WO2005122660A1 - Aluminum substrate for printed circuits, manufacturing method thereof, printed circuit board, and manufacturing method thereof - Google Patents
Aluminum substrate for printed circuits, manufacturing method thereof, printed circuit board, and manufacturing method thereof Download PDFInfo
- Publication number
- WO2005122660A1 WO2005122660A1 PCT/JP2005/011104 JP2005011104W WO2005122660A1 WO 2005122660 A1 WO2005122660 A1 WO 2005122660A1 JP 2005011104 W JP2005011104 W JP 2005011104W WO 2005122660 A1 WO2005122660 A1 WO 2005122660A1
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- WO
- WIPO (PCT)
- Prior art keywords
- oxide layer
- aluminum plate
- aluminum
- manufacturing
- resin
- Prior art date
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Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/44—Manufacturing insulated metal core circuits or other insulated electrically conductive core circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
- H05K1/056—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an organic insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/03—Use of materials for the substrate
- H05K1/05—Insulated conductive substrates, e.g. insulated metal substrate
- H05K1/053—Insulated conductive substrates, e.g. insulated metal substrate the metal substrate being covered by an inorganic insulating layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0315—Oxidising metal
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
- H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
Definitions
- This invention relates to an aluminum substrate to be used as printed circuit boards , the manuf cturing method thereof , printed circuit boards and the manufacturing method thereof.
- the wording of "aluminum” denotes pure aluminum and its alloy.
- a printed circuit board a laminated board in which, for example, a copper base plate is laminated on an insulating layer of glass epoxy resin, is well known.
- aluminum alloy which is light in weight and excellent in thermal conductivity, as a printed circuit board to meet strong demands for enhanced heat radiation and weight saving due to recent high integration of electronic components.
- the aluminum substrate is subjected to sulfuric acid anodizing, oxalic acid anodizing, or sandblasting, to roughen the surface of the aluminum substrate to thereby improve the adhesiveness to the resin plate.
- sulfuric acid anodizing, oxalic acid anodizing, or sandblasting to roughen the surface of the aluminum substrate to thereby improve the adhesiveness to the resin plate.
- Patent document 2 and JP H01-312894, A (Patent document 3), it is known to form a framework structured oxide layer on a surface of an aluminum substrate by anodizing the aluminum substrate using phosphoric acid.
- the oxide layer forming method as disclosed by the aforementioned patent document 1 it is difficult to control the growing of the oxide layer with a high degree of accuracy since the phosphoric acid concentration of the electrolytic bath is high. Therefore, appropriate framework structure cannot be secured, resulting in unstable adhesiveness. Moreover, the method could lead to contamination due to the adhering phosphoric acid on the oxide layer. Furthermore, since the aluminumsubstrate is immersed in a phosphate solution to form the oxide layer, water content remains in the oxide layer, resulting in deterioration of adhesiveness of the oxide layer to the resin plate (insulating layer) .
- the oxide layer forming method as disclosed by the aforementioned patent document 2 it is difficult to control the growing of the oxide layer because of the high temperature electrolytic solution, resulting in unstable adhesiveness. Furthermore, in this oxide layer forming method too, in the same manner as the aforementioned patent document 1, since the aluminum substrate is immersed in a phosphate solution to form the oxide layer, water content remains in the oxide layer, resulting in deterioration of adhesiveness of the oxide layer to the resin plate (insulating layer).
- the oxide layer forming method as disclosed by the aforementioned patent document 3 it is possible to control the growing of the oxide layer with a high degree of accuracy, causing appropriate framework structure, which in turn can secure sufficient adhesion stability.
- this oxide layer forming method too, in the same manner as the aforementioned patent documents 1 and 2, since the aluminum substrate is immersed in a phosphate solution to form the oxide layer, water content remained in the oxide layer may cause deterioration of adhesiveness of the oxide layer to the resin plate (insulating layer).
- the present invention was made to solve the technical problems of the aforementioned prior arts, and aims to provide an aluminum substrate for printed circuits and the manufacturingmethod thereof capable of forming a preferable oxide layer with a high degree of accuracy, obtaining stable adhesiveness relative to a resin insulating material and improving adhesiveness to a resin insulating material. It also aims to provide a printed circuit substrate using the aforementioned aluminum substrate and the manufacturing method thereof .
- the present invention provides the following means .
- a method of manufacturing an aluminum substrate for printed circuits comprising: an oxide layer forming step for forming an anodic oxide layer on at least one surface of an aluminumplate byanodizing the aluminum plate in an electrolytic solution of phosphoric acid concentration :
- the aluminum substrate for printed circuits obtained by the manufacturingmethod of the present invention can secure sufficient adhesive strength to a resin insulating member when making the aluminum substrate adhere to the resin insulating member.
- phosphate anodizing is executed under the conditions specific to the present invention to form the oxide layer, which makes it possible to assuredly form an oxide layer of desired framework structure with larger pore diameters. Therefore, when a resin plate is thermally bondedon the oxide layerof the aluminumsubstrate, resincomponents of the resin plate can be deeply impregnated into pores of the oxide layer to be intricately-intertwined with cells of the oxide layer, resulting in stable and excellent adhesiveness.
- Al and inevitable impurities is used as the aluminum plate.
- the workability can be further improved, which in turn can further improve the product quality.
- a method of manufacturing an aluminum substrate for printed circuits comprising: an oxide layer forming step for forming an anodic oxide layer on at least one surface of an aluminumplate by anodizing the aluminum plate in an electrolytic solution of phosphoric acid concentration:
- An aluminum substrate for printed circuits manufactured by the manufacturing method as recited in any one of the aforementioned Items 1 to 10.
- the aluminum substrate for printed circuits according to this invention in the same manner as mentioned above, it is possible to manufacture an aluminum substrate having a preferable oxide layer and capable of securing stable adhesiveness to a resin insulating member and improving adhesiveness to the resin insulating member.
- the aluminum substrate for printed circuits in the same manner as mentioned above, it is possible to manufacture an aluminum substrate having a preferable oxide layer and capable of securing stable adhesiveness to a resin insulating member and improving adhesiveness to the resin insulating member.
- a method of manufacturing a laminated plate for printed circuits comprising: an oxide layer forming step for forming an anodic oxide layer on at least one surface of an aluminumplate byanodizing the aluminum plate at bath voltage of 10 V or above in an electrolytic solution ofphosphoric acidconcentration : 3 to 20mass% andbathtemperature :
- the pre-heating of the oxide layer is performed at 150 to 300 °C for 0.5 to 3 hours .
- the adhesiveness to a resin insulating member such as a resin plate as an insulting layer can be improved.
- the laminated plate for printed circuits manufactured by the method as recited in the aforementioned Item 13 or 14.
- the laminated plate for printed circuits according to this invention in the same manner as mentioned above , can have a preferable oxide layer, and is capable of securing stable adhesiveness to a resin insulating member and improving adhesiveness to the resin insulating member.
- a method of manufacturing a printed circuit board comprising: an oxide layer forming step for forming an anodic oxide layer on at least one surface of an aluminumplate byanodizing the aluminum plate in an electrolytic solution of phosphoric acid concentration:
- the oxide layer is performed at 150 to 300 °C for 0.5 to 3 hours.
- the printed circuit board manufactured by the manufacturing method as recited in any one of the aforementioned Items 18 to 22.
- the printed circuit board in the same manner as mentioned above, can have a preferable oxide layer, and is capable of securing stable adhesiveness to a resin insulating member and improving adhesiveness to the resin insulating member. Effects of the invention As mentioned above, according to the present invention, it is possible to form a preferable oxide film layer with a high degree of accuracy, secure stable adhesiveness to a resin insulating layer and improve adhesiveness to a resin insulating layer.
- Fig. 1 is a scanning electron microscope (SEM) photograph showing a surface of an oxide layer formed on an aluminum plate by a manufacturing method according to this invention
- Fig. 2 is an enlarged photograph showing the surface of the oxide layer shown in Fig. 1;
- Fig. 3 is a SEM photograph showing the cross-section of the oxide layer shown in Fig. 1 ;
- Fig.4 is a schematic view showing a part of the cross-section of the oxide layer shown in Fig. 1 ;
- Fig. 5 is a SEM photograph showing a surface of an oxide layer formed on an aluminum plate by a conventional manufacturing method
- Fig. 6 is an enlarged photograph showing the SEM photograph shown in Fig. 5;
- Fig. 7 is a SEM photograph showing the cross-section of the oxide layer shown in Fig. 5;
- Fig.8 is a schematic view showing a part of the cross-section of the oxide layer shown in Fig. 5;
- Fig. 9 is a SEM photograph showing a surface of an oxide layer formed on an aluminum plate by another conventional manufacturing method
- Fig.10 is an enlarged photograph showing the SEM photograph shown in Fig . 9 ;
- Fig. 11 is a SEM photograph showing the cross-section of the oxide layer shown in Fig. 9.
- a method of manufacturing an aluminum substrate for printed circuits according to the present invention includes an oxide layer forming step for forming an anodic oxide layer on at least one surface of an aluminum plate by anodizing the aluminum plate in an electrolytic solution of phosphoric acid concentration: 3 to
- the material of the aluminum plate although pure aluminum and aluminum alloy can be used, it is preferable to use aluminum alloy.
- aluminum alloy such as JIS A5052 alloy and Al-Mg-Si series alloy can be preferably used.
- Al-Mg-Si series alloy concretely, it is preferable to use aluminum alloy consisting essentially of Si: 0.2 to 0.8 mass%; Mg: 0.3 to 1 mass%; Fe: 0.5 mass or less; Cu: 0.5 mass% or less, at least one of Ti: 0.1 mass% or less and B:0.1 mass% or less , and the balance being Al and inevitable impurities .
- aluminum alloy whose electric conductivity is 55 to 60% (IACS).
- Al-Mg series alloy and Al-Mg-Si series alloy is excellent in workability, and can be most suitably used as an aluminum substrate for printed circuits due to its excellent thermal conductivity and strength.
- an aluminumplate is anodized in aphosphate electrolytic solution to form an anodic oxide layer on the resin-adhering surface of the aluminum plate.
- the phosphoric acid concentration of the electrolytic solution is preferably set to 3 to 20 mass%, more preferably 8 to 12 mass%. If the phosphoric acid concentration is excessively high, it is difficult to control the growing of the oxide layer with a high degree of accuracy, and therefore appropriate framework structure cannot be secured, resulting in unstable adhesiveness to a resin plate. Moreover, this could lead to contamination due to adhesion of phosphoric acid to the oxide layer. To the contrary, if the phosphoric acid concentration is too low, a sufficient oxide layer may not be formed, and therefore it is not preferable.
- the bath voltage for forming the oxide layer is set to 8 to 40 V, more preferably 10 to 15 V. If the bath temperature is less than 8 V, the oxide layer forming rate may deteriorate. To the contrary, if the bath voltage exceeds 40 V, the voltage control may become difficult .
- the electrolytic current DC (direct current), AC (alternative current), DC-AC superimposed current and square DC current can be preferably used.
- the thickness of the oxide layer In order to secure sufficient adhesiveness to a resin plate, it is preferable to adjust the thickness of the oxide layer to 0.01 to l ⁇ m.
- solution is preferably set to not less than 25°C but less than 40°C
- the inventor analyzed in detail the relationship between the bath temperature of the electrolytic solution and the structure of the oxide layer by conducting experiments.
- Fig. 1 is a scanning electron microscope (SEM) photograph showing the surface of the oxide layer formed on the aluminum plate.
- Fig. 2 is an enlarged photograph showing the surface of the oxide layer shown in Fig. 1, and
- Fig.3 is a SEM photograph showing the cross-section of the oxide layer shown in Fig. 1.
- Fig. 5 is a SEM photograph showing the surface of the oxide layer.
- Fig. 6 is an enlarged photograph showing the SEM photograph shown in Fig. 5
- Fig. 7 is a SEM photograph showing the cross-section of the oxide layer, and
- Fig. 8 is a schematic view showing a part of the cross-section of the oxide layer. Still another oxide layer was formed in the same manner as
- Fig. 9 is a SEM photograph showing the surface of the oxide layer formed on the aluminum plate.
- Fig. 10 is an enlarged photographshowingthe SEMphotograph, andFig.11 is a SEMphotograph showing the cross-section of the oxide layer.
- the oxide layer 1 formed at an appropriate bath temperature had porous or meshed structure with large and branched pores 2 , and relatively stable surface configuration. Accordingly, it is believed that, when heat-joining a resin insulating material, which will be mentioned later, on the oxide layer 1, the resin components were impregnated deeply in the pores 2 to be intricately-intertwined with cells of the oxide layer 1, resulting in enhanced adhesive strength.
- the pore 2 was small in diameter, extended almost linearly without being branched. Furthermore, the oxide layer 1 had meshed structure with needle-like sharp pointed ends. Accordingly, it is believed that, when heat-joining a resin insulating material on the oxide layer 1, the resin components could not be impregnated sufficiently in the pores 2 not to be intertwined with cells of the oxide layer 1, resulting in deteriorated adhesive strength. Furthermore, as shown in Figs. 9 to 11, in the case of the oxide layer 1 formed at low bath temperature, the oxide layer 1 had meshed structure with varies pore diameter and unevenly distributed pores. Accordingly, it is believed that, when heat-joining a resin insulating material mentioned later on the oxide layer 1, the resin components could not be impregnated in the pores 2 over the entire layer surface in a balanced manner, resulting in unstable adhesive strength.
- the oxide layer of the aluminum plate is heat-dried (pre-heated) , the water content absorbed by the oxide layer, especially the water content absorbed at the time of anodizing treatment is released to thereby obtain an aluminum substrate.
- the water content in the oxide layer of the aluminum plate is reduced by releasing it, the adverse effects due to the remaining water content at the time of heat-joining of a resin plate can be eliminated, resulting in sufficient joining strength of the resin plate.
- the heating temperature it is necessary to set the heating temperature to 150 to 300 °C.
- the preferable heating temperature is 200 to 250 °C. That is, if the heating temperature is excessively high, the oxide layer can be destroyed by the heat or the oxide layer can be cracked, which deteriorates the adhesiveness to a resin plate. To the contrary, if the heating temperature is too low, releasing of water content in the oxide layer cannot be sufficiently performed, causing deteriorated adhesiveness to a resin plate, and therefore it is not preferable.
- the heating time is 0.5 hour (30minutes) ormore.
- Theheating time is preferably set to 3 hours or less, more preferably 1 to 2 hours. That is, even if the heating time is set unnecessary long, corresponding effects cannot be expected. Rather, thismaycause increasedenergy loss anddeterioratedproductivity. To the contrary, if theheating time is too short, sufficient releasing of water content in the oxide layer cannot be performed, which causes deteriorated adhesiveness to a resin plate due to the effects of the remaining water content, and therefore it is not preferable. In the present invention, it is considered that when pre-heating the aluminum plate having an oxide layer (anodized
- the releasing of water content can also be effectively performed by setting the pre-heating temperature higher than the heating temperature at the time of joining (at the time of heat-forming) a resin insulating member and a metal circuit member, resulting in sufficient adhesiveness.
- the heating temperature at the pre-heating (heat-drying) step higher than the heating temperature at the joining step, the water content can be effectively released, resulting in excellent adhesiveness.
- a resin insulating member and a metal circuit member made of, e.g. , cupper are laminated on the pre-heat treated aluminum plate (aluminum substrate) to thereby form a printed circuit substrate.
- thermosetting resin or thermoplastic resin can be used as the material of the resin insulating material.
- thermosetting resin phenol resin, epoxy resin, unsaturated polyester resin and polyimide resin can be exemplified.
- thermoplastic resin cross-linked polyolefin resin, high-melting polyolefin resin, polyetherimide resin, polyethersulfone resin and fluorocarbon resin can be exemplified.
- the resin insulating member is laminated on the aluminum substrate in the form of a thermoforming plate, a thermoforming sheet or film, a prepreg or a coating film.
- paper, synthetic fiber fabric and glass fiber can be exemplified.
- glass fiber woven fabric and glass fiber non-woven fabric can be exemplified.
- a metal foil made of copper. aluminum or nickel can be used. It is preferable to mechanically or chemically roughen the joining surface of the metal circuit member to be joined to the insulating layer to improve the adhesiveness .
- the followingmethod can be exemplified.
- a resin plate or a prepreg as an insulatingmember is disposedon the oxide layer of the aluminum substrate in a laminated manner.
- a copper foil as a circuit member is superimposed on the insulating member. With this state, these members are heated under pressure to thereby join the insulating layer and the circuit member on the aluminum substrate.
- the heating temperature is set to 150 to 230 °C
- heating time is set to 30 minutes to 3 hours, more preferably 1 to 2 hours.
- the printed circuit board according to the present invention can be formed.
- the adhesive strength of the resin plate (insulating layer) to the aluminum substrate can be secured at sufficiently high level.
- phosphate anodizing is executed under the conditions specific to the present invention to form the oxide layer on the aluminumsubstrate , whichmakes it possible to assuredly form an oxide layer of desired framework structure with larger pore diameters, as shown in Figs .1 to 4. Therefore, when the resin plate is thermallybondedontheoxide layerof thealuminumsubstrate, resin components of the resin plate can be deeply impregnated into pores of the oxide layer to be intricately-intertwined with cells of the oxide layer, resulting in stable and excellent adhesiveness.
- the water content of the oxide layer is released by heating the oxide layer of the aluminum substrate, whenmaking the aluminum substrate adhere to the resin plate, it is possible to prevent deterioration of adhesiveness to the resin plate due to adverse influences of the remained water content in the oxide layer, which in turn can further improve the adhesiveness.
- Example 1 An aluminum plate (100 mm x 100 mm x 1 mm) made of Al-Mg-Si series alloy (Si: 0.5 mass%, Mg: 0.5 mass%, the balance being Al and inevitable impurities) was prepared. As shown in Table 1, the aluminum plate was anodized at voltage of DC 12 V in an electrolytic solution of phosphoric acid concentration: 10mass% and bath temperature: 30 °C, to thereby form an anodic oxide layer 0.5 ⁇ m thick on the surface of the aluminum plate. Subsequently, this aluminum plate with the oxide layer was pre-heated at 200°C for 1 hour to release the water content in the oxide layer. Thereafter, on the surface (oxide layer surface) of the heat-dried aluminum plate, an epoxy resin plate was superimposed. Furthermore, on the resin plate, a copper foil 70 ⁇ m thick with a roughened lower surface was superimposed. With this state , these
- Example 1 a printed circuit board in which the insulating layer and the circuit layer were integrally laminated on the aluminum substrate.
- Example 2 An aluminum plate (100 mm x 100 mm x 1 mm) made of Al-Mg-Si series alloy (Si: 0.5 mass%, Mg: 0.5 mass%, the balance being Al and inevitable impurities) was prepared. As shown in Table 1, the aluminum plate was anodized at voltage of DC 12 V in an electrolytic solution of phosphoric acid concentration: 10 mass% and bath
- Example 3 An aluminum plate (100 mm x 100 mm x 1 mm) made of Al-Mg-Si series alloy (Si: 0.5 mass%, Mg: 0.5 mass%, the balance being Al and inevitable impurities) was prepared. As shown in Table 1, the aluminum plate was anodized at voltage of DC 12 V in an electrolytic solution of phosphoric acid concentration: 10 mass% and bath
- Example 3 An epoxy resin plate and a copper foil were made to adhere on the surface of theheat-driedaluminumplate , to therebyobtain aprinted circuit board (Example 3).
- Example 4 An aluminum plate (100 mm x 100 mm x 1 mm) made of Al-Mg-Si series alloy (Si: 0.5 mass%, Mg: 0.5 mass%, the balance being Al and inevitable impurities) was prepared. As shown in Table 1, the aluminum plate was anodized at voltage of DC 12 V in an electrolytic solution of phosphoric acid concentration: 5 mass% and bath
- Example 4 an epoxy resin plate and a copper foil were made to adhere on the surface of theheat-driedaluminumplate, to therebyobtain aprinted circuit board (Example 4).
- Example 5 An aluminum plate (100 mm x 100 mm x 1 mm) made of Al-Mg-Si series alloy (Si: 0.5 mass%, Mg: 0.5 mass%, the balance being Al and inevitable impurities) was prepared. As shown in Table 1, the aluminum plate was anodized at voltage of DC 12 V in an electrolytic solution of phosphoric acid concentration: 19 mass% and bath
- Example 5 a printed circuit board
- Example 6 An aluminum plate (100 mm x 100 mm x 1 mm) made of Al-Mg-Si series alloy (Si: 0.5 mass%, Mg: 0.5 mass%, the balance being Al and inevitable impurities) was prepared. As shown in Table 1, the aluminum plate was anodized at voltage of DC 12 V in an electrolytic solution of phosphoric acid concentration: 10 mass% and bath
- Example 6 a printed circuit board
- Example 7 An aluminum plate (100 mm x 100 mm x 1 mm) made of Al-Mg-Si series alloy (Si: 0.5 mass%, Mg: 0.5 mass%, the balance being Al and inevitable impurities) was prepared. As shown in Table 1, the aluminum plate was anodized at voltage of DC 12 V in an electrolytic solution of phosphoric acid concentration: 15 mass% and bath
- Example 7 An epoxy resin plate and a copper foil were made to adhere on the surface of the heat-dried aluminum plate, to thereby obtain a printed circuit board (Example 7).
- Themethodofmanufacturinganaluminumsubstrate forprinted circuit boards according to the present invention can be preferably utilized when manufacturing a printed circuit board to be used as anelectriccircuit boardforvarious electronicproducts . Among other things, it can be utilized when manufacturing an aluminum substrate for such printed circuit boards .
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- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- Insulated Metal Substrates For Printed Circuits (AREA)
- Laminated Bodies (AREA)
Abstract
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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US11/628,991 US20080283408A1 (en) | 2004-06-10 | 2005-06-10 | Aluminum Substrate for Printed Circuits, Manufacturing Method Thereof, Printed Circuit Board, and Manufacturing Method Thereof |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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JP2004-172607 | 2004-06-10 | ||
JP2004172607 | 2004-06-10 | ||
US58037204P | 2004-06-18 | 2004-06-18 | |
US60/580,372 | 2004-06-18 |
Publications (1)
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WO2005122660A1 true WO2005122660A1 (en) | 2005-12-22 |
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PCT/JP2005/011104 WO2005122660A1 (en) | 2004-06-10 | 2005-06-10 | Aluminum substrate for printed circuits, manufacturing method thereof, printed circuit board, and manufacturing method thereof |
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US (1) | US20080283408A1 (en) |
WO (1) | WO2005122660A1 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2007091976A1 (en) * | 2006-02-10 | 2007-08-16 | Opulent Electronics International Pte Ltd | Anodised aluminium, dielectric, and method |
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EP2362432B1 (en) * | 2010-02-25 | 2017-06-07 | Saint-Augustin Canada Electric Inc. | Solar cell assembly |
JP2013211523A (en) | 2012-03-02 | 2013-10-10 | Canon Components Inc | Flexible circuit board |
WO2014158767A1 (en) | 2013-03-14 | 2014-10-02 | Applied Materials, Inc. | High purity aluminum top coat on substrate |
US9624593B2 (en) * | 2013-08-29 | 2017-04-18 | Applied Materials, Inc. | Anodization architecture for electro-plate adhesion |
US9663870B2 (en) | 2013-11-13 | 2017-05-30 | Applied Materials, Inc. | High purity metallic top coat for semiconductor manufacturing components |
DE212014000273U1 (en) | 2014-08-29 | 2017-04-26 | Apple Inc. | Process for reducing the spallation of anodic oxide layers of high strength substrate alloys |
WO2016111693A1 (en) * | 2015-01-09 | 2016-07-14 | Apple Inc. | Processes to reduce interfacial enrichment of alloying elements under anodic oxide films and improve anodized appearance of heat treatable alloys |
US9869623B2 (en) | 2015-04-03 | 2018-01-16 | Apple Inc. | Process for evaluation of delamination-resistance of hard coatings on metal substrates |
US10760176B2 (en) | 2015-07-09 | 2020-09-01 | Apple Inc. | Process for reducing nickel leach rates for nickel acetate sealed anodic oxide coatings |
US10711363B2 (en) | 2015-09-24 | 2020-07-14 | Apple Inc. | Anodic oxide based composite coatings of augmented thermal expansivity to eliminate thermally induced crazing |
US9970080B2 (en) | 2015-09-24 | 2018-05-15 | Apple Inc. | Micro-alloying to mitigate the slight discoloration resulting from entrained metal in anodized aluminum surface finishes |
US10174436B2 (en) | 2016-04-06 | 2019-01-08 | Apple Inc. | Process for enhanced corrosion protection of anodized aluminum |
US11352708B2 (en) | 2016-08-10 | 2022-06-07 | Apple Inc. | Colored multilayer oxide coatings |
US11242614B2 (en) | 2017-02-17 | 2022-02-08 | Apple Inc. | Oxide coatings for providing corrosion resistance on parts with edges and convex features |
US11549191B2 (en) | 2018-09-10 | 2023-01-10 | Apple Inc. | Corrosion resistance for anodized parts having convex surface features |
CN113141712A (en) * | 2021-03-23 | 2021-07-20 | 江门市奔力达电路有限公司 | Method for manufacturing double-sided aluminum substrate |
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JPH05175654A (en) * | 1991-12-26 | 1993-07-13 | Yokohama Rubber Co Ltd:The | Surface treating method for printed wiring board |
JPH0874091A (en) * | 1994-09-02 | 1996-03-19 | Kobe Steel Ltd | Manufacture of vacuum chamber made of al or al alloy |
JP2003003295A (en) * | 2001-06-25 | 2003-01-08 | Aisin Keikinzoku Co Ltd | Surface treatment method for aluminum alloy |
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US4492730A (en) * | 1982-03-26 | 1985-01-08 | Showa Denko Kabushiki Kaisha | Substrate of printed circuit |
JP3495263B2 (en) * | 1998-09-16 | 2004-02-09 | 昭和電工株式会社 | Method for producing Al-Mg-Si alloy sheet excellent in thermal conductivity and strength |
-
2005
- 2005-06-10 US US11/628,991 patent/US20080283408A1/en not_active Abandoned
- 2005-06-10 WO PCT/JP2005/011104 patent/WO2005122660A1/en active Application Filing
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JPS57181196A (en) * | 1981-05-01 | 1982-11-08 | Sumitomo Electric Industries | Method of producing metal core circuit board |
JPH05175654A (en) * | 1991-12-26 | 1993-07-13 | Yokohama Rubber Co Ltd:The | Surface treating method for printed wiring board |
JPH0874091A (en) * | 1994-09-02 | 1996-03-19 | Kobe Steel Ltd | Manufacture of vacuum chamber made of al or al alloy |
JP2003003295A (en) * | 2001-06-25 | 2003-01-08 | Aisin Keikinzoku Co Ltd | Surface treatment method for aluminum alloy |
JP2003328187A (en) * | 2002-05-17 | 2003-11-19 | Nippon Light Metal Co Ltd | Surface treatment method of aluminum material |
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WO2007091976A1 (en) * | 2006-02-10 | 2007-08-16 | Opulent Electronics International Pte Ltd | Anodised aluminium, dielectric, and method |
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US20080283408A1 (en) | 2008-11-20 |
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