EP1481286A2 - Refractive projection lens with a middle part - Google Patents

Refractive projection lens with a middle part

Info

Publication number
EP1481286A2
EP1481286A2 EP03706529A EP03706529A EP1481286A2 EP 1481286 A2 EP1481286 A2 EP 1481286A2 EP 03706529 A EP03706529 A EP 03706529A EP 03706529 A EP03706529 A EP 03706529A EP 1481286 A2 EP1481286 A2 EP 1481286A2
Authority
EP
European Patent Office
Prior art keywords
lens
waist
diameter
projection
si02hl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP03706529A
Other languages
German (de)
French (fr)
Inventor
Karl-Heinz Schuster
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from DE10229249A external-priority patent/DE10229249A1/en
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of EP1481286A2 publication Critical patent/EP1481286A2/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
    • G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Definitions

  • the invention relates to a pi-projection exposure system with a refralctive projection lens, a refractive projection lens itself and a method for producing ⁇ rdl ⁇ osü ⁇ Murierter components in which a projection treatment with a refralctive projection lens is used.
  • this refractive projection lens all lenses are made of one material, the projection lens having a numerical aperture of greater than 0.7 on the image side.
  • AI refractive prescription lenses which are designed for an exposure wavelength of 248.4 ⁇ m, are known, the lenses of the prescription lenses being made of a material that has a refractive index of 1.50839, such as quartz glass, at the exposure wavelength ,
  • the occurrence of coma can also be minimized.
  • aberrations in particular spherical aberration, associated with a high numerical aperture can be corrected.
  • Such a correction is also possible by providing an asphere in the fourth lens group, provided that the asphere is arranged close to the image plane.
  • a refractive projection objective is known from DE 199 39 038 AI, in which chromatic aberrations are tapered by the combination of two or more types of fluoride crystals.
  • the projection lens shown in FIG. 11, which is designed for the wavelength 157nm, has several aspheres. Calcium fluoride and lithium fluoride are in particular provided for this wavelength.
  • Refactive lens arrangements are known from EP 1 139 138 AI, the lenses used being made of the materials calcium fluoride and quartz glass.
  • An exemplary embodiment is shown in which all lenses consist of calcium fluoride, this lens being designed for an exposure wavelength of 157 nm.
  • the other lens arrangements shown are designed for the exposure wavelength of 193 mn. All lens arrangements shown have a plurality of aspheres.
  • the use of calcium fluoride, for example, in a lens arrangement designed for the exposure wavelength of 193 nm is associated with the disadvantage that this material is more difficult to obtain on the one hand like quartz glass and on the other hand it is also considerably more expensive.
  • the invention has for its object to provide refractive lens arrangements or a projection exposure system for microlithography with a refralctive projection lens with a high numerical aperture and good optical properties.
  • the invention was based on the object of providing refractive lens arrangements for microlithography which are distinguished by low longitudinal color errors with a high numerical aperture.
  • the invention was also based on the object of providing refractive lens arrangements, the manufacture of which is reduced.
  • the lens is said to be particularly suitable for the wavelengths of 157 nanometers and 193 nanometers.
  • the arrangement and design of the lenses are possible even under the complex conditions of a high Mü ⁇ Olithograp e-projection objective measures regarding which result in a significant reduction in longitudinal chromatic aberration for a lens material of a given dispersion, it has proved 'to be advantageous to shift the positive refractive power towards the image in order to reduce the longitudinal color error hold.
  • Negative lenses with a small bundle cross-section must be located on the object side far from the system aperture.
  • the high-quality Petzval koi ⁇ ektur required for such a lens arrangement requires the formation of waists with a negative refractive power.
  • the longitudinal color error can be kept small. It has also proven advantageous to shift positive refractive power towards the image.
  • the arrangement of doublets consisting of a positive lens and a negative lens after the first waist with a large lens diameter of at least 85% of the maximum lens diameter or light bundle diameter gives an optimal correction possibility with regard to all aperture-dependent non-axial image errors without generating longitudinal color errors.
  • the area in front of the system panel and the panel area itself is predestined for the occurrence of longitudinal color errors. Because of this problem, it has proven to be advantageous to arrange doublets in the area in front of and around the system diaphragm, in each of which a positive lens is provided, to which a close partner of reversed refractive power is assigned in the case of similar light-tuft diameters. It has proven to be particularly advantageous to provide doublets that have a total refractive power that is less than 20% of the refractive power between the aperture and the wafer. The outer shape of the doublets resembles a thick, bent meniscus, which has a relatively low refractive index.
  • Figure 1 Projection exposure system for microHthography
  • Figure 2 Refractive projection lens for microlithography for the
  • Exposure wavelength 193nm that with a length of 1340.7 mm has a numerical aperture of 0.8;
  • Figure 3 projection lens for the wavelength 193nm that with an overall length of
  • Length of 1390 mm has a numerical aperture of 0.85;
  • Figure 5 Projection lens for the wavelength of 157 n with an emergence of
  • the basic structure of a projection exposure system 1, which comprises a refractive projection objective 5, is first described with reference to FIG. 1.
  • the projection exposure system 1 has an exposure device 3 which is provided with a device for narrowing the bandwidth.
  • the projection objective 5 comprises a lens arrangement 21 with a system diaphragm 19, an optical axis 7 being defined by the lens arrangement 21.
  • a mask 9 is arranged between the exposure direction 3 and the projection objective 5 and is held in the beam path by means of a mask holder 11.
  • Such masks 9 used in milalithithography have a micrometer to nanometer pattern, which are imaged on the image plane 13 by the projection objective 5 down to a factor of 10, in particular by a factor of 4.
  • a substrate or egg 15 positioned by a substrate holder 17 is held in the image plane 13.
  • the still resolvable basic structures depend on the wavelength of the light used for the exposure and on the numerical aperture of the projection lens 5 and the de factor of the humidification device 3.
  • a maximum achievable resolution of the projection exposure system 1 increases with decreasing wavelength of the light bundle 23 provided by the exposure device 3, by means of which the pattern of the mask 9 is imaged on the wafer 15 by means of the projection objective 5.
  • the refractive lens arrangement 21 shown in FIG. 2 is designed for the exposure length of 193 nanometers and has an image-side numerical aperture of 0.8.
  • This lens arrangement 21 comprises 31 lises, 9 of which have at least one aspherical lens surface. Such Luisen are also called asphere.
  • This lens arrangement 21 can be divided into three lens groups LG1 to LG3.
  • the first lens group LG1 has positive refractive power and comprises the lenses with the areas 2-15.
  • This lens group can in turn be subdivided into an opening group EG1, which has negative refractive power and comprises the first three lenses.
  • a belly is formed by the Luisen following the entrance group EG1.
  • These thick positive lenses have a positive effect on the Petzval sum.
  • the last lens of the lens group LG1 is aspherized on the lens surface arranged on the wafer side.
  • These thick positive lenses also make a favorable contribution in terms of coma orrelcture.
  • the second lens group LG2 comprises the lenses with the lens surfaces 16-21.
  • the first and the last lens surface of this lens group is aspheric.
  • This lens group has negative refractive power and it is clearly pronounced by this lens group Waist formed. This lens group thus makes a particularly valuable contribution to correcting the higher order sagital spherical image errors.
  • the negative group makes the main contribution to Pet ⁇ waUcoirekrur, in particular to the flat panel.
  • the third lens group is followed by the third lens group LG3, which is formed by the lenses with the lens surfaces 22-64.
  • This LG3 lens group stands out due to its elongated, tubular shape. Characterized by an elongated area in front of the system diaphragm 19, which has a light bundle diameter or a lens diameter that is at least 85% of the maximum lens diameter or maximum lens bundle diameter. By forming such a region, good optical properties, in particular with regard to a chiomatic longitudinal aberration, could be achieved using a single lens material. This area in front of the system aperture 19 and the area of the system aperture 19 itself is particularly sensitive to the development of chromatic longitudinal aberration.
  • each doublet consisting of a positive lens and a negative lens
  • Another doublet consisting of a positive lens followed by a negative lens is arranged after the system aperture 19.
  • a large part of the breclic power of the projection lens is provided by a thick positive lens following these doublets.
  • the formation of this end region UG3d also contributes significantly to the provision of a very high numerical aperture of 0.8, namely through small single contributions to the spherical aberration and coma number.
  • a positive subgroup is formed by the lenses with the lens surfaces 22-29, designated UG3A, which represents "degenerate" a belly.
  • the projection lens described in FIG. 2 enables an area of 10.5 ⁇ 26 mm to be exposed, the structure of the lens being imaged on the wafer in a manner reduced by a factor of 4.
  • the overall length of this lens arrangement 21 is 1344.0 mm measured from object plane 0 to image plane 0 '.
  • a field of 10.5x26 mm 2 can be exposed.
  • This lens arrangement 21 also has an input group EG1, which is formed by the first louvres arranged on the object side and having a negative refractive power.
  • the lens group LG1 is formed with the subsequent lenses with the areas 8-15. Again, the last lens surface 15 of this lens group is aspherized on the wafer side.
  • a third lens group LG2 is formed by the subsequent Luisen with the surfaces 16-21.
  • This third lens group LG2 has an overall negative refractive power and a clearly pronounced waist 29 is formed by this lens group.
  • This lens group is followed by a fourth lens group LG3, which has an elongated tubular shape, and a system aperture 19 is arranged in this fourth Luisen group.
  • this lens group LG3 On the side facing the third lens group LG2, this lens group LG3 has a sub-group UG3a which has low positive refractive power.
  • a weakly formed waist UG3b which is formed by two negative lenses, which have a large Durlininserser, n at least 85% of the maximum diameter. These two consecutive negative lises form a weak waist UG3b.
  • D3 and D4 are arranged in front of the system aperture 19.
  • D5 is another doublet denotes that a double sphere has through the aspheres on the lens surfaces 46 and 47.
  • the end region, designated UG3d, comprises a plurality of thin lenses through which the expanded light bundle 23 is focused on the wafer or on the image plane.
  • the lens arrangement 21 shown in FIG. 3 is also designed for the wavelength 193 mm and has a length of 1344 mm.
  • the field that can be exposed with this lens arrangement 21 is 10.5 ⁇ 26 mm 2 .
  • the numerical aperture is 0.85. With this lens, the object 9 is imaged on the image plane 13 reduced by a factor of 4. The exact lens data can be found in Table 2.
  • the lens arrangement shown in FIG. 4 is designed for the 157 nm exposure wavelength.
  • the overall length is 1390.0 mm measured from object level 0 to image level 0 '.
  • This lens arrangement 21 a field of 10.5 nm ⁇ x26n ⁇ n ⁇ can be observed.
  • the macroscopic structure of this lens arrangement differs only slightly from the lens arrangement shown in FIG. 3, so that a detailed description is not given here.
  • the exact lens data can be found in Table 3. TABLE 3
  • the lens arrangement 21 shown in FIG. 5 is also designed for the wavelength 157.6 nm.
  • This lens arrangement 21 differs significantly in that only 3 doublets D1, D2 and D4 are arranged in front of the system diaphragm 19.
  • the doublet marked D3 in the previous figures has been omitted.
  • the two successive negative lenses, through which the second weakly defined waist is formed, are arranged at a distance from one another. As a result of this changed arrangement and the saving of the doublet D3, the lens volume is reduced.
  • the lens arrangement 21 shown in FIG. 6 is designed for the wavelength 193 nanometers.
  • the illuminable field is 10.5 mm x 26 mm.
  • the overall length of object plane 0 '- image plane 0' is 1200 mm.
  • the amount of quartz glass required for production is only 103 kg.
  • just like the exemplary embodiment shown in FIG. 5 only a total of four doublets are provided. In this example of filling, the doublet, which was designated D3 in FIGS. 2-4, is also used.
  • the exact lens data can be found in Table 5 below.
  • P (h) is the arrow height as a function of the radius h, ie the distance from a flat surface that passes through the surface vertex and is oriented perpendicular to the optical axis.
  • Ci to C n are the aspherical constants given in the tables and CO is the conical constant.
  • R is the vertex radius given in the tables.
  • Diameter of the circle of confusion ⁇ 2.0 x structure width
  • the chromatically induced circle of confusion should be determined at maximum aperture and with a ⁇ of half the light source bandwidth to the mean working wavelength.
  • Diameter of the chromatic circle of confusion 2.1 * structure width, this results in a contrast decrease of about 6.5% of the polychromatic system to the monochromatic system for lattice structures.
  • a K 1 of 0.32 was rolled.
  • the K ⁇ value varies between 0.27 and 0.35.
  • the code number KCHL can make a comparison between different refractory lithography designs with regard to the generation of the chromatic longitudinal error under the conditions of image field, bandwidth of the light source and material dispersion of the lenses used. If the lens consists only of one material, only this one material dispersion is used. If the lens consists of several materials, each lens receives a synthetic replacement material with a refractive index as before, but with a uniform, selectable dispersion for calculating the replacement CHL.
  • ⁇ is the bandwidth interval
  • Y 'ax is the maximum field diameter.
  • the numerical values for CHL, ⁇ ⁇ and Y ⁇ max are all entered in nm, for ⁇ ⁇ , for example, a value of Inm is selected.
  • the example m 1159a from WO 01/50171 AI represents a very typical KCHL value of 6.07 which varies only within very narrow limits of all refralctive lithography objectives. Such a high KCHL value of 6.64 for the example with description m 1450a is shown as an exception upwards.
  • KCHL value of ⁇ 5.0 and most preferably
  • I Projection control system 3 Illuminates igseimichtung

Abstract

Disclosed is a refractive projection lens used in microlithography, which comprises a lens array in which all lenses are made of one material, and which has a numerical aperture (NA) of more than 0.7 on the image side. The light beam (23) transmitting through the lens array (21) is greater than 85 percent of the largest diameter (25) of the light beam or the maximum lens diameter in the area located upstream from a system diaphragm (19) which is disposed in the lens array (21) along a distance that is equal to the greatest diameter (25) of the light beam or the maximum lens diameter in the lens array (21).

Description

Beschreibung:Description:
Refraktives Projelctionsobiektiv mit einer TailleRefractive projection lens with one waist
Die Erfindung betrifft eine PiOJektionsbelichtungsanlage mit einem refralctiven Projektioiisobjektiv, ein refraktives Projektionsobjelctiv selbst sowie ein Verfahren zur Herstellung ιrdlσosü τMurierter Bauteile bei dem eine Projel tionsbeHclitungsaiilage mit einem refralctiven Projelctionsobjektiv verwendet wird. Bei diesem refraktiven Projektionsobjektiv bestehen alle Linsen aus einem Material, wobei das Projektionsobjelctiv eine bildseitige numerische Apertur von größer 0,7 aufweist.The invention relates to a pi-projection exposure system with a refralctive projection lens, a refractive projection lens itself and a method for producing ιrdlσosü τMurierter components in which a projection treatment with a refralctive projection lens is used. In this refractive projection lens, all lenses are made of one material, the projection lens having a numerical aperture of greater than 0.7 on the image side.
Aus der DE 198 18 444 AI sind refraktive Prcjelctionsobjektive, die für eine Belichtungswellenlänge von 248,4 um ausgelegt sind, bekannt, wobei die Linsen der Prcjelctionsobjektive aus einem Material bestehen, das bei der Belichtungswellenlänge eine Brechzahl von 1,50839, wie Quarzglas, aufweist.From DE 198 18 444 AI refractive prescription lenses, which are designed for an exposure wavelength of 248.4 μm, are known, the lenses of the prescription lenses being made of a material that has a refractive index of 1.50839, such as quartz glass, at the exposure wavelength ,
Weiterhin ist es aus dieser Schrift bereits bekannt, dass auftretende Bildfehler durch den gezielten Einsatz von Asphären korrigiert werden können. So ist es aus dieser Schrift entnehmbar, dass insbesondere durch vorsehen einer Asphäre in der ersten Linsengruppe, bei der es sich um eine Linsengrappe positiver Brechkraft handelt, auftretende Verzeichnung korrigiert werden kann. Weiterhin ist es aus dieser Schrift bekannt, dass durch vorsehen einer Asphäre in der zweiten Linsengruppe, die negative Brechkraft aufweist und durch die eine erste Taille gebildet wird, auftretende Emtrittspupillenaberrationen korrigiert werden können. Weiterhin ist es bekannt, dass durch vorsehen einer asphärischen Linsenoberfl-äche in der dritten Linsengrappe ' auftretendes Koma minimiert werden kann, wobei die dritte Linsengruppe positive Brechkraft aufweist und zwischen den zwei Taillen, zweite und vierte Linsengruppe angeordnet ist. Ebenfalls kann durch vorsehen einer Asphäre in der sechsten Linsengruppe, die positive Brechkraft aufweist und direkt vor dem Wafer angeordnet ist, ebenfalls das Auftreten von Koma nnnimiert werden. Durch vorsehen einer Asphäre in der fünften Linsengruppe, die positive Brechkraft aufweist, können insbesondere mit hoher numerische Apertur zusammenhängende Aberrationen, insbesondere sphärische Aberration, korrigiert werden. Eine derartige Korrektur ist ' auch durch vorsehen einer Asphäre in der vierten Linsengruppe möglich, sofern die Asphäre nahe an der Bildebene angeordnet ist. . Aus der US 5,668,672 ist es bekannt, dass chromatische Aberrationen durch den Einsatz von Quarzglas kombiniert mit einem Fluoridmaterial als Linsenmaterial korrigiert werden können. Weiterhin ist aus der DE 199 39 038 AI ein refraktives Projektionsobjektiv bekannt, bei dem chromatische Aberrationen durch die Kombination von zwei oder mehr Sorten von Fluoridkristallen konigiert wird. Weiterhin weist das in Figur 11 gezeigte Projektionsobjelctiv, das für die Wellenlänge 157nm ausgelegt ist, mehrere Asphären auf. Für diese Wellenlänge sind insbesondere als Lmsemnaterialien Kalziumfluorid und LitMtrrnfluorid vorgesehen.Furthermore, it is already known from this document that image errors that occur can be corrected by the targeted use of aspheres. It can be seen from this document that distortion occurring in particular can be corrected by providing an asphere in the first lens group, which is a lens group of positive refractive power. Furthermore, it is known from this document that by providing an asphere in the second lens group, which has negative refractive power and through which a first waist is formed, occurring pupil aberrations can be corrected. Furthermore, it is known that by providing an aspherical lens surface in the third lens group ' coma can be minimized, the third lens group having positive refractive power and being arranged between the two waists, second and fourth lens groups. Likewise, by providing an asphere in the sixth lens group which has positive refractive power and is arranged directly in front of the wafer, the occurrence of coma can also be minimized. By providing an asphere in the fifth lens group which has positive refractive power, aberrations, in particular spherical aberration, associated with a high numerical aperture can be corrected. Such a correction is also possible by providing an asphere in the fourth lens group, provided that the asphere is arranged close to the image plane. , From US 5,668,672 it is known that chromatic aberrations can be corrected by using quartz glass combined with a fluoride material as the lens material. Furthermore, a refractive projection objective is known from DE 199 39 038 AI, in which chromatic aberrations are tapered by the combination of two or more types of fluoride crystals. Furthermore, the projection lens shown in FIG. 11, which is designed for the wavelength 157nm, has several aspheres. Calcium fluoride and lithium fluoride are in particular provided for this wavelength.
Weiterhiii ist es aus der US 09/694878 bekannt, insbesondere für die Farbfehlerkorrelctur bei emem für die Wellenlänge 193 rnn ausgelegten Objektiv einzelne Linsen aus Calciumfluorid für die Korrektur von Abbildungsfehler vorzusehen, wobei die Mehrzahl der Linsen aus Quarzglas besteht. Die numerische Apertur des in Figur 1 gezeigten Projektionsobjelctives beträgt 0,7. Dieses refraktive Projektioiisobjektiv umfasst eine negative Lmsengruppe, durch die eine ausgeprägte Taille bereitgestellt wird, die mit G2 bezeichnet ist.It is further known from US 09/694878 to provide individual calcium fluoride lenses for the correction of aberrations, in particular for the color error correction in an objective designed for the wavelength 193 nm, the majority of the lenses being made of quartz glass. The numerical aperture of the projection objective shown in FIG. 1 is 0.7. This refractive projection lens includes a negative lens group that provides a pronounced waist, designated G2.
Aus der US 09/44063, EP 1006387, ist em ProjeMonsobjelctiv bekannt, das eine Linsenanordnung, die ebenfalls für die Wellenlänge von 193mn ausgelegtes ist. Diese Lήisenanordnung weist eine numerische Apertur von 0,7 auf. Bei dieser Lmsenanordnυng ist wiederum eine Materiahnischung von Quarzglas und Calciumfluorid vorgesehen. Weiterixin weisen die aus dieser Schrift bekannten Projelctionsobjelctive mindestens zwei Linsengruppen mit negativer Brechkraft auf, durch die jeweils deutlich eine Taille ausgebildet wird.From US 09/44063, EP 1006387, a ProjeMonsobjelctiv is known, the lens arrangement, which is also designed for the wavelength of 193mn. This noise arrangement has a numerical aperture of 0.7. In this lens arrangement, a material mixture of quartz glass and calcium fluoride is again provided. In addition, the projection objectives known from this document have at least two lens groups with negative refractive power, each of which clearly forms a waist.
Aus der EP 1 139 138 AI sind refaktive Linsenanordnungen bekannt, wobei die eingesetzten Linsen aus den Materialien Calciumfluorid und Quarzglas bestehen. Es ist ein Ausfuhrungsbeispiel gezeigt, bei dem alle Linsen aus Calciumfluorid bestehen, wobei dieses Objektiv für eine Belichtungswellenlänge von 157nm ausgelegt ist. Die weiteren gezeigt Linsenanordnungen sind für die Belichtungswellenlänge von 193mn ausgelegt. Alle gezeigten Linsenanordnungen weisen eine Mehrzahl von Asphären auf.Refactive lens arrangements are known from EP 1 139 138 AI, the lenses used being made of the materials calcium fluoride and quartz glass. An exemplary embodiment is shown in which all lenses consist of calcium fluoride, this lens being designed for an exposure wavelength of 157 nm. The other lens arrangements shown are designed for the exposure wavelength of 193 mn. All lens arrangements shown have a plurality of aspheres.
Der Einsatz beispielsweise von Calciumfluorid bei einer für die Belichtungswellenlänge von 193nm ausgelegten Linsenanordnung ist mit dem Nachteil verbunden, dass dieses Material zum einen schwerer verfügbar ist wie Quarzglas und zum anderen auch wesentlich teurer ist. Der Erfindung Hegt die Aufgabe zugrunde, refraktive Linsenanordnungen bzw. eine Projektionsbelichtungsanlage für Mikrolithographie mit einem refralctiven Projektioiisobjektiv mit einer hohen numerischen Apertur und guten optische Eigenschaften bereitzustellen.The use of calcium fluoride, for example, in a lens arrangement designed for the exposure wavelength of 193 nm is associated with the disadvantage that this material is more difficult to obtain on the one hand like quartz glass and on the other hand it is also considerably more expensive. The invention has for its object to provide refractive lens arrangements or a projection exposure system for microlithography with a refralctive projection lens with a high numerical aperture and good optical properties.
Weiterhin lag der Erfindung die Aufgabe zugrunde, refraktive Lmsenanordnungen für die Mikrolithographie zu schaffen, die sich bei hoher numerischer Apertur durch geringe Farblängsfehler auszeichnen.Furthermore, the invention was based on the object of providing refractive lens arrangements for microlithography which are distinguished by low longitudinal color errors with a high numerical aperture.
Weiterhin lag der Erfindung die Aufgabe zugrunde refraktive Lmsenanordnungen bereitzustellen, dessen Herstell osten reduziert sind.The invention was also based on the object of providing refractive lens arrangements, the manufacture of which is reduced.
Die der Erfindung zu Grunde liegenden Aufgaben wurde durch die im Patentanspruch 1 gegebenen Merkmale gelöst. Durch die Maßnahme, dass alle Linsen aus einem Material bestehen, konnten die Herstellkosten reduziert werden, da schon allein dadurch, dass unterschiedlichste Materialien beschafft werden müssen, höhere Kosten verursacht' werden, vermieden wurde.The objects on which the invention is based were achieved by the features given in patent claim 1. By the measure that all lenses are made of a material, the production costs higher costs could be reduced because the very fact that different materials have to be procured, 'caused, was avoided.
Weiterhin ist es Aufgabe der Erfindung, ein rein refraktives Objektiv aus nur einem Linsenmaterial anzugeben, dass als Mikrolithographie-Projektionsobjektiv n it großer bildseitiger numerischer Apertur und großem Bildfeld bezüglich auftretender Farbfehler eine gute Korrektur aufweist. Da die Farbfehler mit zunehmender Bandbreite des Beleuchtungslichtes zunehmen, wurde es erst durch den Einsatz eines in bezug auf die Farbfehler, insbesondere Farblängsfehler, besonders gut korrigierten Objektives möglich, die Anforderungen an eine Einengung der Bandbreite des Beleuchtungslichtes zu reduzieren, ohne das eine Verschlechterung der Bildqualität akzeptiert werden musste.Furthermore, it is an object of the invention to provide a purely refractive lens made from only one lens material which, as a microlithography projection lens with a large numerical aperture on the image side and a large image field, has a good correction with regard to color errors which occur. Since the color errors increase with increasing bandwidth of the illuminating light, it was only possible to reduce the requirements for narrowing the bandwidth of the illuminating light without a deterioration in the image quality by using a lens that was particularly well corrected with regard to the color errors, particularly longitudinal color errors had to be accepted.
Das Objektiv soll besonders für die Wellenlängen 157 Nanometer und 193 Nanometer geeignet sein. Überraschend wurde gefunden, dass auch unter den komplexen Randbedingungen eines hochwertigen MüαOlithograp e-Projektionsobjektives Maßnahmen hinsichtlich der Anordnung und Ausbildung der Linsen möglich sind, die für ein Linsenmaterial mit gegebener Dispersion eine deutliche Senkung der chromatischen Längsaberration ergeben, so hat es sich' als vorteilhaft herausgestellt, positive Brechkraft zum Bild hin zu verschieben, um den Farblängsfehler klein zu halten. Negative Linsen mit kleinem Bündelquersclmitt müssen objektseitig fern der Systemblende angeordnet sein.The lens is said to be particularly suitable for the wavelengths of 157 nanometers and 193 nanometers. Surprisingly, it was found that the arrangement and design of the lenses are possible even under the complex conditions of a high MüαOlithograp e-projection objective measures regarding which result in a significant reduction in longitudinal chromatic aberration for a lens material of a given dispersion, it has proved 'to be advantageous to shift the positive refractive power towards the image in order to reduce the longitudinal color error hold. Negative lenses with a small bundle cross-section must be located on the object side far from the system aperture.
Die für eine derartige Linsenanordnung notwendige hochwertige Petzval-Koiϊektur erfordert die Ausbildung von Taillen mit negativer Brechkraft. Durch die Maßnahme negative Linsen mit kleinem Büschelquerschnitt objektseitig, fern der Systemblende anzuordnen, kann der Farblängsfehler klein gehalten werden. Es hat sich weiteiirhi als vorteilhaft herausgestellt, positive Brechkraft zum Bild hin zu verschieben.The high-quality Petzval koiϊektur required for such a lens arrangement requires the formation of waists with a negative refractive power. By taking negative lenses with a small tuft cross-section on the object side, far from the system aperture, the longitudinal color error can be kept small. It has also proven advantageous to shift positive refractive power towards the image.
Die Anordnung von aus einer Positivlinse und einer Negativlinse bestehenden Dubletts nach der ersten Taille mit großem Linsendurchrnesser von mindestens 85 % des maximalen Linsendurchmessers bzw. Lichtbüscheldurchmessers, geben eine optimale Korrekturmögliclikeit bezüglich aller aperturbehafteter außeraxialer Bildfehler ohne eine Erzeugung von Farblängsfehleiii.The arrangement of doublets consisting of a positive lens and a negative lens after the first waist with a large lens diameter of at least 85% of the maximum lens diameter or light bundle diameter gives an optimal correction possibility with regard to all aperture-dependent non-axial image errors without generating longitudinal color errors.
Gerade der Bereich vor der Systemblende und der Blendenbereich selbst ist prädestiniert für das entstehen von Farblängsfehlern. Aufgrund dieser Problematik hat sich als vorteilhaft herausgestellt, in dem Bereich vor und um die Systemblende herum Dubletts anzuordnen, bei denen jeweils eine Positivlinse vorgesehen ist, der ein nahestehender Partner umgekehrter Brechkraft bei älrnlichen Lichtbüscheldurclimesser zugeordnet ist. Es hat sich insbesondere als vorteilhaft herausgestellt Dubletts vorzusehen, die eine Gesamtbreclkraft aufweisen, die kleiner ist als 20% der Brechkraft zwischen Blende und Wafer beträgt. Die äußere Form der Dubletts gleicht einem dicken durchgebogenen Meniskus, der eine relativ geringe Brechlσaft ausweist.The area in front of the system panel and the panel area itself is predestined for the occurrence of longitudinal color errors. Because of this problem, it has proven to be advantageous to arrange doublets in the area in front of and around the system diaphragm, in each of which a positive lens is provided, to which a close partner of reversed refractive power is assigned in the case of similar light-tuft diameters. It has proven to be particularly advantageous to provide doublets that have a total refractive power that is less than 20% of the refractive power between the aperture and the wafer. The outer shape of the doublets resembles a thick, bent meniscus, which has a relatively low refractive index.
Es hat sich als vorteilhaft herausgestellt einen Rest einer zweiten Taille durch zwei aufeinanderfolgende negativ Linsen, die zwischen zwei positiv Linsen angeordnet sind vorzusehen. Aufgrund des großen Linsendurchmessers dieser Negativlinsen wird der Lichtbündeldurchmesser in dieser zweiten Taille nur geringfügig, insbesondere weniger als 10%, ausgehend von dem maximalen Linsendurchmesser vor dieser Taille eingeschnürt, was sich vorteilhaft auf den Farblängsfehler auswirkt. Der Farblängsfehler wird auch mit chroinatischer Längsaberration bezeichnet. Durch den Einsatz von Asphären in einer Eröffhungslmsengruppe, die aus Negativlmsen besteht, wird eine Entspa iung der Möglichkeiten der Petarvaftorrekrur, insbesondere der Bildschalen- konektur, erreicht. Weitere vorteilhafte Maßnahmen sind in weiteren Ansprüchen beschrieben.It has proven to be advantageous to provide a rest of a second waist by means of two successive negative lenses which are arranged between two positive lenses. Due to the large lens diameter of these negative lenses, the light beam diameter in this second waist is constricted only slightly, in particular less than 10%, based on the maximum lens diameter in front of this waist, which has an advantageous effect on the longitudinal color error. The longitudinal color error is also referred to as chroinatic longitudinal aberration. By using aspheres in an opening lens group consisting of negative lenses, a relaxation of the possibilities of petarvafor correction, in particular the screen shell structure, is achieved. Further advantageous measures are described in further claims.
Anhand der folgenden Ausfαhruiαgsbeispiele wird die Erfindung näher beschrieben. Diese Beispiele sind nicht einschränkend zu verstehen. Es zeigt:The invention is described in more detail with the aid of the following exemplary embodiments. These examples are not meant to be limiting. It shows:
Figur 1: Projektionsbelichtungsanlage für die MikroHthographie;Figure 1: Projection exposure system for microHthography;
Figur 2: Refraktives Projektionsobjektiv für die Mikrolithographie für dieFigure 2: Refractive projection lens for microlithography for the
Belichtungs Wellenlänge 193nm, dass bei einer Baulänge von 1340,7 mm eine numerische Apertur von 0,8 aufweist; Figur 3: Projektionsobjektiv für die Wellenlänge 193nm, dass bei emer Baulänge vonExposure wavelength 193nm that with a length of 1340.7 mm has a numerical aperture of 0.8; Figure 3: projection lens for the wavelength 193nm that with an overall length of
1344 mm eine numerische Apertur von 0,85 aufweist; Figur 4: Projektioiisobjektiv für die Belichtungswellenlänge 157nm, dass bei einer1344 mm has a numerical aperture of 0.85; Figure 4: Projection lens for the 157nm exposure wavelength that at a
Baulänge von 1390 mm eine numerische Apertur von 0,85 aufweist; Figur 5: Projektionsobjektiv für die Wellenlänge 157 n mit emer Baulä ge vonLength of 1390 mm has a numerical aperture of 0.85; Figure 5: Projection lens for the wavelength of 157 n with an emergence of
1300 mm; Figur 6: PiOJektipnsobjektiv für die Wellenlänge 193 nm mit einer Baulänge von1300 mm; Figure 6: PiOjektipns objective for the wavelength 193 nm with a length of
1200 mm1200 mm
Anhand von Figur 1 wird zunächst der prinzipielle Aufbau einer Projelctionsbelichmngsanlage 1, die ein refraktives Projektionsobjektiv 5 umfasst, beschrieben. Die Projelctionsbelichtungsanlage 1 weist eine Belichtungsemrichtung 3 auf, die mit emer Einrichtung zur Einengung der Bandbreite versehen ist. Das Projelctionsobjektiv 5 umfasst eine Linsenanordnung 21 mit einer Systemblende 19, wobei durch die Linsenanordnung 21 eine optische Achse 7 definiert wird. Zwischen Belichmngsenrrichtung 3 und Projelctionsobjelctiv 5 ist eine Maske 9 angeordnet, die mittels eines Maskenhalters 11 im Strahlengang gehalten wird. Solche in der Milαrolithographie verwendeten Masken 9 weisen eine Mikrometer- bis Nanometerstiτiktur auf, die mittels des Projektionsobjektives 5 bis zu einem Faktor von 10, insbesondere um den Faktor 4, verkleinert auf eine Bildebene 13 abgebildet werden. In der Bildebene 13 wird ein durch einen Substrathalter 17 positioniertes Substrat bzw. e i Wafer 15 gehalten. Die noch auflösbaren nrinimalen Strakturen hängen von der Wellenlänge des für die Belichtung verwendeten Lichtes sowie von der numerischen Apertur des Projelctionsobjektives 5 sowie von de K Faktor der Beüchtungseinrichtung 3 ab. Eine maximal erreichbare Auflösung der Projektionsbelichtungsanlage 1 nimmt mit abnehmender Wellenlänge des durch die Belichtungseiirrichtung 3 bereitgestellten Lichtbüschels 23, durch den das Muster der Maske 9 mittels des Projelctionsobjelctives 5 auf den Wafer 15 abgebildet wird, zu.The basic structure of a projection exposure system 1, which comprises a refractive projection objective 5, is first described with reference to FIG. 1. The projection exposure system 1 has an exposure device 3 which is provided with a device for narrowing the bandwidth. The projection objective 5 comprises a lens arrangement 21 with a system diaphragm 19, an optical axis 7 being defined by the lens arrangement 21. A mask 9 is arranged between the exposure direction 3 and the projection objective 5 and is held in the beam path by means of a mask holder 11. Such masks 9 used in milalithithography have a micrometer to nanometer pattern, which are imaged on the image plane 13 by the projection objective 5 down to a factor of 10, in particular by a factor of 4. A substrate or egg 15 positioned by a substrate holder 17 is held in the image plane 13. The still resolvable basic structures depend on the wavelength of the light used for the exposure and on the numerical aperture of the projection lens 5 and the de factor of the humidification device 3. A maximum achievable resolution of the projection exposure system 1 increases with decreasing wavelength of the light bundle 23 provided by the exposure device 3, by means of which the pattern of the mask 9 is imaged on the wafer 15 by means of the projection objective 5.
Anhand der Figuren 2-6 wird der Aufbau verschiedener Lmsenanordnungen 21 der Projektionsobjelctiven 5, die für die Wellenlängen 193nm und 157,6 nm ausgelegt sind, beschrieben.The structure of various lens arrangements 21 of the projection lenses 5, which are designed for the wavelengths 193 nm and 157.6 nm, is described with reference to FIGS. 2-6.
Die in Figur 2 dargestellte refraktive Linsenanordnung 21 ist für die Belichtungs weilenlänge von 193 Nanometer ausgelegt und weist eine bildseitige numerische Apertur von 0,8 auf. Diese Linsenanordnung 21 umfasst 31 Luisen, von denen 9 mindestens eine asphärische Lmsenoberfläche aufweisen. Solche Luisen werden auch mit Asphäre bezeichnet. Die Baulänge von Objelctebene 0 zu Bildebene 0' beträgt 1340,7 mm.The refractive lens arrangement 21 shown in FIG. 2 is designed for the exposure length of 193 nanometers and has an image-side numerical aperture of 0.8. This lens arrangement 21 comprises 31 lises, 9 of which have at least one aspherical lens surface. Such Luisen are also called asphere. The overall length from object level 0 to image level 0 'is 1340.7 mm.
Diese Linsenanordnung 21 ist in drei Linsengruppen LG1 bis LG3 unterteilbar. Die erste Linsengruppe LG1 weist positive Brechkraft auf und umfasst die Linsen mit den Flächen 2-15. Diese Linsengruppe ist wiederum unterteilbar in eine Eröfxhungsgruppe EG1, die negative Brechkraft aufweist und die ersten drei Linsen umfasst. Die ersten beiden objektseitig angeordneten Linsen smd auf der dem Objekt zugewandten Seite mit einer Asphäre versehen, die auf einer konvexen Linsenoberfläche angeordnet ist. Diese ersten beiden Linsen weisen eine Durchbiegung zum Objekt hin auf.This lens arrangement 21 can be divided into three lens groups LG1 to LG3. The first lens group LG1 has positive refractive power and comprises the lenses with the areas 2-15. This lens group can in turn be subdivided into an opening group EG1, which has negative refractive power and comprises the first three lenses. Provide the first two lenses smd on the object side with an asphere on the side facing the object, which is arranged on a convex lens surface. These first two lenses have a deflection towards the object.
Durch die auf die Eingangsgruppe EG1 folgenden Luisen wird ein Bauch gebildet. Diese dicken Positivlinsen haben einen positiven Effekt in Bezug auf die Petzvalsumme. Die letzte Linse der Linsengruppe LG1 ist auf der waferseitig angeordneten Lmsenoberfläche asphärisiert. Diese dicken Positivlinsen liefern zusätzlich einen günstigen Beitrag in Bezug auf die Koma orrelctur.A belly is formed by the Luisen following the entrance group EG1. These thick positive lenses have a positive effect on the Petzval sum. The last lens of the lens group LG1 is aspherized on the lens surface arranged on the wafer side. These thick positive lenses also make a favorable contribution in terms of coma orrelcture.
Die zweite Linsengruppe LG2 umfasst die Linsen mit den Linsenoberfiächen 16-21. Die erste und die letzte Lmsenoberfläche dieser Linsengruppe ist jeweils asphärisiert. Diese Linsengruppe weist negative Brechkraft auf und es wird durch diese Linsengruppe eine deutlich ausgeprägt Taille gebildet. Damit liefert diese Linsengruppe eήien besonders wertvollen Beitrag zur Korrektur der sagitalen sphärischen Bildfehler höherer Ordnung. Gleichzeitig liefert die negative Gruppe den Hauptbeitrag zur Pet∑waUcoirekrur, insbesondere zur Bildschalenebnung.The second lens group LG2 comprises the lenses with the lens surfaces 16-21. The first and the last lens surface of this lens group is aspheric. This lens group has negative refractive power and it is clearly pronounced by this lens group Waist formed. This lens group thus makes a particularly valuable contribution to correcting the higher order sagital spherical image errors. At the same time, the negative group makes the main contribution to Pet∑waUcoirekrur, in particular to the flat panel.
Auf die zweite Linsengruppe folgt die dritte Linsengruppe LG3, die durch die Linsen mit den Linsenoberflächen 22-64 gebildet wird. Diese Linsengruppe LG3 fällt durch ihre langgestreckte rölrOnförmige Erscheinung auf. Durch einen langgestreckten Bereich vor der Systemblende 19, der einen Lichtbüscheldurchmesser bzw. einen Linsendurclimesser aufweist, der mindestens 85 % des maximalen Lmsendurchmessers bzw. maximalen Linsenbüscheldurchmessers beträgt, geprägt. Durch die Ausbildung eines derartigen Bereichs konnten unter Verwendung eines einzigen Linsenrnaterials gute optische Eigenschaften, insbesondere im Bezug auf eine chiOmatische Längsaberration, erreicht werden. Gerade dieser Bereich vor der Systemblende 19 und der Bereich der Systemblende 19 selbst, ist für die Entstehung chromatischer Längsaberration besonders empfindlich. In diesem Ausfuhrungsbeispiel sind vier Dubletts bestehend aus jeweils einer Positivlinse und einer Negativlinse vor der Systemblende 19 angeordnet. Ein weiteres Dublett bestehend aus einer Positivlinse gefolgt von einer Negativlinse ist nach der Systemblende 19 angeordnet. Durch eine auf diese Dubletts folgende dicke Positivlinse wird ein Grossteil der Breclikraft des Projektionsobjelctives bereitgestellt. Ein Endbereich der dritten Linsengruppe LG3, der mit UG3d bezeichnet ist und die Linsen mit den Flächen 31-54 umfasst, wirkt sich vorteilhaft auf die negative Verzeiclmung aus. Die Ausbildung dieses Endbereiches UG3d trägt auch zur Bereitstellung einer sehr hohen numerischen Apertur von 0,8 wesentlich bei und zwar durch kleine Emzelbeiträge zur sphärischen Aberration und Komazahl.The third lens group is followed by the third lens group LG3, which is formed by the lenses with the lens surfaces 22-64. This LG3 lens group stands out due to its elongated, tubular shape. Characterized by an elongated area in front of the system diaphragm 19, which has a light bundle diameter or a lens diameter that is at least 85% of the maximum lens diameter or maximum lens bundle diameter. By forming such a region, good optical properties, in particular with regard to a chiomatic longitudinal aberration, could be achieved using a single lens material. This area in front of the system aperture 19 and the area of the system aperture 19 itself is particularly sensitive to the development of chromatic longitudinal aberration. In this exemplary embodiment, four doublets, each consisting of a positive lens and a negative lens, are arranged in front of the system diaphragm 19. Another doublet consisting of a positive lens followed by a negative lens is arranged after the system aperture 19. A large part of the breclic power of the projection lens is provided by a thick positive lens following these doublets. An end region of the third lens group LG3, which is designated UG3d and comprises the lenses with the surfaces 31-54, has an advantageous effect on the negative distortion. The formation of this end region UG3d also contributes significantly to the provision of a very high numerical aperture of 0.8, namely through small single contributions to the spherical aberration and coma number.
Eine schwach ausgebildete Taille durch zwei aufeinanderfolgende negativ Linsen, die vor der Systemblende angeordnet sind, sind mit UG3b bezeichnet. Durch die Linsen mit den Linsenoberflächen 22-29, mit UG3A bezeichnet, wird eine positive Untergruppe gebildet, die „entartet" einen Bauch darstellt.A weakly formed waist due to two successive negative lenses, which are arranged in front of the system diaphragm, are designated UG3b. A positive subgroup is formed by the lenses with the lens surfaces 22-29, designated UG3A, which represents "degenerate" a belly.
Durch das in Figur 2 beschriebene Projelctionsobjektiv ist eine Fläche 10,5x26 mm belichtbar, wobei die Struktur des Objektives um den Faktor 4 verkleinert auf den Wafer abgebildet werden. TABELLE 1The projection lens described in FIG. 2 enables an area of 10.5 × 26 mm to be exposed, the structure of the lens being imaged on the wafer in a manner reduced by a factor of 4. TABLE 1
M1471aM1471a
BRECHZAHL 1/2 FREIERFRESH NUMBER 1/2 FREE
PL. RADIEN DICKEN GLAESER 193.304nm DURCHMESSERPL. RADIEN THICK GLASSES 193.304nm DIAMETER
0 0.000000000 24.114319875 N2 1.00000320 56.080 1 0.000000000 3.482434220 N2 1.00000320 61.002 2 2078.963770280AS 11.540852046 SI02HL 1.56028895 62.455 3 149.559792284 8.045820053 N2 1.00000320 63.745 283.335388909AS 10.384447026 SI02HL 1.56028895 65.015 5 227.471174739 35.446688452 N2 1.00000320 66.284 6 -122.782367295 38.508940817 SI02HL 1.56028895 68.210 7 -255.078934826 0.874570041 N2 1.00000320 89.183 -888.725542480 30.171005105 SI02HL 1.56028895 95.7350 0.000000000 24.114319875 N2 1.00000320 56,080 1 0.000000000 3.482434220 1.00000320 61 002 2 N2 2078.963770280AS 11.540852046 SI02HL 1.56028895 62,455 3 149.559792284 8.045820053 1.00000320 63 745 N2 283.335388909AS 10.384447026 SI02HL 1.56028895 65,015 5 227.471174739 35.446688452 N2 1.00000320 66,284 6 -122.782367295 38.508940817 SI02HL 1.56028895 68,210 7 -255.078934826 0.874570041 1.00000320 N2 89.183 -888.725542480 30.171005105 SI02HL 1.56028895 95.735
9 -191.846579966 0.675200957 N2 1.00000320 98.7359 -191.846579966 0.675200957 N2 1.00000320 98.735
10 640.397878968 41.049504805 SI02HL 1.56028895 108.48510 640.397878968 41.049504805 SI02HL 1.56028895 108.485
11 -250.387321692 0.675200957 N2 1.00000320 109.14711 -250.387321692 0.675200957 N2 1.00000320 109.147
12 667.678997977 44.017612594 SI02HL 1.56028895 105.07312 667.678997977 44.017612594 SI02HL 1.56028895 105.073
13 -1125.455416998 0.675200957 N2 1.00000320 100.89913 -1125.455416998 0.675200957 N2 1.00000320 100.899
14 192.876693777 62.505832714 SI02HL 1.56028895 93.07214 192.876693777 62.505832714 SI02HL 1.56028895 93.072
15 331.893780633AS 32.604997110 N2 1.00000320 76.48315 331.893780633AS 32.604997110 N2 1.00000320 76.483
16 -171.193877443AS 17.084502546 SI02HL 1.56028895 70.65216 -171.193877443AS 17.084502546 SI02HL 1.56028895 70.652
17 335.138365959 24.373437146 N2 1.00000320 66.30117 335.138365959 24.373437146 N2 1.00000320 66.301
18 -192.572424355 9.645727950 SI02HL 1.56028895 65.92618 -192.572424355 9.645727950 SI02HL 1.56028895 65.926
19 418.847934941 26.888457292 N2 1.00000320 68.37419 418.847934941 26.888457292 N2 1.00000320 68.374
20 -140.483410076 10.610300745 SI02HL 1.56028895 69.12920 -140.483410076 10.610300745 SI02HL 1.56028895 69.129
21 -459.758634782AS 16.193911170 N2 1.00000320 77.66921 -459.758634782AS 16.193911170 N2 1.00000320 77.669
22 -188.260511338 24.787222412 SI02HL 1.56028895 79.45322 -188.260511338 24.787222412 SI02HL 1.56028895 79.453
23 -123.558724879 1.174436845 N2 1.00000320 84.22723 -123.558724879 1.174436845 N2 1.00000320 84.227
24 -224.101808279 35.439166118 SI02HL 1.56028895 89.39224 -224.101808279 35.439166118 SI02HL 1.56028895 89.392
25 -158.235875230 1.137750024 N2 1.00000320 97.00725 -158.235875230 1.137750024 N2 1.00000320 97.007
26 -244.923106839 26.771118597 SI02HL 1.56028895 99.23426 -244.923106839 26.771118597 SI02HL 1.56028895 99.234
27 -435.595962845 19.019537360 N2 1.00000320 108.19027 -435.595962845 19.019537360 N2 1.00000320 108.190
28 254.503542501 103.741855324 SI02HL 1.56028895 125.70428 254.503542501 103.741855324 SI02HL 1.56028895 125.704
29 -370.013146990 0.898100644 N2 1.00000320 123.19029 -370.013146990 0.898100644 N2 1.00000320 123.190
30 ■651.149669203 AS 11.574873540 SI02HL 1.56028895 119.61430 ■ 651.149669203 AS 11.574873540 SI02HL 1.56028895 119.614
31 346.341133415 40.118210584 N2 1.00000320 114.22931 346.341133415 40.118210584 N2 1.00000320 114.229
32 -378.937108427 11.574873540 SI02HL 1.56028895 114.19532 -378.937108427 11.574873540 SI02HL 1.56028895 114.195
33 532.696677413 4.927372582 N2 1.00000320 118.68233 532.696677413 4.927372582 N2 1.00000320 118.682
34 439.556363278 74.374706500 SI02HL 1.56028895 121.39934 439.556363278 74.374706500 SI02HL 1.56028895 121.399
35 -502.601956332 0.675200957 N2 1,00000320 124.80135 -502.601956332 0.675200957 N2 1.00000320 124.801
36 522.145069309AS 14.799644077 SI02HL 1.56028895 124.41436 522.145069309AS 14.799644077 SI02HL 1.56028895 124.414
37 1476.224552423 4.677319062 N2 1.00000320 124.27137 1476.224552423 4.677319062 N2 1.00000320 124.271
38 2177.900420777 11.574873540 SI02HL 1.56028895 124.34938 2177.900420777 11.574873540 SI02HL 1.56028895 124.349
39 384.316107261 1.595817333 N2 1.00000320 124.24139 384.316107261 1.595817333 N2 1.00000320 124.241
40 312.429605405 51.750696421 SI02HL 1.56028895 125.68140 312.429605405 51.750696421 SI02HL 1.56028895 125.681
41 -432.173779349 17.813396316 N2 1.00000320 125.43941 -432.173779349 17.813396316 N2 1.00000320 125.439
42 -249.375527898 11.574873540 SI02HL 1.56028895 124.71942 -249.375527898 11.574873540 SI02HL 1.56028895 124.719
43 -1589.233069199 14.468591925 N2 1.00000320 127.37443 -1589.233069199 14.468591925 N2 1.00000320 127.374
44 0.000000000 -4.822863975 N2 1.00000320 125.29644 0.000000000 -4.822863975 N2 1.00000320 125.296
45 321.301154865 57.691242734 SI02HL 1.56028895 131.35145 321.301154865 57.691242734 SI02HL 1.56028895 131.351
46 -1054.206205699AS 14.951798157 N2 1,00000320 130.20846 -1054.206205699AS 14.951798157 N2 1.00000320 130.208
47 -589.044474927AS 11.574873540 SI02HL 1.56028895 128.57547 -589.044474927AS 11.574873540 SI02HL 1.56028895 128.575
48 274.036317071 8.139476302 N2 1.00000320 128.11948 274.036317071 8.139476302 N2 1.00000320 128.119
49 321.225611416 124.977354157 SI02HL 1.56028895 129.26449 321.225611416 124.977354157 SI02HL 1.56028895 129.264
50 -395.919230783 1.969428424 N2 1.00000320 131.72150 -395.919230783 1.969428424 N2 1.00000320 131.721
51 820.198727366 26.845651259 SI02HL 1.56028895 126.931 2 -973.939543882 0.694000123 N2 1.00000320 125.647 3 139.833041863 36.229940671 SI02HL 1.56028895 107.077 4 242.551698933 0.867355440 N2 1.00000320 102.010 5 131.386059685 29.928967379 SI02HL 1.56028895 91.857 6 235.274124558 0.675200957 N2 1.00000320 85.440 7 157.034314790 26.536117143 SI02HL 1.56028895 79.168 8 231.201718823 9.219970606 N2 1.00000320 66.512 9 470.035875032 11.197726405 SI02HL 1.56028895 61.464 0 236.045204498 0.675200957 N2 1.00000320 52.281 1 134.300351512 8.120819966 SI02HL 1.56028895 48.003 2 63.666959363 10.716266548 N2 1.00000320 38.339 3 108.784923745 21.847901284 SI02HL 1.56028895 35.245 4 693.402002382 8.681155155 N2 1.00000320 24.992 5 0.000000000 0.000000000 N2 1.00000320 14.020 6 0.000000000 0.000000000 1.00000000 14.02051 820.198727366 26.845651259 SI02HL 1.56028895 126.931 2 -973.939543882 0.694000123 N2 1.00000320 125,647 3 139.833041863 36.229940671 SI02HL 1.56028895 107,077 4 242.551698933 0.867355440 N2 1.00000320 102,010 5 131.386059685 29.928967379 SI02HL 1.56028895 91,857 6 235.274124558 0.675200957 N2 1.00000320 85,440 7 157.034314790 26.536117143 SI02HL 1.56028895 79,168 8 231.201718823 9.219970606 N2 1.00000320 66,512 9 470.035875032 11.197726405 SI02HL 1.56028895 61 464 0 236.045204498 0.675200957 N2 1.00000320 52,281 1 134.300351512 8.120819966 SI02HL 1.56028895 48,003 2 63.666959363 10.716266548 N2 1.00000320 38,339 3 108.784923745 21.847901284 SI02HL 1.56028895 35,245 4 693.402002382 8.681155155 N2 1.00000320 24,992 5 0.000000000 0.000000000 N2 1.00000320 14,020 6 0.000000000 0.000000000 1.00000000 14,020
ASPHAERISCHE KONSTANTENASPHERIC CONSTANTS
FLAECHE NR. 2AREA NO. 2
CO 0.0000CO 0.0000
Cl 2.14106637e-007Cl 2.14106637e-007
C2 -1.51669986e-011C2 -1.51669986e-011
C3 2.64769647e-015C3 2.64769647e-015
C4 -3.99036396e-019C4 -3.99036396e-019
C5 2.47505843e-023C5 2.47505843e-023
C6 -3.15802350e-028C6 -3.15802350e-028
C7 3.03036722e-032C7 3.03036722e-032
C8 0.00000000e+000C8 0.00000000e + 000
C9 0,00000000e+000C9 0.00000000e + 000
FLAECHE NR. 4AREA NO. 4
CO 0.0000CO 0.0000
Cl 8.34485767e-008Cl 8.34485767e-008
C2 6.40722335e-012 C2 6.40722335e-012
C4 2.34304470e-019C4 2.34304470e-019
C5 -8.26711198e-024C5 -8.26711198e-024
C6 -7.65863767e-028C6 -7.65863767e-028
C7 6.41110903e-032C7 6.41110903e-032
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 15AREA NO. 15
CO 0.0000CO 0.0000
Cl -2.63006449e-008Cl -2.63006449e-008
C2 " -2.79471341e-012C2 " -2.79471341e-012
C3 -2.67O96228e-016C3 -2.67O96228e-016
C4 -1.35138372e-020C4 -1.35138372e-020
C5 -4.40665654e-024C5 -4.40665654e-024
C6 5.04322571e-028C6 5.04322571e-028
C7 -7.87867135e-032C7 -7.87867135e-032
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE R. 16 CO 0.0000AREA R. 16 CO 0.0000
Cl 3.25803022e-009Cl 3.25803022e-009
C2 -6.94860276e-013C2 -6.94860276e-013
C3 -1.78049294e-016C3 -1.78049294e-016
C4 -6.94438259e-021C4 -6.94438259e-021
C5 6.12556670e-024C5 6.12556670e-024
C6 -1.48556644e-027C6 -1.48556644e-027
C7 1.0008893Se-031C7 1,0008893 Se-031
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 21AREA NO. 21
CO 0.0000CO 0.0000
Cl 4.82674733e-008Cl 4.82674733e-008
C2 1.36227355e-012C2 1.36227355e-012
C3 -9.54833030e-017C3 -9.54833030e-017
C4 9.50143078e-022C4 9.50143078e-022
C5 5.69193655e-025C5 5.69193655e-025
C6 -3.40684947e-029C6 -3.40684947e-029
C7 2.94651178e-033C7 2.94651178e-033
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 30AREA NO. 30
CO 0.0000CO 0.0000
Cl -1.45O94804e-009Cl -1.45O94804e-009
C2 5.04456796e-013C2 5.04456796e-013
C3 -5.09450648e-018C3 -5.09450648e-018
C4 -1.99406773 e-022C4 -1.99406773 e-022
C5 -1.14064975e-026C5 -1.14064975e-026
C6 5.78307927e-031C6 5.78307927e-031
C7 -1.43630501e-035C7 -1.43630501e-035
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 36AREA NO. 36
CO 0.0000CO 0.0000
Cl -1.43259985e-008Cl -1.43259985e-008
C2 -3.56045780e-013C2 -3.56045780e-013
C3 -7.68193084e-018C3 -7.68193084e-018
C4 -1.87091119e-022C4 -1.87091119e-022
C5 -1.28218449e-026C5 -1.28218449e-026
C6 3.62372568e-031C6 3.62372568e-031
C7 -2.39455297e-035C7 -2.39455297e-035
C8 0.00000000e+000C8 0.00000000e + 000
C9. 0.00000000e+000C9. 0.00000000E + 000
FLAECHE R. 46AREA R. 46
CO 0.0000CO 0.0000
Cl -7.4430095 le-010Cl-7.4430095 le-010
C2 -1.00597848e-013C2 -1.00597848e-013
C3 -1.16300854e-017C3 -1.16300854e-017
C4 3.24986044e-023 C5 5.82666461e-027C4 3.24986044e-023 C5 5.82666461e-027
C6 -4.12661445e-031C6 -4.12661445e-031
C7 6.25538499e-036C7 6.25538499e-036
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 47AREA NO. 47
CO 0.0000CO 0.0000
Cl -7.10390913e-009Cl -7.10390913e-009
C2 1.80939707e-014C2 1.80939707e-014
C3 -1.34383300e-017C3 -1.34383300e-017
C4 -1.50233953e-023C4 -1.50233953e-023
C5 7.80860338e-027C5 7.80860338e-027
C6 -4.98388772e-031C6 -4.98388772e-031
C7 9.26846573e-036C7 9.26846573e-036
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
Anhand von Figur 3 wird eine rein refraktive Lmsenanordnung 21, die für die Belichtungs Wellenlänge von 157,6 nm ausgelegt ist, näher beschrieben. Die Baulänge dieses Linsenanordnung 21 beträgt 1344,0 mm gemessen von Objektebene 0 zu Bildebene 0'. Es ist ein Feld von 10,5x26 mm2 belichtbar. Auch diese Linsenanordnung 21 weist wiederum in eine Eingangsgruppe EG1 auf, die durch die ersten objektseitig angeordneten, eine negative Brechkraft aufweisenden Luisen gebildet wird. Mit den darauffolgenden Linsen mit den Flächen 8-15 wird die Linsengruppe LG1 gebildet. Wiederum ist die letzte Linsenfläche 15 dieser Linsengruppe waferseitig asphärisiert.A purely refractive lens arrangement 21, which is designed for the exposure wavelength of 157.6 nm, is described in more detail with reference to FIG. 3. The overall length of this lens arrangement 21 is 1344.0 mm measured from object plane 0 to image plane 0 '. A field of 10.5x26 mm 2 can be exposed. This lens arrangement 21 also has an input group EG1, which is formed by the first louvres arranged on the object side and having a negative refractive power. The lens group LG1 is formed with the subsequent lenses with the areas 8-15. Again, the last lens surface 15 of this lens group is aspherized on the wafer side.
Durch die darauffolgenden Luisen mit den Flächen 16-21 wird eine dritte Linsengruppe LG2 gebildet. Diese dritte Linsengruppe LG2 weist insgesamt negative Brechkraft auf und es wird durch diese Linsengruppe eine deutlich ausgeprägte Taille 29 gebildet. An diese Linsengruppe schließt sich eine vierte Linsengruppe LG3 an, die eine langgestreckte röhrenförmige Gestalt aufweist, hi dieser vierten Luisengruppe ist eine Systemblende 19 angeordnet. Diese Linsengruppe LG3 weist auf der der dritten Linsengruppe LG2 zugewandten Seite eine Untergruppe UG3a auf, die geringe positive Brechkraft aufweist. Darauf folgt eine schwach ausgebildete Taille UG3b, die durch zwei negative Linsen gebildet wird, die einen großen Durcliniesser, n indestens 85 % des maximalen Durchmesser, aufweisen. Durch diese beiden aufeinanderfolgenden negativ Luisen wird eme schwache Taille UG3b gebildet. Diese Negativhnsen sind Teil der Dubletts Dl und D2. Weiterhin sind noch zwei weitere Dubletts, mit D3 und D4 bezeichnet, vor der Systeniblende 19 angeordnet. Mit D5 ist ein weiteres Dublett bezeichnet, dass eine Doppelsphäre durch die Asphären auf den Linsenoberflächen 46 und 47 aufweist. Der Endbereich mit UG3d bezeichnet, umfasst eine Mehrzahl von dünnen Linsen, durch die das aufgeweitete Lichtbündel 23 auf den Wafer bzw. auf die Bildebene fokussiert wird.A third lens group LG2 is formed by the subsequent Luisen with the surfaces 16-21. This third lens group LG2 has an overall negative refractive power and a clearly pronounced waist 29 is formed by this lens group. This lens group is followed by a fourth lens group LG3, which has an elongated tubular shape, and a system aperture 19 is arranged in this fourth Luisen group. On the side facing the third lens group LG2, this lens group LG3 has a sub-group UG3a which has low positive refractive power. This is followed by a weakly formed waist UG3b, which is formed by two negative lenses, which have a large Durlininserser, n at least 85% of the maximum diameter. These two consecutive negative lises form a weak waist UG3b. These negative nuts are part of the doublets Dl and D2. Furthermore, two further doublets, designated D3 and D4, are arranged in front of the system aperture 19. With D5 is another doublet denotes that a double sphere has through the aspheres on the lens surfaces 46 and 47. The end region, designated UG3d, comprises a plurality of thin lenses through which the expanded light bundle 23 is focused on the wafer or on the image plane.
Die in Figur 3 gezeigte Lmsenanordnung 21 ist ebenfalls für die Wellenlänge 193 rnn ausgelegt und weist eine Baulänge von 1344 mm auf. Das mit dieser Linsenanordnung 21 belichtbare Feld beträgt 10,5x26 mm2. Die numerische Apertur beträgt 0,85. Mit diesem Objektiv wird das Objelct 9 um den Faktor 4 verkleinert auf die Bildebene 13 abgebildet. Die genauen Linsendaten sind der Tabelle 2 zu entneh en.The lens arrangement 21 shown in FIG. 3 is also designed for the wavelength 193 mm and has a length of 1344 mm. The field that can be exposed with this lens arrangement 21 is 10.5 × 26 mm 2 . The numerical aperture is 0.85. With this lens, the object 9 is imaged on the image plane 13 reduced by a factor of 4. The exact lens data can be found in Table 2.
TABELLE 2TABLE 2
M1634aM1634a
BRECHZAHL 1/2 FREIERFRESH NUMBER 1/2 FREE
F L. RADIEN DICKEN GLAESER 193.304mn DURCHMESSERF L. RADIEN THICK GLASSES 193.304mn DIAMETER
0.000000000 24.172413800 N2 1.00000320 56.080 0.000000000 15.006569837 N2 1.00000320 61.282 599.473674706AS 17.471359581 SI02HL 1.56028895 65.688 142.945533106 15.594383723 N2 1.00000320 67.351 520.792476125AS 15.866311924 SI02HL 1.56028895 70.201 458.213670894 35.531230748 N2 1.00000320 72.731 -130.942246277 29.261434955 SI02HL 1.56028895 75.090 -522.4344083-67 1.046065674 N2 1.00000320 96.747 -6686.031621900 34.314309045 SI02HL 1.56028895 103.3590.000000000 24.172413800 N2 N2 1.00000320 1.00000320 56,080 0.000000000 15.006569837 17.471359581 61,282 599.473674706AS SI02HL 1.56028895 65,688 142.945533106 15.594383723 N2 1.00000320 67,351 520.792476125AS 15.866311924 SI02HL 1.56028895 70,201 458.213670894 35.531230748 N2 1.00000320 72,731 -130.942246277 29.261434955 SI02HL 1.56028895 75,090 -522.4344083-67 1.046065674 N2 1.00000320 96,747 -6686.031621900 34.314309045 SI02HL 1,56028895 103,359
9 -218.186494807 0.676827586 N2 1.00000320 106.3889 -218.186494807 0.676827586 N2 1.00000320 106.388
10 706.363261168 45.122462397 SI02HL 1.56028895 119,09410 706.363261168 45.122462397 SI02HL 1.56028895 119.094
11 -278.472163674 0.676827586 N2 1.00000320 120.15511 -278.472163674 0.676827586 N2 1.00000320 120.155
12 959.514633579 36.082624687 SI02HL 1.56028895 118.38312 959.514633579 36.082624687 SI02HL 1.56028895 118.383
13 -896.787607317 4.587825747 N2 1.00000320 116.76213 -896.787607317 4.587825747 N2 1.00000320 116.762
14 158.750812726 85.801121037 SI02HL 1.56028895 106.22914 158.750812726 85.801121037 SI02HL 1.56028895 106.229
15 300.475102689AS 43. 038670535 N2 1.00000320 83.11715 300.475102689AS 43.038670535 N2 1.00000320 83.117
16 -175.884377464A 6, 768275864 SI02HL 1.56028895 72.47616 -175.884377464A 6, 768275864 SI02HL 1.56028895 72.476
17 320.319576676 27 ,446116916 N2 1.00000320 68.29317 320.319576676 27, 446116916 N2 1.00000320 68.293
18 -146.443321423 9 ,668965520 SI02HL 1.56028895 67.97418 -146.443321423 9, 668965520 SI02HL 1.56028895 67.974
19 339.454879151 28 ,665475857 N2 1.00000320 72.27919 339.454879151 28, 665475857 N2 1.00000320 72.279
20 -161.977156970 10 ,635862072 SI02HL 1.56028895 73.41420 -161.977156970 10, 635862072 SI02HL 1.56028895 73.414
21 -238.647909042AS 15.370621050 N2 1.00000320 79.55121 -238.647909042AS 15.370621050 N2 1.00000320 79.551
22 -150.311235300 27.766876031 SI02HL 1.56028895 81.60422 -150.311235300 27.766876031 SI02HL 1.56028895 81.604
23 -155.362800581 0.676827586 N2 1.00000320 92.92823 -155.362800581 0.676827586 N2 1.00000320 92.928
24 -428.765583246 34.936111184 SI02HL 1.56028895 101.38324 -428.765583246 34.936111184 SI02HL 1.56028895 101.383
25 -220.472579824 0.676827586 N2 1.00000320 108.19825 -220.472579824 0.676827586 N2 1.00000320 108.198
26 -438.752339375 25.651183289 SI02HL 1.56028895 111.99326 -438.752339375 25.651183289 SI02HL 1.56028895 111.993
27 -486.537649387 16.665277911 N2 1.00000320 118.67927 -486.537649387 16.665277911 N2 1.00000320 118.679
28 286.503340486 84.567562777 SI02HL 1.56028895 136.36328 286.503340486 84.567562777 SI02HL 1.56028895 136.363
29 -370.847311034 7.492580442 N2 1.00000320 135.39429 -370.847311034 7.492580442 N2 1.00000320 135.394
30 -366.945132944AS11.602758624 SI02HL 1.56028895 132.01330 -366.945132944AS11.602758624 SI02HL 1.56028895 132.013
31 577.586771717 32.431277232 N2 1.00000320 128.10831 577.586771717 32.431277232 N2 1.00000320 128.108
32 -559.674262738 11.602758624 SI02HL 1.56028895 128.11032 -559.674262738 11.602758624 SI02HL 1.56028895 128.110
33 537.388094819 2.743298664 N2 1.00000320 131.720 34 408.077824696 42.484571757 SI02HL 1.56028895 134.39433 537.388094819 2.743298664 N2 1.00000320 131.720 34 408.077824696 42.484571757 SI02HL 1.56028895 134.394
35 -717.357209302 0.676827586 N2 1.00000320 134.71835 -717.357209302 0.676827586 N2 1.00000320 134.718
36 583.086197224AS 6.768275864 SI02HL .1.56028895 133.96536 583.086197224AS 6.768275864 SI02HL .1.56028895 133.965
37 269.271701042 7.352686536 N2 1.00000320 133.55037 269.271701042 7.352686536 N2 1.00000320 133.550
38 281.248185100 35.203322187 SI02HL 1.56028895 136.01838 281.248185100 35.203322187 SI02HL 1.56028895 136.018
39 472.606393970 3.186212988 N2 1.00000320 135.91839 472.606393970 3.186212988 N2 1.00000320 135.918
40 363.576248488 54.546183651 SI02HL 1.56028895 137.63340 363.576248488 54.546183651 SI02HL 1.56028895 137.633
41 -468.746315410 23.108875520 N2 1.00000320 137.32441 -468.746315410 23.108875520 N2 1.00000320 137.324
42 -251.383937308 11.602758624 SI02HL 1.56028895 136.43742 -251.383937308 11.602758624 SI02HL 1.56028895 136.437
43 -1073.133309030 33.841379320 N2 1.00000320 140.15843 -1073.133309030 33.841379320 N2 1.00000320 140.158
44 0.000000000 -24.172413800 N2 1.00000320 142.96944 0.000000000 -24.172413800 N2 1.00000320 142.969
45 300.919916537 63.201252893 SI02HL 1.56028895 150.41145 300.919916537 63.201252893 SI02HL 1.56028895 150.411
46 -982.360166014AS11.220067842 N2 1.00000320 149.61846 -982.360166014AS11.220067842 N2 1.00000320 149.618
47 -644.040642268AS11.602758624 SI02HL , 1.56028895 : 148.33047 -644.040642268AS11.602758624 SI02HL, 1.56028895: 148.330
48 251.499390884 13.548863209 N2 1.00000320 144.38448 251.499390884 13.548863209 N2 1.00000320 144.384
49 295.116548681 83.834389825 SI02HL 1.56028895 147.23149 295.116548681 83.834389825 SI02HL 1.56028895 147.231
50 -592.936469041 0.676827586 N2 1.00000320 147.24350 -592.936469041 0.676827586 N2 1.00000320 147.243
51 463.737108447 36.976613477 SI02HL 1.56028895 141.16751 463.737108447 36.976613477 SI02HL 1.56028895 141.167
52 -1426.895647680 0.695672042 N2 1.00000320 139.47552 -1426.895647680 0.695672042 N2 1.00000320 139.475
53 140.559527472 39.416922789 SI02HL 1.56028895 113.15753 140.559527472 39.416922789 SI02HL 1.56028895 113.157
54 220.743893827 0.878083956 N2 1.00000320 106.60754 220.743893827 0.878083956 N2 1.00000320 106.607
55 135.149194981 30.341942424 SI02HL 1.56028895 96.27255 135.149194981 30.341942424 SI02HL 1.56028895 96.272
56 227.528619088 0.689419669 N2 1.00000320 89.30056 227.528619088 0.689419669 N2 1.00000320 89.300
57 157.276474717 26.304510971 SI02HL 1.56028895 82.53657 157.276474717 26.304510971 SI02HL 1.56028895 82.536
58 236.864111032 8.994847659 N2 1.00000320 70.21858 236.864111032 8.994847659 N2 1.00000320 70.218
59 366.476934349 10.551547532 SI02HL L56028895 63.77959 366.476934349 10.551547532 SI02HL L56028895 63.779
60 98.334230915 0.676870172 N2 1.00000320 49.22060 98.334230915 0.676870172 N2 1.00000320 49.220
61 98.324175829 8.007759247 SI02HL 1.56028895 48.80261 98.324175829 8.007759247 SI02HL 1.56028895 48.802
62 76.949074769 8.603791096 N2 1.00000320 42.52562 76.949074769 8.603791096 N2 1.00000320 42.525
63 99.077661785 24.844220969 SI02HL 1.56028895 39.13163 99.077661785 24.844220969 SI02HL 1.56028895 39.131
64 511.945903814 8.702068968 N2 1.00000320 26.96364 511.945903814 8.702068968 N2 1.00000320 26.963
65 0.000000000 0.000000000 N2 1.00000320 14.02065 0.000000000 0.000000000 N2 1.00000320 14.020
66 0.000000000 0.000000000 1.00000000 14.02066 0.000000000 0.000000000 1.00000000 14,020
ASPHAERISCHE KONSTANTEN FLAECHE NR, 2ASPHERIC CONSTANT AREA NO.2
CO 0.0000 CO 0.0000
C2 -7.84396436e-012C2 -7.84396436e-012
C3 4.40001122e-016C3 4.40001122e-016
C4 -7.79882973e-021 C4 -7.79882973e-021
C6 2.14846923e-027C6 2.14846923e-027
C7 -1.41595024e-031C7 -1.41595024e-031
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 4AREA NO. 4
CO 0.0000CO 0.0000
Cl 8.23267830e-008Cl 8.23267830e-008
C2 2.76986901e-012 C2 2.76986901e-012
C4 -7.24098423e-021C4 -7.24098423e-021
C5 1.06376091e-023 C5 1.06376091e-023
CO 0.0000CO 0.0000
Cl -1.4872285le-008Cl -1.4872285le-008
C2 -3.21783489e-013 C2 -3.21783489e-013
C4 -1.66369859e-022C4 -1.66369859e-022
C5 8.53060454e-028C5 8.53060454e-028
C6 -4.40031159e-032C6 -4.40031159e-032
C7 -1.13839635e-036C7-1.13839635e-036
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE R. 46AREA R. 46
CO 0.0000CO 0.0000
Cl -1.29322449e-009Cl -1.29322449e-009
C2 -7.13114740e-014C2 -7.13114740e-014
C3 -9.86341305e-018C3 -9.86341305e-018
C4 7.04573131e-023C4 7.04573131e-023
C5 6.79406884e-027C5 6.79406884e-027
C6 -5.13273315e-031C6 -5.13273315e-031
C7 8.48667932e-036C7 8.48667932e-036
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 47AREA NO. 47
CO 0.0000CO 0.0000
Cl -6.45902286e-009Cl -6.45902286e-009
C2 -2.38977080e-014C2 -2.38977080e-014
C3 -1.08609626e-017C3 -1.08609626e-017
C4 2.89713800e-023C4 2.89713800e-023
C5 1.03658811e-026C5 1.03658811e-026
C6 -6.18950334e-031C6 -6.18950334e-031
C7 1.10366044e-035C7 1.10366044e-035
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
Die m Figur 4 dargestellte Linsenanordnung ist für die Belichtungswellenläiige 157 nm ausgelegt. Die Baulänge beträgt 1390,0 mm gemessen von Objelctebene 0 zu Bildebene 0'. Mit dieser Lmsenanordnung 21 ist ein Feld von 10,5 nmιx26nιnι beHchtbar. Der makroskopische Aufbau dieser Lmsenanordnung unterscheidet sich nur unwesentlich von dem in Figur 3 dargestelltenLinsenanordnuiig, so dass hier auf eme detaillierte Beschreibung verzichtet wird. Die genauen Linsendaten sind der Tabelle 3 zu entnehmen. TABELLE 3The lens arrangement shown in FIG. 4 is designed for the 157 nm exposure wavelength. The overall length is 1390.0 mm measured from object level 0 to image level 0 '. With this lens arrangement 21, a field of 10.5 nmιx26nιnι can be observed. The macroscopic structure of this lens arrangement differs only slightly from the lens arrangement shown in FIG. 3, so that a detailed description is not given here. The exact lens data can be found in Table 3. TABLE 3
Ml 640aMl 640a
BRECHZAHL 1/2 FREIERFRESH NUMBER 1/2 FREE
FL. RADIEN DICKEN GLAESER 157.629nm DURCHMESSERFL. RADIEN THICK GLASSES 157.629nm DIAMETER
0 0.000000000 25.000000000 N2V157 1.00031429 59.0000 0.000000000 25.000000000 N2V157 1,00031429 59,000
1 0.000000000 15.339378260 N2V157 1.00031429 64.4351 0.000000000 15.339378260 N2V157 1,00031429 64,435
2 598.342471978AS 18.724519350 CAF2V157 1.55929035 69.0772 598.342471978AS 18.724519350 CAF2V157 1.55929035 69.077
3 48.181482862 16.454829635 N2V157 1.00031429 70.7933 48.181482862 16.454829635 N2V157 1,00031429 70,793
4 564.226137144AS 16.592649095 CAF2V157 1.55929035 73.6974 564.226137144AS 16.592649095 CAF2V157 1.55929035 73.697
5 465.197188245 36.842463522 N2V157 1.00031429 76.4035 465.197188245 36.842463522 N2V157 1,00031429 76,403
6 -136.836954878 30.276088945 CAF2V157 1.55929035 78.6476 -136.836954878 30.276088945 CAF2V157 1.55929035 78.647
7 -551.745951642 1.159089824 N2V157 1.00031429 101.4307 -551.745951642 1.159089824 N2V157 1,00031429 101,430
8 -9088.971563130 35.614698676 CAF2V157 1.55929035 108.5948 -9088.971563130 35.614698676 CAF2V157 1.55929035 108.594
9 -226.956823330 0.700000000 N2V157 1.00031429 111.4759 -226.956823330 0.700000000 N2V157 1.00031429 111.475
10 723.679003959 46.740300924 CAF2V157 1.55929035 125.05910 723.679003959 46.740300924 CAF2V157 1.55929035 125.059
11 -289.614238561 0.700000002 N2V157 1.00031429 126.01511 -289.614238561 0.700000002 N2V157 1,00031429 126.015
12 910.153581387 34.209584427 CAF2V157 1.55929035 124.00612 910.153581387 34.209584427 CAF2V157 1.55929035 124.006
13 -966.460684234 6.344682099 N2V157 1.00031429 122.51713 -966.460684234 6.344682099 N2V157 1,00031429 122,517
14 165.167813091 88.645251493 CAF2V157 1.55929035 110.77714 165.167813091 88.645251493 CAF2V157 1.55929035 110.777
15 311.690939161AS 44.560755800 N2V157 1.00031429 86.75215 311.690939161AS 44.560755800 N2V157 1,00031429 86,752
16 -181.953058549AS 7.000000001 CAF2V157 1.55929035 75.71716 -181.953058549AS 7.000000001 CAF2V157 1.55929035 75.717
17 324.246438590 28.589730429 N2V157 1.00031429 71.20517 324.246438590 28.589730429 N2V157 1,00031429 71,205
18 -151.825774985 10.000000000 CAF2V157 1.55929035 70.90718 -151.825774985 10.000000000 CAF2V157 1.55929035 70.907
19 355.946694253 29.718149685 N2V157 1.00031429 75.41219 355.946694253 29.718149685 N2V157 1,00031429 75,412
20 -167.034295485 11.000000000 CAF2V157 1.55929035 76.48020 -167.034295485 11.000000000 CAF2V157 1.55929035 76.480
21 -246.225068997AS 15.900879213 N2V157 1.00031429 82.88221 -246.225068997AS 15.900879213 N2V157 1,00031429 82,882
22 -155.088799672 28.774591277 CAF2V157 1.55929035 84.93522 -155.088799672 28.774591277 CAF2V157 1.55929035 84.935
23 -160.065089727 0.718056461 N2V157 1.00031429 96.65523 -160.065089727 0.718056461 N2V157 1,00031429 96,655
24 -441.811052729 36.169965537 CAF2V157 1.55929035 105.53924 -441.811052729 36.169965537 CAF2V157 1.55929035 105.539
25 -228.522063652 0.700000001 N2V157 1.00031429 112.57725 -228.522063652 0.700000001 N2V157 1,00031429 112,577
26 -454.136397771 26.566366602 CAF2V157 1.55929035 116.53226 -454.136397771 26.566366602 CAF2V157 1.55929035 116.532
27 -500.119500379 17.199265008 N2V157 1.00031429 123.43927 -500.119500379 17.199265008 N2V157 1.00031429 123.439
28 296.713551807 87.963677578 CAF2V157 1.55929035 141.80328 296.713551807 87.963677578 CAF2V157 1.55929035 141.803
29 -382.314123004 7.668609038 N2V157 1.00031429 140.78029 -382.314123004 7.668609038 N2V157 1,00031429 140,780
30 -376.638593815AS 12.000000000 CAF2V157 1.55929035 137.27430 -376.638593815AS 12.000000000 CAF2V157 1.55929035 137.274
31 607.216067418 33.641387962 N2V157 1.00031429 133.15031 607.216067418 33.641387962 N2V157 1,00031429 133,150
32 -570.164044613 12.000000000 CAF2V157 1.55929035 ' 133.14132 -570.164044613 12.000000000 CAF2V157 1.55929035 ' 133.141
33 564.533373593 2.816684919 N2V157 1.00031429 136.87133 564.533373593 2.816684919 N2V157 1,00031429 136,871
34 427.721752683 43.902690083 CAF2V157 1.55929035 139.59034 427.721752683 43.902690083 CAF2V157 1.55929035 139.590
35 -732.675269060 0.700000000 N2V157 1.00031429 139.91435 -732.675269060 0.700000000 N2V157 1,00031429 139,914
36 602.910545189AS 7.000000000 CAF2V157 1.55929035 139.07936 602.910545189AS 7.000000000 CAF2V157 1.55929035 139.079
37 279.908546327 7.662016814 N2V157 1.00031429 138.63137 279.908546327 7.662016814 N2V157 1,00031429 138,631
38 292.067625915 33.982510064 CAF2V157 1.55929035 141.19438 292.067625915 33.982510064 CAF2V157 1.55929035 141.194
39 486.808587823 3.734684777 N2V157 1.00031429 141.08739 486.808587823 3.734684777 N2V157 1,00031429 141,087
40 374.488854583 56.692816434 CAF2V157 1.55929035 142.95240 374.488854583 56.692816434 CAF2V157 1.55929035 142.952
41 -487.437697890 24.337612976 N2V157 1.00031429 142.63141 -487.437697890 24.337612976 N2V157 1,00031429 142,631
42 -260.866697273 12.000000000 CAF2V157 1.55929035 141.62542 -260.866697273 12.000000000 CAF2V157 1.55929035 141.625
43 -1117.259721160 35.000000000 N2V157 1.00031429 145.54143 -1117.259721160 35.000000000 N2V157 1,00031429 145,541
44 0.000000000 ■ 25.000000000 N2V157 1.00031429 148.09444 0.000000000 ■ 25.000000000 N2V157 1,00031429 148,094
45 311.002273193 65.578230150 CAF2V157 1.55929035 157.03445 311.002273193 65.578230150 CAF2V157 1.55929035 157.034
46 -1023.554315350AS 11.481377894 N2V157 1.00031429 156.35646 -1023.554315350AS 11.481377894 N2V157 1,00031429 156,356
47 -672.576714992AS 12.000000000 CAF2V157 1.55929035 155.11347 -672.576714992AS 12.000000000 CAF2V157 1.55929035 155.113
259.883468261 14.205528799 N2V157 1.00031429 151.262259.883468261 14.205528799 N2V157 1,00031429 151,262
49 305.263739591 86.781334194 CAF2V157 1.55929035 154.398 50 -617.755257115 0.700000000 N2V157 1.00031429 154.565 51 476.256251891 38.263167655 CAF2V157 1.55929035 148.49149 305.263739591 86.781334194 CAF2V157 1.55929035 154.398 50 -617.755257115 0.700000000 N2V157 1.00031429 154.565 51 476.256251891 38.263167655 CAF2V157 1.55929035 148.491
52 -1486.494799770 0.719489630 N2V157 1.00031429 147.01052 -1486.494799770 0.719489630 N2V157 1,00031429 147.010
53 145.476122811 40.782858325 CAF2V157 1.55929035 119.01953 145.476122811 40.782858325 CAF2V157 1.55929035 119.019
54 229.665054801 0.933275871 N2V157 1.00031429 113.05154 229.665054801 0.933275871 N2V157 1,00031429 113.051
55 140.220419138 31.392645646 CAF2V157 1.55929035 101.74055 140.220419138 31.392645646 CAF2V157 1.55929035 101.740
56 234.824506571 0.723640009 N2V157 1.00031429 95.08856 234.824506571 0.723640009 N2V157 1,00031429 95.088
57 162.332837065 27.214899096 CAF2V157 1.55929035 87.54157 162.332837065 27.214899096 CAF2V157 1.55929035 87.541
58 244.278333665 9.299918126 N2V157 1.00031429 74.72658 244.278333665 9.299918126 N2V157 1.00031429 74.726
59 376.868342950 10.929551626 CAF2V157 1.55929035 67.90259 376.868342950 10.929551626 CAF2V157 1.55929035 67.902
60 101.455739030 0.715773254 N2V157 1.00031429 51.84760 101.455739030 0.715773254 N2V157 1,00031429 51,847
61 101.162965635 8.299519050 CAF2V157 1.55929035 51.36161 101.162965635 8.299519050 CAF2V157 1.55929035 51.361
62 79.437870675 8.884307252 N2V157 1.00031429 44.61962 79.437870675 8.884307252 N2V157 1.00031429 44.619
63 102.534993850 25.750482491 CAF2V157 1.55929035 41.06663 102.534993850 25.750482491 CAF2V157 1.55929035 41.066
64 527,160854703 9.000000000 N2V157 ' 1.00031429 28.05364 527.160854703 9.000000000 N2V157 ' 1.00031429 28.053
65 0.000000000 0.000000000 N2V157 1.00031429 14.75065 0.000000000 0.000000000 N2V157 1,00031429 14,750
66 0.000000000 0.000000000 1.00000000 14.75066 0.000000000 0.000000000 1.00000000 14.750
ASPHAERISCHE KONSTANTENASPHERIC CONSTANTS
FLAECHE NR. 2AREA NO. 2
CO 0.0000CO 0.0000
Cl 1.13998854e-007Cl 1.13998854e-007
C2 -6.36178693e-012C2 -6.36178693e-012
C3 3.23659752e-016C3 3.23659752e-016
C4 -5.32444727e-021C4 -5.32444727e-021
C5 -8.32495109e-024 C5 -8.32495109e-024
C7 -7.83910573e-032C7 -7.83910573e-032
C8 0.00000000e+000C8 0.00000000e + 000
C9 O.00O00000e+000C9 O.00O00000e + 000
FLAECHE NR. 4AREA NO. 4
CO 0.0000CO 0.0000
Cl 7.54224753e-008Cl 7.54224753e-008
C2 2.18650725e-012C2 2.18650725e-012
C3 -1.43119795e-016C3 -1.43119795e-016
C4 -4.77106422e-021C4 -4.77106422e-021
C5 6.81749068e-024C5 6.81749068e-024
C6 -8.54589429e-028C6 -8.54589429e-028
C7 5.97164385e-032C7 5.97164385e-032
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 15AREA NO. 15
CO 0.0000CO 0.0000
Cl -6.96O85201e-009Cl -6.96O85201e-009
C2 -2.46245992e-012C2 -2.46245992e-012
C3 -1.57870389e-016C3 -1.57870389e-016
C4 -8.75762750e-021C4 -8.75762750e-021
C5 3.86817665e-025C5 3.86817665e-025
C6 -9.00885871e-029C6 -9.00885871e-029
C7 8.78630596e-033C7 8.78630596e-033
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000 FLAECHE NR. 16C9 0.00000000e + 000 AREA NO. 16
CO 0.0000CO 0.0000
Cl -3.45865856e-008Cl -3.45865856e-008
C2 2.71322951e-012C2 2.71322951e-012
C3 1.50235080e-016C3 1.50235080e-016
C4 1.89751309e-020C4 1.89751309e-020
C5 -1.30006219e-024C5 -1.30006219e-024
C6 6.16358831e-030C6 6.16358831e-030
C7 1.17159428e-033C7 1.17159428e-033
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 21AREA NO. 21
CO 0.0000CO 0.0000
Cl -1.29712266e-008Cl -1.29712266e-008
C2 2.27339781e-012C2 2.27339781e-012
C3 1.44782825e-016C3 1.44782825e-016
C4 1.49868277e-020C4 1.49868277e-020
C5 -4.08871955e-025C5 -4.08871955e-025
C6 1.55577307e-028C6 1.55577307e-028
C7 -1.00785028e-032C7-1.00785028e-032
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 30AREA NO. 30
CO 0.0000CO 0.0000
Cl -2.06288424e-009Cl -2.06288424e-009
C2 5.71589058e-013C2 5.71589058e-013
C3 -2.21 154944e-018C3 -2.21 154944e-018
C4 -8.89810821e-023C4 -8.89810821e-023
C5 -1.08068385e-026C5-1.08068385e-026
C6 4.36847400e-031C6 4.36847400e-031
C7 -5.73712694e-036C7 -5.73712694e-036
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 36AREA NO. 36
CO 0.0000CO 0.0000
Cl -1.34482120e-008Cl -1.34482120e-008
C2 -2,70871166e-013C2 -2.70871166e-013
C3 -1.46625867e-018C3 -1.46625867e-018
C4 -1.23067852e-022C4 -1.23067852e-022
C5 6.79261614e-028C5 6.79261614e-028
C6 -3.16281062e-032C6 -3.16281062e-032
C7 -5.79252063e-037C7 -5.79252063e-037
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 46AREA NO. 46
CO 0.0000CO 0.0000
Cl -1.19258053e-009Cl -1.19258053e-009
C2 -6.06323614e-014C2 -6.06323614e-014
C3 -7.79480128e-018 C4 5.18508440e-023C3 -7.79480128e-018 C4 5.18508440e-023
C5 4.67224846e-027C5 4.67224846e-027
C6 -3.31365069e-031C6 -3.31365069e-031
C7 5.12625482e-036C7 5.12625482e-036
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 47AREA NO. 47
CO 0.0000CO 0.0000
Cl -5.81614530e-009Cl -5.81614530e-009
C2 -2.06494325e-014C2 -2.06494325e-014
C3 -8.58899622e-018C3 -8.58899622e-018
C4 2.06606063e-023C4 2.06606063e-023
C5 7.14078196e-027C5 7.14078196e-027
C6 -3.99032238e-031C6 -3.99032238e-031
C7 6.64567245e-036C7 6.64567245e-036
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
Die in Figur 5 dargestellt Lmsenanordnung 21 ist ebenfalls für die Wellenlänge 157,6 nm ausgelegt. Dieses Lmsenanordnung 21 unterscheidet sich maßgeblich dadurch, dass nur 3 Dubletts Dl, D2 und D4 vor der Systemblende 19 angeordnet sind. Das in den vorhergehenden Figuren mit D3 zeichnete Dublett ist entfallen. Die beiden aufeinanderfolgenden Negativlinsen, durch die die zweite schwach ausgeprägte Taille gebildet wird, sind beabstandet voneinander angeordnet. Durch diese geänderte Anordnung und die Einsparung des Dublets D3 wird erreicht, dass das Linsenvolumen sinkt.The lens arrangement 21 shown in FIG. 5 is also designed for the wavelength 157.6 nm. This lens arrangement 21 differs significantly in that only 3 doublets D1, D2 and D4 are arranged in front of the system diaphragm 19. The doublet marked D3 in the previous figures has been omitted. The two successive negative lenses, through which the second weakly defined waist is formed, are arranged at a distance from one another. As a result of this changed arrangement and the saving of the doublet D3, the lens volume is reduced.
Die genauen Linsendaten smd der nachfolgenden Tabelle 4 zu entnehmen.The exact lens data can be found in Table 4 below.
Tabelle 4Table 4
ml 641a ml 641a
pat_ml641a . txt TABELLE 4pat_ml641a. txt TABLE 4
Ml 6 1aMl 6 1a
BRECHZAHL 1/2 FREIERFRESH NUMBER 1/2 FREE
FLAECHE RADIEN DICKEN GLAESER 157.629nm DURCHMESSERAREA RADIEN THICK GLASSES 157.629nm DIAMETER
0 0. 000000000 23. 762838750 N2V157 1.00031429 56. 0B00 0. 000000000 23. 762838750 N2V157 1,00031429 56. 0B0
1 0. ooooooόoo 14. 246137526 N2V157 1.00031429 61. ,2461 0. ooooooόoo 14. 246137526 N2V157 1.00031429 61., 246
2 514. 707276562AS 13. 9B1815236 CAF2V157 1.55929035 65. 6882 514. 707276562AS 13. 9B1815236 CAF2V157 1.55929035 65. 688
3 138. 212721202 15. 579876293 N2V157 1.00031429 66. 9513 138. 212721202 15. 579876293 N2V157 1,00031429 66. 951
4 534. 824781243AS 12. 739496641 CAF2V157 1.55929035 69. 6224 534.824781243AS 12. 739496641 CAF2V157 1.55929035 69.662
5 389. 864179126 33. 913726677 N2V157 1.00031429 71. 6845 389.864179126 33.913726677 N2V157 1.00031429 71.684
6 -131. 473719619 28. 107831970 CAF2V157 1.55929035 73. 5866 -131. 473719619 28. 107831970 CAF2V157 1.55929035 73.586
7 -471. 981433648 1. 069906657 N2VΪ57 1.00031429 93. 8997-471. 981433648 1. 069906657 N2VΪ57 1,00031429 93,899
8 0. 000000000 34. 3081B4523 CAF2V157 1.55929035 101. 2258 0. 000000000 34. 3081B4523 CAF2V157 1.55929035 101. 225
9 -228. 280123150 0. 704684075 N2V157 1.00031429 104. 7249-228. 280123150 0. 704684075 N2V157 1.00031429 104.724
10 796. 724829345 43. 758159816 CAF2V157 1.55929035 116. 17310 796.724829345 43.758159816 CAF2V157 1.55929035 116.73
11 -266. 360318650 0. 745094303 N2V157 1.00031429 117. 34711-266. 360318650 0. 745094303 N2V157 1.00031429 117.347
12 1081. 261439844 23. 811542913 CAF2V157 1.55929035 115. 9-6912 1081.261439844 23. 811542913 CAF2V157 1.55929035 115.9-69
13 -712. 390784368 9. 91673-1254 N2V157 1.00031429 115: 44313 -712. 390784368 9. 91673-1254 N2V157 1.00031429 115: 443
14 158. 258040233 80. 929657183 CAF2V157 1.55929035 103. 89314 158.258040233 80.929657183 CAF2V157 1.55929035 103.893
15 328. 916333526AS 43. 637981348 N2V157 1.00031429 83. 02115 328.916333526AS 43.637981348 N2V157 1.00031429 83.021
16 -163. 783184213AS 8. 000000000 CAF2V157 1.55929035 71. 47716-163. 783184213AS 8. 000000000 CAF2V157 1.55929035 71.477
17 294. 432712383 27. 405950067 N2V157 1.00031429 67. ,25617 294.432712383 27. 405950067 N2V157 1.00031429 67., 256
18 -144. 330554051 8. ,234758928 CAF2V157 1.55929035 67. ,03218-144. 330554051 8., 234758928 CAF2V157 1.55929035 67., 032
19 397. ,835892386 28. ,266532844 N2V157 1.00031429 71, ,37319 397, 835892386 28, 266532844 N2V157 1,00031429 71,, 373
20 -161, 553948900 10. .395325272 CAF2V157 1.55929035 72, ,89020 -161, 553948900 10. .395325272 CAF2V157 1.55929035 72,. 890
21 -258. , 614401773AS 15. .068965479 N2V157 1.00031429 79, ,20121-258. , 614401773AS 15. .068965479 N2V157 1,00031429 79,. 201
22 -148, ,191144865 27. ,281969779 CAF2V157 1.55929035 80. ,72622 -148,., 191144865 27., 281969779 CAF2V157 1.55929035 80., 726
23 -153. ,092043553 0, ,711404699 N2V157 1.00031429 91, ,93523-153. , 092043553 0,. 711404699 N2V157 1,00031429 91,. 935
24 -429, ,848987135 34, ,313214826 CAF2V157 1.55929035 100, ,58024 -429,, 848987135 34,, 313214826 CAF2V157 1.55929035 100,, 580
25 -222. ,509319222 0. .755186371 N2V157 1.00031429 107, ,42225-222. , 509319222 0. .755186371 N2V157 1.00031429 107,. 422
26 -446, ,042338354 25. .134410060 CAF2V157 1.55929035 111, .32526 -446,, 042338354 25. .134410060 CAF2V157 1.55929035 111, .325
27 -476. ,016743713 16. .168036298 N2V157 1.00031429 117. .86227-476. , 016743713 16..168036298 N2V157 1.00031429 117. .862
28 290. .945720195 91, ,150270987 OAF2V157 1.55929035 135. .56128 290.945720195 91., 150270987 OAF2V157 1.55929035 135. .561
29 -352, ,999009021 7. .239891532 N2V157 1.00031429 134, ,60629 -352,. 999009021 7. .239891532 N2V157 1,00031429 134., 606
30 -333. , 990335846AS 10. .794904282 CAF2V157 1.55929035 131, ,83730-333. , 990335846AS 10. .794904282 CAF2V157 1.55929035 131,. 837
31 686, ,418617658 67, ,606049576 N2V157 1.00031429 128, ,95331 686,, 418617658 67,, 606049576 N2V157 1,00031429 128,, 953
32 484, .704981071AS 20, ,247999550 CAF2V157 1.55929035 129, ,81232 484, .704981071AS 20,, 247999550 CAF2V157 1.55929035 129,, 812
33 • 272, .25691,0986 8, .301324639 N2V157 1.00031429 129, .69033 • 272, .25691.0986 8, .301324639 N2V157 1,00031429 129, .690
34 283, .424612963 21, .444612905 CAF2V157 1.55929035 132, .59334 283, .424612963 21, .444612905 CAF2V157 1.55929035 132, .593
35 441, .096441131 7, .286378331 N2V157 1.00031429 132, .61135 441, .096441131 7, .286378331 N2V157 1,00031429 132, .611
36 341. .080821148 56, .120769051 CAF2V157 1.55929035 135, .41336 341. .080821148 56, .120769051 CAF2V157 1.55929035 135, .413
37 -467 .022730717 23 .483002796 N2V157 1.00031429 135 .09237 -467 .022730717 23 .483002796 N2V157 1,00031429 135 .092
38 -251 .271987182 10 .033317804 CAF2V157 1.55929035 133 .93438 -251 .271987182 10 .033317804 CAF2V157 1.55929035 133 .934
39 -1127 .860216547 34 .039044392 N2V157 1.00031429 137 .43539 -1127 .860216547 34 .039044392 N2V157 1,00031429 137 .435
40 0 .000000000 -23 .762838750 N2V157 1.00031429 140 .28740 0 .000000000 -23 .762838750 N2V157 1,00031429 140 .287
41 297 .718439650 63 .279096400 CAF2V157 1.55929035 148 .47641 297 .718439650 63 .279096400 CAF2V157 1.55929035 148 .476
42 -917 .492707769AS 10 .913617063 N2V157 1.00031429 147 .74542 -917 .492707769AS 10 .913617063 N2V157 1,00031429 147 .745
43 -614 .308568323AS 11 .278985347 CAF2V157 1.55929035 146 .59943 -614 .308568323AS 11 .278985347 CAF2V157 1.55929035 146 .599
44 248 .499662987 14 .012163218 N2V157 1.00031429 143 .45444 248 .499662987 14 .012163218 N2V157 1,00031429 143 .454
45 293 .420324051 77 .421679876 CAF2V157 1.55929035 146 .72145 293 .420324051 77 .421679876 CAF2V157 1.55929035 146 .721
46 -577 .615924152 0 .827697085 N2V157 . 1.00031429 146 .97646 -577 .615924152 0 .827697085 N2V157. 1,000,31429,146,976
47 428 .803478030 38 .627735627 CAF2V157 1.55929035 141 .30947 428 .803478030 38 .627735627 CAF2V157 1.55929035 141 .309
48 -1538 .689777020 0 .709093944 N2V157 1.00031429 139 .59048 -1538 .689777020 0 .709093944 N2V157 1,00031429 139 .590
49 138 .430254604 39 .259717130 CAF2V157 1.55929035 113 .34449 138 .430254604 39 .259717130 CAF2V157 1.55929035 113 .344
50 220 .629434605 0 .852226738 N2V157 1.00031429 ' 107 .64250 220 .629434605 0 .852226738 N2V157 1,00031429 ' 107 .642
51 134 .960023432 29 .998458517 CAF2V157 1.55929035 97 .02651 134 .960023432 29 .998458517 CAF2V157 1.55929035 97 .026
52 215 .500125113 0 .702119104 N2V157 1.00031429 89 .82852 215 .500125113 0 .702119104 N2V157 1,00031429 89 .828
53 149 .475551465' 25 .893987130 CAF2V157 1.55929035 82 .70253,149 .475551465 '25 .893987130 CAF2V157 1.55929035 82 .702
54 231 .671140781 8 .808791935 N2V157 1.00031429 71 .08454 231 .671140781 8 .808791935 N2V157 1,00031429 71 .084
55 350 .283305716 10 .400580673 CAF2V157 1.55929035 64 .55855 350 .283305716 10 .400580673 CAF2V157 1.55929035 64 .558
56 145 .109553410 0 .700000000 N2V157 1.00031429 52 .53156 145 .109553410 0 .700000000 N2V157 1,00031429 52 .531
57 141 .455177019 8 .001279379 CAF2V157 1.55929035. 51 .71157 141 .455177019 8 .001279379 CAF2V157 1.55929035. 51,711
58 73 .955966022 B .329441414 N2V157 1.00031429 42 .09058 73 .955966022 B .329441414 N2V157 1,00031429 42 .090
59 96 .168359436 24 .494556608 CAF2V157 1.55929035 38 .87959 96 .168359436 24 .494556608 CAF2V157 1.55929035 38 .879
60 459 .800275735 8 .554621950 N2V157 1.00031429 26 .57160 459 .800275735 8 .554621950 N2V157 1,00031429 26 .571
61 0 .000000000 N2V157 14 .020 pat ml641a . txt61 0 .000000000 N2V157 14 .020 pat ml641a. txt
ASPHAERISCHE KONSTANTENASPHERIC CONSTANTS
FLAECHE NR. 2AREA NO. 2
K 0.0000 Cl ■ 1.40076890e-007K 0.0000 Cl ■ 1.40076890e-007
C2 -9.37770559e-012C2 -9.37770559e-012
C3 5.50812946e-016C3 5.50812946e-016
C4 6.20589318e-021C4 6.20589318e-021
C5 -2.37140019e-023C5 -2.37140019e-023
C6 3.95180787e-027C6 3.95180787e-027
C7 -2.60792B32e-031C7 -2.60792B32e-031
C8 0.00000000e+000C8 0.00000000e + 000
C9 0.00000000e+000C9 0.00000000e + 000
FLAECHE NR. 4AREA NO. 4
K 0.0000K 0.0000
Cl 9.46620092e-008Cl 9.46620092e-008
C2 3.31455802e-012C2 3.31455802e-012
C3 -2.39290707e-016C3 -2.39290707e-016
C4 -1.71234783e-020C4 -1.71234783e-020
C5 1.74026756e-023C5 1.74026756e-023
C6 -2.43020107e-027C6 -2.43020107e-027
C7 1.77431459e-031C7 1.77431459e-031
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 15AREA NO. 15
K O.OD00K O.OD00
Cl -1.23543806e-008Cl -1.23543806e-008
C2 -3.O8782621e-012C2 -3.O8782621e-012
C3 -2.03630284e-016C3 -2.03630284e-016
C4 -8.16153110e-021C4 -8.16153110e-021
C5 1.74407091e-025C5 1.74407091e-025
C6 -5.09307070e-029C6 -5.09307070e-029
C7 1.00885745e-032C7 1.00885745e-032
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 16AREA NO. 16
K 0.0000K 0.0000
Cl -4.62416977e-008Cl -4.62416977e-008
C2 5.09342413e-012C2 5.09342413e-012
C3 1.93873885e-016C3 1.93873885e-016
C4 2.75889868e-020C4 2.75889868e-020
C5 -1.64807233e-024C5 -1.64807233e-024
C6 -1.89286552e-028C6 -1.89286552e-028
C7 1.58124115e-032C7 1.58124115e-032
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 21AREA NO. 21
K 0.0000K 0.0000
Cl -2.13181934e-008Cl -2.13181934e-008
C2 3.39572804e-012C2 3.39572804e-012
C3 1.70428863e-016C3 1.70428863e-016
C4 2.27977453e-020C4 2.27977453e-020
C5 -9.47218587e-025C5 -9.47218587e-025
C6 2.6"5529506e-028C6 2.6 " 5529506e-028
C7 -2.14888777e-032C7 -2.14888777e-032
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 30 pat l641a.txtAREA NO. 30 pat l641a.txt
K 0.0000K 0.0000
Cl -2.44196650e-009Cl -2.44196650e-009
C2 6.83785083e-013C2 6.83785083e-013
C3 -4.77483094e-018C3 -4.77483094e-018
C4 -4.35836087e-023C4 -4.35836087e-023
C5 -1.74046992e-026C5 -1.74046992e-026
C6 6.83065300e-031C6 6.83065300e-031
C7 -9.01251572e-036C7 -9.01251572e-036
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 32AREA NO. 32
K 0.0000K 0.0000
Cl -1.53715814e-008Cl -1.53715814e-008
C2 -3.53812954e-013C2 -3.53812954e-013
C3 -8.52862214e-019C3 -8.52862214e-019
C4 -2.84552357e-022C4 -2.84552357e-022
C5 3.34667441e-027C5 3.34667441e-027
C6 -1.70981346e-031C6 -1.70981346e-031
C7 8.06815620e-038C7 8.06815620e-038
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 42AREA NO. 42
K 0.0000K 0.0000
Cl -1.38703B25e-009Cl -1.38703B25e-009
C2 -7.42014625e-014C2 -7.42014625e-014
C3 -1.11669633e-017C3 -1.11669633e-017
C4 7.72614773e-023C4 7.72614773e-023
C5 8.16034068e-027C5 8.16034068e-027
C6 -6.36127613e-031C6 -6.36127613e-031
C7 1.09104108e-035C7 1.09104108e-035
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 43AREA NO. 43
K 0.0000K 0.0000
Cl -6.81804423e-009Cl -6.81804423e-009
C2 -3.12076075e-014C2 -3.12076075e-014
C3 -1.22481799e-017C3 -1.22481799e-017
C4 2.99026626e-023C4 2.99026626e-023
C5 1.23468742e-026C5 1.23468742e-026
C6 -7.60144642e-031C6 -7.60144642e-031
C7 1.42018134e-035C7 1.42018134e-035
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOO C9 O.OOOOOOOOe + OOO
Die in Figur 6 dargestellte Lmsenanordnung 21 ist für die Wellenlänge 193 Nanometer ausgelegt. Das belichtbare Feld beträgt 10,5 mm x 26 mm. Die Baulänge von Objelctebene 0'- Bildebene 0' beträgt 1200 mm. Die für die Herstellung erforderliche Materialmenge an Quarzglas beträgt lediglich 103 kg. Auch bei diesem Ausfuhrungsbeispiel, genauso wie dem in Figur 5 gezeigten Ausfuhruiigsbeispiel, sind insgesamt nur 4 Dubletts vorgesehen. Auch bei diesem Ausfülmuigsbeispiel ist auf das Dublett, dass in den Figuren 2-4 mit D3 bezeichnet worden ist, entfallen. Die genauen Linsendaten sind der nachfolgenden Tabelle 5 zu entnehmen.The lens arrangement 21 shown in FIG. 6 is designed for the wavelength 193 nanometers. The illuminable field is 10.5 mm x 26 mm. The overall length of object plane 0 '- image plane 0' is 1200 mm. The amount of quartz glass required for production is only 103 kg. Also in this exemplary embodiment, just like the exemplary embodiment shown in FIG. 5, only a total of four doublets are provided. In this example of filling, the doublet, which was designated D3 in FIGS. 2-4, is also used. The exact lens data can be found in Table 5 below.
Tabelle 5 M1656aTable 5 M1656a
BRECHZAHL 1/2 FREIER FLAECHECRITICAL NUMBER 1/2 OF FREE AREA
Fl. RADIEN DICKEN GLAESER 193.304 nm DURCHMESSERFl. RADIEN THICK GLASSES 193.304 nm DIAMETER
0 0.000000000 22.812325200 N2 1.00000320 56.0800 0.000000000 22.812325200 N2 1.00000320 56.080
1 0.000000000 10.339145912 N2 1.00000320 61.0401 0.000000000 10.339145912 N2 1.00000320 61.040
2 1344.886802290AS 15.881971169102HL 1.56028895 63.9702 1344.886802290AS 15.881971169102HL 1.56028895 63.970
3 232.178777938 15.628670502 N2 1.00000320 66.0743 232.178777938 15.628670502 N2 1.00000320 66.074
4 -537.599235732AS 10.251256144 SIO2HL 1.56028895 67.1464 -537.599235732AS 10.251256144 SIO2HL 1.56028895 67.146
5 357.600737011 39.221339825 N2 1.00000320 71.7655 357.600737011 39.221339825 N2 1.00000320 71.765
6 -107.956923549 18.404856395 SIO2HL 1.56028895 73.4466 -107.956923549 18.404856395 SIO2HL 1.56028895 73.446
7 -243.717356229 0.700350683 N2 1.00000320 92.6927 -243.717356229 0.700350683 N2 1.00000320 92.692
8 0.000000000 41.961272197 SI02HL 1.56028895 108.7238 0.000000000 41.961272197 SI02HL 1.56028895 108.723
9 -202.822623296 0.701099003 N2 1.00000320 112.3529 -202.822623296 0.701099003 N2 1.00000320 112.352
10 908.396780928 46.105755859 SI02HL 1.56028895 127.49510 908.396780928 46.105755859 SI02HL 1.56028895 127.495
11 -324.403526021 0.700000000 N2 1.00000320 129.12211 -324.403526021 0.700000000 N2 1.00000320 129.122
12 272.374319621 70.961916034 SI02HL 1.56028895 129.62612 272.374319621 70.961916034 SI02HL 1.56028895 129.626
13 -861.339949580 0.801352132 N2 1.00000320 124.29313 -861.339949580 0.801352132 N2 1.00000320 124.293
14 189.599720148 87.814706985 SI02HL 1.56028895 107.19314 189.599720148 87.814706985 SI02HL 1.56028895 107.193
15 235.651582170AS 33.939348010 N2 1.00000320 73.553 -167.950781585 23.127229402 SIO2HL 1.56028895 71.043 418.275060837AS 29.676213557 N2 1.00000320 66.843 -122.074492458 12.991654582 SIO2HL 1.56028895 65.012 225.914585773 27.597144000 N2 1.00000320 69.278 -207.944504375 9.625251661 SIQ2HL 1.56028895 70.891 -222.237071915 AS 12.259114879 N2 1.00000320 74.459 -143.306961785 25.742020969 SIO2HL 1.56028895 75.779 -171.350364563 0.700000000 N2 1.00000320 87.359 -584.950465544 30.430256525 SI02HL 1,56028895 94.810 -322.926323860 0.700000000 N2 1.00000320 102.056 -2074.519592980 18.436325366 SIO2HL 1.56028895 106.932 -454.899324547 0.700000000 N2 1.00000320 108.765 311.973161398 60.379264795 SI02HL 1.56028895 116.799 -244.157709436 4.226375511 N2 1.00000320 116.691 -226.802865587AS 8.000000000 SIO2HL 1.56028895 115.226 581.003793889AS 33.843695716 N2 1.00000320 113.965 433.165006354AS 8,000000000 SI02HL 1.56028895 117.646 220.638014434 6.160147896 N2 1.00000320 117.478 235.847612538 38.094085109 SIO2HL 1.56028895 119.548 2922.562377140 10.091385703 N2 1.00000320 119.635 828.603251335 34.242333007 SIO2HL 1.56028895 120.292 -421.523524573 19.499093440 . N2 1.00000320 120.075 -227.399216829 8.000000000 SIO2HL 1.56028895 119.391 -713.133778093 32.677482617 N2 1.00000320 122.273 0.000000000 -22.812325200 N2 1.00000320 124.721 477.077275979 54.887245264 SI02HL 1.56028895 128.109 -302.959408554AS 9.015123458 N2 1.00000320 128.235 -259.248633314AS 8.000000000 SI02HL 1.56028895 127.331 257.367927097 9.018964995 N2 1.00000320 132.095 301.442153248 62.427272391 SI02HL 1.56028895 134.626 -415.709868667 0.700000000 N2 1.00000320 135.476 247.440229366AS 47.657128386 SIO2HL 1.56028895 133.887 48 -288949.445195000 0.700000000 N2 1.00000320 131.97815 235.651582170AS 33.939348010 N2 1.00000320 73.553 -167.950781585 23.127229402 1.56028895 SIO2HL 71,043 418.275060837AS 29.676213557 N2 1.00000320 66,843 -122.074492458 12.991654582 SIO2HL 1.56028895 65,012 225.914585773 27.597144000 N2 1.00000320 69,278 -207.944504375 9.625251661 1.56028895 SIQ2HL 70,891 -222.237071915 AS 12.259114879 N2 1.00000320 74,459 -143.306961785 25.742020969 SIO2HL 1.56028895 75,779 -171.350364563 0.700000000 1.00000320 N2 87,359 -584.950465544 30.430256525 SI02HL 1.56028895 94,810 -322.926323860 0.700000000 N2 1.00000320 102,056 -2074.519592980 18.436325366 SIO2HL 1.56028895 106,932 -454.899324547 0.700000000 N2 1.00000320 108,765 311.973161398 60.379264795 SI02HL 1.56028895 116,799 -244.157709436 4.226375511 1.00000320 N2 116,691 -226.802865587AS 8.000000000 1.56028895 SIO2HL 115,226 581.003793889AS 33.843695716 N2 1.00000320 113,965 433.165006354AS 8.000000000 SI02HL 1.56028895 117.646 220.638014434 6.160147896 N2 1.00000320 117.478 235.847612538 38.094085109 SIO2HL 1.56028895 119.548 2922.562377140 10.0913 85703 N2 1.00000320 119.635 828.603251335 34.242333007 SIO2HL 1.56028895 120.292 -421.523524573 19.499093440 . N2 1.00000320 120,075 -227.399216829 8.000000000 SIO2HL 1.56028895 119,391 -713.133778093 32.677482617 N2 1.00000320 122,273 0.000000000 -22.812325200 N2 1.00000320 124,721 477.077275979 54.887245264 1.56028895 SI02HL 128,109 -302.959408554AS 9.015123458 1.00000320 N2 128,235 -259.248633314AS 8.000000000 SI02HL 1.56028895 127,331 257.367927097 9.018964995 N2 1.00000320 132,095 301.442153248 62.427272391 SI02HL 1.56028895 134626 -415.709868667 0.700000000 N2 1.00000320 135.476 247.440229366AS 47.657128386 SIO2HL 1.56028895 133.887 48 -288949.445195000 0.700000000 N2 1.00000320 131.978
49 151.825283163 37.348129556 SIO2HL 1.56028895 112.36349 151.825283163 37.348129556 SIO2HL 1.56028895 112.363
50 293.987758399 0.700000000 N2 1.00000320 107.53250 293.987758399 0.700000000 N2 1.00000320 107.532
51 140.326981621 28.581518950 SIO2HL 1.56028895 94.76551 140.326981621 28.581518950 SIO2HL 1.56028895 94.765
52 219.719357959 0.700000000 N2 1.00000320 86.98152 219.719357959 0.700000000 N2 1.00000320 86.981
53 142.826791834 24.808199570 SIO2HL 1.56028895 79.40653 142.826791834 24.808199570 SIO2HL 1.56028895 79.406
54 283.110177788 7.914740800 N2 1.00000320 70.51554 283.110177788 7.914740800 N2 1.00000320 70.515
55 510.756323891 9.591341155 SIO2HL 1.56028895 64.645 ' 55 510.756323891 9.591341155 SIO2HL 1.56028895 64.645 '
56 266.825722219 0.722333492 N2 1.00000320 55.51256 266.825722219 0.722333492 N2 1.00000320 55.512
57 215.942664188 8.000000000 SIO2HL 1.56028895 53.16557 215.942664188 8.000000000 SIO2HL 1.56028895 53.165
58 72.787640467 7.718712927 N2 1.00000320 41.27258 72.787640467 7.718712927 N2 1.00000320 41.272
59 93.765259707 24.684737028 SI02HL 1.56028895 38.37759 93.765259707 24.684737028 SI02HL 1.56028895 38.377
60 469.355888001 8.212437072 N2 1.00000320 26.09960 469.355888001 8.212437072 N2 1.00000320 26.099
61 0.000000000 0.000000000 N2 1.00000320 14.02061 0.000000000 0.000000000 N2 1.00000320 14.020
62 0.000000000 0.000000000 1.00000000 14.02062 0.000000000 0.000000000 1.00000000 14,020
ASPHAERISCHE KONSTANTENASPHERIC CONSTANTS
FLAECHE NR. 2AREA NO. 2
CO 0.0000CO 0.0000
Cl 1.52757338e-007Cl 1.52757338e-007
C2 -1.39394902e-011C2 -1.39394902e-011
C3 7.41376692e-016C3 7.41376692e-016
C4 -3.46945761 e-019C4 -3.46945761 e-019
C5 8.95992656e-023C5 8.95992656e-023
C6 -1.64136955e-026C6 -1.64136955e-026
C7 1.18641735&-030C7 1.18641735 & -030
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 4 CO 0.0000AREA NO. 4 CO 0.0000
Cl 4.00562871e-008Cl 4.00562871e-008
C2 4.60196624e-012C2 4.60196624e-012
C3 -3.47640954e-016C3 -3.47640954e-016
C4 1.69507580e-019C4 1.69507580e-019
C5 -3.89922208e-023C5 -3.89922208e-023
C6 7.79027536e-027C6 7.79027536e-027
C7 -5.5324176 le-031C7 -5.5324176 le-031
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 15AREA NO. 15
C0 0.0000C0 0.0000
Cl 5.47524591e-008Cl 5.47524591e-008
C2 5.05793043e-013C2 5.05793043e-013
C3 3.05008775e-017C3 3.05008775e-017
C4 -1.98253574e-021C4 -1.98253574e-021
C5 7.8444349 le-025C5 7.8444349 le-025
C6 -1.27239733e-028C6 -1.27239733e-028
C7 6.73733553e-033C7 6.73733553e-033
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 17AREA NO. 17
CO 0.0000CO 0.0000
Cl -9.99718876e-008Cl -9.99718876e-008
C2 -8.52059462e-012C2 -8.52059462e-012
C3 -5.86845398e-016C3 -5.86845398e-016
C4 -6.64124324e-020 C5 -4.60657771e-024C4 -6.64124324e-020 C5 -4.60657771e-024
C6 -5.51712065e-028C6 -5.51712065e-028
C7 O.OOOOOOOOe+OOOC7 O.OOOOOOOOe + OOO
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 21AREA NO. 21
CO 0.0000CO 0.0000
Cl -1.77390890e-008Cl -1.77390890e-008
C2 1.86160395&-012C2 1.86160395 & -012
C3 2.57697930e-016C3 2.57697930e-016
C4 2.73779514e-020C4 2.73779514e-020
C5 4.36917581e-024C5 4.36917581e-024
C6 -1.21030389e-028C6 -1.21030389e-028
C7 7.05508252e-032C7 7.05508252e-032
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 30AREA NO. 30
CO 0.0000CO 0.0000
Cl -2.922221lle-009Cl -2.922221ll-009
C2 6.98720386e-013C2 6.98720386e-013
C3 9.60282132e-018C3 9.60282132e-018
C4 4.51192034e-022C4 4.51192034e-022
C5 -8.63764902e-026C5 -8.63764902e-026
C6 2.79307913e-030C6 2.79307913e-030
C7 -4.28143587e-035C7 -4.28143587e-035
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOO FLAECHE NR. 31C9 O.OOOOOOOOe + OOO AREA NO. 31
CO 0.0000CO 0.0000
Cl 3.79088573e-009Cl 3.79088573e-009
C2 1.54225743e-013C2 1.54225743e-013
C3 2.58122902e-018C3 2.58122902e-018
C4 7.06529922e-022C4 7.06529922e-022
C5 -4.65550297e-026C5 -4.65550297e-026
C6 1.02837481e-030C6 1.02837481e-030
C7 2.54076903e-036C7 2.54076903e-036
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NJR. 32AREA NJR. 32
C0 0.0000C0 0.0000
Cl -1.43835369e-008Cl -1.43835369e-008
C2 9.53138635e-014C2 9.53138635e-014
C3 -7.72742465e-019C3 -7.72742465e-019
C4 -5.55446815e-023C4 -5.55446815e-023
C5 1.85136302e-026C5 1.85136302e-026
C6 -1.44110574e-030C6 -1.44110574e-030
C7 3.72591227e-035C7 3.72591227e-035
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 42AREA NO. 42
CO 0.0000CO 0.0000
Cl -1.46322720e-009Cl -1.46322720e-009
C2 -7.32982723e-014 C3 -4.12559846e-018C2 -7.32982723e-014 C3 -4.12559846e-018
C4 1.10568402&-022C4 1.10568402 & -022
C5 8.54286956e-027C5 8.54286956e-027
C6 -8.34588063e-031C6 -8.34588063e-031
C7 1.97309537e-035C7 1.97309537e-035
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE NR. 43AREA NO. 43
O 0.0000O 0.0000
Cl -6.88182408e-009Cl -6.88182408e-009
C2 1.49845458e-014C2 1.49845458e-014
C3 -3.68264031e-018C3 -3.68264031e-018
C4 1.78132275e-022C4 1.78132275e-022
C5 6.62312346e-027C5 6.62312346e-027
C6 -8.68541514e-031C6 -8.68541514e-031
C7 2.32817966e-035C7 2.32817966e-035
C8 O.OOOOOOOOe+OOOC8 O.OOOOOOOOe + OOO
C9 O.OOOOOOOOe+OOOC9 O.OOOOOOOOe + OOO
FLAECHE R. 47AREA R. 47
CO 0.0000CO 0.0000
Cl 1.62217387e-009Cl 1.62217387e-009
C2 -6.74169300e-014C2 -6.74169300e-014
C3 1.20108340e-018C3 1.20108340e-018
C4 1.21664354e-023C4 1.21664354e-023
C5 -1.11444071e-027C5 -1.11444071e-027
C6 1.08479154e-031C6 1.08479154e-031
C7 -2.93513997e-036C7 -2.93513997e-036
C8 O.OOOOOOOOe+OOO C9 O.OOOOOOOOe+OOO C8 O.OOOOOOOOe + OOO C9 O.OOOOOOOOe + OOO
Die asphärischen Linsenoberflächen werden durch die Gleichung:The aspherical lens surfaces are given by the equation:
beschrieben, wobei P(h) die Pfeilhöhe als Funktion des Radius h , also der Abstand von einer ebenen Fläche ist, die durch den Flächenscheitel geht und senkrecht zur optischen Achse orientiert ist. Ci bis Cn sind die in den Tabellen angegebenen asphärischen Konstanten und CO ist die konische Konstante. R ist der in den Tabellen angegebene Scheitelradius. described, where P (h) is the arrow height as a function of the radius h, ie the distance from a flat surface that passes through the surface vertex and is oriented perpendicular to the optical axis. Ci to C n are the aspherical constants given in the tables and CO is the conical constant. R is the vertex radius given in the tables.
Bei der Frage nach dem für die Belichtung im Resist noch erträglichen Kontrastabfall, zeigt sich, dass der Kontrastabfall durch den Farblängsfehler eines Lithograpliieobjelctives deutlich beeinflusst wird. Um die Bandbreite eines Systems über verschiedene Aperturen, Wellenlängen, Materialien und Strulcturbreiten zu ennittehi, werden folgende maximale Zerstreuungskreise, die durch den Farblängsfehler induziert werden, vorgeschlagen:When asked about the contrast drop that is still bearable for the exposure in the resist, it turns out that the contrast drop is clearly influenced by the longitudinal color error of a lithographic lens. In order to determine the bandwidth of a system across different apertures, wavelengths, materials and structure widths, the following maximum circles of confusion, which are induced by the longitudinal color error, are proposed:
Durchmesser des Zerstreuungskreises < 2,2 x Sü Ücturbreite und vorzugsweiseDiameter of the circle of confusion <2.2 x SÜcturbreite and preferably
Durchmesser des Zerstreuungskreises < 2,0 x StrakturbreiteDiameter of the circle of confusion <2.0 x structure width
Der chromatisch induzierte Zerstreuungskreis soll bei maximaler Apertur und bei einem Δλ von der Hälfte der Lichtquellenbandbreite zur mittleren Arbeitswellenlänge ermittelt werden.The chromatically induced circle of confusion should be determined at maximum aperture and with a Δλ of half the light source bandwidth to the mean working wavelength.
In der nachfolgenden Tabelle wurde die Bandbreite eines Systems für folgendes Verhältnis ermittelt:The bandwidth of a system was determined in the following table for the following ratio:
Durchmesser des Chromatischen Zerstreuungskreises = 2,1 * Strulcturbreite, dies ergibt einen Kontrastabfall von etwa 6,5% des polychromatischen Systems zum monochromatischen System für Gittersuτdcturen. Diameter of the chromatic circle of confusion = 2.1 * structure width, this results in a contrast decrease of about 6.5% of the polychromatic system to the monochromatic system for lattice structures.
Die Strukrurbreite wurde nach der folgenden Formel bestimmt Strukturbreite = 'The structure width was determined according to the following formula Structure width = '
NAN / A
Dabei wurde eüi K1 von 0,32 gewälilt. Der K\ Wert variiert sύmvoller Weise zwischen 0,27 und 0,35. Die Kennziffer KCHL kann den Vergleich zwischen unterschiedlichen refralctiven Lithographiedesigns herstellen bezüglich der Erzeugung des chromatischen Längsfehlers unter den Bedingungen Bildfeld, Bandbreite der Lichtquelle und Materialdispersion der verwendeten Linsen. Besteht das Objektiv nur aus emem Material wird nur diese eine Materialdispersion benutzt. Besteht das Objektiv aus mehreren Materialien erhält jede Linse ein synthetisches Ersatzmaterial mit einer Brechzahl wie bisher, aber einer einheitlichen wählbaren Dispersion zur Errechnung des Ersatz CHL.A K 1 of 0.32 was rolled. The K \ value varies between 0.27 and 0.35. The code number KCHL can make a comparison between different refractory lithography designs with regard to the generation of the chromatic longitudinal error under the conditions of image field, bandwidth of the light source and material dispersion of the lenses used. If the lens consists only of one material, only this one material dispersion is used. If the lens consists of several materials, each lens receives a synthetic replacement material with a refractive index as before, but with a uniform, selectable dispersion for calculating the replacement CHL.
CHΩ im]CHΩ in]
KCHL = -KCHL = -
AA
Aλ[nm] * ( ) * j maxfn ]Aλ [nm] * () * j maxfn]
»— 1"- 1
CHL ist der chromatische LängsfehlerCHL is the chromatic longitudinal error
Δλ ist das BandbreitenintervallΔλ is the bandwidth interval
Y' ax ist der maximale Bildfelddurchmesser. Vorteilhafterweise gibt man die numerischen Werte für CHL, Δ λ und YΛmax alle in nm ein, für Δ λ wählt man beispielsweise einen Wert von Inm. Um den Stand der Technik zu dokumentieren wurden aus der WO 01/50171 AI die Beispiel m 1159a repräsentiert einen ganz typischen KCHL Wert von 6,07 der nur in ganz engen Grenzen von allen refralctiven Lithographieobjektiven variiert. Ein so hoher KCHL Wert von 6,64 für das Bespiel mit Bezeicl ung m 1450a ist als Ausnahme nach oben gezeigt.Y 'ax is the maximum field diameter. Advantageously, the numerical values for CHL, Δ λ and Y Λ max are all entered in nm, for Δ λ, for example, a value of Inm is selected. In order to document the state of the art, the example m 1159a from WO 01/50171 AI represents a very typical KCHL value of 6.07 which varies only within very narrow limits of all refralctive lithography objectives. Such a high KCHL value of 6.64 for the example with description m 1450a is shown as an exception upwards.
Werte deutlich unter 6,0 werden erstmalig mit den in hier gezeigten Ausführungsbeispielen erreicht. Insbesondere im Beispiel m 1656a wurde ein extrem kleiner KCHL bewiesen. (KCHL = 4,71) Dieser ermöglicht es erstmalig für 193 nm und etwa 70nm Strukturbreite nur Si02 als Linsenmaterial einzusetzen. Der völlige Verzicht auf CaF bei 70nm Stnikturen und das Reduzieren des CaF2 Volumen für noch kleinere Strulcturen ist enormer wirtschaftlicher Vorteil. Die Objektiv hier gezeigter Bauart besitzen:Values significantly below 6.0 are achieved for the first time with the exemplary embodiments shown here. An extremely small KCHL was proven in particular in the example m 1656a. (KCHL = 4.71) This makes it possible for the first time to use Si02 as the lens material for 193 nm and about 70 nm structure width. The complete absence of CaF at 70nm structures and the reduction of the CaF 2 volume for even smaller structures is an enormous economic advantage. The lens shown here have:
Einen KCHL Wert von < 5,3 vorzugsweiseA KCHL value of <5.3 is preferred
einen KCHL Wert von < 5,0 und ganz bevorzugt emena KCHL value of <5.0 and most preferably
KCHL Wert von < 4,8 KCHL value of <4.8
B ezugszeichenliste :LIST OF REFERENCES:
I Projektionsbehchtungsanlage 3 Beleiicht igseimichtungI Projection control system 3 Illuminates igseimichtung
5 Projektionsobjektiv 7 optische Achse 9 Maske5 projection lens 7 optical axis 9 mask
I I Maskenhalter 13 BildebeneI I mask holder 13 image plane
15 Wafer15 wafers
17 Substrathalter17 substrate holder
19 Systemblende19 system cover
21 Linsenanordnung21 lens arrangement
23 Lichtbündel23 light beams
25 größter Lichtbündeldurchmesser25 largest light beam diameter
27 Lichtbünd'eldurclimesser27 Lichtbünd 'eldurclimesser
29 erste Taille 29 first waist

Claims

PatentanpsrüchePatentanpsrüche
1. Refraktives Projektionsobjelctiv für die Mikrolithograpliie mit einer Linsenanordnung bei dem alle Linsen aus einem Material bestehen und das eine bildseitige numerische Apertur (NA) von größer 0,7 aufweist, dadurch gekennzeichnet, dass das die Lmsenanordnung (21) transmittierende Lichtbündel (23) im Bereich vor emer in der Linsenanordnung (21) angeordneten Systemblende (19) auf der Länge gleich dem größten Lichtbündeldurchmesser (25) oder des maximalen Linsendurmessers in der Lmsenanordnung (21) größer als 85 % des größten Lichtbündeldurchmessers (25) oder des maximalen Linsendurchmessers ist.1. Refractive projection objective for microlithography with a lens arrangement in which all lenses are made of one material and which has an image-side numerical aperture (NA) of greater than 0.7, characterized in that the light bundle (23) transmitting the lens arrangement (21) im The area in front of the system aperture (19) arranged in the lens arrangement (21) is greater than 85% of the largest light bundle diameter (25) or the maximum lens diameter over the length equal to the largest light bundle diameter (25) or the maximum lens diameter in the lens arrangement (21).
2. Refraktives Projektionsobjelctiv für die Mikrolilnographie für eine Belichtungswellenlänge von kleiner 300nm und vorzugsweise einer numerischen Apertur von mindestens 0,8 , dadurch gekennzeichnet, dass alle Luisen aus emem Material bestehen und der Kennwert KCHL kleiner oder gleich 5,5, vorzugsweise kleiner oder gleich 5,0 und besonders bevorzugt 4,8 beträgt, wobei für den Kennwert KCHL gilt2. Refractive projection objective for microlilnography for an exposure wavelength of less than 300 nm and preferably a numerical aperture of at least 0.8, characterized in that all Luisen consist of one material and the characteristic value KCHL is less than or equal to 5.5, preferably less than or equal to 5 , 0 and particularly preferably 4.8, where KCHL applies to the characteristic value
CHL ist der chromatische LängsfehlerCHL is the chromatic longitudinal error
Δλ ist das BandbreitenintervallΔλ is the bandwidth interval
YΛmax ist der maximale Bildfelddurchmesser.Y Λ max is the maximum image field diameter.
Refraktives Projektionsobjelctiv nach Anspruch 1 oder 2, das eine zwischen zwei Bäuchen angeordnete erste Taille aufweist, dadurch gekemizeicl et, dass nach dieser ersten Taille (29) mindestens 4 Dubletts (D1-D5), bestehend aus emer Negativlinse und einer Positivlinse, angeordnet sind.Refractive projection objective according to Claim 1 or 2, which has a first waist arranged between two bellies, characterized in that after this first waist (29) at least 4 doublets (D1-D5), consisting of a negative lens and a positive lens, are arranged.
Refraktives Projektionsobjektiv nach mindestens emem der vorangegangenen Ansprüche, das e e zweite Taille aufweist, dadurch gekennzeichnet, dass die zweite Taille (UG3b) durch zwei aufeinanderfolgende Negativlinsen gebildet wird, die zwischen zwei Positivlinsen angeordnet smd, wobei die Positivlinsen jeweils auf der der jeweiligen Negativlinse der Taille (UG3b) zugewandten Seite eine konvexe Linsenoberfläche aufweisen.Refractive projection lens according to at least one of the preceding claims, which has a second waist, characterized in that the second waist (UG3b) is formed by two successive negative lenses, which are arranged between two positive lenses, the positive lenses each having a convex lens surface on the side facing the respective negative lens of the waist (UG3b).
5. Refraktives Projektionsobjektiv nach Anspruch 4, dadurch gekennzeichnet, dass in der zweite Taille (UG3b) der Lichtbündeldurchmesser (23) bzw. der Linsendurchmesser m der zweiten Taille mindestens 85 % des maximalen Linsendurchmessers bzw. Lichtbündeldurchmessers (25) beträgt.5. Refractive projection lens according to claim 4, characterized in that in the second waist (UG3b) the light beam diameter (23) or the lens diameter m of the second waist is at least 85% of the maximum lens diameter or light beam diameter (25).
6. Refraktives Projektionsobjektiv nach mindestens einem der vorangegangenen Ansprüche, dadurch gekennzeichnet, dass nach der ersten Taille (LG2) vier Dupletts( Dl, D3, D4, D5) angeordnet sind, die aus einer Positivlhise, auf die direkt eme Negativlinse folgt, bestehen.6. Refractive projection lens according to at least one of the preceding claims, characterized in that after the first waist (LG2) four doublets (Dl, D3, D4, D5) are arranged, which consist of a positive lens, followed directly by a negative lens.
7. Refraktives Projektionsobjektiv nach mindestens einem der vorangegangenen Ansprüche, dadurch gekennzeichnet, dass der Abstand zwischen den zueinander gewandten Linsenoberflächen der Dupletts ( Dl- D5) kleiner als 10 % des gemittelten Linsendurchniessers des jeweiligen Dupletts ist.7. Refractive projection lens according to at least one of the preceding claims, characterized in that the distance between the mutually facing lens surfaces of the doublet (DL-D5) is less than 10% of the mean lens diameter of the respective doublet.
8. Refraktives Projektionsobjektiv nach mindestens emem der vorangegangenen Ansprüche, dadurch gekennzeichnet, dass die zueinander gewandten Linsenoberflächen von mindestens drei Dupletts einen Anstand aufweisen, der kleiner als 10 mm ist.8. Refractive projection lens according to at least one of the preceding claims, characterized in that the mutually facing lens surfaces of at least three doublets have a spacing that is less than 10 mm.
9. Refraktives Projektionsobjektiv nach mindestens einem der vorangegangen Ansprüche, dadurch gekennzeichnet, dass die ersten beiden Linsen der Linsenanordnung (21) negative Brechkraft aufweisen und zum Objekt hin durchgebogen sind.9. Refractive projection lens according to at least one of the preceding claims, characterized in that the first two lenses of the lens arrangement (21) have negative refractive power and are bent towards the object.
10. Projektionsobjektiv, dass in drei Linsengruppen unterteilbar ist, wobei durch eine erste Linsengruppe, die positive Brechkraft aufweist, ein erster Bauch gebildet wird und durch eine zweite sich anschließende Linsengruppe, die negative Brechkraft aufweist, eine Taille gebildet wird, wobei auf diese zweite Linsengruppe eine lang gestreckte hintere Linsengruppe folgt, in der die Systemblende 19 angeordnet ist und die sich über 60 % der Länge des PiOJektionsobjektives erstreckt.10. Projection lens that can be subdivided into three lens groups, a first belly being formed by a first lens group that has positive refractive power and a waist being formed by a second subsequent lens group that has negative refractive power, with this second lens group an elongated rear Lens group follows, in which the system aperture 19 is arranged and which extends over 60% of the length of the PIO projection lens.
11. Refraktives Projektionsobj ektiv nach mindestens einem der vorangegangenen Ansprüche, dadurch gekennzeichnet, dass die erste Taille (29) aus drei Negativhnsen besteht.11. Refractive projection object according to at least one of the preceding claims, characterized in that the first waist (29) consists of three negative necks.
12. Refraktives Projektionsobjektiv nach mindestens einem der vorangegangen Ansprüche, dadurch gekennzeichnet, dass die ersten drei aufeinander folgenden Linsen (EG1) negative Brechkraft aufweisen.12. Refractive projection lens according to at least one of the preceding claims, characterized in that the first three successive lenses (EG1) have negative refractive power.
13. Projelctionsbelichtungsanlage der Mikohthographie, dadurch gekemizeichnet, dass die Projektionsbelichtungsanlage (1) ein Projektionsobjelctiv (5) mit einer Lmsenanordnung (21) nach mindestens einem der vorangegangen Ansprüche umfaßt.13. Projection exposure system of microphthography, characterized in that the projection exposure system (1) comprises a projection objective (5) with a lens arrangement (21) according to at least one of the preceding claims.
14. Verfahren zur Herstellung rnüαostiΕktirrierter Bauteile, bei dem ehi mit emer lichtempfindlichen Schicht versehenes Substrat (15) mittels einer Maske (9) und einer Projektionsbelichtungsanlage (1) mit einer Linsenanordnung (21) nach mindestens einem der vorangegangenen Ansprüche durch ultraviolettes Laserlicht belichtet wird und gegebenenfalls nach Entwicklung der Lichtempfindlichen Schicht entsprechend einem auf der Maske (9) enthaltenem Muster stnύcturiert wird. 14. A method for producing rnüαostiΕktirrierter components, in which ehi provided with a light-sensitive layer substrate (15) by means of a mask (9) and a projection exposure system (1) with a lens arrangement (21) according to at least one of the preceding claims by ultraviolet laser light and optionally after development of the photosensitive layer according to a pattern contained on the mask (9).
EP03706529A 2002-03-01 2003-02-19 Refractive projection lens with a middle part Withdrawn EP1481286A2 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US36084502P 2002-03-01 2002-03-01
US360845P 2002-03-01
DE10221243 2002-05-13
DE10221243 2002-05-13
DE10229249 2002-06-28
DE10229249A DE10229249A1 (en) 2002-03-01 2002-06-28 Refractive projection lens with a waist
PCT/EP2003/001651 WO2003075097A2 (en) 2002-03-01 2003-02-19 Refractive projection lens with a middle part

Publications (1)

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US7190527B2 (en) 2002-03-01 2007-03-13 Carl Zeiss Smt Ag Refractive projection objective
DE10229249A1 (en) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refractive projection lens with a waist
DE10210899A1 (en) 2002-03-08 2003-09-18 Zeiss Carl Smt Ag Refractive projection lens for immersion lithography
US7092069B2 (en) 2002-03-08 2006-08-15 Carl Zeiss Smt Ag Projection exposure method and projection exposure system

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DE19855108A1 (en) * 1998-11-30 2000-05-31 Zeiss Carl Fa Microlithographic reduction lens, projection exposure system and method
TW448307B (en) * 1999-12-21 2001-08-01 Zeiss Stiftung Optical projection system

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