WO2006026621A2 - Molybdenum tubular sputtering targets with uniform grain size and texture - Google Patents
Molybdenum tubular sputtering targets with uniform grain size and texture Download PDFInfo
- Publication number
- WO2006026621A2 WO2006026621A2 PCT/US2005/030852 US2005030852W WO2006026621A2 WO 2006026621 A2 WO2006026621 A2 WO 2006026621A2 US 2005030852 W US2005030852 W US 2005030852W WO 2006026621 A2 WO2006026621 A2 WO 2006026621A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- sputtering
- sputtering target
- billet
- molybdenum
- thin film
- Prior art date
Links
- 238000005477 sputtering target Methods 0.000 title claims abstract description 121
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 title claims abstract description 92
- 229910052750 molybdenum Inorganic materials 0.000 title claims abstract description 64
- 239000011733 molybdenum Substances 0.000 title claims abstract description 64
- 238000000034 method Methods 0.000 claims abstract description 84
- 239000010409 thin film Substances 0.000 claims abstract description 60
- 239000000758 substrate Substances 0.000 claims abstract description 27
- 238000005245 sintering Methods 0.000 claims abstract description 20
- 239000004065 semiconductor Substances 0.000 claims abstract description 13
- 239000004973 liquid crystal related substance Substances 0.000 claims abstract description 6
- 230000000295 complement effect Effects 0.000 claims abstract description 5
- 229910044991 metal oxide Inorganic materials 0.000 claims abstract description 5
- 150000004706 metal oxides Chemical class 0.000 claims abstract description 5
- 238000004544 sputter deposition Methods 0.000 claims description 75
- 238000010438 heat treatment Methods 0.000 claims description 42
- 239000000843 powder Substances 0.000 claims description 31
- 239000010408 film Substances 0.000 claims description 25
- 230000009467 reduction Effects 0.000 claims description 23
- 239000007789 gas Substances 0.000 claims description 18
- 238000003825 pressing Methods 0.000 claims description 17
- 230000008569 process Effects 0.000 claims description 17
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 16
- 238000009721 upset forging Methods 0.000 claims description 16
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims description 14
- 239000001257 hydrogen Substances 0.000 claims description 14
- 229910052739 hydrogen Inorganic materials 0.000 claims description 14
- 238000004519 manufacturing process Methods 0.000 claims description 14
- 238000005242 forging Methods 0.000 claims description 11
- 238000001755 magnetron sputter deposition Methods 0.000 claims description 11
- XUFUCDNVOXXQQC-UHFFFAOYSA-L azane;hydroxy-(hydroxy(dioxo)molybdenio)oxy-dioxomolybdenum Chemical compound N.N.O[Mo](=O)(=O)O[Mo](O)(=O)=O XUFUCDNVOXXQQC-UHFFFAOYSA-L 0.000 claims description 10
- 238000001659 ion-beam spectroscopy Methods 0.000 claims description 9
- 229910052757 nitrogen Inorganic materials 0.000 claims description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims description 7
- 238000009694 cold isostatic pressing Methods 0.000 claims description 7
- 239000001301 oxygen Substances 0.000 claims description 7
- 229910052760 oxygen Inorganic materials 0.000 claims description 7
- 238000005098 hot rolling Methods 0.000 claims description 6
- 239000007769 metal material Substances 0.000 claims description 6
- 238000005546 reactive sputtering Methods 0.000 claims description 6
- 229910015711 MoOx Inorganic materials 0.000 claims description 5
- 230000000694 effects Effects 0.000 claims description 5
- 229910015617 MoNx Inorganic materials 0.000 claims description 4
- 238000005468 ion implantation Methods 0.000 claims description 4
- 238000003754 machining Methods 0.000 claims description 4
- 239000011159 matrix material Substances 0.000 claims description 4
- 239000004033 plastic Substances 0.000 claims description 4
- 229920003023 plastic Polymers 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 238000010276 construction Methods 0.000 claims description 3
- 229920000139 polyethylene terephthalate Polymers 0.000 claims description 3
- 239000005020 polyethylene terephthalate Substances 0.000 claims description 3
- 238000005096 rolling process Methods 0.000 claims description 3
- 239000004642 Polyimide Substances 0.000 claims description 2
- 229910052804 chromium Inorganic materials 0.000 claims description 2
- 238000005520 cutting process Methods 0.000 claims description 2
- 238000005516 engineering process Methods 0.000 claims description 2
- 238000000227 grinding Methods 0.000 claims description 2
- 229910052758 niobium Inorganic materials 0.000 claims description 2
- 230000003647 oxidation Effects 0.000 claims description 2
- 238000007254 oxidation reaction Methods 0.000 claims description 2
- 229920000636 poly(norbornene) polymer Polymers 0.000 claims description 2
- 229920001230 polyarylate Polymers 0.000 claims description 2
- 229920000515 polycarbonate Polymers 0.000 claims description 2
- 239000004417 polycarbonate Substances 0.000 claims description 2
- 229920001721 polyimide Polymers 0.000 claims description 2
- 229910052594 sapphire Inorganic materials 0.000 claims description 2
- 239000010980 sapphire Substances 0.000 claims description 2
- 229910052715 tantalum Inorganic materials 0.000 claims description 2
- 229910052721 tungsten Inorganic materials 0.000 claims description 2
- 238000005303 weighing Methods 0.000 claims description 2
- 239000000203 mixture Substances 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 229910052720 vanadium Inorganic materials 0.000 claims 1
- 229910052799 carbon Inorganic materials 0.000 description 61
- 238000001887 electron backscatter diffraction Methods 0.000 description 6
- 239000002245 particle Substances 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 238000000151 deposition Methods 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 230000008021 deposition Effects 0.000 description 3
- 238000001125 extrusion Methods 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000001953 recrystallisation Methods 0.000 description 3
- 230000000930 thermomechanical effect Effects 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- AYTAKQFHWFYBMA-UHFFFAOYSA-N chromium dioxide Chemical compound O=[Cr]=O AYTAKQFHWFYBMA-UHFFFAOYSA-N 0.000 description 2
- 238000007596 consolidation process Methods 0.000 description 2
- QXYJCZRRLLQGCR-UHFFFAOYSA-N dioxomolybdenum Chemical compound O=[Mo]=O QXYJCZRRLLQGCR-UHFFFAOYSA-N 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- JKQOBWVOAYFWKG-UHFFFAOYSA-N molybdenum trioxide Chemical compound O=[Mo](=O)=O JKQOBWVOAYFWKG-UHFFFAOYSA-N 0.000 description 2
- 238000011946 reduction process Methods 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 239000013077 target material Substances 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 1
- APUPEJJSWDHEBO-UHFFFAOYSA-P ammonium molybdate Chemical compound [NH4+].[NH4+].[O-][Mo]([O-])(=O)=O APUPEJJSWDHEBO-UHFFFAOYSA-P 0.000 description 1
- 229940010552 ammonium molybdate Drugs 0.000 description 1
- 235000018660 ammonium molybdate Nutrition 0.000 description 1
- 239000011609 ammonium molybdate Substances 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 229920001971 elastomer Polymers 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 230000014509 gene expression Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000036541 health Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000001000 micrograph Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000005078 molybdenum compound Substances 0.000 description 1
- 150000002752 molybdenum compounds Chemical class 0.000 description 1
- 239000002674 ointment Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/16—Both compacting and sintering in successive or repeated steps
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/16—Both compacting and sintering in successive or repeated steps
- B22F3/162—Machining, working after consolidation
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/24—After-treatment of workpieces or articles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F5/00—Manufacture of workpieces or articles from metallic powder characterised by the special shape of the product
- B22F5/006—Manufacture of workpieces or articles from metallic powder characterised by the special shape of the product of flat products, e.g. sheets
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
- C21D8/02—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
- C21D8/0221—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips characterised by the working steps
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D8/00—Modifying the physical properties by deformation combined with, or followed by, heat treatment
- C21D8/02—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips
- C21D8/0247—Modifying the physical properties by deformation combined with, or followed by, heat treatment during manufacturing of plates or strips characterised by the heat treatment
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C1/00—Making non-ferrous alloys
- C22C1/04—Making non-ferrous alloys by powder metallurgy
- C22C1/045—Alloys based on refractory metals
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C27/00—Alloys based on rhenium or a refractory metal not mentioned in groups C22C14/00 or C22C16/00
- C22C27/04—Alloys based on tungsten or molybdenum
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22F—CHANGING THE PHYSICAL STRUCTURE OF NON-FERROUS METALS AND NON-FERROUS ALLOYS
- C22F1/00—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working
- C22F1/16—Changing the physical structure of non-ferrous metals or alloys by heat treatment or by hot or cold working of other metals or alloys based thereon
- C22F1/18—High-melting or refractory metals or alloys based thereon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3471—Introduction of auxiliary energy into the plasma
- C23C14/3478—Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3485—Sputtering using pulsed power to the target
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/46—Sputtering by ion beam produced by an external ion source
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/24—After-treatment of workpieces or articles
- B22F2003/248—Thermal after-treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2301/00—Metallic composition of the powder or its coating
- B22F2301/20—Refractory metals
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
- B22F2998/10—Processes characterised by the sequence of their steps
Abstract
Description
Claims
Priority Applications (13)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2005279847A AU2005279847A1 (en) | 2004-08-31 | 2005-08-29 | Molybdenum tubular sputtering targets with uniform grain size and texture |
CA002577162A CA2577162A1 (en) | 2004-08-31 | 2005-08-29 | Molybdenum sputtering targets |
BRPI0515132-5A BRPI0515132A (en) | 2004-08-31 | 2005-08-29 | molybdenum flash targets |
KR1020137013387A KR20130080054A (en) | 2004-08-31 | 2005-08-29 | Molybdenum sputtering targets |
EP05792638A EP1784518A2 (en) | 2004-08-31 | 2005-08-29 | Molybdenum tubular sputtering targets with uniform grain size and texture |
MX2007002290A MX2007002290A (en) | 2004-08-31 | 2005-08-29 | Molybdenum tubular sputtering targets with uniform grain size and texture. |
JP2007530275A JP2008511757A (en) | 2004-08-31 | 2005-08-29 | Molybdenum sputtering target |
US11/574,469 US8088232B2 (en) | 2004-08-31 | 2005-08-29 | Molybdenum tubular sputtering targets with uniform grain size and texture |
IL181454A IL181454A0 (en) | 2004-08-31 | 2007-02-20 | Molybdenum sputtering targets |
US13/340,973 US8425833B2 (en) | 2004-08-31 | 2011-12-30 | Methods of forming molybdenum sputtering targets |
US13/849,918 US9017600B2 (en) | 2004-08-31 | 2013-03-25 | Methods of forming molybdenum sputtering targets |
US14/608,995 US9309591B2 (en) | 2004-08-31 | 2015-01-29 | Methods of depositing thin films using molybdenum sputtering targets |
US15/061,566 US9926623B2 (en) | 2004-08-31 | 2016-03-04 | Methods of forming molybdenum sputtering targets |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/931,203 | 2004-08-31 | ||
US10/931,203 US20060042728A1 (en) | 2004-08-31 | 2004-08-31 | Molybdenum sputtering targets |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/931,203 Continuation US20060042728A1 (en) | 2004-08-31 | 2004-08-31 | Molybdenum sputtering targets |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US11/574,469 A-371-Of-International US8088232B2 (en) | 2004-08-31 | 2005-08-29 | Molybdenum tubular sputtering targets with uniform grain size and texture |
US13/340,973 Continuation US8425833B2 (en) | 2004-08-31 | 2011-12-30 | Methods of forming molybdenum sputtering targets |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2006026621A2 true WO2006026621A2 (en) | 2006-03-09 |
WO2006026621A3 WO2006026621A3 (en) | 2006-07-13 |
Family
ID=35429607
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2005/030852 WO2006026621A2 (en) | 2004-08-31 | 2005-08-29 | Molybdenum tubular sputtering targets with uniform grain size and texture |
Country Status (14)
Country | Link |
---|---|
US (5) | US20060042728A1 (en) |
EP (2) | EP2065480B1 (en) |
JP (1) | JP2008511757A (en) |
KR (2) | KR20130080054A (en) |
CN (1) | CN100549202C (en) |
AU (1) | AU2005279847A1 (en) |
BR (1) | BRPI0515132A (en) |
CA (1) | CA2577162A1 (en) |
IL (1) | IL181454A0 (en) |
MX (1) | MX2007002290A (en) |
PL (1) | PL2065480T3 (en) |
RU (1) | RU2007111556A (en) |
TW (1) | TWI377261B (en) |
WO (1) | WO2006026621A2 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007041730A1 (en) * | 2005-10-14 | 2007-04-19 | Plansee Se | Tube target |
WO2009020587A1 (en) * | 2007-08-06 | 2009-02-12 | H.C. Starck, Inc. | Refractory metal plates with improved uniformity of texture |
US8250895B2 (en) | 2007-08-06 | 2012-08-28 | H.C. Starck Inc. | Methods and apparatus for controlling texture of plates and sheets by tilt rolling |
KR101505211B1 (en) | 2007-01-16 | 2015-03-23 | 에이치. 씨. 스타아크 아이앤씨 | High density refractory metals & alloys sputtering targets |
US9951413B2 (en) | 2009-04-10 | 2018-04-24 | Saint-Gobain Coating Solutions | Molybdenum-based target and process for producing a target by thermal spraying |
Families Citing this family (61)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20030002043A1 (en) * | 2001-04-10 | 2003-01-02 | Kla-Tencor Corporation | Periodic patterns and technique to control misalignment |
US20060042728A1 (en) | 2004-08-31 | 2006-03-02 | Brad Lemon | Molybdenum sputtering targets |
US20060201589A1 (en) * | 2005-03-11 | 2006-09-14 | Honeywell International Inc. | Components comprising metallic material, physical vapor deposition targets, thin films, and methods of forming metallic components |
WO2006117144A1 (en) | 2005-05-05 | 2006-11-09 | H.C. Starck Gmbh | Method for coating a substrate surface and coated product |
JP4904341B2 (en) * | 2005-05-05 | 2012-03-28 | ハー.ツェー.スタルク ゲゼルシャフト ミット ベシュレンクテル ハフツング | Coating method for manufacturing or reprocessing sputter targets and x-ray anodes |
US7837929B2 (en) * | 2005-10-20 | 2010-11-23 | H.C. Starck Inc. | Methods of making molybdenum titanium sputtering plates and targets |
JP5114812B2 (en) * | 2006-03-07 | 2013-01-09 | キャボット コーポレイション | Method for producing deformed metal member |
US20080078268A1 (en) | 2006-10-03 | 2008-04-03 | H.C. Starck Inc. | Process for preparing metal powders having low oxygen content, powders so-produced and uses thereof |
PL2104753T3 (en) * | 2006-11-07 | 2014-12-31 | Starck H C Gmbh | Method for coating a substrate and coated product |
US20080105542A1 (en) * | 2006-11-08 | 2008-05-08 | Purdy Clifford C | System and method of manufacturing sputtering targets |
US7776166B2 (en) * | 2006-12-05 | 2010-08-17 | Praxair Technology, Inc. | Texture and grain size controlled hollow cathode magnetron targets and method of manufacture |
US20080145688A1 (en) | 2006-12-13 | 2008-06-19 | H.C. Starck Inc. | Method of joining tantalum clade steel structures |
CN101611165B (en) * | 2007-01-12 | 2012-03-21 | 新日铁高新材料 | Process for producing molybdenum-based sputtering target plate |
US8197894B2 (en) | 2007-05-04 | 2012-06-12 | H.C. Starck Gmbh | Methods of forming sputtering targets |
KR100936016B1 (en) * | 2007-11-23 | 2010-01-11 | 한양대학교 산학협력단 | Method of fabricating a sputtering target of molybdenum having ultrafine crystalline and sputtering target of molybdenum prepared thereby |
US20090181179A1 (en) * | 2008-01-11 | 2009-07-16 | Climax Engineered Materials, Llc | Sodium/Molybdenum Composite Metal Powders, Products Thereof, and Methods for Producing Photovoltaic Cells |
TW201006938A (en) * | 2008-04-28 | 2010-02-16 | Starck H C Inc | Molybdenum-niobium alloys, sputtering targets containing such alloys, methods of making such targets, thin films prepared therefrom and uses thereof |
US8246903B2 (en) | 2008-09-09 | 2012-08-21 | H.C. Starck Inc. | Dynamic dehydriding of refractory metal powders |
US8043655B2 (en) * | 2008-10-06 | 2011-10-25 | H.C. Starck, Inc. | Low-energy method of manufacturing bulk metallic structures with submicron grain sizes |
FR2944293B1 (en) | 2009-04-10 | 2012-05-18 | Saint Gobain Coating Solutions | THERMAL PROJECTION DEVELOPING METHOD OF A TARGET |
WO2011004887A1 (en) * | 2009-07-09 | 2011-01-13 | 株式会社東芝 | High purity molybdenum powder and production method for same |
JP5550328B2 (en) * | 2009-12-22 | 2014-07-16 | 株式会社東芝 | Mo sputtering target and manufacturing method thereof |
CN101792897A (en) * | 2010-04-06 | 2010-08-04 | 韩伟东 | High-purity molybdenum target for thin-film solar cell and preparation method thereof |
US8449818B2 (en) | 2010-06-30 | 2013-05-28 | H. C. Starck, Inc. | Molybdenum containing targets |
US8449817B2 (en) | 2010-06-30 | 2013-05-28 | H.C. Stark, Inc. | Molybdenum-containing targets comprising three metal elements |
WO2012043227A1 (en) * | 2010-09-30 | 2012-04-05 | 日立金属株式会社 | Method for producing molybdenum target |
CN101956159A (en) * | 2010-09-30 | 2011-01-26 | 金堆城钼业股份有限公司 | Method for preparing high-purity molybdenum titanium sputtering target |
DE102010053751A1 (en) | 2010-10-28 | 2012-05-03 | Oerlikon Trading Ag, Trübbach | Molybdenum monoxide layers and their production by PVD |
CN102560359A (en) * | 2010-12-30 | 2012-07-11 | 鸿富锦精密工业(深圳)有限公司 | Coating part and producing method thereof |
KR101259599B1 (en) * | 2011-03-08 | 2013-04-30 | 한국생산기술연구원 | Manufacturing of molybdenum sputtering target for back electrode application of CIGS solar cell |
IN2013MN01963A (en) * | 2011-04-10 | 2015-07-03 | Univ Alberta | |
JP2012237056A (en) * | 2011-04-28 | 2012-12-06 | Hitachi Metals Ltd | METHOD FOR PRODUCING MoCr TARGET MATERIAL AND THE MoCr TARGET MATERIAL |
KR20170016024A (en) | 2011-05-10 | 2017-02-10 | 에이치. 씨. 스타아크 아이앤씨 | Multi-block sputtering target and associated methods and articles |
US9412568B2 (en) | 2011-09-29 | 2016-08-09 | H.C. Starck, Inc. | Large-area sputtering targets |
CN102617044B (en) * | 2012-03-05 | 2014-08-06 | 湖北大学 | Method for preparing vertical orientation anatase titanium oxide film by using hydrothermal method and gas sensor thereof |
US9334565B2 (en) | 2012-05-09 | 2016-05-10 | H.C. Starck Inc. | Multi-block sputtering target with interface portions and associated methods and articles |
US9005357B2 (en) * | 2012-05-24 | 2015-04-14 | Agency For Science, Technology And Research | Method of preparing molybdenum oxide films |
CN202828801U (en) * | 2012-07-26 | 2013-03-27 | 富鼎电子科技(嘉善)有限公司 | Delivery mechanism |
CN104342619B (en) * | 2013-07-31 | 2017-06-30 | 宁波江丰电子材料股份有限公司 | The preparation method of molybdenum target material |
KR102316360B1 (en) * | 2013-10-29 | 2021-10-22 | 플란제 에스이 | Sputtering target and production method |
AT13602U3 (en) * | 2013-10-29 | 2014-08-15 | Plansee Se | Sputtering target and method of preparation |
CN107236934A (en) * | 2016-03-28 | 2017-10-10 | Jx金属株式会社 | Cylinder type sputtering target and its manufacture method |
KR20180028084A (en) | 2016-09-07 | 2018-03-16 | 삼성디스플레이 주식회사 | Display device |
CN106567047A (en) * | 2016-11-04 | 2017-04-19 | 北方民族大学 | Method of preparing high-purity microstructure-controllable Mo-Nb alloy target material through hot-pressing process |
CN108070832A (en) * | 2016-11-14 | 2018-05-25 | 宁波江丰电子材料股份有限公司 | The manufacturing method of molybdenum niobium target blankss |
CN106493525A (en) * | 2016-12-23 | 2017-03-15 | 有研亿金新材料有限公司 | A kind of preparation method of sputtering titanacycle |
JP6768575B2 (en) * | 2017-03-24 | 2020-10-14 | Jx金属株式会社 | Tungsten silicide target and its manufacturing method |
CN107022739A (en) * | 2017-05-19 | 2017-08-08 | 包头稀土研究院 | The manufacture method of sputter coating molybdenum rotary target material |
CN107815654B (en) * | 2017-11-16 | 2020-02-11 | 金堆城钼业股份有限公司 | Method for preparing molybdenum disulfide sputtering target material |
CN108687158B (en) * | 2018-05-11 | 2019-12-17 | 成都联虹钼业有限公司 | preparation method of isotropic molybdenum plate |
CN108546894A (en) * | 2018-05-11 | 2018-09-18 | 成都联虹钼业有限公司 | A kind of preparation method with Properties of High Temperature Creep molybdenum plate |
CN110777343A (en) * | 2019-11-05 | 2020-02-11 | 河南科技大学 | Preparation method of molybdenum planar sputtering target |
US11043352B1 (en) | 2019-12-20 | 2021-06-22 | Varex Imaging Corporation | Aligned grain structure targets, systems, and methods of forming |
CN111254396A (en) * | 2020-01-21 | 2020-06-09 | 洛阳高新四丰电子材料有限公司 | Preparation method of molybdenum-tungsten alloy sputtering target material |
CN111318570B (en) * | 2020-03-05 | 2021-11-19 | 爱发科电子材料(苏州)有限公司 | Process for manufacturing micronized target material crystal grains |
CN113463042A (en) * | 2021-05-31 | 2021-10-01 | 洛阳科威钨钼有限公司 | Preparation method of molybdenum-titanium alloy sputtering coating target material |
KR102601264B1 (en) * | 2021-08-13 | 2023-11-09 | 연세대학교 산학협력단 | Composition for gas sensor, gas sensor comprising same, and method for manufacturing the same |
CN113996819B (en) * | 2021-09-30 | 2023-07-25 | 宁波江丰电子材料股份有限公司 | Sputtering arc surface machining method of circular molybdenum target assembly |
CN114131026A (en) * | 2021-12-08 | 2022-03-04 | 西安瑞福莱钨钼有限公司 | Process for producing molybdenum tube blank by using mould pressing method |
CN114411103A (en) * | 2022-01-18 | 2022-04-29 | 宁波江丰钨钼材料有限公司 | Large-size molybdenum target material and preparation method and application thereof |
CN114574821B (en) * | 2022-01-31 | 2023-05-23 | 安泰科技股份有限公司 | Preparation method of large-size molybdenum target |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03150356A (en) * | 1989-11-02 | 1991-06-26 | Hitachi Metals Ltd | Tungsten or molybdenum target and production thereof |
JP2000045066A (en) * | 1998-07-27 | 2000-02-15 | Hitachi Metals Ltd | Mo-BASED TARGET MATERIAL AND ITS PRODUCTION |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6066425A (en) * | 1983-09-22 | 1985-04-16 | Nippon Telegr & Teleph Corp <Ntt> | High-purity molybdenum target and high-purity molybdenum silicide target for lsi electrode and manufacture thereof |
JPH0539566A (en) * | 1991-02-19 | 1993-02-19 | Mitsubishi Materials Corp | Sputtering target and its production |
JP3769761B2 (en) * | 1994-04-28 | 2006-04-26 | 住友化学株式会社 | Aluminum alloy single crystal target and method for producing the same |
US6569270B2 (en) * | 1997-07-11 | 2003-05-27 | Honeywell International Inc. | Process for producing a metal article |
US6183614B1 (en) | 1999-02-12 | 2001-02-06 | Applied Materials, Inc. | Rotating sputter magnetron assembly |
US6238526B1 (en) * | 1999-02-14 | 2001-05-29 | Advanced Ion Technology, Inc. | Ion-beam source with channeling sputterable targets and a method for channeled sputtering |
US6342133B2 (en) | 2000-03-14 | 2002-01-29 | Novellus Systems, Inc. | PVD deposition of titanium and titanium nitride layers in the same chamber without use of a collimator or a shutter |
JP3748221B2 (en) * | 2001-10-23 | 2006-02-22 | 日立金属株式会社 | Mo-based sputtering target and method for producing the same |
KR100686494B1 (en) | 2002-12-30 | 2007-02-23 | 엘지.필립스 엘시디 주식회사 | Sputter for deposition of metal layer and method of fabricating liquid crystal display device using sputter |
US20050279630A1 (en) * | 2004-06-16 | 2005-12-22 | Dynamic Machine Works, Inc. | Tubular sputtering targets and methods of flowforming the same |
US20060042728A1 (en) | 2004-08-31 | 2006-03-02 | Brad Lemon | Molybdenum sputtering targets |
US8088232B2 (en) | 2004-08-31 | 2012-01-03 | H.C. Starck Inc. | Molybdenum tubular sputtering targets with uniform grain size and texture |
-
2004
- 2004-08-31 US US10/931,203 patent/US20060042728A1/en not_active Abandoned
-
2005
- 2005-08-29 BR BRPI0515132-5A patent/BRPI0515132A/en not_active IP Right Cessation
- 2005-08-29 MX MX2007002290A patent/MX2007002290A/en not_active Application Discontinuation
- 2005-08-29 EP EP20090154926 patent/EP2065480B1/en active Active
- 2005-08-29 RU RU2007111556/02A patent/RU2007111556A/en not_active Application Discontinuation
- 2005-08-29 PL PL09154926T patent/PL2065480T3/en unknown
- 2005-08-29 JP JP2007530275A patent/JP2008511757A/en not_active Withdrawn
- 2005-08-29 KR KR1020137013387A patent/KR20130080054A/en active Search and Examination
- 2005-08-29 KR KR1020077007294A patent/KR20070057225A/en active Application Filing
- 2005-08-29 EP EP05792638A patent/EP1784518A2/en not_active Ceased
- 2005-08-29 CA CA002577162A patent/CA2577162A1/en not_active Abandoned
- 2005-08-29 WO PCT/US2005/030852 patent/WO2006026621A2/en active Application Filing
- 2005-08-29 AU AU2005279847A patent/AU2005279847A1/en not_active Abandoned
- 2005-08-29 CN CNB2005800372658A patent/CN100549202C/en not_active Expired - Fee Related
- 2005-08-30 TW TW94129572A patent/TWI377261B/en not_active IP Right Cessation
-
2007
- 2007-02-20 IL IL181454A patent/IL181454A0/en unknown
-
2011
- 2011-12-30 US US13/340,973 patent/US8425833B2/en active Active
-
2013
- 2013-03-25 US US13/849,918 patent/US9017600B2/en not_active Expired - Fee Related
-
2015
- 2015-01-29 US US14/608,995 patent/US9309591B2/en active Active
-
2016
- 2016-03-04 US US15/061,566 patent/US9926623B2/en active Active
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH03150356A (en) * | 1989-11-02 | 1991-06-26 | Hitachi Metals Ltd | Tungsten or molybdenum target and production thereof |
JP2000045066A (en) * | 1998-07-27 | 2000-02-15 | Hitachi Metals Ltd | Mo-BASED TARGET MATERIAL AND ITS PRODUCTION |
Non-Patent Citations (2)
Title |
---|
PATENT ABSTRACTS OF JAPAN vol. 015, no. 373 (C-0869), 19 September 1991 (1991-09-19) & JP 03 150356 A (HITACHI METALS LTD), 26 June 1991 (1991-06-26) * |
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 05, 14 September 2000 (2000-09-14) & JP 2000 045066 A (HITACHI METALS LTD), 15 February 2000 (2000-02-15) * |
Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007041730A1 (en) * | 2005-10-14 | 2007-04-19 | Plansee Se | Tube target |
US8900340B2 (en) | 2005-10-14 | 2014-12-02 | Plansee Se | Tubular target and production method |
US9890451B2 (en) | 2005-10-14 | 2018-02-13 | Plansee Se | Tubular target and production method |
KR101505211B1 (en) | 2007-01-16 | 2015-03-23 | 에이치. 씨. 스타아크 아이앤씨 | High density refractory metals & alloys sputtering targets |
WO2009020587A1 (en) * | 2007-08-06 | 2009-02-12 | H.C. Starck, Inc. | Refractory metal plates with improved uniformity of texture |
JP2010535943A (en) * | 2007-08-06 | 2010-11-25 | エイチ.シー. スターク インコーポレイテッド | Refractory metal plate with improved tissue uniformity |
US8250895B2 (en) | 2007-08-06 | 2012-08-28 | H.C. Starck Inc. | Methods and apparatus for controlling texture of plates and sheets by tilt rolling |
KR101201577B1 (en) * | 2007-08-06 | 2012-11-14 | 에이치. 씨. 스타아크 아이앤씨 | Refractory metal plates with improved uniformity of texture |
US9095885B2 (en) | 2007-08-06 | 2015-08-04 | H.C. Starck Inc. | Refractory metal plates with improved uniformity of texture |
US9767999B2 (en) | 2007-08-06 | 2017-09-19 | H.C. Starck Inc. | Refractory metal plates |
US9951413B2 (en) | 2009-04-10 | 2018-04-24 | Saint-Gobain Coating Solutions | Molybdenum-based target and process for producing a target by thermal spraying |
Also Published As
Publication number | Publication date |
---|---|
US8425833B2 (en) | 2013-04-23 |
TWI377261B (en) | 2012-11-21 |
EP2065480A1 (en) | 2009-06-03 |
IL181454A0 (en) | 2007-07-04 |
US20060042728A1 (en) | 2006-03-02 |
PL2065480T3 (en) | 2012-12-31 |
CN101057000A (en) | 2007-10-17 |
US9017600B2 (en) | 2015-04-28 |
BRPI0515132A (en) | 2008-07-08 |
US9926623B2 (en) | 2018-03-27 |
CN100549202C (en) | 2009-10-14 |
MX2007002290A (en) | 2007-04-16 |
WO2006026621A3 (en) | 2006-07-13 |
CA2577162A1 (en) | 2006-03-06 |
RU2007111556A (en) | 2008-10-10 |
JP2008511757A (en) | 2008-04-17 |
EP2065480B1 (en) | 2012-05-30 |
KR20070057225A (en) | 2007-06-04 |
TW200624581A (en) | 2006-07-16 |
US20130224059A1 (en) | 2013-08-29 |
US20120189483A1 (en) | 2012-07-26 |
US20160186311A1 (en) | 2016-06-30 |
EP1784518A2 (en) | 2007-05-16 |
US9309591B2 (en) | 2016-04-12 |
KR20130080054A (en) | 2013-07-11 |
AU2005279847A1 (en) | 2006-03-09 |
US20150136584A1 (en) | 2015-05-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US9926623B2 (en) | Methods of forming molybdenum sputtering targets | |
US8088232B2 (en) | Molybdenum tubular sputtering targets with uniform grain size and texture | |
EP2172292B1 (en) | Method of manufacturing bulk metallic structures with submicron grain sizes and structures made with such method | |
KR101253377B1 (en) | Sputtering target and method of fabrication | |
CN100557055C (en) | Molybdenum alloy | |
EP2185300B1 (en) | Refractory metal plates with improved uniformity of texture | |
JP2012180599A (en) | Sputter target, and its manufacturing method by rotary shaft direction forging | |
CN108265258B (en) | Preparation method of multilayer energy-containing nano-structure foil for material connection |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KM KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NG NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SM SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IS IT LT LU LV MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 2005792638 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 181454 Country of ref document: IL |
|
WWE | Wipo information: entry into national phase |
Ref document number: MX/a/2007/002290 Country of ref document: MX |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2007530275 Country of ref document: JP Ref document number: 2005279847 Country of ref document: AU |
|
NENP | Non-entry into the national phase |
Ref country code: DE |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2577162 Country of ref document: CA |
|
ENP | Entry into the national phase |
Ref document number: 2005279847 Country of ref document: AU Date of ref document: 20050829 Kind code of ref document: A |
|
WWP | Wipo information: published in national office |
Ref document number: 2005279847 Country of ref document: AU |
|
WWE | Wipo information: entry into national phase |
Ref document number: 1020077007294 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2007111556 Country of ref document: RU |
|
WWE | Wipo information: entry into national phase |
Ref document number: 200580037265.8 Country of ref document: CN |
|
WWP | Wipo information: published in national office |
Ref document number: 2005792638 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 11574469 Country of ref document: US |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2937/DELNP/2008 Country of ref document: IN |
|
ENP | Entry into the national phase |
Ref document number: PI0515132 Country of ref document: BR |