WO2004034146A3 - Beleuchtungssystem mit einer vorrichtung zur einstellung der lichtintensität - Google Patents
Beleuchtungssystem mit einer vorrichtung zur einstellung der lichtintensität Download PDFInfo
- Publication number
- WO2004034146A3 WO2004034146A3 PCT/EP2003/009370 EP0309370W WO2004034146A3 WO 2004034146 A3 WO2004034146 A3 WO 2004034146A3 EP 0309370 W EP0309370 W EP 0309370W WO 2004034146 A3 WO2004034146 A3 WO 2004034146A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- lighting system
- radiation source
- light intensity
- object plane
- adjusting
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
- G03F7/70558—Dose control, i.e. achievement of a desired dose
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03807802A EP1550004A2 (de) | 2002-09-30 | 2003-08-23 | Beleuchtungssystem mit einer vorrichtung zur einstellung der lichtintensit t |
AU2003258657A AU2003258657A1 (en) | 2002-09-30 | 2003-08-23 | Lighting system comprising a device for adjusting the light intensity |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10245625 | 2002-09-30 | ||
DE10245625.9 | 2002-09-30 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2004034146A2 WO2004034146A2 (de) | 2004-04-22 |
WO2004034146A3 true WO2004034146A3 (de) | 2004-08-05 |
Family
ID=32086837
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/009370 WO2004034146A2 (de) | 2002-09-30 | 2003-08-23 | Beleuchtungssystem mit einer vorrichtung zur einstellung der lichtintensität |
Country Status (3)
Country | Link |
---|---|
EP (1) | EP1550004A2 (de) |
AU (1) | AU2003258657A1 (de) |
WO (1) | WO2004034146A2 (de) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102007025846A1 (de) * | 2007-06-01 | 2008-12-11 | Carl Zeiss Smt Ag | Beleuchtungssystem mit wenigstens einem akustooptischen Spiegel |
DE102007041004A1 (de) | 2007-08-29 | 2009-03-05 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die EUV-Mikrolithografie |
DE102012218221A1 (de) * | 2012-10-05 | 2014-04-10 | Carl Zeiss Smt Gmbh | Monitorsystem zum Bestimmen von Orientierungen von Spiegelelementen und EUV-Lithographiesystem |
Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5574537A (en) * | 1993-04-15 | 1996-11-12 | Nikon Corporation | Apparatus for controlling light quantity using acousto-optic modulator for selecting 0th-order diffracted beam |
EP0987601A2 (de) * | 1998-09-17 | 2000-03-22 | Nikon Corporation | Belichtungsapparat und Belichtungsverfahren unter Verwendung derselben |
US6106139A (en) * | 1997-10-30 | 2000-08-22 | Nikon Corporation | Illumination optical apparatus and semiconductor device manufacturing method |
US20010010580A1 (en) * | 1993-02-24 | 2001-08-02 | Kazuaki Suzuki | Exposure control apparatus and method |
WO2001079935A1 (en) * | 2000-04-17 | 2001-10-25 | Micronic Laser Systems Ab | Pattern generation system using a spatial light modulator |
US20030044701A1 (en) * | 2001-08-30 | 2003-03-06 | Boettiger Ulrich C. | Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates |
US20030179458A1 (en) * | 2002-03-25 | 2003-09-25 | Osamu Osawa | Light exposure apparatus and light emitting device therefor |
-
2003
- 2003-08-23 EP EP03807802A patent/EP1550004A2/de not_active Withdrawn
- 2003-08-23 AU AU2003258657A patent/AU2003258657A1/en not_active Abandoned
- 2003-08-23 WO PCT/EP2003/009370 patent/WO2004034146A2/de not_active Application Discontinuation
Patent Citations (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20010010580A1 (en) * | 1993-02-24 | 2001-08-02 | Kazuaki Suzuki | Exposure control apparatus and method |
US5574537A (en) * | 1993-04-15 | 1996-11-12 | Nikon Corporation | Apparatus for controlling light quantity using acousto-optic modulator for selecting 0th-order diffracted beam |
US6106139A (en) * | 1997-10-30 | 2000-08-22 | Nikon Corporation | Illumination optical apparatus and semiconductor device manufacturing method |
EP0987601A2 (de) * | 1998-09-17 | 2000-03-22 | Nikon Corporation | Belichtungsapparat und Belichtungsverfahren unter Verwendung derselben |
WO2001079935A1 (en) * | 2000-04-17 | 2001-10-25 | Micronic Laser Systems Ab | Pattern generation system using a spatial light modulator |
US20030044701A1 (en) * | 2001-08-30 | 2003-03-06 | Boettiger Ulrich C. | Method and apparatus for controlling radiation beam intensity directed to microlithographic substrates |
US20030179458A1 (en) * | 2002-03-25 | 2003-09-25 | Osamu Osawa | Light exposure apparatus and light emitting device therefor |
Also Published As
Publication number | Publication date |
---|---|
WO2004034146A2 (de) | 2004-04-22 |
AU2003258657A8 (en) | 2004-05-04 |
AU2003258657A1 (en) | 2004-05-04 |
EP1550004A2 (de) | 2005-07-06 |
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