WO2006021245A1 - Apparatus and method for levitation of an amount of conductive material - Google Patents
Apparatus and method for levitation of an amount of conductive material Download PDFInfo
- Publication number
- WO2006021245A1 WO2006021245A1 PCT/EP2005/005905 EP2005005905W WO2006021245A1 WO 2006021245 A1 WO2006021245 A1 WO 2006021245A1 EP 2005005905 W EP2005005905 W EP 2005005905W WO 2006021245 A1 WO2006021245 A1 WO 2006021245A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- coils
- coil
- conductive material
- levitation
- evaporated
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/22—Furnaces without an endless core
- H05B6/32—Arrangements for simultaneous levitation and heating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Definitions
- the invention relates to an apparatus for levitation of an amount of conductive material, comprising a coil for keeping the material in levitation using a varying electric current in the coil.
- the invention also relates to a method for generating an amount of levitated conductive material using the apparatus.
- the levitation of conductive material is known for physical vapour deposition, a technology for coating a substrate with a layer of material that is condensed from the vapour phase on the substrate in a vacuum chamber.
- a lot of energy is lost since the crucible has to be cooled.
- the crucible is attacked by the material to be evaporated.
- electromagnetic levitation has been developed, as described in WO 03/071000 Al. In electromagnetic levitation, an amount of conductive material is kept floating above a coil in which a varying electric current is fed. Due to the varying electric current, an alternating electromagnetic field is generated in the coil.
- the electromagnetic field exerts an upward directed force on the conductive material.
- This electromagnetic force balances the gravitational force acting on the conductive material, to keep the conductive material levitated. Since the magnetic force varies with the distance to the coil, the conductive material will be kept in levitation (or float) above the coil at a distance that depends on the current in the coil and the mass of the conductive material.
- the electric current also provides electrical energy for heating the conductive material, such that it melts and eventually evaporates.
- the evaporated material is used to coat substrates, such as strip material.
- the above apparatus has the drawback that the varying electric current both provides the levitation force and the heating power for the amount of conductive material.
- the current should be increased.
- the levitation force of the electromagnetic field is than increased at the same time, resulting in the floating of the material above the coil at a greater distance to the coil. At this distance, the electromagnetic field is less, resulting in a heating power for the material that is lower than intended.
- an apparatus for levitation of an amount of conductive material comprising a coil for keeping the material in levitation using a varying electric current in the coil, wherein the apparatus comprises two coils, a first coil and a second coil, both coils generating an alternating electromagnetic field during use, the alternating electromagnetic field of the first and second coil counteracting each other, wherein the first and second coil are positioned such that the conductive material that is kept in levitation between the first coil and the second coil is evaporated.
- the conductive material will often melt due to the heating before it evaporates, but some materials will sublimate before they melt.
- the coils have substantially the same centre line.
- the conductive material is entrapped in between the two magnetic fields in the best possible way.
- the centre lines of the coils are displaced relatively, or enclose an angle, the conductive material is apt to leak out of the space between the coils when the conductive material is molten, and be lost for evaporation.
- the coils have windings that are all substantially closed loops.
- the magnetic fields generated by the coils will thus be substantially symmetrical around the centre line of each coil.
- the conductive material is thus kept centred in the space between the coils, and when the conductive material is molten, it will have a symmetrical shape corresponding to the symmetry in the magnetic field.
- the coils each have a separate current supply.
- the magnitude of the current can be varied independent for each coil, and thus the levitation force and heating power can be varied, as can the distance between the coils.
- a drawback is that the alternating field of the coils must be well controlled.
- the coils are connected and have the same current supply. In this way there is no problem with the phases of the magnetic fields, because the same current is used, but it is more difficult to form the coils because they are connected, and the distance cannot be changed after the coils are wound, and the heating power and levitation force cannot be varied independently of each other.
- the coils are wound in opposite directions. Since the current flows in the same direction through the windings, in this way counteracting magnetic fields are generated in the coils.
- the first coil is situated substantially above the second coil.
- the gravity force acting on the levitated conductive material will then be substantially directed along the same line as the magnetic fields of the coils. The forces will thus be well-balanced.
- the first coil has the same number of windings or less winding than the second coil.
- the magnetic field of the second (lower) coil is stronger than the magnetic field of the first (upper) coil, thus counteracting the gravity force and keeping the conductive material approximately halfway between the first and second coil.
- the first and second coils are mirror symmetric. With this configuration of the coils, the coils can be manipulated, as elucidated below. - A -
- the entrapment of the conductive material between the two coils makes it possible to generate enough heating power in the conductive material when the current is increased, such that the conductive material evaporates at a rate that is high enough to be able to coat a substrate in an economically profitable way.
- the conductive material could not be heated to a temperature high enough to generate economic interesting evaporation rates for the coating of substrates.
- the evaporated conductive material is directed essentially along the direction of the centre line of the coils for the coating of a substrate.
- an isolating means such as a duct or tube, between the coils and the conductive material; in this way the evaporated material can be directed to the substrate to be coated, without condensation on parts of the apparatus.
- the coils are manipulated together so as to direct the evaporated conductive material with one or more degrees of freedom. This is possible now the conductive material is entrapped between the coils and cannot leave the combined magnetic fields of the coils. By manipulating the coils, for instance by rotation, the evaporated material can be directed in another direction, which makes it far more easy to coat one or more substrates that are present in the vacuum chamber.
- the coils are manipulated with six degrees of freedom.
- the coils can thus move in three directions and rotate around two horizontal axes and one vertical axe.
- the strength of the electromagnetic fields in the two coils is such that the conductive material entrapped in the electromagnetic fields is forced towards the centre line of the coils. This is especially useful when the evaporated material should be directed to a substrate that is not exactly above the coils.
- the coils can now be manipulated and the evaporated material directed in all directions, to coat substrates in the vacuum chamber.
- Fig. 1 shows in a schematic way the two coils according to the invention with the entrapped conductive material in cross-section.
- first coil 1 and a second coil 2 each coil consisting of three windings Ia, Ib, Ic and 2a, 2b, 2c.
- Coil 1 and coil 2 each produce an electromagnetic field, the field of coil 1 counteracting the field of coil 2 such that the resulting electromagnetic field entraps conductive material 3 that is provided between the coils.
- the electromagnetic fields are shown by the electromagnetic field lines 4.
- the conductive material here shown as a molten droplet
- the droplet cannot move out of the coils, and thus that a high current can be generated in the windings of the coils, resulting in a high heating power of the coils.
- the droplet will thus be heated to a high temperature and evaporate fast.
- the evaporation rate of the (super)heated conductive material is high, and the coating velocity of a substrate economically attractive.
- windings can be circular, but also can have another shape, preferably axially symmetrical.
- the windings could for instance be square.
- three windings for each coil it is possible to use less or more windings, and the number of windings can differ for each coil.
- a different magnitude of the current in each coil can be used.
- the evaporated material will mainly flow in the direction of the centre line 5, in view of a duct or tube of non-conductive material placed between the coils and the droplet (not shown).
- This duct prevents arcing between the windings and contamination of the vacuum chamber.
- the apparatus according to the invention makes it possible to manipulate the coils together, such that the direction of the centre line is changed. In this way it is possible to coat a substrate not only from below or from above, but also sideways. It is also possible to displace the coils together in three directions. Due to the fact that the conductive material is entrapped between the two coils, the material will remain between the coils and evaporate before, during and after the manipulation.
- the coils and the conductive material are kept in a vacuum of at least 10 "3 mbar.
- the varying electric current and the frequency used have to be high enough to heat and evaporate the conductive material, which is used, and depends on the type of conductive material and the coating velocity required.
Abstract
Description
Claims
Priority Applications (12)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CA2576541A CA2576541C (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
EP05754666A EP1785010B1 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
AU2005276729A AU2005276729B2 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
BRPI0514545-7A BRPI0514545A (en) | 2004-08-23 | 2005-05-31 | apparatus and method for levitating a quantity of conductive material |
KR1020077006446A KR101143067B1 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
DE602005013791T DE602005013791D1 (en) | 2004-08-23 | 2005-05-31 | DEVICE AND METHOD FOR LUBRICATING A LOT OF CONDUCTIVE MATERIALS |
MX2007002191A MX2007002191A (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material. |
PL05754666T PL1785010T3 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
US11/573,704 US7973267B2 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
CN2005800280853A CN101006751B (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
JP2007528625A JP5064222B2 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitating a quantity of conductive material |
HK07114323.2A HK1109292A1 (en) | 2004-08-23 | 2007-12-31 | Apparatus and method for levitation of an amount of conductive material |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/923,505 | 2004-08-23 | ||
US10/923,505 US7323229B2 (en) | 2002-02-21 | 2004-08-23 | Method and device for coating a substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2006021245A1 true WO2006021245A1 (en) | 2006-03-02 |
Family
ID=34971215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2005/005905 WO2006021245A1 (en) | 2004-08-23 | 2005-05-31 | Apparatus and method for levitation of an amount of conductive material |
Country Status (16)
Country | Link |
---|---|
EP (1) | EP1785010B1 (en) |
JP (1) | JP5064222B2 (en) |
KR (1) | KR101143067B1 (en) |
CN (1) | CN101006751B (en) |
AT (1) | ATE428290T1 (en) |
AU (1) | AU2005276729B2 (en) |
BR (1) | BRPI0514545A (en) |
CA (1) | CA2576541C (en) |
DE (1) | DE602005013791D1 (en) |
ES (1) | ES2324921T3 (en) |
HK (1) | HK1109292A1 (en) |
MX (1) | MX2007002191A (en) |
PL (1) | PL1785010T3 (en) |
RU (1) | RU2370921C2 (en) |
UA (1) | UA89792C2 (en) |
WO (1) | WO2006021245A1 (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102009042972A1 (en) | 2009-09-16 | 2011-03-24 | Technische Universität Ilmenau | Device for manipulating levitated electrically conductive substance in high frequency electromagnetic alternating field, has modification unit provided for spatial modification in effective area of electromagnetic alternating field |
DE102011018675A1 (en) | 2011-04-18 | 2012-10-18 | Technische Universität Ilmenau | Device for active manipulation of floating electrically conductive substance e.g. liquid metal melt in high-frequency alternating electromagnetic field, has primary winding and secondary winding that are separated at specified angle |
US9267203B2 (en) | 2010-12-13 | 2016-02-23 | Posco | Continuous coating apparatus |
EP2085492B1 (en) | 2007-12-28 | 2016-04-20 | Posco | Zinc alloy coated steel sheet having good sealer adhesion and corrosion resistance and process of manufacturing the same |
PL423811A1 (en) * | 2017-12-11 | 2019-06-17 | Politechnika Śląska | Device for multi-scale levitation melting |
Families Citing this family (9)
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KR101639812B1 (en) * | 2009-09-29 | 2016-07-15 | 주식회사 포스코 | Apparatus for floating and heating material |
KR101639813B1 (en) * | 2009-10-08 | 2016-07-15 | 주식회사 포스코 | Continuous Coating Apparatus |
KR101359218B1 (en) * | 2011-12-27 | 2014-02-06 | 주식회사 포스코 | Apparatus for floating and heating materials |
KR101365467B1 (en) * | 2012-04-24 | 2014-02-24 | 한국표준과학연구원 | Thin Film Deposition Apparatus and Thin Film Deposition Method |
RU2522666C2 (en) * | 2012-06-27 | 2014-07-20 | Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования "Юго-Западный государственный университет" (ЮЗГУ) | Device for levitation of certain amount of material |
EP3124648B1 (en) * | 2015-07-31 | 2018-03-28 | Hilberg & Partner GmbH | Evaporator system and evaporation method for coating a strip-shaped substrate |
RU2693852C2 (en) * | 2017-11-07 | 2019-07-05 | Федеральное государственное бюджетное образовательное учреждение высшего образования " Юго-Западный государственный университет" (ЮЗГУ) | Device for levitation of certain amount of material |
DE102018117302A1 (en) * | 2018-07-17 | 2020-01-23 | Ald Vacuum Technologies Gmbh | Suspended melting with an annular element |
KR20200076389A (en) | 2018-12-19 | 2020-06-29 | 주식회사 포스코 | Apparatus and method for controlling coating layer in pvd plating processs |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686864A (en) * | 1951-01-17 | 1954-08-17 | Westinghouse Electric Corp | Magnetic levitation and heating of conductive materials |
US2957064A (en) * | 1958-09-30 | 1960-10-18 | Westinghouse Electric Corp | Stabilizing of levitation melting |
US3363081A (en) * | 1963-11-21 | 1968-01-09 | Noiret Maurice | Magnetic device to lift and melt a body without any holder |
US4979182A (en) * | 1988-09-30 | 1990-12-18 | Deutsche Forschungsanstalt Fur Luft-Und Raumfahrt Ev | Device for positioning and melting electrically conductive materials without a receptacle |
US4993043A (en) * | 1988-10-25 | 1991-02-12 | Deutsche Forschungsanstalt Fur Luft-Und Raumfahrt E.V. | Device for positioning and melting electrically conductive materials without a receptacle |
WO2003071000A1 (en) * | 2002-02-21 | 2003-08-28 | Corus Technology Bv | Method and device for coating a substrate |
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JPS621863A (en) * | 1985-06-28 | 1987-01-07 | Ishikawajima Harima Heavy Ind Co Ltd | Apparatus for vaporizing metal |
JPH0781181B2 (en) * | 1986-07-10 | 1995-08-30 | 石川島播磨重工業株式会社 | Film forming equipment |
JPH0797680A (en) * | 1993-09-30 | 1995-04-11 | Kao Corp | Thin film forming device |
JP3129076B2 (en) * | 1994-03-02 | 2001-01-29 | 富士電機株式会社 | Floating melting apparatus and its tapping method |
JPH07252639A (en) * | 1994-03-15 | 1995-10-03 | Kao Corp | Production of metallic thin film |
JPH08104981A (en) * | 1994-10-05 | 1996-04-23 | Sumitomo Electric Ind Ltd | Pvd device |
JPH08199345A (en) * | 1995-01-30 | 1996-08-06 | Mitsubishi Electric Corp | Film forming device and film formation |
JP4156885B2 (en) * | 2002-09-11 | 2008-09-24 | 株式会社アルバック | Thin film forming equipment |
-
2005
- 2005-05-31 KR KR1020077006446A patent/KR101143067B1/en active IP Right Grant
- 2005-05-31 PL PL05754666T patent/PL1785010T3/en unknown
- 2005-05-31 DE DE602005013791T patent/DE602005013791D1/en active Active
- 2005-05-31 AU AU2005276729A patent/AU2005276729B2/en not_active Ceased
- 2005-05-31 CA CA2576541A patent/CA2576541C/en not_active Expired - Fee Related
- 2005-05-31 MX MX2007002191A patent/MX2007002191A/en active IP Right Grant
- 2005-05-31 ES ES05754666T patent/ES2324921T3/en active Active
- 2005-05-31 RU RU2007110642/09A patent/RU2370921C2/en not_active IP Right Cessation
- 2005-05-31 JP JP2007528625A patent/JP5064222B2/en not_active Expired - Fee Related
- 2005-05-31 CN CN2005800280853A patent/CN101006751B/en not_active Expired - Fee Related
- 2005-05-31 AT AT05754666T patent/ATE428290T1/en active
- 2005-05-31 WO PCT/EP2005/005905 patent/WO2006021245A1/en active Application Filing
- 2005-05-31 BR BRPI0514545-7A patent/BRPI0514545A/en not_active IP Right Cessation
- 2005-05-31 UA UAA200702502A patent/UA89792C2/en unknown
- 2005-05-31 EP EP05754666A patent/EP1785010B1/en not_active Not-in-force
-
2007
- 2007-12-31 HK HK07114323.2A patent/HK1109292A1/en not_active IP Right Cessation
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686864A (en) * | 1951-01-17 | 1954-08-17 | Westinghouse Electric Corp | Magnetic levitation and heating of conductive materials |
US2957064A (en) * | 1958-09-30 | 1960-10-18 | Westinghouse Electric Corp | Stabilizing of levitation melting |
US3363081A (en) * | 1963-11-21 | 1968-01-09 | Noiret Maurice | Magnetic device to lift and melt a body without any holder |
US4979182A (en) * | 1988-09-30 | 1990-12-18 | Deutsche Forschungsanstalt Fur Luft-Und Raumfahrt Ev | Device for positioning and melting electrically conductive materials without a receptacle |
US4993043A (en) * | 1988-10-25 | 1991-02-12 | Deutsche Forschungsanstalt Fur Luft-Und Raumfahrt E.V. | Device for positioning and melting electrically conductive materials without a receptacle |
WO2003071000A1 (en) * | 2002-02-21 | 2003-08-28 | Corus Technology Bv | Method and device for coating a substrate |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP2085492B1 (en) | 2007-12-28 | 2016-04-20 | Posco | Zinc alloy coated steel sheet having good sealer adhesion and corrosion resistance and process of manufacturing the same |
EP2085492B2 (en) † | 2007-12-28 | 2022-06-15 | Posco | Zinc alloy coated steel sheet having good sealer adhesion and corrosion resistance and process of manufacturing the same |
DE102009042972A1 (en) | 2009-09-16 | 2011-03-24 | Technische Universität Ilmenau | Device for manipulating levitated electrically conductive substance in high frequency electromagnetic alternating field, has modification unit provided for spatial modification in effective area of electromagnetic alternating field |
US9267203B2 (en) | 2010-12-13 | 2016-02-23 | Posco | Continuous coating apparatus |
DE102011018675A1 (en) | 2011-04-18 | 2012-10-18 | Technische Universität Ilmenau | Device for active manipulation of floating electrically conductive substance e.g. liquid metal melt in high-frequency alternating electromagnetic field, has primary winding and secondary winding that are separated at specified angle |
PL423811A1 (en) * | 2017-12-11 | 2019-06-17 | Politechnika Śląska | Device for multi-scale levitation melting |
Also Published As
Publication number | Publication date |
---|---|
KR20070067097A (en) | 2007-06-27 |
AU2005276729B2 (en) | 2010-08-26 |
MX2007002191A (en) | 2007-05-08 |
UA89792C2 (en) | 2010-03-10 |
HK1109292A1 (en) | 2008-05-30 |
RU2370921C2 (en) | 2009-10-20 |
ATE428290T1 (en) | 2009-04-15 |
PL1785010T3 (en) | 2009-08-31 |
CN101006751B (en) | 2011-04-27 |
CA2576541C (en) | 2012-01-10 |
CA2576541A1 (en) | 2006-03-02 |
CN101006751A (en) | 2007-07-25 |
JP5064222B2 (en) | 2012-10-31 |
JP2008515133A (en) | 2008-05-08 |
BRPI0514545A (en) | 2008-06-17 |
EP1785010A1 (en) | 2007-05-16 |
EP1785010B1 (en) | 2009-04-08 |
RU2007110642A (en) | 2008-09-27 |
ES2324921T3 (en) | 2009-08-19 |
DE602005013791D1 (en) | 2009-05-20 |
AU2005276729A1 (en) | 2006-03-02 |
KR101143067B1 (en) | 2012-05-08 |
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