WO2003019617A3 - Verfahren zur herstellung von elektronischen bauelementen - Google Patents
Verfahren zur herstellung von elektronischen bauelementen Download PDFInfo
- Publication number
- WO2003019617A3 WO2003019617A3 PCT/EP2002/009497 EP0209497W WO03019617A3 WO 2003019617 A3 WO2003019617 A3 WO 2003019617A3 EP 0209497 W EP0209497 W EP 0209497W WO 03019617 A3 WO03019617 A3 WO 03019617A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- electronic components
- transmitting device
- chip
- support
- active detecting
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 230000010354 integration Effects 0.000 abstract 1
- 239000004065 semiconductor Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/12—Mountings, e.g. non-detachable insulating substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14618—Containers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L31/02—Details
- H01L31/0232—Optical elements or arrangements associated with the device
- H01L31/02325—Optical elements or arrangements associated with the device the optical elements not being integrated nor being directly associated with the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
- H01L27/144—Devices controlled by radiation
- H01L27/146—Imager structures
- H01L27/14601—Structural or functional details thereof
- H01L27/14625—Optical elements or arrangements associated with the device
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/095—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00 with a principal constituent of the material being a combination of two or more materials provided in the groups H01L2924/013 - H01L2924/0715
- H01L2924/097—Glass-ceramics, e.g. devitrified glass
- H01L2924/09701—Low temperature co-fired ceramic [LTCC]
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Led Device Packages (AREA)
- Ceramic Capacitors (AREA)
- Compositions Of Oxide Ceramics (AREA)
- Solid State Image Pick-Up Elements (AREA)
- Pressure Sensors (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Electroluminescent Light Sources (AREA)
- Dicing (AREA)
- Optical Couplings Of Light Guides (AREA)
Abstract
Priority Applications (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02779276A EP1419530B1 (de) | 2001-08-24 | 2002-08-26 | Verfahren zur herstellung von elektronischen bauelementen |
AU2002342623A AU2002342623A1 (en) | 2001-08-24 | 2002-08-26 | Method for producing electronic components |
DE50210653T DE50210653D1 (de) | 2001-08-24 | 2002-08-26 | Verfahren zur herstellung von elektronischen bauelementen |
US10/487,604 US7160478B2 (en) | 2001-08-24 | 2002-08-26 | Method for producing electronic componets |
JP2003522978A JP4571405B2 (ja) | 2001-08-24 | 2002-08-26 | 電子部品の作製方法 |
KR1020047002746A KR100940943B1 (ko) | 2001-08-24 | 2002-08-26 | 전자 부품 제조 방법 |
US11/603,388 US8114304B2 (en) | 2001-08-24 | 2006-11-22 | Method for producing electronic components |
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10141558.3 | 2001-08-24 | ||
DE10141558 | 2001-08-24 | ||
DE10141571.0 | 2001-08-24 | ||
DE2001141571 DE10141571B8 (de) | 2001-08-24 | 2001-08-24 | Verfahren zum Zusammenbau eines Halbleiterbauelements und damit hergestellte integrierte Schaltungsanordnung, die für dreidimensionale, mehrschichtige Schaltungen geeignet ist |
DE10222960.0 | 2002-05-23 | ||
DE10222960A DE10222960A1 (de) | 2002-05-23 | 2002-05-23 | Verfahren zur Herstellung von elektronischen Bauelementen |
Related Child Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10487604 A-371-Of-International | 2002-08-26 | ||
US11/603,388 Division US8114304B2 (en) | 2001-08-24 | 2006-11-22 | Method for producing electronic components |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003019617A2 WO2003019617A2 (de) | 2003-03-06 |
WO2003019617A3 true WO2003019617A3 (de) | 2004-01-22 |
Family
ID=27214576
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2002/009497 WO2003019617A2 (de) | 2001-08-24 | 2002-08-26 | Verfahren zur herstellung von elektronischen bauelementen |
Country Status (9)
Country | Link |
---|---|
US (2) | US7160478B2 (de) |
EP (1) | EP1419530B1 (de) |
JP (1) | JP4571405B2 (de) |
KR (2) | KR100940943B1 (de) |
AT (1) | ATE369626T1 (de) |
AU (1) | AU2002342623A1 (de) |
DE (1) | DE50210653D1 (de) |
SG (1) | SG161099A1 (de) |
WO (1) | WO2003019617A2 (de) |
Families Citing this family (51)
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US7224856B2 (en) * | 2001-10-23 | 2007-05-29 | Digital Optics Corporation | Wafer based optical chassis and associated methods |
US7074638B2 (en) | 2002-04-22 | 2006-07-11 | Fuji Photo Film Co., Ltd. | Solid-state imaging device and method of manufacturing said solid-state imaging device |
EP1686619A3 (de) * | 2002-07-29 | 2007-01-03 | Fuji Photo Film Co., Ltd. | Festkörper-Bildaufnehmer und Herstellungsverfahren dafür |
JP3896951B2 (ja) * | 2002-11-13 | 2007-03-22 | 松下電器産業株式会社 | 光通信用送受光モジュール |
JP2005241457A (ja) * | 2004-02-26 | 2005-09-08 | Hamamatsu Photonics Kk | 赤外線センサ及びその製造方法 |
JP4670251B2 (ja) * | 2004-04-13 | 2011-04-13 | 日亜化学工業株式会社 | 発光装置 |
TWM271321U (en) * | 2004-09-10 | 2005-07-21 | Aiptek Int Inc | Flip-chip packaging device |
US20060131710A1 (en) * | 2004-12-21 | 2006-06-22 | Taiwan Semiconductor Manufacturing Company, Ltd. | Advanced cavity structure for wafer level chip scale package |
US20070197922A1 (en) * | 2006-02-17 | 2007-08-23 | Honeywell International Inc. | Disposable pressure sensor systems and packages therefor |
EP1870936A1 (de) | 2006-06-19 | 2007-12-26 | STMicroelectronics (Rousset) SAS | Herstellungsverfahren für Linsen, insbesonders für eine integrierte Bildaufnahmevorrichtung |
JPWO2008023827A1 (ja) * | 2006-08-25 | 2010-01-14 | 三洋電機株式会社 | 半導体装置 |
WO2008023826A1 (fr) * | 2006-08-25 | 2008-02-28 | Sanyo Electric Co., Ltd. | Dispositif semi-conducteur et son procédé de fabrication |
JP5270349B2 (ja) * | 2006-08-25 | 2013-08-21 | セミコンダクター・コンポーネンツ・インダストリーズ・リミテッド・ライアビリティ・カンパニー | 半導体装置及びその製造方法 |
DE102007038465A1 (de) * | 2006-11-20 | 2008-05-21 | Awaiba Gmbh | Kameramodul auf Waferebene |
JP4958273B2 (ja) * | 2007-01-23 | 2012-06-20 | オンセミコンダクター・トレーディング・リミテッド | 発光装置及びその製造方法 |
US7576425B2 (en) * | 2007-01-25 | 2009-08-18 | Xintec, Inc. | Conducting layer in chip package module |
TWI353667B (en) * | 2007-07-13 | 2011-12-01 | Xintec Inc | Image sensor package and fabrication method thereo |
US8772919B2 (en) | 2007-08-08 | 2014-07-08 | Wen-Cheng Chien | Image sensor package with trench insulator and fabrication method thereof |
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US7880293B2 (en) * | 2008-03-25 | 2011-02-01 | Stats Chippac, Ltd. | Wafer integrated with permanent carrier and method therefor |
DE102008025756B4 (de) * | 2008-05-29 | 2023-02-23 | OSRAM Opto Semiconductors Gesellschaft mit beschränkter Haftung | Halbleiteranordnung |
KR100950915B1 (ko) * | 2008-06-17 | 2010-04-01 | 삼성전기주식회사 | 웨이퍼 레벨 카메라 모듈 및 그 제조방법 |
JP5186295B2 (ja) * | 2008-06-30 | 2013-04-17 | 富士フイルム株式会社 | 撮像モジュール及びその製造方法並びに内視鏡装置 |
ES2416254B1 (es) | 2009-02-09 | 2014-12-29 | Semprius, Inc. | Módulos fotovoltaicos de tipo concentrador (cpv), receptores y sub-receptores y métodos para formar los mismos |
JP2010245292A (ja) * | 2009-04-06 | 2010-10-28 | Panasonic Corp | 光学デバイス、電子機器、及びその製造方法 |
EP2246890B1 (de) * | 2009-04-28 | 2013-03-13 | STMicroelectronics (Crolles 2) SAS | Herstellungsmethode eines Bildgebermoduls |
DE102009024425B4 (de) * | 2009-06-09 | 2011-11-17 | Diehl Aerospace Gmbh | Anschlusseinrichtung für eine lichtemittierende Diode und Beleuchtungseinheit |
JPWO2011108664A1 (ja) * | 2010-03-03 | 2013-06-27 | 有限会社Mtec | 光半導体装置 |
JP5558189B2 (ja) * | 2010-04-26 | 2014-07-23 | 浜松ホトニクス株式会社 | 赤外線センサ及びその製造方法 |
US20120154945A1 (en) * | 2010-12-16 | 2012-06-21 | William Mark Hiatt | Optical apertures and applications thereof |
EP2472579A1 (de) * | 2010-12-30 | 2012-07-04 | Baumer Innotec AG | Kontaktierung von Bauelementen auf Substraten |
US9252172B2 (en) | 2011-05-31 | 2016-02-02 | Stats Chippac, Ltd. | Semiconductor device and method of forming EWLB semiconductor package with vertical interconnect structure and cavity region |
CN103512595B (zh) | 2011-07-19 | 2016-08-10 | 赫普塔冈微光有限公司 | 光电模块及其制造方法与包含光电模块的电器及装置 |
US9553162B2 (en) | 2011-09-15 | 2017-01-24 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming semiconductor die with active region responsive to external stimulus |
US9564413B2 (en) | 2011-09-15 | 2017-02-07 | STATS ChipPAC Pte. Ltd. | Semiconductor device and method of forming semiconductor die with active region responsive to external stimulus |
US20140264693A1 (en) * | 2013-03-12 | 2014-09-18 | Optiz, Inc. | Cover-Free Sensor Module And Method Of Making Same |
US9575722B2 (en) | 2013-03-14 | 2017-02-21 | International Business Machines Corporation | Software interface for a specialized hardward device |
SG10201408698SA (en) | 2013-12-26 | 2015-07-30 | Agency Science Tech & Res | Chemical Sensor Package For Highly Pressured Environment |
US9481572B2 (en) * | 2014-07-17 | 2016-11-01 | Texas Instruments Incorporated | Optical electronic device and method of fabrication |
US9543735B2 (en) | 2014-09-26 | 2017-01-10 | Texas Instruments Incorporated | Optoelectronic packages having through-channels for routing and vacuum |
US9429727B2 (en) * | 2014-11-06 | 2016-08-30 | Sae Magnetics (H.K.) Ltd. | Wafer level packaged optical subassembly and transceiver module having same |
US9543347B2 (en) | 2015-02-24 | 2017-01-10 | Optiz, Inc. | Stress released image sensor package structure and method |
US10418501B2 (en) | 2015-10-02 | 2019-09-17 | X-Celeprint Limited | Wafer-integrated, ultra-low profile concentrated photovoltaics (CPV) for space applications |
EP3449538B1 (de) * | 2016-04-29 | 2022-11-23 | Finisar Corporation | Schnittstellenbildende chip-auf-glas-anordnung |
US10522505B2 (en) | 2017-04-06 | 2019-12-31 | Advanced Semiconductor Engineering, Inc. | Semiconductor device package and method for manufacturing the same |
DE102017213065B3 (de) | 2017-04-13 | 2018-07-05 | Christian-Albrechts-Universität Zu Kiel | Verfahren zur Herstellung von plankonvexen Linsenelementen und zur Herstellung eines gehäusten Bauelements auf Waferebene |
KR20220031082A (ko) * | 2019-07-09 | 2022-03-11 | 하이만 센서 게엠베하 | 진공 충전 웨이퍼 레벨 하우징 내에 열 적외선 센서 어레이를 생산하는 방법 |
US11862749B2 (en) * | 2019-12-06 | 2024-01-02 | Adesto Technologies Corporation | Integrated module assembly for optical integrated circuits |
US11329035B2 (en) | 2020-04-16 | 2022-05-10 | International Business Machines Corporation | Tetherless chip module |
JP2024518491A (ja) * | 2021-05-10 | 2024-05-01 | パーデュー・リサーチ・ファウンデーション | 印加される電磁放射によってrf信号インピーダンスを制御可能な導波通アセンブリを備えた半導体システム |
JP7176788B1 (ja) | 2021-06-02 | 2022-11-22 | サンテック株式会社 | 光デバイス、光デバイスの製造方法、及び光デバイスチップの製造方法 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5500540A (en) * | 1994-04-15 | 1996-03-19 | Photonics Research Incorporated | Wafer scale optoelectronic package |
US5761350A (en) * | 1997-01-22 | 1998-06-02 | Koh; Seungug | Method and apparatus for providing a seamless electrical/optical multi-layer micro-opto-electro-mechanical system assembly |
WO1999018612A2 (en) * | 1997-10-03 | 1999-04-15 | Digital Optics Corporation | Wafer level integration of multiple optical elements |
US5915168A (en) * | 1996-08-29 | 1999-06-22 | Harris Corporation | Lid wafer bond packaging and micromachining |
US6328482B1 (en) * | 1998-06-08 | 2001-12-11 | Benjamin Bin Jian | Multilayer optical fiber coupler |
Family Cites Families (24)
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JPH04145403A (ja) * | 1990-10-05 | 1992-05-19 | Seiko Giken:Kk | 多芯リボンテープ光ファイバ用分岐合流器およびその製造方法 |
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JP3091903B2 (ja) * | 1994-08-17 | 2000-09-25 | セイコーインスツルメンツ株式会社 | アバランシェ・フォト・ダイオード及びその製造方法 |
JPH09199736A (ja) * | 1996-01-16 | 1997-07-31 | Olympus Optical Co Ltd | 光センサモジュール |
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US6235141B1 (en) * | 1996-09-27 | 2001-05-22 | Digital Optics Corporation | Method of mass producing and packaging integrated optical subsystems |
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DE19916572A1 (de) | 1999-04-13 | 2000-10-26 | Siemens Ag | Optisches Halbleiterbauelement mit optisch transparenter Schutzschicht |
US6243508B1 (en) * | 1999-06-01 | 2001-06-05 | Picolight Incorporated | Electro-opto-mechanical assembly for coupling a light source or receiver to an optical waveguide |
IL133453A0 (en) | 1999-12-10 | 2001-04-30 | Shellcase Ltd | Methods for producing packaged integrated circuit devices and packaged integrated circuit devices produced thereby |
US6351027B1 (en) * | 2000-02-29 | 2002-02-26 | Agilent Technologies, Inc. | Chip-mounted enclosure |
JP3713418B2 (ja) * | 2000-05-30 | 2005-11-09 | 光正 小柳 | 3次元画像処理装置の製造方法 |
US6909554B2 (en) * | 2000-12-27 | 2005-06-21 | Finisar Corporation | Wafer integration of micro-optics |
US6556349B2 (en) * | 2000-12-27 | 2003-04-29 | Honeywell International Inc. | Variable focal length micro lens array field curvature corrector |
US6635941B2 (en) * | 2001-03-21 | 2003-10-21 | Canon Kabushiki Kaisha | Structure of semiconductor device with improved reliability |
US6646807B2 (en) * | 2001-06-19 | 2003-11-11 | Rohm Co., Ltd. | Lens array unit and process for making lens array |
US6967124B1 (en) * | 2001-06-19 | 2005-11-22 | Amkor Technology, Inc. | Imprinted integrated circuit substrate and method for imprinting an integrated circuit substrate |
DE10141571B8 (de) | 2001-08-24 | 2005-05-25 | Schott Ag | Verfahren zum Zusammenbau eines Halbleiterbauelements und damit hergestellte integrierte Schaltungsanordnung, die für dreidimensionale, mehrschichtige Schaltungen geeignet ist |
DE10222960A1 (de) | 2002-05-23 | 2003-12-11 | Schott Glas | Verfahren zur Herstellung von elektronischen Bauelementen |
DE10222959B4 (de) | 2002-05-23 | 2007-12-13 | Schott Ag | Mikro-elektromechanisches Bauelement und Verfahren zur Herstellung von mikro-elektromechanischen Bauelementen |
US6974966B1 (en) * | 2002-01-16 | 2005-12-13 | Vijaysekhar Jayaraman | Multiple epitaxial region wafers with optical connectivity |
-
2002
- 2002-08-26 AU AU2002342623A patent/AU2002342623A1/en not_active Abandoned
- 2002-08-26 JP JP2003522978A patent/JP4571405B2/ja not_active Expired - Fee Related
- 2002-08-26 SG SG200602593-6A patent/SG161099A1/en unknown
- 2002-08-26 KR KR1020047002746A patent/KR100940943B1/ko not_active IP Right Cessation
- 2002-08-26 AT AT02779276T patent/ATE369626T1/de not_active IP Right Cessation
- 2002-08-26 WO PCT/EP2002/009497 patent/WO2003019617A2/de active Application Filing
- 2002-08-26 US US10/487,604 patent/US7160478B2/en not_active Expired - Fee Related
- 2002-08-26 KR KR1020097021389A patent/KR100986816B1/ko not_active IP Right Cessation
- 2002-08-26 EP EP02779276A patent/EP1419530B1/de not_active Expired - Lifetime
- 2002-08-26 DE DE50210653T patent/DE50210653D1/de not_active Expired - Lifetime
-
2006
- 2006-11-22 US US11/603,388 patent/US8114304B2/en not_active Expired - Fee Related
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
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US5500540A (en) * | 1994-04-15 | 1996-03-19 | Photonics Research Incorporated | Wafer scale optoelectronic package |
US5915168A (en) * | 1996-08-29 | 1999-06-22 | Harris Corporation | Lid wafer bond packaging and micromachining |
US5761350A (en) * | 1997-01-22 | 1998-06-02 | Koh; Seungug | Method and apparatus for providing a seamless electrical/optical multi-layer micro-opto-electro-mechanical system assembly |
WO1999018612A2 (en) * | 1997-10-03 | 1999-04-15 | Digital Optics Corporation | Wafer level integration of multiple optical elements |
US6328482B1 (en) * | 1998-06-08 | 2001-12-11 | Benjamin Bin Jian | Multilayer optical fiber coupler |
Non-Patent Citations (3)
Title |
---|
JIM K L ET AL: "Fabrication of wafer level chip scale packaging for optoelectronic devices", 1999 PROCEEDINGS. 49TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE (CAT. NO.99CH36299), 1999 PROCEEDINGS. 49TH ELECTRONIC COMPONENTS AND TECHNOLOGY CONFERENCE, SAN DIEGO, CA, USA, 1-4 JUNE 1999, 1999, Piscataway, NJ, USA, IEEE, USA, pages 1145 - 1147, XP002248941, ISBN: 0-7803-5231-9 * |
LECLERCQ J-L ET AL: "INP-BASED MOEMS AND RELATED TOPICS", JOURNAL OF MICROMECHANICS & MICROENGINEERING, NEW YORK, NY, US, vol. 10, no. 2, 27 September 1999 (1999-09-27), pages 287 - 292, XP008002312, ISSN: 0960-1317 * |
PFEIFFER J ET AL: "Tunable wavelength-selective WDM photodetector based on MOEMS", ANNUAL REPORT TECHNICAL UNIVERSITY DARMSTADT, XX, XX, 1999, pages 94 - 98, XP002195782 * |
Also Published As
Publication number | Publication date |
---|---|
AU2002342623A8 (en) | 2003-03-10 |
KR100986816B1 (ko) | 2010-10-12 |
US7160478B2 (en) | 2007-01-09 |
WO2003019617A2 (de) | 2003-03-06 |
SG161099A1 (en) | 2010-05-27 |
US20040256349A1 (en) | 2004-12-23 |
KR20040036920A (ko) | 2004-05-03 |
US20070063202A1 (en) | 2007-03-22 |
AU2002342623A1 (en) | 2003-03-10 |
EP1419530B1 (de) | 2007-08-08 |
KR100940943B1 (ko) | 2010-02-08 |
JP4571405B2 (ja) | 2010-10-27 |
JP2005501405A (ja) | 2005-01-13 |
DE50210653D1 (de) | 2007-09-20 |
KR20090115818A (ko) | 2009-11-06 |
EP1419530A2 (de) | 2004-05-19 |
ATE369626T1 (de) | 2007-08-15 |
US8114304B2 (en) | 2012-02-14 |
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