WO2003075097A3 - Refractive projection lens with a middle part - Google Patents

Refractive projection lens with a middle part Download PDF

Info

Publication number
WO2003075097A3
WO2003075097A3 PCT/EP2003/001651 EP0301651W WO03075097A3 WO 2003075097 A3 WO2003075097 A3 WO 2003075097A3 EP 0301651 W EP0301651 W EP 0301651W WO 03075097 A3 WO03075097 A3 WO 03075097A3
Authority
WO
WIPO (PCT)
Prior art keywords
lens
diameter
lens array
light beam
refractive projection
Prior art date
Application number
PCT/EP2003/001651
Other languages
German (de)
French (fr)
Other versions
WO2003075097A2 (en
Inventor
Karl-Heinz Schuster
Original Assignee
Zeiss Carl Smt Ag
Karl-Heinz Schuster
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10229249A external-priority patent/DE10229249A1/en
Application filed by Zeiss Carl Smt Ag, Karl-Heinz Schuster filed Critical Zeiss Carl Smt Ag
Priority to AU2003208872A priority Critical patent/AU2003208872A1/en
Priority to EP03706529A priority patent/EP1481286A2/en
Priority to US10/645,302 priority patent/US6891683B2/en
Publication of WO2003075097A2 publication Critical patent/WO2003075097A2/en
Publication of WO2003075097A3 publication Critical patent/WO2003075097A3/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Abstract

Disclosed is a refractive projection lens used in microlithography, which comprises a lens array in which all lenses are made of one material, and which has a numerical aperture (NA) of more than 0.7 on the image side. The light beam (23) transmitting through the lens array (21) is greater than 85 percent of the largest diameter (25) of the light beam or the maximum lens diameter in the area located upstream from a system diaphragm (19) which is disposed in the lens array (21) along a distance that is equal to the greatest diameter (25) of the light beam or the maximum lens diameter in the lens array (21).
PCT/EP2003/001651 2002-03-01 2003-02-19 Refractive projection lens with a middle part WO2003075097A2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
AU2003208872A AU2003208872A1 (en) 2002-03-01 2003-02-19 Refractive projection lens with a middle part
EP03706529A EP1481286A2 (en) 2002-03-01 2003-02-19 Refractive projection lens with a middle part
US10/645,302 US6891683B2 (en) 2002-03-01 2003-08-21 Refractive projection objective with a waist

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US36084502P 2002-03-01 2002-03-01
US60/360,845 2002-03-01
DE10221243 2002-05-13
DE10221243.0 2002-05-13
DE10229249.3 2002-06-28
DE10229249A DE10229249A1 (en) 2002-03-01 2002-06-28 Refractive projection lens with a waist

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US10/645,302 Continuation US6891683B2 (en) 2002-03-01 2003-08-21 Refractive projection objective with a waist

Publications (2)

Publication Number Publication Date
WO2003075097A2 WO2003075097A2 (en) 2003-09-12
WO2003075097A3 true WO2003075097A3 (en) 2003-11-13

Family

ID=27791836

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/001651 WO2003075097A2 (en) 2002-03-01 2003-02-19 Refractive projection lens with a middle part

Country Status (3)

Country Link
EP (1) EP1481286A2 (en)
AU (1) AU2003208872A1 (en)
WO (1) WO2003075097A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10229249A1 (en) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refractive projection lens with a waist
US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10210899A1 (en) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refractive projection lens for immersion lithography
US7092069B2 (en) 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19855108A1 (en) * 1998-11-30 2000-05-31 Zeiss Carl Fa Microlithographic reduction lens, projection exposure system and method
EP1111425A2 (en) * 1999-12-21 2001-06-27 Carl Zeiss Optical projection system

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19855108A1 (en) * 1998-11-30 2000-05-31 Zeiss Carl Fa Microlithographic reduction lens, projection exposure system and method
EP1111425A2 (en) * 1999-12-21 2001-06-27 Carl Zeiss Optical projection system

Also Published As

Publication number Publication date
AU2003208872A1 (en) 2003-09-16
EP1481286A2 (en) 2004-12-01
WO2003075097A2 (en) 2003-09-12

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