WO2005038077A2 - Modulare vorrichtung zur beschichtung von oberflächen - Google Patents

Modulare vorrichtung zur beschichtung von oberflächen Download PDF

Info

Publication number
WO2005038077A2
WO2005038077A2 PCT/EP2004/011669 EP2004011669W WO2005038077A2 WO 2005038077 A2 WO2005038077 A2 WO 2005038077A2 EP 2004011669 W EP2004011669 W EP 2004011669W WO 2005038077 A2 WO2005038077 A2 WO 2005038077A2
Authority
WO
WIPO (PCT)
Prior art keywords
receiving
cathodes
vacuum chamber
cathode
objects
Prior art date
Application number
PCT/EP2004/011669
Other languages
German (de)
English (en)
French (fr)
Other versions
WO2005038077A3 (de
Inventor
Tibor Cselle
Mojmir Jilek
Original Assignee
Platit Ag
Pivot A.S.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP03405753.9 external-priority
Application filed by Platit Ag, Pivot A.S. filed Critical Platit Ag
Priority to KR1020067008721A priority Critical patent/KR101091594B1/ko
Priority to DE502004010209T priority patent/DE502004010209D1/de
Priority to US10/575,854 priority patent/US20070137566A1/en
Priority to EP04790508A priority patent/EP1673488B1/de
Publication of WO2005038077A2 publication Critical patent/WO2005038077A2/de
Publication of WO2005038077A3 publication Critical patent/WO2005038077A3/de
Priority to HK07103679.5A priority patent/HK1096435A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32568—Relative arrangement or disposition of electrodes; moving means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3464—Sputtering using more than one target
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
    • H01L21/67207—Apparatus for manufacturing or treating in a plurality of work-stations comprising a chamber adapted to a particular process
PCT/EP2004/011669 2003-10-17 2004-10-15 Modulare vorrichtung zur beschichtung von oberflächen WO2005038077A2 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
KR1020067008721A KR101091594B1 (ko) 2003-10-17 2004-10-15 표면코팅을 위한 모듈형 장치
DE502004010209T DE502004010209D1 (de) 2003-10-17 2004-10-15 Modulare vorrichtung zur beschichtung von oberflächen
US10/575,854 US20070137566A1 (en) 2003-10-17 2004-10-15 Modular device for coating surfaces
EP04790508A EP1673488B1 (de) 2003-10-17 2004-10-15 Modulare vorrichtung zur beschichtung von oberflächen
HK07103679.5A HK1096435A1 (en) 2003-10-17 2007-04-10 Modular device for coating surfaces

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP03405753A EP1524329A1 (de) 2003-10-17 2003-10-17 Modulare Vorrichtung zur Beschichtung von Oberflächen
EP03405753.9 2003-10-17

Publications (2)

Publication Number Publication Date
WO2005038077A2 true WO2005038077A2 (de) 2005-04-28
WO2005038077A3 WO2005038077A3 (de) 2006-03-02

Family

ID=34354641

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/011669 WO2005038077A2 (de) 2003-10-17 2004-10-15 Modulare vorrichtung zur beschichtung von oberflächen

Country Status (7)

Country Link
US (1) US20070137566A1 (pt-PT)
EP (2) EP1524329A1 (pt-PT)
KR (1) KR101091594B1 (pt-PT)
CN (1) CN100540726C (pt-PT)
DE (1) DE502004010209D1 (pt-PT)
HK (1) HK1096435A1 (pt-PT)
WO (1) WO2005038077A2 (pt-PT)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2163661A1 (de) 2008-09-05 2010-03-17 Fette GmbH Wälzfräswerkzeug mit einer Beschichtung und Verfahren zur Neubeschichtung eines Wälzfräswerkzeuges

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100977613B1 (ko) * 2008-03-26 2010-08-23 한전케이피에스 주식회사 고온용 부품의 윤활코팅장치
CZ304905B6 (cs) * 2009-11-23 2015-01-14 Shm, S.R.O. Způsob vytváření PVD vrstev s pomocí rotační cylindrické katody a zařízení k provádění tohoto způsobu
EP2521159A1 (en) 2011-05-06 2012-11-07 Pivot a.s. Glow discharge apparatus and method with lateral rotating arc cathodes
CH705029A1 (de) 2011-05-27 2012-11-30 Bloesch W Ag Beschichtetes Holzbearbeitungswerkzeug.
US10304665B2 (en) 2011-09-07 2019-05-28 Nano-Product Engineering, LLC Reactors for plasma-assisted processes and associated methods
US9761424B1 (en) 2011-09-07 2017-09-12 Nano-Product Engineering, LLC Filtered cathodic arc method, apparatus and applications thereof
DE102011113563A1 (de) * 2011-09-19 2013-03-21 Oerlikon Trading Ag, Trübbach Karussellschlitten für Vakuumbehandlungsanlage
CN106086816A (zh) * 2016-07-06 2016-11-09 广东振华科技股份有限公司 一种cvd镀膜机
CN110777347A (zh) * 2019-10-28 2020-02-11 浙江锋源氢能科技有限公司 Pvd样品转架和pvd设备

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990002216A1 (en) * 1988-08-25 1990-03-08 Vac-Tec Systems, Inc. Physical vapor deposition dual coating apparatus and process
DE4443740A1 (de) * 1994-12-08 1996-06-13 Bloesch W Ag Vorrichtung zum Beschichten von Substraten
US5750207A (en) * 1995-02-17 1998-05-12 Si Diamond Technology, Inc. System and method for depositing coating of modulated composition
WO2002050864A1 (en) * 2000-12-18 2002-06-27 Shm, S.R.O. Apparatus for evaporation of materials for coating of objects
US20020182448A1 (en) * 2000-02-09 2002-12-05 Hauzer Techno Coating Europe Bv Method for the manufacture of an article and an article

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2022946T5 (es) * 1987-08-26 1996-04-16 Balzers Hochvakuum Procedimiento para la aportacion de capas sobre sustratos.
DE3829260C2 (pt-PT) * 1988-08-29 1992-08-06 Multi-Arc Oberflaechentechnik Gmbh, 5060 Bergisch Gladbach, De

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1990002216A1 (en) * 1988-08-25 1990-03-08 Vac-Tec Systems, Inc. Physical vapor deposition dual coating apparatus and process
DE4443740A1 (de) * 1994-12-08 1996-06-13 Bloesch W Ag Vorrichtung zum Beschichten von Substraten
US5750207A (en) * 1995-02-17 1998-05-12 Si Diamond Technology, Inc. System and method for depositing coating of modulated composition
US20020182448A1 (en) * 2000-02-09 2002-12-05 Hauzer Techno Coating Europe Bv Method for the manufacture of an article and an article
WO2002050864A1 (en) * 2000-12-18 2002-06-27 Shm, S.R.O. Apparatus for evaporation of materials for coating of objects

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1673488A2 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2163661A1 (de) 2008-09-05 2010-03-17 Fette GmbH Wälzfräswerkzeug mit einer Beschichtung und Verfahren zur Neubeschichtung eines Wälzfräswerkzeuges
US8349474B2 (en) 2008-09-05 2013-01-08 Fette Gmbh Hob cutter with a coating and method for coating hob cutter

Also Published As

Publication number Publication date
DE502004010209D1 (de) 2009-11-19
WO2005038077A3 (de) 2006-03-02
CN100540726C (zh) 2009-09-16
HK1096435A1 (en) 2007-06-01
CN1867692A (zh) 2006-11-22
EP1524329A1 (de) 2005-04-20
EP1673488B1 (de) 2009-10-07
KR101091594B1 (ko) 2011-12-13
EP1673488A2 (de) 2006-06-28
KR20070007251A (ko) 2007-01-15
US20070137566A1 (en) 2007-06-21

Similar Documents

Publication Publication Date Title
WO2005038077A2 (de) Modulare vorrichtung zur beschichtung von oberflächen
EP1693905B1 (de) Verfahren zur Herstellung biaxial orientierter Dünnschichten
EP1722005B1 (de) Verfahren zum Betreiben einer Sputterkathode mit einem Target
DE102007023970A1 (de) Vorrichtung zum Beschichten einer Vielzahl in dichtester Packung auf einem Suszeptor angeordneter Substrate
DE3442844A1 (de) Vorrichtung und anlage fuer die durchfuehrung einer behandlung unter vakuum
DE102005061563A1 (de) Anlage zur Behandlung von Substraten und Verfahren
EP3277858A1 (de) Chargierung von werkstücken in einer beschichtungsanlage
DE2755852A1 (de) Anlage zum behandeln von substraten mittels eines ionenstrahls
WO2012069208A9 (de) Substrathalter für die oberflächenbehandlung von substraten und verwendung des substrathalters
DE112009001533T5 (de) Katodeneinheit und mit derselben versehene Sputter-Vorrichtung
DE19803278A1 (de) Werkstückträger und Anlagen zur Behandlung und/oder Beschichtung von Werkstücken sowie damit hergestellte Beschichtungen
WO2014177254A1 (de) Vielseitige haltevorrichtung zur oberflächenbehandlung von stangenförmigen substraten
CH692000A5 (de) Beschichtungskammer, Substratträger hierfür, Verfahren zum Vakuumbedampfen sowie Beschichtungsverfahren.
DE102014116342B4 (de) Substrathaltevorrichtung und Verfahren zum Prozessieren eines Substrats
DE69627249T2 (de) Hochvakuum-Sputter-Vorrichtung und zu behandelndes Substrat
WO2018083322A1 (de) Vorrichtung zur extraktion von elektrischen ladungsträgern aus einem ladungsträgererzeugungsraum
DE3242855A1 (de) Verfahren und vorrichtung zur konturierung der dicke von aufgespruehten schichten
DE1908310A1 (de) Kathodenzerstaeubungseinrichtung
DE102005019100A1 (de) Magnetsystem für eine Zerstäubungskathode
DE4446414A1 (de) Sputter-Vorrichtung
EP1560253B1 (de) Vorrichtung zum Beschichten eines Substrats mit einer Absorberanordnung
EP0940482B1 (de) Vakuum-Plasma-Beschichtungsanlage und Anwendung derselben
DE10239163A1 (de) Vorrichtung und Verfahren zur Ausbildung von Gradientenschichten auf Substraten in einer Vakuumkammer
EP4131332A1 (de) Mehrfach-sputtertarget
DE3925711C1 (pt-PT)

Legal Events

Date Code Title Description
WWE Wipo information: entry into national phase

Ref document number: 200480030608.3

Country of ref document: CN

AK Designated states

Kind code of ref document: A2

Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW

AL Designated countries for regional patents

Kind code of ref document: A2

Designated state(s): BW GH GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG

121 Ep: the epo has been informed by wipo that ep was designated in this application
WWE Wipo information: entry into national phase

Ref document number: 1020067008721

Country of ref document: KR

WWE Wipo information: entry into national phase

Ref document number: 2004790508

Country of ref document: EP

WWE Wipo information: entry into national phase

Ref document number: 2007137566

Country of ref document: US

Ref document number: 10575854

Country of ref document: US

WWP Wipo information: published in national office

Ref document number: 2004790508

Country of ref document: EP

WWP Wipo information: published in national office

Ref document number: 1020067008721

Country of ref document: KR

WWP Wipo information: published in national office

Ref document number: 10575854

Country of ref document: US