WO2003032038A1 - Procede et appareil d'enregistrement d'un reseau optique sur un support photosensible - Google Patents

Procede et appareil d'enregistrement d'un reseau optique sur un support photosensible Download PDF

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Publication number
WO2003032038A1
WO2003032038A1 PCT/CA2002/001147 CA0201147W WO03032038A1 WO 2003032038 A1 WO2003032038 A1 WO 2003032038A1 CA 0201147 W CA0201147 W CA 0201147W WO 03032038 A1 WO03032038 A1 WO 03032038A1
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WO
WIPO (PCT)
Prior art keywords
light beam
phase mask
moving
photosensitive medium
curvature
Prior art date
Application number
PCT/CA2002/001147
Other languages
English (en)
Inventor
Yves Painchaud
Alain Mailloux
Hélène CHOTARD
Original Assignee
Teraxion Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from CA002358659A external-priority patent/CA2358659A1/fr
Application filed by Teraxion Inc. filed Critical Teraxion Inc.
Publication of WO2003032038A1 publication Critical patent/WO2003032038A1/fr

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Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02152—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating involving moving the fibre or a manufacturing element, stretching of the fibre
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/02—Optical fibres with cladding with or without a coating
    • G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
    • G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
    • G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
    • G02B6/02133—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference
    • G02B6/02138—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating using beam interference based on illuminating a phase mask
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B6/122—Basic optical elements, e.g. light-guiding paths
    • G02B6/124—Geodesic lenses or integrated gratings
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
    • G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
    • G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
    • G02B2006/12166—Manufacturing methods
    • G02B2006/12173—Masking

Definitions

  • the present invention relates to the field of components for optical telecommunications and more particularly concerns a method and a corresponding apparatus for recording optical gratings in a photosensitive medium with an enhanced control of the characteristics of the grating.
  • Phase masks are widely used for the fabrication of UV-induced fiber Bragg gratings since their first reports (see for example K.O. Hill, B. Malo, F. Bilodeau, D.C. Johnson, and J. Albert, "Bragg gratings fabricated in monomode photosensitive optical fiber by UV exposure through a phase mask" Appl. Phys. Lett., pp.1035-1037 (1993); U.S. Patent No 5,367,588 (Hill et al.); D.Z. Anderson, V. Mizrahi, T. Amsterdam, and A.E. White, "Production of in-fibre gratings using a diffractive optical element' Electron.
  • the fiber is characterized by an effective index n ⁇ ff that is modified by the UV radiation.
  • a fiber Bragg grating is mainly characterized by the period p of the index modulation in the core of the fiber, along its axis.
  • n ⁇ ft is the slowly varying effective index of the fiber inside the grating
  • z is the position along the grating and the dependence of the parameters over z indicates that both the period and the slowly varying effective index are not necessarily uniform along the grating.
  • control of the Bragg wavelength along a grating This can be done by controlling the period of the grating along the fiber.
  • z ⁇ is the magnification factor
  • ⁇ is the phase mask period
  • q is the distance between the output surface of the phase mask and the fiber core
  • i f is the distance between the output surface of the phase mask and the focal plane, that is the plane where the beam would be focalized.
  • the distance Z f also corresponds to the radius of curvature of the wavefront at the phase mask.
  • FIG. 2 illustrates the interference fringes at the output of a phase mask when a collimated beam is incident.
  • the period of the grating is independent of the distance between the phase mask and the fiber.
  • the present invention provides a method for recording an optical grating along a waveguiding axis in a photosensitive medium.
  • the method includes: a) providing a phase mask proximate the photosensitive medium along the waveguiding axis; b) projecting a light beam through a portion of the phase mask to generate a light beam with a modulated intensity profile.
  • the light beam with a modulated intensity profile impinges on the photosensitive medium to locally record therein a portion of the optical grating, having a characteristic period; c) moving the light beam along the waveguiding axis of the photosensitive medium to successively record portions of the optical grating therealong; and d) concurrently to the moving of the light beam: i) moving the phase mask in a direction parallel to the moving of the light beam.
  • the moving of the phase mask is adjusted relative to the moving of the light beam to locally tune the characteristic period of each portion of the optical grating; and ii) providing a curvature in the light beam wavefront along the direction of the waveguiding axis, this curvature having a wavefront radius of curvature at a phase mask plane selected to generally optimize an efficiency of the recording of the optical grating for this characteristic period.
  • the present invention provides another method for recording an optical grating along a waveguiding axis in a photosensitive medium, the method comprising: a) providing a phase mask proximate to the photosensitive medium along the waveguiding axis; b) projecting a light beam through a portion of said phase mask to generate a light beam with a modulated intensity profile, said light beam with a modulated intensity profile impinging on the photosensitive medium to locally record therein a portion of the optical grating having a characteristic period; c) moving the light beam along the waveguiding axis of the photosensitive medium to successively record portions of the optical grating therealong; and d) concurrently to said moving of the light beam: i) moving the photosensitive medium in a direction parallel to the moving of the light beam, said moving of the photosensitive medium being adjusted relative to the moving of the light beam to locally tune the characteristic period of each portion of the optical grating; and ii) providing a wavefront curvature in said light beam along the direction of the
  • an apparatus for recording an optical grating along a waveguiding axis in a photosensitive medium includes a phase mask provided proximate the photosensitive medium along the waveguiding axis.
  • a light source is also provided, generating a light beam for projection through a portion of the phase mask to generate a light beam with a modulated intensity profile.
  • the light beam with a modulated intensity profile impinges on the photosensitive medium to locally record therein a portion of the optical grating having a characteristic period.
  • the apparatus finally includes curvature means for providing a curvature in the light beam along the direction of the waveguiding axis.
  • the curvature has a wavefront radius of curvature in a plane of the phase mask selected to generally optimize an efficiency of the recording of the optical grating for the characteristic period of each portion of the optical grating.
  • a method for recording an optical grating along a waveguiding axis in a photosensitive medium comprising a plurality of superimposed grating components each having a characteristic period profile
  • the method comprising: a) providing a phase mask proximate the photosensitive medium along the waveguiding axis; b) for each of the superimposed grating component: i) projecting a light beam through a portion of said phase mask to generate a light beam with a modulated intensity profile, said light beam with a modulated intensity profile impinging on the photosensitive medium to locally record therein a portion of the optical grating component having a characteristic period; ii) moving the light beam along the waveguiding axis of the photosensitive medium to successively record portions of the optical grating component therealong; and iii) concurrently to said moving of the light beam: 1) moving the phase mask in a direction parallel to the moving of the light beam, said moving of the
  • FIG. 1 shows the reflectivity as a function of wavelength for an optical grating made using the technique described by Cole et al.
  • FIGs. 2A and 2B illustrate the interference fringes at the output of a phase mask when the incident light beam is collimated (FIG. 2A) and convergent (FIG. 2B).
  • FIG. 3 illustrates the index modulation in two successive portions of a photosensitive medium when the light beam is convergent (a) and when the light beam has a curvature (b).
  • FIG. 4A is a side view of an apparatus according to a preferred embodiment of the invention
  • FIG. 4B is a perspective side view of a portion of the apparatus of FIG. 4A
  • FIGs. 5A, 5B and 5C are graphs respectively showing the reflectivity the group delay and the dispersion of superimposed gratings fabricated using a preferred embodiment of the invention.
  • the present invention advantageously allows to improve the range of the phase mask moving technique disclosed by Cole et al. where the phase mask (or photosensitive medium) is displaced parallel to the scanning of the light beam.
  • a method for recording an optical grating along a waveguiding axis in a photosensitive medium is a length of optical fiber, but any other type of waveguide where a refractive index grating needs to be written would be equally covered by the present invention.
  • optical grating refers generally to a periodic (or nearly periodic) refractive index change in an optical medium. It can be of any length allowed by the geometry of the system, and if desired it may be chirped, apodised, etc.
  • the method first involves providing a phase mask proximate the photosensitive medium, along its waveguiding axis.
  • the phase mask preferably has a constant period along its length but a chirped mask could also be used, with appropriate modifications to the other parameters of the system.
  • proximate the photosensitive medium it is meant that the photosensitive medium is positioned within the diffraction field of a light beam modulated by the phase mask.
  • the phase mask extends in parallel to the waveguiding axis of the photosensitive medium, but the two could alternatively form a small angle to induce a chirp in the photoinduced optical grating.
  • the next step of the method of the present invention involves projecting a light beam through a portion of the phase mask, to generate a light beam with a modulated intensity profile.
  • the light beam with a modulated intensity profile impinges on the photosensitive medium to locally record therein a portion of the optical grating.
  • This portion of the optical grating has a characteristic period p(z), z representing the position of this particular portion of the grating along the waveguiding axis.
  • the light beam is preferably UV radiation produced by a laser.
  • the light beam is then moved along the waveguiding axis, to successively record portions of the optical grating therealong at different positions z.
  • the phase mask is also moved in a parallel direction, in accordance with the technique of Cole et al.
  • the movement of the phase mask is adjusted relative to the moving of the light beam to locally tune the characteristic period of each portion of the optical grating which is being photoinduced in the photosensitive medium.
  • a translation of the phase mask in the same direction as the movement of the light beam will increase the local characteristic period of the grating, whereas moving the two in opposite directions shortens the grating's period.
  • the tunability of the grating period with the Cole et al. technique is limited by the range of the reflectivity peak seen on FIG. 1.
  • the present invention provides a curvature in the light beam wavefront, and the wavefront radius of curvature at the phase mask plane is selected to generally optimize the efficiency of the recording of the optical grating for a given characteristic period. This essentially allows to a large wavelength shift in the efficiency curve of FIG. 1 to align the reflectivity peak with the desired wavelength.
  • FIGs. 3A and 3B illustrates the index modulation induced inside two portions of a photosensitive medium during a step-by-step scan.
  • phase in the index modulation is the same in the two portions.
  • the UV beam has a curvature in its wavefront (FIG. 3B)
  • a phase shift exists between the two portions. This phase shift depends on the wavefront curvature, on the laser beam displacement and on the distance between the phase mask and the waveguiding axis of the photosensitive medium according to:
  • phase shift between portions is however eliminated by properly coordinating the movements of the phase mask as the light beam.
  • the required displacement ⁇ x m of the phase mask for eliminating the phase shift is :
  • the displacement of the phase mask which determines the period of the grating.
  • the wavefront curvature of the light beam is then adjusted in order for the writing process to be efficient.
  • the effect of the wavefront curvature can be viewed as a wavelength shift in the efficiency curve shown in FIG. 1.
  • a disagreement between the phase mask displacement and the light beam wavefront curvature causes a loss of writing efficiency according to the graph shown in FIG. 1.
  • the adjustment of the wavefront curvature is not extremely critical, as long as the resulting recording efficiency remains within the acceptable range.
  • the moving of the light beam and of the phase mask are both done step by step. Therefore, between the recording of each consecutive grating portions the light beam undergoes a displacement ⁇ z and the phase mask is displaced by a quantity ⁇ x m . If, for a given grating portion, the nominal period of the optical grating Po (corresponding to a Bragg wavelength ⁇ o) is the one obtained without any phase mask displacement, the period shift ⁇ p from this nominal value, and the corresponding shift in the Bragg wavelength of the grating portion, is given by:
  • n g and n ⁇ ff are the group and effective indices of the waveguiding axis respectively.
  • the required wavefront radius of curvature of the light beam at the phase mask plane for the writing to be efficient is:
  • the moving of the light beam and the phase mask may be done continuously.
  • the local value of the nominal grating period p 0 (z) (and Bragg wavelength ⁇ B o(z)) is modified by a quantity _ p(z) ( ⁇ B(z)) by displacing the phase mask by a quantity ⁇ x m (z) according to:
  • dz is the translation of the UV beam
  • v m (z) is the velocity of the phase mask at position z
  • v(z) is the velocity of the light beam translation at position z.
  • the wavefront radius of curvature must be such that at each point along the grating, the following relationship holds:
  • the method of the present invention allows to tailor the characteristic period profile of the recorded grating by simply controlling two parameters, that is the relative translation of the phase mask and light beam and the wavefront radius of curvature of the light beam.
  • the present invention may also be combined with any other appropriate techniques that may further provide an adjustment of the characteristics of an optical grating, such as stretching the fiber, varying the scanning speed, etc.
  • the method above could be modified so that the photosensitive medium is moved instead of the phase mask, since the desired effect on the period depends on the relative displacement between these two components, It will be readily understood that to obtain the same effect, the photosensitive medium should be translated in the opposite direction as the phase mask would have been.
  • FIGs. 4A and 4B there is show an apparatus 10 for recording on optical grating along a waveguiding axis 12 of a photosensitive medium 14, according to a preferred embodiment of the invention.
  • the apparatus first includes a phase mask 16 provided proximate the photosensitive medium 14 along the waveguiding axis 12.
  • a light source 18, preferably a UV laser source, is also provided and generates a light beam 20 which is directed to project through a portion of the phase mask 16. This in turn generates a light beam with a modulated intensity profile which impinges on the photosensitive medium 14 to locally record therein a portion of the optical grating having a characteristic period.
  • these moving means include a 45° mirror 22 disposed to redirect the light beam 20 from the light source 18 towards the phase mask 16, this mirror being mounted on a translation stage 24.
  • phase mask 16 means for moving the phase mask 16 in a direction parallel to the moving of the light beam 20 and concurrently thereto are provided.
  • this is embodied by a second translation stage 26 on which the phase mask 16 is mounted.
  • the relative movements of the phase mask 16 and the light beam 20 are adjusted to locally tune the characteristic period of each portion of the optical grating, in accordance with the technique described above.
  • Appropriate optical components are further provided to give the light beam 20 a wavefront curvature along the direction of the waveguiding axis.
  • the wavefront radius of curvature, in the plane of the phase mask, is selected to generally optimize the efficiency of the recording of the optical grating, as also explained above.
  • the light beam 20 is modified previously to impinging on the phase mask 16 by an optical system composed of lenses L1, L2 and Lf.
  • Lens L f focuses the light beam 20 along the waveguiding axis of the photosensitive medium and therefore does not influence the wavefront curvature of the beam in this axis.
  • Lenses L1 and L2 decrease the width of the light beam 20 and allow, via a longitudinal displacement of lens L1, an adjustment of the wavefront curvature.
  • Distance q is the one between the phase mask and the waveguiding axis
  • / is the distance between lens L2 and the waveguiding axis
  • D, D' and D" are respectively the beam widths at the system input, at lens L2 and at the waveguiding axis, and f ?
  • d and f 2 are the focal lengths of lenses L1 and L2 respectively.
  • Distance d between lenses L1 and L2 has a nominal value, before adjustment of the wavefront radius of curvature, fi+f , with this choice, the light beam 20 incident on the phase mask 16 is collimated and the period of the grating corresponds to the nominal period p 0 .
  • d it is convenient to write d as: d - f ⁇ h - ⁇ (11) so that ⁇ varies around 0 for adjusting the local characteristic period of the grating.
  • the light beam width at lens L2 and at the waveguiding axis is respectively given by:
  • the light beam width at the waveguiding axis is independent of the wavefront curvature and the grating period depends linearly on the position of lens L1, which is therefore preferably mounted on another translation stage 28.
  • a method for recording an optical grating having a plurality of superimposed grating components each having a different characteristic period profile in a photosensitive medium is for example useful for compensation of chromatic dispersion as for disclosed in assignee's simultaneously filed co-pending application entitled "OPTICAL STRUCTURE FOR THE COMPENSATION OF CHROMATIC DISPERSION IN A LIGHT SIGNAL".
  • the method according to this embodiment includes as before a first step of providing a phase mask proximate the photosensitive medium along the waveguiding axis.
  • the steps of the method described above are performed, that is: i) projecting a light beam through a portion of the phase mask to generate a light beam with a modulated intensity profile, the light beam with a modulated intensity profile impinging on the photosensitive medium to locally record therein a portion of the optical grating component having a characteristic period; ii) moving the light beam along the waveguiding axis of the photosensitive medium to successively record portions of the optical grating component therealong; and iii) concurrently to the moving of the light beam:
  • the wavefront radius of curvature in the plane of the phase mask being selected to generally optimize the efficiency of the recording of the optical grating for said characteristic period.
  • FIGs. 5A and 5B show the measurements of the reflectivity and group delay obtained for a multi-channel fiber Bragg grating made of superimposed grating components using the method of the present invention and the apparatus of FIG. 4A.
  • the central wavelength and the dispersion of the grating are adjusted by a proper control of the position of lens L1 and the phase mask displacement.
  • FIG. 5C shows the dispersion measured en each channel in comparison with the targeted values. It is clear from this example that the present invention allows a precise and broad adjustment of both the Bragg wavelength and the chirp of the grating.
  • the present invention advantageously allows the adjustment of the Bragg wavelength over a large range, while avoiding slanted fringes inside the grating.
  • phase masks are typically expensive

Abstract

L'invention concerne un procédé et un appareil (10) d'enregistrement de réseaux optiques sur un support photosensible (14). L'invention utilise un masque (16) de phase en combinaison avec le balayage d'un faisceau lumineux (20) d'enregistrement. Le masque de phase ou, en variante, le support photosensible, est déplacé le long d'une direction parallèle au balayage du faisceau lumineux, de façon à pouvoir ajuster localement l'étendue du réseau enregistré. Afin de garantir une efficacité d'enregistrement appropriée sur une large gamme de longueurs d'onde, le faisceau lumineux comprend une courbure de front d'ondes sélectionnée. Le procédé de l'invention est particulièrement avantageux pour l'enregistrement de composants de réseau superposés sur un support photosensible.
PCT/CA2002/001147 2001-10-09 2002-07-23 Procede et appareil d'enregistrement d'un reseau optique sur un support photosensible WO2003032038A1 (fr)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
CA2,358,659 2001-10-09
CA002358659A CA2358659A1 (fr) 2001-10-09 2001-10-09 Technique d'ecriture de reseaux de bragg par controle des franges
CA 2377208 CA2377208A1 (fr) 2001-10-09 2002-03-18 Methode et appareil d'enregistrement de reseaux optiques sur un support photosensible
CA2,377,208 2002-03-18

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Publication Number Publication Date
WO2003032038A1 true WO2003032038A1 (fr) 2003-04-17

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CA (1) CA2377208A1 (fr)
WO (1) WO2003032038A1 (fr)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102692829A (zh) * 2011-03-25 2012-09-26 上海微电子装备有限公司 基于双光源多周期标记的对准方法及对准系统
CN103777467A (zh) * 2012-10-19 2014-05-07 上海微电子装备有限公司 一种套刻误差测量装置及方法
CN104345579A (zh) * 2013-08-09 2015-02-11 上海微电子装备有限公司 无掩模曝光设备及其信号回馈控制方法
CN104345577A (zh) * 2013-08-09 2015-02-11 上海微电子装备有限公司 对准装置
CN104375391A (zh) * 2014-12-10 2015-02-25 志圣科技（广州）有限公司 一种光刻机的控制方法及装置
CN104375389A (zh) * 2014-10-13 2015-02-25 江苏影速光电技术有限公司 一种多工件台协作直写光刻方法
CN104777715A (zh) * 2014-01-10 2015-07-15 上海微电子装备有限公司 一种测量光刻机垂向测量系统反射镜面形的方法
CN104797979A (zh) * 2013-01-22 2015-07-22 Asml荷兰有限公司 静电夹具
CN104914677A (zh) * 2014-03-12 2015-09-16 台湾积体电路制造股份有限公司 制造具有增强的缺陷可修复性的集成电路的方法
CN104932204A (zh) * 2014-03-19 2015-09-23 北大方正集团有限公司 光刻机曝光参数的获取方法
CN105487345A (zh) * 2016-01-14 2016-04-13 哈尔滨工业大学 基于电制冷片的动磁钢磁浮双工件台矢量圆弧换台方法及装置
CN105739247A (zh) * 2016-02-25 2016-07-06 中国科学技术大学 一种纳米压印设备
CN106527054A (zh) * 2016-11-28 2017-03-22 京东方科技集团股份有限公司 一种曝光设备及曝光方法
CN106574995A (zh) * 2014-07-11 2017-04-19 加拿大国家研究委员会 用提供可调节干涉图案的装置形成光学光栅

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5636304A (en) * 1992-12-23 1997-06-03 Lucent Technologies Inc. Article comprising a spatially varying Bragg grating in an optical fiber
WO1999022256A1 (fr) * 1997-10-24 1999-05-06 Pirelli Cavi E Sistemi S.P.A. Fabrication de reseaux pour guides d'ondes optiques
US6130973A (en) * 1998-03-26 2000-10-10 Institut National D'optique Method and apparatus for spectrally designing all-fiber filters
US6201911B1 (en) * 1998-08-19 2001-03-13 Samsung Electronics Co., Ltd. Apparatus for manufacturing long-period fiber gratings and apparatus for manufacturing two-band long-period fiber gratings using the same
US6269208B1 (en) * 1998-10-30 2001-07-31 Corning Incorporated Wavelength tuning of photo-induced gratings

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5636304A (en) * 1992-12-23 1997-06-03 Lucent Technologies Inc. Article comprising a spatially varying Bragg grating in an optical fiber
WO1999022256A1 (fr) * 1997-10-24 1999-05-06 Pirelli Cavi E Sistemi S.P.A. Fabrication de reseaux pour guides d'ondes optiques
US6130973A (en) * 1998-03-26 2000-10-10 Institut National D'optique Method and apparatus for spectrally designing all-fiber filters
US6201911B1 (en) * 1998-08-19 2001-03-13 Samsung Electronics Co., Ltd. Apparatus for manufacturing long-period fiber gratings and apparatus for manufacturing two-band long-period fiber gratings using the same
US6269208B1 (en) * 1998-10-30 2001-07-31 Corning Incorporated Wavelength tuning of photo-induced gratings

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
COLE M J ET AL: "Moving fibre/phase mask-scanning beam technique for enhanced flexibility in producing fibre gratings with uniform phase mask", ELECTRONICS LETTERS, IEE STEVENAGE, GB, vol. 31, no. 17, 17 August 1995 (1995-08-17), pages 1488 - 1490, XP006003242, ISSN: 0013-5194 *
LOH W H ET AL: "Compensation of imperfect phase mask with moving fibre-scanning beam technique for production of fibre gratings", ELECTRONICS LETTERS, IEE STEVENAGE, GB, vol. 31, no. 17, 17 August 1995 (1995-08-17), pages 1483 - 1485, XP006003230, ISSN: 0013-5194 *

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CN103777467A (zh) * 2012-10-19 2014-05-07 上海微电子装备有限公司 一种套刻误差测量装置及方法
CN104797979A (zh) * 2013-01-22 2015-07-22 Asml荷兰有限公司 静电夹具
US9939737B2 (en) 2013-01-22 2018-04-10 Asml Netherlands B.V. Electrostatic clamp
CN104345579A (zh) * 2013-08-09 2015-02-11 上海微电子装备有限公司 无掩模曝光设备及其信号回馈控制方法
CN104345577A (zh) * 2013-08-09 2015-02-11 上海微电子装备有限公司 对准装置
CN104777715A (zh) * 2014-01-10 2015-07-15 上海微电子装备有限公司 一种测量光刻机垂向测量系统反射镜面形的方法
CN104914677A (zh) * 2014-03-12 2015-09-16 台湾积体电路制造股份有限公司 制造具有增强的缺陷可修复性的集成电路的方法
CN104932204A (zh) * 2014-03-19 2015-09-23 北大方正集团有限公司 光刻机曝光参数的获取方法
EP3167316A4 (fr) * 2014-07-11 2018-02-21 National Research Council of Canada Formation d'un réseau optique avec un appareil produisant un motif d'interférence réglable
CN106574995B (zh) * 2014-07-11 2019-08-30 加拿大国家研究委员会 用提供可调节干涉图案的装置形成光学光栅
US10156680B2 (en) 2014-07-11 2018-12-18 National Research Council Of Canada Forming an optical grating with an apparatus providing an adjustable interference pattern
CN106574995A (zh) * 2014-07-11 2017-04-19 加拿大国家研究委员会 用提供可调节干涉图案的装置形成光学光栅
CN104375389A (zh) * 2014-10-13 2015-02-25 江苏影速光电技术有限公司 一种多工件台协作直写光刻方法
CN104375391A (zh) * 2014-12-10 2015-02-25 志圣科技（广州）有限公司 一种光刻机的控制方法及装置
CN105487345A (zh) * 2016-01-14 2016-04-13 哈尔滨工业大学 基于电制冷片的动磁钢磁浮双工件台矢量圆弧换台方法及装置
CN105739247A (zh) * 2016-02-25 2016-07-06 中国科学技术大学 一种纳米压印设备
CN106527054A (zh) * 2016-11-28 2017-03-22 京东方科技集团股份有限公司 一种曝光设备及曝光方法

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