WO2006037516A1 - Dispositif pour revetir un substrat se presentant sous la forme d'une bande - Google Patents

Dispositif pour revetir un substrat se presentant sous la forme d'une bande Download PDF

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Publication number
WO2006037516A1
WO2006037516A1 PCT/EP2005/010411 EP2005010411W WO2006037516A1 WO 2006037516 A1 WO2006037516 A1 WO 2006037516A1 EP 2005010411 W EP2005010411 W EP 2005010411W WO 2006037516 A1 WO2006037516 A1 WO 2006037516A1
Authority
WO
WIPO (PCT)
Prior art keywords
evaporator
sources
band
shaped substrate
evaporator sources
Prior art date
Application number
PCT/EP2005/010411
Other languages
German (de)
English (en)
Inventor
Uwe Braun
Original Assignee
Leybold Optics Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Leybold Optics Gmbh filed Critical Leybold Optics Gmbh
Publication of WO2006037516A1 publication Critical patent/WO2006037516A1/fr

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Definitions

  • the invention relates to a device according to the preamble of claim 1.
  • Substrates are provided for a variety of reasons with a single or multi-layered coating.
  • One reason for the coating of substrates is to provide the surface of a body, which consists of a relatively soft material, with a hard coating. Examples of these are plastic spectacle lenses provided with an SiO 2 layer or tools provided with a nitride layer.
  • Other coatings serve to transmit or reflect certain wavelengths of light. Such coatings are used in architectural glass. Coatings can also serve to make plastic containers gas impermeable.
  • plastic films are often provided with a metallic coating in order to be able to use them as a gas-tight packaging material, for example.
  • the coating of the substrates can be done by sputtering, evaporation or other coating methods.
  • the evaporation can be carried out by means of electron beams which strike the material to be evaporated. But it is also possible to evaporate material in a crucible or on a heated surface.
  • the heated surface may be an evaporative boat heated inductively or by current flow.
  • it is known to place the melting point of the evaporator above the vaporization point of the material to be evaporated (GB 360 826).
  • evaporator chambers are seen parallel to each other vorge ⁇ , wherein the chambers, as seen from the side, adjacent to each other or overlapping are arranged.
  • the evaporator chambers are recesses in the evaporator and are not individually energized. Rather, the entire evaporator is connected to voltage.
  • a device for the continuous vapor deposition of strip-shaped substrates in which a plurality of evaporator boats are provided as evaporators, which are arranged perpendicular to the strip running direction and which are moved continuously and supplemented with source material (FR-A 2 052 433).
  • a device for the continuous vapor deposition of strip-shaped substrates in which a multiplicity of evaporator boats are arranged at the same distance from one another and in the direction of strip travel and which can be heated by direct current passage (JP-A 01 219 157.
  • JP-A 01 219 157 In: Patents Abstracts of Japan, C-660, 29.11.1989, Vol. 13 / NO.536).
  • a device for coating a moving and flexible film which comprises a housing and means for evaporating coating material in the housing (GB 2 373 744 A).
  • the evaporation means comprise at least one evaporator boat and a device for feeding two elongate elements of coating material onto the evaporator boat (GB 2 373 744 A).
  • a vacuum evaporation device for metallizing strip-shaped substrates which has a plurality of evaporation sources, which are heated and supplied with a metal to be evaporated (WO 03/004 720 A1).
  • This device has means which move the substrate over the evaporator source and means which supply a metal wire to the evaporator sources.
  • Each of the evaporator sources in this case has two recesses which are aligned with each other in the direction in which the substrate moves, and each of the two recesses is supplied with an associated metal wire.
  • the object of the invention is to reduce the reciprocal interaction of different evaporator sources and thus to improve the uniformity of the band coating. This object is achieved according to the features of patent claim 1.
  • the advantage achieved by the invention is, in particular, that the total Ver ⁇ steam block can be reduced because more evaporator boats fit on the same strip length. This applies to a large extent when the power is supplied from the underside of the evaporator boats.
  • Fig. 1 is a schematic diagram of a vacuum evaporation plant
  • Fig. 2 is an enlarged detail of Fig. 1; 3 shows an evaporator boat in a first side view;
  • FIG. 4 shows the evaporator boat of FIG. 3 in a second side view
  • FIG. FIG. 5 shows an isolated evaporator boat from the plant according to FIG. 2
  • FIG. FIG. 6 two adjacent evaporator boats in the system according to FIG. 2
  • FIG. 7 shows an arrangement according to the invention of evaporator boats
  • 8 shows the simulation of an evaporator boat by means of two point sources
  • Fig. 9 is a graph showing the film thickness distribution of a point source on a coated film
  • 10 is a graphical representation of the layer thickness distribution of a line source.
  • FIG. 1 shows a schematic side view of a vacuum chamber 1 in which a coating installation 2 is located.
  • This coating installation 2 has an unwinding roll 3, a take-up roll 4 and a coating drum 5.
  • the unwinding and winding rollers 3, 4 are mounted in uprights 6, 7.
  • the corresponding stator of the coating drum 5 is not shown in the drawing.
  • the unwinding roll 3 consists of a wound film 8, which is unwound to the take-up reel 4, wherein it nestles against the underside of the coating drum 5.
  • Below the coating drum 5 can be seen two evaporator boats 9, 10, which are arranged on a table 11. Laterally next to the evaporator boats 9, 10 are wire dispenser 12, 13, the z. B.
  • the evaporator boats 9, 10 may be provided on its upper side with a recess. However, there are also Kermik evaporator boats with a flat surface. It can be seen here that a plurality of evaporator boats 9, 10, 16 to 23 offset from one another and with their longitudinal axis in the direction of movement of the film 8 are arranged. This staggered arrangement of the evaporator boats 9, 10, 16 to 23 is known from DE 40 27 034 C1. It can also be seen that one aluminum wire 14, 15, 24 to 31 is provided per evaporator boat 9, 10, 16 to 23, which is pushed in by the wire dispenser 12, 13 (FIG.
  • the evaporator boat 10 is shown in isolation and in a side view, with the longer side 32 can be seen with the side length 1.
  • the shorter sides 33, 34 are connected to a DC or AC voltage source 35. Due to the DC or AC current flowing through the evaporator boat 10, the vaporizer boat 10 heats up such that the tip 36 of the aluminum wire melts. The molten aluminum spreads over the entire surface 37 of the flat surfaced evaporator boat 10 and vaporizes from that surface 37.
  • the vaporizer lobe or lobes 38 thereby forming spreads outwardly and settles on the foil 8. It would spread with increasing distance to the evaporator boat if it were not hindered by the film 8.
  • This film 8 is located at a distance a from the surface of the evaporator boat 10.
  • the density of the particles forming the evaporator lobe or lobes 38 decreases towards the edge zones.
  • Fig. 4 shows the same evaporator boat 10 again in a view from above, d. H. in a view from the film 8 on the evaporator boat 10, wherein the film movement is indicated by an arrow 39. It can be seen here that the vaporization cloud 38 assumes an approximately elliptical shape in the height of the foil 8. Arranging several evaporator boats in the manner as shown in FIG. 1 of DE 40 27 034, i. parallel to each other and not offset, then overlap the adjacent evaporation clouds or lobes 38, resulting in an uneven coating on the substrate 8.
  • evaporation clouds 38 result, as shown in FIGS shows, ie the evaporation clouds can also have an overlap region 42 here.
  • This cut or overlap region 42 produces stripes on the film 8, because the film 8 is subjected to approximately twice the amount of evaporation material in this region.
  • the particle density in the edge regions is lower than in the central regions, so that a doubling of the amount of evaporator material does not have to occur.
  • FIG. 7 shows an arrangement according to the invention of four evaporator boats 50 to 53, wherein two of these evaporator boats - the evaporator boats 50 and 51 - lie on a first straight line 54 that runs perpendicular to the running direction of the film 8. At a distance x from the straight line 54 and in the running direction of the film 8, a second straight line 55 runs parallel to the straight line 54, on which the two other evaporator boats 52, 53 are arranged.
  • the evaporator boats 50, 52 on the first straight line 54 have an overlapping area y with the evaporator boats 52, 53 on the second straight line 55 in the horizontal direction.
  • This overlapping region y is selected such that, during dynamic operation, the lower coating of the film 8 produced by the edge regions of the evaporator lobes 60, 61 is compensated by the edge regions of the subsequent evaporator lobes 62, 63 in such a way that the coating of the coating in the central region of the coating Evaporator Keulen 60-69 corresponds.
  • the distance x can be kept small in transverse evaporator boats.
  • the values for x, y and a are adjusted in such a way that a uniform distribution of the deposited particles arises on the film 8. These values can be determined by experiments. If only two evaporator boats 50, 51 are provided on a straight line 54, the distance l-2y between them is fixed. If the evaporator boats 50, 52 are at different straight lines 54, 55, the distances x and y are determined. In Fig. 8, an evaporator boat 50 is indicated by dashed lines.
  • the evaporator boat 50 In order to be able to calculate the layer thickness distribution of the material delivered by this evaporator boat 50 on a film, the evaporator boat 50 will be replaced by two point sources 70, 71, which are arranged symmetrically with respect to an imaginary center line 72.
  • the distances of the point sources 70, 71 to the center line 72 are denoted by c, wherein in a model calculation a practical value for c is a distance of 25 mm. can be set. Taking, for example, a value of 180 mm for the distance a from the point sources 70, 71 to the strip 8, the result is a layer thickness distribution, as shown in FIGS.
  • this layer thickness distribution is due to the fact that in a high-rate evaporation, the ascending vapor cloud or vapor lobe spread, since many atoms leave the surface of the evaporator 50 and thereby the free path length of the atoms decreases. As a consequence of this, the atoms collide with one another and change their direction of movement into spaces in which a free path length is still present, which results in a broadening of the vapor cloud or steam lobe. This effect occurs not only with an evaporator boat 50, but with all evaporator boats 50-53, so that in the areas where the evaporator lobes overlap between the evaporator boats 50-53, centers of high vapor densities can arise.
  • the distribution of the Generalchen ⁇ density on a substrate at a distance of 180 mm from the evaporator boat 50 is indicated by means concentric rings.
  • the layer thickness is 75% at 80% of the setpoint.
  • the next inwardly directed ring 76 has a layer thickness which contributes 80% at 85% of the nominal value, while the further inwardly directed ring 77 has a layer thickness of 85% at 90% of the nominal value.
  • the next ring 78 indicates a layer thickness of 90% at 95% of the nominal value, while the inner circle 79 indicates a layer thickness of 95% at 100%.
  • the region 80 has a distribution of 50% -55%, while the region 81 has a distribution of 55% -60%.
  • the ranges 82 to 90 have distributions of 60% - 65% and 65% - 70% and 70% - 75% and 75% - 80% and 80% - 85% and 85% - 90%, respectively. 90% - 95% and 95% - 100%, respectively.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

L'invention concerne un dispositif pour revêtir un substrat se présentant sous la forme d'une bande. Ce dispositif comprend plusieurs nacelles d'évaporateur constituées par exemple de céramique, à la surface desquelles un métal est fondu. L'axe longitudinal des nacelles d'évaporateur s'étend transversalement à la direction de transport du substrat se présentant sous la forme d'une bande. Le substrat peut être revêtu de manière uniforme, par positionnement spécifique des nacelles d'évaporateur les autres par rapport aux autres.
PCT/EP2005/010411 2004-10-01 2005-09-27 Dispositif pour revetir un substrat se presentant sous la forme d'une bande WO2006037516A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE200410047938 DE102004047938B4 (de) 2004-10-01 2004-10-01 Vorrichtung für die Verdampferbeschichtung eines bandförmigen Substrates
DE102004047938.0 2004-10-01

Publications (1)

Publication Number Publication Date
WO2006037516A1 true WO2006037516A1 (fr) 2006-04-13

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PCT/EP2005/010411 WO2006037516A1 (fr) 2004-10-01 2005-09-27 Dispositif pour revetir un substrat se presentant sous la forme d'une bande

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DE (1) DE102004047938B4 (fr)
WO (1) WO2006037516A1 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2020454A1 (fr) * 2007-07-27 2009-02-04 Applied Materials, Inc. Appareil d'évaporation doté d'un creuset incliné
CN103249861A (zh) * 2010-12-01 2013-08-14 应用材料公司 蒸发单元和真空涂布装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102006056984A1 (de) * 2006-11-30 2008-06-05 Leybold Optics Gmbh Laufende Beschichtung
KR100984148B1 (ko) * 2007-12-21 2010-09-28 삼성전기주식회사 소스량 제어가 가능한 진공증착장치
DE102021115602A1 (de) 2021-06-16 2022-12-22 Kennametal Inc. Verdampferschiffchen

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01219157A (ja) * 1988-02-25 1989-09-01 Toppan Printing Co Ltd 極薄金属蒸着膜の形成方法
EP0474964A2 (fr) * 1990-08-27 1992-03-18 Leybold Aktiengesellschaft Dispositif pour le revêtement en continu de substrats en forme de bande
DE4404550A1 (de) * 1994-02-12 1995-08-24 Leybold Ag Anordnung zur Regelung der Verdampferrate von Tiegeln
WO2000028103A2 (fr) * 1998-11-12 2000-05-18 Flex Products, Inc. Appareil a ouvertures lineaires de depot et procede de revetement

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB360826A (en) * 1930-06-06 1931-11-06 Kurt Richter Improved method of coating articles of all kinds with thin layers of metals or metalloids
DE765487C (de) * 1940-02-02 1953-11-02 Siemens & Halske A G Einrichtung zur Verdampfung von Stoffen
DE970246C (de) * 1948-10-02 1958-08-28 Siemens Ag Vorrichtung zur laufenden Bedampfung endloser Gebilde
US3563202A (en) * 1969-06-25 1971-02-16 Pennwalt Corp Mobile vbaporative firing source
DE19519775A1 (de) * 1995-05-30 1996-12-12 Siemens Ag Verfahren zum Erzeugen dotierter Alkalihalogenidaufdampfschichten
GB2373744A (en) * 2001-01-06 2002-10-02 Valmet General Ltd Coating a flexible web with a metal
ITFI20010122A1 (it) * 2001-07-03 2003-01-03 Galileo Vacuum Systems S R L Impianto di vaporizzazione sottovuoto per la metallizzazione di un substrato nastriforme e relativa sorgente di vaporizzazione

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01219157A (ja) * 1988-02-25 1989-09-01 Toppan Printing Co Ltd 極薄金属蒸着膜の形成方法
EP0474964A2 (fr) * 1990-08-27 1992-03-18 Leybold Aktiengesellschaft Dispositif pour le revêtement en continu de substrats en forme de bande
DE4404550A1 (de) * 1994-02-12 1995-08-24 Leybold Ag Anordnung zur Regelung der Verdampferrate von Tiegeln
WO2000028103A2 (fr) * 1998-11-12 2000-05-18 Flex Products, Inc. Appareil a ouvertures lineaires de depot et procede de revetement

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 013, no. 536 (C - 660) 29 November 1989 (1989-11-29) *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2020454A1 (fr) * 2007-07-27 2009-02-04 Applied Materials, Inc. Appareil d'évaporation doté d'un creuset incliné
CN103249861A (zh) * 2010-12-01 2013-08-14 应用材料公司 蒸发单元和真空涂布装置

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DE102004047938A1 (de) 2006-04-13
DE102004047938B4 (de) 2008-10-23

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