WO2003075097A3 - Objectif de projection refractif dote d'une taille - Google Patents

Objectif de projection refractif dote d'une taille Download PDF

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Publication number
WO2003075097A3
WO2003075097A3 PCT/EP2003/001651 EP0301651W WO03075097A3 WO 2003075097 A3 WO2003075097 A3 WO 2003075097A3 EP 0301651 W EP0301651 W EP 0301651W WO 03075097 A3 WO03075097 A3 WO 03075097A3
Authority
WO
WIPO (PCT)
Prior art keywords
lens
diameter
lens array
light beam
refractive projection
Prior art date
Application number
PCT/EP2003/001651
Other languages
German (de)
English (en)
Other versions
WO2003075097A2 (fr
Inventor
Karl-Heinz Schuster
Original Assignee
Zeiss Carl Smt Ag
Karl-Heinz Schuster
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10229249A external-priority patent/DE10229249A1/de
Application filed by Zeiss Carl Smt Ag, Karl-Heinz Schuster filed Critical Zeiss Carl Smt Ag
Priority to EP03706529A priority Critical patent/EP1481286A2/fr
Priority to AU2003208872A priority patent/AU2003208872A1/en
Priority to US10/645,302 priority patent/US6891683B2/en
Publication of WO2003075097A2 publication Critical patent/WO2003075097A2/fr
Publication of WO2003075097A3 publication Critical patent/WO2003075097A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

L'invention concerne un objectif de projection réfractif pour microlithographie, comprenant un dispositif de lentilles dans lequel toutes les lentilles sont en un même matériau, et présentant une ouverture numérique (NA) côté image supérieure à 0,7, le faisceau lumineux (23) transmettant le dispositif de lentilles (21) dans une région située en amont d'un diaphragme (19) du système agencé dans le dispositif de lentilles (21) sur la longueur égale au plus grand diamètre du faisceau lumineux (25) ou du diamètre de lentille maximal dans le dispositif de lentilles (21) étant plus grand que 85 % du plus grand diamètre de faisceau lumineux (25) ou du diamètre de lentille maximal.
PCT/EP2003/001651 2002-03-01 2003-02-19 Objectif de projection refractif dote d'une taille WO2003075097A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP03706529A EP1481286A2 (fr) 2002-03-01 2003-02-19 Objectif de projection refractif dote d'une taille
AU2003208872A AU2003208872A1 (en) 2002-03-01 2003-02-19 Refractive projection lens with a middle part
US10/645,302 US6891683B2 (en) 2002-03-01 2003-08-21 Refractive projection objective with a waist

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US36084502P 2002-03-01 2002-03-01
US60/360,845 2002-03-01
DE10221243 2002-05-13
DE10221243.0 2002-05-13
DE10229249A DE10229249A1 (de) 2002-03-01 2002-06-28 Refraktives Projektionsobjektiv mit einer Taille
DE10229249.3 2002-06-28

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/645,302 Continuation US6891683B2 (en) 2002-03-01 2003-08-21 Refractive projection objective with a waist

Publications (2)

Publication Number Publication Date
WO2003075097A2 WO2003075097A2 (fr) 2003-09-12
WO2003075097A3 true WO2003075097A3 (fr) 2003-11-13

Family

ID=27791836

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/001651 WO2003075097A2 (fr) 2002-03-01 2003-02-19 Objectif de projection refractif dote d'une taille

Country Status (3)

Country Link
EP (1) EP1481286A2 (fr)
AU (1) AU2003208872A1 (fr)
WO (1) WO2003075097A2 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10229249A1 (de) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refraktives Projektionsobjektiv mit einer Taille
US7092069B2 (en) 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
DE10210899A1 (de) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refraktives Projektionsobjektiv für Immersions-Lithographie

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
EP1111425A2 (fr) * 1999-12-21 2001-06-27 Carl Zeiss Système à projection optique

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
EP1111425A2 (fr) * 1999-12-21 2001-06-27 Carl Zeiss Système à projection optique

Also Published As

Publication number Publication date
EP1481286A2 (fr) 2004-12-01
WO2003075097A2 (fr) 2003-09-12
AU2003208872A1 (en) 2003-09-16

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