WO2006001343A1

WO2006001343A1 - Chemical liquid supply management device

Info

Publication number: WO2006001343A1
Application number: PCT/JP2005/011551
Authority: WO
Inventors: Kiyoshi Kamibayashi; Toshimichi Yamanaka; Kazuyuki Hashimoto; Masato Shimura; Shizuo Nachi
Original assignee: Nagase & Co., Ltd.; Nagase Cms Technology Co., Ltd.
Priority date: 2004-06-24
Filing date: 2005-06-23
Publication date: 2006-01-05
Also published as: TW200606599A; JP2006007075A

Abstract

A chemical liquid supply management device has memory means (204) for memorizing a set value of a chemical liquid supply amount set in advance, flow rate measurement means (202) for measuring by the hour the flow rate of a chemical liquid flowing in a supply line, supply amount acquisition means (214) for acquiring, by accumulating the flow rate of the chemical liquid, an actual measurement value of the amount of the chemical liquid supplied to an object (104) to which the chemical liquid is to be applied, supply amount determination means (216) for determining, based on the actual measurement value and the set value of the chemical liquid supply amount, whether or not the amount of the chemical liquid supplied to the object (104) through a supply line (L1) has reached the set value, and supply stop means (218) for stopping the supply of the chemical liquid through the supply line when it is determined that the amount of the chemical liquid supplied to the object (104) through the supply line has reached the set value.

Description

Chemical liquid supply management device

Technical field

TECHNICAL FIELD [0001] The present invention relates to a chemical liquid supply management apparatus that manages a supply amount of a chemical liquid supplied via a supply line to an object to be coated in a spinner.

Background art

Conventionally, processing processes using chemical solutions such as pure water, acids, alkalis, organic solvents, and photoresists have been frequently used in manufacturing processes for semiconductors, magnetic disks, and the like.

[0003] For example, in a semiconductor manufacturing process, processing with a precision of, for example, 0.3 to 0. or even lower by a photolithography method including pretreatment with these chemical solutions, resist film formation, etching, and the like. Is done.

In such a manufacturing process, a chemical solution is often applied to an object to be applied such as a substrate by a spin coating method using a spinner.

[0005] Here, if the amount of the chemical solution supplied to the object to be coated in the spinner is too small than the predetermined amount, the treatment with the chemical solution is not sufficiently performed. On the other hand, if the amount of the chemical solution to be supplied is too large, The cost of expensive chemical solutions increases and the cost increases. Therefore, it is required to supply the chemical solution in an accurate amount to the object to be coated.

[0006] Conventionally, a predetermined amount of a chemical solution is repeatedly supplied to an object to be coated by preliminarily determining a time for opening a valve of the supply line.

Patent Document 1: Japanese Patent Laid-Open No. 62-221463

Disclosure of the invention

Problems to be solved by the invention

[0007] However, as a result of investigations by the present inventors, it has been found that the following problems occur.

[0008] When supplying a chemical solution to an object to be applied to a spinner, not only the amount of the chemical solution but also reduction of foreign matters in the chemical solution is required, and a normal supply line is used to remove foreign matters. There is a filter! [0009] Then, the passage of time, that is, the total amount of chemicals passing through the supply line increases, so that the pressure loss of the filter increases and the flow rate fluctuates even if a metering pump is used. Just by making the same, the supply amount of chemicals will fluctuate.

[0010] Since the way of changing the supply amount varies depending on the usage state of the supply line L1, etc., even if the change time is predicted and the valve opening time is set, It is difficult to control the supply amount well.

The present invention has been made in view of the above problems, and an object of the present invention is to provide a chemical liquid supply management apparatus that can accurately supply a predetermined amount of chemical liquid.

Means for solving the problem

[0012] A chemical supply management device according to the present invention is a chemical supply management device that manages a supply amount of a chemical supplied to a coating object in a spinner via a supply line, and is set in advance. The storage means for storing the set value of the chemical solution supply amount, the flow rate measurement means for measuring the flow rate of the chemical solution flowing through the supply line every hour, and the flow rate of the chemical solution obtained by the flow rate measurement means are integrated to integrate Setting of the supply amount acquisition means for acquiring the actual measurement value of the chemical liquid supply amount supplied to the coating, the actual measurement value of the chemical liquid supply amount acquired by the supply amount acquisition means, and the setting of the chemical supply amount stored in the storage means Supply amount judgment means for judging whether or not the chemical supply amount supplied to the coating object via the supply line has reached the set value of the chemical supply amount, and supply amount judgment Means to be coated via supply line When the chemical liquid supply amount which is supplied for is determined to have reached the set value of the chemical liquid supply amount, provided with a supply stop means for stopping the supply of the chemical liquid through the supply line! / Ru.

[0013] According to the chemical solution supply management apparatus according to the present invention, the amount of the chemical solution supplied to the coating object in the spinner is accurately managed to the set value of the predetermined supply amount, and the supply amount of the chemical solution is too small. This prevents incomplete processing and waste of chemicals due to excessive supply of chemicals, and realizes low-cost and high-quality spinner processing. In particular, when a filter or the like is provided in the supply line, and the pressure loss of the supply line fluctuates with time, the flow rate of the chemical flowing through the supply line, that is, the volume and weight per unit time may vary. Even in some cases, according to the present invention, since the flow rate is sequentially accumulated, the supply amount is managed with sufficiently high accuracy. Here, the storage unit stores a plurality of set values of the chemical solution supply amount, and the chemical solution supply management apparatus further sets the plurality of chemical solution supply amounts stored in the storage unit in response to an external signal. Selection means for selecting one of the values, and the supply amount determination means includes the set value of the chemical solution supply amount selected by the selection means and the supply amount of the chemical solution acquired by the supply amount acquisition means. It is preferable to make the above judgment based on the actual measurement value.

[0015] Accordingly, if a plurality of chemical solution supply amounts are stored in the force storage means, the chemical solution supply amount can be switched to a desired value in accordance with an external force instruction. Therefore, it is particularly suitable when it is necessary to change the supply amount of the chemical according to the content of the treatment.

[0016] In addition, a timer for acquiring a discharge time from the time when supply of the chemical liquid to the application object via the supply line is started to the time when supply of the chemical liquid to the application object via the supply line is stopped. It is preferable to have further means.

[0017] When the characteristics of the chemical liquid supplied through the supply line greatly fluctuate due to chemical deterioration or chemical replenishment mistakes, etc., the discharge time required to reach the set supply amount is compared to before the fluctuation. Will change greatly. Therefore, by acquiring such a discharge time, it is possible to easily find such alteration of the chemical solution, a chemical replenishment error, and the like.

[0018] For example, if a recording control means for recording the discharge time in the recording unit is further provided, manufacturing history management becomes easy, and the cause of the occurrence of defects becomes easy.

[0019] Further, the storage means further stores an allowable range of the discharge time in association with the set value of the chemical liquid supply amount, and the chemical liquid supply management apparatus further stores the discharge time acquired by the timer means, Based on the allowable discharge time range stored in the means, the time determination means for determining whether the discharge time acquired by the timer means is within the allowable discharge time range, and the time determination means are determined by the timer means. It is preferable to further include warning control means for generating a warning signal when it is determined that the obtained discharge time is outside the allowable range of discharge time.

[0020] This makes it possible to automatically detect and warn of a sudden change in the properties of the chemical solution such as when the chemical solution is denatured or when a different type of chemical solution is supplied, so that manufacturing defects are particularly reduced.

The invention's effect

[0021] According to the present invention, there is provided a chemical liquid supply management device capable of supplying a predetermined amount of chemical liquid with high accuracy. Provided.

Brief Description of Drawings

FIG. 1 is a schematic configuration diagram showing a semiconductor manufacturing apparatus according to an embodiment of the present invention.

FIG. 2 is a diagram showing the contents stored in the storage unit of FIG.

3 is a diagram showing a flowchart of the semiconductor manufacturing apparatus of FIG.

[FIG. 4] FIG. 4 is a graph showing measured values of the chemical supply amount when the chemical supply amount management device is used.

[FIG. 5] FIG. 5 is a graph showing the measured value of the chemical supply amount when the chemical supply amount management device is used.

Explanation of symbols

[0023] 100 ··· Spinner, 104 ... Substrate (coating object), 200 ... Chemical solution supply management device, 202 ... Flow meter (flow rate measuring means), 204 ... Storage means (storage unit), 212 ... Selection means, 214 ... Supply quantity acquisition means, 216 ... Supply quantity judgment means, 218 ... Supply stop means, 220 ... Timer means, 226 ... Record control means, 222 ... Time judgment means, 224 ... Warning control means, L1 ... supply line. BEST MODE FOR CARRYING OUT THE INVENTION

Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings.

FIG. 1 is a schematic configuration diagram showing a semiconductor manufacturing system according to the present embodiment. The semiconductor manufacturing system of this embodiment mainly includes a spinner 100 that supplies a chemical solution 102 to a substrate (object to be coated) 104 on a rotating table 106, a spinner controller 150 that controls the spinner 100, and the substrate 104. And a chemical supply management device 200 for managing the amount of chemical supplied to the apparatus to a predetermined amount.

The spinner 100 is an apparatus that spin-coats a chemical solution 102 such as a photoresist on the substrate 104. The spinner 100 has a substrate 106 mounted on the upper surface and fixed, and a table 106 that rotates the substrate 104 around a vertical axis, a chemical solution storage tank 108 that stores the chemical solution, and a chemical solution 102 from the chemical solution storage tank 108 to the substrate 104. The supply line L1 is connected to the supply line L1, the pump 110 for supplying the chemical solution 102 from the chemical solution storage tank 108 to the substrate 104, the valve 112 connected to the supply line L1, and the supply line L1. Was Filter 117.

[0027] The pump 110 is not particularly limited as long as it can supply a chemical solution! However, pulse pumps, helicopter pumps, bellows pumps, diaphragm pumps, and the like are preferred, and pulse pumps are also preferred because of their high quantitative power. ! /

[0028] Also, the valve 112 is not particularly limited, but a valve that can switch between an opening operation and a closing operation with high responsiveness is preferred. An electromagnet that can be suitably controlled by a spinner controller 150, which will be described later. A driving on-off valve and a pneumatic driving on-off valve are preferred.

[0029] The chemical solution 102 used in the spinner 100 is not particularly limited. For example, when a resist film is spin-coated, a photoresist is used. Specifically, for example, positive photoresists include those containing naphthoquinone diazide-based photosensitizer and alkali-soluble rosin (nopolac rosin) as main components. Examples of the chemical solution 102 include a developing solution, a stripping solution, and a polishing solution in addition to the resist solution.

The spinner controller 150 is a control device that controls the rotation of the table 106 of the spinner 100, and controls the driving / stopping of the pump 110 and the opening / closing of the valve 112. Specifically, the spinner controller 150 starts the supply of the chemical solution 102 and stops the supply of the chemical solution 102.

[0031] The supply operation of the chemical solution by the spinner controller 150 is specifically performed by starting the pump 110, opening the valve 112, and starting supply to the chemical supply management device 200. And a signal indicating the mode number of the set supply amount to be supplied (details will be described later).

In addition, the operation of stopping the supply of the chemical solution by the spinner controller 150 is specifically performed by stopping the pump 110 and closing the valve 112 based on the supply stop signal received from the chemical supply management device 200. Including doing.

Subsequently, the chemical liquid supply management apparatus 200 according to the present embodiment will be described. The chemical solution supply management apparatus 200 includes a flow meter (flow rate measuring means) 202, a storage unit (storage unit) 204, an interface unit 206, a control unit 210, a recording unit 250, and an alarm unit 252. Have.

[0034] The flow meter 202 is connected to the supply line L1 of the spinner 100, and measures the flow rate of the chemical liquid flowing through the supply line L1, that is, the weight or volume of the chemical liquid transferred per unit time. Information on the flow rate is transmitted to the control unit 210 at predetermined time intervals. Such a flow meter 202 is not particularly limited, but an electromagnetic flow meter, an area flow meter, an ultrasonic flow meter, and the like are preferable from the viewpoint of a wide measurement range and high accuracy.

[0035] As shown in FIG. 2, the area 204A, 204B, 204C, 204D and the force S are set in the area 204. A mode number is stored in the storage area 204A. The storage area 204B stores a preset supply amount that is set in advance in association with each mode number. The storage area 204C stores a first allowable range of the discharge time set in advance for the set supply amount of each mode number. The storage area 204D stores a second allowable range of the discharge time set in advance for the set supply amount of each mode number. The second tolerance range is narrower than the first tolerance range. As the storage unit 204, for example, ROM, RAM, HDD, or the like can be adopted.

The interface unit 206 is a connection device that exchanges signals between the control unit 210 and the spinner controller 150. Specifically, the interface unit 206 receives a chemical solution supply start signal and a supply mode number from the spinner controller 150 and transmits them to the control unit 210. On the other hand, the interface unit 206 transmits a signal for stopping the supply of the chemical solution to the spinner controller 150 based on an instruction from the control unit 210.

[0037] The control unit 210 includes functions of a selection unit 212, a supply amount acquisition unit 214, a supply amount determination unit 216, a supply stop unit 218, a timer unit 220, a time determination unit 222, a warning control unit 224, and a recording control unit 226. To demonstrate. Such a device can be realized by a computer that executes a predetermined program by a CPU.

[0038] The selection means 212 acquires the mode number from the interface unit 206, accesses the storage areas 204A to 204D of the storage unit 204, and sets the set value of the chemical supply amount corresponding to the mode number and the Select one tolerance and second tolerance selectively.

The supply amount acquisition unit 214 receives the flow rate of the chemical solution flowing through the supply line L1 from the flow meter 202 every predetermined time. Further, upon receiving a chemical solution supply start signal from the interface unit 206, the supply amount acquisition unit 214 integrates the flow rate received from the flow meter 202, that is, integrates the flow rate with respect to time, and supplies the chemical solution through the supply line L1. The actual measurement value of the supply amount as the total supply amount actually supplied to the substrate 104 is acquired after the supply of the substrate is started. The actual measurement of the supply amount is repeated every predetermined time, for example, every time the supply amount acquisition means 214 obtains a flow rate from the flow meter 202. Thereby, an actual measurement value of the supply amount of the chemical solution supplied to the substrate 104 is obtained over time.

[0040] The supply amount determination means 216 is actually applied to the substrate 104 based on the set value of the chemical solution supply amount acquired by the selection means 212 and the measured value of the supply amount acquired by the supply amount acquisition means 214. On the other hand, it is determined whether or not the supplied amount has reached the set value of the supplied amount.

Specifically, for example, if (actual supply value supply value set value of supply amount) ≥0 is satisfied, it can be determined that the actual supply amount has reached the actual supply value. Further, the supply amount determination unit 216 can make such a determination every time the supply amount acquisition unit 214 acquires an actual measurement value of the supply amount.

[0042] The supply stop unit 218 is configured to supply a chemical solution to the spinner controller 150 via the interface unit 206 when the supply amount determination unit 216 determines that the actual supply amount has reached the set value of the supply amount. Send a signal to stop the supply.

On the other hand, the timer means 220 starts from the time when the supply of the chemical solution to the substrate 104 via the supply line L1 is started until the time when the supply of the chemical solution to the substrate 104 via the supply line L1 is stopped. Get the discharge time. Specifically, for example, when it is started, it can be acquired as the time when the chemical supply management apparatus 200 receives a supply start signal from the spinner controller 150, and when stopped, the supply stop means 218 is supplied by the spinner controller 150. On the other hand, it may be when a supply stop signal is transmitted.

[0044] The time judging means 222 is divided into the discharge time acquired by the timer means 220, the first allowable range acquired by the selecting means 212, and the second allowable range narrower than the first allowable range. The following judgment is made based on this. First, it is determined whether or not the discharge time is included in the second allowable range. If the discharge time is not included in the second allowable range, the discharge time is further included in the first allowable range. Judge whether or not you are.

[0045] Then, the warning control means 224 gives a serious warning to the alarm unit 252 when the time determination means 222 does not include the discharge time in either the first allowable range or the second allowable range. A warning, for example, a flashing warning light or an alarm sound is generated. On the other hand, the warning control means 224 is included in the first allowable range in which the discharge time in the time determination means 222 is wide. If it is not included in the second allowable range that is narrower than the first allowable range, the alarm unit 252 is caused to perform a light warning, for example, turn on the indicator lamp. By setting the two ranges in this way, it is possible to respond flexibly according to the degree of abnormality.

[0046] The recording control means 226 records the measured value of the supply amount and the discharge time together with the time in the recording unit 250. As the recording unit 250, an HD, a printer, or the like can be used.

Next, the operation of the semiconductor manufacturing apparatus of this embodiment will be described with reference to the flowchart of FIG.

[0048] Here, for the sake of simplicity, the state force in which the substrate 104 is placed on the table 106, the table 106 is rotated at a predetermined number of rotations, and the preparation before the chemical solution supply is completed will be described. At this time, the storage unit 204 stores the set supply amount, the first allowable range, and the second allowable range for each mode number.

First, in step S 101, the spinner controller 150 transmits a chemical supply start signal and a set supply amount mode number to the chemical supply management apparatus 200, and drives the pump 110 and opens the valve 112.

In response to this, the chemical supply management apparatus 200 receives the start signal and the mode number in step S201.

[0051] Next, in the chemical supply management apparatus 200, in step S203, the timer means 220 is started to start the discharge time measurement, and the set value of the supply amount based on the mode number, the first allowable range, The second allowable range is selected and acquired from the storage unit 204.

[0052] Next, in step S205, the chemical supply management apparatus 200 integrates the flow rate data from the flow meter 202 to obtain an actual supply value.

Next, in step S 207, the chemical supply management apparatus 200 determines that the actual supply amount is the supply amount set value based on the supply amount setting value and the actual supply amount measurement value! Judge whether the power was exceeded.

[0054] If it is determined that the actual supply amount does not exceed the set value of the supply amount, the process returns to step S205 again to acquire the actual supply amount.

[0055] On the other hand, when it is determined that the actual supply amount is equal to or greater than the set value of the supply amount, the process proceeds to step S209, and a signal for stopping the supply of the chemical solution is transmitted to the spinner controller 150. On the other hand, the time measurement by the timer means 220 is stopped and the discharge time is acquired.

Correspondingly, the spinner controller 150 receives this supply stop signal in step S103, and in step S105, stops the driving of the pump 110 and closes the valve 112 to stop the supply of the chemical solution. .

[0057] Subsequently, in chemical supply management apparatus 200, in step S211, it is determined whether or not the discharge time is included in the second allowable range, and the discharge time is not included in the second allowable range. In this case, it is further determined whether or not the discharge time is included in the first allowable range.

[0058] When the discharge time is included in the second allowable range, the process proceeds to step S217.

On the other hand, if the discharge time is not included in the first allowable range and the second allowable range, the process proceeds to step S213 to cause the warning unit 252 to give a severe warning, and then proceeds to step S217. Furthermore, when the discharge time is included in the first allowable range but not included in the second allowable range, the process proceeds to step S215, a light warning is given by the alarm unit 252 and the process proceeds to step S217. Finally, in step S217, the measured value of the supply amount and the discharge time are recorded in the recording unit 250. This completes the series of processing.

[0059] Thereafter, the same processing can be repeated again according to an instruction from the spinner controller 150, if necessary.

[0060] According to the present invention, the flow rate of the chemical solution flowing through the supply line L1 is integrated to actually measure the supply amount, and further, based on the actual measurement value and the set value, the actual supply amount is supplied to the substrate 104 of the spinner 100. The amount of chemical liquid to be controlled is accurately controlled to a predetermined set value. Therefore, incomplete processing due to an excessive supply amount of the chemical solution and waste of the chemical solution due to an excessive supply amount of the chemical solution can be prevented, and processing with a spinner can be realized at low cost and high quality.

[0061] In particular, when the pressure loss of the filter 117 increases with time, even if the flow rate of the chemical flowing through the supply line L1 is changed even if the quantitative pump 110 is used, the supply amount of the chemical is not increased. High enough! Managed with accuracy.

[0062] Further, the storage unit 204 stores a plurality of set values of the chemical solution supply amount, and the selection unit 212 sets the plurality of set values of the chemical solution supply amounts stored in the storage unit 204 in response to a signal from the spinner controller 150. The supply amount determination unit 216 selects the chemical solution supply amount selected by the selection unit 212 and the chemical supply acquired by the supply amount acquisition unit 214. Based on the measured value of the supply amount, the supply amount is judged!

Therefore, the supply amount of the chemical solution can be switched to a desired value in accordance with an instruction from the spinner controller 150. Therefore, it is particularly suitable when it is necessary to change the supply amount of the chemical according to the content of the treatment. The spinner controller 150 may directly send the set value of the supply amount to the storage unit 204! /.

[0064] In addition, when the characteristics of the chemical liquid supplied via the supply line L1 greatly fluctuate due to chemical deterioration or chemical replenishment mistakes, the discharge time required to reach the set supply amount is reduced. It will change greatly compared to before the change. In this embodiment, the discharge time is acquired by the timer means 220.

[0065] Therefore, based on this discharge time, it is possible to easily detect alteration of the chemical solution, a chemical solution replenishment error, and the like. In addition, since the ejection time is recorded by the recording control means 226, manufacturing history management becomes easy, and the cause of the occurrence of defects can be easily pursued.

Furthermore, in the present embodiment, the storage unit 204 further stores an allowable discharge time range in association with the set value of the chemical supply amount, and the time determination unit 222 determines whether the discharge time is within the allowable range. The warning control means 224 generates a warning signal when it is determined that the discharge time is outside the allowable discharge time range!

[0067] This makes it possible to automatically detect and warn of a sudden change in the properties of the chemical solution such as when the chemical solution is altered or when a different type of chemical solution is supplied, so that manufacturing defects are particularly reduced.

[0068] The present invention is not limited to the above-described embodiment, and various modifications are possible.

[0069] For example, in the above embodiment, the spinner controller 150 includes the function of the spinner controller 150 in the force chemical supply management device 200 provided separately from the chemical supply management device 200, and the chemical supply management device 200 directly Control of the spinner 100 nozzle 112 and pump 110 may be performed.

Example

[0070] Subsequently, in the spinner 100 using the chemical solution supply management apparatus 200 according to the present embodiment, the measured value of the supply amount when the supply of the photoresist is repeatedly performed with the set value of the supply amount being lOmL is shown in FIG. Figure 3 shows the measured value of the photoresist supply amount when the photoresist is repeatedly supplied so that the valve open time is 5 seconds without using this chemical supply management device. Shown in 5. As shown in FIG. 5, in the conventional control, a large supply amount error occurs. However, when the chemical solution supply management apparatus according to the present embodiment is used, the supply amount is managed with extremely high accuracy.

Claims

The scope of the claims

[1] A chemical supply management device for managing a supply amount of a chemical supplied via a supply line to an object to be coated in a spinner,

Storage means for storing a preset value of the chemical supply amount;

The flow rate measuring means for measuring the flow rate of the chemical solution flowing through the supply line every hour, and the flow rate of the chemical solution obtained by the flow rate measuring unit is integrated to obtain the supply amount of the chemical solution supplied to the coated object. Based on the supply amount acquisition means for acquiring the actual measurement value, the actual measurement value of the chemical liquid supply amount acquired by the supply amount acquisition means, and the set value of the chemical liquid supply amount stored in the storage means, A supply amount determining means for determining whether or not a chemical solution supply amount supplied to the article to be coated through a supply line has reached a set value of the chemical solution supply amount;

When the supply amount determining means determines that the chemical supply amount supplied to the object to be coated via the supply line has reached the set value of the chemical supply amount, the supply amount determination means Supply stopping means for stopping the supply of the chemical solution;

A chemical supply management device.

[2] The storage means stores a plurality of set values of the chemical supply amount,

The chemical solution supply management device further includes:

In accordance with an external force signal, there is provided selection means for selecting any one of a plurality of set values of the chemical supply amount stored in the storage means,

2. The supply amount determination unit performs the determination based on a set value of the chemical solution supply amount selected by the selection unit and an actual measurement value of the chemical solution supply amount acquired by the supply amount acquisition unit. The chemical liquid supply management device according to 1.

[3] A discharge time from when the supply of the chemical liquid to the coated object through the supply line is started to when the supply of the chemical liquid to the coated object through the supply line is stopped is acquired. The chemical solution supply management device according to claim 1, further comprising a timer means.

4. The chemical liquid supply management apparatus according to claim 3, further comprising a recording control unit that records the ejection time in a recording unit. The storage means stores an allowable discharge time range in association with the set value of the chemical supply amount,

The chemical solution supply management device further includes:

Based on the discharge time acquired by the timer means and the allowable range of discharge time stored in the storage means, it is determined whether the discharge time acquired by the timer means is within the allowable range of the discharge time. Time judging means for judging,

The warning control means for generating a warning signal when the time determination means determines that the discharge time acquired by the timer means is outside the allowable range of the discharge time. 4. The chemical supply management device according to 4.