WO2003074193A2 - Procede et dispositif de production d'un revetement de surface - Google Patents

Procede et dispositif de production d'un revetement de surface Download PDF

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Publication number
WO2003074193A2
WO2003074193A2 PCT/EP2002/002248 EP0202248W WO03074193A2 WO 2003074193 A2 WO2003074193 A2 WO 2003074193A2 EP 0202248 W EP0202248 W EP 0202248W WO 03074193 A2 WO03074193 A2 WO 03074193A2
Authority
WO
WIPO (PCT)
Prior art keywords
radiation
wave
carrier
short
starting material
Prior art date
Application number
PCT/EP2002/002248
Other languages
German (de)
English (en)
Other versions
WO2003074193A3 (fr
Inventor
Kai K. O. BÄR
Rainer Gaus
Rolf Wirth
Martin Schweizer
Original Assignee
Advanced Photonics Technologies Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Advanced Photonics Technologies Ag filed Critical Advanced Photonics Technologies Ag
Priority to PCT/EP2002/002248 priority Critical patent/WO2003074193A2/fr
Priority to AU2002308228A priority patent/AU2002308228A1/en
Publication of WO2003074193A2 publication Critical patent/WO2003074193A2/fr
Publication of WO2003074193A3 publication Critical patent/WO2003074193A3/fr

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0209—Multistage baking
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/02—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by baking
    • B05D3/0254—After-treatment
    • B05D3/0263—After-treatment with IR heaters
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/061—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using U.V.
    • B05D3/065—After-treatment
    • B05D3/067—Curing or cross-linking the coating
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
    • B05D3/06—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation
    • B05D3/068—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials by exposure to radiation using ionising radiations (gamma, X, electrons)

Definitions

  • the invention relates to a method and a device for producing a surface coating according to the preamble of claim 1 and claim 10.
  • Printing ink systems of this type are normally relatively low-viscosity solvent systems in order to enable easy application to the substrate and to largely avoid surface defects during application. From an environmental point of view, efforts are increasingly being made to use water-based systems, i. H. with the largest possible proportion of water in the
  • Solvent system In these systems, the solvent must be present before or almost simultaneously with the activation of the hardenable or crosslinkable component - in modern systems a relatively large proportion of water - be removed from the applied layer.
  • UV-activatable or UV-curable systems it is known that, by using a broadband radiation source which, in addition to UV radiation, also emits into the infrared range, the applied layer can be heated to evaporate the solvent.
  • a broadband radiation source which, in addition to UV radiation, also emits into the infrared range
  • the applied layer can be heated to evaporate the solvent.
  • such lamps are only of limited suitability for highly specific systems in which the provision of specific spectral components is important. In addition, they are not very energy efficient.
  • the invention is therefore based on the object of providing an improved method and a corresponding device of the generic type which can in particular be optimally adapted to special requirements of modern coating systems and work with improved energy economy.
  • the invention includes the basic idea that radiation activation or cross-linking by short-wave coating systems to be processed on the one hand and electromagnetic evaporation of solvent components of the applied layer on the other hand with two separate irradiation devices.
  • a radiation source with an optimal emission spectrum can be selected for each of the existing subtasks and the generation and action of parts of the spectrum of the electromagnetic radiation that are not required for either process can be avoided. This in turn largely prevents possible harmful effects of such radiation components on the overall process. In addition, the energy efficiency of the process is fundamentally increased.
  • the invention further includes the idea of removing radiation in the near infrared range, in particular in the wavelength range between 0.8 ⁇ m and 1.5 ⁇ m, for removing the solvent component - in particular water or a mixture of water and organic solvents in aqueous systems use.
  • This component of the spectrum of electromagnetic waves also referred to as "NIR radiation”
  • NIR radiation is particularly well absorbed by such systems, and their use therefore results in a particularly high energy efficiency of the overall process.
  • UV radiation is used as short-wave electromagnetic radiation in a manner known per se, the spectrum of which is suitably matched to the activation or crosslinking characteristics of the coating system.
  • mercury vapor lamps or lasers operating in the UV range for example excimer lasers, can be used here.
  • X-ray or gamma emitters are used as the source of short-wave electromagnetic radiation, for example for resist hardening in semiconductor technology.
  • the longer-wave radiation on the surface of the applied layer system preferably has a power density of more than 300 kW / m 2 , especially more than 500 kW / m 2 and also for special applications over 700 kW / m 2 .
  • This enables drying times of the coating of less than 10 s, especially 5 s or less and in selected systems even 3 s or less.
  • the coating material used in the method according to the invention is in particular one of the under
  • aqueous systems that is to say an aqueous solution or dispersion, the solvent components - in particular water components - of which are essentially completely evaporated in a short time by the NIR radiation.
  • the power density and duration of treatment a certain residual moisture of the layer for the treatment step with the short-wave radiation can be set if necessary.
  • the systems mentioned are liquid lacquer or a printing ink with a UV-curable or crosslinking binder component.
  • the above-mentioned application for the production of highly integrated circuits is a structuring resist that can be UV, X-ray or ⁇ activated.
  • known layer systems can be treated in layer thicknesses that are optimal for the respective application.
  • layer thicknesses of between 1 micron and 500 mm, with larger values more (eg. B. 'furniture) for the lacquer coating of durable goods are used, while values in the lower region, in particular between 2 .mu.m and 50 .mu.m, for printing inks and temporary cover layers, for example in semiconductor technology, apply.
  • the irradiation device for generating NIR radiation comprises at least one, but preferably a plurality of halogen lamps, which are operated in particular at a lamp temperature of over 2500 K, preferably over 2900 K.
  • Elongated tubular halogen lamps of a type known per se are particularly suitable for the majority of the practically relevant applications, because with them a relatively wide - and by arranging several lamps in parallel next to each other also slightly longer - irradiation. can be generated with a sufficiently homogeneous power density distribution.
  • the use of a halogen lamp designed approximately as a radio emitter can also be useful.
  • the NIR radiation source - in particular the halogen lamp or halogen lamps - is preferably assigned reflectors for concentrating or focusing the radiation on the support of the coating system to be treated.
  • the reflector or the reflectors have a partially elliptical, partially parabolic or essentially W-shaped cross section. Inexpensive manufacture of the proposed device in this embodiment is possible with reflectors which have a plurality of appropriately designed reflection surfaces for one halogen lamp each, in which several halogen lamps are therefore inserted.
  • the reflectors are preferably actively cooled. This is done in a particularly simple manner by means of integrated fluid flow channels and a connected water cooling.
  • a further increase in the energy economy of the method is possible by using side or counter reflectors, the latter being particularly advantageous in the case of transparent or semi-transparent coating systems and supports.
  • the arrangement of the radiation source with the assigned reflectors (also referred to as main reflectors) and the side or counter reflectors is preferably such that an essentially closed radiation space is formed in which almost no radiation losses occur. If the type of radiator used for the short-wave or high-energy radiation makes this appear advantageous, means for optical beam shaping are also assigned to these radiators. Conventional UV lamps are in particular also reflectors. With a suitable design of the overall system, the reflectors assigned to the NIR emitter or the NIR emitters can also serve as reflectors for the UV radiation for certain applications. In contrast, if a laser is used as the UV radiation source, a beam expansion (using a system known per se) can be useful.
  • the system can be designed in a particularly simple manner in such a way that the carrier with the coating system as a whole lies in a radiation zone generated by the radiator (s) for the long-wave radiation and is briefly irradiated in a kind of "flash" process , This would be practical, for example, in semiconductor technology.
  • the carrier of the coating system passes through a fixed irradiation device which creates an irradiation zone with a predetermined contour, or the irradiation device is moved over the carrier.
  • the carrier or the irradiation device has a drive, which can be adjusted in particular to an exact feed rate.
  • the proposed device preferably comprises at least one measuring sensor for detecting a physical size of the coating which is relevant for the process of removing the solvent from the coating, in particular a based smoothly working temperature sensor (especially a pyrometer element) and / or a moisture sensor and / or an optical measuring device for detecting the reflectivity or absorption capacity of the coating.
  • a based smoothly working temperature sensor especially a pyrometer element
  • a moisture sensor especially a pyrometer element
  • an optical measuring device for detecting the reflectivity or absorption capacity of the coating.
  • the longer-wave radiation source can be controlled "manually" by means of a suitable radiation control device.
  • a suitable radiation control device In particular, the operating voltage of a halogen lamp as an NIR emitter and / or the distance between the emitter and the coating system can be controlled.
  • the irradiation controller input is connected to the sensor or sensors and -the 'includes a control device for operation of the device in a closed control loop.
  • Fig. 1 is a schematic longitudinal sectional view of a system for processing a with a UV-curing
  • FIG. 2 shows a sectional illustration of a device for resist treatment on semiconductor wafers in the context of an IC production process.
  • the drying and crosslinking section 100 comprises two basic components, namely an NIR drying module 107 with a drying control unit 109 and a UV crosslinking module 111.
  • the NIR drying module 107 consists of a one-piece solid Al reflector 113 with four internally polished reflector sections 113a with an approximately W-shaped cross section and four halogen filament lamps 115, each located in the center of a reflector section 113a, and is via cooling water pipes 117 connected to an external cooling device.
  • a pyrometer element 119 which is embedded in the reflector block 113 and is connected to a measurement signal input of the drying control unit 109, detects the surface temperature of the paper web 103 or the imprints 101 in the drying method defined by the reflector 113 in cooperation with the halogen lamps 115. irradiation zone.
  • the operating voltage of the halogen lamps 115 is controlled as a function of the measurement signals of the pyrometer element 119 in such a way that the surface temperature on the paper web 103 is kept constant with high accuracy.
  • the UV crosslinking module 111 as the second component of the drying and crosslinking section 100 comprises a second Al reflector 121 with two reflector sections 121a with parabolic schematic cross section, in each of which a mercury vapor lamp 123 is seated as a UV radiation source.
  • FIG. 2 shows a resist drying and curing device 200 for use in an ICE manufacturing process.
  • a plurality of semiconductor wafers 203 are deposited on a plate 201 and are covered with a liquid resist layer (not shown) with a UV-curable photoresist, which is applied by spinning in a constant, small thickness.
  • the irradiation arrangement 209 comprises an excimer laser 211 as a UV radiation source with a beam expansion device 213 for producing a substantially rectangular UV radiation zone covering the width of the plate 201.
  • the irradiation arrangement 209 further comprises a solid aluminum reflector 215 designed as an extruded profile, which is connected via cooling water lines 217 to a water cooling system (not shown) and has an approximately W-shaped cross section, and an elongated halogen filament lamp arranged in the center of the "W" 219th
  • the halogen lamp 219 is assigned an irradiation control unit 221, which is connected via a control input to a pyrometer element 223 used for contactless temperature measurement.
  • the halogen lamp 219 in cooperation with the Al reflector 215, generates an NIR irradiation zone on the plate 201 carrying the semiconductor wafers 203, which in the direction of movement of the irradiation arrangement 209 - symbolized by the arrow below the upper guide rail 205 - during the drying and curing step UV radiation zone leads ahead.
  • the NIR radiation zone essentially all of the solvent components of the photoresist are evaporated by the NIR radiation of the halogen lamp irradiated with a high power density before the dried resist is cured in the UV radiation zone.
  • the NIR radiation is controlled in the manner described above for the first exemplary embodiment.

Landscapes

  • Application Of Or Painting With Fluid Materials (AREA)
  • Chemically Coating (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

L'invention concerne un procédé de production d'un revêtement de surface (101), comprenant une phase d'activation d'une substance de départ, en particulier d'activation de monomères ou d'un composé à chaîne courte. Cette phase d'activation consiste à soumettre la surface d'un support (103) à un rayonnement électromagnétique à onde courte à longueurs d'onde situées en dessous de la zone visible, de manière à former des polymères ou une réticulation. Selon ce procédé, la substance de départ est soumise à un rayonnement à onde longue provenant d'une deuxième source de rayonnement (115) à puissance volumique élevée, en particulier à un rayonnement dans la zone de l'infrarouge proche, de façon sensiblement simultanée et/ou immédiatement avant une irradiation par le rayonnement électromagnétique à onde courte provenant d'une première source de rayonnement (123).
PCT/EP2002/002248 2002-03-01 2002-03-01 Procede et dispositif de production d'un revetement de surface WO2003074193A2 (fr)

Priority Applications (2)

Application Number Priority Date Filing Date Title
PCT/EP2002/002248 WO2003074193A2 (fr) 2002-03-01 2002-03-01 Procede et dispositif de production d'un revetement de surface
AU2002308228A AU2002308228A1 (en) 2002-03-01 2002-03-01 Method and device for the production of a surface coating by means of nir and uv aftertreatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/EP2002/002248 WO2003074193A2 (fr) 2002-03-01 2002-03-01 Procede et dispositif de production d'un revetement de surface

Publications (2)

Publication Number Publication Date
WO2003074193A2 true WO2003074193A2 (fr) 2003-09-12
WO2003074193A3 WO2003074193A3 (fr) 2003-12-04

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AU (1) AU2002308228A1 (fr)
WO (1) WO2003074193A2 (fr)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005043075A1 (de) * 2005-09-10 2007-03-15 Rehau Ag + Co. Verfahren zur Trocknung einer auf einem Kraftfahrzeug-Bauteil aufgebrachten Lackschicht sowie Trocknungssystem hierfür
US7754320B2 (en) 2004-01-12 2010-07-13 James Hardie Technology Limited Composite fiber cement article with radiation curable component
US7998571B2 (en) 2004-07-09 2011-08-16 James Hardie Technology Limited Composite cement article incorporating a powder coating and methods of making same
EP3498383A3 (fr) * 2017-12-15 2019-09-25 Eloxalwerk Ludwigsburg Helmut Zerrer GmbH Dispositif de revêtement d'une pièce à usiner par au moins un polymère haute performance et procédé de revêtement

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8993462B2 (en) 2006-04-12 2015-03-31 James Hardie Technology Limited Surface sealed reinforced building element

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19909542A1 (de) * 1999-03-04 2000-09-14 Industrieservis Ges Fuer Innov Lampen- und Reflektoranordnung
WO2001064794A2 (fr) * 2000-03-01 2001-09-07 Basf Coatings Ag Procede de preparation de revetements, de couches adhesives ou de couches d"etancheite pour des substrats portant ou non une couche d"appret
DE10035430A1 (de) * 2000-07-20 2002-02-07 Advanced Photonics Tech Ag Verfahren und Vorrichtung zur thermischen Behandlung einer Fotolackschicht auf einem Schaltungssubstrat, insbesondere Halbleiterwafer
WO2002039039A1 (fr) * 2000-11-08 2002-05-16 Adphos Advanced Photonics Technologies Ag Procede pour produire un revetement sur un substrat
DE10131620A1 (de) * 2001-06-29 2003-01-16 Adphos Advanced Photonics Tech Verfahren und Vorrichtung zum Trocknen und/oder Vernetzen oder Erwärmen mittels elektromagnetischer Strahlung

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19909542A1 (de) * 1999-03-04 2000-09-14 Industrieservis Ges Fuer Innov Lampen- und Reflektoranordnung
WO2001064794A2 (fr) * 2000-03-01 2001-09-07 Basf Coatings Ag Procede de preparation de revetements, de couches adhesives ou de couches d"etancheite pour des substrats portant ou non une couche d"appret
DE10035430A1 (de) * 2000-07-20 2002-02-07 Advanced Photonics Tech Ag Verfahren und Vorrichtung zur thermischen Behandlung einer Fotolackschicht auf einem Schaltungssubstrat, insbesondere Halbleiterwafer
WO2002039039A1 (fr) * 2000-11-08 2002-05-16 Adphos Advanced Photonics Technologies Ag Procede pour produire un revetement sur un substrat
DE10131620A1 (de) * 2001-06-29 2003-01-16 Adphos Advanced Photonics Tech Verfahren und Vorrichtung zum Trocknen und/oder Vernetzen oder Erwärmen mittels elektromagnetischer Strahlung

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7754320B2 (en) 2004-01-12 2010-07-13 James Hardie Technology Limited Composite fiber cement article with radiation curable component
US7998571B2 (en) 2004-07-09 2011-08-16 James Hardie Technology Limited Composite cement article incorporating a powder coating and methods of making same
DE102005043075A1 (de) * 2005-09-10 2007-03-15 Rehau Ag + Co. Verfahren zur Trocknung einer auf einem Kraftfahrzeug-Bauteil aufgebrachten Lackschicht sowie Trocknungssystem hierfür
EP3498383A3 (fr) * 2017-12-15 2019-09-25 Eloxalwerk Ludwigsburg Helmut Zerrer GmbH Dispositif de revêtement d'une pièce à usiner par au moins un polymère haute performance et procédé de revêtement

Also Published As

Publication number Publication date
AU2002308228A8 (en) 2003-09-16
WO2003074193A3 (fr) 2003-12-04
AU2002308228A1 (en) 2003-09-16

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