TW200606599A - Chemical liquid supply and control device - Google Patents

Chemical liquid supply and control device

Info

Publication number
TW200606599A
TW200606599A TW094121238A TW94121238A TW200606599A TW 200606599 A TW200606599 A TW 200606599A TW 094121238 A TW094121238 A TW 094121238A TW 94121238 A TW94121238 A TW 94121238A TW 200606599 A TW200606599 A TW 200606599A
Authority
TW
Taiwan
Prior art keywords
chemical liquid
supply
amount
set value
supply line
Prior art date
Application number
TW094121238A
Other languages
Chinese (zh)
Inventor
Kiyoshi Kamibayashi
Toshimichi Yamanaka
Kazuyuki Hashimoto
Masato Shimura
Shizuo Nachi
Original Assignee
Nagase & Co Ltd
Nagase Cms Technology Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nagase & Co Ltd, Nagase Cms Technology Co Ltd filed Critical Nagase & Co Ltd
Publication of TW200606599A publication Critical patent/TW200606599A/en

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/06—Control of flow characterised by the use of electric means
    • G05D7/0617—Control of flow characterised by the use of electric means specially adapted for fluid materials
    • G05D7/0629—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means
    • G05D7/0688—Control of flow characterised by the use of electric means specially adapted for fluid materials characterised by the type of regulator means by combined action on throttling means and flow sources
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/162—Coating on a rotating support, e.g. using a whirler or a spinner
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3021—Imagewise removal using liquid means from a wafer supported on a rotating chuck

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Automation & Control Theory (AREA)
  • Coating Apparatus (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Materials For Photolithography (AREA)

Abstract

A chemical liquid supply management device has a memory means (204) for memorizing a set value of a chemical liquid supply amount set in advance, a flow rate measurement means (202) for measuring by the hour the flow rate of a chemical liquid flowing in a supply line, a supply amount acquisition means (214) for acquiring, by accumulating the flow rate of the chemical liquid, an actual measurement value of the amount of the chemical liquid supplied to an object (104) to which the chemical liquid is to be applied, a supply amount determination means (216) for determining, based on the actual measurement value and the set value of the chemical liquid supply amount, whether or not the amount of the chemical liquid supplied to the object (104) through a supply line (L1) has reached the set value, and a supply stop means (218) for stopping the supply of the chemical liquid through the supply line when it is determined that the amount of the chemical liquid supplied to the object (104) through the supply line has reached the set value.
TW094121238A 2004-06-24 2005-06-24 Chemical liquid supply and control device TW200606599A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004186941A JP2006007075A (en) 2004-06-24 2004-06-24 Chemical liquid supply and control apparatus

Publications (1)

Publication Number Publication Date
TW200606599A true TW200606599A (en) 2006-02-16

Family

ID=35774893

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094121238A TW200606599A (en) 2004-06-24 2005-06-24 Chemical liquid supply and control device

Country Status (3)

Country Link
JP (1) JP2006007075A (en)
TW (1) TW200606599A (en)
WO (1) WO2006001343A1 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4863782B2 (en) * 2006-06-19 2012-01-25 東京応化工業株式会社 Treatment liquid supply device
JP6450650B2 (en) * 2015-06-16 2019-01-09 東京エレクトロン株式会社 Processing apparatus, processing method, and storage medium
JP6552680B2 (en) * 2018-05-30 2019-07-31 東京エレクトロン株式会社 Processing device, processing method and storage medium

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10216605A (en) * 1997-01-31 1998-08-18 Sony Corp Rotary coating device for chemical liquid
JP2000246164A (en) * 1999-03-02 2000-09-12 Sony Corp Resist coating device
JP3630650B2 (en) * 2001-07-31 2005-03-16 株式会社 日立インダストリイズ Paste applicator

Also Published As

Publication number Publication date
JP2006007075A (en) 2006-01-12
WO2006001343A1 (en) 2006-01-05

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