WO2003041136A1 - Dispositif d'exposition a faisceau d'electrons - Google Patents

Dispositif d'exposition a faisceau d'electrons Download PDF

Info

Publication number
WO2003041136A1
WO2003041136A1 PCT/JP2002/011623 JP0211623W WO03041136A1 WO 2003041136 A1 WO2003041136 A1 WO 2003041136A1 JP 0211623 W JP0211623 W JP 0211623W WO 03041136 A1 WO03041136 A1 WO 03041136A1
Authority
WO
WIPO (PCT)
Prior art keywords
electron beam
exposure device
beam exposure
placing surfaces
reference placing
Prior art date
Application number
PCT/JP2002/011623
Other languages
English (en)
French (fr)
Inventor
Nobuo Shimazu
Akihiro Endou
Tohru Ise
Toyoji Fukui
Taichi Fujita
Yoshiaki Yanagi
Yukio Tsuda
Hideaki Tsuda
Koichi Nihei
Original Assignee
Tokyo Seimitsu Co., Ltd.
Leepl Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Seimitsu Co., Ltd., Leepl Corporation filed Critical Tokyo Seimitsu Co., Ltd.
Publication of WO2003041136A1 publication Critical patent/WO2003041136A1/ja

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3174—Particle-beam lithography, e.g. electron beam lithography

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Electron Beam Exposure (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
PCT/JP2002/011623 2001-11-07 2002-11-07 Dispositif d'exposition a faisceau d'electrons WO2003041136A1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2001342229A JP2003142392A (ja) 2001-11-07 2001-11-07 電子ビーム露光装置
JP2001/342229 2001-11-07

Publications (1)

Publication Number Publication Date
WO2003041136A1 true WO2003041136A1 (fr) 2003-05-15

Family

ID=19156119

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2002/011623 WO2003041136A1 (fr) 2001-11-07 2002-11-07 Dispositif d'exposition a faisceau d'electrons

Country Status (3)

Country Link
JP (1) JP2003142392A (ja)
TW (1) TW200303572A (ja)
WO (1) WO2003041136A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9180216B2 (en) 2012-05-21 2015-11-10 Airex Co., Ltd. Electron beam irradiation device with gripping/moving means

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4522139B2 (ja) * 2003-09-19 2010-08-11 大日本スクリーン製造株式会社 基板処理ユニット、基板載置状態検出方法および基板処理装置
JP2006303156A (ja) * 2005-04-20 2006-11-02 Nikon Corp 静電チャック装置および露光装置
JP2010272586A (ja) * 2009-05-19 2010-12-02 Hitachi High-Technologies Corp 荷電粒子線装置
CN101916038B (zh) * 2010-07-15 2012-01-25 中国科学院苏州纳米技术与纳米仿生研究所 一种电子束光刻加工圆形阵列的方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09148224A (ja) * 1995-11-24 1997-06-06 Matsushita Electric Ind Co Ltd 露光装置及びパターン形成方法
JPH09266157A (ja) * 1996-03-28 1997-10-07 Nec Corp 縮小投影露光方法およびその装置
US5831272A (en) * 1997-10-21 1998-11-03 Utsumi; Takao Low energy electron beam lithography
JPH11111599A (ja) * 1997-10-03 1999-04-23 Hitachi Ltd 静電吸着装置及びそれを用いた電子線描画装置
GB2339960A (en) * 1998-07-16 2000-02-09 Advantest Corp Charged particle beam exposure with compensation for partial unevenness of the surface of the exposed specimen

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09148224A (ja) * 1995-11-24 1997-06-06 Matsushita Electric Ind Co Ltd 露光装置及びパターン形成方法
JPH09266157A (ja) * 1996-03-28 1997-10-07 Nec Corp 縮小投影露光方法およびその装置
JPH11111599A (ja) * 1997-10-03 1999-04-23 Hitachi Ltd 静電吸着装置及びそれを用いた電子線描画装置
US5831272A (en) * 1997-10-21 1998-11-03 Utsumi; Takao Low energy electron beam lithography
GB2339960A (en) * 1998-07-16 2000-02-09 Advantest Corp Charged particle beam exposure with compensation for partial unevenness of the surface of the exposed specimen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9180216B2 (en) 2012-05-21 2015-11-10 Airex Co., Ltd. Electron beam irradiation device with gripping/moving means

Also Published As

Publication number Publication date
JP2003142392A (ja) 2003-05-16
TW200303572A (en) 2003-09-01

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