WO2005057607A3 - Plasmaquelle zur erzeugung eines induktiv gekoppelten plasmas - Google Patents

Plasmaquelle zur erzeugung eines induktiv gekoppelten plasmas Download PDF

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Publication number
WO2005057607A3
WO2005057607A3 PCT/DE2004/002764 DE2004002764W WO2005057607A3 WO 2005057607 A3 WO2005057607 A3 WO 2005057607A3 DE 2004002764 W DE2004002764 W DE 2004002764W WO 2005057607 A3 WO2005057607 A3 WO 2005057607A3
Authority
WO
WIPO (PCT)
Prior art keywords
inductively coupled
plasma
producing
coupled plasma
arrangement
Prior art date
Application number
PCT/DE2004/002764
Other languages
English (en)
French (fr)
Other versions
WO2005057607A2 (de
Inventor
Joachim Mai
Original Assignee
Roth & Rau Ag
Joachim Mai
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=34672723&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO2005057607(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Roth & Rau Ag, Joachim Mai filed Critical Roth & Rau Ag
Publication of WO2005057607A2 publication Critical patent/WO2005057607A2/de
Publication of WO2005057607A3 publication Critical patent/WO2005057607A3/de

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)

Abstract

Die Erfindung betrifft eine Plasmaquelle zur Erzeugung eines induktiv gekoppelten Plasmas mit mindestens einer Erregerspule (1) zur Erzeugung eines veränderlichen magnetischen Flusses und mit einer magnetischen Polschuhanordnung (2), bei der die Erregerspule (1) in Nuten in der Polschuhanordnung (2) angeordnet ist, derart dass das induktiv gekoppelte Plasma vor der magnetischen Polschuhanordnung (2) und innerhalb einer Vakuumkammer erzeugt wird. Die Plasmaquelle weist mindestens eine Multipolmagnetanordnung (8, 9) auf, derart dass sich das Magnetfeld der Multipolmagnetanordnung (8, 9) mit dem induktiv gekoppelten Plasma überlagert.
PCT/DE2004/002764 2003-12-13 2004-12-13 Plasmaquelle zur erzeugung eines induktiv gekoppelten plasmas WO2005057607A2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10358505.2 2003-12-13
DE10358505A DE10358505B4 (de) 2003-12-13 2003-12-13 Plasmaquelle zur Erzeugung eines induktiv gekoppelten Plasmas

Publications (2)

Publication Number Publication Date
WO2005057607A2 WO2005057607A2 (de) 2005-06-23
WO2005057607A3 true WO2005057607A3 (de) 2005-11-17

Family

ID=34672723

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/DE2004/002764 WO2005057607A2 (de) 2003-12-13 2004-12-13 Plasmaquelle zur erzeugung eines induktiv gekoppelten plasmas

Country Status (2)

Country Link
DE (1) DE10358505B4 (de)
WO (1) WO2005057607A2 (de)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2087778A4 (de) * 2006-08-22 2010-11-17 Mattson Tech Inc Induktive plasmaquelle mit hohem koppelwirkungsgrad
US8992725B2 (en) 2006-08-28 2015-03-31 Mattson Technology, Inc. Plasma reactor with inductie excitation of plasma and efficient removal of heat from the excitation coil
EP2849204B1 (de) 2013-09-12 2017-11-29 Meyer Burger (Germany) AG Plasmaerzeugungsvorrichtung
CN109496050A (zh) * 2019-01-03 2019-03-19 厦门大学 一种分层等离子体产生装置
DE102019213591A1 (de) * 2019-09-06 2021-03-11 Singulus Technologies Ag Behandlungsanlage und plasmabehandlungsverfahren

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0379828A2 (de) * 1989-01-25 1990-08-01 International Business Machines Corporation Radiofrequenzinduktion/Mehrpolplasma-Bearbeitungsvorrichtung
JPH06290943A (ja) * 1993-04-02 1994-10-18 Sankyo Seiki Mfg Co Ltd 着磁ヘッド
DE19606375A1 (de) * 1996-02-21 1997-08-28 Balzers Prozes Systeme Gmbh Plasmaquelle mit eingekoppelten Whistler- oder Helikonwellen
EP0908923A2 (de) * 1997-10-10 1999-04-14 European Community Verfahren und Vorrichtung zur Erzeugung eines ausgedehnten Induktionsplasmas für Plasmabehandlungen
EP1253216A1 (de) * 2001-04-27 2002-10-30 European Community (EC) Verfahren und Vorrichtung zur sequentiellen Plasmabehandlung
JP2003188153A (ja) * 2001-12-19 2003-07-04 Shimadzu Corp 誘導結合型プラズマ生成装置およびプラズマ処理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02194171A (ja) * 1989-01-20 1990-07-31 Ulvac Corp マグネトロンスパッタリング源
IT1269413B (it) * 1994-10-21 1997-04-01 Proel Tecnologie Spa Sorgente di plasma a radiofrequenza
JP2929275B2 (ja) * 1996-10-16 1999-08-03 株式会社アドテック 透磁コアを有する誘導結合型−平面状プラズマの発生装置
EP0908921A1 (de) * 1997-10-10 1999-04-14 European Community Bearbeitungskammer zur Plasma gesteigerte chemischen Dampfphasenabscheidung und diese Bearbeitungskammer benutzende Vorrichtung

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0379828A2 (de) * 1989-01-25 1990-08-01 International Business Machines Corporation Radiofrequenzinduktion/Mehrpolplasma-Bearbeitungsvorrichtung
JPH06290943A (ja) * 1993-04-02 1994-10-18 Sankyo Seiki Mfg Co Ltd 着磁ヘッド
DE19606375A1 (de) * 1996-02-21 1997-08-28 Balzers Prozes Systeme Gmbh Plasmaquelle mit eingekoppelten Whistler- oder Helikonwellen
EP0908923A2 (de) * 1997-10-10 1999-04-14 European Community Verfahren und Vorrichtung zur Erzeugung eines ausgedehnten Induktionsplasmas für Plasmabehandlungen
EP1253216A1 (de) * 2001-04-27 2002-10-30 European Community (EC) Verfahren und Vorrichtung zur sequentiellen Plasmabehandlung
JP2003188153A (ja) * 2001-12-19 2003-07-04 Shimadzu Corp 誘導結合型プラズマ生成装置およびプラズマ処理装置

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
GODYAK V A ET AL: "Experimental setup and electrical characteristics of an inductively coupled plasma", JOURNAL OF APPLIED PHYSICS, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 85, no. 2, 15 January 1999 (1999-01-15), pages 703 - 712, XP012046578, ISSN: 0021-8979 *
MEZIANI T ET AL: "Design of a magnetic-pole enhanced inductively coupled plasma source", PLASMA SOURCES SCIENCE AND TECHNOLOGY, IOP PUBLISHING LTD, XX, vol. 10, no. 2, May 2001 (2001-05-01), pages 276 - 283, XP002331669, ISSN: 0963-0252 *
PATENT ABSTRACTS OF JAPAN vol. 1995, no. 01 28 February 1995 (1995-02-28) *
PATENT ABSTRACTS OF JAPAN vol. 2003, no. 11 5 November 2003 (2003-11-05) *

Also Published As

Publication number Publication date
DE10358505B4 (de) 2007-10-11
WO2005057607A2 (de) 2005-06-23
DE10358505A1 (de) 2005-07-14

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