AU2003242756A1 - Catadioptric reduction objective - Google Patents

Catadioptric reduction objective

Info

Publication number
AU2003242756A1
AU2003242756A1 AU2003242756A AU2003242756A AU2003242756A1 AU 2003242756 A1 AU2003242756 A1 AU 2003242756A1 AU 2003242756 A AU2003242756 A AU 2003242756A AU 2003242756 A AU2003242756 A AU 2003242756A AU 2003242756 A1 AU2003242756 A1 AU 2003242756A1
Authority
AU
Australia
Prior art keywords
reduction objective
catadioptric reduction
catadioptric
objective
reduction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003242756A
Other languages
English (en)
Other versions
AU2003242756A8 (en
Inventor
Martin Brunotte
Olaf Dittmann
Toralf Gruner
Vladimir Kamenov
Birgit Mecking
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of AU2003242756A1 publication Critical patent/AU2003242756A1/en
Publication of AU2003242756A8 publication Critical patent/AU2003242756A8/xx
Abandoned legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70308—Optical correction elements, filters or phase plates for manipulating imaging light, e.g. intensity, wavelength, polarisation, phase or image shift
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
    • G03F7/70966—Birefringence

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
AU2003242756A 2002-06-25 2003-06-25 Catadioptric reduction objective Abandoned AU2003242756A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE2002129614 DE10229614A1 (de) 2002-06-25 2002-06-25 Katadioptrisches Reduktionsobjektiv
DE10229614.6 2002-06-25
PCT/EP2003/006680 WO2004001480A2 (de) 2002-06-25 2003-06-25 Katadioptrisches reduktionsobjektiv

Publications (2)

Publication Number Publication Date
AU2003242756A1 true AU2003242756A1 (en) 2004-01-06
AU2003242756A8 AU2003242756A8 (en) 2004-01-06

Family

ID=29723625

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003242756A Abandoned AU2003242756A1 (en) 2002-06-25 2003-06-25 Catadioptric reduction objective

Country Status (4)

Country Link
JP (1) JP2005531021A (de)
AU (1) AU2003242756A1 (de)
DE (1) DE10229614A1 (de)
WO (1) WO2004001480A2 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10338983A1 (de) 2003-08-20 2005-03-17 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithografie
US7405808B2 (en) 2003-12-19 2008-07-29 Carl Zeiss Smt Ag Optical system, in particular illumination system, of a microlithographic projection exposure apparatus
DE102004026518A1 (de) * 2004-05-21 2005-12-15 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithografie
EP1759248A1 (de) * 2004-06-04 2007-03-07 Carl Zeiss SMT AG Projektionssystem mit kompensation von intensitätsschwankungen und kompensationselement dafür
US7345740B2 (en) * 2004-12-28 2008-03-18 Asml Netherlands B.V. Polarized radiation in lithographic apparatus and device manufacturing method
EP1726994A3 (de) 2005-05-25 2007-08-08 Carl Zeiss SMT AG Lichtintegrator für ein Beleuchtungssystem, insbesondere für eine mikrolithographische Projektionsbelichtungsanlage
WO2008110501A1 (de) * 2007-03-13 2008-09-18 Carl Zeiss Smt Ag Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage
CN102830500B (zh) * 2012-09-10 2015-03-18 上海激光等离子体研究所 光束偏振旋转装置及偏振旋转方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2698521B2 (ja) * 1992-12-14 1998-01-19 キヤノン株式会社 反射屈折型光学系及び該光学系を備える投影露光装置
US5729331A (en) * 1993-06-30 1998-03-17 Nikon Corporation Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
DE19807120A1 (de) * 1998-02-20 1999-08-26 Zeiss Carl Fa Optisches System mit Polarisationskompensator
US6451507B1 (en) * 1998-08-18 2002-09-17 Nikon Corporation Exposure apparatus and method
DE19851749A1 (de) * 1998-11-10 2000-05-11 Zeiss Carl Fa Polarisationsoptisch kompensiertes Objektiv
US6324003B1 (en) * 1999-12-23 2001-11-27 Silicon Valley Group, Inc. Calcium fluoride (CaF2) stress plate and method of making the same
JP3927753B2 (ja) * 2000-03-31 2007-06-13 キヤノン株式会社 露光装置及びデバイス製造方法
DE10117481A1 (de) * 2001-04-07 2002-10-10 Zeiss Carl Katadioptrisches Projektionsobjektiv
US6831731B2 (en) * 2001-06-28 2004-12-14 Nikon Corporation Projection optical system and an exposure apparatus with the projection optical system
WO2003077011A1 (en) * 2002-03-14 2003-09-18 Carl Zeiss Smt Ag Optical system with birefringent optical elements

Also Published As

Publication number Publication date
AU2003242756A8 (en) 2004-01-06
JP2005531021A (ja) 2005-10-13
WO2004001480A2 (de) 2003-12-31
WO2004001480A3 (de) 2004-05-13
DE10229614A1 (de) 2004-01-15

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Legal Events

Date Code Title Description
MK6 Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase