WO2004001480A3 - Katadioptrisches reduktionsobjektiv - Google Patents

Katadioptrisches reduktionsobjektiv Download PDF

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Publication number
WO2004001480A3
WO2004001480A3 PCT/EP2003/006680 EP0306680W WO2004001480A3 WO 2004001480 A3 WO2004001480 A3 WO 2004001480A3 EP 0306680 W EP0306680 W EP 0306680W WO 2004001480 A3 WO2004001480 A3 WO 2004001480A3
Authority
WO
WIPO (PCT)
Prior art keywords
deviating
projection objective
polarization
objective
catadioptric
Prior art date
Application number
PCT/EP2003/006680
Other languages
English (en)
French (fr)
Other versions
WO2004001480A2 (de
Inventor
Birgit Mecking
Olaf Dittmann
Toralf Gruner
Vladimir Kamenov
Martin Brunotte
Original Assignee
Zeiss Carl Smt Ag
Birgit Mecking
Olaf Dittmann
Toralf Gruner
Vladimir Kamenov
Martin Brunotte
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Birgit Mecking, Olaf Dittmann, Toralf Gruner, Vladimir Kamenov, Martin Brunotte filed Critical Zeiss Carl Smt Ag
Priority to JP2004514856A priority Critical patent/JP2005531021A/ja
Priority to AU2003242756A priority patent/AU2003242756A1/en
Publication of WO2004001480A2 publication Critical patent/WO2004001480A2/de
Publication of WO2004001480A3 publication Critical patent/WO2004001480A3/de
Priority to US11/019,202 priority patent/US20050190446A1/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

Ein katadioptrisches Projektionsobjektiv zur Abbildung eines in der Objektebene des Projektionsobjektivs angeordneten Musters in die Bildebene des Projektionsobjektivs hat zwischen Objektebene und Bildebene einen katadioptrischen Objektivteil mit einen Konkavspiegel (17) und einem ersten Umlenkspiegel (16) sowie mindestens einen zweiten Umlenkspiegel (19). Im Lichtweg zwischen den Umlenkspiegeln wird die Polarisationsvorzugsrichtung des Lichtes mit Hilfe einer Polarisationsdreheinrichtung (26) um ca. 90° gedreht. Dadurch können polarisationsabhängige Reflektivitäts- und Phasenwirkungsunterschiede der Umlenkspiegel mindestens teilweise kompensiert werden. Hierdurch ist eine Abbildung mit weitgehend gleichem Kontrast für alle Strukturrichtungen möglich.
PCT/EP2003/006680 2002-06-25 2003-06-25 Katadioptrisches reduktionsobjektiv WO2004001480A2 (de)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2004514856A JP2005531021A (ja) 2002-06-25 2003-06-25 反射屈折縮小対物レンズ
AU2003242756A AU2003242756A1 (en) 2002-06-25 2003-06-25 Catadioptric reduction objective
US11/019,202 US20050190446A1 (en) 2002-06-25 2004-12-23 Catadioptric reduction objective

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2002129614 DE10229614A1 (de) 2002-06-25 2002-06-25 Katadioptrisches Reduktionsobjektiv
DE10229614.6 2002-06-25

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US11/019,202 Continuation US20050190446A1 (en) 2002-06-25 2004-12-23 Catadioptric reduction objective

Publications (2)

Publication Number Publication Date
WO2004001480A2 WO2004001480A2 (de) 2003-12-31
WO2004001480A3 true WO2004001480A3 (de) 2004-05-13

Family

ID=29723625

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/006680 WO2004001480A2 (de) 2002-06-25 2003-06-25 Katadioptrisches reduktionsobjektiv

Country Status (4)

Country Link
JP (1) JP2005531021A (de)
AU (1) AU2003242756A1 (de)
DE (1) DE10229614A1 (de)
WO (1) WO2004001480A2 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102830500A (zh) * 2012-09-10 2012-12-19 上海激光等离子体研究所 光束偏振旋转装置及偏振旋转方法

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10338983A1 (de) 2003-08-20 2005-03-17 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithografie
US7405808B2 (en) 2003-12-19 2008-07-29 Carl Zeiss Smt Ag Optical system, in particular illumination system, of a microlithographic projection exposure apparatus
DE102004026518A1 (de) * 2004-05-21 2005-12-15 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithografie
EP1759248A1 (de) * 2004-06-04 2007-03-07 Carl Zeiss SMT AG Projektionssystem mit kompensation von intensitätsschwankungen und kompensationselement dafür
US7345740B2 (en) * 2004-12-28 2008-03-18 Asml Netherlands B.V. Polarized radiation in lithographic apparatus and device manufacturing method
EP1726994A3 (de) 2005-05-25 2007-08-08 Carl Zeiss SMT AG Lichtintegrator für ein Beleuchtungssystem, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
WO2008110501A1 (de) * 2007-03-13 2008-09-18 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0602923A1 (de) * 1992-12-14 1994-06-22 Canon Kabushiki Kaisha Belichtungsvorrichtung unter Verwendung von einem katadioptrischen Projektionssystem
EP1001295A1 (de) * 1998-11-10 2000-05-17 Carl Zeiss Polarisationsoptisch kompensiertes Objektiv
US6324003B1 (en) * 1999-12-23 2001-11-27 Silicon Valley Group, Inc. Calcium fluoride (CaF2) stress plate and method of making the same
US20010052968A1 (en) * 2000-03-31 2001-12-20 Takahisa Shiozawa Exposure apparatus and device manufacturing method
US6351305B1 (en) * 1993-06-30 2002-02-26 Nikon Corporation Exposure apparatus and exposure method for transferring pattern onto a substrate
US6377338B1 (en) * 1998-08-18 2002-04-23 Nikon Corporation Exposure apparatus and method
US20030058421A1 (en) * 2001-06-28 2003-03-27 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
WO2003077011A1 (en) * 2002-03-14 2003-09-18 Carl Zeiss Smt Ag Optical system with birefringent optical elements

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19807120A1 (de) * 1998-02-20 1999-08-26 Zeiss Carl Fa Optisches System mit Polarisationskompensator
DE10117481A1 (de) * 2001-04-07 2002-10-10 Zeiss Carl Katadioptrisches Projektionsobjektiv

Patent Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0602923A1 (de) * 1992-12-14 1994-06-22 Canon Kabushiki Kaisha Belichtungsvorrichtung unter Verwendung von einem katadioptrischen Projektionssystem
US6351305B1 (en) * 1993-06-30 2002-02-26 Nikon Corporation Exposure apparatus and exposure method for transferring pattern onto a substrate
US6377338B1 (en) * 1998-08-18 2002-04-23 Nikon Corporation Exposure apparatus and method
EP1001295A1 (de) * 1998-11-10 2000-05-17 Carl Zeiss Polarisationsoptisch kompensiertes Objektiv
US6324003B1 (en) * 1999-12-23 2001-11-27 Silicon Valley Group, Inc. Calcium fluoride (CaF2) stress plate and method of making the same
US20010052968A1 (en) * 2000-03-31 2001-12-20 Takahisa Shiozawa Exposure apparatus and device manufacturing method
US20030058421A1 (en) * 2001-06-28 2003-03-27 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
WO2003077011A1 (en) * 2002-03-14 2003-09-18 Carl Zeiss Smt Ag Optical system with birefringent optical elements

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
BURNETT J H ET AL: "INTRINSIC BIREFRINGENCE IN CALCIUM FLUORIDE AND BARIUM FLUORIDE", PHYSICAL REVIEW, B. CONDENSED MATTER, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 64, no. 24, 15 December 2001 (2001-12-15), pages 241102 - 1-241102-4, XP001098828, ISSN: 0163-1829 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102830500A (zh) * 2012-09-10 2012-12-19 上海激光等离子体研究所 光束偏振旋转装置及偏振旋转方法
CN102830500B (zh) * 2012-09-10 2015-03-18 上海激光等离子体研究所 光束偏振旋转装置及偏振旋转方法

Also Published As

Publication number Publication date
AU2003242756A1 (en) 2004-01-06
AU2003242756A8 (en) 2004-01-06
JP2005531021A (ja) 2005-10-13
WO2004001480A2 (de) 2003-12-31
DE10229614A1 (de) 2004-01-15

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