WO2003023910A3 - Laser a electrodes ameliorees a taux eleve de repetition - Google Patents

Laser a electrodes ameliorees a taux eleve de repetition Download PDF

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Publication number
WO2003023910A3
WO2003023910A3 PCT/US2002/028463 US0228463W WO03023910A3 WO 2003023910 A3 WO2003023910 A3 WO 2003023910A3 US 0228463 W US0228463 W US 0228463W WO 03023910 A3 WO03023910 A3 WO 03023910A3
Authority
WO
WIPO (PCT)
Prior art keywords
anode
discharge
laser
electrode
erosion rate
Prior art date
Application number
PCT/US2002/028463
Other languages
English (en)
Other versions
WO2003023910A2 (fr
Inventor
Richard G Morton
Timothy S Dyer
Thomas D Steiger
Richard C Ujazdowski
Tom A Watson
Bryan Moosman
Alex P Ivaschenko
Walter D Gillespie
Curtis L Rettig
Original Assignee
Cymer Inc
Richard G Morton
Timothy S Dyer
Thomas D Steiger
Richard C Ujazdowski
Tom A Watson
Bryan Moosman
Alex P Ivaschenko
Walter D Gillespie
Curtis L Rettig
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/953,026 external-priority patent/US6711202B2/en
Priority claimed from US10/081,589 external-priority patent/US20020154670A1/en
Priority claimed from US10/104,502 external-priority patent/US6690706B2/en
Application filed by Cymer Inc, Richard G Morton, Timothy S Dyer, Thomas D Steiger, Richard C Ujazdowski, Tom A Watson, Bryan Moosman, Alex P Ivaschenko, Walter D Gillespie, Curtis L Rettig filed Critical Cymer Inc
Priority to AU2002324905A priority Critical patent/AU2002324905A1/en
Priority to EP02759577A priority patent/EP1436866A4/fr
Priority to KR1020047003801A priority patent/KR100940782B1/ko
Priority to JP2003527843A priority patent/JP3971382B2/ja
Publication of WO2003023910A2 publication Critical patent/WO2003023910A2/fr
Publication of WO2003023910A3 publication Critical patent/WO2003023910A3/fr

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0381—Anodes or particular adaptations thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/038—Electrodes, e.g. special shape, configuration or composition
    • H01S3/0388—Compositions, materials or coatings
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/09—Processes or apparatus for excitation, e.g. pumping
    • H01S3/097—Processes or apparatus for excitation, e.g. pumping by gas discharge of a gas laser
    • H01S3/09702—Details of the driver electronics and electric discharge circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)

Abstract

L'invention porte sur un laser à gaz présentant au moins une électrode allongée de longue durée et pouvant produire au moins 12 milliards de décharges électriques à haute tension excitant un laser à gaz au fluor. Dans une exécution préférée l'une au moins des électrodes est faite d'un premier matériau à vitesse d'érosion relativement faible et l'autre, d'un deuxième matériau anodique à vitesse d'érosion relativement plus élevée. Le matériau de la première anode se situe dans la zone désirée de décharge de l'électrode. Le matériau de la deuxième anode jouxte celui de la première anode sur au moins deux longs côtés du premier matériau. Pendant le fonctionnement du laser, l'érosion apparaît sur les deux matériaux, mais la vitesse d'érosion plus élevée du deuxième matériau assure que toute tendance de la décharge à s'étendre au premier matériau érodera rapidement le deuxième matériau, et suffisamment pour arrêter la propagation de la décharge. Dans une exécution préférée l'anode est telle que décrite ci-dessus et la cathode est également faite de deux matériaux, dont le premier, qui forme la zone de décharge, est du laiton C26000, et le deuxième, du laiton C36000. Le système de pulsation de la puissance fournit des impulsions à la cadence de 1 kHz. Une soufflante fait circuler le gaz du laser entre les électrodes à une vitesse d'au moins 5 m/s, tandis qu'un échangeur de chaleur extrait la chaleur dégagée par la soufflante et par les décharges.
PCT/US2002/028463 2001-09-13 2002-09-06 Laser a electrodes ameliorees a taux eleve de repetition WO2003023910A2 (fr)

Priority Applications (4)

Application Number Priority Date Filing Date Title
AU2002324905A AU2002324905A1 (en) 2001-09-13 2002-09-06 High rep-rate laser with improved electrodes
EP02759577A EP1436866A4 (fr) 2001-09-13 2002-09-06 Laser a electrodes ameliorees a taux eleve de repetition
KR1020047003801A KR100940782B1 (ko) 2001-09-13 2002-09-06 향상된 전극을 구비한 고반복률 레이저
JP2003527843A JP3971382B2 (ja) 2001-09-13 2002-09-06 改良された電極を備える高繰返率のレーザ

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US09/953,026 2001-09-13
US09/953,026 US6711202B2 (en) 2000-06-09 2001-09-13 Discharge laser with porous insulating layer covering anode discharge surface
US10/081,589 2002-02-21
US10/081,589 US20020154670A1 (en) 2000-06-09 2002-02-21 Electric discharge laser with two-material electrodes
US10/104,502 2002-03-22
US10/104,502 US6690706B2 (en) 2000-06-09 2002-03-22 High rep-rate laser with improved electrodes

Publications (2)

Publication Number Publication Date
WO2003023910A2 WO2003023910A2 (fr) 2003-03-20
WO2003023910A3 true WO2003023910A3 (fr) 2003-05-30

Family

ID=27374022

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US2002/028463 WO2003023910A2 (fr) 2001-09-13 2002-09-06 Laser a electrodes ameliorees a taux eleve de repetition

Country Status (4)

Country Link
EP (1) EP1436866A4 (fr)
JP (1) JP3971382B2 (fr)
KR (1) KR100940782B1 (fr)
WO (1) WO2003023910A2 (fr)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7230965B2 (en) * 2001-02-01 2007-06-12 Cymer, Inc. Anodes for fluorine gas discharge lasers
US7339973B2 (en) * 2001-09-13 2008-03-04 Cymer, Inc. Electrodes for fluorine gas discharge lasers
US7095774B2 (en) * 2001-09-13 2006-08-22 Cymer, Inc. Cathodes for fluorine gas discharge lasers
US7301980B2 (en) * 2002-03-22 2007-11-27 Cymer, Inc. Halogen gas discharge laser electrodes
EP2259390A1 (fr) * 2003-07-29 2010-12-08 Cymer, Inc. Electrode pour laser á décharge gazeuse
JP4579002B2 (ja) * 2005-02-21 2010-11-10 株式会社小松製作所 パルス発振型放電励起レーザ装置
US7542502B2 (en) * 2005-09-27 2009-06-02 Cymer, Inc. Thermal-expansion tolerant, preionizer electrode for a gas discharge laser
WO2015125286A1 (fr) * 2014-02-21 2015-08-27 ギガフォトン株式会社 Chambre laser
KR102519981B1 (ko) * 2018-01-11 2023-04-10 사이머 엘엘씨 방전 체임버용 전극
CN112210775B (zh) * 2020-10-09 2022-12-02 中国科学院微电子研究所 一种零件涂层制备装置及零件涂层制备方法、终端装置

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5187716A (en) * 1990-07-06 1993-02-16 Mitsubishi Denki Kabushiki Kaisha Excimer laser device
US5247534A (en) * 1991-04-23 1993-09-21 Lambda Physik Forschungsgesellschaft Mbh Pulsed gas-discharge laser
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5586134A (en) * 1992-11-13 1996-12-17 Cymer Laser Technologies Excimer laser
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer
US5897847A (en) * 1991-03-06 1999-04-27 American Air Liquide Method for extending the gas lifetime of excimer lasers

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6348874A (ja) * 1986-08-19 1988-03-01 Matsushita Electric Ind Co Ltd レ−ザ装置
DE4401892C2 (de) * 1994-01-24 1999-06-02 Lambda Physik Forschung Elektrode für einen Gasentladungslaser und Verfahren zum Formen einer Elektrode für einen Gasentladungslaser
US6330261B1 (en) * 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
JPH1168196A (ja) * 1997-08-26 1999-03-09 Nissin Electric Co Ltd ガスレーザ装置
US6466602B1 (en) * 2000-06-09 2002-10-15 Cymer, Inc. Gas discharge laser long life electrodes
US6711202B2 (en) * 2000-06-09 2004-03-23 Cymer, Inc. Discharge laser with porous insulating layer covering anode discharge surface
US6654403B2 (en) * 2000-06-09 2003-11-25 Cymer, Inc. Flow shaping electrode with erosion pad for gas discharge laser

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5187716A (en) * 1990-07-06 1993-02-16 Mitsubishi Denki Kabushiki Kaisha Excimer laser device
US5897847A (en) * 1991-03-06 1999-04-27 American Air Liquide Method for extending the gas lifetime of excimer lasers
US5247534A (en) * 1991-04-23 1993-09-21 Lambda Physik Forschungsgesellschaft Mbh Pulsed gas-discharge laser
US5359620A (en) * 1992-11-12 1994-10-25 Cymer Laser Technologies Apparatus for, and method of, maintaining a clean window in a laser
US5586134A (en) * 1992-11-13 1996-12-17 Cymer Laser Technologies Excimer laser
US5763930A (en) * 1997-05-12 1998-06-09 Cymer, Inc. Plasma focus high energy photon source
US5818865A (en) * 1997-05-16 1998-10-06 Cymer, Inc. Compact excimer laser insulator with integral pre-ionizer

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP1436866A4 *

Also Published As

Publication number Publication date
WO2003023910A2 (fr) 2003-03-20
KR20040031790A (ko) 2004-04-13
KR100940782B1 (ko) 2010-02-11
EP1436866A2 (fr) 2004-07-14
EP1436866A4 (fr) 2009-10-28
JP3971382B2 (ja) 2007-09-05
JP2005503027A (ja) 2005-01-27

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