WO2007002455A3 - Helicon plasma source with permanent magnets - Google Patents

Helicon plasma source with permanent magnets Download PDF

Info

Publication number
WO2007002455A3
WO2007002455A3 PCT/US2006/024565 US2006024565W WO2007002455A3 WO 2007002455 A3 WO2007002455 A3 WO 2007002455A3 US 2006024565 W US2006024565 W US 2006024565W WO 2007002455 A3 WO2007002455 A3 WO 2007002455A3
Authority
WO
WIPO (PCT)
Prior art keywords
plasma source
discharge tube
permanent magnets
helicon plasma
permanent magnet
Prior art date
Application number
PCT/US2006/024565
Other languages
French (fr)
Other versions
WO2007002455A2 (en
Inventor
Francis F Chen
Original Assignee
Univ California
Francis F Chen
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Univ California, Francis F Chen filed Critical Univ California
Publication of WO2007002455A2 publication Critical patent/WO2007002455A2/en
Priority to US12/003,330 priority Critical patent/US8179050B2/en
Publication of WO2007002455A3 publication Critical patent/WO2007002455A3/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)

Abstract

A helicon plasma source has a discharge tube, a radio frequency antenna disposed proximate the discharge tube, and a permanent magnet positioned with respect to the discharge tube so that the discharge tube is in a far-field region of a magnetic field produced by the permanent magnet.
PCT/US2006/024565 2005-06-23 2006-06-23 Helicon plasma source with permanent magnets WO2007002455A2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
US12/003,330 US8179050B2 (en) 2005-06-23 2007-12-21 Helicon plasma source with permanent magnets

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US69305405P 2005-06-23 2005-06-23
US60/693,054 2005-06-23
US80150106P 2006-05-18 2006-05-18
US60/801,501 2006-05-18

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US12/003,330 Continuation-In-Part US8179050B2 (en) 2005-06-23 2007-12-21 Helicon plasma source with permanent magnets

Publications (2)

Publication Number Publication Date
WO2007002455A2 WO2007002455A2 (en) 2007-01-04
WO2007002455A3 true WO2007002455A3 (en) 2008-08-07

Family

ID=37595889

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2006/024565 WO2007002455A2 (en) 2005-06-23 2006-06-23 Helicon plasma source with permanent magnets

Country Status (1)

Country Link
WO (1) WO2007002455A2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103843465A (en) * 2011-10-13 2014-06-04 韩国科学技术院 Plasma apparatus and substrate-processing apparatus

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU2494484C2 (en) 2008-05-02 2013-09-27 Шайн Медикал Текнолоджис, Инк. Production device and method of medical isotopes
US10978214B2 (en) 2010-01-28 2021-04-13 SHINE Medical Technologies, LLC Segmented reaction chamber for radioisotope production
US10734126B2 (en) 2011-04-28 2020-08-04 SHINE Medical Technologies, LLC Methods of separating medical isotopes from uranium solutions
KR101241049B1 (en) 2011-08-01 2013-03-15 주식회사 플라즈마트 Plasma generation apparatus and plasma generation method
IN2014DN09137A (en) 2012-04-05 2015-05-22 Shine Medical Technologies Inc
KR20140087215A (en) * 2012-12-28 2014-07-09 주식회사 윈텔 Plasma generation apparatus and substrate processing apparatus
US9299536B2 (en) * 2013-10-17 2016-03-29 Varian Semiconductor Equipment Associates, Inc. Wide metal-free plasma flood gun

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6087778A (en) * 1996-06-28 2000-07-11 Lam Research Corporation Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna
US6264812B1 (en) * 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
US20030029837A1 (en) * 2001-08-10 2003-02-13 Applied Materials, Inc. Dielectric etch plasma chamber utilizing a magnetic filter to optimize plasma characteristics
US6635578B1 (en) * 1998-02-09 2003-10-21 Applied Materials, Inc Method of operating a dual chamber reactor with neutral density decoupled from ion density
US20030218430A1 (en) * 2002-05-22 2003-11-27 Ka-Ngo Leung Ion source with external RF antenna
US6771026B2 (en) * 2002-06-12 2004-08-03 Tokyo Electron Limited Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron wave

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6264812B1 (en) * 1995-11-15 2001-07-24 Applied Materials, Inc. Method and apparatus for generating a plasma
US6087778A (en) * 1996-06-28 2000-07-11 Lam Research Corporation Scalable helicon wave plasma processing device with a non-cylindrical source chamber having a serpentine antenna
US6635578B1 (en) * 1998-02-09 2003-10-21 Applied Materials, Inc Method of operating a dual chamber reactor with neutral density decoupled from ion density
US20030029837A1 (en) * 2001-08-10 2003-02-13 Applied Materials, Inc. Dielectric etch plasma chamber utilizing a magnetic filter to optimize plasma characteristics
US20030218430A1 (en) * 2002-05-22 2003-11-27 Ka-Ngo Leung Ion source with external RF antenna
US6771026B2 (en) * 2002-06-12 2004-08-03 Tokyo Electron Limited Plasma generation by mode-conversion of RF-electromagnetic wave to electron cyclotron wave

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103843465A (en) * 2011-10-13 2014-06-04 韩国科学技术院 Plasma apparatus and substrate-processing apparatus

Also Published As

Publication number Publication date
WO2007002455A2 (en) 2007-01-04

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