WO2005121390A1 - 合成樹脂成形物表面における有機化合物の吸着抑制方法 - Google Patents
合成樹脂成形物表面における有機化合物の吸着抑制方法 Download PDFInfo
- Publication number
- WO2005121390A1 WO2005121390A1 PCT/JP2005/010457 JP2005010457W WO2005121390A1 WO 2005121390 A1 WO2005121390 A1 WO 2005121390A1 JP 2005010457 W JP2005010457 W JP 2005010457W WO 2005121390 A1 WO2005121390 A1 WO 2005121390A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- synthetic resin
- thin film
- container
- adsorption
- plasma
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
- C23C14/083—Oxides of refractory metals or yttrium
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/10—Glass or silica
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/20—Metallic material, boron or silicon on organic substrates
Definitions
- the present invention provides a synthetic resin of an organic compound, characterized in that a thin film layer of metal, silicon or their oxides is formed on the surface of a synthetic resin molded product such as a container by a thin film forming technique using plasma.
- the present invention relates to a method for suppressing adsorption to a molded product.
- Synthetic resins are easily used in molding, are excellent in impact resistance, are lightweight and safe, and are therefore widely used as materials for various molded articles such as containers.
- the synthetic resin molded article has a property that an organic compound is adsorbed on its surface, there are various restrictions in using the organic compound in direct contact with the organic compound. Therefore, attempts have been made to suppress the adsorption of organic compounds by modifying the surface of the synthetic resin.
- a plasma etching technique is known. This technique is characterized by homogenizing the surface of the synthetic resin by plasma treatment.However, it is possible to modify the surface structure of the synthetic resin even at a low temperature. It has been described that plasma irradiation of a copolymer plate in an argon gas atmosphere improves the hydrophilicity of its surface and suppresses the adsorption of insulin. It is described that when the rate plate is subjected to plasma treatment in an argon gas atmosphere to make it hydrophilic, proteins such as lysozyme, anolebumin, and ⁇ _ globulin in artificial tears can be suppressed from being adsorbed on the surface of the polymethacrylate plate. Have been.
- methods for forming a thin film of metal or metal oxide on the surface of a synthetic resin molded article by a thin film forming technique using plasma include sputtering, ion plating, plasma-enhanced chemical vapor deposition, and the like. There are arc ion plating, hollow sword vapor deposition, etc.Resin containers using these technologies to form thin films of metals and metal oxides have excellent permeability to oxygen and other gases. Is known.
- Patent Document 1 discloses forming a Si ⁇ film on the surface of a synthetic resin container such as polyethylene terephthalate (PET) or polyethylene ( ⁇ ) using a special ionization coating method. It describes that the gas permeability is reduced to prevent oxidation of the contents.
- Patent Document 2 discloses that a gas barrier property for oxygen and the like is improved by subjecting a ceramic thin film layer containing silicon oxide as a main component to plasma chemical vapor deposition on an inner surface or an outer surface of a plastic molded article made of an ethylene polypropylene random copolymer. It is described. All of the above-mentioned prior art documents aim at protecting the contents by blocking the intrusion of gas such as oxygen into the container. There is no description about the suppression of adsorption of organic compounds by forming a thin film layer by using it, and it goes without saying that it is also suggested.
- Patent Document 1 JP-A-60-2443
- Patent Document 2 JP 2001-261866 A
- Non-patent Document 1 Pharmaceutical Journal 119 (12) 929-935, 1999
- Non-Patent Document 2 Chem. Pharm. Bull. 42 (9) 1896-1901, 1994
- the synthetic resin can be more effectively used.
- a plasma etching technique described in the background art.
- the plasma etching technique is a simple and useful method, radicals generated at the cross-linking site and the graft site on the surface of the synthetic resin molded product may cause a secondary reaction with oxygen in the air, etc.
- Development of a method for suppressing adsorption of organic compounds has been desired.
- Synthetic resins are used for various purposes, and are also used in aqueous liquid containers such as eye drops.
- aqueous liquid containers such as eye drops.
- organic compounds such as drugs and preservatives in the ophthalmic solution stored in the container are adsorbed on the inner surface of the container, a change in the concentration of the organic compound in the ophthalmic solution occurs and quality assurance can be achieved. Therefore, it is important to suppress the decrease in the content of organic compounds in eye drops.
- the inventors of the present invention have made intensive studies to solve the above-mentioned problems, and found that a thin film layer of metal, silicon or their oxides was formed on a synthetic resin molded product by a thin film forming technique using plasma. Then, they found that adsorption of an organic compound to the resin could be effectively suppressed, and the present invention was reached.
- a method for suppressing adsorption of organic compounds to the inner surface of a container characterized by forming a thin film layer of metal, silicon or their oxides on the inner surface of a synthetic resin container by a thin film forming technique using plasma,
- polyolefin resin is S, polyethylene resin, polypropylene resin or polyethylene terephthalate resin.
- An organic compound is formed into a synthetic resin molded product by forming a thin film layer of metal, silicon or their oxides on the surface of the synthetic resin molded product by a thin film forming technique using plasma. Synthetic resin molded products with excellent adsorption suppression,
- the kind of the synthetic resin is not particularly limited, and examples thereof include a polyolefin resin, a polystyrene resin, and a polyester resin, and a polyolefin resin is preferable.
- the polyolefin resin include polyethylene resin (PE), polypropylene resin (PP), polyethylene terephthalate resin (PET), polyvinyl chloride resin (PVC), and more preferably polyethylene resin (PE) and polypropylene resin. (PP) and polyethylene terephthalate resin (PET). These resins may be a homopolymer or a copolymer.
- the synthetic resin container of the present invention is not particularly limited as long as it is a container capable of storing an aqueous solution, and examples thereof include an eyedropper container and a pet bottle.
- the method for suppressing the adsorption of organic compounds to synthetic resin molded articles by the thin film forming technique using plasma of the present invention is suitable for suppressing the adsorption of trace amounts of organic compounds in aqueous liquid preparations, and is therefore useful in gene research and the like. It can also be used for biochips for analysis technology.
- the thin film forming technology using plasma is a technology for forming a thin film layer of metal, silicon or their oxides on the surface of a synthetic resin molded product by plasma irradiation.
- Technologies for Films and Coatings NOYES PUBLICATIONS, 1982, pp170-243, NOYES PUBLICATIONS, 1990, pp160-182, etc., ion plating (HANDBOOK OF PLASMA PROCESSI NG TECHNOLOGY, NOYES PUBLICATIONS, 1990, ⁇ 338_355), plasma chemical vapor deposition (Deposition Technologies for Films and Coatings, NOYES PUBLICATI ⁇ NS, 1982, pp365-384), arc ion plating (HANDBOOK OF PLASMA PROCESSING TECHNOLOGY, NOYES PUBLICATIONS, 1990, pp419-446) ), Hollow force sword deposition (HANDBOOK OF PLASMA PROCESSING TECHNOLOGY, N ⁇ Y ES PUBLICATION
- Examples of the metal, silicon or their oxides include Ti, Si, Ta, Al, Ni, Cr, Ag, S Examples thereof include n, Hf, Nb, TiO, SiO, SiO, and Al 2 O, and more preferably Ti, Ag, Ti ⁇ , and SiO.
- the thickness (average thickness) of the thin film layer of metal, silicon or their oxide is preferably 1 ⁇ m or less, more preferably 0.1 to 500 nm, and most preferably:! To 100 nm.
- the thin film layer effectively suppresses the adsorption of the organic compound to the surface of the synthetic resin molded product even in such a thin layer.
- a multi-layered thin film layer of metal, silicon or their oxides can be formed, whereby the adsorption suppressing effect can be further improved.
- An example of the two-layer thin film layer is a layer in which an Ag layer is formed on a TiO layer by vapor deposition.
- the synthetic resin container according to the present invention generally stores an organic compound in the form of a solution or suspension.
- the organic compound having a property of being adsorbed on the inner surface of the container include vitamins such as vitamin E, local anesthetics such as dibuforcein hydrochloride, steroids such as fluorometholone, betamethasone, and triamcinolone, and prostaglandin derivatives such as latanoprost.
- Drugs such as peptides and proteins such as cyclosporine, lysozyme, anolebumin, and ⁇ -globulin, and various additives such as preservatives and surfactants that are acceptable for pharmaceuticals, foods, beverages, and the like.
- the preservative include a paraben preservative such as butyl paraoxybenzoate and a quaternary ammonium preservative such as benzanolone chloride.
- the synthetic resin container of the present invention is an ophthalmic container
- a thin film made of a desired metal such as Ti, Ag, TiO, SiO, silicon or an oxide thereof is formed on the inner surface of the ophthalmic container by using a sputtering technique.
- a layer is formed.
- the thickness of the thin film layer on the inner surface of the ophthalmic container is not particularly limited, and may be determined in consideration of the characteristics of the organic compound contained in the ophthalmic solution, the type of the thin film, and the like.
- a thin film layer of metal, silicon or their oxides is formed on the surface of a synthetic resin molded article or the inner surface of a synthetic resin container by a thin film forming technique using plasma, the surface of the synthetic resin molded article or the synthetic resin Adsorption of the organic compound on the inner surface of the container can be effectively suppressed.
- the force described in detail in the section on adsorption suppression test below When a thin film layer of Ti, Ag, TiO, and SiO was formed on the resin, the reduction of the organic compound content was significantly suppressed in all cases.
- Persistence Vitamin E content at measurement / Vitamin E content before immersion X 100
- Figure 1 shows the change in the residual ratio of vitamin E (average value of three times) at each film thickness.
- the PE piece treated with the Ti sputtering thin film has excellent vitamin E adsorption suppression. Indicates for production.
- Test Example 2 [Adsorption suppression test of dib-hydrochloric acid force using a resin piece on which Ti was plasma-deposited]
- Residual rate content of dibu-hydrochloric acid at measurement / content of dibu-hydrochloric acid before immersion X 100
- Table 1 shows the change in the residual ratio of dibu-hydrochloric acid hydrochloride (average value of three times).
- the PE piece treated with the Ti sputtering thin film has an excellent dib hydrochloride force-in adsorption suppressing action.
- Table 2 shows the residual ratio of vitamin E at each film thickness (average value of three times).
- TiO sputtered thin film-treated PE pieces have excellent vitamin E adsorption.
- the residual ratio of vitamin E was calculated by the calculation formula shown in Test Example 1.
- Table 3 shows the residual ratio of vitamin E at each film thickness (average value of three times).
- the PE piece treated with the Ag sputtering thin film shows an excellent vitamin E adsorption suppression effect.
- Si which is the target material
- Si discharge power: 40 W
- Si which is the target material
- a thin film treated PE piece was obtained.
- a plurality of glass bottles each containing 120 mL of a test solution containing 0.002% butyl paraoxybenzoate (w / v) were prepared.
- the E pieces were immersed in test solutions in separate glass bottles three by three, and stored under the conditions of 40 ° C and 75% RH.
- the content of butyl paraoxybenzoate was measured using a high performance liquid chromatograph at 0 (before immersion in the PE piece) and after 84 days. [0040]
- the residual ratio of butyl paraoxybenzoate was calculated by the following formula.
- Residual rate content of butyl paraoxybenzoate at the time of measurement / content of butyl paraoxybenzoate before immersion X I 00
- Table 4 shows the residual ratio of butyl para-oxybenzoate (average of three times).
- FIG. 1 is a graph showing the results of an adsorption suppression test (change in the residual ratio of vitamin E) using a PE piece treated with a Ti sputtering thin film.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Details Of Rigid Or Semi-Rigid Containers (AREA)
- Physical Vapour Deposition (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004169651 | 2004-06-08 | ||
| JP2004-169651 | 2004-06-08 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| WO2005121390A1 true WO2005121390A1 (ja) | 2005-12-22 |
Family
ID=35503079
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| PCT/JP2005/010457 Ceased WO2005121390A1 (ja) | 2004-06-08 | 2005-06-08 | 合成樹脂成形物表面における有機化合物の吸着抑制方法 |
Country Status (1)
| Country | Link |
|---|---|
| WO (1) | WO2005121390A1 (ja) |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002370722A (ja) * | 2001-06-19 | 2002-12-24 | Toppan Printing Co Ltd | バリア容器 |
| JP2003104352A (ja) * | 2001-09-28 | 2003-04-09 | Toppan Printing Co Ltd | バリア性プラスチック容器 |
| JP2003138377A (ja) * | 2001-10-31 | 2003-05-14 | Toppan Printing Co Ltd | プラスチック容器への薄膜成膜方法 |
-
2005
- 2005-06-08 WO PCT/JP2005/010457 patent/WO2005121390A1/ja not_active Ceased
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002370722A (ja) * | 2001-06-19 | 2002-12-24 | Toppan Printing Co Ltd | バリア容器 |
| JP2003104352A (ja) * | 2001-09-28 | 2003-04-09 | Toppan Printing Co Ltd | バリア性プラスチック容器 |
| JP2003138377A (ja) * | 2001-10-31 | 2003-05-14 | Toppan Printing Co Ltd | プラスチック容器への薄膜成膜方法 |
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