WO2003107400A2 - Acid etching mixture having reduced water content - Google Patents
Acid etching mixture having reduced water content Download PDFInfo
- Publication number
- WO2003107400A2 WO2003107400A2 PCT/US2003/019079 US0319079W WO03107400A2 WO 2003107400 A2 WO2003107400 A2 WO 2003107400A2 US 0319079 W US0319079 W US 0319079W WO 03107400 A2 WO03107400 A2 WO 03107400A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- acid
- etching
- amount
- mixture
- fluorosulfonic
- Prior art date
Links
- 238000005530 etching Methods 0.000 title claims abstract description 200
- 239000000203 mixture Substances 0.000 title claims abstract description 164
- 239000002253 acid Substances 0.000 title claims abstract description 117
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title claims abstract description 91
- UQSQSQZYBQSBJZ-UHFFFAOYSA-N fluorosulfonic acid Chemical compound OS(F)(=O)=O UQSQSQZYBQSBJZ-UHFFFAOYSA-N 0.000 claims abstract description 56
- 229910052710 silicon Inorganic materials 0.000 claims abstract description 33
- 239000010703 silicon Substances 0.000 claims abstract description 33
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 claims description 108
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 70
- 238000000034 method Methods 0.000 claims description 67
- 230000008569 process Effects 0.000 claims description 55
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 claims description 41
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 32
- 150000007513 acids Chemical class 0.000 claims description 28
- 235000011007 phosphoric acid Nutrition 0.000 claims description 20
- 239000007921 spray Substances 0.000 claims description 9
- 230000003247 decreasing effect Effects 0.000 claims description 7
- 239000000758 substrate Substances 0.000 claims description 6
- 239000011260 aqueous acid Substances 0.000 claims description 4
- 238000010924 continuous production Methods 0.000 claims description 3
- 230000007423 decrease Effects 0.000 claims description 3
- 230000006872 improvement Effects 0.000 claims description 2
- 238000002360 preparation method Methods 0.000 abstract 1
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 24
- 235000012431 wafers Nutrition 0.000 description 15
- 239000003795 chemical substances by application Substances 0.000 description 14
- 238000005498 polishing Methods 0.000 description 14
- 238000004519 manufacturing process Methods 0.000 description 11
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 6
- 230000002378 acidificating effect Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- ZODDGFAZWTZOSI-UHFFFAOYSA-N nitric acid;sulfuric acid Chemical compound O[N+]([O-])=O.OS(O)(=O)=O ZODDGFAZWTZOSI-UHFFFAOYSA-N 0.000 description 4
- 239000007858 starting material Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 230000007062 hydrolysis Effects 0.000 description 3
- 150000007524 organic acids Chemical class 0.000 description 3
- 235000005985 organic acids Nutrition 0.000 description 3
- 230000002035 prolonged effect Effects 0.000 description 3
- 229910005185 FSO3H Inorganic materials 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 2
- 239000000969 carrier Substances 0.000 description 2
- 238000003486 chemical etching Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000003647 oxidation Effects 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical compound OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 238000007517 polishing process Methods 0.000 description 2
- 238000012545 processing Methods 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 235000012239 silicon dioxide Nutrition 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000000725 suspension Substances 0.000 description 2
- 230000008016 vaporization Effects 0.000 description 2
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 230000003292 diminished effect Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 230000003301 hydrolyzing effect Effects 0.000 description 1
- 238000012994 industrial processing Methods 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 230000001788 irregular Effects 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 150000007522 mineralic acids Chemical class 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical compound OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- ABTOQLMXBSRXSM-UHFFFAOYSA-N silicon tetrafluoride Chemical compound F[Si](F)(F)F ABTOQLMXBSRXSM-UHFFFAOYSA-N 0.000 description 1
- 238000010561 standard procedure Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 238000004448 titration Methods 0.000 description 1
- 239000003039 volatile agent Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02002—Preparing wafers
- H01L21/02005—Preparing bulk and homogeneous wafers
- H01L21/02008—Multistep processes
- H01L21/0201—Specific process step
- H01L21/02019—Chemical etching
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Definitions
- the invention relates to an acid etching mixture having reduced water content.
- said water content can be reduced by adding fluorosulfonic acid to acidic compositions containing water.
- Said etching mixture is useful in etching silicon.
- silicon wafers can be etched in spray etching processes or spin etching processes.
- water content affecting etching quality can be advantageously regulated and can be kept constant during the etching process.
- Silicon is a very important material because of its semiconducting properties. For example it is used in the manufacture of solar cells and integrated circuits.
- the other application relates exclusively to the manufacture of very thin structural elements with application in multi chip packages or flexible carriers, as for example smart cards.
- the wafers are first ground down mechanically. Afterwards the damaged and uneven areas are etched in a chemical etching process isotropically, what means regular to all space directions, to provide polished surfaces.
- etching agents consisting mainly of mixtures of sulfuric acid and hydrogen fluoride or aqueous hydrogen fluoride.
- nitric(v) acid and orthophosphoric acid can be added.
- the prior art has attempted to improve the selectivity and the etching rate of the etching process by modification of the relative ratios of the ingredients used.
- Etching agents or etching mixtures which are preferably useful in producing textured surfaces typically contain more than 80 % of sulfuric acid, up to 10 % of nitric(v) acid and up to 5 % of hydrogen fluoride, wherein the total amount of all compounds being present in the etching mixture is 100 % (% by weight).
- Said etching mixtures are known as texture etching agents.
- Etching agents that produce an extended degradation with formation of a polished surface must have a clearly reduced amount of sulfuric acid of from 10 to 20 % and approximately an amount of orthophosphoric acid of from 10 % to 20 %. However said etching mixtures must have a considerably increased amount of nitric(v) acid in the range of from 20 to 50 %.
- the content of hydrogen fluoride can be between 2 and 20 % (% by weight).
- Said etching mixtures are known as polishing etching agents.
- the commercially available acids used in said etching mixtures typically contain water. Therefor the resulting etching mixtures contain water, too. In general polishing etching mixtures contain a higher amount of water than texture etching mixtures.
- a process for the manufacture of an acid etching mixture characterized in that fluorosulfonic acid is reacted with an acidic composition containing water.
- Said acids are known products, which are manufactured commercially. They are readily available.
- the water content of the acid etching mixtures of the invention can vary within a relatively large range. However said content is preferably below about 40 % by weight, wherein the total amount of all components being present in the etching mixture is 100 % by weight. It is important that said water content can be kept relatively constant during the etching process.
- the acid etching mixture of the invention is advantageous to provide a higher water content in order to achieve sufficiently high etching rates.
- the water content is preferably reduced to an amount from about 15 to about 35 %, and the content of acids present in the etching mixtures is preferably from about 20 to about 40 % nitric(v) acid, from about 5 to 35 % sulfuric acid, from about 5 to 25 % aqueous hydrofluoric acid, and from about 5 to about 20 % phosphoric acid, wherein the total amount of all components being present in the etching mixture is 100 % (% by weight).
- Said acid will be metered into the etching mixture to the extent that the concentration of the hydrogen fluoride in the mixture has been diminished.
- concentration of acid and water can be kept constant during the etching process, because the water content being increased for the moment is reduced again, which provides very constant and advantageous etching processes for silicon wafers.
- the increase of the water content can be avoided in a prolonged process, thereby keeping the etching rate constant. Reconcentration with aqueous hydrogen fluoride as described in the prior art would result in a disadvantageous increase of the water content.
- the composition of the etching bath can be maintained for a longer period than with an etching mixture of the prior art.
- the parameters relevant for the etching process for example the viscosity, can be kept constant, too.
- the invention provides an acid etching mixture, characterized in that said mixture is obtained by hydrolysis of fluorosulfonic acid, wherein the hydrolysis is carried out in the presence of one or more further acids selected from nitric(v) acid, sulfuric acid, hydrofluoric acid and orthophosphoric acid.
- said acid etching mixtures wherein the water content is reduced by fluorosulfonic acid, can be applied in spray etching processes or spin etching processes. Said processes can be carried out in spray etching plants or spin etching plants.
- single-disc processes are carried out to an increasing degree in spin etching plants.
- wafers of a thickness of, for example, 750 ⁇ m are ground down mechanically to a thickness of approximately 250 ⁇ m followed by chemical etching down to about 40 ⁇ m.
- Said etching process can be carried out in several steps, first with a fast acting etching mixture, which takes away from about 50 to about 100 ⁇ m, followed by slow polishing with a slow acting etching mixture, which takes away of from about 5 to about 30 ⁇ m.
- the temperature is preferably from about 20 to about 50°C. Lower temperatures mostly result in higher selectivity and decreased etching rate. Higher temperatures mostly result in higher etching rates and decreased selectivity.
- Etching mixtures were prepared by mixing commercial sulfuric acid (96 % by weight in water), nitric(v) acid (70 % by weight in water), aqueous hydrofluoric acid (50 % by weight in water), orthophosphoric acid (85 % by weight in water), and fluorosulfonic acid (100 % by weight).
- the amounts of acids and the compositions of the mixtures with water content are listed in the following tables.
- the compositions of the mixtures were checked according to standard methods, for example the water content with the well known titration according to Karl Fischer.
- Table 1 starting material (amount in % by weight)
- Table 3 shows the acids used as starting material and the amounts of said acids in polishing etching agents, table 4 the resulting compositions.
Landscapes
- Engineering & Computer Science (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Chemical & Material Sciences (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP03737149A EP1516356A2 (en) | 2002-06-18 | 2003-06-18 | Acid etching mixture having reduced water content |
KR10-2004-7020659A KR20050013143A (en) | 2002-06-18 | 2003-06-18 | Acid etching mixture having reduced water content |
AU2003238253A AU2003238253A1 (en) | 2002-06-18 | 2003-06-18 | Acid etching mixture having reduced water content |
JP2004514122A JP2005530045A (en) | 2002-06-18 | 2003-06-18 | Acid etching mixture with reduced water content |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/174,174 US20030230548A1 (en) | 2002-06-18 | 2002-06-18 | Acid etching mixture having reduced water content |
US10/174,174 | 2002-06-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003107400A2 true WO2003107400A2 (en) | 2003-12-24 |
WO2003107400A3 WO2003107400A3 (en) | 2004-04-15 |
Family
ID=29733511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US2003/019079 WO2003107400A2 (en) | 2002-06-18 | 2003-06-18 | Acid etching mixture having reduced water content |
Country Status (7)
Country | Link |
---|---|
US (1) | US20030230548A1 (en) |
EP (1) | EP1516356A2 (en) |
JP (1) | JP2005530045A (en) |
KR (1) | KR20050013143A (en) |
CN (1) | CN1679146A (en) |
AU (1) | AU2003238253A1 (en) |
WO (1) | WO2003107400A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102656250A (en) * | 2009-09-21 | 2012-09-05 | 巴斯夫欧洲公司 | Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7067015B2 (en) * | 2002-10-31 | 2006-06-27 | Texas Instruments Incorporated | Modified clean chemistry and megasonic nozzle for removing backside CMP slurries |
JP2006100799A (en) * | 2004-09-06 | 2006-04-13 | Sumco Corp | Method of manufacturing silicon wafer |
JP4642001B2 (en) * | 2006-10-24 | 2011-03-02 | 関東化学株式会社 | Composition for removing photoresist residue and polymer residue |
DE102007004060B4 (en) * | 2007-01-22 | 2013-03-21 | Gp Solar Gmbh | Use of an etching solution comprising water, nitric acid and sulfuric acid and etching process |
TWI358467B (en) * | 2007-12-07 | 2012-02-21 | Nanya Technology Corp | Etchant for metal alloy having hafnium and molybde |
DE102007061687B4 (en) | 2007-12-19 | 2010-04-29 | Cpi Chemiepark Institut Gmbh | Process for the matt etching of silicon substrates and etching mixture for carrying out the method |
DE102009007136A1 (en) * | 2009-02-02 | 2010-08-12 | Sovello Ag | Etching mixture for producing a structured surface on silicon substrates |
CN102534620A (en) * | 2010-12-08 | 2012-07-04 | 无锡华润上华科技有限公司 | Wet-process silicon etching solution for P-type wafer |
SG192574A1 (en) * | 2011-03-11 | 2013-09-30 | Fujifilm Electronic Materials | Novel etching composition |
US8894877B2 (en) | 2011-10-19 | 2014-11-25 | Lam Research Ag | Method, apparatus and composition for wet etching |
US8986559B2 (en) * | 2012-02-29 | 2015-03-24 | Avantor Performance Materials, Inc. | Compositions and methods for texturing polycrystalline silicon wafers |
CN104624512A (en) * | 2015-01-21 | 2015-05-20 | 江西久顺科技有限公司 | Method for sorting P-type heavy-doped silicon material and N-type heavy-doped silicon material in dyeing manner |
JP6803842B2 (en) | 2015-04-13 | 2020-12-23 | ハネウェル・インターナショナル・インコーポレーテッドHoneywell International Inc. | Polysiloxane formulations and coatings for optoelectronic applications |
TWI538986B (en) * | 2015-07-15 | 2016-06-21 | 綠能科技股份有限公司 | Etching solution and method of surface roughening of silicon substrate |
CN113299551B (en) * | 2021-04-27 | 2023-05-02 | 南昌大学 | Method for regulating and controlling semiconductor corrosion area |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1383662A (en) * | 1964-03-05 | 1964-12-24 | Bayer Ag | Improved process for regenerating pickling baths containing hydrofluoric acid and sulfuric acid |
EP0304857A2 (en) * | 1987-08-27 | 1989-03-01 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH | Process and apparatus for etching the surface of semiconductors |
EP0618612A2 (en) * | 1993-03-23 | 1994-10-05 | Matsushita Electric Industrial Co., Ltd. | Method of cleaning semiconductor device and equipment for cleaning semiconductor device |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6092500A (en) * | 1983-10-26 | 1985-05-24 | Mitsubishi Heavy Ind Ltd | Liquid composition for electropolishing niobium material and its preparation |
US5300463A (en) * | 1992-03-06 | 1994-04-05 | Micron Technology, Inc. | Method of selectively etching silicon dioxide dielectric layers on semiconductor wafers |
DE19805525C2 (en) * | 1998-02-11 | 2002-06-13 | Sez Semiconduct Equip Zubehoer | Process for wet-etching semiconductor wafers to produce a defined edge region by under-etching |
-
2002
- 2002-06-18 US US10/174,174 patent/US20030230548A1/en not_active Abandoned
-
2003
- 2003-06-18 EP EP03737149A patent/EP1516356A2/en not_active Withdrawn
- 2003-06-18 KR KR10-2004-7020659A patent/KR20050013143A/en not_active Application Discontinuation
- 2003-06-18 WO PCT/US2003/019079 patent/WO2003107400A2/en not_active Application Discontinuation
- 2003-06-18 JP JP2004514122A patent/JP2005530045A/en not_active Withdrawn
- 2003-06-18 CN CNA038196425A patent/CN1679146A/en active Pending
- 2003-06-18 AU AU2003238253A patent/AU2003238253A1/en not_active Abandoned
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1383662A (en) * | 1964-03-05 | 1964-12-24 | Bayer Ag | Improved process for regenerating pickling baths containing hydrofluoric acid and sulfuric acid |
EP0304857A2 (en) * | 1987-08-27 | 1989-03-01 | Wacker-Chemitronic Gesellschaft für Elektronik-Grundstoffe mbH | Process and apparatus for etching the surface of semiconductors |
EP0618612A2 (en) * | 1993-03-23 | 1994-10-05 | Matsushita Electric Industrial Co., Ltd. | Method of cleaning semiconductor device and equipment for cleaning semiconductor device |
Non-Patent Citations (2)
Title |
---|
DATABASE WPI Section Ch, Week 198527 Derwent Publications Ltd., London, GB; Class L03, AN 1985-162319 XP002265596 & JP 60 092500 A (MITSUBISHI HEAVY IND CO LTD) 24 May 1985 (1985-05-24) * |
DÖRING, KARLHEINZ SPRECHSAAL vol. 116, no. 5, 1983, pages 366 - 370, XP001091350 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102656250A (en) * | 2009-09-21 | 2012-09-05 | 巴斯夫欧洲公司 | Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates |
CN102656250B (en) * | 2009-09-21 | 2015-02-25 | 巴斯夫欧洲公司 | Aqueous acidic etching solution and method for texturing the surface of single crystal and polycrystal silicon substrates |
Also Published As
Publication number | Publication date |
---|---|
WO2003107400A3 (en) | 2004-04-15 |
JP2005530045A (en) | 2005-10-06 |
KR20050013143A (en) | 2005-02-02 |
US20030230548A1 (en) | 2003-12-18 |
EP1516356A2 (en) | 2005-03-23 |
CN1679146A (en) | 2005-10-05 |
AU2003238253A8 (en) | 2003-12-31 |
AU2003238253A1 (en) | 2003-12-31 |
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