WO2003077279A3 - Vorrichtung zur aktivierung von gasen in vakuum mittels hohlkathodenglimmentladung - Google Patents

Vorrichtung zur aktivierung von gasen in vakuum mittels hohlkathodenglimmentladung Download PDF

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Publication number
WO2003077279A3
WO2003077279A3 PCT/EP2003/000152 EP0300152W WO03077279A3 WO 2003077279 A3 WO2003077279 A3 WO 2003077279A3 EP 0300152 W EP0300152 W EP 0300152W WO 03077279 A3 WO03077279 A3 WO 03077279A3
Authority
WO
WIPO (PCT)
Prior art keywords
hollow cathode
cathode discharge
vacuum
gas
activating gases
Prior art date
Application number
PCT/EP2003/000152
Other languages
English (en)
French (fr)
Other versions
WO2003077279A2 (de
Inventor
Thomas Jung
Original Assignee
Fraunhofer Ges Forschung
Thomas Jung
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fraunhofer Ges Forschung, Thomas Jung filed Critical Fraunhofer Ges Forschung
Priority to EP03743795A priority Critical patent/EP1483773A2/de
Publication of WO2003077279A2 publication Critical patent/WO2003077279A2/de
Publication of WO2003077279A3 publication Critical patent/WO2003077279A3/de

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32018—Glow discharge
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/4697—Generating plasma using glow discharges
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/335—Cleaning

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

Die Erfindung betrifft eine Vorrichtung zur Aktivierung eines durch die Vorrichtung strömenden Gases mittels Hohlkathoden-Glimmmentladung, die aus einem mit mindestens einer Gaszuleitung (4) und mindestens einer Öffnung (5) für den Gasaustritt versehenen Gehäuse (6), einer Hohlkathode sowie einem durch das Gehäuse begrenzten Innenraum (3) mit einer darin angeordneten Anode (2) besteht, und die Dimensionierung der mindestens einen Öffnung für den Gasaustritt im Verhältnis zur Wandstärke der Hohlkathode derart gewählt ist, dass die Hohlkathoden-Glimmentladung auf den Innenraum begrenzt ist.
PCT/EP2003/000152 2002-03-14 2003-01-09 Vorrichtung zur aktivierung von gasen in vakuum mittels hohlkathodenglimmentladung WO2003077279A2 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP03743795A EP1483773A2 (de) 2002-03-14 2003-01-09 Vorrichtung zur aktivierung von gasen im vakuum

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10211332A DE10211332B4 (de) 2002-03-14 2002-03-14 Vorrichtung und Verfahren zur Aktivierung von Gasen im Vakuum sowie Verwendung der Vorrichtung
DE10211332.7 2002-03-14

Publications (2)

Publication Number Publication Date
WO2003077279A2 WO2003077279A2 (de) 2003-09-18
WO2003077279A3 true WO2003077279A3 (de) 2004-03-25

Family

ID=27797776

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/000152 WO2003077279A2 (de) 2002-03-14 2003-01-09 Vorrichtung zur aktivierung von gasen in vakuum mittels hohlkathodenglimmentladung

Country Status (3)

Country Link
EP (1) EP1483773A2 (de)
DE (1) DE10211332B4 (de)
WO (1) WO2003077279A2 (de)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10352516B4 (de) * 2003-11-04 2011-08-11 Samsung Mobile Display Co. Ltd., Gyeonggi Verfahren und Vorrichtung zur Abscheidung dünner Schichten auf einem organischen Substrat

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5069770A (en) * 1990-07-23 1991-12-03 Eastman Kodak Company Sputtering process employing an enclosed sputtering target
DE19722056A1 (de) * 1997-05-27 1998-12-03 Roland Dr Gesche Verfahren und Anordnung zum Herstellen dünner Schichten mittels Niederdruck-Gasentladung in einer Hohlkathode

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19902146C2 (de) * 1999-01-20 2003-07-31 Fraunhofer Ges Forschung Verfahren und Einrichtung zur gepulsten Plasmaaktivierung
US6246059B1 (en) * 1999-03-06 2001-06-12 Advanced Ion Technology, Inc. Ion-beam source with virtual anode
DE10060002B4 (de) * 1999-12-07 2016-01-28 Komatsu Ltd. Vorrichtung zur Oberflächenbehandlung

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5069770A (en) * 1990-07-23 1991-12-03 Eastman Kodak Company Sputtering process employing an enclosed sputtering target
DE19722056A1 (de) * 1997-05-27 1998-12-03 Roland Dr Gesche Verfahren und Anordnung zum Herstellen dünner Schichten mittels Niederdruck-Gasentladung in einer Hohlkathode

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
FUSAO SHIMOKAWA ET AL: "NEW HIGH-POWER FAST ATOM BEAM SOURCE", JOURNAL OF VACUUM SCIENCE AND TECHNOLOGY: PART A, AMERICAN INSTITUTE OF PHYSICS. NEW YORK, US, vol. 12, no. 5, 1 September 1994 (1994-09-01), pages 2739 - 2744, XP000476646, ISSN: 0734-2101 *
NGO M T ET AL: "THE TEMPORAL DEVELOPMENT OF HOLLOW CATHODE DISCHARGES", IEEE TRANSACTIONS ON PLASMA SCIENCE, IEEE INC. NEW YORK, US, vol. 18, no. 3, June 1990 (1990-06-01), pages 669 - 676, XP000961529, ISSN: 0093-3813 *

Also Published As

Publication number Publication date
DE10211332B4 (de) 2009-07-02
WO2003077279A2 (de) 2003-09-18
DE10211332A1 (de) 2003-10-02
EP1483773A2 (de) 2004-12-08

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