WO2006045653A1 - Verfahren zum montieren von halbleiterchips und entsprechende halbleiterchipanordnung - Google Patents
Verfahren zum montieren von halbleiterchips und entsprechende halbleiterchipanordnung Download PDFInfo
- Publication number
- WO2006045653A1 WO2006045653A1 PCT/EP2005/054165 EP2005054165W WO2006045653A1 WO 2006045653 A1 WO2006045653 A1 WO 2006045653A1 EP 2005054165 W EP2005054165 W EP 2005054165W WO 2006045653 A1 WO2006045653 A1 WO 2006045653A1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/14—Housings
- G01L19/141—Monolithic housings, e.g. molded or one-piece housings
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/0007—Fluidic connecting means
- G01L19/0038—Fluidic connecting means being part of the housing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/06—Means for preventing overload or deleterious influence of the measured medium on the measuring device or vice versa
- G01L19/0627—Protection against aggressive medium in general
- G01L19/0636—Protection against aggressive medium in general using particle filters
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L19/00—Details of, or accessories for, apparatus for measuring steady or quasi-steady pressure of a fluent medium insofar as such details or accessories are not special to particular types of pressure gauges
- G01L19/14—Housings
- G01L19/147—Details about the mounting of the sensor to support or covering means
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01L—MEASURING FORCE, STRESS, TORQUE, WORK, MECHANICAL POWER, MECHANICAL EFFICIENCY, OR FLUID PRESSURE
- G01L9/00—Measuring steady of quasi-steady pressure of fluid or fluent solid material by electric or magnetic pressure-sensitive elements; Transmitting or indicating the displacement of mechanical pressure-sensitive elements, used to measure the steady or quasi-steady pressure of a fluid or fluent solid material, by electric or magnetic means
- G01L9/0041—Transmitting or indicating the displacement of flexible diaphragms
- G01L9/0051—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance
- G01L9/0052—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements
- G01L9/0054—Transmitting or indicating the displacement of flexible diaphragms using variations in ohmic resistance of piezoresistive elements integral with a semiconducting diaphragm
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
- H01L2224/85—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
- H01L2224/85909—Post-treatment of the connector or wire bonding area
- H01L2224/8592—Applying permanent coating, e.g. protective coating
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/102—Material of the semiconductor or solid state bodies
- H01L2924/1025—Semiconducting materials
- H01L2924/10251—Elemental semiconductors, i.e. Group IV
- H01L2924/10253—Silicon [Si]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1515—Shape
- H01L2924/15151—Shape the die mounting substrate comprising an aperture, e.g. for underfilling, outgassing, window type wire connections
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16151—Cap comprising an aperture, e.g. for pressure control, encapsulation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/161—Cap
- H01L2924/1615—Shape
- H01L2924/16152—Cap comprising a cavity for hosting the device, e.g. U-shaped cap
Definitions
- the present invention relates to a method for mounting semiconductor chips and a corre sponding semiconductor chip arrangement.
- DE 102 004 011 203 discloses various examples of methods for mounting semiconductor chips and corresponding semiconductor chip arrangements, of which three examples are explained in more detail below.
- FIG. 7 shows a first example of a method for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a cross-sectional view.
- reference numeral 100 denotes a TO8 socket made of, for example, Kovar.
- Reference numeral 5 is a micromechanical silicon pressure sensor chip with piezoresistive Wandlerele ⁇ elements 51, which are housed on a membrane 55.
- a cavity 58 is placed on the back side of the respective silicon pressure sensor chip 5, for example by anisotropic etching, e.g. with KOH or TMAH.
- the membrane 55 can also be produced by trench etching.
- the sensor chip 5 may consist of a pure resistance bridge with piezoresistive resistors or be combined with an evaluation circuit, which together with the piezoresistors in a
- Reference numeral 53 in FIG. 7 designates a bonding pad of an integrated circuit 52 (not illustrated in greater detail), which has a connection wire 60 with an electrical connection device 130 which in turn is insulated from the TO8 socket 100 by an insulating layer 131.
- the glass base 140 has a passage opening 141, which connects the cavity 58 to the externally prevailing pressure P via a passage opening 101 of the TO8 base 100 and a connection device 120 attached thereto.
- the structure shown in Fig. 7 is usually still welded hermetically sealed with a metal cap, not shown.
- FIG. 8 shows a second example of a method for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a cross-sectional view.
- This second example provides for bonding the sensor chip 5 to a substrate 1 made of a ceramic or plastic via a glass base 140 ', which has no through-opening, and to passivate it with a gel 2 for environmental protection purposes.
- a protective cap 13 having a through hole 15 for the applied pressure P.
- the glass cap 140 'in this example has no through-hole since the pressure P is applied from the other side.
- FIG. 9 shows a third example of a method for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a cross-sectional view.
- the sensor chip 5 ' is a surface micromechanical sensor chip which has been produced, for example, according to the method described in DE 100 32 579 A1 and has an integrated cavity 58' over a membrane region 55 '.
- Premoldgereheats 10 For mounting, bond pads 53 of the sensor chip 5 'are soldered in a mounting region by means of a solder or adhesive bond, for example solder balls 26, to bonding pads (not shown) of the substrate, the part a Premoldgeophuses 10 is made of plastic, protrudes from the side of a molded therein leadframe 8 her ⁇ .
- the premold housing 10 has a recess 11, in addition to which the sensor chip 5 is mounted overhanging in flip-chip technology.
- the minimum distance of Konatkt Schemeen the leadframe 8 in the mounting region of the sensor chip 5 is usually greater than the minimum distance of the bond pads 53 on the sensor chip 5.
- only a small number of bond pads 53 on the sensor chip 5 are necessary, e.g. four pieces for the connection of a Wheatstone bridge, these can be placed as far away as necessary from each other.
- the mounting area additionally has an underfill 28 made of an insulating plastic material, wherein the edge K of the recess 11, which lies between the mounting area and the membrane area 55 ', serves as a trailing edge for the underfill 28 during the assembly process.
- the tear-off edge K ensures that the underfill 28 can not get into or under the membrane area 55 '.
- the membrane area 55 'of the sensor chip 5' protrudes laterally next to the strip-shaped mounting area, so that the pressure medium can reach the membrane area 55 'undisturbed.
- the sensor chip 5 ' is in the membrane area 55' on the surface by a (not shown) view, e.g. a nitride layer, passivated, which acts as a secure media protection. In the assembly area, the sensor chip 5 'is protected against corrosion by the underfill 28.
- a (not shown) view e.g. a nitride layer, passivated, which acts as a secure media protection.
- the sensor chip 5 ' In the assembly area, the sensor chip 5 'is protected against corrosion by the underfill 28.
- the premold housing 10 has an annular side wall region 10a, on the upper side of which a cover 20 'with a passage opening 15b for the pressure P to be applied is provided. Due to the fact that the sensor chip 5 'by the flip-chip mounting on the Montage ⁇ area opposite side of the peripheral region of the top of the premold housing 10 is spaced, a problem-free transfer of the applied pressure P on the membrane area
- the cover 20 has a pressure connection piece 21, wherein an optional filter 22 can be installed in the passage opening 15b, which prevents particles or liquid media from getting into the interior of the sensor package. Thus, it can be prevented, for example, that water penetrates, which could break off the sensor chip 5 'during freezing and thus destroy it.
- the glass base 140, 140 ' according to FIGS. 7 and 8, which entails considerable costs during production, can be completely omitted, since the lateral protruding of the surface micromechanical sensor chip 5' is already adjacent to the strip-shaped mounting region the removal allows the voltage generated by different thermal expansion coefficients of silicon and the connection with the Lotkügelchen 26 and the underfill 28.
- the idea underlying the present invention is an overhanging structure of a semiconductor chip, in particular surface micromechanical (OMM) differential pressure sensor chips, on a substrate with a recess by means of a flip-chip mounting technique, wherein a mechanical decoupling of the semiconductor chip is provided by the lateral overhanging.
- OMM surface micromechanical
- the method according to the invention for mounting semiconductor chips with the features of claim 1 and the corresponding semiconductor chip arrangement according to claim 8 have the advantage, compared with the known approaches, that a simple, cost-effective and voltage-insensitive construction is made possible.
- the subject of the present invention has the further advantage that no further process steps are required compared to an absolute pressure sensor without a second pressure connection except for an additional short silicon trench step for opening an access opening to a cavern, which is very cost-effective for the method according to the invention designed.
- the etching step for opening the second pressure access does not have to take place through the entire sensor, but only through a small thickness of the membrane, which entails a short etching process.
- a potential clogging of the connection channel from the membrane cavity to the pressure connection hole by particles in the medium can be prevented by a large-area, fine-meshed grid.
- the type of sensor according to the invention has a very media-resistant construction which protects the electrical connections, for example made of aluminum, by the underfill. There are only surfaces of silicon or silicon nitride (passivation) to which the print medium can get. No gel is required to passivate the electrical chip connections (bond pads).
- a monocrystalline silicon membrane can be produced, whose particular advantage is the high mechanical
- the semiconductor chip By joining solder on the semiconductor chip and the substrate, the semiconductor chip is aligned because of the surface tension of the solder. The most energetically favorable state is reached when the solder between two contact surfaces on the chip and substrate has the smallest surface. This is is enough if the two surfaces are directly above each other. The pressure access hole is thereby adjusted by means of this Dijustage exactly on the chip connection. As a result, even very small structures can be precisely aligned.
- the inventive method also allows a space-saving design of sensor chip and evaluation circuit.
- a multiplicity of bond pads are provided in the mounting area, which are mounted on the surface of the substrate via a solder or adhesive connection.
- the through-opening through the substrate is provided for opening the cavern before mounting the semiconductor chip.
- a first pressure connection device is provided on the rear side of the substrate and a second pressure connection device is provided on the front side of the substrate, which are designed in such a way that different pressures can be applied to the two sides of the membrane region.
- the substrate is a part of a prefabricated housings.
- the housing is a premold housing made of plastic, in which a leadframe is formed.
- the housing has an annular sowandbe- rich, which surrounds the sensor chip and which is closed above the sensor chips by a cover with a fürgangsöffiiung.
- the cavern has a first cavern area, a second cavern area and a third cavern area, wherein the first cavern area lies below the membrane area, the third cavern area lies in the peripheral area and has the opening to the substrate and the second cavern area is a channel-like area which connects the first and third channel area.
- the second cavern area has a narrow elongated shape.
- the first cavern area has a rectangular, preferably square shape.
- the second cavern area starts from a corner of the first cavern area.
- a piezoelectric or piezoresistive pressure detection device is provided in the membrane region.
- FIG. 2 shows a second embodiment of the inventive method for mounting of
- Fig. 3 shows a third embodiment of the inventive method for mounting of
- FIG. 4 shows a fourth embodiment of the method according to the invention for mounting semiconductor chips and a corresponding semiconductor chip arrangement in cross-sectional view
- 5,6 shows an embodiment of the semiconductor chip according to the invention as a pressure sensor in FIG.
- FIG. 7 shows a first example of a method for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a cross-sectional view
- FIG. 8 shows a second example of a method for mounting semiconductor chips and a corresponding semiconductor chip arrangement in cross-sectional view
- FIG. 9 shows a third example of a method for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a cross-sectional view.
- FIG. 1a, b show a first embodiment of the method according to the invention for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a lateral or planar cross-sectional view.
- the sensor chip 5 " is a surface micromechanical sensor chip, which has been produced, for example, according to the method described in DE 100 32 579 A1 and has an integrated cavity 58 'over a membrane region 55'.
- the substrate 1 ' which is a printed circuit board or ceramic and which has a recess 11, next to the sensor chip 5 "is mounted overhanging in flip-chip technology.
- the mounting area MB additionally has an underfill 28 made of an insulating plastic material, wherein the edge K of the recess 11, which lies between the mounting area and membrane area 55 ', serves as a tear-off edge for the underfill 28 during the assembly process.
- the tear-off edge K ensures that the underfill 28 can not get into or under the membrane area 55 '.
- the membrane area 55 'of the sensor chip 5 "protrudes laterally next to the strip-shaped mounting area so that the pressure medium with the pressure P1 can reach the membrane area 55' undisturbed.
- the sensor chip 5 is passivated in the membrane region 55 'on the surface by a view (not shown), for example a nitride layer, which acts as a secure medium protection.
- the sensor chip 5 has a different structure of the cavern 58 ', which can be taken from FIG
- the second cavern area 258 ' is a channel-like area connecting the first and third cavern areas 158', 358 '.
- the first cavern area 158 'in this embodiment has a square shape, the second cavern area 258' starting from a corner of the first cavern area 158 '. This is advantageous in terms of preventing possible stress coupling of the second cavern region 258 'into the piezoresistors 51.
- the third cavern region 358 ' is round in the present example and, as seen in FIG. 1b, has a lattice-shaped opening 58' a, the lattice structure being required, penetration of foreign particles into the cavern 58 'or clogging of the channel region to prevent.
- the substrate 1 ' has a through-opening 101' below the opening 58'a, which enables a coupling of pressure P2 through the substrate 1 'into the cavity 58'.
- the area of the through-opening 101 ' does not reach underfill 28. This again creates an edge on the substrate 1', at which a meniscus forms, and the underfill 28 stops ,
- the evaluation circuit 6 is integrated in the mounting area MB of the chip 5 ".
- a solution with a separate evaluation chip is also conceivable.
- FIG. 2 shows a second embodiment of the method according to the invention for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a cross-sectional view.
- the cover 20" has an opening 15a.
- the pressure connection device in this case has a housing device 3, which is flanged to the opening 15a and the opening 101 ', by means of an O-ring device 4 and corresponding
- Pressure openings 15a ' has.
- the pressure Pl reaches only the front side of the membrane region 55 'and the pressure P2 reaches the rear side of the membrane region 55'.
- FIG. 3 shows a third embodiment of the method according to the invention for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a cross-sectional view.
- the cover 20 is likewise provided in the embodiment shown in FIG. 3, but here it has a pressure connecting piece 21 with an opening 15.
- a further pressure connecting piece 21 ' is provided, which via an adhesive layer 21 'a is glued to the back of the substrate 1' is additionally provided in the pressure connection piece 21 'an opti ⁇ onal filter 22nd
- FIG. 4 shows a fourth embodiment of the method according to the invention for mounting semiconductor chips and a corresponding semiconductor chip arrangement in a cross-sectional view.
- FIG. 4 The embodiment shown in FIG. 4 is based on the example described in connection with FIG. 9.
- the premold housing 10 has on its rear side a through-opening 101 ", on which an optional filter 22 'is glued externally, through the through-opening 101" the pressure P2 can reach the rear side of the membrane area 55.
- the pressure P 1 can reach the front side of the membrane region 55 'through the connecting piece 21 and the optional filter 22 located therein.
- Fig. 5.6 show an embodiment of the inventive Absoltut- or differential pressure sensor in cross-sectional view.
- a passivation layer 65 for example of silicon nitride, is initially applied to the front side of the chip 5 "and, above this, a photoresist layer 71 which is photolithographically patterned in the usual way in the form of a grating 75. With the aid of this structured photoresist layer 71 as a mask, an etching can then take place for the success of the grid-like opening 58'a.
- a major advantage of this trench etching process is that only the thickness of the passivation layer 65 and the top layer of silicon must be etched above the quenching region 358 'and not the entire thickness of the silicon chip 5 "as in the prior art of the third cavity region 358 ', the underlying silicon is etched, as can be clearly seen in Fig. 6.
- a sufficiently long overetching time can be set, so that it is ensured that over the entire wafer, the corresponding openings 58'a are safely opened to the caverns 58.
- piezoresistive sensor structures were considered.
- the invention is also suitable for capacitive or other sensor structures in which membranes are used.
- the geometry of the membrane can be designed as desired, but preferably square, recht ⁇ angular or round.
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- Analytical Chemistry (AREA)
- Measuring Fluid Pressure (AREA)
- Pressure Sensors (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/666,179 US7563634B2 (en) | 2004-10-22 | 2005-08-24 | Method for mounting semiconductor chips, and corresponding semiconductor chip system |
JP2007537245A JP4847960B2 (ja) | 2004-10-22 | 2005-08-24 | 半導体チップを搭載するための方法および相応する半導体チップ装置 |
EP05787150A EP1805101B1 (de) | 2004-10-22 | 2005-08-24 | Verfahren zum montieren von halbleiterchips und entsprechende halbleiterchipanordnung |
DE502005010452T DE502005010452D1 (de) | 2004-10-22 | 2005-08-24 | Verfahren zum montieren von halbleiterchips und entsprechende halbleiterchipanordnung |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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DE102004051468.2 | 2004-10-22 | ||
DE102004051468A DE102004051468A1 (de) | 2004-10-22 | 2004-10-22 | Verfahren zum Montieren von Halbleiterchips und entsprechende Halbleiterchipanordnung |
Publications (1)
Publication Number | Publication Date |
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WO2006045653A1 true WO2006045653A1 (de) | 2006-05-04 |
Family
ID=35985110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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PCT/EP2005/054165 WO2006045653A1 (de) | 2004-10-22 | 2005-08-24 | Verfahren zum montieren von halbleiterchips und entsprechende halbleiterchipanordnung |
Country Status (6)
Country | Link |
---|---|
US (1) | US7563634B2 (de) |
EP (1) | EP1805101B1 (de) |
JP (1) | JP4847960B2 (de) |
CN (1) | CN100584741C (de) |
DE (2) | DE102004051468A1 (de) |
WO (1) | WO2006045653A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2008089412A (ja) * | 2006-10-02 | 2008-04-17 | Matsushita Electric Works Ltd | 圧力センサ |
WO2008138666A1 (de) * | 2007-05-15 | 2008-11-20 | Robert Bosch Gmbh | Differenzdruck-sensoranordnung und entsprechendes herstellungsverfahren |
Families Citing this family (22)
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CN101960276B (zh) * | 2007-10-30 | 2013-07-03 | 阿自倍尔株式会社 | 压力传感器及其制造方法 |
DE102008011943B4 (de) * | 2008-02-29 | 2012-04-26 | Robert Bosch Gmbh | Sensoranordnung zur Differenzdruckmessung |
JP5291979B2 (ja) | 2008-04-24 | 2013-09-18 | 株式会社フジクラ | 圧力センサ及びその製造方法と、該圧力センサを備えた電子部品 |
JP5331546B2 (ja) | 2008-04-24 | 2013-10-30 | 株式会社フジクラ | 圧力センサモジュール及び電子部品 |
US7832279B2 (en) * | 2008-09-11 | 2010-11-16 | Infineon Technologies Ag | Semiconductor device including a pressure sensor |
US8723276B2 (en) | 2008-09-11 | 2014-05-13 | Infineon Technologies Ag | Semiconductor structure with lamella defined by singulation trench |
EP2172754A1 (de) * | 2008-10-06 | 2010-04-07 | Sensirion AG | Infrarotsensor mit rückseitigem Infrarotfilter |
US8124953B2 (en) | 2009-03-12 | 2012-02-28 | Infineon Technologies Ag | Sensor device having a porous structure element |
JP5286153B2 (ja) * | 2009-04-28 | 2013-09-11 | アズビル株式会社 | 圧力センサの製造方法 |
US8518732B2 (en) | 2010-12-22 | 2013-08-27 | Infineon Technologies Ag | Method of providing a semiconductor structure with forming a sacrificial structure |
US8546169B1 (en) * | 2012-04-25 | 2013-10-01 | Freescale Semiconductor, Inc. | Pressure sensor device and method of assembling same |
US9500808B2 (en) | 2012-05-09 | 2016-11-22 | The Boeing Company | Ruggedized photonic crystal sensor packaging |
CN103616122B (zh) * | 2013-10-28 | 2017-01-11 | 天津科技大学 | 一种冷藏车用的气体压力传感器 |
US9310267B2 (en) * | 2014-02-28 | 2016-04-12 | Measurement Specialities, Inc. | Differential pressure sensor |
WO2015180859A1 (de) | 2014-05-27 | 2015-12-03 | Robert Bosch Gmbh | Verfahren zur herstellung eines mikromechanischen bauelements sowie ein entsprechend hergestelltes mikromechanisches bauelement |
GB2533084A (en) * | 2014-12-02 | 2016-06-15 | Melexis Tech N V | Relative and absolute pressure sensor combined on chip |
JP6809122B2 (ja) * | 2016-10-17 | 2021-01-06 | 株式会社デンソー | 半導体装置 |
TWI663692B (zh) * | 2018-02-27 | 2019-06-21 | 菱生精密工業股份有限公司 | Pressure sensor package structure |
DE102018220542A1 (de) * | 2018-11-29 | 2020-06-04 | Robert Bosch Gmbh | Tankvorrichtung zur Speicherung von verdichteten Fluiden mit einer Sensormodulanordnung |
WO2022080080A1 (ja) * | 2020-10-12 | 2022-04-21 | 株式会社村田製作所 | 圧力センサ装置 |
CN113539851A (zh) * | 2021-07-16 | 2021-10-22 | 芯知微(上海)电子科技有限公司 | 一种系统级封装方法及其封装结构 |
FR3146351A1 (fr) * | 2023-03-01 | 2024-09-06 | Valeo Embrayages | Capteur de pression différentielle |
Citations (5)
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JP4361658B2 (ja) * | 2000-02-14 | 2009-11-11 | 富士通マイクロエレクトロニクス株式会社 | 実装基板及び実装方法 |
JP2002082009A (ja) * | 2000-06-30 | 2002-03-22 | Denso Corp | 圧力センサ |
DE10032579B4 (de) | 2000-07-05 | 2020-07-02 | Robert Bosch Gmbh | Verfahren zur Herstellung eines Halbleiterbauelements sowie ein nach dem Verfahren hergestelltes Halbleiterbauelement |
DE102004011203B4 (de) | 2004-03-04 | 2010-09-16 | Robert Bosch Gmbh | Verfahren zum Montieren von Halbleiterchips und entsprechende Halbleiterchipanordnung |
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2004
- 2004-10-22 DE DE102004051468A patent/DE102004051468A1/de not_active Withdrawn
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2005
- 2005-08-24 DE DE502005010452T patent/DE502005010452D1/de active Active
- 2005-08-24 US US11/666,179 patent/US7563634B2/en not_active Expired - Fee Related
- 2005-08-24 EP EP05787150A patent/EP1805101B1/de not_active Not-in-force
- 2005-08-24 CN CN200580036160A patent/CN100584741C/zh not_active Expired - Fee Related
- 2005-08-24 JP JP2007537245A patent/JP4847960B2/ja not_active Expired - Fee Related
- 2005-08-24 WO PCT/EP2005/054165 patent/WO2006045653A1/de active Application Filing
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Cited By (3)
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JP2008089412A (ja) * | 2006-10-02 | 2008-04-17 | Matsushita Electric Works Ltd | 圧力センサ |
WO2008138666A1 (de) * | 2007-05-15 | 2008-11-20 | Robert Bosch Gmbh | Differenzdruck-sensoranordnung und entsprechendes herstellungsverfahren |
US20100133631A1 (en) * | 2007-05-15 | 2010-06-03 | Hubert Benzel | Differential-pressure sensor system and corresponding production method |
Also Published As
Publication number | Publication date |
---|---|
DE502005010452D1 (de) | 2010-12-09 |
JP2008517288A (ja) | 2008-05-22 |
US20080128840A1 (en) | 2008-06-05 |
CN101044088A (zh) | 2007-09-26 |
EP1805101B1 (de) | 2010-10-27 |
CN100584741C (zh) | 2010-01-27 |
EP1805101A1 (de) | 2007-07-11 |
DE102004051468A1 (de) | 2006-04-27 |
JP4847960B2 (ja) | 2011-12-28 |
US7563634B2 (en) | 2009-07-21 |
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