WO2005024392A1 - ナノチューブプローブ及び製造方法 - Google Patents
ナノチューブプローブ及び製造方法 Download PDFInfo
- Publication number
- WO2005024392A1 WO2005024392A1 PCT/JP2004/013403 JP2004013403W WO2005024392A1 WO 2005024392 A1 WO2005024392 A1 WO 2005024392A1 JP 2004013403 W JP2004013403 W JP 2004013403W WO 2005024392 A1 WO2005024392 A1 WO 2005024392A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- nanotube
- coating film
- partial coating
- base end
- probe
- Prior art date
Links
- 239000002071 nanotube Substances 0.000 title claims abstract description 372
- 239000000523 sample Substances 0.000 title claims abstract description 159
- 238000004519 manufacturing process Methods 0.000 title claims description 38
- 238000000576 coating method Methods 0.000 claims abstract description 278
- 239000011248 coating agent Substances 0.000 claims abstract description 269
- 238000010894 electron beam technology Methods 0.000 claims abstract description 50
- 238000000034 method Methods 0.000 claims description 41
- 238000010884 ion-beam technique Methods 0.000 claims description 17
- 238000000354 decomposition reaction Methods 0.000 claims description 9
- 230000001105 regulatory effect Effects 0.000 claims description 3
- 239000012535 impurity Substances 0.000 abstract description 15
- 238000010586 diagram Methods 0.000 description 29
- 230000008569 process Effects 0.000 description 14
- 238000005530 etching Methods 0.000 description 10
- 239000007789 gas Substances 0.000 description 9
- 230000008901 benefit Effects 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 239000000126 substance Substances 0.000 description 6
- 230000001276 controlling effect Effects 0.000 description 5
- 230000000704 physical effect Effects 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 4
- 230000001070 adhesive effect Effects 0.000 description 4
- 239000003575 carbonaceous material Substances 0.000 description 4
- 230000009467 reduction Effects 0.000 description 4
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 238000005411 Van der Waals force Methods 0.000 description 3
- 230000001678 irradiating effect Effects 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000004323 axial length Effects 0.000 description 2
- 239000002041 carbon nanotube Substances 0.000 description 2
- 229910021393 carbon nanotube Inorganic materials 0.000 description 2
- 230000002925 chemical effect Effects 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 230000002950 deficient Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 239000011505 plaster Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 101100136092 Drosophila melanogaster peng gene Proteins 0.000 description 1
- 238000009825 accumulation Methods 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 238000000089 atomic force micrograph Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000012472 biological sample Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 238000012512 characterization method Methods 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000866 electrolytic etching Methods 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000012634 fragment Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000003384 imaging method Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 230000003993 interaction Effects 0.000 description 1
- 230000005389 magnetism Effects 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 239000002086 nanomaterial Substances 0.000 description 1
- 125000002524 organometallic group Chemical group 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 230000005641 tunneling Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/16—Probe manufacture
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q70/00—General aspects of SPM probes, their manufacture or their related instrumentation, insofar as they are not specially adapted to a single SPM technique covered by group G01Q60/00
- G01Q70/08—Probe characteristics
- G01Q70/10—Shape or taper
- G01Q70/12—Nanotube tips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y35/00—Methods or apparatus for measurement or analysis of nanostructures
Definitions
- the present invention relates to a nanotube probe using a nanotube as a probe. More specifically, the present invention realizes a specific method for fixing a nanotube to a holder, for example, for physical and chemical characterization of a sample surface.
- Probe that can be used as a probe of a scanning probe microscope that detects the surface of the sample and detects the sample surface, and a method of manufacturing the nanotube probe
- a scanning probe microscope is a microscope that detects the physical and chemical effects received from atoms on the sample surface by a probe tip, and generates a sample surface image from detection signals while scanning the probe over the surface. . For this reason, the resolution and measurement accuracy of a scanning probe microscope greatly depend on the size of the probe and its physical properties.
- High resolution can be obtained by using a tough, small-diameter nanotube represented by a carbon nanotube (CNT) as a probe of a scanning probe microscope.
- CNT carbon nanotube
- fixing nanotubes to the holder that holds the probe requires sophisticated microfabrication technology.
- the nanotube probe and its production method were first disclosed by Colbert Daniel T., Dai Honji et al. In Japanese Patent Publication No. 2000-516708. Next, in the process of improving the above-mentioned invention, it was disclosed by the present inventors as JP-A-2000-227435.
- a nanotube is used as a probe of a scanning probe microscope, and the nanotube is fixed to the protruding portion of the cantilever by an adhesive using an optical microscope.
- the maximum magnification of an optical microscope is limited to 1000 to 2000 times, it is theoretically impossible to directly observe nanotubes with a diameter of 100 nm or less with an optical microscope. Therefore, it is difficult to even bond the nanotube to a specific position of the cantilever protrusion, and it is even more difficult to adjust the number and direction of the bonded nanotubes.
- a nanotube probe is assembled while directly observing the nanotube in an electron microscope. That is, the present invention provides a method for producing a nanotube probe with high precision and ease by coating and fixing the nanotube on the holder surface using an electron beam under a direct observation state.
- FIG. 15 is an explanatory view of an embodiment in which a nanotube probe is formed by the conventional technique. While observing directly in an electron microscope, the nanotube arrangement plate 106 to which the nanotubes 108 are attached is opposed to the cantilever protrusion 104. Next, the two are brought close to each other to bring the base end portion 108 b of the nanotube into contact with the protruding portion 104.
- the nanotube 108 has a tip length A of the nanotube tip 108 a sufficient to serve as a probe, and the base 108 b has a base length B. .
- the impurity substance floating in the sample chamber of the electron microscope is decomposed, and the coating film 112 is formed by the decomposition product carbon substance.
- the base end 108 b of the nanotube is fixed to the cantilever protrusion 104 by the coating film 112.
- the electron beam 110 has a beam diameter such that it covers the entire nanotube base end 108 b. Therefore, the impurities 142 and 142 present in the sample chamber are decomposed by the electron beam 110 and the coating film 112 is formed so that the generated carbon material covers the base end 108 b of the nanotube. It is formed.
- the carbon material not only forms the coating film 112 but also becomes charged by the electrons 140 and 140 and is scattered by the electric repulsion, or the fragments are scattered and the coating material other than the coating film 112 is formed.
- impurities 1 36 adhered to the region of No. 1 and soiled the protruding portion 104 of the cantilever.
- the base end of the nanotube 108 b In the case of coating over the entire surface, the diameter of the end face of the electron beam 110 was large, so that the energy flow density was low, and it was necessary to irradiate the electron beam i ⁇ 0 for a long time.
- the distal end length A when the distal end length A is set to an appropriate length, a case appears in which the proximal end length B becomes considerably long as shown in (15B). If the base end length B is larger than the beam diameter, the coating film 1 1 2 is moved by moving the electron beam 110 in the direction of arrow m to cover the entire base end 108 b. Need to be formed in multiple stages. However, the larger the area covered by the coating film 112, the longer the fixing time, and the greater the amount of the impurity 136 attached to the cantilever protrusion. As a result, the nanotube probe was greatly contaminated by impurities, and could not be provided as a product in some cases.
- Figure 16 shows the configuration of a defective nanotube probe and a measurement diagram using it. If the nanotubes 108 do not pass through the sharp ends 107 of the cantilever protrusions 104 and the base end 108 b of the nanotubes is entirely coated in one process, the misalignment is corrected. That is no longer possible. Such a shift is likely to occur when the nanotubes 108 are obliquely attached to the nanotube arrangement plate 106.
- Such misalignment causes an adverse effect when the sharp end 107 also functions as a probe together with the nanotube tip 108 c in the AFM measurement.
- (16A) when the positions of the sharp end 107 and the nanotube 108 are misaligned, as shown in (16B), the sharp end scanning point 150 and the nanotube running point are shifted. This causes a double exposure of 152 and gives incorrect sample surface information.
- FIG. 17 is a configuration diagram of a conventional cantilever protrusion 104 having a curved side surface and a nanotube 108.
- the side surface 122 of the cantilever protrusion 104 is concavely curved, it is necessary to fix the nanotube to the curved side surface 122.
- the other parts do not contribute to fixation at all even if they are coated entirely. As described above, there are many points that need to be improved in the conventional full-surface coating method.
- the nanotube probe is fixed to the holder with a predetermined strength or more.
- Another object of the present invention is to provide a nanotube probe which can be fixed in a short time and a method for producing the same. It is another object of the present invention to provide a nanotube probe which can be fixed to a holder having a curved surface in a short time with a small amount of adhered impurities at the time of fixing, and can further increase the fixing strength, and a method of manufacturing the same.
- a first aspect of the present invention is to provide a holder for holding a nanotube, and a base end of the nanotube with a tip end of the nanotube protruding.
- a nanotube probe having a portion fixed to a holder surface by a coating film, each of a plurality of portions at the base end of the nanotube is fixed to the holder surface by a partial coating film, and the partial coating films are separated without overlapping each other. Is a nanotube probe.
- the maximum coating skirt width fixed to the holder surface in a direction perpendicular to the nanotube axis is W
- the nanotube diameter is d
- W / d It is a nanotube probe that satisfies the relation of ⁇ 0.1.
- the coating length directly pressing the nanotubes in the axial direction is L
- the diameter of the nanotubes is d
- the relationship of L / d ⁇ 0.3 is satisfied.
- a fourth aspect of the present invention is a nanotube probe, wherein the average thickness T of the partial coating film is 1 nm or more.
- a projecting portion of a cantilever is used as the holder, a base end portion of the nanotube is arranged to be in contact with the surface of the projecting portion, and the partial coating film is provided on each of two or more contact regions.
- the partial coating film is provided on each of two or more contact regions.
- a seventh aspect of the present invention is a nanotube probe for disposing a nanotube in the vicinity of a sharp end of the protrusion.
- a method for manufacturing a nanotube probe comprising: a holder for holding a nanotube; and a base end portion of the nanotube fixed to a holder surface by a coating film with a tip end portion of the nanotube protruding.
- the coating film is composed of at least two or more partial coating films, and the first fixing portion of the base end portion of the nanotube is brought into contact with the holder surface to partially cover the first fixing portion.
- a cantilever protrusion is used as the holder, the first partial coating film is formed below the base end of the nanotube, and the nanotube is arranged so as to pass near the sharp end of the protrusion.
- This is a method for producing a nanotube probe in which a second partial coating film is formed in a state above the base end of the nanotube.
- a first partial coating film is formed below the nanotube base end, The intermediate region of the end is kept in a non-contact state with the protruding portion, and the nanotube is adjusted so as to pass through the sharp end of the protruding portion with the first partial coating film as a fulcrum.
- a first partial coating film is formed at a position below the nanotube base end, and the nanotube base is formed.
- the intermediate region between the first fixed portion and the second fixed portion at the end is forcibly bent to a shape along the curved surface, and adjusted so that the nanotube passes near the sharp end of the protruding portion with the first partial coating film as a fulcrum. Either of the forced bending and the passage adjustment may be performed first, and a position above the base end of the nanotube is brought into contact with the vicinity of the sharp end to form a second partial coating film in the contact area.
- This is a method for producing a nanotube probe.
- a twelfth aspect of the present invention is a method for producing a nanotube probe in which after forming the second partial coating film, the intermediate region is fixed by a third partial coating film.
- the nanotube probe according to claim 8, 9, 10, 10, 11, or 12, wherein the partial coating film is formed while directly observing in an electron microscope or a focused ion beam device. Is a manufacturing method.
- a fifteenth aspect of the present invention is the method for producing a nanotube probe according to claim 13, wherein the partial coating film is a decomposition deposit formed by an electron beam or an ion beam.
- a fifteenth aspect of the present invention is a method for producing a nanotube probe for controlling the size of the partial coating film by regulating the scanning range of the electron beam or the ion beam.
- the size of the partial coating film is reduced as much as possible, so that the time required for forming the coating film can be reduced. It will be possible to make a dramatic reduction. It is difficult to clearly see the whole image of the nanotube even with a magnifying device such as an electron microscope, and it is difficult for even a skilled person to confirm the rearmost end of the nanotube. In the whole-surface coating method, it is necessary to check the rearmost end of the nanotube before coating, which requires a huge amount of coating time.
- the partial coating method does not require confirmation of the end of the nanotube at all, and has the advantage that the coating time is shortened and the coating operation is extremely simple.
- the nanotube can be fixed to the holder only by fixing at least two points at the base end of the nanotube.
- the partial coating film is formed by the maximum coating skirt ⁇ ⁇ W with respect to the nanotube diameter d by satisfying the relationship of W / d ⁇ 0.1. The required fixing strength for fixing the UBE to the holder surface can be obtained.
- the partial coating film is formed in an arbitrary shape such as a rectangle, a circle, and an ellipse.
- the adhesive strength determines the strength. This bonding length is called the maximum coating hem width, and the present inventors have discovered for the first time that if the maximum coating hem width W is 0.1 times or more of the nanotube diameter d, the initial fixing strength can be obtained. It was done. Since the partial coating film is formed in an arbitrary shape such as a rectangle, a circle, an ellipse, and a curved surface, the width of the coating hem also varies depending on the position. In the present invention, the above conditions have been found by focusing on the maximum coating hem width.
- the coating length L satisfies the relationship of L / d ⁇ 0.3 with respect to the nanotube diameter d, so that the partial coating film is required for fixing the nanotubes to the holder surface.
- Strength can be obtained.
- the partial coating film is a pure plaster that fixes the nanotubes, and the axial length of the pure plaster directly pressing the nanotube is called the coating length, and is one of the factors that give the adhesive strength. It is.
- the partial coating can take any shape, but the coating length is uniquely determined. The present inventors have clarified that an initial fixing strength can be obtained when the coating length L is at least 0.3 times the nanotube diameter d.
- the coating time can be reduced. There is no upper limit on the coating length L, but the upper limit can be determined in consideration of the coating time.
- a nanotube probe having a fixing strength that can withstand practical use It is possible to provide. It is desirable that the thickness of the partial coating film be uniform, but it cannot be said that it is completely uniform. If the film thickness is uniform, the average film thickness matches that film thickness. If the film thickness is not uniform, judge with the average film thickness. Regarding the average film thickness, it is natural that the coating strength increases as the thickness increases. As the average film thickness increases, coating time unnecessarily increases. The present inventors have experimentally confirmed that the nanotube can be securely fixed if the average thickness of the coating film is 1 nm or more (T ⁇ 1 nm).
- the coating time was ⁇ Peng large because it was unnecessarily thick. According to the present invention, if the average film thickness is set to 1 nm or more, the coating time can be drastically reduced and the coating operation can be simplified.
- the nanotube is fixed to the force cantilever by two or more partial coating films. Therefore, a nanotube probe can be easily manufactured.
- the AFM device for finely controlling the cantilever can be used as it is, the drive control of the nanotube probe can be easily performed.
- the shape of the cantilever protrusion may be arbitrary, and various shapes such as a straight cone such as a cone or a triangular pyramid and a curved cone having a curved surface may be used as the shape of the protrusion.
- a partial coating film may be formed at a position where at least the surface of the protruding portion and the base end of the nanotube are in contact with each other. .
- a curved cantilever protrusion can be used as a holder.
- the protruding portion itself is a probe tl "
- the protruding portion is formed into a concave or convex shape in order to sharpen the tip of the protruding portion.
- the nanotube When the nanotube is placed in contact with the curved surface, it contacts at least two points, upper and lower, so that the nanotube can be fixed by forming a partial coating film at these contact points.
- the present invention can be used effectively, and the same fixing strength as that of the entire surface coating can be obtained.
- the nanotube is arranged to pass near the sharp end of the protruding portion of the cantilever, the surface signal from the nanotube probe running on the sample surface is provided. Thereby, a sample surface image can be revealed with high accuracy.
- the sharp end of the protruding portion does not function as a probe, and double exposure can be prevented.
- the eighth embodiment of the present invention provides a manufacturing method for realizing the first embodiment. At least two points where the base end of the nanotube comes into contact with the holder are selected, and both contact points are fixed as a first fixing point and a second fixing point by a partial coating film.
- the coating order of the first fixed portion and the second fixed portion does not matter. Since the area of the partial coating film is extremely reduced, there is an advantage that the coating time is remarkably reduced as compared with the whole coating method.
- the fixing strength of the nanotube depends on the area of the partial coating film.
- the nanotube is swung right and left around the first partial coating film while the nanotube is swung right and left near the sharp end of the cantilever protrusion. , And then a second partial coating film is formed thereon.
- the nanotubes can be arranged normally, and the failure rate of the nanotube probe can be rapidly reduced.
- a sample surface image can be captured only by a surface signal from a nanotube probe that scans the sample surface, and a nanotube probe that does not cause double exposure due to a sharp end of a protruding portion can be manufactured.
- the tenth aspect of the present invention it is possible to manufacture a nanotube probe using a force cantilever whose sharp end of the protruding portion is further sharpened by a curved property.
- the rod-shaped nanotube When the rod-shaped nanotube is brought into contact with the concave curved surface, the nanotube comes into contact with the curved surface at two points, upper and lower, and is in a non-contact state in the middle region.
- the lower contact point is partially coated and fixed, and the nanotube is swung right and left with the fixed point as a fulcrum so as to pass through the sharp end, and then the upper contact point is partially coated and fixed. Therefore, although it is not fixed in the middle area, it can be fixed securely by the upper and lower two points.
- the intermediate region is in contact with the surface, but can be securely fixed by fixing the partial coating at the upper and lower two points.
- the nanotube can be reliably corrected to a normal posture, This has the advantage of rapidly reducing the defect rate of the tubeless probe.
- the partial coating since the partial coating is fixed, the same fixing strength can be developed in a shorter time than the conventional coating covering the entire base end of the nanotube.
- the van der between the nanotube and the cantilever protrusion is fixed together with the partial coating film.
- the curved shape of the cantilever protrusion includes a concave curve and a convex curve.
- the nanotube probe when running on the sample surface, the nanotube probe can accurately follow the steep irregularities on the sample surface, and has an advantage that a sample surface image can be captured with high accuracy. Further, since the posture of the nanotube is forcibly corrected so that the nanotube passes through the sharp end of the protruding portion, the failure rate of the nanotube probe can be rapidly reduced.
- the number of coating locations is 3 or more, and high strength fixing can be realized.
- the thirteenth aspect of the present invention it is possible to magnify the cantilever or the nanotube as a part while observing the part using an electron microscope or a focused ion beam apparatus, and to assemble the part with high accuracy.
- the impurity gas in the apparatus is decomposed by an electron beam or an ion beam, and the decomposition product is deposited to form a partial coating film easily and in a short time.
- the electron beam dion beam has an advantage that an existing electron microscope and a focused ion beam device (FIB device) can be used, and does not require a new charged beam generator.
- the size of the coating film that is, the coating length L, the maximum coating width W is controlled by regulating the scanning range (beam deflection width) of the electron beam or the ion beam.
- the scanning range beam deflection width
- the above-mentioned conditions of W / d ⁇ 0.1 and L / d0.3 can be easily satisfied.
- the beam diameter of the electron beam or the ion beam can be reduced to a minimum, which has the effect of minimizing the accumulation of decomposition products in areas other than the coating area.
- the average coating film thickness can be freely controlled, and the above-mentioned film thickness condition, that is, the condition of T ⁇ l (nm) can be easily achieved.
- FIG. 1 is a schematic configuration diagram of an apparatus for fixing a nanotube 8 to a cantilever 2.
- FIG. 2 is an explanatory diagram of the fixing operation of the nanotube 8.
- FIG. 3 is an explanatory diagram of the partial coating film 12 formed by the electron beam 10.
- FIG. 4 is an explanatory diagram of the relationship between the size of the partial coating film 12 and the nanotube diameter d. ⁇
- Figure 5 shows the relationship between the nanotube diameter d, each size of the partial coating film, and the fixing strength.
- FIG. 6 is a relationship diagram showing the fixing strength of the etched nanotubes 8.
- FIG. 7 is a process diagram of a method of fixing the nanotubes 8 to the curved force-tilever projections 4.
- FIG. 8 is an explanatory diagram of a method of fixing the nanotubes 8 to the uncurved force-chinch lever projections 4.
- FIG. 9 is a process drawing in which the nanotube 8 is arranged to pass through near the sharp end 7 of the protruding portion 4.
- FIG. 10 is a process diagram of fixing the nanotube intermediate region with the third partial coating film 12c.
- FIG. 11 is a process diagram for fixing the nanotube 8 to the cantilever protrusion 4 which is formed in a concavely curved shape.
- FIG. 12 is a process diagram of fixing three points of the nanotubes 8 to the cantilever protrusions 4 formed in a concavely curved shape.
- FIG. 13 is a process diagram for fixing the nanotubes 8 to the protruding portions 4 of the cantilever that are formed in a convex shape.
- FIG. 14 is an explanatory diagram of a method for fixing one nanotube 8 from the nanotube group 36.
- FIG. 15 is an explanatory diagram of an embodiment in which a nanotube probe is formed according to this conventional technique.
- Figure 16 shows a configuration diagram of a defective product of a conventional nanotube probe and a measurement diagram using the same.
- FIG. 17 is a configuration diagram of a conventional cantilever protrusion 104 having a curved side surface and a nanotube 108.
- the inventors of the present invention have conducted intensive studies to improve the nanotube probe by the full-surface coating method, and have completed the nanotube probe by the partial coating method.
- embodiments of a nanotube probe and a method for manufacturing the same according to the present invention will be described in detail with reference to the drawings.
- a nanotube probe which can fix the nanotube to the holder surface in a short time, reduce the amount of impurities adhering to the holder surface to the utmost, and can use a holder of any shape, and a method of manufacturing the same are provided.
- a cantilever protrusion for AFM is used as a holder for fixing a nanotube.
- the holder is not limited to the cantilever, and it goes without saying that any member that can fix the nanotube and can control the fine movement of the nanotube can be used as the holder.
- FIG. 1 is a schematic configuration diagram of an apparatus for fixing a nanotube 8 to a force cantilever 2.
- a cantilever 2 used in AFM is composed of a cantilever part 3 and a protruding part 4, and the protruding part 4 is used as a holder for fixing nanotubes.
- a large number of nanotubes 8 are attached to a nanotube placement plate 6 which is a source of nanotubes. The nanotube 8 of the nanotube placement plate 6 is fixed to the protrusion 4, and then the nanotube 8 is separated from the nanotube placement plate 6 and the nanotube probe Assemble.
- FIG. 2 is an explanatory view of the fixing operation of the nanotube 8. As shown in (2A), the sharp end 7 of the cantilever protrusion 4 is brought very close to the nanotube 8 in the direction of arrow a while directly observing with an electron microscope.
- the cantilever projection 4 is arranged so that the nanotube 8 is disassembled into a distal end 8a and a proximal end 8b by the cantilever projection 4. After the base end portion 8b of the nanotube has adhered to the surface of the cantilever protrusion 4, an appropriate first fixed portion is irradiated with an electron beam 10 to form a first partial coating film 12a. In observing with an electron microscope, it is necessary to be skilled to specify the tip 8c of the nanotube. Therefore, the electron beam 10 is applied to a position appropriately distant from the nanotube tip 8c to form the first partial coating film 12a.
- the second fixed portion above the base end 8b is irradiated with the electron beam 10 to form the second partial coating film 12b, and the nanotube base end 8b is forced.
- the impurity gas in the electron microscope is decomposed by the electron beam, and the decomposition products are deposited to form the first partial coating film 12a and the second partial coating film 12b.
- the impurity gas is an organic gas
- the decomposition deposit is often composed of a carbon material.
- the decomposition deposits are composed of metallic substances.
- the material constituting the coating film can be arbitrarily selected.
- the cantilever protrusion 4 and the nanotube placement plate 6 are relatively separated in the direction of arrow b.
- the adhesive force of the nanotube 8 to the nanotube arrangement plate 6 is weaker than the fixing strength of the first partial coating film 12a and the second partial coating film 12b.
- the probe 8 is separated from the nanotube placement plate 6 integrally with the force-chinch lever projection 4.
- FIG. 3 is an explanatory diagram of the partial coating film 12 formed by the electron beam 10.
- the first method is a method in which the electron beam is narrowed down and the beam is swung within a set scanning range, and the size of the partial coating film is adjusted by changing the scanning range.
- the second method is to make the electron beam thicker by loosening the aperture, and adjust the size of the coating film by changing the beam thickness.
- the first method is used, and the beam diameter R of the electron beam 10 is narrowed down to an extremely small value (for example, several nm to 10 nm). While shaking in 14, a coating film 12 is formed.
- the beam diameter R is reduced to about 4 nm, and the scanning range 14 is set to 20 nm on each side.
- the size of the coating film 12 is about 30 nm.
- the size of the scanning range 14 and the size of the coating film 12 are of the same order, but are not necessarily the same. However, there is a certain dependency between the size of the scanning range 14 and the size of the coating film 12.
- the scanning range 14 is an area defined by a horizontal width u and a vertical width V, and is realized by a deflection coil.
- the partial coating film 12 is formed by irradiating the electron beam 10 while oscillating it within the scanning range 14.
- the size of the partial coating film 12 can be controlled.
- the size of the scanning range 14 can be adjusted according to the diameter of the fixed nanotube. As described later, since the width D, length L, and average thickness T of the partial coating film 12 have a certain relationship with the nanotube diameter d, the partial coating film 12 is formed so as to satisfy the relationship. Thereby, the desired fixing strength can be obtained.
- the second method is used, and when the nanotube diameter d changes from small to large, the diameter R of the electron beam 10 is also adjusted from small to large by adjusting the aperture.
- the electron beam 10 is in a direct irradiation state and is not scanned. That is, corresponding to the thin nanotube 8 (left figure) and the thick nanotube 8 (right figure), beam irradiation is performed by adjusting the beam diameter R of the electron beam 10 to obtain a partial coating having a predetermined fixed intensity. Films 12 and 12 are formed.
- the nanotube diameter d, the holder surface The average film thickness T, the coating length L, and the maximum coating hem width W of the partial coating film 12 can be freely changed according to the shape as described later.
- a method of changing the diameter R of the electron beam and adjusting the aperture of the electron beam can also be adopted.
- the electron beam diameter R may be set to 30 nm, and the scanning range 14 may be adjusted to 80 nm on each side. Needless to say, such a two-stage adjustment can be freely changed according to the purpose.
- the material of the partial coating film 12 is selected so as to satisfy various physical properties required for the nanotube probe, for example, fixing strength, conductivity, rawness, insulation, magnetism, etc ..
- the impurity gas is an organic gas
- the carbon material generated by electron beam decomposition becomes the partial coating film 12.
- the impurity gas is a metal organic gas
- the decomposed metal material is used as the partial coating film.
- the film becomes 12.
- the physical properties can be adjusted by selecting the type of the metal element.
- FIG. 4 is an explanatory diagram of the relationship between the size of the partial coating film 12 and the nanotube diameter d.
- the partial coating film 12 has the following dimensions.
- the length in contact with the protrusion surface 5 in the direction perpendicular to the nanotubes 8 is represented by the coating hem width. Since the partial coating film 12 is of a lost shape, the coating hem width is constant, and the maximum coating hem width W is equal to the coating hem width. Therefore, it may be referred to as the coating hem width W or the maximum coating hem width W.
- the axial length of the partial coating film 12 is given by the coating length L. In this case, since the partial coating film 12 is rectangular, the width of the partial coating film 12 is also equal to the coating length L.
- the diameter of the nanotube 8 is d, and the average thickness of the nanotube is T.
- the durability test shown in (4B) is performed.
- a nanotube 8 fixed to the cantilever protrusion 4 of the cantilever 2 with the first partial coating film 12a and the second partial coating film 12b was used.
- the tip 8 c of the nanotube 8 is brought into contact with the sample surface 48, and an arrow perpendicular to the sample surface 48
- the cantilever was further approached in the direction c, and the nanotube 8 was curved.
- the sample was moved on the sample surface 48 while maintaining this curved state. This test was repeated 100 times, and the fixing strength of the partial coating film 12 was measured.
- Fig. 5 shows the test results.
- each dimension is defined by a rectangular partial coating film, but the shape of the partial coating film 12 is not limited to a square.
- the shape of the partial coating film can be formed in various shapes by changing the beam cross section or the scanning range of the electron beam according to the shape of the cantilever protrusion. As an example,
- (4C) shows the partial coating film 12 formed in an elliptical shape.
- the length from the nanotube to the end of the coating film that becomes the maximum is the maximum coating foot width W
- the length of the nanotube 8 directly pressed in the axial direction is defined as the coating length L.
- the shape of the partial coating film of the nanotube probe used in the durability test shown in (4B) is not limited to a rectangle, but may include an elliptical shape.
- the relationship between the ratio of the maximum coating skirt width W and the coating length L to the nanotube diameter d and the fixing strength of the nanotube almost coincides, at least for the rectangular and elliptical shapes. From this, it can be concluded that the relationship between the nanotube diameter d and each dimension shown in FIG. 5 generally holds unless there is an excessive difference in shape.
- Figure 5 shows the relationship between the nanotube diameter d, each size of the partial coating film, and the fixing strength.
- the fixing strength was judged in four stages: excellent ( ⁇ ), good ( ⁇ ), acceptable ( ⁇ ), and unacceptable (X). The three stages of excellent, good, and acceptable were passed, and unacceptable was rejected. .
- the criteria for “excellent”, “good” and “not good” were determined by taking an AFM image of a standard sample using the tested nanotube probe and judging the sharpness of the image by a skilled person. If this is not possible, various causes can be considered, such as early detachment of the nanotubes and wear of the nanotube tips.
- T was not possible with In nm.
- the result was ⁇ , when it was 3 nm, it was ⁇ , and when it was 4 nm or more, the result was ⁇ . Therefore, it was judged to be acceptable when T was 2 nm or more. That is, in order to have the minimum required fixing strength as a probe in the partial coating film, the average thickness of the partial coating film needs to be 2 nm or more. Furthermore, it has a preferable fixing strength at T ⁇ 3 nm, and has a more preferable fixing strength at T ⁇ 4 nm.
- FIG. 6 is a relationship diagram showing the fixing strength of the nanotube 8 subjected to the etching treatment. It is thought that the etching treatment of the protruding portion of the forcech lever increases the fixing strength of the nanotube by modifying the surface of the protruding portion.
- the etching treatment includes chemical etching using hydrofluoric acid, phosphoric acid, etc., electrolytic etching, plasma etching, laser beam etching, and the like, and various etching methods can be selected according to the purpose.
- the fixed strength was determined by changing WZd, LZd, and T.
- a practically minimum fixed strength is obtained even when the value of / (1 is 0.1. Further, preferably, W / d ⁇ 0.3. Excellent fixing strength is obtained preferably when W / d ⁇ 0.5 or more, as shown in (6B), for LZ d, the minimum required fixing strength is obtained with LZd ⁇ 0.3 . Preferably Excellent fixing strength is obtained when L / d ⁇ 0.5, more preferably L / d ⁇ 0.8. As shown in (6C), for the average coating thickness T, the minimum required fixing strength is obtained at T ⁇ 1 nm. Excellent fixation strength is obtained when T ⁇ 2 nm, more preferably T ⁇ 3 nm.
- the etching treatment increased the strength by one step compared to the case without etching. This is probably because the surface of the protruding part was modified by the etching treatment, and the bonding strength with the nanotube increased.
- the required fixing strength was obtained when W / d ⁇ 0.1, L / d ⁇ 0.3, and T ⁇ 1 nm. It was found that when no etching treatment was performed, the required fixing strength was obtained when W / d ⁇ 0.3, L / d ⁇ 0.5, and T ⁇ 2 nm.
- FIG. 7 is a process chart of a method of fixing the nanotube 8 to the curved cantilever protrusion 4.
- the nanotubes 8 attached to the nanotube placement plate 6 are fixed to the protruding portion curved surface 22 that is curved toward the sharp end 7.
- the nanotube 8 is irradiated with the electron beam 10 to the first fixed portion P1 in contact with the curved surface 22 to form a first partial coating film 12a.
- the nanotube 8 is laid down, and the nanotube 8 is brought into contact with the second fixing point P 2 located near the sharp end 7.
- the second fixed portion P2 is irradiated with an electron beam 10 to form a second partial coating film 12b.
- the nanotube 8 is fixed at at least two points in contact with the curved surface 22, and a predetermined fixing strength is maintained by satisfying the above-mentioned coating conditions.
- the gap 23 existing between the nanotube 8 and the curved surface 22 is not subjected to the coating process, so that the coating time of the coating film is reduced, and the efficient coating process is performed.
- FIG. 8 is an explanatory diagram of a method of fixing the nanotube 8 to the uncurved cantilever protrusion 4.
- the surfaces 5a and 5b of the cantilever protrusion 4 are not curved but are formed in a straight line, and the nanotubes 8 have the first coating film 12a and the second coating film 12b on the surface 5a or 5b. It is fixed by.
- the cantilever 3 is oriented in the Z-axis direction
- the protrusion 4 is arranged in the Y-axis direction
- the nanotube 8 is fixed to the surface 5a.
- the surface of the cantilever protrusion 4 Nanotube 8 is fixed to 5b.
- the nanotube 8 can be fixed to either the surface 5.a or the surface 5b of the cantilever protrusion 4.
- the surface on which the nanotube 8 is mounted can be freely selected by freely controlling the attitude of the nanotube arrangement plate 6 with respect to the protrusion 4.
- FIG. 9 is a process diagram in which the nanotube 8 is disposed so as to pass near the sharp end 7 of the protrusion 4.
- the tip 8c of the nanotube and the sharp end 7 of the protruding portion simultaneously function as a probe, and the captured surface image becomes a double image (double exposure) and the image accuracy is reduced. Resulting in.
- the nanotubes 8 are arranged so as to pass near the sharp ends 7 of the protrusions 4.
- the nanotube placement plate 6 is a source of the nanotubes 8, but the nanotubes 8 are generally oblique to the nanotube placement plate 6.
- the nanotubes 8 are attached to the nanotube placement plate 6 in the attachment area 6a.
- the attachment region 6a is a region where the nanotube 8 and the nanotube arrangement plate 6 are bonded by an intermolecular force. The method of attaching both is out of the scope of the present invention, and is not mentioned.
- the obliquely arranged nanotubes 8 are brought into contact with the cantilever protrusions 4, and the first fixed position P 1, which is the contact point, is irradiated with the electron beam 10 to make the first partial coating film 12 a
- the nanotube 8 is forcibly passed through the sharp end 7.
- this enforcement method In the first method, the nanotube placement plate 6 is moved in the direction of arrow e, and the nanotube 8 is swiveled counterclockwise around the first fixed point P1 as a fulcrum.
- the cantilever protrusion 4 is moved in the direction of arrow f, and the nanotube 8 is turned counterclockwise around the attachment region 6a as a fulcrum. In this way, the arrangement of the nanotubes 8 is corrected so as to pass near the sharp end 7.
- the second fixed portion P2 near the sharp end 7 is irradiated with the electron beam 10 to form the second partial coating film 12b.
- the nanotubes 8 are passed through the first partial coating film 12a and the second It is fixed to the protrusion 4 by the partial coating film 1 2b.
- the vicinity of the sharp end 7 means the position of the sharp end 7 and the vicinity thereof, and it is needless to say that it is optimal that the nanotube 8 directly passes through the position of the sharp end 7.
- FIG. 10 is a process diagram for fixing the nanotube intermediate region with the third partial coating film 12c.
- (10 A) and (10 B) the operation described with reference to FIG. 9 is performed, and the nanotube 8 is applied to the protrusion 4 by the first partial coating film 12 a and the second partial coating film S 12 b Is fixed by Further, in order to increase the fixing strength, the intermediate region between the first partial coating film 12a and the second partial coating film 12b is irradiated with an electron beam 10 to irradiate the third partial coating film 12c.
- a fourth partial coating film or the like can be additionally formed, and the nanotubes can be fixed at multiple points to provide higher strength fixing.
- FIG. 11 is a process diagram of fixing the nanotube 8 to the cantilever protrusion 4 that is concavely curved.
- the side surface of the cantilever protrusion 4 is formed in a concave shape toward the sharp end 7 thereof, and a curved surface 22 is formed.
- the steps of bringing the nanotube 8 into close contact with the curved surface 22 are shown in (11A), (11B) and (11C).
- the first fixed portion P1 below the nanotube 8 is irradiated with the electron beam 10 to form the first partial coating film 12a.
- the nanotube placement plate 6 is moved in the direction of arrow g, and at the same time, the nanotube placement plate 6 is slightly moved in the direction of arrow h, so that the middle region of the nanotube 8 is brought into contact with the curved surface 22. Force to bend. Further, the nanotube 8 is adjusted so as to pass through the sharp end 7 with the first partial coating film 12a as a fulcrum.
- the electron beam 10 is irradiated to the second fixed point P2 in the upper direction of the nanotube 8 that is in close contact with the cantilever protrusion 4, thereby forming the second partial coating film 12b.
- Such close fixation enhances the Van der Waals force between the nanotube 8 and the cantilever protrusion 4, and can fix the nanotube 8 more firmly.
- the nanotubes 8 attached in such a manner project substantially vertically upward from the protrusions 4. Therefore, since the probe is arranged at a right angle to the sample surface, the tip of the nanotube probe stands perpendicular to the unevenness on the sample surface, and the unevenness is detected with high accuracy to reduce erroneous information.
- FIG. 12 is a process diagram in which three nanotubes 8 are fixed to the cantilever protrusions 4 that are formed in a concavely curved shape.
- the nanotubes 8 are formed along the curved surface 22 by the first partial coating film 12 a and the second partial coating film 1. 2 fixes 2 points. At this time, the nanotube 8 is fixed so as to pass through the sharp end 7.
- the third partial coating film 12c is formed by irradiating the intermediate region with an electron beam 10 in order to increase the fixing strength.
- the nanotubes 8 are securely bonded and fixed to the curved surface 22 by the third partial coating film 12 c. Further, if necessary, a fourth partial coating film or the like is formed and the nanotubes 8 are fixed at multiple points, so that the fixing strength can be increased.
- FIG. 13 is a process diagram of fixing the nanotube 8 to the cantilever protrusion 4 which is formed in a convex shape.
- (13A) when the curved surface 22 of the cantilever protrusion 4 is formed in a convex shape toward the sharp end 7, the electron beam 10 is applied to a position below the nanotube 8 to emit the first beam.
- a partial coating film 12a is formed.
- (13B) the upper position of the nanotube 8 is brought into contact with the vicinity of the sharp end 7, and the contact portion is irradiated with the electron beam 10 to form the second partial coating film 12b.
- the fixing method using the partial coating film makes it easy to fix the nanotube to the holder surface having various shapes.
- FIG. 14 is an explanatory diagram of a method for fixing one nanotube 8 from the nanotube group 36.
- An appropriate nanotube 8 to be used as a probe is selected from a group of several to several tens of nanotubes attached to the nanotube placement plate 6.
- the nanotube placement plate 6 may be retracted in the direction of arrow j.
- the protruding portion 4 of the cantilever is retracted in the direction of arrow k, only the selected nanotube 8 can be pulled out.
- a single nanotube 8 is pulled out from the same nanotube placement plate 6 to produce a large number of nanotube probes. be able to. Therefore, the production efficiency of the nanotube probe can be sharply increased.
- an electron microscope was used as a magnifying device, and an electron beam was used to form a partial coating film.
- other magnifying devices and charged beams can be used for any purpose.
- the fixing time can be significantly reduced, and mass production of the nanotube probe and reduction of production cost can be achieved. Can be realized.
- the same nanotube placement plate can be used many times, and the production efficiency of the nanotube probe can be increased.
- nanotube probe with a specified strength can be manufactured only by forming a partial coating film that satisfies the relationship of 1 nm.
- initial energy density of the charged beam, irradiation time, and scanning range (beam deflection width) can be manufactured without the need for skill. It is possible to significantly improve productivity.
- a nanotube probe can be easily manufactured simply by attaching a nanotube to a conventionally used cantilever with a partial coating film, and the production cost can be significantly reduced.
- the intended purpose can be achieved only by partially coating only the contact portion between the curved cantilever protrusion and the nanotube. Even when the contact point between the curved surface and the nanotube is small, if the contact point is partially coated, the same fixing strength as that of the entire surface coating can be obtained. This not only significantly shortens the manufacturing time, but also allows the advanced use of the conventional force cantilever, thereby achieving labor saving.
- the probe function of the sharp end of the protruding part can be sealed off by disposing the nanotube near the sharp end of the protruding part of the cantilever, and a high-precision surface image using only the nanotube probe appears. This can greatly improve the reliability of nanotube probes. In other words, by preventing double exposure, it is possible to accurately detect the nanostructure of a substance sample or a biological sample, and to provide an innovative method as a measurement method of nanotechnology.
- the nanotube probe can be manufactured in a short time, and mass production of the nanotube probe and rapid reduction of the production cost can be realized.
- the nanotube is placed near the sharp end of the protruding part of the forceps, so that the probe function of the protruding part can be sealed off, and a high-precision surface image can be provided using only the nanotube probe. it can. Further, the reliability of the nanotube probe can be greatly improved.
- the nanotube probe can be provided by partially coating and fixing the nanotube on the curved surface, so that the nanotube probe can be configured using a holder having an arbitrary shape, and the nanotube probe can be multi-expanded.
- the van der Waals force of the contact surface acts to provide a durable nanotube probe it can. Further, since the nanotube probe is perpendicular to the sample surface, it is possible to accurately detect unevenness information on the sample surface.
- the fixing operation is performed while directly observing with an electron microscope, a partial coating film can be formed with high accuracy.
- the processing of the nanotubes and the addition of functional materials can be performed reliably in the electron microscope.
- a partial coating film can be formed using an electron beam or an ion beam. Therefore, it is possible to manufacture a nanotube probe using an existing device such as an electron microscope or a focused ion beam device (FIB device). No charged beam generator is required. Electron and ion beams have an established electromagnetic control method, which enables advanced microfabrication.
- the average film thickness, the coating length, and the maximum coating width of the partial coating film can be freely changed only by controlling the scanning range of the electron beam or the ion beam. Therefore, a nanotube probe having a desired fixing strength on an arbitrary shaped holder surface can be manufactured. Further, the beam diameter of the charged beam can be reduced to a minimum, and the amount of impurities in the beam path adhered to the holder surface by the charged beam can be suppressed.
- the nanotube probe according to the present invention can be applied to an ordinary scanning probe microscope.
- Scanning probe microscopes include a scanning tunneling microscope (STM) that detects tunnel current, an atomic force microscope (AFM) that detects surface irregularities by van der Waals force, and a surface friction is detected by frictional force.
- Horizontal force microscope (LFM) Magnetic force microscope (MFM) to detect magnetic interaction between magnetic probe f and sample surface
- FFM Magnetic force microscope
- FFM Magnetic force microscope
- Field force microscope to detect electric field force gradient by applying voltage between sample and probe
- C FM chemical force microscope
- These scanning probe microscopes have in common that they detect the physical and chemical effects unique to the probe with a probe and image the atomic arrangement on the surface. Therefore, if the nanotube probe according to the present invention is applied, the resolution and measurement accuracy can be remarkably improved.
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- Radiology & Medical Imaging (AREA)
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Nanotechnology (AREA)
- Carbon And Carbon Compounds (AREA)
Abstract
Description
Claims
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/570,525 US7511270B2 (en) | 2003-09-08 | 2004-09-08 | Nanotube probe and a method for manufacturing the same |
EP04773076A EP1666867A4 (en) | 2003-09-08 | 2004-09-08 | NANOROPHONE END AND METHOD FOR THE PRODUCTION THEREOF |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003315231A JP2005083857A (ja) | 2003-09-08 | 2003-09-08 | ナノチューブプローブ及び製造方法 |
JP2003-315231 | 2003-09-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO2005024392A1 true WO2005024392A1 (ja) | 2005-03-17 |
Family
ID=34269824
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP2004/013403 WO2005024392A1 (ja) | 2003-09-08 | 2004-09-08 | ナノチューブプローブ及び製造方法 |
Country Status (5)
Country | Link |
---|---|
US (1) | US7511270B2 (ja) |
EP (1) | EP1666867A4 (ja) |
JP (1) | JP2005083857A (ja) |
KR (1) | KR100811324B1 (ja) |
WO (1) | WO2005024392A1 (ja) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20060105848A (ko) * | 2005-04-04 | 2006-10-11 | 주식회사 하이닉스반도체 | 나노 니들 팁을 구비한 프로브 및 이를 이용한 분석 장치 |
US7439731B2 (en) | 2005-06-24 | 2008-10-21 | Crafts Douglas E | Temporary planar electrical contact device and method using vertically-compressible nanotube contact structures |
KR100697323B1 (ko) | 2005-08-19 | 2007-03-20 | 한국기계연구원 | 나노 팁 및 이의 제조방법 |
WO2007047337A2 (en) * | 2005-10-13 | 2007-04-26 | The Regents Of The University Of California | Improved probe system comprising an electric-field-aligned probe tip and method for fabricating the same |
US8130007B2 (en) | 2006-10-16 | 2012-03-06 | Formfactor, Inc. | Probe card assembly with carbon nanotube probes having a spring mechanism therein |
US8354855B2 (en) * | 2006-10-16 | 2013-01-15 | Formfactor, Inc. | Carbon nanotube columns and methods of making and using carbon nanotube columns as probes |
US20080216565A1 (en) * | 2007-03-09 | 2008-09-11 | Donato Ceres | Probe tips |
US8149007B2 (en) * | 2007-10-13 | 2012-04-03 | Formfactor, Inc. | Carbon nanotube spring contact structures with mechanical and electrical components |
JP2009109411A (ja) * | 2007-10-31 | 2009-05-21 | Hitachi Kenki Fine Tech Co Ltd | プローブとその製造方法および走査型プローブ顕微鏡 |
EP2259043A4 (en) * | 2008-02-27 | 2012-06-27 | Japan Science & Tech Agency | CARBON FAN TUBE CARRIER AND METHOD FOR PRODUCING THE CARBON FAN TUBE CARRIER |
JP5292128B2 (ja) | 2009-02-25 | 2013-09-18 | 株式会社日立製作所 | 走査プローブ顕微鏡およびこれを用いた試料の観察方法 |
US8272124B2 (en) * | 2009-04-03 | 2012-09-25 | Formfactor, Inc. | Anchoring carbon nanotube columns |
US20100252317A1 (en) * | 2009-04-03 | 2010-10-07 | Formfactor, Inc. | Carbon nanotube contact structures for use with semiconductor dies and other electronic devices |
US8872176B2 (en) | 2010-10-06 | 2014-10-28 | Formfactor, Inc. | Elastic encapsulated carbon nanotube based electrical contacts |
CN104142410A (zh) * | 2013-05-06 | 2014-11-12 | 中国科学院物理研究所 | 一种扫描隧道显微镜扫描头 |
RU2708530C1 (ru) * | 2019-04-11 | 2019-12-09 | Федеральное государственное бюджетное образовательное учреждение высшего образования "Тверской государственный технический университет" (ТвГТУ) | Зонд сканирующего микроскопа |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000227435A (ja) * | 1998-12-03 | 2000-08-15 | Yoshikazu Nakayama | 電子装置の表面信号操作用プローブ及びその製造方法 |
JP2002243616A (ja) * | 2001-02-13 | 2002-08-28 | Yoshikazu Nakayama | 受発光プローブ及び受発光プローブ装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4332073B2 (ja) * | 2004-06-09 | 2009-09-16 | 喜萬 中山 | 走査型顕微鏡用プローブ |
US7368712B2 (en) * | 2005-12-06 | 2008-05-06 | International Business Machines Corporation | Y-shaped carbon nanotubes as AFM probe for analyzing substrates with angled topography |
-
2003
- 2003-09-08 JP JP2003315231A patent/JP2005083857A/ja active Pending
-
2004
- 2004-09-08 US US10/570,525 patent/US7511270B2/en not_active Expired - Fee Related
- 2004-09-08 EP EP04773076A patent/EP1666867A4/en not_active Withdrawn
- 2004-09-08 KR KR1020067003055A patent/KR100811324B1/ko not_active IP Right Cessation
- 2004-09-08 WO PCT/JP2004/013403 patent/WO2005024392A1/ja active Application Filing
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000227435A (ja) * | 1998-12-03 | 2000-08-15 | Yoshikazu Nakayama | 電子装置の表面信号操作用プローブ及びその製造方法 |
JP2002243616A (ja) * | 2001-02-13 | 2002-08-28 | Yoshikazu Nakayama | 受発光プローブ及び受発光プローブ装置 |
Non-Patent Citations (1)
Title |
---|
See also references of EP1666867A4 * |
Also Published As
Publication number | Publication date |
---|---|
EP1666867A4 (en) | 2009-12-02 |
US7511270B2 (en) | 2009-03-31 |
JP2005083857A (ja) | 2005-03-31 |
KR20060034307A (ko) | 2006-04-21 |
EP1666867A1 (en) | 2006-06-07 |
US20070018098A1 (en) | 2007-01-25 |
KR100811324B1 (ko) | 2008-03-07 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3417721B2 (ja) | 走査プローブ顕微鏡の使用方法 | |
WO2005024392A1 (ja) | ナノチューブプローブ及び製造方法 | |
US20210247336A1 (en) | Device and method for analysing a defect of a photolithographic mask or of a wafer | |
US20070278405A1 (en) | Multi-tip surface cantilever probe | |
US11899359B2 (en) | Method and apparatus for removing a particle from a photolithographic mask | |
US11680963B2 (en) | Method and apparatus for examining a measuring tip of a scanning probe microscope | |
TWI729418B (zh) | 用於檢測及/或處理樣品的裝置和方法 | |
US20060254347A1 (en) | Scanning probe device and processing method by scanning probe | |
JP5452088B2 (ja) | 微小接触式プローバ | |
KR20010074651A (ko) | 집적화된 마이크로컬럼과 주사프로브현미경 어레이 | |
EP2126955A1 (en) | Improved particle beam generator | |
JP5102968B2 (ja) | 導電性針およびその製造方法 | |
JP4427824B2 (ja) | プローブの製造方法、プローブおよび走査型プローブ顕微鏡 | |
JP2002279925A (ja) | 高分解能複合型顕微鏡 | |
Kasama et al. | A versatile three-contact electrical biasing transmission electron microscope specimen holder for electron holography and electron tomography of working devices | |
JP2005342887A (ja) | 静電ナノピンセット及びナノマニピュレータ装置 | |
JP2004233166A (ja) | 原子間遷移エネルギー分析走査プローブ顕微鏡法および原子間遷移エネルギー分析走査プローブ顕微鏡 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A1 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BW BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE EG ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NA NI NO NZ OM PG PH PL PT RO RU SC SD SE SG SK SL SY TJ TM TN TR TT TZ UA UG US UZ VC VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A1 Designated state(s): GM KE LS MW MZ NA SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 1020067003055 Country of ref document: KR |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2004773076 Country of ref document: EP |
|
WWE | Wipo information: entry into national phase |
Ref document number: 2007018098 Country of ref document: US Ref document number: 10570525 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 1020067003055 Country of ref document: KR |
|
WWP | Wipo information: published in national office |
Ref document number: 2004773076 Country of ref document: EP |
|
WWP | Wipo information: published in national office |
Ref document number: 10570525 Country of ref document: US |