of 100 μm thick film.

Description

Specification

Partition wall pattern forming female mold material, partition wall pattern forming female mold forming method, partition wall pattern forming method, plasma display panel

Technical field

TECHNICAL FIELD [0001] The present invention relates to a partition wall pattern forming female mold material, a partition wall pattern forming female mold forming method, a partition wall pattern forming method, and a plasma display panel.

Background art

[0002] In a plasma display panel, a plurality of discharge cells are formed by dividing an airtight space formed between a pair of flat substrates into a stripe shape or a matrix shape, and the plurality of discharge cells are selectively used. A discharge is generated, and the fluorescent layer formed in the discharge cell is caused to emit light by this discharge to display an image.

[0003] The above-described discharge cell is divided by the partition formed on the substrate (back substrate). The pattern of the partition on the substrate is between the electrode (address electrode) formed on the substrate. Therefore, in order to form the partition wall on the substrate with high accuracy, various partition wall forming methods have been proposed and implemented.

[0004] Among the partition wall forming methods, one of the methods widely used for mass production is the sandblast method. In this sandblasting method, a low-melting glass paste, which is a partition wall material, is applied onto a substrate and dried, and then a mask pattern that cannot be shaved by the sandblasting process is formed on the substrate according to the partition pattern. In this method, the partition wall is formed by cutting and removing the dry film of the partition wall material at the location, which is covered with a mask by a sandblasting process in which an abrasive is sprayed.

[0005] Since this sandblasting method forms a mask pattern by photolithography, it is possible to set the partition wall position with high accuracy, and the processing can be completed in a relatively short time. Therefore, it is widely adopted as a method suitable for mass production. However, since the shape of the discharge cell (the shape of the side wall of the partition wall) is determined by the sandblasting process, the shape of the discharge cell cannot be arbitrarily set, and the discharge cell having a depth, i.e., a high There is a problem that it is not suitable for forming a thick partition wall. [0006] In addition to the above-described sandblasting method, a partition wall forming method called an additive method (female mold forming method) is known. In this additive method, a female pattern is formed by a photolithographic process using a photosensitive resin in a portion other than the formation of a partition on the substrate, and then a partition material paste is filled in a portion that becomes a partition between the female molds. Then, the partition pattern is formed by removing the female mold.

[0007] The steps of this additive method will be described with reference to FIG. First, a photosensitive resin expansion 2 is formed by applying a photosensitive resin paste on a substrate [1 on which a substrate 1 & is formed, or a photosensitive resin paste ((a )). Then, a photomask M having a light opaque portion Ma corresponding to the partition wall pattern is placed on the photosensitive resin expansion 2 and exposed by irradiating reaction light (ultraviolet rays) ((b) in the figure). The female ¾J2A is obtained by this development process (Fig. (C)), and then the partition wall paste is filled between the formed female ¾J2A (Fig. (D)), and the female J2A is removed to separate the female die J2A. In this case, the step of removing the female ¾J2A includes a method of immersing the substrate ¾1 in an alkaline aqueous solution to swell and peel the female ¾J2A, and the female ¾J2A and the partition material filled therebetween There is a method in which the barrier rib material is vitrified at the same time that the female J2A is released by firing together.

[0008] Further, Patent Document 1 described below describes a conventional technique for forming a partition wall by this additive method, and an irradiation angle of irradiation light incident on a cross-sectional area of a photosensitive resin plate through a photomask. And forming a female die having a trapezoidal opening in the photosensitive resin plate by applying a photoresist process to the photosensitive resin plate to form a trapezoidal partition wall cross section. Yes.

Patent Document 1: Japanese Patent Application Laid-Open No. 2001-57147

Disclosure of the invention

Problems to be solved by the invention

[0010] Increasing the resolution of displayed images has become a major challenge for plasma display panels, and development of panel forming technologies that support VGA, XGA, SXGA, QXGA, and higher-definition images is underway. . At this time, if an attempt is made to increase the definition of the image with the set screen size, the opening area or pitch of each discharge cell is reduced. In order to obtain a good image quality, a sufficient light emitting space in the discharge cell. (Plasma generation Therefore, it is necessary to increase the depth (height) of the discharge cell or widen the bottom surface of the discharge cell. In order to obtain good luminous efficiency, it is necessary to design the shape of the discharge cell to a desired shape.

As described above, in order to form the discharge cells necessary for obtaining a high-definition and high-quality image, it is necessary to improve the technology for forming the partition walls that partition the discharge cells. However, the above-described sandblasting method inevitably has a small bottom area with respect to the opening area of the discharge cell, and is not suitable for increasing the depth of the discharge cell. There is a fundamental disadvantage.

[0012] Therefore, the above-described additive method is expected as a partition wall forming technique corresponding to high definition and high image quality. However, the conventional technology does not provide a photosensitive resin itself that can form a female mold having a desired height (that forms a partition wall height of 100 to 300 μm) in a single exposure. There is a problem that it is impossible to form a partition wall that partitions discharge cells having a large depth, and in general, the reaction at the bottom surface of the photosensitive resin film is less likely to proceed than the surface directly irradiated with reaction light. Inevitably, the cross section of the female mold becomes an inverted trapezoid, and it is impossible to widen the bottom surface of the discharge cell to form a desired light emitting space in the discharge cell! /, And! // .

[0013] Furthermore, in order to form a discharge cell having a desired shape, a complicated exposure process such as changing the irradiation angle of irradiation light as in the prior art described in Patent Document 1 described above is required. However, there was a problem that the partition wall could not be formed because of high productivity.

[0014] An object of the present invention is to deal with such a problem. That is, to provide an effective barrier rib forming method for obtaining a high-definition and high-quality image, and when adopting an additive method for barrier rib formation, it has a sufficient height in one exposure and is desired. It is an object of the present invention to be able to form partition walls (female molds for forming partition walls) having a cross-sectional shape.

Means for solving the problem

In order to achieve such an object, the present invention includes at least the configurations according to the following independent claims. [0016] [Claim 1] A liquid photocurable composition for forming a partition pattern of a plasma display panel by an additive method, comprising a polyfunctional radical-reactive compound and a photopolymerization initiator A partition wall pattern forming female characterized by comprising a liquid photocurable composition having a light transmittance of 10 to 60% at the maximum emission wavelength of an irradiation light source used for curing a 100 m thick film. Mold material.

[0017] [Claim 5] A female-type forming method for forming a partition wall pattern of a plasma display panel by an additive method, comprising a polyfunctional radical reactive compound, a photopolymerization initiator, and a photosensitizer. A liquid photocurable composition containing a liquid photocurable composition having a light transmittance of 10 to 60% at the maximum emission wavelength of an irradiation light source used for curing a 100 m thick film. A method of forming a female mold for forming a partition wall pattern. Brief Description of Drawings

FIG. 1 is an explanatory diagram of a conventional technique.

FIG. 2 is an explanatory view showing a method for forming a partition pattern forming female die according to an embodiment of the present invention.

FIG. 3 is an explanatory view showing a method for forming a female mold for forming a partition wall pattern according to another embodiment of the present invention.

FIG. 4 is an explanatory view showing a method for forming a partition pattern forming female die according to another embodiment of the present invention.

FIG. 5 is an explanatory diagram of an example (Table 1).

FIG. 6 is a graph showing the relationship between light transmittance and female overhang angle in an example.

BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, embodiments of the present invention will be described. Embodiments of the present invention are characterized by a female material for forming a partition wall pattern for forming a partition wall pattern of a plasma display panel by an additive method, and include a polyfunctional radical reactive compound, a photopolymerization initiator, and a photosensitizer. A liquid photocurable composition containing 100% of a film having a light transmittance of 10 to 60% at the maximum emission wavelength of an irradiation light source used for curing a 100 m thick film. Yes. Here, the maximum emission wavelength is the emission energy of the irradiation light source. If the light source is a UV lamp, it is usually 365 nm. The light transmittance represents the transmittance of light having the maximum emission wavelength that transmits through a film obtained by coating the liquid photocurable composition to a thickness of 100 m.

That is, the liquid photocurable composition used in the embodiment of the present invention contains a polyfunctional radical reactive compound and a photoinitiator as essential components. Examples of the polyfunctional radical reactive compound to be used include trimethylolpropane tri (meth) acrylate, trimethylol propane pan trioxyethyl (meth) acrylate, pentaerythritol tri (meth) acrylate, ethylene glycol di ( (Meth) acrylate, triethylene glycol diatalate, tetraethylene glycol di (meth) acrylate, tricyclodecanedyl dimethanol di (meth) acrylate, polyethylene glycol di (meth) acrylate, 1, 4 butanediol di (Meth) acrylate, 1, 6 hexanediol di (meth) acrylate, neopentyl glycol di (meth) acrylate, tripropylene glycol di (meth) acrylate, neopentyl glycol cold (meth) acrylate, bisph Diol A diglycidyl ether end (meth) acrylic acid adduct, pentaerythritol tri (meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol hexa (meth) acrylate, polyester di (meth ) Atarylate, Tris (2-hydroxyethyl) isocyanurate tri (meth) acrylate, Tris (2-hydroxyethyl) isocyanurate di (meth) acrylate, Ethylene oxide of bisphenol A or Di (meth) acrylate of diol, an adduct of propylene oxide, ethylene oxide of hydrogenated bisphenol A or di (meth) acrylate of diol, an adduct of propylene oxide, diglycidyl ether of bisphenol A (Meta) aterate added to Epoxy (meth) Atari rate (hereinafter, also referred to as "diepoxy of bisphenol A (meth) Atari rate".), Triethylene glycol di Bulle ether.

[0021] Among these polyfunctional radical-reactive compounds, epoxy (meth) acrylate with bisphenol A diglycidyl ether added with (meth) acrylate, dipentaerythritol hexa acrylate, tricyclo Didecane dimethanol di (meth) acrylate, bisphenol A ethylene oxide or propylene oxide diol di (meth) acrylate, tris (2-hydroxyethyl) isocyanurate tri (meta) ) Atarire Is preferred.

[0022] The blending ratio of the polyfunctional radically polymerizable compound in the liquid photocurable composition which is the female material for forming a partition wall pattern of the present invention is generally 30 per 100 parts by weight of the liquid photocurable composition. Parts by weight to 99.9 parts by weight, more preferably 50 parts by weight to 99 parts by weight.

[0023] A monofunctional radical polymerizable compound may be added to the liquid photocurable resin composition in the embodiment of the present invention. Examples of such compounds include burata group-containing ratatas such as N-Buyl pyrrolidone, N-Bielcaprolatatam, isobolol (meth) acrylate, boryl (meth) acrylate, tricyclodehydrol (meth). Alicyclic structures such as attalylate, dicyclopenta (meth) acrylate, 4-butylcyclohexyl (meth) acrylate, (meth) acrylate, benzyl (meth) acrylate, allyloyl morpholine, burimidazole, Butylpyridine, 2-hydroxyethyl (meth) acrylate, 2-hydroxy) acrylate, ethyl (meth) acrylate, propyl (meth) acrylate, isopropyl (meth) acrylate, butyl (meth) acrylate , Amyl (meth) acrylate, isobutyl (meth) acrylate, t-butyl ( (Meth) acrylate, pentyl (meth) acrylate, isoamyl (meth) acrylate, hexyl (meth) acrylate, heptyl (meth) acrylate, octyl (meth) acrylate, isooctyl (meth) acrylate 2—Ethylhexyl (meth) acrylate, Nor (meth) acrylate, Decyl (meth) acrylate, Isodecyl (meth) acrylate, Undecyl (meth) acrylate, Dodecyl (meth) acrylate, Lauryl ( (Meth) Atarylate, Stearyl (Meth) Atarylate, Isostearyl (Meth) Atarylate, Tetrahydrofurfuryl (Meth) Atarylate, Butoxychetyl (Meth) Atarylate, Ethoxydiethylene Glycol (Meth) Atalylate, Phenoxetyl (Meth) Atari Rate, polyethylene Recall mono (meth) acrylate, polypropylene glycol mono (meth) acrylate, methoxyethylene glycol (meth) acrylate, ethoxyethyl (meth) acrylate, methoxy polyethylene glycol (meth) acrylate, methoxy polypropylene glycol (meth) Atalylate, diacetone (meth) acrylamide, isobutoxymethyl (meth) acrylamide, N, N-dimethyl (meth) acrylamide, t-octyl (meth) acrylamide, dimethylaminoethyl (meth) atalylate, jetylaminoethyl ( (Meth) atallylate, 7-amino- 3, 7-dimethyloctyl (meth) Mention may be made of atarylate, N, N jetyl (meth) acrylamide, N, N dimethylaminopropyl (meth) acrylamide, hydroxybutyl butyl ether, lauryl butyl ether, cetyl butyl ether, 2-ethyl hexyl butyl ether. it can.

[0024] The amount of the monofunctional radically polymerizable compound in the liquid photocurable composition that is the female material for forming the partition wall pattern of the present invention is generally 100 parts by weight of the liquid photocurable composition. The force of 0 parts by weight is also 69 parts by weight, more preferably 0 to 49 parts by weight.

In addition, a photopolymerization initiator is used in the liquid photocurable composition in the embodiment of the present invention. The photopolymerization initiator is added to control the light transmittance of the liquid photocurable composition in addition to playing a role of initiating the photocuring reaction of the liquid photocurable composition. The light transmittance of the liquid photocurable composition may be controlled only by the blending amount of the photopolymerization initiator, or the photopolymerization initiator may be used in combination with a photosensitizer described later depending on the blending amount of these two components. You may control. Examples of the photopolymerization initiator include 1-hydroxycyclohexyl phenyl ketone, 2,2-dimethoxy-2-phenylacetophenone, xanthone, fluorenone, benzaldehyde, fluorene, anthraquinone, triphenylamine, carbazole, 3-methyl Acetofenone, 4-Chronobenzophenone, 4,4'-Dimethoxybenzophenone, 4,4'-Diaminobenzophenone, Michler's ketone, benzoin propyl ether, benzoin ether, benzyl dimethyl ketal, 1 (4 isopropyl phenol) ) 2-Hydroxy 2-Methylpropane 1-one, 2-Hydroxy-2-methyl 1-Fel Propane 1-one, Thioxanthone, Jetylthioxanthone, 2-Isopropylthioxanthone, 2 Black mouth thixanthone, 2-Methyl-11 〔Four (Methylthio) phenol] 2 Morpholinopropane 1-one, 2, 4, 6 Trimethylbenzoyldiphenylphosphine oxide, Bis (2,6 dimethoxybenzoyl) 2, 4, 4 Trimethylpentyl thiol In addition, commercially available products are IRUGACURE184, 369, 651, 500, 907, CGI1700, CGI1750, CGI1850, CG24-61 (above, manufactured by Chinoku Specialty One Chemicals); LucirinLR8728 (manufactured by BASF) ); Darocurel l6, 1173 (above, manufactured by Merck); and Ubetalar P36 (manufactured by UCB).

[0026] The addition amount of the photopolymerization initiator is adjusted according to the light transmittance of a 100-m-thick film obtained by curing the obtained liquid photocurable composition. Preferred addition of photopolymerization initiator The amount of addition varies depending on the type of photopolymerization initiator and the emission wavelength of the light source used for photocuring, but is generally 0.1 to 20 parts by weight per 100 parts by weight of the liquid photocurable composition. It is preferably 0.5 to 10 parts by weight.

[0027] In the liquid photocurable composition according to the embodiment of the present invention, it is preferable to use a photosensitizer together. The photosensitizer plays a role of sensitizing the action of the photopolymerization initiator in the photocuring reaction of the liquid photocurable composition, and also controls the light transmittance of the liquid photocurable composition. Is also added. In general, photosensitizers have a larger extinction coefficient than photopolymerization initiators! / Less for photopolymerization initiator because of! The light transmittance can be controlled effectively by the blending amount. For this reason, it is preferable to control the light transmittance of the liquid photocurable composition by using a photopolymerization initiator and a photosensitizer in combination. As this photosensitizer, for example, 4-dimethylaminobenzoic acid, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, isoamyl 4-dimethylaminobenzoate, thixanthone, 2,4 dimethylthioxanthone, 2,3 jetylthioxanthone, commercially available Examples of the product include ubelicril P102, 103, 104, 105 (above, manufactured by UCB).

[0028] The amount of the photosensitizer added is adjusted in accordance with the light transmittance of the cured film in the same manner as the photopolymerization initiator. The preferred amount of photosensitizer added varies depending on the photosensitizer species and the emission wavelength of the light source used for photocuring. Generally, 0.01 to 15 parts by weight per 100 parts by weight of the liquid photocurable composition. Parts, more preferably 0.05 to 10 parts by weight, even more preferably 0.1 to 5 parts by weight.

[0029] In addition, in the liquid photocurable composition according to the embodiment of the present invention, the viscosity of the liquid photocurable composition can be controlled by adding a solvent in order to adjust the coating film thickness. Solvents for this include benzene, toluene, xylene, hexane, cyclohexane, cyclohexanone, acetone, methyl ethyl ketone, methyl isobutyl ketone, chloroform, methyl chloride, methanol, ethanol, isopropanol, butanol, Water can be used. A combination of these solvents can also be used.

[0030] The amount of the solvent added can be used at an arbitrary ratio for the purpose of controlling the viscosity of the liquid photocurable composition. If the amount of the solvent added is too large, it takes time to dry the solvent during coating. Mechanical properties of female mold material for partition wall pattern formation obtained without completely removing the solvent The strength may be inferior. The amount of the solvent added is preferably 900 parts by weight or less per 100 parts by weight of the liquid photocurable composition.

[0031] According to such a method for forming a partition pattern forming female mold using the partition pattern forming female material according to the embodiment of the present invention or the above-described liquid photocurable composition, the above-described light transmittance is obtained. By arbitrarily adjusting in the range of 10 to 60%, the cross-sectional shape of the partition pattern female mold can be arbitrarily set to inverted trapezoidal, rectangular or trapezoidal.

[0032] In particular, by setting the above-described light transmittance to 40% or more, a female cross section having a trapezoidal shape with a wide bottom surface can be obtained, and a partition wall that partitions discharge cells with a wide bottom surface can be formed. become. As a result, even when the opening area of the discharge cell is reduced in order to form a high-definition screen, a sufficient light emitting space can be secured by increasing the bottom area of the discharge cell. Good image quality can be obtained.

[0033] Further, by making the above-described light transmittance relatively high, the bottom of the film can be reacted efficiently even when the above-mentioned liquid photocurable composition is formed thick. As a result, a female mold having a high height can be formed, and a partition wall that partitions a discharge cell having a depth can be formed.

[0034] Further, since the light transmittance described above can be adjusted by the amount of the photopolymerization initiator described above or the addition amount of the photopolymerization initiator and the photosensitizer, the partition pattern can be adjusted by this adjustment. The cross-sectional shape of the forming female mold can be arbitrarily set to a trapezoidal shape, a rectangular shape, or a composite shape thereof. Then, by setting the shape of the partition formed thereby, it is possible to design the shape of the discharge cell that can obtain good light emission efficiency.

Hereinafter, a more specific method for forming the partition pattern forming female mold will be described with reference to the drawings. FIG. 2 is an explanatory view showing a method for forming a partition pattern forming female die according to an embodiment of the present invention.

According to this, as a step, the substrate 1 is placed on the support plate 10, the electrode 2 (address electrode) is formed, and the dielectric layer 3 (address protection layer) is formed as necessary. A liquid leakage guide plate 11 is erected around the substrate 1 and the substrate 1 surrounded by the liquid leakage guide plate 11 is filled with the liquid photocurable composition described above to form a photosensitive resin film 4. ((A) in the figure). Here, the liquid leakage guide plate 11 is used to form a partition wall having a height of about 100 to 300 m. Thus, the photosensitive resin film 4 having a desired thickness is obtained.

[0037] The present invention is not limited to this, and the liquid photocurable composition described above may be applied to the substrate 1 by an applicator or the like in the form of a resinous paste having a desired viscosity. In this case, in order to form a partition wall having a height of about 100 to 300 / ζ πι, it is necessary to apply a desired thickness, so it is necessary to impart a desired viscosity to the resin paste. become.

[0038] As a subsequent step, a photomask 12 having a light-impermeable portion 12a of a partition wall pattern is placed on the photosensitive resin film 4 made of the filled liquid photocurable composition, and reaction light (for example, , UV light having a maximum emission wavelength of 365 nm). Here, the process is completed with a single exposure of parallel rays. According to this, the portion irradiated with the reaction light through the opening other than the light opaque portion 12a is cured, and an uncured portion is formed under the light opaque portion 12a ((b) in the figure). . Then, in a subsequent development processing step, the uncured portion under the light-impermeable portion 12a is removed to obtain a female die 4A having a partition wall pattern (FIG. (C)).

[0039] At this time, by using the liquid photocurable composition with the light transmittance adjusted as described above, the cross-sectional shape of the female die 4A can be arbitrarily set even in one parallel light exposure. For example, by using a liquid photocurable composition having a light transmittance of 40% or more, a female die 4A having a trapezoidal cross section with a bottom surface wider than the top surface as shown in the figure can be obtained.

FIG. 3 is an explanatory view showing a method of forming a partition pattern forming female die according to another embodiment of the present invention. In this embodiment, the substrate 1 is placed on the support plate 10, the electrode 2 (address electrode) is formed, and the dielectric layer 3 (address protection layer) is formed as necessary. A film (dry film resist) formed by drying the liquid photocurable composition described above is placed to form a photosensitive resin film 4, and a partition pattern light is formed on the photosensitive resin film 4. A photomask 12 having an opaque portion 12a is placed and irradiated with reaction light (for example, ultraviolet light having a maximum emission wavelength of 365 nm) ((a) in the figure). Then, in the subsequent development processing step, the uncured portion under the light-impermeable portion 12a is removed to obtain a female die 4A having a partition pattern ((b) in the figure).

[0041] According to this, similarly to the above-described method, it is possible to obtain a female die 4A having a trapezoidal cross section whose bottom surface is wider than the top surface as shown in the figure, and since the photosensitive resin film 4 formed into a film is used. Thus, the formation of the photosensitive resin film 4 can be simplified. FIG. 4 is an explanatory view showing a method of forming a partition pattern forming female die according to another embodiment of the present invention. In this embodiment, as a step, the liquid photocurable composition having the light transmittance set to a desired value is dried and cured to form a plurality of films 40a to 40d. In subsequent steps, a plurality of films 40a to 40d are laminated on the substrate 2 on which the electrode 2 or the dielectric layer 3 is formed according to the desired cross-sectional shape of the female mold to be formed. Further, as a subsequent process, a photomask 12 having a light-opaque portion 12a having a partition wall pattern is placed on the plurality of films 40a to 40d and irradiated with reaction light. The uncured part under the transmission part 12a is removed to obtain a female mold with a partition pattern

[0043] According to this embodiment, the above-described light transmittances in the plurality of films 40a to 40d are set to different values as appropriate, and the stacking order is set as appropriate, so that a single pass through the photomask 12 is performed. The cross-sectional shape of the female mold can be arbitrarily set by exposure. In particular, by increasing the number of laminated films 40a to 40d and setting appropriate light transmittances, it is possible to form a female mold having a desired curved cross section as shown in the figure. According to this, in order to obtain good luminous efficiency, the shape of the discharge cell can be arbitrarily designed, and even when a highly precise discharge cell arrangement is formed, an appropriate light emitting space can be formed. And high-quality images can be obtained.

[0044] After forming the partition pattern forming female die according to each of such embodiments, the partition material filling step shown in Fig. L (d) and the female die removing step shown in Fig. 1 (e) are performed. After that, the partition pattern can be formed. In the method for forming the partition pattern according to the embodiment of the present invention, the partition material is filled between the formed female molds, and then the female mold and the partition material are fired simultaneously.

In this case, the partition wall material is filled between the female molds by using a partition wall paste such as a low melting point glass paste as in the prior art and by squeegee or coating. After this filling step, if necessary, the partition wall material adhering or splashing on the portion other than the groove portion of the female mold is cleaned by means such as polishing, and the female mold and the filled partition wall material are fired at the same time. At the same time that the mold is disassembled and removed, the partition material is vitrified to form a partition pattern on the substrate 1. At this time, by simultaneously firing the female mold and the partition wall material, the female mold can be formed while maintaining the shape of the molded product of the partition wall, regardless of the shape of the female mold (for example, a trapezoid with a wide bottom surface). To remove Togashi.

[0046] The partition wall pattern forming female mold material comprising the liquid photocurable composition described above has a property of shrinking when heated, and there is no stress on the partition wall material during firing, and the partition wall forming support material during partition wall formation. In particular, it is effective in eliminating the distortion and cracking of the partition walls. In addition, this female material for forming a partition wall pattern is useful from the viewpoint of environmental protection because it generates only carbon dioxide and water vapor during firing and does not generate anything harmful to the environment.

[0047] According to the plasma display panel in which the discharge cells are partitioned by the barrier rib pattern formed as described above, even when the density of the discharge cells is increased in order to display a high-definition image, A sufficient emission space can be formed in the discharge cell, and the discharge cell can be designed in a desired shape so as to increase the luminous efficiency. In particular, as described above, when the female die is trapezoidal with a wide bottom surface, the partition wall has an inverted trapezoidal cross section, the bottom surface can be widened with respect to the opening of the discharge cell, and the light emitting space is effectively reduced. Can be spread.

Example

[0048] Examples of the female material for forming a partition wall pattern according to the present invention are shown below.

[0049] In a reaction vessel equipped with a stirrer, 50 parts of bisphenol A diepoxy acrylate (VR-90, manufactured by Showa Takao Co., Ltd.), dipentaerythritol hexa acrylate (Nippon Gyaku ( KAYARAD DPHA) (12.5 parts), 1-hydroxycyclohexylphenol ketone (Cirbus Specialty Chemicals Co., Ltd. Irgacurel84), 1 part, 2, 4-Jetylthioki Santon (Nippon Kayaku Co., Ltd.) KAYACURE DETEX) was added in the amount shown in Table 1, and 50 parts of methyl ethyl ketone was added. The mixture in the container was stirred at 50 ° C for 3 hours to obtain a uniform solution.

[0050] As a substrate S on which the obtained solution was applied, a glass substrate that had been surface-treated with an ethanol solution of trimethoxysilylpropyl metatalylate was prepared.

[0051] The liquid photocurable composition was applied to the glass substrate for each of the examples shown in Table 1 using an applicator. The coating thickness was adjusted to be about 220 m after curing. This is left in an oven at 80 ° C for 10 minutes to dry, and then a pattern mask is applied to the surface and UV is applied. UV irradiation was performed using a conveyor. The illuminance of UV was 20 mWZcm ² and the amount of irradiation was 45 miZcm ² .

[0052] The obtained cured product was immersed in a solution of methyl ethyl ketone Z ethanol (lZl) for development processing.

[0053] The cross-sectional shape of the obtained female mold was observed with a microscope. The relationship between the female mold shape and the composition is shown in Table 1 (refer to Fig. 5 for the symbols in the table).

[0054] [Table 1]

[0055] From the results of this example, the relationship between the light transmittance and the angle Θ (female overhang angle) is shown in FIG. As shown in the figure, by adjusting the light transmittance between 10% and 60%, the overhang angle Θ can be changed within a range of about 70 to L10. That is, it becomes possible to change the female section to an inverted trapezoidal force rectangle or trapezoid.

As described above, according to the embodiments or examples of the present invention, it is possible to provide an effective partition forming method for obtaining a high-definition and high-quality image, and it is possible to provide an additional method for partition formation. When the active method is adopted, a partition wall (female mold for forming a partition wall) having a sufficient height and a desired cross-sectional shape can be formed by one exposure.

Claims

The scope of the claims

[1] A female material for forming a partition pattern of a plasma display panel by an additive method,

A liquid photocurable composition containing a polyfunctional radical-reactive compound and a photopolymerization initiator and having a light transmittance of 10 to 60 at the maximum emission wavelength of an irradiation light source used for curing a 100 m thick film. A female mold material for forming a partition wall pattern, which also has a liquid photocurable composition strength of%.

[2] A female material for forming a partition pattern of a plasma display panel by an additive method,

A liquid photocurable composition containing a polyfunctional radical-reactive compound, a photopolymerization initiator, and a photosensitizer, and has a light transmittance of 10 at the maximum emission wavelength of an irradiation light source used for curing a 100 m thick film. A female mold material for forming a partition wall pattern, characterized by having a liquid photo-curable composition power of ˜60%.

[3] The female material for forming a partition wall pattern according to claim 1 or 2, wherein the light transmittance is 40% or more.

[4] The partition pattern shape according to any one of claims 1 to 3, wherein the addition amount of the photopolymerization initiator and Z or the photosensitizer is adjusted according to the light transmittance. Adult female material.

[5] A female mold forming method for forming a partition pattern of a plasma display panel by an additive method,

A liquid photocurable composition containing a polyfunctional radical-reactive compound and a photopolymerization initiator and having a light transmittance of 10 to 60 at the maximum emission wavelength of an irradiation light source used for curing a 100 m thick film. A method for forming a female pattern for forming a partition wall pattern, wherein the composition also has a liquid photocurable composition strength of%.

[6] A method of forming a female mold for forming a partition pattern of a plasma display panel by an additive method,

A liquid photo-curable composition containing a polyfunctional radical-reactive compound, a photopolymerization initiator, and a photosensitizer, and the maximum emission of the irradiation light source used when curing a 100 m thick film A method for forming a female mold for forming a partition wall pattern, characterized in that it also has a liquid photocurable composition having a light transmittance of 10-60% at a wavelength.

7. The method for forming a female mold for forming a partition wall pattern according to claim 5 or 6, wherein the light transmittance is 40% or more.

[8] The partition pattern formation according to any one of claims 5 to 7, wherein the addition amount of the photopolymerization initiator and Z or the photosensitizer is adjusted according to the light transmittance. Forming method for female mold.

[9] The cross-sectional shape of the female mold is arbitrarily set to a trapezoidal shape, a rectangular shape, or a composite shape thereof by adjusting the light transmittance according to the amount of the photopolymerization initiator and Z or a photosensitizer added. A method for forming a female mold for forming a partition wall pattern according to any one of claims 5 to 8.

[10] A step of standing a liquid leakage guide plate around a substrate on which a partition wall is to be formed, and filling the liquid photocurable composition on the substrate surrounded by the liquid leakage guide plate;

A step of placing a photomask having a light-impermeable portion of the partition wall pattern on the filled liquid photocurable composition and irradiating with reaction light;

10. The method for forming a partition wall pattern forming female die according to claim 5, further comprising a step of removing an uncured portion under the light opaque portion to obtain a female die of the partition wall pattern. .

[11] A step of placing a film formed by drying the liquid photocurable composition on a substrate on which partition walls are to be formed,

Placing a photomask having a light-impermeable portion of the barrier rib pattern on the film and irradiating reactive light;

The method for forming a female mold for forming a partition wall pattern according to any one of claims 5 to 10, further comprising a step of obtaining a female mold of the partition wall pattern by removing an uncured portion below the light opaque portion. .

[12] A step of drying the liquid photocurable composition with the light transmittance set to a desired value to form a plurality of films,

Depending on the desired cross-sectional shape of the female mold, the plurality of films are intended to form partition walls. Laminating on a substrate,

Placing a photomask having a light-impermeable portion of the partition pattern on the plurality of films and irradiating reaction light;

[13] After the partition wall material is filled between the female dies formed by the method for forming the partition wall pattern forming female mold according to any one of claims 5 to 12, the female mold and the partition wall material are simultaneously used. A method for forming a barrier rib pattern by firing to form a barrier rib pattern.

14. A plasma display panel in which discharge cells are partitioned by barrier ribs formed by the barrier rib pattern forming method according to claim 13.

15. The plasma display panel according to claim 14, wherein the partition wall has an inverted trapezoidal cross section.