WO2004108846A3 - Beschichtungssystem für glasoberflächen, verfahren zu dessen herstellung und dessen anwendung - Google Patents

Beschichtungssystem für glasoberflächen, verfahren zu dessen herstellung und dessen anwendung Download PDF

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Publication number
WO2004108846A3
WO2004108846A3 PCT/EP2004/006026 EP2004006026W WO2004108846A3 WO 2004108846 A3 WO2004108846 A3 WO 2004108846A3 EP 2004006026 W EP2004006026 W EP 2004006026W WO 2004108846 A3 WO2004108846 A3 WO 2004108846A3
Authority
WO
WIPO (PCT)
Prior art keywords
production
coating
coating system
tio2
glass surfaces
Prior art date
Application number
PCT/EP2004/006026
Other languages
English (en)
French (fr)
Other versions
WO2004108846A2 (de
Inventor
Bernd Proft
Martin Dehnen
Petra Gruenberg
Martina Hueber
Original Assignee
Chemetall Gmbh
Sachtleben Chemie Gmbh
Bernd Proft
Martin Dehnen
Petra Gruenberg
Martina Hueber
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Chemetall Gmbh, Sachtleben Chemie Gmbh, Bernd Proft, Martin Dehnen, Petra Gruenberg, Martina Hueber filed Critical Chemetall Gmbh
Priority to EP04739582A priority Critical patent/EP1651581A2/de
Publication of WO2004108846A2 publication Critical patent/WO2004108846A2/de
Publication of WO2004108846A3 publication Critical patent/WO2004108846A3/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0042—Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • G03F7/0043—Chalcogenides; Silicon, germanium, arsenic or derivatives thereof; Metals, oxides or alloys thereof
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/006—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character
    • C03C17/007—Surface treatment of glass, not in the form of fibres or filaments, by coating with materials of composite character containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/42—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions at least one coating of an organic material and at least one non-metal coating
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/44—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the composition of the continuous phase
    • C03C2217/445—Organic continuous phases
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/40—Coatings comprising at least one inhomogeneous layer
    • C03C2217/43—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase
    • C03C2217/46—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase
    • C03C2217/47—Coatings comprising at least one inhomogeneous layer consisting of a dispersed phase in a continuous phase characterized by the dispersed phase consisting of a specific material
    • C03C2217/475—Inorganic materials
    • C03C2217/477—Titanium oxide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/70—Properties of coatings
    • C03C2217/71—Photocatalytic coatings

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Composite Materials (AREA)
  • Metallurgy (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Surface Treatment Of Glass (AREA)
  • Laminated Bodies (AREA)

Abstract

Zusammenfassung Beschrieben wird ein Beschichtungssystem, enthaltend TiO2 und eine auf Silanen und/oder Siloxanen basierenden Beschichtung, wobei das TiO2 eine mittlere Kristallitgröße d50 von 1 bis 100 nm aufweist und die Schichtdicke der TiO2-Schicht 1 bis 1000 nm beträgt. Die Herstellung des Beschichtungssystems erfolgt dadurch, dass auf ein Substrat eine TiO2-Beschichtung und anschliessend eine Silanbeschichtung aufgebracht wird. Verwendung findet das Beschichtungssystem bei der Herstellung 'selbstreinigender', bzw. pflegeleichter Oberflächen (z.B. Glasoberflächen) und der Erzeugung von Oberflächen mit schaltbaren hydrophoben und hydrophilen Eigenschaften, z.B. bei der Herstellung von Druckplatten oder Trommeln, die mit UV-Strahlung beschrieben werden.
PCT/EP2004/006026 2003-06-05 2004-06-04 Beschichtungssystem für glasoberflächen, verfahren zu dessen herstellung und dessen anwendung WO2004108846A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP04739582A EP1651581A2 (de) 2003-06-05 2004-06-04 Beschichtungssystem f r glasoberflächen, verfahren zu dessen herstellung und dessen anwendung

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10325768.3 2003-06-05
DE2003125768 DE10325768A1 (de) 2003-06-05 2003-06-05 Beschichtungssystem für Glasoberflächen, Verfahren zu dessen Herstellung und dessen Anwendung

Publications (2)

Publication Number Publication Date
WO2004108846A2 WO2004108846A2 (de) 2004-12-16
WO2004108846A3 true WO2004108846A3 (de) 2005-07-14

Family

ID=33482657

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2004/006026 WO2004108846A2 (de) 2003-06-05 2004-06-04 Beschichtungssystem für glasoberflächen, verfahren zu dessen herstellung und dessen anwendung

Country Status (3)

Country Link
EP (1) EP1651581A2 (de)
DE (1) DE10325768A1 (de)
WO (1) WO2004108846A2 (de)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US7862910B2 (en) 2006-04-11 2011-01-04 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
USRE43817E1 (en) 2004-07-12 2012-11-20 Cardinal Cg Company Low-maintenance coatings
CN112080165B (zh) * 2020-09-24 2021-06-22 福州大学 一种具有抗菌功能的超疏水性薄膜材料的制备方法

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* Cited by examiner, † Cited by third party
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JPWO2006088079A1 (ja) * 2005-02-18 2008-07-03 日本曹達株式会社 有機無機複合体
DE102005035673A1 (de) * 2005-07-29 2007-02-01 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Photokatalytisches Schichtsystem mit hohem Schalthub
US20080011599A1 (en) 2006-07-12 2008-01-17 Brabender Dennis M Sputtering apparatus including novel target mounting and/or control
US9465296B2 (en) 2010-01-12 2016-10-11 Rolith, Inc. Nanopatterning method and apparatus
CN101830636B (zh) * 2010-03-02 2011-12-14 株洲旗滨集团股份有限公司 一种低so3含量浮法玻璃的制造方法
US10155361B2 (en) * 2011-11-09 2018-12-18 Corning Incorporated Method of binding nanoparticles to glass
WO2013107583A1 (en) 2012-01-19 2013-07-25 Unilever Plc Fabric treatment method and composition
US10351467B2 (en) 2015-06-01 2019-07-16 Hakko Sangyo Co., Ltd. Glass lining, method for manufacturing glass lining and method for cleaning glass-lined articles
US10604442B2 (en) 2016-11-17 2020-03-31 Cardinal Cg Company Static-dissipative coating technology
CN108359282A (zh) * 2018-01-09 2018-08-03 佛山优维士光电科技有限公司 一种用于低压气体放电汞灯的纳米二氧化钛水溶胶涂料的制备方法
CN108467209A (zh) * 2018-04-19 2018-08-31 王建蕊 一种健康汽车玻璃
CN110372225B (zh) * 2019-07-24 2020-10-23 北京科技大学 具有多尺度结构的高效冷凝亲水疏水薄膜涂层的制备方法

Citations (2)

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Publication number Priority date Publication date Assignee Title
US6037289A (en) * 1995-09-15 2000-03-14 Rhodia Chimie Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions
US6294313B1 (en) * 1997-08-08 2001-09-25 Dai Nippon Printing Co., Ltd. Pattern forming body, pattern forming method, and their applications

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JPH0959042A (ja) * 1995-06-14 1997-03-04 Toto Ltd 防曇性コーティングを備えた透明基材
JPH0959041A (ja) * 1995-06-14 1997-03-04 Toto Ltd 光触媒を含有する防曇性コーティング組成物
FR2738813B1 (fr) * 1995-09-15 1997-10-17 Saint Gobain Vitrage Substrat a revetement photo-catalytique
JPH09231821A (ja) * 1995-12-22 1997-09-05 Toto Ltd 照明器具及び照度維持方法
JPH10182189A (ja) * 1996-12-25 1998-07-07 Toto Ltd 建築用窓ガラス
DE19938551A1 (de) * 1999-08-18 2001-02-22 Penth Bernd Hydrophobe Beschichtung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6037289A (en) * 1995-09-15 2000-03-14 Rhodia Chimie Titanium dioxide-based photocatalytic coating substrate, and titanium dioxide-based organic dispersions
US6294313B1 (en) * 1997-08-08 2001-09-25 Dai Nippon Printing Co., Ltd. Pattern forming body, pattern forming method, and their applications

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE43817E1 (en) 2004-07-12 2012-11-20 Cardinal Cg Company Low-maintenance coatings
USRE44155E1 (en) 2004-07-12 2013-04-16 Cardinal Cg Company Low-maintenance coatings
US7862910B2 (en) 2006-04-11 2011-01-04 Cardinal Cg Company Photocatalytic coatings having improved low-maintenance properties
US7820309B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coatings, and methods for producing low-maintenance coatings
US7820296B2 (en) 2007-09-14 2010-10-26 Cardinal Cg Company Low-maintenance coating technology
CN112080165B (zh) * 2020-09-24 2021-06-22 福州大学 一种具有抗菌功能的超疏水性薄膜材料的制备方法

Also Published As

Publication number Publication date
WO2004108846A2 (de) 2004-12-16
DE10325768A1 (de) 2004-12-23
EP1651581A2 (de) 2006-05-03

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