WO2003075097A2 - Objectif de projection refractif dote d'une taille - Google Patents

Objectif de projection refractif dote d'une taille Download PDF

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Publication number
WO2003075097A2
WO2003075097A2 PCT/EP2003/001651 EP0301651W WO03075097A2 WO 2003075097 A2 WO2003075097 A2 WO 2003075097A2 EP 0301651 W EP0301651 W EP 0301651W WO 03075097 A2 WO03075097 A2 WO 03075097A2
Authority
WO
WIPO (PCT)
Prior art keywords
lens
waist
diameter
projection
si02hl
Prior art date
Application number
PCT/EP2003/001651
Other languages
German (de)
English (en)
Other versions
WO2003075097A3 (fr
Inventor
Karl-Heinz Schuster
Original Assignee
Carl Zeiss Smt Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10229249A external-priority patent/DE10229249A1/de
Application filed by Carl Zeiss Smt Ag filed Critical Carl Zeiss Smt Ag
Priority to EP03706529A priority Critical patent/EP1481286A2/fr
Priority to AU2003208872A priority patent/AU2003208872A1/en
Priority to US10/645,302 priority patent/US6891683B2/en
Publication of WO2003075097A2 publication Critical patent/WO2003075097A2/fr
Publication of WO2003075097A3 publication Critical patent/WO2003075097A3/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Definitions

  • Figure 2 Refractive projection lens for microlithography for the
  • a third lens group LG2 is formed by the subsequent Luisen with the surfaces 16-21.
  • This third lens group LG2 has an overall negative refractive power and a clearly pronounced waist 29 is formed by this lens group.
  • This lens group is followed by a fourth lens group LG3, which has an elongated tubular shape, and a system aperture 19 is arranged in this fourth Luisen group.
  • this lens group LG3 On the side facing the third lens group LG2, this lens group LG3 has a sub-group UG3a which has low positive refractive power.
  • a weakly formed waist UG3b which is formed by two negative lenses, which have a large Durlininserser, n at least 85% of the maximum diameter. These two consecutive negative lises form a weak waist UG3b.
  • a K 1 of 0.32 was rolled.
  • the K ⁇ value varies between 0.27 and 0.35.
  • the code number KCHL can make a comparison between different refractory lithography designs with regard to the generation of the chromatic longitudinal error under the conditions of image field, bandwidth of the light source and material dispersion of the lenses used. If the lens consists only of one material, only this one material dispersion is used. If the lens consists of several materials, each lens receives a synthetic replacement material with a refractive index as before, but with a uniform, selectable dispersion for calculating the replacement CHL.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Optical Elements Other Than Lenses (AREA)

Abstract

L'invention concerne un objectif de projection réfractif pour microlithographie, comprenant un dispositif de lentilles dans lequel toutes les lentilles sont en un même matériau, et présentant une ouverture numérique (NA) côté image supérieure à 0,7, le faisceau lumineux (23) transmettant le dispositif de lentilles (21) dans une région située en amont d'un diaphragme (19) du système agencé dans le dispositif de lentilles (21) sur la longueur égale au plus grand diamètre du faisceau lumineux (25) ou du diamètre de lentille maximal dans le dispositif de lentilles (21) étant plus grand que 85 % du plus grand diamètre de faisceau lumineux (25) ou du diamètre de lentille maximal.
PCT/EP2003/001651 2002-03-01 2003-02-19 Objectif de projection refractif dote d'une taille WO2003075097A2 (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
EP03706529A EP1481286A2 (fr) 2002-03-01 2003-02-19 Objectif de projection refractif dote d'une taille
AU2003208872A AU2003208872A1 (en) 2002-03-01 2003-02-19 Refractive projection lens with a middle part
US10/645,302 US6891683B2 (en) 2002-03-01 2003-08-21 Refractive projection objective with a waist

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US36084502P 2002-03-01 2002-03-01
US60/360,845 2002-03-01
DE10221243.0 2002-05-13
DE10221243 2002-05-13
DE10229249.3 2002-06-28
DE10229249A DE10229249A1 (de) 2002-03-01 2002-06-28 Refraktives Projektionsobjektiv mit einer Taille

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/645,302 Continuation US6891683B2 (en) 2002-03-01 2003-08-21 Refractive projection objective with a waist

Publications (2)

Publication Number Publication Date
WO2003075097A2 true WO2003075097A2 (fr) 2003-09-12
WO2003075097A3 WO2003075097A3 (fr) 2003-11-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/001651 WO2003075097A2 (fr) 2002-03-01 2003-02-19 Objectif de projection refractif dote d'une taille

Country Status (3)

Country Link
EP (1) EP1481286A2 (fr)
AU (1) AU2003208872A1 (fr)
WO (1) WO2003075097A2 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6891683B2 (en) 2002-03-01 2005-05-10 Carl Zeiss Smt Ag Refractive projection objective with a waist
US6891596B2 (en) 2002-03-08 2005-05-10 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
US7092069B2 (en) 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
EP1111425A2 (fr) * 1999-12-21 2001-06-27 Carl Zeiss Système à projection optique

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19855108A1 (de) * 1998-11-30 2000-05-31 Zeiss Carl Fa Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
EP1111425A2 (fr) * 1999-12-21 2001-06-27 Carl Zeiss Système à projection optique

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6891683B2 (en) 2002-03-01 2005-05-10 Carl Zeiss Smt Ag Refractive projection objective with a waist
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
US7382540B2 (en) 2002-03-01 2008-06-03 Carl Zeiss Smt Ag Refractive projection objective
US6891596B2 (en) 2002-03-08 2005-05-10 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
US7092069B2 (en) 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system
US7312847B2 (en) 2002-03-08 2007-12-25 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography

Also Published As

Publication number Publication date
EP1481286A2 (fr) 2004-12-01
WO2003075097A3 (fr) 2003-11-13
AU2003208872A1 (en) 2003-09-16

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