JPH0781181B2 - Film forming equipment - Google Patents

Description

TECHNICAL FIELD The present invention relates to a film forming apparatus for forming a film on a surface of an object to be processed made of a conductive material.

"Prior Art" As a film forming apparatus of this kind, a vacuum vapor deposition apparatus, an ion plating apparatus, a sputtering apparatus and the like have been conventionally known. Among them, the vacuum vapor deposition apparatus will be described with reference to FIG. To do.

FIG. 3 shows a schematic configuration of a vacuum vapor deposition apparatus in which a long cylindrical metal roll is used as an object to be treated.
Is a vacuum container, 2 is an object to be treated, and 3 is an evaporation source device. The evaporation source device 3 includes a crucible 4 and an electron gun 5. The evaporation material 6 filled in the crucible 4 is irradiated with an electron beam 7 from the electron gun 5 to heat and evaporate the evaporation material 6. It is a thing. This evaporation source device 3 is attached to the tip of a beam 8 penetrating the vacuum vessel 1. This beam 8 is driven by a drive source (not shown), as shown by the arrow in the figure, in the longitudinal direction of the workpiece 2. You can move along. Reference numeral 9 is a seal member for maintaining airtightness.

In this device, the object to be processed 2 is rotatably supported by a supporting device (not shown) and is disposed above the crucible 4,
By rotating the object 2 to be processed and driving the beam 8 to move the crucible 4 over the entire length of the object 2 to evaporate the evaporation material 6, the vapor 10 thereof is transferred to the surface of the object 2 to be processed. It is adapted to be vapor-deposited over the entire surface to form a film.

In addition, this apparatus is provided with a heating device 11 for heating the object to be processed 2. The heating device 11 is used for processing the object 2
The electric resistor 12 (that is, an electric heater) arranged in the vicinity of is used as a heating element, and power is supplied from the power supply device 13 to the resistor 12 to generate heat. The power source is 50 Hz or 60 Hz. The commercial AC power source is used. The heating device 11 raises the surface temperature of the object to be processed 2 to about 200 ° C. to 500 ° C. when forming the film, thereby smoothing the properties of the film to be formed and adhering the film to the object to be processed 2. It is for increasing strength.

"Problems to be Solved by the Invention" By the way, in the conventional vacuum deposition apparatus described above, the electric resistance 12
Since the heating device 11 using an (electric heater) is used, power consumption is extremely large, operating costs are high and energy saving is difficult. Further, in the above-mentioned heating device 11, the heating speed is slow, and it takes a long time to heat the object 2 to be processed to the required temperature before forming the film, which is an obstacle to shortening the operation time. Was there.

Note that the above is not limited to the vacuum vapor deposition apparatus, but an ion plating apparatus that vaporizes by ionizing vapor and colliding it with an object to be processed, or sputtering that vaporizes and evaporates a target material In other film forming apparatuses such as the apparatus, the same problem occurs when the object to be processed is heated by the electric resistor.

The present invention has been made in view of the above circumstances, and a film forming apparatus including a heating device capable of reducing power consumption to save energy and heating an object to be processed in a short time Is intended to provide.

"Means for Solving the Problems" The present invention comprises an evaporation source device for evaporating an evaporative substance, and a heating device for heating an object to be processed made of a conductive material. In a film forming apparatus for forming a film on the surface of the object to be processed by depositing the vapor on a heated object to be processed, as the heating device, a high frequency current is passed through a high frequency heating coil arranged near the object to be processed. As a result, an induction heating device for inducing an induced current in the object to be processed to heat the surface layer portion is used. It is desirable to dispose the high-frequency heating coil and the evaporation source device so as to be movable with respect to the object to be processed.

[Operation] The induction heating device in the film forming apparatus of the present invention heats and heats the object to be processed itself. That is, when a high-frequency current is passed through the high-frequency heating coil, a high-frequency magnetic field is generated, and a high-frequency induction current flows through the object to be processed that is arranged in the vicinity of the coil, so that the object to be processed that is a conductive material Generates Joule heat due to its electrical resistance. Since the induced current tends to flow on the surface of the object to be processed, the surface of the object to be processed becomes particularly hot.

[Embodiment] An embodiment of the present invention will be described below with reference to FIGS. 1 and 2.

First, the vacuum vapor deposition apparatus of the first embodiment will be described with reference to FIG. Since the apparatus of the first embodiment is configured in the same manner as the above-described conventional vacuum vapor deposition apparatus (see FIG. 3) except for the heating device, the components common to both are shown in FIG. The same reference numerals as those in the figure are given and the description thereof will be omitted.

In the vacuum vapor deposition apparatus of the first embodiment, the object to be processed 2
An induction heating device 20 is used as a heating device for heating the. The induction heating device 20 includes a high frequency heating coil 21.
And a beam 22 attached to the coil 21 in an electrically insulated state, and a few KHz to several hundred KHz on the coil 21.
It is composed of a high frequency power source 23 for applying the high frequency current of. The coil 21 has an inner diameter slightly larger than the outer diameter of a roll which is the object 2 to be processed, and the object 2 can be inserted through the coil 21 with a slight gap secured inside. The coil 21 is formed of a hollow copper tube, and the copper tube forming the coil 21 is guided through the beam 22 to the outside of the vacuum container 1, and the high frequency power source 23 is provided at the end thereof. While being connected, the cooling water 24 is allowed to pass through the hollow interior of this copper pipe.

The beam 22 and the beam 8 holding the evaporation source device 3 are connected by a connecting member 25 with the coil 21 positioned obliquely above the crucible 4 of the evaporation source device 3. The two beams 22 and 8 are movable in the direction of the arrow in the figure by a drive source (hydraulic cylinder, etc.) not shown, and therefore the coil 21 and the evaporation source device 3 are
At the same time, the object 2 can be moved along the length direction. Reference numeral 26 is a bearing, and 27 is a seal member for maintaining airtightness.

Here, the operation of the induction heating device 20 will be described. When a high-frequency current is applied to the coil 21, a high-frequency magnetic field is generated in the coil 21, and the magnetic field causes a high-frequency induction current in the portion of the workpiece 2 that is a conductive material (metal in this example) in the vicinity of the coil 21. Flow, and Joule heat is generated in the object 2 to be processed due to its electric resistance, and that part instantly becomes high in temperature. Moreover, the distribution state of the high frequency induction current tends to decrease exponentially from the surface of the object 2 to be processed, and this tendency becomes more remarkable as the frequency of the applied current becomes higher. Therefore, the object to be processed 2
By appropriately setting the power supply frequency according to the material and shape of the material, only the surface that needs to be heated can be heated, and the inside of the object 2 to be processed that does not need to be heated is hardly heated. . That is, this induction heating device 20
Then, it is possible to extremely efficiently heat the object to be processed 2 without consuming unnecessary energy.

Next, a method of using the vacuum vapor deposition device of the first embodiment will be described.

First, the workpiece 2 is coiled by a supporting device (not shown).
21 is rotatably supported with it inserted, the coil 21 and the evaporation source device 3 are positioned on the left end side in the figure of the object to be treated 2, and the inside of the vacuum container 1 is set to a predetermined vacuum degree (for example, 10 ⁻⁶ To
rr). Then, while rotating the workpiece 2 as shown by the arrow in the figure, the two beams 22 and 8 are gradually moved to the right in the figure to move the coil 21 in a state in which the coil 21 precedes the evaporation source device 3. , A high-frequency current is applied to the coil 21 by the high-frequency power source 23, and the electron gun 5
Then, the evaporation material 6 in the crucible 4 is irradiated with the electron beam 7 to be evaporated.

By doing so, the portion of the workpiece 2 near the coil 21 is instantly heated to a high temperature as described above, and the vapor 10 of the vaporized substance 6 evaporated from the crucible 4 is vapor-deposited on the hot portion, which is favorable. A film is formed. When the coil 21 and the evaporation source device 3 reach the right end in the figure of the object to be processed 2,
A coating is formed on the entire outer peripheral surface of the object to be processed 2.

As described above, according to the device of the first embodiment, the induction heating device 20 heats the object 2 to be processed, and the coil 21 and the evaporation source device 3 are connected to each other by the coil 21. Since the workpiece 2 is moved along the lengthwise direction in advance of the above, it is possible to instantly heat only that portion and only the surface thereof immediately before forming the coating film. Therefore, by using the induction heating device 20, not only it is necessary to heat the object to be treated 2 over a long period of time in advance, but also the inside thereof, which does not need to be heated, is heated by a resistance heating method. As compared with the case where the device is used, the thermal efficiency is remarkably improved, the energy consumption can be significantly reduced, and the operation time can be shortened.

The first embodiment has been described above. Next, the second embodiment will be described with reference to FIG. In the apparatus of the second embodiment, a thin plate (for example, strip steel) made of a conductive material is used as an object to be processed, and the present invention is applied to a continuous vacuum evaporation apparatus for continuously forming a coating on both surfaces of the object. It is applied.

In FIG. 2, reference numeral 30 is a front chamber, 31 is a heating chamber, 32 is a vapor deposition chamber, and 33 is a rear chamber. Sealing rolls for keeping airtightness are provided between these chambers and at the inlet and outlet of the workpiece 35. 34 are provided, and the interior of each chamber can be maintained at a predetermined vacuum degree by a vacuum exhaust device (not shown). Then, the strip steel 35 which is the object to be processed is drawn out from the uncoiler 36, successively passes through the above-mentioned chambers and is wound around the coiler 37.

A high-frequency heating coil 39 of an induction heating device 38 is fixedly arranged in the heating chamber 31, and the object 35 to be processed passes inside the coil 39. This induction heating device
38 is the same as the induction heating device 20 in the first embodiment, and generates high-frequency current from the high-frequency power source 40 to the coil 39 to generate induction current on the surface (upper and lower surfaces) of the object 35 to be processed. The surface is heated to a high temperature.

Further, two evaporation source devices 41, 41 are arranged in the vapor deposition chamber 32. These evaporation source devices 41, 41 are the same as the evaporation source device 3 in the first embodiment, and the former device 41
Is on the lower surface of the object to be processed 35, and the apparatus 41 at the latter stage is to vaporize the vapor 44 of the vaporized substance 43 over the entire width of the object to be processed 35 on the upper surface of the object to be processed 35 reversed by the guide rollers 42. It is like this.

In the continuous vacuum vapor deposition apparatus of the second embodiment, both surfaces of the object 35 to be processed are heated by the induction heating apparatus 38 in the heating chamber 31 to raise the temperature, and then a coating film is formed on both surfaces in the vapor deposition chamber 32. Therefore, similar to the first embodiment, it is possible to raise the temperature of the object to be treated 35 in an extremely short time and efficiently only the surface thereof, and then quickly vaporize it.
By depositing 44, a good film can be formed.

Although the embodiments of the present invention have been described above, the present invention is not limited to the above embodiments. For example, although the first and second embodiments described above apply the present invention to a vacuum vapor deposition apparatus, the present invention is not limited to this, and it is also applicable to other film forming apparatuses, such as an ion plating apparatus and a sputtering apparatus. The same applies. Further, in the first embodiment, since the object to be processed is a long roll, the coil and the evaporation source device can be freely moved. However, depending on the shape and size of the object to be processed, this may not always be the case. Alternatively, they may be fixedly provided.

[Advantages of the Invention] As described in detail above, according to the present invention, as a heating device for heating an object to be processed made of a conductive material, an induced current is induced in the object to be processed to heat its surface layer portion. Since the induction heating device is used, only the surface of the object to be processed can be instantly heated to a high temperature. Therefore, compared with the conventional resistance heating type heating device, the heating efficiency is remarkably improved, the energy consumption can be significantly reduced, the energy can be sufficiently saved, and the operating time can be shortened. It has the effect of being able to.

Further, if the coil of the induction heating device and the evaporation source device are movable with respect to the object to be processed, the object to be processed can be partially and sequentially heated, and the object to be processed is large in size. It is effective when used.

[Brief description of drawings]

1 and 2 show an embodiment of the present invention,
FIG. 1 is a sectional view showing a schematic structure of a vacuum vapor deposition apparatus according to the first embodiment, and FIG. 2 is a sectional view showing a schematic structure of a continuous vacuum vapor deposition apparatus according to the second embodiment. FIG. 3 is a sectional view showing a schematic configuration of a conventional film forming apparatus (vacuum vapor deposition apparatus). 2,35 …… Processing object, 3,41 …… Evaporation source device, 6,43 …… Evaporation material, 10,44 …… Steam, 20,38 …… Induction heating device, 21,39 …… High frequency heating coil .

Claims (2)

[Claims] 1. An evaporation source device for evaporating an evaporated substance, and a heating device for heating an object to be treated made of a conductive material, wherein the evaporated substance is evaporated to vaporize the vapor to be heated. In a film forming apparatus that forms a film on the surface of the object to be processed by vapor deposition, as the heating device, a high frequency current is passed through a high frequency heating coil arranged in the vicinity of the object to be processed to induce an induced current in the object itself. A film forming apparatus characterized by using an induction heating device for inducing heat to generate heat in its surface layer portion. 2. The film forming apparatus according to claim 1, wherein the high-frequency heating coil and the evaporation source device are arranged so as to be movable with respect to an object to be processed.