AU2003258657A8 - Lighting system comprising a device for adjusting the light intensity - Google Patents

Lighting system comprising a device for adjusting the light intensity

Info

Publication number
AU2003258657A8
AU2003258657A8 AU2003258657A AU2003258657A AU2003258657A8 AU 2003258657 A8 AU2003258657 A8 AU 2003258657A8 AU 2003258657 A AU2003258657 A AU 2003258657A AU 2003258657 A AU2003258657 A AU 2003258657A AU 2003258657 A8 AU2003258657 A8 AU 2003258657A8
Authority
AU
Australia
Prior art keywords
adjusting
light intensity
lighting system
lighting
intensity
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003258657A
Other versions
AU2003258657A1 (en
Inventor
Frank Melzer
Manfred Maul
Joachim Hainz
Martin Antoni
Wolfgang Singer
Markus Weiss
Johannes Wangler
Joachim Wietzorrek
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2003258657A8 publication Critical patent/AU2003258657A8/en
Publication of AU2003258657A1 publication Critical patent/AU2003258657A1/en
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70558—Dose control, i.e. achievement of a desired dose
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
AU2003258657A 2002-09-30 2003-08-23 Lighting system comprising a device for adjusting the light intensity Abandoned AU2003258657A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE10245625.9 2002-09-30
DE10245625 2002-09-30
PCT/EP2003/009370 WO2004034146A2 (en) 2002-09-30 2003-08-23 Lighting system comprising a device for adjusting the light intensity

Publications (2)

Publication Number Publication Date
AU2003258657A8 true AU2003258657A8 (en) 2004-05-04
AU2003258657A1 AU2003258657A1 (en) 2004-05-04

Family

ID=32086837

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003258657A Abandoned AU2003258657A1 (en) 2002-09-30 2003-08-23 Lighting system comprising a device for adjusting the light intensity

Country Status (3)

Country Link
EP (1) EP1550004A2 (en)
AU (1) AU2003258657A1 (en)
WO (1) WO2004034146A2 (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102007025846A1 (en) * 2007-06-01 2008-12-11 Carl Zeiss Smt Ag Illumination system with at least one acousto-optical mirror
DE102007041004A1 (en) 2007-08-29 2009-03-05 Carl Zeiss Smt Ag Illumination lens for use in scanner-type projection illumination system e.g. stepper, for extreme ultraviolet microlithography, has correction element arranged in optical path of ultraviolet radiation between radiation source and location
DE102012218221A1 (en) * 2012-10-05 2014-04-10 Carl Zeiss Smt Gmbh Monitor system for determining orientations of mirror elements and EUV lithography system

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3235078B2 (en) * 1993-02-24 2001-12-04 株式会社ニコン Scanning exposure method, exposure control device, scanning type exposure device, and device manufacturing method
JPH06302491A (en) * 1993-04-15 1994-10-28 Nikon Corp Exposure quantity controller
US6106139A (en) * 1997-10-30 2000-08-22 Nikon Corporation Illumination optical apparatus and semiconductor device manufacturing method
JP2000100685A (en) * 1998-09-17 2000-04-07 Nikon Corp Aligner and exposure method using the same
SE517550C2 (en) * 2000-04-17 2002-06-18 Micronic Laser Systems Ab Pattern generation system using a spatial light modulator
US6794100B2 (en) * 2001-08-30 2004-09-21 Micron Technology, Inc. Method for controlling radiation beam intensity directed to microlithographic substrates
JP2003282412A (en) * 2002-03-25 2003-10-03 Ushio Inc Light irradiation apparatus

Also Published As

Publication number Publication date
EP1550004A2 (en) 2005-07-06
AU2003258657A1 (en) 2004-05-04
WO2004034146A2 (en) 2004-04-22
WO2004034146A3 (en) 2004-08-05

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase